Device and method for aligning and adjusting dual-path transmitting and receiving slits

Abstract

The invention relates to a device and a method for aligning and adjusting double-path transceiving slits. Comprising a dual-path transceiving slit module which comprises a transmitting slit, a beam splitter prism and a receiving slit, a detection light beam is transmitted by the transmitting slit, and the detection light beam is focused on the receiving slit after being reflected by a detected object; the slit module fixing seat is used for installing and fixing the dual-path transceiving slit module on a corresponding base; the receiving slit posture adjusting module is used for controlling the translational motion of the receiving slit in the X / Y / Z axial direction and the rotational motion of the receiving slit around the Y / Z axial direction; the slit coincidence monitoring module is used for monitoring the projection coincidence state of the transmitting slit conjugate virtual image and the receiving slit on the XOY plane in real time; and the slit focusing monitoring module is used for monitoring the distance difference between the conjugate virtual image of the transmitting slit and the specified point on the receiving slit along the Z axis in real time. According to the invention, a point spectrum confocal measurement technology and a high-power microscopic imaging technology are introduced into the double-path transmitting-receiving slit aligning and adjusting device, so that the problem that the requirement on the adjusting precision of a double-path transmitting-receiving slit module is high is solved.

Description

Technical Field

[0001] The present invention relates to the technical field of optical precision alignment, and in particular to a dual-path transceiver slit alignment and alignment device and method. Background Art

[0002] Line scanning of line spectrum confocal displacement measurement technology can improve the low efficiency of single-point scanning of point spectrum confocal displacement measurement technology. It is often used in three-dimensional morphology detection scenarios, such as mobile phone screen curvature detection, mobile phone appearance detection, semiconductor component detection, lithium battery production process detection, etc., and has high commercial value.

[0003] In the line spectrum confocal displacement sensor, the emitting slit is combined with a high-precision lens to emit a detection beam, achieving linear light illumination on the surface of the object being measured; the signal light reflected by the object being measured passes through the high-precision lens and is focused on the receiving slit; the emitting slit and the receiving slit are both conjugate to the object being measured. In order to prevent direct crosstalk between the emitting and reflected beams, a beam splitter prism is generally used to place the emitting and receiving slits in two independent optical paths, such as Figure 1 As shown in the figure. If the conjugate virtual image of the transmitting slit and the projection of the receiving slit on the XOY plane do not overlap well, the signal light passing through the receiving slit will be uneven along the slit line, resulting in low signal intensity at some locations, seriously affecting the sampling rate. If the transmitting and receiving slits are not in focus, the signal passing through the receiving slit will be subject to interference from stray peaks, seriously affecting measurement accuracy. To ensure the sampling rate and measurement accuracy of the linear spectrum confocal displacement sensor, the transmitting and receiving slits must be aligned with high precision. Summary of the Invention

[0004] The purpose of the present invention is to overcome the problems existing in the prior art and provide a dual-path receiving and transmitting slit alignment and adjustment device and method. The device utilizes point spectrum confocal measurement technology and high-power microscopy imaging technology to monitor the spatial relative state of the receiving slit and the transmitting slit in real time. With the help of a precision displacement and angle adjustment module, the device achieves both high precision and high efficiency.

[0005] In order to achieve the above technical objectives and the above technical effects, the present invention is implemented through the following technical solutions:

[0006] A dual-channel transceiver slot alignment and adjustment device, the device comprising:

[0007] The dual-path transceiver slit module includes a transmitting slit, a beam splitter prism, and a receiving slit. The transmitting slit emits a detection beam, which is reflected by the object being measured and focused on the receiving slit. The beam splitter prism places the transmitting slit and the receiving slit in two independent optical paths.

[0008] The slot module fixing seat is used to install and fix the dual-channel transceiver slot module on the corresponding base;

[0009] The receiving slit attitude adjustment module is used to control the translation movement of the receiving slit in the X / Y / Z axes and the rotation movement of the receiving slit around the Y / Z axes;

[0010] Slit coincidence monitoring module, used to monitor in real time the coincidence status of the conjugate virtual image of the transmitting slit and the projection of the receiving slit in the XOY plane;

[0011] The slit focus monitoring module is used to monitor the distance difference along the Z axis between the conjugate virtual image of the transmitting slit and the specified point on the receiving slit in real time.

[0012] Furthermore, the dual-channel transceiver slot module further includes a receiving slot mounting seat and a slot fixing seat, wherein:

[0013] The beam splitter prism is used to split a beam of light into two beams of transmitted light and reflected light;

[0014] The receiving slit mounting seat is used to mount the receiving slit;

[0015] The slit fixing seat is used to support the emitting slit, the beam splitter prism, the receiving slit and the receiving slit mounting seat.

[0016] Furthermore, the receiving slit attitude adjustment module includes a translation dimension adjustment module, a rotation dimension adjustment module and an attitude adjustment adapter, wherein:

[0017] The translation dimension adjustment module includes three linear translation slides, which are used to control the translation movement of the receiving slit in the X / Y / Z axes respectively;

[0018] The rotation dimension adjustment module includes a rotating stage and an arc swing slide, which are respectively used to control the rotation movement of the receiving slit around the Y / Z axis;

[0019] The posture adjustment adapter is used to connect the rotation dimension adjustment module, the translation dimension adjustment module and the receiving slit mounting seat. When the states of the translation dimension adjustment module and the rotation dimension adjustment module change, the receiving slit mounting seat drives the receiving slit to move accordingly.

[0020] Furthermore, the slit overlap monitoring module includes a high-power microscope, a microscope focusing slide, and an overlap monitoring auxiliary reflecting prism, wherein:

[0021] The high-power microscope is used to monitor in real time the overlapping state of the conjugate virtual image of the transmitting slit and the projection of the receiving slit on the XOY plane;

[0022] The microscope focusing slide is used to adjust the height of the high-power microscope relative to the coincidence monitoring auxiliary reflection prism;

[0023] The light reflected by the emitting slit is reflected by the dichroic prism and the coincidence monitoring auxiliary reflecting prism in sequence, and is imaged on the high-power microscope image plane. The light reflected by the receiving slit is transmitted through the dichroic prism, and is reflected by the coincidence monitoring auxiliary reflecting prism, and is imaged on the high-power microscope image plane. The coincidence state of the emitting slit image and the receiving slit image projected on the XOY plane is observed with the field of view within the high-power microscope.

[0024] Furthermore, the slit focus monitoring module includes a point spectrum confocal displacement probe, a sensor linear fine-tuning slide, and a focus monitoring auxiliary reflective prism, wherein:

[0025] The point spectrum confocal displacement probe is used to monitor the distance difference between the conjugate virtual image of the transmitting slit and the designated point of the receiving slit along the Z axis in real time;

[0026] The sensor linear fine-tuning slide is used to adjust the distance between the point spectrum confocal displacement probe and the focus monitoring auxiliary reflection prism;

[0027] The light reflected by the emitting slit is transmitted through the dichroic prism, reflected by the focus monitoring auxiliary reflection prism, and enters the point spectrum confocal displacement probe. The light reflected by the receiving slit is reflected by the dichroic prism and the focus monitoring auxiliary reflection prism in sequence, and enters the point spectrum confocal displacement probe. The position signals of the designated points of the emitting slit and the receiving slit are observed through the display of the spectral confocal displacement sensor corresponding to the point spectrum confocal displacement probe. The distance difference between the two position signals corresponds to the distance difference between the conjugate virtual image of the emitting slit and the receiving slit along the Z axis.

[0028] Furthermore, two sets of the point spectrum confocal displacement probes and sensor linear fine-tuning slides are provided to respectively monitor the feedback position signals of two designated points on the slit, and the focusing state of the two designated points represents the focusing state of all points on the slit straight line.

[0029] A method for aligning and adjusting a dual-channel transceiver slit according to the present invention comprises the following steps:

[0030] Step S1: Install the slit module fixing seat, the receiving slit attitude adjustment module, the slit overlap monitoring module, the slit focus monitoring module, and the dual-channel transceiver slit module on the base;

[0031] Step S2: Adjust the microscope focusing slide so that the emission slit is clearly imaged in the center of the microscope field of view, and lock the microscope focusing slide;

[0032] Step S3: Adjust the linear fine-tuning slides of the first set of sensors so that the first designated point of the emission slit is within the measurement range of the point spectrum confocal displacement probe and the feedback position signal of the first designated point of the emission slit is visible on the display, lock the linear fine-tuning slides of the sensors, adjust the linear fine-tuning slides of the second set of sensors so that the second designated point of the emission slit is within the measurement range of the point spectrum confocal displacement probe and the feedback position signal of the second designated point of the emission slit is visible on the display, and lock the linear fine-tuning slides of the sensors;

[0033] Step S4: Fix the receiving slit to the receiving slit mounting base, connect the attitude adjustment adapter to the receiving slit mounting base, and coarsely adjust the receiving slit attitude adjustment module so that the image of the receiving slit enters the field of view of the microscope and the two designated points of the receiving slit enter the measurement range of the point spectrum confocal displacement probe. Two sets of transmission slit and receiving slit feedback position signals appear on the display;

[0034] Step S5: Fine-tune the X / Y axis linear translation slide and the arc swing slide, paying attention to the overlap between the receiving slit image and the transmitting slit image in the microscope field of view;

[0035] Step S6: Fine-tune the Z-axis linear translation slide and the rotation stage, and pay attention to the overlapping state of the feedback position signals of the two sets of transmitting slits and receiving slits on the display;

[0036] Step S7: Steps S5 and S6 are performed alternately until the receiving slit image and the transmitting slit image in the microscope field of view completely overlap, and the two sets of transmitting slit and receiving slit feedback position signals on the display overlap;

[0037] Step S8: Fix the receiving slit mounting seat and the slit fixing seat by dispensing glue.

[0038] The beneficial effects of the present invention are:

[0039] 1. The present invention uses high-precision position monitoring using point-spectral confocal measurement technology and high-resolution image monitoring using a high-magnification microscopic imaging system, supplemented by the precise displacement and angle adjustment capabilities of the fine-tuning slide assembly. This enables sub-micron focusing and split-second posture matching, while achieving high-precision assembly and adjustment of the dual-channel transceiver slit module.

[0040] 2. It has the simultaneous monitoring of slit overlap and slit focus, the real-time slit state adjustment and slit state monitoring, and the high efficiency of the dual-channel transceiver slit module installation and adjustment;

[0041] 3. The devices integrated in the adjustment device, such as the point spectrum confocal displacement probe, high-power microscope and fine-tuning slide group, are all mature products. The adjustment device has high reliability, easy procurement and low cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] Figure 1 This is an example of the usage of the dual-channel transceiver slot module;

[0043] Figure 2 Schematic diagram of the three-dimensional structure of the device of the present invention;

[0044] Figure 3 Schematic diagram of the slit overlap monitoring device of the present invention;

[0045] Figure 4 Schematic diagram of the slit focus monitoring device of the present invention;

[0046] Figure 5 This is a schematic diagram of the slit overlap monitoring principle of the present invention;

[0047] Figure 6 This is a schematic diagram of the slit focus monitoring principle of the present invention.

[0048] Explanation of the numbers in the figure: 1. Slit module fixing seat, 2. Receiving slit attitude adjustment module, 21. Translation dimension adjustment module, 22. Rotation dimension adjustment module, 23. Attitude adjustment adapter, 3. Slit coincidence monitoring module, 31. High-power microscope, 32. Microscope focusing slide, 33. Coincidence monitoring auxiliary reflection prism, 4. Slit focus monitoring module, 41. Point spectrum confocal displacement probe, 42. Sensor linear fine-tuning slide, 43. Focus monitoring auxiliary reflection prism, 5. Dual-channel transceiver slit module, 51. Transmitting slit, 52. Beam splitter, 53. Receiving slit, 54. Receiving slit mounting seat, 55. Slit fixing seat, 6. Base. DETAILED DESCRIPTION

[0049] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments.

[0050] A dual-channel transceiver slot alignment and adjustment device, such as Figure 2 As shown, the device includes:

[0051] The dual-path transceiver slit module 5 includes a transmitting slit 51, a beam splitter prism 52, and a receiving slit 53. The transmitting slit 51 emits a detection beam, which is reflected by the object to be measured and focused on the receiving slit 53. The beam splitter prism 52 places the transmitting slit 51 and the receiving slit 53 in two independent optical paths.

[0052] The slot module fixing base 1 is used to install and fix the dual-channel transceiver slot module 5 on the corresponding base 6;

[0053] The receiving slit posture adjustment module 2 is used to control the translation movement of the receiving slit 53 in the X / Y / Z axes and the rotation movement of the receiving slit around the Y / Z axes;

[0054] The slit overlap monitoring module 3 is used to monitor in real time the overlap state of the conjugate virtual image of the transmitting slit 51 and the projection of the receiving slit 53 on the XOY plane;

[0055] The slit focus monitoring module 4 is used to monitor in real time the distance difference between the conjugate virtual image of the transmitting slit 51 and a designated point on the receiving slit 53 along the Z axis.

[0056] The dual-channel transceiver slot module 5 further includes a receiving slot mounting base 54 and a slot fixing base 55, wherein:

[0057] The beam splitter prism 52 is used to split a beam of light into two beams of transmitted light and reflected light;

[0058] The receiving slot mounting seat 54 is used to mount the receiving slot 53;

[0059] The slit fixing seat 55 is used to support the emitting slit 51 , the beam splitter prism 52 , the receiving slit 53 and the receiving slit mounting seat 54 .

[0060] The receiving slit attitude adjustment module 2 includes a translation dimension adjustment module 21, a rotation dimension adjustment module 22 and an attitude adjustment adapter 23, wherein:

[0061] The translation dimension adjustment module 21 includes three linear translation slides, which are used to control the translation movement of the receiving slit 53 in the X / Y / Z axes respectively;

[0062] The rotation dimension adjustment module 22 includes a rotating table and an arc swing slide. The rotating table is a high-precision rotating table that provides Y-axis rotation, and the arc swing slide is a high-precision arc swing slide that provides Z-axis rotation, which are respectively used to control the rotation of the receiving slit 53 around the Y / Z axis;

[0063] The posture adjustment adapter 23 is used to connect the rotation dimension adjustment module 22, the translation dimension adjustment module 21 and the receiving slit mounting seat 54. When the states of the translation dimension adjustment module 21 and the rotation dimension adjustment module 22 change, the receiving slit mounting seat 54 drives the receiving slit 53 to move accordingly.

[0064] The slit overlap monitoring module 3 includes a high-power microscope 31, a microscope focusing slide 32 and an overlap monitoring auxiliary reflecting prism 33, wherein:

[0065] The high-power microscope 31 is used to monitor in real time the overlapping state of the conjugate virtual image of the transmitting slit 51 and the projection of the receiving slit 53 on the XOY plane. Figure 3 As shown;

[0066] The microscope focusing slide 32 is used to adjust the height of the high-power microscope 31 relative to the coincidence monitoring auxiliary reflection prism 33;

[0067] The principle of slit overlap monitoring is as follows Figure 5As shown, the light reflected from the emission slit 51 is reflected by the beam splitter prism 52 and the coincidence monitoring auxiliary reflection prism 33 in sequence, and is imaged on the image plane of the high-power microscope 31, as shown in FIG. Figure 4 The light reflected by the receiving slit 53 is transmitted through the dichroic prism 52, and then reflected by the auxiliary reflection prism 33 of the coincidence monitoring, and is imaged on the image plane of the high-power microscope 31, as shown. Figure 4 As shown by the solid line in the microscope field of view; in this way, the overlapping state of the transmitting slit image and the receiving slit image projected on the XOY plane can be seen in the microscope field of view, realizing real-time monitoring of the overlapping state of the transmitting and receiving slits.

[0068] The slit focus monitoring module 4 includes a point spectrum confocal displacement probe 41, a sensor linear fine-tuning slide 42 and a focus monitoring auxiliary reflection prism 43, wherein:

[0069] The point spectrum confocal displacement probe 41 is used to monitor the distance difference between the conjugate virtual image of the transmitting slit 51 and the designated point of the receiving slit 53 along the Z axis in real time, such as Figure 4 As shown;

[0070] The sensor linear fine-tuning slide 42 is used to adjust the distance between the point spectrum confocal displacement probe 41 and the focus monitoring auxiliary reflection prism 43;

[0071] The principle of slit focus monitoring is as follows Figure 6 As shown, the light reflected from the emission slit 51 is transmitted through the dichroic prism 52, then reflected by the focus monitoring auxiliary reflection prism 43, and enters the point spectrum confocal displacement probe 41, corresponding to Figure 5 The dotted line signal in the middle slit feedback position signal; the light reflected by the receiving slit 53 is reflected by the dichroic prism 52 and the focus monitoring auxiliary reflection prism 43 in turn, and enters the point spectrum confocal displacement probe 41, corresponding to Figure 5 The solid line signal in the middle slit feedback position signal; in this way, the position signals of the designated points of the transmitting slit 51 and the receiving slit 53 can be seen on the display of the spectral confocal displacement sensor, and the distance difference between the two signals corresponds to the distance difference between the conjugate virtual image of the transmitting slit and the receiving slit along the Z axis.

[0072] Two sets of the point spectrum confocal displacement probes 41 and sensor linear fine-tuning slides 42 are provided to respectively monitor the feedback position signals of two designated points on the slit. The focusing state of the two designated points represents the focusing state of all points on the slit line.

[0073] A method for aligning and adjusting a dual-channel transceiver slit according to the present invention comprises the following steps:

[0074] Step S1: Press Figure 2As shown, the slit module fixing seat 1, the receiving slit attitude adjustment module 2, the slit overlap monitoring module 3, the slit focus monitoring module 4, and the dual-channel transceiver slit module 5 are installed on the base 6;

[0075] Step S2: Press Figure 3 As shown, adjust the microscope focusing slide 32 so that the emission slit 51 is clearly imaged in the center of the microscope field of view, and lock the microscope focusing slide 32;

[0076] Step S3: Press Figure 4 As shown, adjust the first set of sensor linear fine-tuning slides 42 so that the first designated point of the emission slit 51 is within the measurement range of the point spectrum confocal displacement probe 41, and the feedback position signal of the first designated point of the emission slit 51 is visible on the display, lock the sensor linear fine-tuning slides 42, adjust the second set of sensor linear fine-tuning slides 42 so that the second designated point of the emission slit 51 is within the measurement range of the point spectrum confocal displacement probe 41, and the feedback position signal of the second designated point of the emission slit 51 is visible on the display, and lock the sensor linear fine-tuning slides 42;

[0077] Step S4: Fix the receiving slit 53 to the receiving slit mounting base 54, connect the attitude adjustment adapter 23 to the receiving slit mounting base 54, and coarsely adjust the receiving slit attitude adjustment module 2 so that the image of the receiving slit 53 enters the field of view of the microscope and the two designated points of the receiving slit 53 enter the measurement range of the point spectrum confocal displacement probe 41. Two sets of feedback position signals of the transmitting slit 51 and the receiving slit 53 appear on the display;

[0078] Step S5: Fine-tune the X / Y axis linear translation slide and the arc swing slide (Z axis rotation), paying attention to the overlap of the receiving slit image and the transmitting slit image in the microscope field of view;

[0079] Step S6: Fine-tune the Z-axis linear translation slide and the rotation stage (Y-axis rotation), and pay attention to the overlapping state of the feedback position signals of the two sets of transmitting slits 51 and receiving slits 53 on the display;

[0080] Step S7: Steps S5 and S6 are performed alternately until the receiving slit image and the transmitting slit image in the microscope field of view completely overlap, and the feedback position signals of the two sets of transmitting slits 51 and receiving slits 53 on the display overlap;

[0081] Step S8: Fix the receiving slit mounting seat 54 and the slit fixing seat 55 by applying glue.

[0082] This invention utilizes the high-precision position monitoring of point spectral confocal measurement technology and the high-resolution image attitude monitoring of a high-magnification microscopic imaging system, supplemented by the precise displacement and angle adjustment capabilities of a fine-tuning slide assembly, to achieve submicron-level focusing and split-second attitude matching. This enables the dual-channel transceiver slit module to possess excellent signal capture and restoration capabilities, making it suitable for numerous high-precision measurement systems. Furthermore, the real-time nature of point spectral confocal measurement and high-magnification microscopic imaging monitoring enhances the efficiency of this alignment device's assembly and adjustment.

[0083] In addition, it should be noted that, unless otherwise specified or indicated, the terms "first", "second", etc. in the specification are only used to distinguish the various components, elements, steps, etc. in the specification, and are not used to indicate the logical relationship or sequential relationship between the various components, elements, steps, etc.

[0084] The foregoing description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art will readily appreciate that various modifications and variations of the present invention are possible. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the present invention.

Claims

1. A dual-channel transceiver slit alignment and adjustment device, characterized in that: The device includes: A dual-path transceiver slit module (5) includes a transmitting slit (51), a beam splitter prism (52), and a receiving slit (53). The transmitting slit (51) emits a detection light beam, which is reflected by the object to be measured and focused on the receiving slit (53). The transmitting slit (51) and the receiving slit (53) are placed in two independent light paths through the beam splitter prism (52). A slot module fixing seat (1) is used to install and fix the dual-channel transceiver slot module (5) on a corresponding base (6); A receiving slit attitude adjustment module (2) is used to control the translational movement of the receiving slit (53) in the X / Y / Z axes and the rotational movement of the receiving slit around the Y / Z axes; A slit overlap monitoring module (3) is used to monitor in real time the overlap state of the projection of the conjugate virtual image of the transmitting slit (51) and the receiving slit (53) on the XOY plane; The slit focus monitoring module (4) is used for real-time monitoring of the distance difference along the Z axis between the conjugate virtual image of the transmitting slit (51) and a designated point on the receiving slit (53).

2. The dual-channel transceiver slit alignment and adjustment device according to claim 1, characterized in that: The dual-channel transceiver slot module (5) further includes a receiving slot mounting seat (54) and a slot fixing seat (55), wherein: The beam splitter prism (52) is used to split a beam of light into two beams of light, a transmitted beam and a reflected beam; The receiving slit mounting seat (54) is used to mount the receiving slit (53); The slit fixing seat (55) is used to support the emission slit (51), the beam splitter prism (52), the receiving slit (53) and the receiving slit mounting seat (54).

3. The dual-channel transceiver slit alignment and adjustment device according to claim 2, characterized in that: The receiving slit attitude adjustment module (2) comprises a translation dimension adjustment module (21), a rotation dimension adjustment module (22) and an attitude adjustment adapter (23), wherein: The translation dimension adjustment module (21) includes three linear translation slides, which are respectively used to control the translation movement of the receiving slit (53) in the X / Y / Z axes; The rotation dimension adjustment module (22) includes a rotation table and an arc swing slide table, which are respectively used to control the rotation movement of the receiving slit (53) around the Y / Z axis; The posture adjustment adapter (23) is used to connect the rotation dimension adjustment module (22), the translation dimension adjustment module (21) and the receiving slit mounting seat (54); when the states of the translation dimension adjustment module (21) and the rotation dimension adjustment module (22) change, the receiving slit mounting seat (54) drives the receiving slit (53) to move accordingly.

4. The dual-channel transceiver slit alignment and adjustment device according to claim 3, characterized in that: The slit overlap monitoring module (3) comprises a high-power microscope (31), a microscope focusing slide (32), and an overlap monitoring auxiliary reflecting prism (33), wherein: The high-power microscope (31) is used to monitor in real time the overlapping state of the conjugate virtual image of the emission slit (51) and the projection of the receiving slit (53) on the XOY plane; The microscope focusing slide (32) is used to adjust the height of the high-power microscope (31) relative to the coincidence monitoring auxiliary reflection prism (33); The light reflected by the emitting slit (51) is reflected by the beam splitter prism (52) and the coincidence monitoring auxiliary reflection prism (33) in sequence, and is imaged on the image plane of the high-power microscope (31). The light reflected by the receiving slit (53) is transmitted through the beam splitter prism (52), and is reflected by the coincidence monitoring auxiliary reflection prism (33) and is imaged on the image plane of the high-power microscope (31). The coincidence state of the projection of the emitting slit image and the receiving slit image on the XOY plane is observed with the field of view within the high-power microscope (31).

5. The dual-channel transceiver slit alignment and adjustment device according to claim 4, characterized in that: The slit focus monitoring module (4) comprises a point spectrum confocal displacement probe (41), a sensor linear fine-tuning slide (42), and a focus monitoring auxiliary reflection prism (43), wherein: The point spectrum confocal displacement probe (41) is used to monitor in real time the distance difference between the conjugate virtual image of the transmitting slit (51) and a designated point of the receiving slit (53) along the Z axis; The sensor linear fine-tuning slide (42) is used to adjust the distance between the point spectrum confocal displacement probe (41) and the focus monitoring auxiliary reflection prism (43); The light reflected by the emitting slit (51) is transmitted through the dichroic prism (52), reflected by the focus monitoring auxiliary reflection prism (43), and enters the point spectrum confocal displacement probe (41). The light reflected by the receiving slit (53) is reflected by the dichroic prism (52) and the focus monitoring auxiliary reflection prism (43) in sequence, and enters the point spectrum confocal displacement probe (41). The position signals of the designated points of the emitting slit (51) and the receiving slit (53) are observed through the display of the spectral confocal displacement sensor corresponding to the point spectrum confocal displacement probe (41). The distance difference between the two position signals corresponds to the distance difference between the conjugate virtual image of the emitting slit (51) and the receiving slit (53) along the Z axis.

6. The dual-channel transceiver slit alignment and adjustment device according to claim 5, characterized in that: Two sets of the point spectrum confocal displacement probes (41) and sensor linear fine-tuning slides (42) are provided to respectively monitor feedback position signals of two designated points on the slit, and the focusing state of the two designated points represents the focusing state of all points on the slit straight line.

7. A method for assembling and adjusting the device according to any one of claims 1 to 6, characterized in that: The method comprises the following steps: Step S1: Install the slit module fixing base (1), the receiving slit attitude adjustment module (2), the slit overlap monitoring module (3), the slit focus monitoring module (4), and the dual-channel transceiver slit module (5) on the base (6); Step S2: adjusting the microscope focusing slide (32) so that the emission slit (51) is clearly imaged in the center of the microscope field of view, and locking the microscope focusing slide (32); Step S3: adjusting the first set of sensor linear fine-tuning slides (42) so that the first designated point of the emission slit (51) is within the measurement range of the point spectrum confocal displacement probe (41), and the feedback position signal of the first designated point of the emission slit (51) is visible on the display, locking the sensor linear fine-tuning slides (42), adjusting the second set of sensor linear fine-tuning slides (42) so that the second designated point of the emission slit (51) is within the measurement range of the point spectrum confocal displacement probe (41), and the feedback position signal of the second designated point of the emission slit (51) is visible on the display, and locking the sensor linear fine-tuning slides (42); Step S4: fixing the receiving slit (53) to the receiving slit mounting seat (54), connecting the attitude adjustment adapter (23) to the receiving slit mounting seat (54), and coarsely adjusting the receiving slit attitude adjustment module (2) so that the image of the receiving slit (53) enters the field of view of the microscope, and at the same time, both designated points of the receiving slit (53) enter the measurement range of the point spectrum confocal displacement probe (41), and two sets of feedback position signals of the transmitting slit (51) and the receiving slit (53) appear on the display; Step S5: Fine-tune the X / Y axis linear translation slide and the arc swing slide, paying attention to the overlap between the receiving slit image and the transmitting slit image in the microscope field of view; Step S6: fine-tune the Z-axis linear translation slide and the rotation stage, and pay attention to the overlapping state of the feedback position signals of the two sets of transmitting slits (51) and receiving slits (53) on the display; Step S7: Execute steps S5 and S6 in turn until the receiving slit image and the transmitting slit image in the microscope field of view completely overlap, and at the same time, the feedback position signals of the two sets of transmitting slits (51) and receiving slits (53) on the display overlap; Step S8: Fix the receiving slit mounting seat (54) and the slit fixing seat (55) by dispensing glue.

Images