A horizontal graphite boat for silicon wafer coating

Abstract

The present invention discloses a horizontal graphite boat for coating silicon wafers, which relates to the field of semiconductor device technology. The boat comprises a bottom sheet and a top sheet, wherein a first inner sheet is disposed between the bottom sheet and the top sheet, and a second inner sheet is further disposed between the bottom sheet and the top sheet, and the first inner sheet and the second inner sheet are alternately disposed between the bottom sheet and the top sheet, wherein each of the first inner sheet and the second inner sheet is provided with a through groove, wherein a supporting portion for supporting the silicon wafer is fixedly disposed in the through groove, and a supporting portion for supporting the bottom sheet is disposed below the bottom sheet, and a fixing mechanism for fixing the bottom sheet, the first inner sheet, the second inner sheet, and the top sheet is disposed on the supporting portion, and an adjustment mechanism is disposed on the supporting portion. By providing the adjustment mechanism, the boat can be adapted for carrying and placing silicon wafers to be coated of different thicknesses, thereby effectively preventing the silicon wafers from shifting, tilting, or falling during the coating process, thereby improving the uniformity of the coating on the surface of the silicon wafers and effectively reducing the scrap rate of the silicon wafer coating.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor devices, and in particular to a horizontal graphite boat for silicon wafer coating. Background Art

[0002] In semiconductor chip manufacturing and photovoltaic cell production, silicon wafer coating is a core technology that enhances the optoelectronic properties of silicon wafers and improves product quality. By uniformly depositing a thin film with specific functionalities on the surface of the silicon wafer, the wafer's optical and electrical properties can be effectively improved, directly impacting the chip's computing performance and the photovoltaic cell's photoelectric conversion efficiency. As the key carrier for the silicon wafer coating process, the structural design and performance of the horizontal graphite boat play a decisive role in the quality of the silicon wafer coating.

[0003] Currently, the horizontal graphite boats commonly used on the market for silicon wafer coating have obvious technical defects. Traditional graphite boats mostly adopt a fixed structure design, and their supporting slots have a single size specification, which can only adapt to silicon wafers of a specific thickness. In actual production, the thickness of silicon wafers varies depending on the product type and process requirements. For example, the thickness of semiconductor-grade silicon wafers is generally between 100-700 microns, and the thickness of photovoltaic-grade silicon wafers is generally in the range of 150-220 microns. With the development of process technology, the thickness specifications of silicon wafers are becoming increasingly diversified. When using a fixed-structure graphite boat to carry silicon wafers of different thicknesses, if the silicon wafer thickness is smaller than the adaptive size of the supporting slot, the silicon wafer is prone to displacement and tilting during the coating process, resulting in uneven film deposition, film thickness deviation, edge effects and other problems. If the silicon wafer thickness is greater than the adaptive size of the supporting slot, the silicon wafer cannot be placed normally, or after placement, it may crack or even fall due to uneven force, causing the silicon wafer to be scrapped. In addition, silicon wafers need to experience complex environments such as high temperature and gas scouring during the coating process. The fixed-structure graphite boat cannot provide stable and reliable support and fixation for silicon wafers of different thicknesses, further exacerbating the risk of silicon wafer displacement. The unstable state of the silicon wafer not only reduces the uniformity of the coating, resulting in a decrease in product yield and increased production costs, but also limits the company's adaptability to the production of diversified silicon wafer products, making it difficult to meet the rapidly changing market needs. Therefore, improvement is urgently needed. Summary of the Invention

[0004] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a horizontal graphite boat for silicon wafer coating, aiming to solve the above technical problems.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions:

[0006] A horizontal graphite boat for coating silicon wafers comprises a bottom sheet and a top sheet, a plurality of equally spaced first inner sheets are arranged between the bottom sheet and the top sheet, a plurality of equally spaced second inner sheets are also arranged between the bottom sheet and the top sheet, and the plurality of first inner sheets and the plurality of second inner sheets are alternately arranged between the bottom sheet and the top sheet, a plurality of equally spaced through grooves are respectively formed through the first inner sheet and the second inner sheet, a bearing portion for bearing silicon wafers is fixedly provided in the through grooves, a supporting portion for supporting the bottom sheet is provided below the bottom sheet, a fixing mechanism for fixing the bottom sheet, the first inner sheet, the second inner sheet and the top sheet is provided on the supporting portion, and an adjustment mechanism is provided on the supporting portion.

[0007] Preferably, the bearing portion includes:

[0008] A carrying frame is located in the through groove, and a carrying groove is provided on a surface of the carrying frame away from the bottom film, wherein the carrying groove has two symmetrically arranged adjustment grooves;

[0009] The bearing plate is slidably arranged in the bearing groove, and an adjusting plate is fixedly arranged on the end surface of the bearing plate close to the adjusting groove, and the adjusting plate is slidably connected to the adjusting groove.

[0010] Preferably, the support portion comprises:

[0011] There are two pads, and the two pads are symmetrically arranged below the bottom film, and the pads are used to provide support for the bottom film;

[0012] Boat feet are provided at both ends of the pad, and are used to improve the stability of the pad supporting the film, and the lower electrode block is provided on the boat feet;

[0013] The upper electrode block is arranged between any first inner sheet and the second inner sheet, and the upper electrode block and the lower electrode block are used to connect with the external electrodes.

[0014] Preferably, graphite spacers are provided between the bottom sheet, the first inner sheet, the second inner sheet and the top sheet for supporting the four corners of each sheet.

[0015] Preferably, the adjustment mechanism comprises:

[0016] There are multiple L-shaped support plates, and the multiple L-shaped support plates are equidistantly arranged on the pad on any side, and the L-shaped support plates are fixedly connected to the pad;

[0017] The driving part has multiple groups, and the multiple groups of driving parts are respectively arranged on corresponding L-shaped support plates;

[0018] There are multiple groups of adjusting parts, and the multiple groups of adjusting parts are equidistantly arranged on the bottom film. The adjusting parts are used to adjust the positions of adjacent carrying plates in the carrying slots.

[0019] Preferably, the driving unit includes:

[0020] A fixed block is provided on the top sheet, wherein a driving groove is provided on a surface of the fixed block away from the bottom sheet, and a driving block is slidably provided in the driving groove;

[0021] a transmission part, provided on the driving block, and cooperating with the adjustment part;

[0022] A driving screw is located in the driving groove, and one end of the driving screw away from the L-shaped support plate is rotatably connected to the fixed block, and the other end of the driving screw passes through the L-shaped support plate, the driving screw is rotatably connected to the L-shaped support plate, and the driving screw is threadedly connected to the driving block;

[0023] The knob is fixedly arranged on one end of the driving screw rod passing through the L-shaped support plate.

[0024] Preferably, a hexagonal hole is formed on the end surface of the knob away from the L-shaped support plate.

[0025] Preferably, the transmission part includes:

[0026] A transmission plate, fixedly arranged on the driving block;

[0027] There are two tooth plates, and the two tooth plates are symmetrically arranged on the transmission plate, and the tooth plates are fixedly connected to the transmission plate.

[0028] Preferably, the adjustment unit includes:

[0029] There are two longitudinal axes, and the two longitudinal axes are symmetrically arranged on both sides of the same bearing groove. One end of the longitudinal axis is rotatably connected to the cushion block, and the other end of the longitudinal axis passes through the bottom plate, the first inner plate, the second inner plate and the top plate, and the longitudinal axis is rotatably connected to the bottom plate, the first inner plate, the second inner plate and the top plate. The portion of the longitudinal axis located in the adjustment groove is provided with screw threads, and the screw threads on the longitudinal axes on both sides of the same bearing groove have opposite thread rotation directions. The longitudinal axis is threadedly connected to the adjustment plate through the screw threads;

[0030] An adjusting gear is fixedly arranged at an end of the longitudinal axis away from the bottom film, and the adjusting gear is meshed with the tooth plate.

[0031] Preferably, the fixing mechanism comprises:

[0032] There are multiple ceramic rods, and the multiple ceramic rods are evenly arranged on the pad, and the pad and the top plate are respectively passed through the two ends of the ceramic rod;

[0033] a ceramic sleeve, located between the bottom sheet, the first inner sheet, the second inner sheet and the top sheet, and the ceramic sleeve is sleeved on the ceramic rod;

[0034] Nuts are threadedly arranged at both ends of the ceramic rod, and the nuts are used to lock the ceramic rod.

[0035] In summary, due to the adoption of the above technical solution, the beneficial effects of the present invention are:

[0036] 1. This device is equipped with an adjustment mechanism, which makes it suitable for carrying and placing silicon wafers of different thicknesses to be coated, thereby effectively preventing the silicon wafers from shifting, tilting and falling during the coating process, thereby improving the uniformity of the coating on the silicon wafer surface and effectively reducing the scrap rate of the silicon wafer coating.

[0037] 2. This device eliminates the traditional card points, avoids the card points blocking the silicon wafer surface, reduces the problem of uneven silicon wafer coating caused by contact points (such as "card point marks"), and thus improves the photoelectric conversion efficiency of the battery cell; and the horizontal structure of this device can be adapted to different photovoltaic cell preparation processes, and when the battery cell is placed horizontally, it can avoid the color difference problem caused by uneven airflow in the vertical direction. At the same time, because the battery silicon wafer is placed horizontally, it avoids the battery cell slipping or collision caused by uneven force at the card points of the traditional vertical graphite boat, thereby reducing the defective rate. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0039] Figure 1 A schematic diagram of the three-dimensional structure of a horizontal graphite boat used for silicon wafer coating is shown.

[0040] Figure 2 A front view of a horizontal graphite boat used for coating silicon wafers is shown.

[0041] Figure 3 A side view of a horizontal graphite boat used for coating silicon wafers is shown.

[0042] Figure 4 A top view of a horizontal graphite boat used for coating silicon wafers is shown.

[0043] Figure 5 A partial structural schematic diagram of a horizontal graphite boat used for silicon wafer coating is shown.

[0044] Figure 6 Shown Figure 5 Exploded view of the structure.

[0045] Figure 7 Shown Figure 6A magnified schematic diagram of the local structure at point A in the middle.

[0046] Figure 8 A half-section schematic diagram of a horizontal graphite boat used for silicon wafer coating is shown.

[0047] Legend:

[0048] 1. Bottom plate; 2. Top plate; 3. First inner plate; 4. Second inner plate; 5. Through slot; 6. Carrying frame; 7. Carrying slot; 8. Adjustment slot; 9. Carrying plate; 10. Adjustment plate; 11. Pad; 12. Boat foot; 13. Lower electrode block; 14. Upper electrode block; 15. Graphite spacer; 16. L-shaped support plate; 17. Fixed block; 18. Drive slot; 19. Drive block; 20. Drive screw; 21. Knob; 22. Hexagonal hole; 23. Transmission plate; 24. Tooth plate; 25. Longitudinal axis; 26. Screw thread; 27. Adjustment gear; 28. Ceramic rod; 29. ​​Ceramic sleeve; 30. Nut. DETAILED DESCRIPTION

[0049] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0050] In the description of the present invention, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention.

[0051] It should be noted that when a component is referred to as being "fixed to" another component, it may be directly on the other component or there may also be a central component. When a component is considered to be "connected to" another component, it may be directly connected to the other component or there may also be a central component. When a component is considered to be "set on" another component, it may be directly set on the other component or there may also be a central component. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only.

[0052] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature identified as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0053] Reference Figures 1 to 8 An embodiment of a horizontal graphite boat for coating silicon wafers according to the present invention is further described.

[0054] A horizontal graphite boat for silicon wafer coating comprises a bottom sheet 1 and a top sheet 2, a plurality of equally spaced first inner sheets 3 are arranged between the bottom sheet 1 and the top sheet 2, a plurality of equally spaced second inner sheets 4 are also arranged between the bottom sheet 1 and the top sheet 2, and the plurality of first inner sheets 3 and the plurality of second inner sheets 4 are alternately arranged between the bottom sheet 1 and the top sheet 2. It should be noted that the electrode polarities of the alternately arranged first inner sheets 3 and second inner sheets 4 are different, and graphite spacers 15 for supporting the four corners of each are arranged between the bottom sheet 1, the first inner sheet 3, the second inner sheet 4 and the top sheet 2. It should be noted that by providing the graphite spacers 15, the bottom sheet 1, the first inner sheet 3, the second inner sheet 4 and the top sheet 2 are isolated, thereby avoiding short circuit during operation of the device.

[0055] The first inner sheet 3 and the second inner sheet 4 are both provided with a plurality of equally spaced through grooves 5, wherein a supporting portion for supporting the silicon wafer is fixedly provided in the through grooves 5, and the supporting portion includes:

[0056] The carrying frame 6 is located in the through groove 5, and a carrying groove 7 is formed on the surface of the carrying frame 6 away from the bottom film 1, and two symmetrically arranged adjustment grooves 8 are formed in the carrying groove 7;

[0057] A carrying plate 9 is slidably disposed in the carrying groove 7, and an adjusting plate 10 is fixedly disposed on the end surface of the carrying plate 9 close to the adjusting groove 8, and the adjusting plate 10 is slidably connected to the adjusting groove 8;

[0058] It should be noted that, by providing a carrying groove 7 on the carrying frame 6, it is convenient for the carrying plate 9 to slide in the carrying groove 7, so as to change the distance between the surface of the carrying plate 9 away from the film 1 and the surface of the carrying frame 6 away from the film 1, so as to adapt to the carrying work of silicon wafers of different thicknesses; by providing the carrying plate 9, the device can support the silicon wafer to be coated, and the adjustment plate 10 is provided to drive the carrying plate 9 to slide in the carrying groove 7.

[0059] A supporting portion for supporting the bottom film 1 is provided below the bottom film 1, and the supporting portion includes:

[0060] There are two pads 11, and the two pads 11 are symmetrically arranged below the bottom film 1, and the pads 11 are used to provide support for the bottom film 1;

[0061] Boat legs 12 are provided at both ends of the pad 11. The boat legs 12 are used to improve the stability of the pad 11 in supporting the bottom film 1. The boat legs 12 are provided with a lower electrode block 13.

[0062] The upper electrode block 14 is disposed between any first inner sheet 3 and the second inner sheet 4 . The upper electrode block 14 and the lower electrode block 13 are used to connect to external electrodes.

[0063] The support portion is provided with an adjustment mechanism, and the adjustment mechanism includes:

[0064] There are multiple L-shaped support plates 16, and the multiple L-shaped support plates 16 are equidistantly arranged on the pad 11 on any side, and the L-shaped support plates 16 are fixedly connected to the pad 11;

[0065] The driving part has multiple groups, and the multiple groups of driving parts are respectively arranged on the corresponding L-shaped support plates 16. The driving part includes:

[0066] A fixed block 17 is provided on the top sheet 2 , and a driving groove 18 is provided on the surface of the fixed block 17 away from the bottom sheet 1 , and a driving block 19 is slidably provided in the driving groove 18 ;

[0067] The transmission part is provided on the driving block 19 and cooperates with the adjusting part. The transmission part includes:

[0068] The transmission plate 23 is fixedly mounted on the driving block 19;

[0069] There are two tooth plates 24, and the two tooth plates 24 are symmetrically arranged on the transmission plate 23, and the tooth plates 24 are fixedly connected to the transmission plate 23;

[0070] A drive screw 20 is located in the drive groove 18, and one end of the drive screw 20 away from the L-shaped support plate 16 is rotatably connected to the fixed block 17, and the other end of the drive screw 20 passes through the L-shaped support plate 16. The drive screw 20 is rotatably connected to the L-shaped support plate 16, and the drive screw 20 is threadedly connected to the drive block 19;

[0071] The knob 21 is fixedly provided at one end of the driving screw 20 passing through the L-shaped support plate 16. A hexagonal hole 22 is provided on the end surface of the knob 21 away from the L-shaped support plate 16. It should be noted that by providing the hexagonal hole 22 on the knob 21, when it is inconvenient for the staff to manually rotate the knob 21, the staff can use an Allen wrench to rotate the knob 21, thereby increasing the diversity of the rotation of the driving knob 21 to cope with the situation where it is inconvenient for the staff to directly rotate the knob 21 manually;

[0072] There are multiple groups of adjustment parts, and the multiple groups of adjustment parts are equidistantly arranged on the bottom film 1. The adjustment parts are used to adjust the position of adjacent supporting plates 9 in the supporting groove 7. The adjustment parts include:

[0073] There are two longitudinal shafts 25, and the two longitudinal shafts 25 are symmetrically arranged on both sides of the same bearing slot 7. One end of the longitudinal shaft 25 is rotatably connected to the cushion block 11, and the other end of the longitudinal shaft 25 passes through the bottom plate 1, the first inner plate 3, the second inner plate 4, and the top plate 2. The longitudinal shaft 25 is rotatably connected to the bottom plate 1, the first inner plate 3, the second inner plate 4, and the top plate 2. The portion of the longitudinal shaft 25 located in the adjustment slot 8 is provided with a screw thread 26, and the screw threads 26 on the longitudinal shafts 25 on both sides of the same bearing slot 7 have opposite thread rotation directions. The longitudinal shaft 25 is threadedly connected to the adjustment plate 10 via the screw thread 26;

[0074] The adjusting gear 27 is fixedly disposed on the end of the longitudinal shaft 25 away from the bottom film 1 , and the adjusting gear 27 is engaged with the toothed plate 24 .

[0075] During operation, the distance between the surface of the carrier plate 9 away from the film 1 and the surface of the carrier frame 6 away from the film 1 is adjusted according to the thickness of the silicon wafer to be coated. The specific process is as follows: the staff manually rotates the knob 21, thereby rotating the drive screw 20 fixedly connected to the knob 21. The threaded transmission between the drive screw 20 and the drive block 19 causes the drive block 19 to slide in the drive groove 18, thereby causing the transmission plate 23 fixedly connected to the drive block 19 to move, thereby causing the toothed plate 24 provided on the transmission plate 23 to move. The toothed plate 24 on the transmission plate 23 cooperates with the adjusting gears 27 on both sides, thereby causing the longitudinal shaft 25 fixedly connected to the adjusting gear 27 to rotate. The threaded transmission between the screw teeth 26 on the longitudinal shaft 25 and the adjusting plate 10 causes the adjusting plate 10 to drive the carrier plate 9 to slide in the carrying groove 7, thereby changing the distance between the surface of the carrier plate 9 away from the film 1 and the surface of the carrier frame 6 away from the film 1 until the surface of the silicon wafer to be coated is flush with the surface of the carrier frame 6 away from the film 1.

[0076] The device is provided with an adjustment mechanism, which makes it suitable for carrying and placing silicon wafers to be coated with different thicknesses, thereby effectively preventing the silicon wafers from shifting, tilting and falling during the coating process, thereby improving the uniformity of the coating on the silicon wafer surface and effectively reducing the scrap rate of the silicon wafer coating.

[0077] The support portion is provided with a fixing mechanism for fixing the bottom sheet 1, the first inner sheet 3, the second inner sheet 4 and the top sheet 2, and the fixing mechanism includes:

[0078] There are multiple ceramic rods 28, and the multiple ceramic rods 28 are evenly arranged on the cushion block 11, and the two ends of the ceramic rods 28 pass through the cushion block 11 and the top plate 2 respectively;

[0079] The ceramic sleeve 29 is located between the bottom sheet 1, the first inner sheet 3, the second inner sheet 4, and the top sheet 2, and is sleeved on the ceramic rod 28. It should be noted that the ceramic sleeve 29 is provided to isolate the first inner sheet 3 and the second inner sheet 4 to avoid short circuit.

[0080] Nuts 30 are threadedly disposed at both ends of the ceramic rod 28 , and the nuts 30 are used to lock the ceramic rod 28 .

[0081] It should be noted that this device eliminates the traditional card points, avoids the card points blocking the silicon wafer surface, reduces the problem of uneven silicon wafer coating caused by contact points (such as "card point marks"), and thus improves the photoelectric conversion efficiency of the battery cell; and the horizontal structure of this device can be adapted to different photovoltaic cell preparation processes, and when the battery cell is placed horizontally, it can avoid the color difference problem caused by uneven vertical airflow. At the same time, because the battery silicon wafer is placed horizontally, it avoids the battery cell slipping or collision caused by uneven force at the card points of the traditional vertical graphite boat, thereby reducing the defective rate.

[0082] Working principle: During operation, the distance between the surface of the carrier plate 9 away from the film 1 and the surface of the carrier frame 6 away from the film 1 is adjusted according to the thickness of the silicon wafer to be coated. The specific process is as follows: the staff manually rotates the knob 21, so that the driving screw 20 fixedly connected to the knob 21 rotates, and the threaded transmission between the driving screw 20 and the driving block 19 makes the driving block 19 slide in the driving groove 18, thereby making the transmission plate 23 fixedly connected to the driving block 19 move, thereby making the gear plate 24 set on the transmission plate 23 move, and the gear plate 24 on the transmission plate 23 cooperates with the adjusting gears 27 on both sides, thereby making the longitudinal shaft 25 fixedly connected to the adjusting gear 27 rotate, and the threaded transmission between the screw teeth 26 on the longitudinal shaft 25 and the adjusting plate 10, thereby making the adjusting plate 10 drive the carrier plate 9 to slide in the carrying groove 7, thereby changing the distance between the surface of the carrier plate 9 away from the film 1 and the surface of the carrier frame 6 away from the film 1 until the surface of the silicon wafer to be coated is flush with the surface of the carrier frame 6 away from the film 1.

[0083] The above description of the embodiments is intended to enable one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not limited to the embodiments shown herein but is intended to conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A horizontal graphite boat for silicon wafer coating, comprising a bottom sheet (1) and a top sheet (2), characterized in that: A plurality of first inner sheets (3) distributed at equal intervals are provided between the bottom sheet (1) and the top sheet (2), and a plurality of second inner sheets (4) distributed at equal intervals are further provided between the bottom sheet (1) and the top sheet (2), and the plurality of first inner sheets (3) and the plurality of second inner sheets (4) are alternately provided between the bottom sheet (1) and the top sheet (2), and a plurality of through grooves (5) distributed at equal intervals are provided through the first inner sheet (3) and the second inner sheet (4), and a supporting portion for supporting a silicon wafer is fixedly provided in the through groove (5), and a supporting portion for supporting the bottom sheet (1) is provided below the bottom sheet (1), and a fixing mechanism for fixing the bottom sheet (1), the first inner sheet (3), the second inner sheet (4) and the top sheet (2) is provided on the supporting portion, and an adjustment mechanism is provided on the supporting portion; The bearing portion includes: A carrying frame (6) is located in the through groove (5), and a carrying groove (7) is provided on the surface of the carrying frame (6) away from the bottom film (1), and two symmetrically arranged adjustment grooves (8) are provided in the carrying groove (7); A bearing plate (9) is slidably arranged in the bearing groove (7), and an adjustment plate (10) is fixedly arranged on the end surface of the bearing plate (9) close to the adjustment groove (8), and the adjustment plate (10) is slidably connected to the adjustment groove (8); The regulating mechanism comprises: There are multiple L-shaped support plates (16), and the multiple L-shaped support plates (16) are equidistantly arranged on the cushion block (11) on any side, and the L-shaped support plates (16) are fixedly connected to the cushion block (11); The driving part has multiple groups, and the multiple groups of driving parts are respectively arranged on corresponding L-shaped support plates (16); There are multiple groups of adjustment parts, and the multiple groups of adjustment parts are equidistantly arranged on the bottom film (1), and the adjustment parts are used to adjust the positions of adjacent supporting plates (9) in the supporting groove (7).

2. The horizontal graphite boat for silicon wafer coating according to claim 1, characterized in that: The support portion includes: There are two pads (11), and the two pads (11) are symmetrically arranged below the bottom film (1), and the pads (11) are used to provide support for the bottom film (1); Boat feet (12) are provided at both ends of the pad (11), the boat feet (12) are used to improve the stability of the pad (11) supporting the bottom film (1), and a lower electrode block (13) is provided on the boat feet (12); An upper electrode block (14) is arranged between any first inner plate (3) and any second inner plate (4), and the upper electrode block (14) and the lower electrode block (13) are used to be connected to external electrodes.

3. The horizontal graphite boat for silicon wafer coating according to claim 2, characterized in that: Graphite spacers (15) for supporting the four corners of each are provided between the bottom sheet (1), the first inner sheet (3), the second inner sheet (4), and the top sheet (2).

4. The horizontal graphite boat for silicon wafer coating according to claim 3, characterized in that: The driving unit includes: A fixed block (17) is provided on the top sheet (2); a driving groove (18) is provided on a surface of the fixed block (17) away from the bottom sheet (1); a driving block (19) is slidably provided in the driving groove (18); A transmission part is provided on the driving block (19), and the transmission part cooperates with the adjustment part; A driving screw rod (20) is located in the driving groove (18), and one end of the driving screw rod (20) away from the L-shaped support plate (16) is rotatably connected to the fixed block (17), and the other end of the driving screw rod (20) passes through the L-shaped support plate (16). The driving screw rod (20) is rotatably connected to the L-shaped support plate (16), and the driving screw rod (20) is threadedly connected to the driving block (19); The knob (21) is fixedly arranged on one end of the driving screw (20) passing through the L-shaped support plate (16).

5. The horizontal graphite boat for silicon wafer coating according to claim 4, characterized in that: The end surface of the knob (21) away from the L-shaped support plate (16) is provided with a hexagonal hole (22).

6. The horizontal graphite boat for silicon wafer coating according to claim 5, characterized in that: The transmission part includes: A transmission plate (23) is fixedly mounted on the driving block (19); There are two tooth plates (24), and the two tooth plates (24) are symmetrically arranged on the transmission plate (23), and the tooth plates (24) are fixedly connected to the transmission plate (23).

7. The horizontal graphite boat for silicon wafer coating according to claim 6, characterized in that: The adjustment unit includes: There are two longitudinal axes (25), and the two longitudinal axes (25) are symmetrically arranged on both sides of the same bearing groove (7), one end of the longitudinal axis (25) is rotatably connected to the pad (11), and the other end of the longitudinal axis (25) is penetrated by the bottom plate (1), the first inner plate (3), the second inner plate (4) and the top plate (2), and the longitudinal axis (25) is rotatably connected to the bottom plate (1), the first inner plate (3), the second inner plate (4) and the top plate (2), and the portion of the longitudinal axis (25) located in the adjustment groove (8) is provided with a screw thread (26), and the screw threads (26) on the longitudinal axes (25) on both sides of the same bearing groove (7) have opposite directions of rotation, and the longitudinal axis (25) is threadedly connected to the adjustment plate (10) through the screw thread (26); An adjusting gear (27) is fixedly arranged at an end of the longitudinal axis (25) away from the bottom plate (1), and the adjusting gear (27) is meshed with the toothed plate (24).

8. The horizontal graphite boat for silicon wafer coating according to claim 7, characterized in that: The fixing mechanism comprises: There are multiple ceramic rods (28), and the multiple ceramic rods (28) are evenly arranged on the cushion block (11), and the two ends of the ceramic rods (28) are respectively penetrated by the cushion block (11) and the top plate (2); A ceramic sleeve (29) is located between the bottom sheet (1), the first inner sheet (3), the second inner sheet (4), and the top sheet (2), and the ceramic sleeve (29) is sleeved on the ceramic rod (28); Nuts (30) are threadedly provided at both ends of the ceramic rod (28), and the nuts (30) are used to lock the ceramic rod (28).

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