Semiconductor exhaust gas treatment device

Abstract

The present invention relates to the technical field related to waste gas treatment equipment, and discloses a semiconductor waste gas treatment device, which includes a furnace body, one end of which is a combustion area and the other end is open. The side of the furnace body is provided with a waste gas inlet near the combustion area and a waste gas outlet near the open end. An atomizing nozzle is provided in the combustion area. An aerosol mixing device is provided in the furnace body between the waste gas inlet and the waste gas outlet. The aerosol mixing device divides the cavity of the furnace body into a plurality of chambers, and the plurality of chambers are connected by a plurality of flow holes. The flow area of ​​each flow hole is smaller than the cross-sectional area of ​​the chamber. The semiconductor waste gas treatment device disclosed by the present invention can fully mix the post-combustion waste gas with atomized water in a relatively short time and within the effective furnace body space, so that the conversion rate of hydrofluoric acid is greatly increased, and the chemical erosion of the furnace wall can be significantly suppressed. The atomized water has a significantly improved ability to capture ash, thereby largely avoiding scaling in the furnace.

Description

Technical Field

[0001] The present invention relates to the technical field related to waste gas treatment equipment, and in particular to a semiconductor waste gas treatment device. Background Art

[0002] The exhaust gas generated by the semiconductor manufacturing process contains highly corrosive fluorinated gases (such as NF3 and CF4), which must be decomposed into harmless substances through high-temperature flame combustion (usually >1000°C). However, the free fluoride ions in the combustion products can severely corrode the furnace walls. At the same time, the resulting metal oxide ash (such as Al2O3 and SiO2 particles) adheres to the inner wall of the furnace body due to the high-temperature airflow. Over a long period of erosion, the corrosion of the furnace wall causes the metal matrix to roughen, accelerating the adhesion of ash and forming a hardened composite scale layer (up to 10mm thick) with fluoride salts (such as Na and AlF6) as a binder. This requires shutdown for cleaning, resulting in short maintenance cycles and seriously affecting the exhaust gas treatment process.

[0003] Based on this situation, existing technologies, such as patent CN03265748.X, disclose a semiconductor waste gas treatment device with a flame channel. It proposes spraying atomized water vapor inside the furnace body. The water mist reacts with fluoride ions to generate hydrofluoric acid (HF) to prevent fluoride ion corrosion on the inner wall of the furnace body. At the same time, the water mist can also capture ash to form water droplets for discharge.

[0004] In actual industrial applications, the above solution can alleviate furnace wall corrosion and scaling to a certain extent, but it also faces significant limitations:

[0005] The reaction of atomized water vapor to fluoride ions and the condensation efficiency of ash are both limited. The applicant's research found that this is due to the limited space inside the furnace body. The atomized water vapor and the exhaust gas after combustion cannot be fully mixed during the short residence time, resulting in insufficient capture rate of settled ash by water mist, especially in low flow rate areas, and insufficient reaction with fluoride ions. In addition, some fluoride ions and ash will escape to the top of the furnace, creating dead corners. The dense scale layer accumulated in the dead corners hinders heat conduction, causing local temperature abnormalities, affecting exhaust gas treatment, and even causing electrochemical local corrosion under high-temperature fluoride ion penetration, causing the risk of furnace wall perforation. Summary of the Invention

[0006] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, one object of the present invention is to provide a semiconductor waste gas treatment device.

[0007] According to the semiconductor waste gas treatment device proposed in the present invention, it includes a furnace body, one end of the furnace body is a combustion area, and the other end is an open end. The side of the furnace body is provided with a waste gas inlet close to the combustion area and a waste gas outlet close to the open end, and an atomizing nozzle is arranged in the combustion area.

[0008] Different from the traditional solution, an aerosol mixing device is provided in the furnace body between the exhaust gas inlet and the exhaust gas outlet. The aerosol mixing device divides the cavity of the furnace body into several chambers, and the several chambers are connected by several flow holes. The flow area of ​​each flow hole is smaller than the cross-sectional area of ​​the chamber.

[0009] The purpose of this setup is to use the aerosol mixing device to reconstruct the traditional single chamber into several independent chambers connected in series. The chambers are connected through flow holes with smaller flow areas. When the mixed fluid of high-temperature exhaust gas carrying ash and atomized water flows through the flow holes with a sudden decrease in cross-section, a high-speed jet is generated according to the Bernoulli principle, increasing the flow rate by 3 to 5 times. When the jet enters the next large-cross-section chamber, the flow channel expands rapidly to form a strong turbulent vortex.

[0010] The high-speed jet further tears the water mist into atomization, causing the specific surface area to increase sharply, which dramatically increases the probability of collision between fluoride ions and water mist. In addition, the multi-stage chamber forms a directional eddy field. The eddy operation makes the mixing of high-temperature exhaust gas and atomized water more intense, and can fully mix them in a shorter time, thereby increasing the conversion rate of hydrofluoric acid and significantly inhibiting the chemical erosion of the furnace wall.

[0011] In addition, the turbulent vortex imparts extremely high kinetic energy to ash particles, causing them to collide and coalesce with atomized droplets by inertia. Compared with traditional solutions, the water mist's ability to capture ash is significantly improved, forming millimeter-sized ash-containing droplets that settle and are discharged in real time under the action of gravity, essentially preventing them from forming scale on the furnace wall.

[0012] Furthermore, the high-speed jet and strong turbulent vortex effect produce a shearing and peeling effect, continuously removing the primary soft scale in the hole edge and cavity to prevent hardening and agglomeration;

[0013] In summary, the nearly complete neutralization of fluoride ions keeps the furnace walls smooth, ash is removed immediately, the formation of hard scale using fluoride salts as adhesives is eliminated, and the equipment maintenance cycle is extended from 7 days to more than 21 days.

[0014] In some examples of the present invention, the aerosol mixing device includes a plurality of plates, which are distributed along the axial direction of the furnace body. Each plate extends radially along the furnace body until it is connected to the inner wall of the furnace body, dividing the cavity of the furnace body into a plurality of chambers, and the flow holes are opened on the plates.

[0015] The purpose of this setting is: first, the plate extends radially to the furnace wall to form a full-section partition, forcing the high-temperature exhaust gas carrying ash and atomized water to pass through the flow holes of the plate, avoiding the blind spots of flow bypass in traditional chambers; second, the flow holes are precisely arranged according to the preset reduction ratio to achieve precise control of the Bernoulli effect and turbulence intensity.

[0016] In some examples of the present invention, each plate is provided with a plurality of flow holes having different flow areas.

[0017] The purpose of this setting is: by setting flow holes with different flow areas, the larger flow holes can maintain the permeability of the main airflow, and the smaller flow holes can eliminate the edge flow attenuation caused by the traditional single aperture to a certain extent; in addition, multiple jets collide and mix in the chamber, and the mixing energy efficiency increases exponentially compared to the single-hole solution, further achieving sufficient mixing.

[0018] In some examples of the present invention, the plurality of flow holes opened on each plate are distributed along the circumference of the plate and along the radial direction of the plate, and the flow holes opened on adjacent plates are staggered.

[0019] The purpose of this arrangement is that the staggered flow holes break the straight flow path. When the holes of adjacent plates are staggered, the fluid is forced to make multiple turns in the chamber, which greatly extends the mixing path.

[0020] The specific advantages are: first, it prolongs the contact time of the aerosol and eliminates the short-circuit overflow phenomenon; second, it generates secondary turbulence by impacting the wall, increases the Reynolds number, and avoids the laminar flow defect of the positive channel; third, it prevents the high-speed jet from directly penetrating the multi-layer plate to form a "tunnel effect", blocks the linear inertial deposition channel of the ash, and keeps the particulate matter in a suspended mixed state throughout the process.

[0021] In some examples of the present invention, the aerosol mixing device also includes a support shaft that connects all the plates in series. After the support shaft passes through all the plates, one end extends to the middle of the furnace body as a free end, and the other end extends to the open end of the furnace body and is fixedly connected to the furnace body.

[0022] The purpose of this setting is: the basic purpose of the support shaft is to connect the various plates and provide support for each plate; in addition, one end of the support shaft and the fixed end of the furnace body form a thermal expansion dead point, and the other end is free to expand and contract to absorb temperature difference stress, thereby controlling the radial deformation difference of the multi-stage plates within an ideal range; at the same time, the support shaft acts as a damping mass block to absorb part of the plate vibration caused by the high-speed jet, thereby extending the service life of the plate.

[0023] In some examples of the present invention, one end of the support shaft extends outside the open end of the furnace body and is connected to the first flange, and the first flange is fixedly connected to the furnace body to close the open end of the furnace body, and a first through hole is opened on the first flange.

[0024] The purpose of this setting is to use the first through hole to discharge ash-containing droplets out of the furnace, the first flange is rigidly fixed to the furnace body to form a thermal displacement dead point, and the first flange simultaneously completes the triple functions of sealing the open end of the furnace body, positioning the support shaft, and integrating the drainage channel.

[0025] In some examples of the present invention, the plate is a circular plate with a second through hole in the middle for the support shaft to pass through. A positioning protrusion is formed from the inner wall of the second through hole toward the center of the second through hole, and an alignment groove is formed on the support shaft corresponding to the alignment protrusion.

[0026] The purpose of such a setting is to achieve phase locking between the plate and the support shaft by utilizing the cooperation between the alignment protrusion and the alignment groove, thereby ensuring constant relative positions between the multi-stage plates and preventing turbulent field distortion.

[0027] In some examples of the present invention, the plate is composed of a plurality of sector-shaped members, and any two sector-shaped members are connected by wedges.

[0028] The purpose of this setting is that the diameter of the open end of the furnace body is smaller than the diameter of the plate. Because for installation considerations, the plate is composed of several fan-shaped parts, and the wedge automatically induces the fan-shaped parts to radially fit the furnace wall, generating a radial clamping force. During installation, the fan-shaped parts can be initially fixed and then welded, reducing the use of auxiliary tooling.

[0029] In some examples of the present invention, an annular cover is provided at the atomizing nozzle, and a plurality of three-pronged through holes are opened in the annular cover. The plurality of three-pronged through holes are distributed along the circumference of the atomizing nozzle. The first end of each three-pronged through hole points to the atomizing nozzle, the second end points to the side wall inside the furnace body, and the third end points to the top inside the furnace body. The connecting points of the three-pronged through holes are staggered.

[0030] The purpose of such setting is: as mentioned in the previous article, there are dead corners in the furnace body. The dense scale layer accumulated in the dead corners hinders heat conduction, causing local temperature abnormalities and affecting exhaust gas treatment. The dead corners here are generally formed at the top of the furnace, because the water mist is sprayed downward, and the exhaust gas after combustion will dissipate upward, thus causing a dead corner at the top; and the setting of a three-pronged through hole can enable part of the water mist sprayed from the atomizing nozzle to enter the three-pronged through hole, and after being guided at the dislocation, it is ejected to the inner side of the furnace through the second end. The remaining part of the water flow turns at the dislocation and is ejected to the top of the furnace side through the third end, thereby capturing the ash in the dead corner and avoiding corrosion.

[0031] In some examples of the present invention, the three-pronged through hole includes a first passage having a first end, a second passage having a second end, and a third passage having a third end, the first passage is parallel to the second passage, and a staggered shoulder is formed between the first passage and the second passage, and one end of the third passage points to the shoulder.

[0032] Additional aspects and advantages of the present invention will be set forth in part in the description which follows and, in part, will be obvious from the description which follows, or may be learned by practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, a brief introduction is given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0034] Figure 1 This is a front view of a semiconductor waste gas treatment device according to an embodiment of the present invention;

[0035] Figure 2 A top view of the furnace body in an embodiment of the present invention;

[0036] Figure 3 Attached to the embodiment of the present invention Figure 2 Cross-sectional view at AA;

[0037] Figure 4 is a front view of three plates in an embodiment of the present invention;

[0038] Figure 5 Attached to the embodiment of the present invention Figure 3 Detail at B.

[0039] Description of reference numerals:

[0040] Furnace body 1, outer shell 11, refractory layer 12, positioning protrusion 121, interlayer 13, combustion area 14, combustion-supporting gas nozzle 15, igniter 16, exhaust gas inlet 17, exhaust gas outlet 18, atomizing nozzle 19;

[0041] Bracket 2;

[0042] Chimney 3;

[0043] Aerosol mixing device 4, plate 41, sector 411, triangular groove 4111, wedge 412, flow holes 413a, 413b, 413c, second through hole 414, alignment protrusion 415, annular limiting protrusion 416, annular shoulder groove 417, support shaft 42, alignment groove 421, first flange 43, first through hole 431;

[0044] The annular cover 5 has a three-pronged through hole 51 , a first passage 511 , a second passage 512 , a third passage 513 , and a shoulder 514 . DETAILED DESCRIPTION

[0045] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.

[0046] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, features defined as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0047] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed, detachable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on the specific circumstances.

[0048] The following describes embodiments of the present invention in detail. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended only to explain the present invention and are not to be construed as limiting the present invention.

[0049] Reference below Figures 1 to 5 The description shown is a semiconductor exhaust gas treatment device provided according to an embodiment of the present invention.

[0050] Please see the attached Figure 1 , is a front view of a semiconductor waste gas treatment device. The treatment device includes a longitudinally arranged furnace body 1, which is installed on a bracket 2, and a chimney 3 is provided on one side of the furnace body 1.

[0051] Please see the attached Figure 2 ~Attached Figure 3 , attached Figure 2 It is a top view of the furnace body 1, Figure 3 For attachment Figure 2 In the cross-sectional view taken at AA, the furnace body 1 comprises an outer shell 11 and a refractory layer 12 disposed within the outer shell 11. An interlayer 13 is formed between the outer shell 11 and the refractory layer 12, through which a medium is passed for heat preservation. The upper portion of the furnace body 1 comprises a combustion zone 14. A combustion-supporting gas nozzle 15 and an igniter 16 extend from the top of the furnace body 1 into the furnace. An exhaust gas inlet 17 is also provided on the side of the furnace body 1, near the combustion zone 14. Exhaust gas enters the furnace through the exhaust gas inlet 17 and, aided by the combustion-supporting gas, burns in the combustion zone 14. The exhaust gas has considerable kinetic energy.

[0052] Please continue to see the attached Figure 3 The furnace body 1 is open at one end away from the combustion area 14, and an exhaust gas outlet 18 is provided on the side near the open end. The exhaust gas outlet 18 is connected to the chimney 3, so that the exhaust gas after combustion can be discharged through the exhaust gas outlet 18 and then enter the chimney 3, and then discharged through the chimney 3.

[0053] Please continue to see the attached Figure 3 An atomizing nozzle 19 is provided in the combustion area 14. Specifically, the atomizing nozzle 19 also extends from the top of the furnace wall to the furnace body 1 and is distributed on the side of the combustion-supporting gas nozzle 15. The spraying direction of the atomizing nozzle 19 points to the center of the furnace body 1. The water mist sprayed therefrom is used to fully contact with the exhaust gas after combustion, one is to react with the fluorine ions in the combustion exhaust gas, and the other is to capture the ash in the exhaust gas.

[0054] Please continue to see the attached Figure 3 An aerosol mixing device 4 is provided in the furnace body 1 between the exhaust gas inlet 17 and the exhaust gas outlet 18. The aerosol mixing device 4 divides the cavity of the furnace body 1 into a plurality of chambers. The plurality of chambers are connected through a plurality of flow holes 413. The flow area of ​​each flow hole 413 is smaller than the cross-sectional area of ​​the chamber.

[0055] That is, the aerosol mixing device 4 is used to divide a single chamber into several independent chambers connected in series. The chambers are connected through the flow holes 413. After the kinetic combustion exhaust gas and the atomized water are mixed for the first time in the combustion area 14, they enter the next chamber through the flow holes 413. Since the flow area of ​​the flow holes 413 is smaller than the cross-sectional area of ​​each chamber, under the Bernoulli principle, the flow velocity of the mixed fluid increases at the flow holes 413, forming a jet, which is different from the velocity of the mixed fluid that has entered the next chamber, forming a turbulent vortex phenomenon, thereby accelerating the mixing between the combustion exhaust gas and the atomized water, making the reaction between water molecules and fluoride ions more thorough, and also making the water mist capture the ash more thoroughly.

[0056] Please continue to see the attached Figure 3The aerosol mixing device 4 specifically includes three plates 41, each of which is a circular plate. Each plate 41 extends radially along the furnace body 1 and is welded to the inner wall of the furnace body 1, so that the plate 41 and the inner wall of the furnace body 1 are in a sealed connection state. The three plates 41 are evenly distributed along the axial direction of the furnace body 1, dividing the cavity of the furnace body 1 into four chambers, one of which is the combustion area 14, and the remaining three chambers are mixing chambers for the mixed fluid. The flow holes 413 are opened on the plates 41, so that the mixed fluid is continuously mixed in the three mixing chambers.

[0057] Please see the attached Figure 4 , is a front view of the three plates 41. The three plates 41 are arranged from left to right, corresponding to the top-down arrangement in the furnace body 1. Three flow holes 413 with different flow areas are opened on each plate 41. The purpose of such arrangement is, first, that the larger flow holes 413 are used to maintain the passability of the mixed fluid, and the smaller flow holes 413 are used to enhance the vortex effect at this location, thereby improving the overall mixing effect.

[0058] Please continue to see the attached Figure 4 The three flow holes 413 formed on each plate 41 are distributed along the circumference of the plate 41 and also along the radial direction of the plate 41. That is, the three flow holes 413 are distributed in a stepped manner in the circumferential direction of the plate 41. The flow holes 413 formed on adjacent plates 41 are staggered. This arrangement can prevent high-speed jets from directly penetrating the multi-layer plates 41 to form a "tunnel effect."

[0059] In this embodiment, three flow holes 413a, 413b, and 413c are provided on each plate 41. The method for staggering the flow holes 413 of adjacent plates 41 is as follows: the middle plate 41 is rotated 60 degrees relative to its adjacent plates 41, so that the three corresponding flow holes 413a, 413b, and 413c on different plates 41 are staggered.

[0060] In actual use scenarios, when the mixed fluid undergoes vortex mixing in the chamber, low-pressure areas will be generated in the corners of the chamber. In an environment with complex flow rates, the stability of the plate 41 will be greatly tested. Therefore, please continue to refer to the attached Figure 3 The aerosol mixing device 4 also includes a support shaft 42 that connects all the plates 41 in series. After the support shaft 42 passes through all the plates 41, one end extends to the middle of the furnace body 1 as a free end, and the other end extends to the open end of the furnace body 1 and is fixedly connected to the furnace body 1. In this way, the support shaft 42 acts as a damping mass block to absorb part of the vibration of the plate 41 caused by the high-speed jet, thereby extending the service life of the plate 41.

[0061] Please continue to see the attached Figure 3One end of the support shaft 42 extends to the outside of the open end of the furnace body 1 and is welded to the first flange 43. The first flange 43 is fixedly connected to the furnace body 1 to close the open end of the furnace body 1. A plurality of first through holes 431 are provided on the first flange 43. The plurality of first through holes 431 are opened around the support shaft 42, and their function is to discharge the waste liquid that has captured the ash.

[0062] Please continue to see the attached Figure 3 ~Attached Figure 4 A second through hole 414 is provided in the middle of the plate 41 for the support shaft 42 to pass through, and a positioning protrusion 415 is formed from the inner wall of the second through hole 414 to the center of the second through hole 414. The positioning protrusion 415 is annular, and an alignment groove 421 is formed on the support shaft 42 corresponding to the alignment protrusion 415. The alignment groove 421 is also annular. During installation, the alignment protrusion 415 needs to be placed in the alignment groove 421; the advantages of doing so are, first, precise positioning of the plate 41, and second, increased connection strength between the plate 41 and the support shaft 42.

[0063] Please continue to see the attached Figure 3 Each plate 41 has an annular limiting protrusion 416 extending axially along the edge of the second through hole 414. This is done to further increase the connection strength between the plate 41 and the support shaft 42.

[0064] Please continue to see the attached Figure 4 Each plate 41 is composed of three fan-shaped parts 411, and the two fan-shaped parts 411 are connected by wedges 412; this arrangement allows the fan-shaped parts 411 to be placed in the furnace body 1 for installation, and during installation, the corresponding alignment protrusion 415 of each fan-shaped part 411 can be respectively entered into the alignment groove 421, and the wedge 412 can be used to initially position the two fan-shaped parts 411, and then weld the two fan-shaped parts 411 together, so there is no need to support the plate 41 when welding it.

[0065] Please continue to see the attached Figure 4 The cross section of the wedge 412 is square and can be divided into two triangles along its diagonal line, while the fan-shaped pieces 411 are provided with triangular grooves 4111 at the connection points between each other, and the two adjacent triangular grooves 4111 are merged into a square structure that fits the wedge 412.

[0066] Please continue to see the attached Figure 4 The three flow holes 413 are respectively opened on the three sector-shaped members 411 . This arrangement is to avoid the flow holes 413 being distributed at the connection between two sector-shaped members 411 .

[0067] Please continue to see the attached Figure 3A positioning protrusion 121 is also provided on the inner wall of the furnace body 1 corresponding to each plate 41. The positioning protrusion 121 is an annular protrusion corresponding to the annular shoulder groove 417 formed on the plate 41. The positioning protrusion 121 and the annular shoulder groove 417 correspond to each other to position the plate 41.

[0068] Please see the attached Figure 5 , attached Figure 5 For attachment Figure 3 In the detail view at point B, an annular cover 5 is provided at the atomizing nozzle 19. The annular cover 5 is provided on the atomizing nozzle 19. The upper end of the annular cover 5 is fixed to the inner wall of the furnace body 1, and the lower end extends beyond the atomizing nozzle 19. A plurality of three-pronged through holes 51 are opened in the annular cover 5. The three-pronged through holes 51 are distributed along the circumference of the atomizing nozzle 19. The first end of each three-pronged through hole 51 points to the atomizing nozzle 19, the second end points to the side wall of the furnace body 1, and the third end points to the top of the furnace body 1. The connection points of the three-pronged through holes 51 are staggered.

[0069] Specifically, the three-pronged through hole 51 includes a first passage 511 having a first end, a second passage 512 having a second end, and a third passage 513 having a third end. The first passage 511 and the second passage 512 are parallel to each other, and a staggered shoulder 514 is formed between the first passage 511 and the second passage 512. One end of the third passage 513 points to the shoulder 514.

[0070] In this way, when the atomizing nozzle 19 sprays the spray G, the first end of the three-pronged through hole 51 can meet the edge of the spray G, so that part of the spray can enter the three-pronged through hole 51 through the first passage 511. The spray with stronger power is subjected to the force at the shoulder 514, and the spray direction is changed. It is sprayed through the third passage 513 and sprayed toward the top of the furnace body 1 to capture the ash at the top. The spray with weaker power is guided by the shoulder 514 and sprayed through the second passage 512 to capture the ash on the side wall.

[0071] Other components of the semiconductor waste gas treatment device according to the embodiment of the present invention, such as the nozzle and the operation, are well known to those skilled in the art and will not be described in detail here.

[0072] Throughout this specification, references to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" indicate that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, illustrative uses of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0073] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the claims and their equivalents.

Claims

1. Semiconductor exhaust gas treatment device, characterized in that, The furnace body comprises a furnace body, wherein one end of the furnace body is a combustion area and the other end is an open end, a waste gas inlet near the combustion area and a waste gas outlet near the open end are provided on the side of the furnace body, and an atomizing nozzle is provided in the combustion area; An aerosol mixing device is provided in the furnace body between the exhaust gas inlet and the exhaust gas outlet, and the aerosol mixing device divides the cavity of the furnace body into a plurality of chambers, and the plurality of chambers are connected through a plurality of flow holes, and the flow area of ​​each flow hole is smaller than the cross-sectional area of ​​the chamber; The aerosol mixing device includes a plurality of plates, which are distributed along the axial direction of the furnace body. Each plate extends radially along the furnace body until it is connected to the inner wall of the furnace body, dividing the cavity of the furnace body into a plurality of chambers. The flow holes are opened on the plates.

2. The semiconductor waste gas treatment device according to claim 1, characterized in that: Each of the plates is provided with a plurality of flow holes having different flow areas.

3. The semiconductor waste gas treatment device according to claim 2, characterized in that: The plurality of flow holes opened on each plate are distributed along the circumference of the plate and along the radial direction of the plate, and the flow holes opened on adjacent plates are staggered.

4. The semiconductor waste gas treatment device according to any one of claims 1 to 3, characterized in that: The aerosol mixing device also includes a support shaft connecting all the plates in series. After passing through all the plates, one end of the support shaft extends to the middle of the furnace body, and the other end extends to the open end of the furnace body, and is fixedly connected to the furnace body.

5. The semiconductor waste gas treatment device according to claim 4, characterized in that: One end of the support shaft extends outside the open end of the furnace body and is connected to a first flange. The first flange is fixedly connected to the furnace body to close the open end of the furnace body. A first through hole is formed on the first flange.

6. The semiconductor waste gas treatment device according to claim 4, characterized in that: The plate is a circular plate with a second through hole in the middle for the support shaft to pass through. A positioning protrusion is formed from the inner wall of the second through hole toward the center of the second through hole, and an alignment groove is formed on the support shaft corresponding to the alignment protrusion.

7. The semiconductor waste gas treatment device according to claim 6, characterized in that: The plate is composed of a plurality of sector-shaped parts, and any two of the sector-shaped parts are connected by wedges.

8. The semiconductor waste gas treatment device according to any one of claims 1 to 3, characterized in that: An annular cover is provided at the atomizing nozzle, and a plurality of three-pronged through holes are opened in the annular cover. The three-pronged through holes are distributed along the circumference of the atomizing nozzle. The first end of each three-pronged through hole points to the atomizing nozzle, the second end points to the side wall inside the furnace body, and the third end points to the top inside the furnace body. The connecting parts of the three-pronged through holes are staggered.

9. The semiconductor waste gas treatment device according to claim 8, characterized in that: The three-pronged through hole includes a first passage having the first end, a second passage having the second end, and a third passage having the third end. The first passage and the second passage are arranged in parallel, and a staggered shoulder is formed between the first passage and the second passage. One end of the third passage points to the shoulder.

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