Optical system device

Abstract

The purpose of the present invention is to provide an optical system device capable of adjusting at least one or both of the number of dots in a dot pattern and light intensity. This optical system device is provided with: an optical element (1) in which lenses (11) that transmit light having a wavelength (lambda) are periodically arranged; a plurality of irradiation units (2) having a light source that irradiates light having a wavelength [lambda] to the plurality of lenses (11); an imaging unit (3) that receives light; a calculation unit (4) that calculates the distance of the object on the basis of information from the imaging unit (3); and a control unit (5) that controls the lighting of each irradiation unit (2), where m and n are natural numbers equal to or greater than 1, f1 is a focal distance based on a cross-sectional shape perpendicular to the y direction of the lens (11), f2 (f1 is not equal to f2) is a focal distance based on a cross-sectional shape perpendicular to the x direction of the lens (11), P1 is a pitch size in the x direction of the lens (11), P2 is a pitch size in the y direction of the lens (11), and f2 is a focal distance based on a cross-sectional shape perpendicular to the x direction of the lens (11). The distance (L1) between the irradiation unit (2) and the first focal plane (111) of the lens (11) and the distance (L2) between the irradiation unit (2) and the second focal plane (112) satisfy formula 1 and formula 2. # imgabs0 #

Description

Technical Field

[0001] The present invention relates to an optical system device. Background Art

[0002] A three-dimensional measurement sensor using the Time of Flight (TOF) method will be used in portable devices, vehicles, robots, etc. It is a component that measures the distance of an object based on the time until the light irradiated from a light source to the object is reflected back. If the light from the light source is uniformly irradiated onto a specified area of the object, the distances of the irradiated points can be measured and the three-dimensional structure of the object can be detected.

[0003] The sensor system includes a light irradiation unit that irradiates light onto the object, an imaging unit that detects the light reflected from each point of the object, and an arithmetic unit that calculates the distance of the object based on the signal received by the imaging unit.

[0004] Since the imaging unit and the arithmetic unit can use existing Complementary Metal Oxide Semiconductor (CMOS) imagers and Central Processing Units (CPUs), the unique part of the system becomes the light irradiation unit including a laser and an optical filter. In particular, by passing laser light through a microlens array to shape the light beam, a diffusion filter that uniformly irradiates the object in a controlled area becomes a characteristic part of the system.

[0005] Here, since the existing diffusion filter has a periodic structure of the microlens array, there is a problem of uneven light intensity due to the influence of diffraction. Therefore, measures such as randomly arranging each lens are taken to suppress the unevenness (for example, Patent Document 1).

[0006] On the other hand, there is a need for long-distance measurement in TOF, and the light intensity of the irradiated light needs to be of a magnitude that allows long-distance measurement. However, the higher the uniformity of the irradiated light in the randomly arranged microlens array, the lower the light intensity, so it is not suitable for long-distance measurement.

[0007] Therefore, as a method of saving power and processing strong light signals, irradiating a dot pattern and performing three-dimensional measurement based on the time of flight of the light is being studied (for example, Patent Document 2).

[0008] Prior Art Documents

[0009] Patent Documents

[0010] Patent Document 1: Japanese Patent Application Laid-Open No. 2006-500621

[0011] Patent Document 2: International Publication No. 2023 / 026987 Summary of the Invention

[0012] Problems to be Solved by the Invention

[0013] Here, compared with the irradiation based on the existing dot pattern and the uniform irradiation based on the diffusion filter, the resolution is low. To achieve high resolution, it is necessary to increase the number of dots in the dot pattern, but when increasing the dot pattern, there is a problem that the energy consumption becomes large. In addition, in long-distance measurement, the greater the light intensity of the irradiation light is, the better, but in short-distance measurement, there is also a requirement to reduce the light intensity of the irradiation light to reduce the energy consumption.

[0014] Therefore, an object of the present invention is to provide an optical system device that can at least adjust either or both of the number of dots and the light intensity of the dot pattern.

[0015] Technical Means for Solving the Problems

[0016] To achieve the above object, the optical system device of the present invention is characterized in that it includes: an optical element having lenses that transmit light of wavelength λ arranged periodically; a plurality of irradiation units having light sources that irradiate light of wavelength λ onto the plurality of lenses; an imaging unit that receives light; an arithmetic unit that calculates the distance of an object based on information from the imaging unit; and a control unit that controls the lighting of each of the irradiation units. If m and n are natural numbers of 1 or more, the focal length based on the cross-sectional shape perpendicular to the y direction of the lens is set as f1, the focal length based on the cross-sectional shape perpendicular to the x direction is set as f2 (f1 ≠ f2), the size of the pitch in the x direction of the lens is set as P1, and the size of the pitch in the y direction is set as P2, then the distance L1 between the irradiation unit and the first focal plane of the lens and the distance L2 from the second focal plane satisfy the following formulas 1 and 2:

[0017] [Equation 1]

[0018]

[0019] [Equation 2]

[0020]

[0021] The irradiation unit may include: different types of irradiation units, and when the positions of the light sources relative to the lens are overlapped and gathered on one lens for each irradiation unit, the positions of the apparent light sources after the gathering are different from each other. In addition, the irradiation unit may include: the same type of irradiation units, and when the positions of the light sources relative to the lens are overlapped and gathered on one lens for each irradiation unit, the positions of the apparent light sources after the gathering are the same as each other.

[0022] In addition, it is preferable that the control unit controls the lighting of each of the irradiation units based on the distance information calculated by the arithmetic unit. In this case, the control unit controls in such a way that the smaller the distance to the object, the larger the number of the irradiation units to be lit. In addition, the control unit may control in such a way that the smaller the distance to the object, the smaller the number of the irradiation units to be lit.

[0023] In addition, the light sources included in the same irradiation unit are a plurality of light sources arranged periodically, and the pitch in the x direction of the light sources is a natural number multiple or a reciprocal multiple of the pitch P1 of the lenses, and the pitch in the y direction is a natural number multiple or a reciprocal multiple of the pitch P2 of the lenses.

[0024] It is preferable that all of the irradiation units are formed on the same semiconductor chip. In addition, it is preferable that all of the irradiation units and the imaging unit are formed on the same semiconductor chip.

[0025] It is preferable that the distances L1 and L2 satisfy the following formulas 3 and 4:

[0026] [Formula 3]

[0027]

[0028] [Formula 4]

[0029]

[0030] Effects of the Invention

[0031] The optical system device of the present invention can adjust at least either or both of the number of dots and the light intensity of the dot pattern according to the situation. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 is a schematic plan view showing the optical system device of the present invention.

[0033] Figure 2 is a schematic sectional view (a) based on the xz plane, (b) a schematic sectional view based on the yz plane, and (c) a perspective view showing the lens of the optical element and the irradiation unit according to the present invention.

[0034] Figure 3 is a plan view for explaining the outline of the lighting unit and the light source according to the present invention.

[0035] Figure 4 is a plan view for explaining the position of the light source relative to the lens and the position of the apparent light source according to the present invention.

[0036] ​​​​​Figure 5 is a plan view for explaining the position of a point formed through an optical element according to the present invention.

[0037] Figure 6 is a plan view for explaining the position of a light source relative to a lens and the position of an apparent light source according to another invention. Detailed implementation mode

[0038] The optical system device of the present invention will be described below. As Figure 1 shown, the optical system device of the present invention mainly includes an optical element 1, a plurality of irradiation units 2, an imaging unit 3 that receives light, an arithmetic unit 4, and a control unit 5.

[0039] As Figure 2 shown, the optical element 1 is an element formed by periodically arranging lenses 11 that transmit light with a wavelength of λ. Here, the lens 11 is a lens that has a focal point at a position separated from the lens 11 by a predetermined distance f (f > 0). In addition, in this specification, the focal length means, as Figure 2 shown, the distance between the lens surface closest to the focal point and the focal point. Here, if the mutually perpendicular directions are set as the x direction, y direction, and z direction, and the optical axis direction of the optical element 1 is set as the z direction, then Figure 2 (a) is a view of the optical system device observed in the y direction, Figure 2 (b) is a view of the optical system device observed in the x direction.

[0040] The shape of the lens 11 can be freely designed according to a pattern of the spread mode of the point to be irradiated (hereinafter, referred to as a dot pattern). For example, when the dot pattern is to be circular, the shape of the lens 11 may be a spherical lens. In addition, when the dot pattern is to be non-circular, the shape of the lens 11 may be an aspherical lens appropriately designed. In the case of an aspherical lens, the focal length varies according to the direction. Figure 2 (c) is an example of an aspherical lens in which the focal length based on the cross-sectional shape perpendicular to the y direction is f1, the focal length based on the cross-sectional shape perpendicular to the x direction is f2 (f1 ≠ f2), the size of the pitch in the x direction is P1, and the size of the pitch in the y direction is P2. In addition, the optical element of the present invention can also be used for a wide-angle lens in which the focal length f1 or the focal length f2 is less than 20 μm, 15 μm, 10 μm, respectively, or a narrow-angle lens in which the focal length is greater than 60 μm, 65 μm, 70 μm, respectively.

[0041] ​In addition, in the periodic arrangement of the lenses, there are cases where the square or rectangular lenses 11 in plan view are arranged in a four-sided pattern, or the hexagonal lenses 11 in plan view are arranged in a hexagonal pattern, etc. In addition, as long as the lens 11 functions as a lens, it can be any lens. In addition to general lenses such as convex lenses or concave lenses, Fresnel lenses, diffractive optical element (DOE) lenses, metalenses, etc. can also be used. In the case of a convex lens, it is preferably arranged such that the convex lens portion faces the irradiation unit 8 side. In addition, any material can be used for the lens, for example, resin or glass can be used.

[0042] The irradiation unit 2 has a light source 7 that irradiates light with a wavelength λ onto the plurality of lenses 11. The irradiation unit 2 can be a single light source or multiple light sources. In the case where a plurality of light sources 7 are included in one irradiation unit 2, it is configured such that when the positions of the respective light sources 7 relative to the lens 11 are overlapped and concentrated on one lens, the positions of the apparent light sources 7 after the concentration coincide with each other. For example, it can be configured as follows: The light sources included in the same irradiation unit are arranged periodically, and the pitch P in the x direction of the light sources x is a natural number multiple or a reciprocal multiple of the pitch P1 of the lens, and the pitch P in the y direction y is a natural number multiple or a reciprocal multiple of the pitch P2 of the lens. In other words, the light sources 7 included in the same irradiation unit 2 only need to be regularly arranged as follows: If the magnitude of the pitch in the x direction is set as P x and the magnitude of the pitch in the y direction is set as P y , and j and k are natural numbers of 1 or more, then it satisfies P x = jP1 or jP x = P1, and it satisfies P y = kP2 or kP y = P2.

[0043] In addition, regarding the optical element 1, when the light sources 7 of the irradiation unit 2 are arranged in a square pattern, the pitch P1 and the pitch P2 of the lenses 11 can be set to P1 = P2. In addition, when the light sources 7 of the irradiation unit 2 are arranged in a hexagonal pattern, the pitch P1 and the pitch P2 of the lenses 11 can be set to 2P1 = √3P2 or √3P1 = 2P2.

[0044] The light source 7 can be any light source as long as it can irradiate light with a wavelength of λ onto a plurality of lenses 11. Additionally, the light sources 7 are preferably formed on the same plane. Further, the irradiation unit 2 and the optical element 1 only need to be arranged such that the optical axis direction of the light source of the irradiation unit 2 coincides with the optical axis direction of the lens 11 of the optical element 1. As a specific example of the irradiation unit 2, for instance, a vertical cavity surface emitting laser (VCSEL) that is expected to have high output with less power can be cited. In a VCSEL, there is a single emitter VCSEL having one light source 10 that can irradiate light in a direction perpendicular to the light emitting surface, or a multi-emitter VCSEL having a plurality of light sources 10.

[0045] In addition, all of the irradiation units 2 can also be formed on the same semiconductor chip. Thus, when assembling the optical system device, it is not necessary to align the positions of the irradiation units or the light sources with each other in the x-direction, y-direction, and z-direction.

[0046] [Positional relationship between the irradiation unit and the optical element]

[0047] As shown in Figure 2 , the incident light can be converted into a dot pattern with a large contrast when the distances L1 between the irradiation unit 2 and the first focal plane 111 of the lens 11 and L2 between the second focal plane 112 satisfy the following formulas α and β. Here, m and n refer to natural numbers of 1 or more, P1 refers to the size of the pitch in the x-direction of the lens 11, P2 refers to the size of the pitch in the y-direction, λ refers to the wavelength of the light incident on the irradiation unit 2, f1 refers to the focal length of the lens 11 based on the cross-sectional shape perpendicular to the y-direction, f2 refers to the focal length of the lens 11 based on the cross-sectional shape perpendicular to the x-direction, and a, b, c, and d refer to coefficients representing the allowable errors.

[0048] [Equation 5]

[0049]

[0050] [Equation 6]

[0051]

[0052] In addition, the so-called first focal plane 111 refers to a plane located at the following focal position, that is, the focal position based on the cross-sectional shape perpendicular to the optical axis (z direction) of the lens 11 and perpendicular to the y direction of the lens 11. Further, the so-called second focal plane 112 refers to a plane located at the following focal position, that is, the focal position based on the cross-sectional shape perpendicular to the optical axis (z direction) of the lens 11 and perpendicular to the x direction of the lens 11. In addition, the distance L1 and the distance L2 refer to the distance (optical path length) traveled in a vacuum in the same time as light travels in a medium. If the refractive index of the medium is set to N and the actual distance is set to L, they are represented by the product NL. In addition, when the foci are located on both sides of the lens 11, the first focal plane 111 and the second focal plane 112 are preferably based on the side of the irradiation unit 2 of the lens 11.

[0053] In addition, the coefficient a of the formula α is a = 1, a = 0.5, a = 0.3, a = 0.1, and the smaller the value, the more preferable. In addition, the coefficient b is also b = 1, b = 0.5, b = 0.3, b = 0.1, and the smaller the value, the more preferable. In addition, the coefficient c of the formula β is c = 1, c = 0.5, c = 0.3, c = 0.1, and the smaller the value, the more preferable. In addition, the coefficient d is also d = 1, d = 0.5, d = 0.3, d = 0.1, and the smaller the value, the more preferable. When the coefficients of the formula α and the formula β are a = b = c = d = 1, the formula α and the formula β respectively become the following formula 1 and formula 2.

[0054] [Equation 7]

[0055]

[0056] [Equation 8]

[0057]

[0058] In particular, when the coefficients of the formula α and the formula β are a = b = c = d = 0, that is, when the distance L1 and the distance L2 satisfy the following formula 3 and formula 4, light can be maximally made to interfere constructively.

[0059] [Equation 9]

[0060]

[0061] [Equation 10]

[0062]

[0063] In addition, if the pitches P1 and P2 become smaller than the wavelength λ of the light of the light source 7, it is difficult to generate diffraction. Therefore, as long as the aspherical lens 11 is sufficient to generate diffraction within the light distribution angle including the light source 7, the pitches P1 and P2 can be sufficiently larger than the wavelength λ of the light of the light source 7, for example, 5 times or more, preferably 10 times or more.

[0064] In addition, each irradiation unit 2 may be configured to include the following irradiation units, that is, when the positions of the light sources 7 relative to the lens 11 are overlapped and concentrated on one lens for each irradiation unit, different types of irradiation units in which the positions of the apparent light sources 7 after the concentration are different from each other (hereinafter, the irradiation units in such a relationship are referred to as different types of irradiation units). In this way, by using different types of irradiation units 2, the positions of the points formed by the light irradiated from each irradiation unit 2 passing through the optical element 1 are at least not all exactly the same. Therefore, by controlling the lighting of each irradiation unit, the number or position of the points can be adjusted.

[0065] This will be specifically described by using Figure 3 the four irradiation units 2A to 2D shown in (a). The optical element 1 is an element in which the lens 11 having a square shape with a side length of P in a plan view is arranged in a square pattern. In addition, for simplicity of explanation, the light sources 7 included in each of the irradiation units 2A to 2D are Figure 3 periodically arranged in the same manner as the pitch P of the lens 11 of the optical element 1 as shown in (b). In addition, the irradiation unit 2A and the irradiation unit 2B are arranged such that the periodic positions of the light sources differ by only 1 / 2 pitch in the x-axis direction, the irradiation unit 2A and the irradiation unit 2C are arranged such that the periodic positions of the light sources differ by only 1 / 2 pitch in the y-axis direction, and the irradiation unit 2A and the irradiation unit 2D are arranged such that the periodic positions of the light sources differ by 1 / 2 pitch in the x-axis direction and the y-axis direction, respectively. When the position of the light source 7A of the irradiation unit 2A relative to the lens 11 is arranged as Figure 4 (A1), the position of the apparent light source 7A overlapped and concentrated on one lens 11 is as Figure 4 (A2). Similarly, when the positions of the light sources 7B to 7D of the irradiation units 2B to 2D relative to the lens 11 are arranged as Figure 4 (B1) to (D1), the positions of the apparent light sources 7B to 7D overlapped and concentrated on one lens 11 are respectively as Figure 4 (B2) to (D2).

[0066] When the light sources 7A to 7D of the irradiation units 2A to 2D configured as described above are lit, the positions of the points formed by passing through the optical element 1 are all different from each other. Therefore, for example, when only the irradiation unit 2A is used, the positions of the points are as Figure 5 (a). In addition, when two sets of irradiation units such as the irradiation unit 2A and the irradiation unit 2B, the irradiation unit 2A and the irradiation unit 2C, and the irradiation unit 2A and the irradiation unit 2D are used, the positions of the points formed by passing through the optical element 1 are respectively as Figure 5 (b) to (d). In addition, when all of the irradiation units 2A to 2D are used, the positions of the points formed by passing through the optical element 1 are as Figure 5(e) and so on. Therefore, by controlling the lighting of each irradiation unit, the number or position of the points can be adjusted.

[0067] In addition, each irradiation unit 2 can also be configured to include the following irradiation units, that is, when the positions of the light sources 7 relative to the lens 11 are overlapped and concentrated on one lens for each irradiation unit, the positions of the apparent light sources 7 after the concentration are the same for the same type of irradiation units (hereinafter, the irradiation units in such a relationship are referred to as the same type of irradiation units). In this way, by using the same type of irradiation units 2, the positions of the points formed by the light irradiated from each irradiation unit 2 passing through the optical element 1 are the same. Therefore, by controlling the lighting of each irradiation unit, the light intensity of the points can be adjusted.

[0068] This will be specifically described by using Figure 3 the four types of irradiation units 2A to 2D shown in (a). The optical element 1 is an element in which the lens 11 having a side length of P in a plan view is arranged in a square pattern. In addition, for the sake of simplicity of explanation, the light sources 7 included in each of the irradiation units 2A to 2D are arranged periodically in the same manner as the pitch P of the lens 11 of the optical element 1, as shown in (b). In addition, the irradiation unit 2A, the irradiation unit 2B, the irradiation unit 2C, and the irradiation unit 2D are arranged such that the periodic positions of the light sources are the same in both the x-axis direction and the y-axis direction. When the position of the light source 7A of the irradiation unit 2A relative to the lens 11 is arranged as shown in Figure 3 (A1), the position of the apparent light source 7A overlapped and concentrated on one lens 11 is as shown in Figure 6 (A2). Similarly, when the positions of the light sources 7B to 7D of the irradiation units 2B to 2D relative to the lens 11 are arranged as shown in Figure 6 (B1) to (D1), the positions of the apparent light sources 7B to 7D overlapped and concentrated on one lens 11 are respectively as shown in Figure 6 (B2) to (D2). Figure 6 When the light sources 7A to 7D of the irradiation units 2A to 2D configured as described above are lit, the positions of the points formed by passing through the optical element 1 are all the same. Therefore, by controlling the number of the lit irradiation units 2A to 2D, the light intensity of the points can be adjusted.

[0069] In addition, the irradiation unit 2 can of course also be configured to include both the different types of irradiation units and the same type of irradiation units described above.

[0070]

[0071] ​The imaging unit 3 is configured to detect the light reflected by the object from the light irradiated by the irradiation unit 2 and return it, and convert information such as its position or light intensity into digital data. The imaging unit 3 can be any component as long as it can detect the reflected light and convert the information into digital data. For example, existing image sensors such as CMOS or Charge Coupled Device (CCD) can be used. In addition, the imaging unit 3 can also be entirely formed on the same semiconductor chip together with the irradiation unit.

[0072] The arithmetic unit 4 is configured to calculate the distance of the object based on the information from the imaging unit 3. Here, the distance of the object refers to the distance between the object and the reference components such as optical elements, irradiation units, and imaging units. The arithmetic unit 4 can calculate the distance of the object in any way. For example, it can calculate the distance between the irradiation unit 2 and the object 9 based on the time from when the light irradiated by the irradiation unit 2 is reflected by the object 9 and received by the imaging unit 3. In addition, it is also possible to calculate the distance between the irradiation unit 2 and the object 9 using triangulation based on the position change of the points. In addition, it is also possible to calculate the distance by changing the number of lit irradiation units 2 of the same type and based on the presence or absence of the points detectable by the imaging unit 3 and the light intensity of the points. The distance between the irradiation unit 2 and the object 9 calculated in this way can be used, for example, in various technologies such as three-dimensional measurement or autofocus.

[0073] The control unit 5 controls the lighting of each irradiation unit 2. The control unit 5 can control the irradiation unit 2 in any way. For example, it can control the lighting of each irradiation unit 2 based on the distance information calculated by the arithmetic unit. As a method of controlling the lighting of the irradiation unit 2, for example, it can be controlled as follows: the smaller the distance to the object 9, the more the number of different types of lit irradiation units is increased, and the larger the distance to the object 9, the fewer the number of different types of lit irradiation units is decreased. If controlled in this way, when the distance to the object is small, the number of points can be increased to improve the resolution, and when the distance to the object is large, the number of points can be decreased to reduce power consumption.

[0074] In addition, as another method of controlling the lighting of the irradiation unit 2, for example, it can also be controlled as follows: the smaller the distance to the object 9, the fewer the number of the same type of lit irradiation units is decreased, and the larger the distance to the object 9, the more the number of the same type of lit irradiation units is increased. If controlled in this way, when the distance to the object is small, the light intensity of the points can be reduced to reduce power consumption, and when the distance to the object is large, the light intensity of the points can be increased to perform long-distance measurement.

[0075] In addition, as yet another method for controlling the lighting of the irradiation unit 2, it is also possible to control the lighting of different types of irradiation units 2 in sequence. Thus, the position of the point changes, and accordingly, the arithmetic unit 4 can calculate the distance between the irradiation unit 2 and the object 9 using the triangulation method based on the change in the position of the point.

[0076] As the control unit, any component can be used as long as it can control the lighting of the light source for each irradiation unit based on the information from the imaging unit 3. For example, an existing computer or CPU can be used.

[0077] Explanation of the reference numerals in the drawings

[0078] 1: Optical element

[0079] 2, 2A - 2D: Irradiation unit

[0080] 3: Imaging unit

[0081] 4: Arithmetic unit

[0082] 5: Control unit

[0083] 7, 7A - 7D: Light source

[0084] 8A - 8D: Point

[0085] 9: Object

[0086] 11: Lens

[0087] 111: First focal plane

[0088] 112: Second focal plane

Claims

1. An optical system device, characterized in that, Comprising: An optical element, having lenses that are periodically arranged and transmit light of wavelength λ; A plurality of irradiation units, each having a light source that irradiates light of wavelength λ onto the plurality of lenses; An imaging unit that receives light; An arithmetic unit that calculates the distance to an object based on information from the imaging unit; And A control unit that controls the lighting of each of the irradiation units, If m and n are natural numbers of 1 or more, the focal length based on the cross-sectional shape perpendicular to the y-direction of the lens is set as f1, the focal length based on the cross-sectional shape perpendicular to the x-direction of the lens is set as f2 (f1 ≠ f2), the size of the pitch of the lens in the x-direction is set as P1, and the size of the pitch in the y-direction is set as P2, then the distance L1 between the irradiation unit and the first focal plane of the lens and the distance L2 to the second focal plane satisfy the following formulas 1 and 2: [Equation 1] [Equation 2] 2. The optical system device according to claim 1, wherein The irradiation unit includes: different types of irradiation units. When the positions of the light sources relative to the lenses are overlapped and gathered on one lens for each irradiation unit, the positions of the apparent light sources after the gathering are different from each other.

3. The optical system device according to claim 1, characterized in that, The irradiation unit includes: the same type of irradiation units. When the positions of the light sources relative to the lenses are overlapped and gathered on one lens for each irradiation unit, the positions of the apparent light sources after the gathering are the same as each other.

4. The optical system device according to any one of claims 1 to 3, characterized in that The control unit controls the lighting of each of the irradiation units based on the distance information calculated by the arithmetic unit.

5. The optical system device according to claim 1 or 2, characterized in that, The control unit controls in such a manner that, based on the distance information calculated by the arithmetic unit, the smaller the distance to the object, the greater the number of lighting irradiation units.

6. The optical system device according to claim 1 or 3, characterized in that, The control unit controls in such a manner that, based on the distance information calculated by the arithmetic unit, the smaller the distance to the object, the smaller the number of lighting irradiation units.

7. The optical system device according to any one of claims 1 to 3, characterized in that, The light sources included in the same irradiation unit are a plurality of light sources arranged periodically. The pitch of the light sources in the x-direction is a natural number multiple or a reciprocal multiple of the pitch P1 of the lenses, and the pitch in the y-direction is a natural number multiple or a reciprocal multiple of the pitch P2 of the lenses.

8. The optical system device according to any one of claims 1 to 3, characterized in that, All of the irradiation units are formed on the same semiconductor chip.

9. The optical system device according to any one of claims 1 to 3, characterized in that, All of the irradiation units and the imaging unit are formed on the same semiconductor chip.

10. The optical system device according to any one of claims 1 to 3, characterized in that, The distance L1 and the distance L2 satisfy the following formulas 3 and 4: [Equation 3] [Equation 4]

Images