Contact photolithography machine cleaning equipment

Abstract

The present invention discloses a contact photolithography cleaning device, which relates to the field of semiconductor chip technology and includes a cleaning rack, an ultrasonic cleaning component, a transmission component, and a recovery component. A PLC controller is provided on the front surface of the top of the cleaning rack. When the present invention is used, the tightening bolt is turned to drive the limiting telescopic rod to rotate and retract, further driving the rotating rod, the rotating ring, and the two arc-shaped tightening plates to rotate, generating relative pulling force on the two tightening blocks. The two tightening blocks drive the two tightening rods to move relative to each other, further driving the two adjustment frames to move relative to each other, clamping and fixing the photolithography plate with rubber nails, and then inserting the rod on the outer surface of the clamping frame into the inside of the socket. Under the action of the adjustment component, an adjustment frame that can adjust the width distance is provided, which can flexibly clamp and fix photolithography plates of different thicknesses, thereby improving their firmness and stability.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor chips, in particular to contact-type photolithography machine cleaning equipment. Background Art

[0002] A semiconductor chip is a miniature electronic device or component typically made of semiconductor materials such as silicon and germanium. It integrates numerous electronic components onto a very small semiconductor wafer through a complex series of processes, including photolithography, etching, and doping. The photomask is a key component in contact lithography machines for pattern transfer. Contact lithography machines create the chip's circuit pattern by placing the photomask in direct contact with the photoresist-coated wafer surface. The pattern on the photomask is then projected onto the wafer by irradiation, forming the chip's circuit pattern.

[0003] In the existing technology, the photoresist is in direct contact with the photoresist, and some photoresist is easily adhered to the photoresist. When the residual photoresist on the surface is mixed with unknown particles in the environment, in addition to the electrostatic adsorption of the particles themselves, the fixation of the photoresist is increased, making it difficult to remove the surface contamination of the photoresist, which brings various problems to the final photolithography process effect. Therefore, cleaning the photoresist is a very important step.

[0004] When cleaning the photoresist plate, it needs to be placed in a cleaning frame, and then the cleaning frame is placed in a cleaning tank. However, the width of the space inside the cleaning frame remains unchanged. When the thickness of the photoresist plate is small, the photoresist plate will be loose in the cleaning frame. During the ultrasonic cleaning process, the photoresist plate will shake due to vibration and easily collide with the cleaning frame, causing wear and even slight deformation of the photoresist plate, affecting the accuracy of pattern transfer in the subsequent photolithography process, reducing the photolithography effect of the photolithography machine, and affecting the manufacturing quality of the chip.

[0005] Therefore, we propose a contact lithography machine cleaning device to solve the problems raised in the above background technology. Summary of the Invention

[0006] The purpose of the present invention is to provide a contact-type photolithography machine cleaning device to solve the problem proposed in the above-mentioned background technology that during the ultrasonic cleaning process, when the thickness of the photolithography plate is smaller than the internal width of the cleaning frame, the photolithography plate is prone to collision with the cleaning frame, causing wear of the photolithography plate and even slight deformation, affecting the accuracy of pattern transfer in the subsequent photolithography process and reducing the photolithography effect of the photolithography machine.

[0007] To achieve the above-mentioned object, the present invention provides the following technical solution: a contact lithography cleaning device, comprising a cleaning rack, an ultrasonic cleaning assembly, a transmission assembly, and a recovery assembly, wherein a PLC controller is provided on the front surface of the top of the cleaning rack, a high-pressure flushing assembly is provided on the top of the cleaning rack, and an adjustment assembly is provided inside the ultrasonic cleaning assembly;

[0008] The adjustment assembly includes four clamping frames and eight adjustment frames. Eight rubber nails are fixedly connected to the outer surface of one side of the eight adjustment frames. Tightening rods are fixedly connected to the outer surfaces of both sides of the eight adjustment frames. The clamping frames can be used to stack two photoresist plates. The adjustment frames can adjust the distance between the rubber nails to contact the stacked photoresist plates in the clamping frames. The tightening rods are used to drive the adjustment frames to move.

[0009] The ultrasonic cleaning component comprises a shell and a cleaning pool, and a transducer is arranged at the bottom of the cleaning pool.

[0010] Preferably, the adjustment assembly also includes eight tightening bolts, one end of the eight tightening bolts is fixedly connected to the limiting telescopic rod, one end of the eight limiting telescopic rods is fixedly installed with a rotating rod, the outer surfaces of the eight rotating rods are fixedly installed with a rotating ring, the outer surfaces of the eight rotating rings are fixedly installed with two arc-shaped tightening plates, the outer surfaces of the multiple tightening rods are fixedly installed with tightening blocks, and the outer surfaces of the multiple arc-shaped tightening plates are respectively movably embedded in the interior of the multiple tightening blocks.

[0011] Preferably, the eight adjustment frames are evenly divided into four groups, the outer surfaces of the four groups of adjustment frames are movably embedded in the inside of the four clamping frames, one ends of the eight rotating rods are movably embedded in the outer surfaces on both sides of the four clamping frames, the outer surfaces on both sides of the four clamping frames are fixedly installed with mounting plates, the outer surfaces of the eight tightening bolts are movably embedded in the inside of the eight mounting plates, the outer surfaces on both sides of the four clamping frames are provided with two adjustment holes, each vertically distributed two adjustment holes of the sixteen adjustment holes form a group, each adjacent two tightening rods of the sixteen tightening rods form a group, and the outer surfaces of the eight groups of tightening rods are movably embedded in the inside of the eight groups of adjustment holes.

[0012] Preferably, the adjustment component also includes a fixing frame, the top of the fixing frame is provided with eight sockets, and the interiors of the eight sockets are movably embedded with plug rods, the eight plug rods are grouped in two in each horizontal distribution, and one end of the four groups of plug rods are respectively fixedly mounted on the outer surface of one side of the four clamping frames, and the bottom of the fixing frame is fixedly mounted on the bottom surface inside the cleaning tank.

[0013] Preferably, the outer surface of the cleaning pool is fixedly mounted inside the outer shell, a waste liquid pipe is fixedly connected to the bottom surface of the outer surface of the cleaning pool, one end of the waste liquid pipe is fixedly passed through the outer surface of the outer shell, a valve is provided on the outer surface of the waste liquid pipe, two plug-in covers are provided on the top of the outer shell and the cleaning pool, and the bottom of the outer shell is fixedly mounted on the top of the cleaning rack.

[0014] Preferably, the high-pressure flushing assembly includes three high-pressure pumps and two liquid storage barrels, the output ends of the three high-pressure pumps are connected to liquid outlet pipes through flanges, one end of the three liquid outlet pipes is provided with solenoid valves, the output ends of the three solenoid valves are provided with connecting pipes, and one end of the three connecting pipes is fixedly connected to a T-tube.

[0015] Preferably, the high-pressure flushing assembly also includes two movable tubes, one end of the two movable tubes is fixedly connected to a diversion tube, the outer surfaces of the two movable tubes are fixedly connected to multiple nozzles, a fixed tube is fixedly connected at the center of the outer surface of the diversion tube, one end of the fixed tube is fixedly connected to a hose, and one end of the hose is fixedly connected to one end of the T-tube.

[0016] Preferably, the input ends of two of the high-pressure pumps are connected to liquid extraction pipes through flanges, and the input end of another high-pressure pump is connected to a water extraction pipe through a flange. The outer surfaces of the two movable pipes and the diversion pipe are movably embedded in the interior of the cleaning pool, and one end of the two liquid extraction pipes extends to the interior of the two liquid storage barrels respectively. The bottoms of the three high-pressure pumps are mounted on the edge of the top of the cleaning rack by bolts, and support blocks are fixedly mounted on both ends of the T-tube, and the bottoms of the two support blocks are fixedly mounted on the top of the cleaning rack.

[0017] Preferably, the transmission assembly includes a screw transmission mechanism and a U-shaped plate, a movable plate is provided on the outer surface of the screw transmission mechanism, a fixed rod is fixedly installed at the top of the outer surface of one side of the movable plate, a movable rod is fixedly installed at one end of the fixed rod, the bottom of the movable rod is fixedly installed on the top of the U-shaped plate, the bottom of the U-shaped plate is fixedly installed on the top of the outer surfaces of two movable tubes, the outer surface of the U-shaped plate is movably embedded in the interior of the cleaning pool, and the bottom of the screw transmission mechanism is fixedly installed on the top of the cleaning rack near the outer shell.

[0018] Preferably, the recovery component includes a recovery pump and a filter, the input end of the filter is fixedly connected to a drain pipe through a flange, one end of the drain pipe is fixedly passed through the interior of the outer shell and is fixedly connected to the bottom of the outer surface of the cleaning pool, an electric valve is provided on the outer surface of the drain pipe, the output end of the recovery pump is connected to the recovery pipe through a flange, one end of the recovery pipe extends to the interior of one of the liquid storage barrels, the input end of the recovery pump is connected to the output end of the filter through a flange, and the bottom of the recovery pump is mounted on the rear surface of the top of the cleaning rack by bolts.

[0019] Compared with the prior art, the present invention has the following beneficial effects:

[0020] 1. When using the present invention, tightening the tightening bolt causes the limited telescopic rod to rotate and retract, further rotating the rotating rod, rotating ring, and two curved tightening plates, generating relative tension on the two tightening blocks. The two tightening blocks drive the relative movement of the two tightening rods, which in turn drives the relative movement of the two adjustment frames. The photoresist is clamped and fixed using rubber nails, and then the rods on the outer surface of the clamping frame are inserted into the sockets. Due to the action of the rubber nails, the adjustment frame does not directly contact the photoresist, preventing damage to the photoresist from contact with the equipment. Two photoresist plates can be stacked inside a clamping frame, and eight photoresist plates can be immersed and cleaned simultaneously in the cleaning tank. The adjustment assembly provides an adjustable width and distance adjustment frame, which can flexibly clamp and fix photoresist plates of varying thicknesses, improving their firmness and stability. During the subsequent cleaning process, this prevents collision between the photoresist plate and the clamping frame, which could cause wear or deformation of the plate, thereby improving the cleaning effect.

[0021] 2. When using the present invention, an appropriate amount of acetone solution is injected into the cleaning tank and two plug-in covers are installed. An external ultrasonic generator is activated, and ultrasonic cleaning is performed by converting the ultrasonic wave into an ultrasonic wave through a transducer. When the ultrasonic cleaning is completed, the electric valve and recovery pump are opened, and the acetone solution is pumped into the filter through the discharge pipe for filtration. The acetone solution is then collected and recovered in the storage tank through the recovery pipe. Under the action of the ultrasonic cleaning component, the ultrasonic cleaning effect is achieved. Under the action of the recovery component, the cleaning liquid is recycled and reused, thereby improving the utilization rate and reducing resource waste.

[0022] 3. During use, the high-pressure pump and solenoid valve operate, sequentially spraying acetone solution onto the surface of the photoresist to rinse it, removing loose organic particles and stubborn inorganic particles. After a certain period of spraying, the nozzle begins spraying alcohol to clean the acetone solution from the surface of the photoresist, and finally rinses it with deionized water. Simultaneously, the screw drive mechanism is activated, and the nozzle moves up and down along the upper and lower drive mechanisms over the outer surface of the photoresist, spraying and rinsing. The high-pressure flushing assembly and drive assembly achieve multiple, multi-angle high-pressure flushing effects, further improving the photoresist cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 A first-angle stereoscopic view of a contact lithography cleaning device according to the present invention;

[0024] Figure 2 A second-angle stereoscopic view of a contact lithography cleaning device according to the present invention;

[0025] Figure 3 This is a perspective view of a partial structure of a high-pressure flushing component in a contact photolithography cleaning device of the present invention;

[0026] Figure 4This is a schematic cross-sectional view of the structure of an ultrasonic cleaning component in a contact photolithography cleaning device of the present invention;

[0027] Figure 5 This is a schematic cross-sectional view of the structure of a cleaning pool in a contact photolithography cleaning device of the present invention;

[0028] Figure 6 This is a schematic structural diagram of an adjustment component in a contact photolithography cleaning device according to the present invention;

[0029] Figure 7 This is a perspective view of the structure of a U-shaped plate in a contact photolithography cleaning device of the present invention;

[0030] Figure 8 This is a perspective view of the structure of an adjustment component in a contact photolithography cleaning device according to the present invention;

[0031] Figure 9 This is a perspective view of the structure of a clamping frame in a contact photolithography cleaning device of the present invention;

[0032] Figure 10 This is a perspective view of the structure of an adjustment frame in a contact photolithography cleaning device of the present invention;

[0033] Figure 11 This is a schematic cross-sectional view of the structure of an adjustment frame in a contact photolithography cleaning device of the present invention;

[0034] Figure 12 This is a schematic cross-sectional view of the structure of a mounting plate in a contact photolithography cleaning device of the present invention;

[0035] Figure 13 The present invention is a schematic cross-sectional view of a partial structure of a limiting telescopic rod in a contact lithography cleaning device.

[0036] In the picture:

[0037] 1. Cleaning rack; 2. PLC controller; 3. Ultrasonic cleaning assembly; 301. Housing; 302. Cleaning tank; 303. Transducer; 304. Waste liquid pipe; 305. Plug-in cover; 4. High-pressure flushing assembly; 401. High-pressure pump; 402. Liquid outlet pipe; 403. Solenoid valve; 404. Connecting pipe; 405. T-shaped pipe; 406. Hose; 407. Fixed pipe; 408. Support block; 409. Liquid extraction pipe; 410. Liquid storage barrel; 411. Water extraction pipe; 412. Diverter pipe; 413. Moving pipe; 414. Nozzle; 5. Transmission assembly; 501. Screw transmission mechanism; 502. Movable plate; 503, fixed rod; 504, movable rod; 505, U-shaped plate; 6, recovery assembly; 601, recovery pump; 602, filter; 603, drain pipe; 604, recovery pipe; 605, electric valve; 7, adjustment assembly; 701, clamping frame; 702, adjustment frame; 703, rubber nail; 704, tightening rod; 705, tightening block; 706, mounting plate; 707, tightening bolt; 708, telescopic rod with limit; 709, rotating rod; 710, rotating ring; 711, arc-shaped tightening plate; 712, adjustment hole; 713, plug rod; 714, fixed frame; 715, plug hole. DETAILED DESCRIPTION

[0038] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0039] Example 1: Please refer to Figures 1-13As shown, the present invention provides a technical solution: a contact photolithography cleaning device, comprising a cleaning rack 1, an ultrasonic cleaning component 3, a transmission component 5 and a recovery component 6, a PLC controller 2 is provided on the front surface of the top of the cleaning rack 1, a high-pressure flushing component 4 is provided on the top of the cleaning rack 1, and an adjustment component 7 is provided inside the ultrasonic cleaning component 3; the adjustment component 7 comprises four clamping racks 701 and eight adjustment frames 702, one side outer surface of each of the eight adjustment frames 702 is fixedly connected to eight rubber nails 703, and both side outer surfaces of the eight adjustment frames 702 are fixedly connected to tightening rods 704, the clamping rack 701 can be stacked up and down to place two photolithography plates, and the adjustment frame 702 can be fixedly connected to the outer surface of the eight adjustment frames 702. Adjust the distance width between the rubber nails 703 to contact the stacked photoresist plates in the clamping frame 701, and the tightening rod 704 is used to drive the adjustment frame 702 to move; the ultrasonic cleaning component 3 includes a shell 301 and a cleaning tank 302, and a transducer 303 is set at the bottom of the cleaning tank 302. The adjustment component 7 also includes eight tightening bolts 707, and one end of the eight tightening bolts 707 is fixedly connected to the limited telescopic rod 708. One end of the eight limited telescopic rods 708 is fixedly installed with a rotating rod 709, and the outer surface of the eight rotating rods 709 is fixedly installed with a rotating ring 710. The outer surface of the eight rotating rings 710 is fixedly installed with two arc-shaped tightening plates 711, multiple tightening The outer surfaces of the rods 704 are fixedly installed with tightening blocks 705, and the outer surfaces of the multiple arc-shaped tightening plates 711 are movably embedded in the interiors of the multiple tightening blocks 705. The eight adjustment frames 702 are evenly divided into four groups. The outer surfaces of the four groups of adjustment frames 702 are movably embedded in the interiors of the four clamping frames 701. One end of the eight rotating rods 709 is movably embedded in the outer surfaces of both sides of the four clamping frames 701. The outer surfaces of both sides of the four clamping frames 701 are fixedly installed with mounting plates 706. The outer surfaces of the eight tightening bolts 707 are movably embedded in the interiors of the eight mounting plates 706. The outer surfaces of both sides of the four clamping frames 701 are provided with two adjustment holes 712. The six adjustment holes 712 are grouped with two adjustment holes 712 distributed vertically, and the sixteen tightening rods 704 are grouped with two adjacent tightening rods 704. The outer surfaces of the eight groups of tightening rods 704 are movably embedded in the eight groups of adjustment holes 712. The adjustment component 7 also includes a fixing frame 714. The top of the fixing frame 714 is provided with eight sockets 715. The interiors of the eight sockets 715 are movably embedded with plug rods 713. The eight plug rods 713 are grouped with two plug rods 713 distributed horizontally. One end of the four groups of plug rods 713 is respectively fixedly installed on the outer surface of one side of the four clamping frames 701, and the bottom of the fixing frame 714 is fixedly installed on the bottom surface inside the cleaning tank 302.

[0040] In this embodiment, when in use, two adjustment frames 702 are provided inside each clamping frame 701, and the rubber nails 703 are installed on opposite sides of the two adjustment frames 702, and the rubber nails 703 are located at the side of the adjustment frames 702, such as Figure 10 and Figure 11 As shown, eight rubber nails 703 are installed on each adjustment frame 702, which are respectively located at the four corners and the middle position, and the structure of the adjustment frame 702 is as follows Figure 10 As shown, the three thinner crossbars in the middle are located at the upper, middle and lower positions respectively. Place the photoresist plate in the clamping frame 701 and place it between the two adjustment frames 702, with the side of the photoresist plate facing outward and the side without photoresist facing the insertion rod 713. After placing one photoresist plate, place the second photoresist plate in the clamping frame 701 and place it on top of the first placed photoresist plate, so that the two photoresist plates are stacked up and down. Then tighten the tightening bolts 707 on both sides of the clamping frame 701 so that it moves toward the clamping frame 701 while rotating spirally inside the corresponding mounting plate 706. The structure of the limiting telescopic rod 708 is shown as follows. Figure 13 As shown, the tightening bolt 707 rotates and moves, driving the limiting telescopic rod 708 to rotate, and causing the limiting telescopic rod 708 to be squeezed and contracted, further driving the rotating rod 709 and the rotating ring 710 to rotate, thereby driving the two arc-shaped tightening plates 711 to rotate. The structure of the two arc-shaped tightening plates 711 is shown in FIG. Figure 12As shown, as the arc-shaped tightening plate 711 rotates, it generates relative tension on the two tightening blocks 705, thereby driving the two tightening blocks 705 to move relative to each other and the two tightening rods 704 to move relative to each other in the adjustment holes 712. The movement of the tightening rods 704 drives the two opposing adjustment frames 702 to move relative to each other, causing the rubber pins 703 to contact both sides of the photoresist plates. At this time, the rubber pins 703 at the four corners contact the two top corners of the upper photoresist plate and the two bottom corners of the lower photoresist plate, respectively. The four rubber pins 703 in the middle contact the two bottom corners of the upper photoresist plate and the two top corners of the lower photoresist plate, respectively. The upper and lower crossbars are located at the top of the upper photoresist plate and the bottom of the lower photoresist plate, respectively. The middle crossbar is located at the contact surface between the upper and lower photoresist plates. Under the action of the rubber pins 703, the adjustment frames 702 do not directly contact the photoresist plates, thus avoiding damage to the photoresist plates caused by instrument contact and not affecting the subsequent ultrasonic cleaning and rinsing of the photoresist plates. Once the photoresist plate in the clamping frame 701 is securely clamped, stop tightening bolt 707, then place the clamping frame 701 into the cleaning tank 302 with the side coated with photoresist facing the nozzle 414. Insert rod 713 into socket 715 to secure the clamping frame 701 and the photoresist plate to the outer surface of the fixing frame 714. Repeat this process to install three more clamping frames 701 into the cleaning tank 302. Two photoresist plates can be stacked and placed in one clamping frame 701, and a total of eight photoresist plates can be placed in four clamping frames 701. Eight photoresist plates can be immersed and cleaned simultaneously in the cleaning tank 302. Under the action of the adjustment component 7, an adjustment frame 702 that can adjust the width distance is set, which can flexibly clamp and fix photoresist plates of different thicknesses to improve their firmness and stability. In the subsequent cleaning process, it prevents the photoresist plate from colliding with the clamping frame 701, causing the photoresist plate to be worn or deformed, which is beneficial to improving the cleaning effect. It solves the problem that during ultrasonic cleaning, when the thickness of the photoresist plate is less than the internal width of the cleaning frame, the photoresist plate is easily collided with the cleaning frame, causing the photoresist plate to be worn or even slightly deformed, affecting the accuracy of pattern transfer in the subsequent photolithography process and reducing the photolithography effect of the photolithography machine.

[0041] Example 2: Figure 2-Figure 6As shown, the ultrasonic cleaning component 3 includes a housing 301 and a cleaning tank 302, a transducer 303 is provided at the bottom of the cleaning tank 302, the outer surface of the cleaning tank 302 is fixedly installed inside the housing 301, a waste liquid pipe 304 is fixedly connected to the bottom surface of the outer surface of the cleaning tank 302, one end of the waste liquid pipe 304 is fixedly passed through the outer surface of the housing 301, a valve is provided on the outer surface of the waste liquid pipe 304, two plug-in covers 305 are provided on the top of the housing 301 and the cleaning tank 302, the bottom of the housing 301 is fixedly installed on the top of the cleaning rack 1, and the recovery component 6 includes a recovery pump 601 and a filter 60 2. The input end of the filter 602 is fixedly connected to a drain pipe 603 through a flange. One end of the drain pipe 603 is fixedly passed through the interior of the shell 301 and is fixedly connected to the bottom of the outer surface of the cleaning tank 302. An electric valve 605 is provided on the outer surface of the drain pipe 603. The output end of the recovery pump 601 is connected to a recovery pipe 604 through a flange. One end of the recovery pipe 604 extends to the interior of one of the liquid storage barrels 410. The input end of the recovery pump 601 is connected to the output end of the filter 602 through a flange. The bottom of the recovery pump 601 is mounted on the rear surface of the top of the cleaning rack 1 by bolts.

[0042] In this embodiment, when in use, the high-pressure pump 401, the solenoid valve 403, the screw drive mechanism 501, the electric valve 605 and the PLC controller 2 are electrically connected, and the transducer 303 is electrically connected to the external ultrasonic generator. After the photoresist is placed in the cleaning tank 302 through the adjustment component 7, an appropriate amount of acetone solution is injected into the cleaning tank 302 for soaking, and then the two plug-in covers 305 are covered. The structure of the plug-in cover 305 is as follows: Figure 4 and Figure 5 As shown, a plug-in plate is installed on the side of the plug-in cover 305, and a matching slot is opened, and a circular hole is opened on the contact surface of the plug-in cover 305, which matches the moving rod 504 and the fixed tube 407 respectively. The two plug-in covers 305 are plugged together so that the plug-in plate is inserted into the slot, and the moving rod 504 and the fixed tube 407 are respectively located in the circular holes, and the plug-in cover 305 can be covered on the top of the cleaning tank 302 and the shell 301, as shown in FIG. Figure 2As shown, the solvent is effectively prevented from volatilizing, and the cleaning process is also safer. Start the external ultrasonic generator, which is converted into ultrasonic waves through the transducer 303, and perform ultrasonic cleaning on the photoresist in the cleaning tank 302, so that the organic impurities and inorganic particles on the surface are loosened and fall off. The cleaning time can be set through the control panel on the PLC controller 2. When the ultrasonic cleaning is completed, the electric valve 605 and the recovery pump 601 are opened, and the acetone solution in the cleaning tank 302 is pumped to the filter 602 through the drain pipe 603 for filtration to improve the purity of the acetone solution. The acetone solution then enters the corresponding liquid storage barrel 410 through the recovery pipe 604 for recovery. The two liquid storage barrels 410 respectively store acetone solution and alcohol solution. The recovery pipe 604 corresponds to the acetone solution liquid storage barrel 410. Both liquid storage barrels 410 are provided with a liquid injection pipe and a drain pipe. The drain pipe is provided with a manual valve, such as Figure 3 Under the action of the ultrasonic cleaning component 3, the ultrasonic cleaning effect is achieved, and under the action of the recovery component 6, the cleaning liquid is recycled and reused, thereby improving the utilization rate and reducing resource waste.

[0043] Example 3: Figure 2-Figure 7As shown, the high-pressure flushing assembly 4 includes three high-pressure pumps 401 and two liquid storage barrels 410. The output ends of the three high-pressure pumps 401 are connected to the liquid outlet pipe 402 through a flange. One end of the three liquid outlet pipes 402 is provided with a solenoid valve 403. The output end of the three solenoid valves 403 is provided with a connecting pipe 404. One end of the three connecting pipes 404 is fixedly connected to a T-shaped pipe 405. The high-pressure flushing assembly 4 also includes two movable pipes 413. One end of the two movable pipes 413 is fixedly connected to a diversion pipe 412. The outer surfaces of the two mobile pipes 413 are fixedly connected to a plurality of nozzles 414. The center of the outer surface of the diversion pipe 412 is fixedly connected to a fixed pipe 407. One end of the fixed pipe 407 is fixedly connected to a hose 406. One end of the hose 406 is fixedly connected to one end of the T-shaped pipe 405. The input ends of the two high-pressure pumps 401 are connected to the liquid extraction pipe 409 through a flange. The input end of the other high-pressure pump 401 is connected to the water extraction pipe 411 through a flange. The two mobile pipes 413 and the diversion pipe 412 are fixedly connected to the center of the outer surface of the diversion pipe 412. The outer surfaces of 12 are movably embedded in the interior of the cleaning pool 302, one end of the two liquid extraction pipes 409 extends to the interior of the two liquid storage barrels 410 respectively, the bottoms of the three high-pressure pumps 401 are mounted on the edge of the top of the cleaning rack 1 by bolts, and both ends of the T-tube 405 are fixedly mounted with support blocks 408, and the bottoms of the two support blocks 408 are fixedly mounted on the top of the cleaning rack 1. The transmission assembly 5 includes a screw transmission mechanism 501 and a U-shaped plate 505. A movable plate 502 is provided on the outer surface of the screw transmission mechanism 501, and a fixed rod 503 is fixedly mounted on the top of the outer surface of one side of the movable plate 502. A moving rod 504 is fixedly mounted on one end of the fixed rod 503, and the bottom of the moving rod 504 is fixedly mounted on the top of the U-shaped plate 505. The bottom of the U-shaped plate 505 is fixedly mounted on the top of the outer surfaces of the two moving tubes 413. The outer surface of the U-shaped plate 505 is movably embedded in the interior of the cleaning pool 302, and the bottom of the screw transmission mechanism 501 is fixedly mounted on the top of the cleaning rack 1 near the outer shell 301.

[0044] In this embodiment, after ultrasonic cleaning of the photoresist is complete, the rearmost high-pressure pump 401 and solenoid valve 403 are activated, and the screw drive mechanism 501 is also started. The spray head 414 is directed toward the side of the photoresist-stained photoresist. After the high-pressure pump 401 is activated, the acetone solution in the acetone solution storage tank 410 is pumped by the liquid extraction pipe 409 into the liquid outlet pipe 402. The acetone solution then flows through the solenoid valve 403 into the connecting pipe 404, then sequentially into the T-tube 405, the flexible tube 406, and the fixed pipe 407. The solution then flows through the diverter pipe 412 into the two movable pipes 413 before being ejected through the spray head 414. At the same time, the screw transmission mechanism 501 drives the movable plate 502 and the fixed rod 503 to move up and down, driving the movable rod 504 and the U-shaped plate 505 to move up and down, and further driving the movable tube 413 and the diversion tube 412 to move up and down, so that the nozzle 414 moves up and down on the outer surface of the photoresist to spray acetone solution, rinse the photoresist, and spray off the loose organic particles on the surface and the more stubborn inorganic particles. When the high-pressure flushing time is set by the PLC controller 2, the rear solenoid valve 403 and the high-pressure pump 401 are automatically closed, and the front solenoid valve 403 and the high-pressure pump 401 are started. At this time, the corresponding liquid extraction pipe 409 extracts the alcohol into the liquid outlet pipe 402 and the connecting pipe 404, and then transports it to the nozzle 414 in sequence through the T-tube 405, the hose 406, the fixed pipe 407, the diversion pipe 412 and the movable pipe 413. At this time, the transmission component 5 drives the nozzle 414 to move up and down to spray alcohol on the photoresist to clean the acetone solution on the surface of the photoresist. The valve at the waste pipe 304 is opened in advance, and the alcohol after flushing is discharged through the waste pipe 304. One end of the pumping pipe 411 is connected to the deionized water storage tank. When the alcohol rinse time set on the PLC controller 2 ends, the front solenoid valve 403 and high-pressure pump 401 are closed, and the middle solenoid valve 403 and high-pressure pump 401 are opened. Deionized water is pumped through the pumping pipe 411 and transported to the mobile pipe 413 through the connecting pipe 404 and other pipes. The deionized water is sprayed through the nozzle 414 to remove residual acetone reagent. Thanks to the action of the high-pressure rinse assembly 4 and the transmission assembly 5, the effect of multiple, multi-angle high-pressure rinses is achieved, further improving the cleaning effect of the photoresist.

[0045] The entire mechanism works as follows: a photoresist plate is placed in a clamping frame 701, positioned between two adjustment frames 702, with the photoresist side facing outward. A second photoresist plate is then placed on top of the first. Tightening bolts 707 on either side of the clamping frame 701 are screwed, causing them to rotate and move toward the clamping frame 701. This rotates and contracts the telescopic limit rods 708, further driving the rotating rod 709 and rotating ring 710, which in turn rotates the two curved tightening plates 711. This generates tension on the two tightening blocks 705, which in turn drive the two tightening rods 704 to move relative to each other. This in turn drives the two adjustment frames 702 to move relative to each other, clamping the photoresist plate via the rubber nails 703. The clamping frame 701 is then placed inside the cleaning tank 302, and the insertion rod 713 is inserted into the insertion hole 715. Repeat this process until the other three clamping frames 701 are installed inside the cleaning tank 302. An appropriate amount of acetone solution is poured into the cleaning tank 302 for soaking, and then two plug-in covers 305 are installed. The external ultrasonic generator is activated, and the ultrasonic wave is converted into ultrasonic waves by the transducer 303 for ultrasonic cleaning. The cleaning time can be set through the control panel on the PLC controller 2. When the ultrasonic cleaning is completed, the electric valve 605 and the recovery pump 601 are opened, and the discharge pipe 603 pumps the acetone solution into the filter 602 for filtration. Then, it enters the corresponding liquid storage barrel 410 through the recovery pipe 604 for recovery. After the ultrasonic cleaning is completed, the high-pressure pump 401 and solenoid valve 403 at the rear are started, and the screw transmission mechanism 501 is started. After the high-pressure pump 401 is started, the liquid extraction pipe 409 pumps the acetone solution into the liquid outlet pipe 402, enters the connecting pipe 404 through the solenoid valve 403, and then enters the T-shaped pipe 405, the hose 406 and the fixed pipe 407 in sequence. It enters the two movable pipes 413 through the diverter pipe 412 and finally is sprayed out through the nozzle 414. At the same time, the screw drive mechanism 501 drives the movable plate 502 and fixed rod 503 to move up and down, driving the movable rod 504 and U-shaped plate 505 to move up and down, further driving the movable tube 413 and diverter tube 412 to move up and down, causing the spray head 414 to move up and down on the outer surface of the photoresist plate, spraying the acetone solution to rinse the photoresist plate. After the high-pressure rinse time set by the PLC controller 2 ends, the rear solenoid valve 403 and high-pressure pump 401 automatically close, and the front solenoid valve 403 and high-pressure pump 401 start. At this time, the corresponding liquid extraction pipe 409 pumps alcohol and delivers it to the spray head 414 to spray the alcohol to clean the photoresist plate. The valve at the waste liquid pipe 304 is opened in advance, and the alcohol after rinsing is discharged through the waste liquid pipe 304. After the alcohol rinse time set on the PLC controller 2 ends, the front solenoid valve 403 and high-pressure pump 401 are closed, and the middle solenoid valve 403 and high-pressure pump 401 are opened, and deionized water is pumped through the water extraction pipe 411 for cleaning.

[0046] Among them, the transducer 303, high-pressure pump 401, solenoid valve 403, screw transmission mechanism 501, filter 602, electric valve 605 and PLC controller 2 are all existing technologies, and their components and operating principles are public technologies, so no further explanation is given here.

[0047] Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments, or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A contact lithography cleaning device, comprising a cleaning rack, an ultrasonic cleaning assembly, a transmission assembly, and a recovery assembly, characterized in that: A PLC controller is provided on the front surface of the top of the cleaning rack, a high-pressure flushing component is provided on the top of the cleaning rack, and an adjusting component is provided inside the ultrasonic cleaning component; The adjustment assembly includes four clamping frames and eight adjustment frames, each of the eight adjustment frames having eight rubber nails fixedly connected to one side outer surface, and each of the eight adjustment frames having a tightening rod fixedly connected to the other side outer surfaces. The clamping frames are used to stack two photoresist plates on top of each other, and the adjustment frames adjust the distance between the rubber nails to contact the stacked photoresist plates in the clamping frames. The tightening rods are used to drive the adjustment frames to move. The ultrasonic cleaning assembly includes a housing and a cleaning tank, and a transducer is provided at the bottom of the cleaning tank; The outer surface of the cleaning pool is fixedly mounted inside the shell, a waste liquid pipe is fixedly connected to the bottom surface of the outer surface of the cleaning pool, one end of the waste liquid pipe is fixedly passed through the outer surface of the shell, a valve is provided on the outer surface of the waste liquid pipe, two plug-in covers are provided on the top of the shell and the cleaning pool, and the bottom of the shell is fixedly mounted on the top of the cleaning rack; The high-pressure flushing assembly includes three high-pressure pumps and two liquid storage barrels. The output ends of the three high-pressure pumps are connected to liquid outlet pipes through flanges. One end of the three liquid outlet pipes is provided with a solenoid valve. The output ends of the three solenoid valves are provided with connecting pipes. One end of the three connecting pipes is fixedly connected to a T-shaped pipe. The high-pressure flushing assembly further includes two movable tubes, one end of each movable tube being fixedly connected to a diverter tube, and the outer surfaces of each movable tube being fixedly connected to a plurality of nozzles, a fixed tube being fixedly connected at the center of the outer surface of each diverter tube, one end of each fixed tube being fixedly connected to a hose, and one end of each hose being fixedly connected to one end of a T-shaped tube; The input ends of two of the high-pressure pumps are connected to liquid extraction pipes through flanges, and the input end of another high-pressure pump is connected to a water extraction pipe through a flange. The outer surfaces of the two movable pipes and the diversion pipe are movably embedded in the interior of the cleaning pool, and one end of the two liquid extraction pipes extends to the interior of the two liquid storage barrels respectively. The bottoms of the three high-pressure pumps are all mounted on the edge of the top of the cleaning rack by bolts, and support blocks are fixedly mounted on both ends of the T-shaped pipe, and the bottoms of the two support blocks are fixedly mounted on the top of the cleaning rack; The transmission assembly includes a screw transmission mechanism and a U-shaped plate. A movable plate is provided on the outer surface of the screw transmission mechanism. A fixed rod is fixedly installed at the top of the outer surface of one side of the movable plate. A movable rod is fixedly installed at one end of the fixed rod. The bottom of the movable rod is fixedly installed on the top of the U-shaped plate. The bottom of the U-shaped plate is fixedly installed on the top of the outer surfaces of two movable tubes. The outer surface of the U-shaped plate is movably embedded in the interior of the cleaning tank. The bottom of the screw transmission mechanism is fixedly installed on the top of the cleaning rack near the outer shell.

2. The contact lithography cleaning device according to claim 1, characterized in that: The adjustment assembly also includes eight tightening bolts, one end of the eight tightening bolts is fixedly connected to the limited telescopic rod, one end of the eight limited telescopic rods is fixedly installed with a rotating rod, the outer surface of the eight rotating rods is fixedly installed with a rotating ring, the outer surface of the eight rotating rings is fixedly installed with two arc-shaped tightening plates, the outer surfaces of the multiple tightening rods are fixedly installed with tightening blocks, and the outer surfaces of the multiple arc-shaped tightening plates are respectively movably embedded in the interior of the multiple tightening blocks.

3. The contact lithography cleaning device according to claim 2, characterized in that: The eight adjustment frames are evenly divided into four groups, the outer surfaces of the four groups of adjustment frames are movably embedded in the inside of the four clamping frames, one ends of the eight rotating rods are movably embedded in the outer surfaces on both sides of the four clamping frames, the outer surfaces on both sides of the four clamping frames are fixedly installed with mounting plates, the outer surfaces of the eight tightening bolts are movably embedded in the inside of the eight mounting plates, the outer surfaces on both sides of the four clamping frames are provided with two adjustment holes, each vertically distributed two adjustment holes of the sixteen adjustment holes form a group, each adjacent two tightening rods of the sixteen tightening rods form a group, and the outer surfaces of the eight groups of tightening rods are movably embedded in the inside of the eight groups of adjustment holes.

4. The contact lithography cleaning device according to claim 3, characterized in that: The adjustment assembly also includes a fixing frame, the top of which is provided with eight insertion holes, and the interiors of the eight insertion holes are movably embedded with insertion rods, and the eight insertion rods are grouped in two in each horizontal distribution, and one end of the four groups of insertion rods is respectively fixedly mounted on the outer surface of one side of the four clamping frames, and the bottom of the fixing frame is fixedly mounted on the bottom surface inside the cleaning tank.

5. The contact lithography cleaning device according to claim 1, characterized in that: The recovery component includes a recovery pump and a filter. The input end of the filter is fixedly connected to a drain pipe through a flange. One end of the drain pipe is fixedly passed through the interior of the shell and is fixedly connected to the bottom of the outer surface of the cleaning pool. An electric valve is provided on the outer surface of the drain pipe. The output end of the recovery pump is connected to the recovery pipe through a flange. One end of the recovery pipe extends to the interior of one of the liquid storage barrels. The input end of the recovery pump is connected to the output end of the filter through a flange. The bottom of the recovery pump is mounted on the rear surface of the top of the cleaning rack by bolts.

Images