A purification device for high-purity silicon tetrachloride processing

Abstract

The application relates to the technical field of silicon tetrachloride processing, and discloses a purification device for high-purity silicon tetrachloride processing, which comprises a base, a heating frame is inserted into the top of the base, the inner wall of the heating frame is fixedly connected with a processing frame, the surface of the processing frame is fixedly connected with a heating device, the bottom of the base is fixedly connected with a support, the inner wall top of the support is fixedly connected with a hydraulic rod, the bottom of the hydraulic rod is fixedly connected with the top of the heating frame, and the inner wall of the support is fixedly connected with an air pump. After the silicon tetrachloride raw material is placed in the inside of the processing frame, the heating device is started to work, the heat generated by the heating device is transmitted to the inside of the processing frame through the processing frame to heat and treat the silicon tetrachloride raw material, the water vapor generated after the silicon tetrachloride raw material is heated floats upwards, the air pump is started to work, the suction force generated by the air pump enters the inside of the processing frame through the circular pipe and sucks the water vapor into the inside of the elbow pipe, and the water vapor flows in the inside of the elbow pipe.

Description

TECHNICAL FIELD

[0001] The application relates to a silicon tetrachloride processing technology field, in particular to a purification device for high-purity silicon tetrachloride processing. BACKGROUND

[0002] Silicon tetrachloride is an inorganic compound, which is colorless or light yellow smoky liquid at room temperature, has a stimulating odor and significant hygroscopicity, and is related to silicon ore mining, silicon powder purification and chlor-alkali industry in the production of silicon tetrachloride. With the development of global semiconductor technology and optical fiber communication technology, the silicon tetrachloride industry has entered a golden period of rapid growth. Silicon tetrachloride has unique properties and wide application fields.

[0003] Silicon tetrachloride needs to be purified when used in other fields. At present, the distillation method is usually used for purifying silicon tetrachloride. The silicon tetrachloride needs to be heated and vaporized during the purification by the distillation method. The vaporized silicon tetrachloride floats to the inside of the condensing device to complete the condensing operation. However, a large amount of water vapor is attached to the inside of the heating device, so that part of the water vapor cannot enter the inside of the condensing device to complete the condensing operation, thereby affecting the purification of the silicon tetrachloride. SUMMARY

[0004] The purpose of the present application is to provide a purification device for high-purity silicon tetrachloride processing to solve the problems in the background art.

[0005] To solve the above technical problems, the present application is realized by the following technical scheme:

[0006] The present application is a purification device for high-purity silicon tetrachloride processing, which comprises a base, a heating frame is inserted into the top of the base, a treatment frame is fixedly connected to the inner wall of the heating frame, a heating device is fixedly connected to the surface of the treatment frame, a support is fixedly connected to the bottom of the base, a hydraulic rod is fixedly connected to the inner wall top of the support, the bottom of the hydraulic rod is fixedly connected to the top of the heating frame, an air pump is fixedly connected to the inner wall of the support, and a condensing component is arranged on the surface of the heating frame.

[0007] The condensing component comprises a circular pipe, the end of the circular pipe is fixedly connected to the surface of the heating frame, a positioning ring is fixedly connected to the surface of the circular pipe, a bend pipe is communicated with the bottom of the positioning ring, a storage frame is communicated with the lower surface of the bend pipe, a sealing door is hinged to the bottom of the storage frame, a sieve plate is fixedly connected to the inner wall of the bend pipe, a condensing pipe is fixedly connected to the upper surface of the bend pipe, a condensing device is fixedly connected to the surface of the condensing pipe, a processing frame is fixedly connected to the top of the base, a sealing component is arranged in the circular pipe, a discharging component is arranged in the inner wall of the bend pipe, and a stirring component is arranged in the treatment frame.

[0008] Further, the end of the circular tube penetrates through the heating frame and communicates with the inside of the processing frame, the elbow pipe is located below the circular tube, the end of the elbow pipe away from the positioning ring communicates with the air inlet end of the air pump, the sieve plate is located at the end of the elbow pipe close to the air pump, and the condensing pipe is located below the circular tube.

[0009] Further, the sealing component comprises a fixing ring, the surface of the fixing ring is fixedly connected with the inner wall of the circular tube, the surface of the fixing ring is provided with an air inlet hole, the end of the fixing ring away from the air inlet hole is provided with a positioning groove, the inner wall of the air inlet hole is inserted with a sealing block, the surface of the sealing block is fixedly connected with a positioning plate, the surface of the positioning plate is fixedly connected with an extension rod, the end of the positioning plate close to the extension rod is fixedly connected with a spring, the inner wall of the circular tube is fixedly connected with a round hole frame, the top of the positioning ring is fixedly connected with an electric telescopic frame, the telescopic end of the electric telescopic frame is fixedly connected with a connecting rod, and the end of the connecting rod away from the electric telescopic frame is fixedly connected with the end of the extension rod.

[0010] Further, the surface of the positioning plate is in contact with the inner wall of the positioning groove, the end of the spring away from the positioning plate is fixedly connected with the surface of the round hole frame, the surface of the extension rod is in sliding connection with the inner wall of the round hole frame, and the end of the extension rod away from the positioning plate penetrates through the circular tube and extends to the outer end of the circular tube.

[0011] Further, the blanking component comprises a conical frame, the end of the conical frame is fixedly connected with the inner wall of the elbow pipe, the top of the conical frame is fixedly connected with a resilient spring, the top of the resilient spring is fixedly connected with a conical ring, the top of the conical ring is fixedly connected with an extrusion rod, the top of the extrusion rod is fixedly connected with a triangular plate, the bottom of the extension rod is fixedly connected with a pressure plate, and the surface of the conical ring is fixedly connected with a synchronous rod.

[0012] Further, the upper surface of the triangular plate extends to the inside of the circular tube, the surface of the conical ring is in contact with the inner wall of the elbow pipe, the number of the conical rings is plurality, and the plurality of conical rings are fixedly connected through the synchronous rod.

[0013] Further, the inner wall of the conical ring is conical, the top of the conical frame is conical, the bottom of the pressure plate is in contact with the bottom of the inner wall of the circular tube, and the conical ring is located in the inside of the condensing pipe.

[0014] Further, the stirring component comprises a rotating disc, the surface of the rotating disc is fixedly connected with a mixing plate, the top of the rotating disc is fixedly connected with an elastic rod, the top of the elastic rod is fixedly connected with a limiting disc, the top of the limiting disc is fixedly connected with a rotating rod, the top of the rotating rod is rotatably connected with the inner wall top of the heating frame, the surface of the rotating rod is fixedly connected with an engagement frame, the surface of the engagement frame is engaged with an engagement plate, the surface of the engagement plate is fixedly connected with a push rod, and the end, away from the engagement plate, of the push rod is fixedly connected with the lower surface of the pressure plate.

[0015] Further, the bottom of the rotating disc and the bottom of the mixing plate are in contact with the inner wall bottom of the processing frame, and the end, away from the engagement plate, of the push rod penetrates through the fixed ring and extends to the inside of the circular pipe.

[0016] The present application has the following advantages:

[0017] After the silicon tetrachloride raw material is placed in the inside of the processing frame, the heating device is started to work, the heat generated by the heating device is transmitted to the inside of the processing frame through the processing frame to heat and treat the silicon tetrachloride raw material, the water vapor generated after the silicon tetrachloride raw material is heated floats upwards, the air pump is started to work, the suction force generated by the air pump enters the inside of the processing frame through the circular pipe and sucks the water vapor into the inside of the elbow pipe, when the water vapor flows in the inside of the elbow pipe, the condensing device is started to work, the cold air generated by the condensing device is transmitted to the surface of the elbow pipe through the condensing pipe, the water vapor in the inside of the elbow pipe is condensed by the condensing pipe, and after condensation, the water vapor slides into the inside of the storage frame to complete the purification treatment of the silicon tetrachloride raw material, the suction force generated by the air pump can guide the water vapor into the inside of the processing frame, so that a large amount of water vapor is prevented from adhering to the inside of the processing frame to cause waste of the silicon tetrachloride raw material.

[0018] When the air pump starts to work, the electric telescopic frame is started to push the connecting rod to move, the connecting rod pulls the telescopic rod to extend when moving, after the telescopic rod starts to extend, the positioning plate pushes the sealing block away from the inner wall of the air inlet hole by the elasticity of the spring, so that the suction force generated by the air pump can enter the inside of the processing frame to collect the water vapor, when the electric telescopic frame is retracted, after the electric telescopic frame pushes the telescopic rod to retract to the limit through the connecting rod, the telescopic rod pushes the positioning plate to insert the sealing block into the inside of the air inlet hole to seal the circular pipe, so that when the processing frame starts to heat the silicon tetrachloride raw material, hot air can be gathered in the inside of the processing frame to improve the heating efficiency.

[0019] In this invention, after the sealing block separates from the air inlet, the electric telescopic frame can push the telescopic rod to move synchronously during extension and retraction. When the telescopic rod moves, it pushes the triangular plate downward through the pressure plate. When the triangular plate moves downward, it pushes the conical ring to move inside the bend through the extrusion rod. When the conical ring moves, it can treat the water vapor on the inner wall of the bend, so that the condensed water vapor can quickly slide down into the storage rack for collection. When the pressure plate separates from the triangular plate, the conical ring will move upward using the elasticity of the spring. The conical ring can then move up and down inside the bend to scrape off the water vapor, thereby improving the purification efficiency of silicon tetrachloride raw materials.

[0020] In this invention, the pressure plate moves by pushing the meshing plate, which in turn drives the meshing frame to rotate. The meshing frame rotates by rotating the limiting plate, which in turn drives the limiting plate to rotate by rotating the limiting plate. The limiting plate rotates by connecting the limiting plate to the rotating plate via a spring rod, which in turn drives the mixing plate to rotate. The mixing plate stirs the silicon tetrachloride raw material while rotating, which makes the silicon tetrachloride raw material heat evenly and improves the purification efficiency of the silicon tetrachloride raw material.

[0021] Of course, any product implementing this invention does not necessarily need to achieve all of the advantages described above at the same time. Attached Figure Description

[0022] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0024] Figure 2 This is a schematic diagram of the support structure of the present invention;

[0025] Figure 3 This is a schematic cross-sectional view of the heating frame of the present invention;

[0026] Figure 4 This is a schematic diagram of the overall structure of the condenser component of the present invention;

[0027] Figure 5 This is a schematic diagram of the overall structure of the sealing component of the present invention;

[0028] Figure 6 For the present invention Figure 5 Enlarged diagram of part A in the diagram;

[0029] Figure 7 This is a schematic diagram of the overall structure of the feeding component of the present invention;

[0030] Figure 8 It is a whole structure schematic diagram of the stirring part of the application;

[0031] Figure 9 It is an enlarged schematic diagram of B part in the application Figure 8 .

[0032] In the drawings, the components represented by each reference numeral are listed as follows:

[0033] In the drawings: 1, heating frame; 2, hydraulic rod; 3, support; 4, air pump; 5, processing frame; 6, heating device; 7, condensing part; 8, sealing part; 9, blanking part; 10, stirring part; 11, base; 20, processing frame; 21, round pipe; 22, positioning ring; 23, condensing pipe; 24, elbow pipe; 25, condensing device; 26, sealing door; 27, storage frame; 28, sieve plate; 30, electric telescopic frame; 31, connecting rod; 32, telescopic rod; 33, round hole frame; 34, spring; 35, fixed ring; 36, air inlet hole; 37, positioning groove; 38, positioning plate; 39, sealing block; 40, triangular plate; 41, extrusion rod; 42, conical ring; 43, synchronous rod; 44, elastic spring; 45, conical frame; 46, pressure plate; 50, rotating disc; 51, mixing plate; 52, elastic rod; 53, push rod; 54, limiting disc; 55, rotating rod; 56, meshing plate; 57, meshing frame. DETAILED DESCRIPTION

[0034] The technical solutions in the embodiments of the application will be clearly and completely described below with reference to the drawings in the embodiments of the application. Obviously, the described embodiments are only part of the embodiments of the application, rather than all the embodiments of the application. Based on the embodiments in the application, all other embodiments obtained by a person of ordinary skill in the art without creative work fall within the protection scope of the application.

[0035] Please refer to Figures 1-9 the drawings, the application is a kind of for high purity silicon tetrachloride processing purification device, including base 11, the top of base 11 is inserted with heating frame 1, the inner wall of heating frame 1 is fixedly connected with processing frame 5, the surface of processing frame 5 is fixedly connected with heating device 6, the bottom of base 11 is fixedly connected with support 3, the inner wall top of support 3 is fixedly connected with hydraulic rod 2, the bottom of hydraulic rod 2 is fixedly connected with the top of heating frame 1, the inner wall of support 3 is fixedly connected with air pump 4, the surface of heating frame 1 is provided with condensing part 7;

[0036] The condensing part 7 comprises a round pipe 21, the end of the round pipe 21 is fixedly connected with the surface of the heating frame 1, the surface of the round pipe 21 is fixedly connected with a positioning ring 22, the bottom of the positioning ring 22 is communicated with a bend pipe 24, the lower surface of the bend pipe 24 is communicated with a storage frame 27, the bottom of the storage frame 27 is hingedly connected with a sealing door 26, the inner wall of the bend pipe 24 is fixedly connected with a sieve plate 28, the upper surface of the bend pipe 24 is fixedly connected with a condensing pipe 23, the surface of the condensing pipe 23 is fixedly connected with a condensing device 25, the top of the base 11 is fixedly connected with a processing frame 20, the inside of the round pipe 21 is provided with a sealing part 8, the inner wall of the bend pipe 24 is provided with a discharging part 9, and the inside of the processing frame 5 is provided with a stirring part 10.

[0037] The end of the round pipe 21 penetrates through the heating frame 1 and is communicated with the inside of the processing frame 5, after the silicon tetrachloride raw material is placed in the inside of the processing frame 20, the heating device 6 is started to work, the heat generated by the heating device 6 is transmitted to the inside of the processing frame 20 through the processing frame 5 to heat and treat the silicon tetrachloride raw material, the water vapor generated after the silicon tetrachloride raw material is heated floats upwards, the air pump 4 is started to work, the suction force generated by the air pump 4 enters the inside of the processing frame 5 through the round pipe 21 and sucks the water vapor into the inside of the bend pipe 24, when the water vapor flows in the inside of the bend pipe 24, the condensing device 25 is started to work, the cold air generated by the condensing device 25 is transmitted to the surface of the bend pipe 24 through the condensing pipe 23, the bend pipe 23 can condense the water vapor when the water vapor flows in the inside of the bend pipe 24, the condensed water vapor slides into the inside of the storage frame 27 to complete the purification treatment of the silicon tetrachloride raw material, the suction force generated by the air pump 4 can guide the water vapor into the inside of the processing frame 5, so that a large amount of water vapor is prevented from adhering to the inside of the processing frame 5 to cause the waste of the silicon tetrachloride raw material, the bend pipe 24 is located below the round pipe 21, the end of the bend pipe 24 away from the positioning ring 22 is communicated with the air inlet end of the air pump 4, the sieve plate 28 is located at the end of the bend pipe 24 close to the air pump 4, and the condensing pipe 23 is located below the round pipe 21.

[0038] The sealing part 8 comprises a fixed ring 35, the surface of the fixed ring 35 is fixedly connected with the inner wall of the round pipe 21, the surface of the fixed ring 35 is provided with an air inlet hole 36, the end of the fixed ring 35 away from the air inlet hole 36 is provided with a positioning groove 37, the inner wall of the air inlet hole 36 is inserted with a sealing block 39, the surface of the sealing block 39 is fixedly connected with a positioning plate 38, the surface of the positioning plate 38 is fixedly connected with an extension rod 32, the end of the positioning plate 38 close to the extension rod 32 is fixedly connected with a spring 34, the inner wall of the round pipe 21 is fixedly connected with a round hole frame 33, the top of the positioning ring 22 is fixedly connected with an electric telescopic frame 30, the telescopic end of the electric telescopic frame 30 is fixedly connected with a linkage rod 31, and the end of the linkage rod 31 away from the electric telescopic frame 30 is fixedly connected with the end of the extension rod 32.

[0039] The surface of the positioning plate 38 is in contact with the inner wall of the positioning groove 37. When the air pump 4 starts to work, the electric telescopic frame 30 is started to push the connecting rod 31 to move. When the connecting rod 31 moves, the telescopic rod 32 is pulled to extend. After the telescopic rod 32 starts to extend, the positioning plate 38 pushes the sealing block 39 away from the inner wall of the air inlet hole 36 by the elasticity of the spring 34, so that the suction force generated by the air pump 4 can enter the inside of the treatment frame 5 to collect water vapor. When the electric telescopic frame 30 retracts, the electric telescopic frame 30 pushes the telescopic rod 32 to retract to the limit through the connecting rod 31, and then the telescopic rod 32 pushes the positioning plate 38 to insert the sealing block 39 into the inside of the air inlet hole 36 to seal the pipe 21, so that when the treatment frame 5 starts to heat the silicon tetrachloride raw material, hot air can be gathered in the inside of the treatment frame 5 to improve the heating efficiency. The end of the spring 34 away from the positioning plate 38 is fixedly connected with the surface of the circular hole frame 33. The surface of the telescopic rod 32 is in sliding connection with the inner wall of the circular hole frame 33. The end of the telescopic rod 32 away from the positioning plate 38 penetrates through the pipe 21 and extends to the outer end of the pipe 21.

[0040] The blanking component 9 comprises a conical frame 45. The end of the conical frame 45 is fixedly connected with the inner wall of the elbow pipe 24. The top of the conical frame 45 is fixedly connected with an elastic spring 44. The top of the elastic spring 44 is fixedly connected with a conical ring 42. The top of the conical ring 42 is fixedly connected with an extrusion rod 41. The top of the extrusion rod 41 is fixedly connected with a triangular plate 40. The bottom of the telescopic rod 32 is fixedly connected with a pressure plate 46. The surface of the conical ring 42 is fixedly connected with a synchronous rod 43.

[0041] The upper surface of the triangular plate 40 extends to the inside of the pipe 21. After the sealing block 39 is separated from the air inlet hole 36, the electric telescopic frame 30 can push the telescopic rod 32 to move synchronously when extending and retracting. When the telescopic rod 32 moves, the pressure plate 46 pushes the triangular plate 40 to move downward. When the triangular plate 40 moves downward, the extrusion rod 41 pushes the conical ring 42 to move in the inside of the elbow pipe 24. When the conical ring 42 moves, it can treat the water vapor on the inner wall of the elbow pipe 24, so that the condensed water vapor can quickly slide to the inside of the storage frame 27 for collection. When the pressure plate 46 is separated from the triangular plate 40, the conical ring 42 moves upward by the elasticity of the elastic spring 44. The conical ring 42 can move up and down in the inside of the elbow pipe 24 to scrape off the water vapor, thereby improving the purification efficiency of the silicon tetrachloride raw material. The surface of the conical ring 42 is in contact with the inner wall of the elbow pipe 24. The number of the conical rings 42 is multiple. The multiple conical rings 42 are fixedly connected by the synchronous rod 43.

[0042] The inner wall of the conical ring 42 is conical. The top of the conical frame 45 is conical. The bottom of the pressure plate 46 is in contact with the bottom of the inner wall of the pipe 21. The conical ring 42 is located in the inside of the condenser pipe 23.

[0043] The stirring component 10 comprises a rotating disc 50, the surface of the rotating disc 50 is fixedly connected with a mixing plate 51, the top of the rotating disc 50 is fixedly connected with an elastic rod 52, the top of the elastic rod 52 is fixedly connected with a limiting disc 54, the top of the limiting disc 54 is fixedly connected with a rotating rod 55, the top of the rotating rod 55 is rotatably connected with the inner wall top of the heating frame 1, the surface of the rotating rod 55 is fixedly connected with an engagement frame 57, the surface of the engagement frame 57 is engaged with an engagement plate 56, the surface of the engagement plate 56 is fixedly connected with a push rod 53, and one end, away from the engagement plate 56, of the push rod 53 is fixedly connected with the lower surface of the pressure plate 46.

[0044] The bottom of the rotating disc 50 and the bottom of the mixing plate 51 are in contact with the inner wall bottom of the processing frame 20, the pressure plate 46 is moved by the push rod 53 to drive the engagement plate 56 to move, the engagement plate 56 drives the engagement frame 57 to rotate when moving, the engagement frame 57 drives the limiting disc 54 to rotate through the rotating rod 55 when rotating, the limiting disc 54 drives the mixing plate 51 to rotate through the connection of the elastic rod 52 and the rotating disc 50 when rotating, the mixing plate 51 stirs the silicon tetrachloride raw material when rotating, the silicon tetrachloride raw material is heated uniformly through stirring, the purification efficiency of the silicon tetrachloride raw material is improved, and one end, away from the engagement plate 56, of the push rod 53 penetrates through the fixed ring 35 and extends to the inside of the circular tube 21.

[0045] When in use, after the raw material of silicon tetrachloride is placed in the processing rack 20, the heating device 6 is started to work, and the heat generated by the heating device 6 is transmitted to the inside of the processing rack 20 through the processing rack 5 to heat the raw material of silicon tetrachloride, and the water vapor generated after the raw material of silicon tetrachloride is heated will float upwards, and the air pump 4 is started to work, and the suction force generated by the air pump 4 will enter the inside of the processing rack 5 through the circular pipe 21 and suck the water vapor into the inside of the elbow pipe 24, when the water vapor flows in the inside of the elbow pipe 24, the condensing device 25 is started to work, and the cold air generated by the condensing device 25 is transmitted to the surface of the elbow pipe 24 through the condensing pipe 23, so that the condensing pipe 23 can condense the water vapor flowing in the inside of the elbow pipe 24, and after condensation, the water vapor will slide into the inside of the storage rack 27 to complete the purification treatment of the raw material of silicon tetrachloride, and the suction force generated by the air pump 4 can guide the water vapor into the inside of the processing rack 5, so as to avoid that a large amount of water vapor is attached to the inside of the processing rack 5 to cause waste of the raw material of silicon tetrachloride, when the air pump 4 starts to work, the electric telescopic rack 30 is started to push the connecting rod 31 to move, and the connecting rod 31 pulls the telescopic rod 32 to extend when moving, after the telescopic rod 32 starts to extend, the positioning plate 38 pushes the sealing block 39 away from the inner wall of the air inlet hole 36 by the elasticity of the spring 34, so that the suction force generated by the air pump 4 can enter the inside of the processing rack 5 to collect the water vapor, when the electric telescopic rack 30 is retracted, after the electric telescopic rack 30 pushes the telescopic rod 32 to retract to the limit through the connecting rod 31, the telescopic rod 32 pushes the positioning plate 38 to insert the sealing block 39 into the inside of the air inlet hole 36 to seal the circular pipe 21, so that when the processing rack 5 starts to heat the raw material of silicon tetrachloride, the hot air can be gathered in the inside of the processing rack 5 to improve the heating efficiency, when the sealing block 39 is separated from the air inlet hole 36, the electric telescopic rack 30 can push the telescopic rod 32 to move synchronously when extending and retracting, the telescopic rod 32 pushes the triangular plate 40 to move downwards through the pressure plate 46 when moving, the triangular plate 40 pushes the conical ring 42 to move in the inside of the elbow pipe 24 through the extrusion rod 41 when moving downwards, the conical ring 42 can treat the water vapor on the inner wall of the elbow pipe 24 when moving, so that the condensed water vapor can quickly slide into the inside of the storage rack 27 for collection, when the pressure plate 46 is separated from the triangular plate 40, the conical ring 42 moves upwards by the elasticity of the elastic spring 44, so that the conical ring 42 can move up and down in the inside of the elbow pipe 24 to scrape off the water vapor, thereby improving the purification efficiency of the raw material of silicon tetrachloride, the pressure plate 46 drives the meshing plate 56 to move through the push rod 53 when moving, the meshing plate 56 drives the meshing rack 57 to rotate when moving, the meshing rack 57 drives the limiting disc 54 to rotate through the rotating rod 55 when rotating, the limiting disc 54 drives the mixing plate 51 to rotate through the connection of the elastic rod 52 and the rotating disc 50 when rotating, the mixing plate 51 stirs the raw material of silicon tetrachloride when rotating, so that the raw material of silicon tetrachloride is evenly heated through stirring, thereby improving the purification efficiency of the raw material of silicon tetrachloride.

[0046] The preferred embodiments of the application disclosed above are only to facilitate the elucidation of the application. The preferred embodiments do not describe all the details of the application and limit the application to the specific embodiments described. Obviously, many modifications and variations can be made in light of the teachings above. The description is chosen and described in order to best explain the principles of the application and its practical application to thereby enable others skilled in the art to best utilize the application and get the best results from the application. The application is only limited by the claims and their full scope and equivalents.

Claims

1. A purification device for the processing of high-purity silicon tetrachloride, comprising a base (11), characterized in that, The top of the base (11) is inserted with a heating frame (1), the inner wall of the heating frame (1) is fixedly connected with a processing frame (5), the surface of the processing frame (5) is fixedly connected with a heating device (6), the bottom of the base (11) is fixedly connected with a support (3), the inner wall top of the support (3) is fixedly connected with a hydraulic rod (2), the bottom of the hydraulic rod (2) is fixedly connected with the top of the heating frame (1), the inner wall of the support (3) is fixedly connected with an air pump (4), the surface of the heating frame (1) is provided with a condensing component (7); The condensing component (7) includes a round pipe (21), the end of the round pipe (21) is fixedly connected with the surface of the heating frame (1), the surface of the round pipe (21) is fixedly connected with a positioning ring (22), the bottom of the positioning ring (22) is communicated with a bend pipe (24), the lower surface of the bend pipe (24) is communicated with a storage frame (27), the bottom of the storage frame (27) is hingedly connected with a sealing door (26), the inner wall of the bend pipe (24) is fixedly connected with a sieve plate (28), the upper surface of the bend pipe (24) is fixedly connected with a condensing pipe (23), the surface of the condensing pipe (23) is fixedly connected with a condensing device (25), the top of the base (11) is fixedly connected with a processing frame (20), the inside of the round pipe (21) is provided with a sealing component (8), the inner wall of the bend pipe (24) is provided with a discharging component (9), the inside of the processing frame (5) is provided with a stirring component (10); The sealing component (8) includes a fixed ring (35), the surface of the fixed ring (35) is fixedly connected with the inner wall of the round pipe (21), the surface of the fixed ring (35) is provided with an air inlet hole (36), one end of the fixed ring (35) away from the air inlet hole (36) is provided with a positioning groove (37), the inner wall of the air inlet hole (36) is inserted with a sealing block (39), the surface of the sealing block (39) is fixedly connected with a positioning plate (38), the surface of the positioning plate (38) is fixedly connected with an extension rod (32), one end of the positioning plate (38) close to the extension rod (32) is fixedly connected with a spring (34), the inner wall of the round pipe (21) is fixedly connected with a round hole frame (33), the top of the positioning ring (22) is fixedly connected with an electric telescopic frame (30), the telescopic end of the electric telescopic frame (30) is fixedly connected with a linkage rod (31), one end of the linkage rod (31) away from the electric telescopic frame (30) is fixedly connected with the end of the extension rod (32). The blanking component (9) comprises a conical frame (45), the end of the conical frame (45) is fixedly connected with the inner wall of the elbow pipe (24), the top of the conical frame (45) is fixedly connected with an elastic spring (44), the top of the elastic spring (44) is fixedly connected with a conical ring (42), the top of the conical ring (42) is fixedly connected with an extrusion rod (41), the top of the extrusion rod (41) is fixedly connected with a triangular plate (40), the bottom of the telescopic rod (32) is fixedly connected with a pressure plate (46), and the surface of the conical ring (42) is fixedly connected with a synchronous rod (43).

2. The purification device for processing of high purity silicon tetrachloride according to claim 1, characterized in that: The end of the circular pipe (21) penetrates through the heating frame (1) and communicates with the inside of the processing frame (5), the elbow pipe (24) is located below the circular pipe (21), the end of the elbow pipe (24) away from the positioning ring (22) is communicated with the air inlet end of the air pump (4), the sieve plate (28) is located at the end of the elbow pipe (24) close to the air pump (4), and the condenser pipe (23) is located below the circular pipe (21).

3. A purification device for processing of high purity silicon tetrachloride according to claim 2, characterized in that: The surface of the positioning plate (38) is in contact with the inner wall of the positioning groove (37), the end of the spring (34) away from the positioning plate (38) is fixedly connected with the surface of the circular hole frame (33), the surface of the telescopic rod (32) is in sliding connection with the inner wall of the circular hole frame (33), and the end of the telescopic rod (32) away from the positioning plate (38) penetrates through the circular pipe (21) and extends to the outer end of the circular pipe (21).

4. The purification device for processing of high purity silicon tetrachloride according to claim 3, characterized in that: The upper surface of the triangular plate (40) extends to the inside of the circular pipe (21), the surface of the conical ring (42) is in contact with the inner wall of the elbow pipe (24), and the number of the conical ring (42) is provided as a plurality of, and the plurality of conical rings (42) are fixedly connected through the synchronous rod (43).

5. A purification apparatus for processing of high purity silicon tetrachloride according to claim 4, characterized in that: The inner wall of the conical ring (42) is conical, the top of the conical frame (45) is conical, the bottom of the pressure plate (46) is in contact with the inner wall bottom of the circular pipe (21), and the conical ring (42) is located in the inside of the condenser pipe (23).

6. The purification apparatus for processing of high purity silicon tetrachloride according to claim 5, characterized in that: The stirring component (10) comprises a rotating disc (50), the surface of the rotating disc (50) is fixedly connected with a mixing plate (51), the top of the rotating disc (50) is fixedly connected with an elastic rod (52), the top of the elastic rod (52) is fixedly connected with a limiting disc (54), the top of the limiting disc (54) is fixedly connected with a rotating rod (55), the top of the rotating rod (55) is rotatably connected with the inner wall top of the heating frame (1), the surface of the rotating rod (55) is fixedly connected with an engagement frame (57), the surface of the engagement frame (57) is engaged with an engagement plate (56), the surface of the engagement plate (56) is fixedly connected with a push rod (53), and the end of the push rod (53) away from the engagement plate (56) is fixedly connected with the lower surface of the pressure plate (46).

7. The purification apparatus for processing of high purity silicon tetrachloride according to claim 6, characterized in that: The bottom of the rotating disc (50) and the bottom of the mixing plate (51) are in contact with the inner wall bottom of the processing frame (20), and the end of the push rod (53) away from the engagement plate (56) penetrates through the fixed ring (35) and extends to the inside of the circular pipe (21).

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