Dimming diaphragm, manufacturing method thereof, dimming glass and vehicle

Abstract

The invention discloses a dimming diaphragm, a manufacturing method of the dimming diaphragm, dimming glass and a vehicle. The dimming diaphragm comprises a first base material layer, a dimming layer, a second base material layer, a first conductive layer arranged between the first base material layer and the dimming layer and a second conductive layer arranged between the second base material layer and the dimming layer. The first conductive layer is provided with a first electrode group, the first electrode group at least comprises a first electrode, the second conductive layer is provided with a second electrode group, the second electrode group at least comprises a second electrode, a spacer region is formed between the electrode group and the conductive layer, and the length of at least one of the first electrode and the second electrode is less than or equal to 300mm; and the other conductive layer is provided with an isolation structure at the isolation region of the electrode which is less than or equal to 300mm away from the electrode, and the isolation structure divides the other conductive layer into a first part which can be conducted with the electrode on the conductive layer and a second part which is disconnected with the electrode. The service life of the dimming diaphragm can be effectively prolonged, and the dimming function is prevented from losing efficacy.

Description

Technical Field

[0001] The present invention relates to the technical field of vehicle window glass, and in particular to a dimming film and a manufacturing method thereof, dimming glass, and a vehicle. Background Art

[0002] Car windows are an essential component of a vehicle. To ensure driving safety, window glass must possess high strength, rigidity, and other safety performance parameters. Window glass is typically designed as laminated glass, consisting of two or more sheets of inorganic glass interposed with one or more functional film layers.

[0003] In related art, when the functional film layer is configured as a dimming layer, for example, the dimming layer is connected to the two glass substrates via adhesive layers. The dimming layer can be used to adjust the light transmission effect of the window glass, thereby at least achieving switching between bright and dark states.

[0004] For dimming glass with a dimming layer, corresponding electrodes need to be provided on the conductive layers on the upper and lower surfaces of the dimming layer, and a predetermined voltage (current) is applied to the dimming layer through the electrodes. In a specific application scenario, in order to achieve a zoned gradient effect on the window glass, the dimming layer can be divided into zones according to a pattern, and each zone can be used as an electrode. When in use, the zoned gradient effect can be achieved by energizing different zones separately.

[0005] However, after research, the inventors of this application found that the existing dimming functional layer has the following problems during use: the electrodes are easily damaged and have a short service life; especially for the dimming functional layer with partitions, the partition electrodes are easily damaged and the partition function is easily failed, which affects the service life of the dimming functional layer.

[0006] It should be noted that the above introduction to the technical background is merely intended to provide a clear and complete description of the technical solutions of this application and facilitate understanding by those skilled in the art. Simply because these solutions are described in the background technology section of this application, it should not be assumed that the above technical solutions are well known to those skilled in the art. Summary of the Invention

[0007] In response to the defects of the existing technology, the embodiments of the present invention provide a dimming film and its manufacturing method, dimming glass, and a vehicle, which can effectively improve the service life of the electrode, thereby extending the service life of the dimming film. In particular, the dimming film with partitions can effectively extend the service life of the partition electrodes and prevent the partition function from failing.

[0008] The specific technical solution of the embodiment of the present invention includes: a dimming film, the dimming film including: a first substrate layer, a dimming layer and a second substrate layer, the first substrate layer having a first surface away from the dimming layer and a second surface close to the dimming layer, the second surface being provided with a first conductive layer; the second substrate layer having a third surface close to the dimming layer and a fourth surface away from the dimming layer, the third surface being provided with a second conductive layer; a first predetermined edge of the first conductive layer being provided with a first electrode group, the first electrode group including at least one first electrode, a first spacing region being formed between the first electrode group and the second conductive layer, the second A second electrode group is provided at a second predetermined edge of the conductive layer, the second electrode group includes at least one second electrode, and a second spacing area is formed between the second electrode group and the first conductive layer; at least one electrode length of the first electrode and the second electrode is ≤300 mm; an electrode with an electrode length ≤300 mm is provided on a conductive layer, and an isolation structure is provided on the other conductive layer within a predetermined range of the isolation area close to the electrode with an electrode length ≤300 mm, and the isolation structure separates the other conductive layer into a first part that can be electrically connected to the electrode on the other conductive layer and a second part that is disconnected from the electrode on the other conductive layer.

[0009] In a preferred embodiment, multiple partitions are formed in the first conductive layer, and the first electrode is a partition electrode formed in the first predetermined edge area of the first conductive layer corresponding to each of the partitions; the second electrode is a common electrode formed in the second predetermined edge area of the second conductive layer, and the partition electrodes include multiple ones, and the length of at least one of the partition electrodes and / or the electrode length of the common electrode is ≤300 mm.

[0010] In a preferred embodiment, the electrode length of at least two of the partition electrodes is ≤300 mm, and the number of the isolation structures is set corresponding to the partition electrodes with electrode length ≤300 mm; or, the number of the isolation structure is one, and one isolation structure completely isolates all partition electrodes with electrode length ≤300 mm.

[0011] In a preferred embodiment, the electrode length of the common electrode is ≤300 mm, the electrode length of at least one of the partition electrodes is ≤300 mm, and the isolation structure includes a first isolation structure and a second isolation structure; the first isolation structure is arranged on the second conductive layer within a predetermined distance range from the first spacing area, and the first isolation structure separates the second conductive layer into a first part that can be electrically connected to the common electrode and a second part that is disconnected from the common electrode; the second isolation structure is arranged on the first conductive layer within a predetermined distance range from the second spacing area, and the second isolation structure separates the first conductive layer into a third part that can be electrically connected to the partition electrode with an electrode length ≤300 mm and a fourth part that is disconnected from the partition electrode with an electrode length ≤300 mm.

[0012] In a preferred embodiment, the isolation structure includes: an etching line, which is obtained by removing material of the other conductive layer with a predetermined removal width on the other conductive layer; or, the isolation structure includes: a cutting portion, which is obtained by removing material of the other conductive layer with a predetermined removal width on the other conductive layer and removing the substrate layer outside the other conductive layer with the predetermined removal width.

[0013] In a preferred embodiment, the predetermined distance from the isolation structure to the spacing area close to the electrode with a length of ≤300 mm is between 1 mm and 15 mm.

[0014] In a preferred embodiment, the cross-sectional width of the first spacer region or the second spacer region is between 1 mm and 15 mm.

[0015] In a preferred embodiment, the cross-sectional width of the first predetermined edge region is between 2 mm and 12 mm; and the cross-sectional width of the second predetermined edge region is between 2 mm and 12 mm.

[0016] In a preferred embodiment, the isolation structure extends entirely along the spacing direction of the plurality of partition electrodes.

[0017] In a preferred embodiment, the dimming film has a first side and a second side facing each other, the first predetermined edge area is arranged close to the first side, the second predetermined edge area is arranged close to the second side, and a plurality of the partition electrodes are arranged at intervals along the first side to form a longitudinal partition electrode assembly, the dimming film has a third side and a fourth side connected between the first side and the second side, the common electrode extends along the second side and the third side, and one end of the common electrode is arranged close to one end of the partition electrode assembly.

[0018] A dimming glass comprises any one of the dimming films described above.

[0019] In a preferred embodiment, the smart glass further includes: an outer glass and an inner glass, the outer glass and the smart film are connected by a first adhesive layer, and the inner glass and the smart film are connected by a second adhesive layer. The smart glass further includes: a shielding area, the shielding area is arranged in a predetermined peripheral area between the first adhesive layer and the outer glass, and in a predetermined outer ring area between the second adhesive layer and the inner glass, and the distance from the isolation structure to the inner side of the edge of the shielding area is at least 2 mm.

[0020] A vehicle comprising any of the above-mentioned dimming glass.

[0021] A method for manufacturing a dimming film, the dimming film comprising: a first substrate layer, a dimming layer, and a second substrate layer, the first substrate layer being provided with a first conductive layer, and the second substrate layer being provided with a second conductive layer; the method for manufacturing the dimming film comprising the following steps:

[0022] forming a first electrode at a first predetermined edge of the first conductive layer, and forming a first spacing region between the first electrode and the second conductive layer;

[0023] forming a second electrode at a second predetermined edge of the second conductive layer; and forming a second spacing region between the second electrode and the first conductive layer;

[0024] When the length of at least one of the first electrode and the second electrode is ≤300 mm, the electrode with a length ≤300 mm is arranged on a conductive layer, and an isolation structure is arranged on another conductive layer within a predetermined range of an isolation area close to the electrode with a length ≤300 mm, so as to separate the other conductive layer into a first part that can be electrically connected to the electrode on the other conductive layer and a second part that is disconnected from the electrode on the other conductive layer.

[0025] A method for manufacturing a dimming film, the dimming film comprising: a first substrate layer, a dimming layer, and a second substrate layer, the first substrate layer being provided with a first conductive layer, and the second substrate layer being provided with a second conductive layer; the method for manufacturing the dimming film comprising the following steps:

[0026] Forming a plurality of partitions on the first conductive layer;

[0027] A common electrode is formed on one side of the second conductive layer, and a partition electrode is formed for each partition on the other side of the first conductive layer, a first spacing region is formed between the plurality of partition electrodes and the second conductive layer, and a second spacing region is formed between the common electrode and the first conductive layer;

[0028] An isolation structure is provided within a predetermined distance range between the second conductive layer and the first spacing region, and the second conductive layer is separated into a first part and a second part relative to each other along the isolation structure, wherein the first part is relatively close to the common electrode and can be electrically conductive with the common electrode, and the second part is relatively far away from the common electrode and is disconnected from the common electrode.

[0029] In a preferred embodiment, the step of forming the partitions specifically includes: using a laser to act on the first conductive layer through the first substrate layer or using a laser to act directly on the first conductive layer to etch out the plurality of partitions.

[0030] In a preferred embodiment, the isolation structure includes an etching line, and the step of providing the isolation structure specifically includes: using a laser to penetrate the second substrate layer and act on the second conductive layer to etch the etching line.

[0031] In a preferred embodiment, the predetermined removal width of the etched line is within 100 μm.

[0032] The technical solution of the present invention has the following significant beneficial effects:

[0033] In an embodiment of the present application, an isolation structure is provided on another conductive layer (a conductive layer directly opposite to the conductive layer where the electrodes with an electrode length ≤ 300 mm are located) within a predetermined range of an isolation region close to the electrodes with an electrode length ≤ 300 mm. The isolation structure separates the other conductive layer into a first portion that is electrically conductive with the electrodes on the other conductive layer and a second portion that is disconnected from the electrodes on the other conductive layer. When in use, the isolation structure can effectively prevent the problem of excessive current at the half-cut position and ablation along the half-cut position. The electrodes isolated by the isolation structure are not easily damaged, thereby effectively extending the service life of the electrodes and thus extending the service life of the dimming diaphragm. In particular, for a dimming diaphragm with partitions, the service life of the partitioned electrodes can be effectively extended, preventing the partition function from failing.

[0034] With reference to the following description and drawings, specific embodiments of the present invention are disclosed in detail, indicating the manner in which the principles of the present invention can be employed. It should be understood that the embodiments of the present invention are not limited in scope thereby. Within the spirit and scope of the appended claims, the embodiments of the present invention include many variations, modifications, and equivalents. Features described and / or illustrated with respect to one embodiment may be used in the same or similar manner in one or more other embodiments, combined with features in other embodiments, or substituted for features in other embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The drawings described herein are for illustrative purposes only and are not intended to limit the scope of the present invention in any way. In addition, the shapes and proportional dimensions of the various components in the drawings are merely illustrative and are used to help understand the present invention, and are not intended to specifically limit the shapes and proportional dimensions of the various components of the present invention. Those skilled in the art can select various possible shapes and proportional dimensions to implement the present invention according to specific circumstances under the guidance of the present invention.

[0036] Figure 1 This is a structural diagram of a dimming film;

[0037] Figure 2 This is a schematic structural diagram of the first dimming film provided in an embodiment of the present application;

[0038] Figure 3 for Figure 2 Cross-sectional view at AA in the middle;

[0039] Figure 4 for Figure 2 Cross-sectional view at the middle BB;

[0040] Figure 5 for Figure 3 One of the partial enlarged schematic diagrams at point I in the middle;

[0041] Figure 6 for Figure 3 The second partial enlarged diagram of point I in the middle;

[0042] Figure 7 This is the structural intention of a switchable glass provided in an embodiment of the present application;

[0043] Figure 8 for Figure 7 Cross-sectional view at CC;

[0044] Figure 9 This is a schematic structural diagram of a second dimming film provided in an embodiment of the present application;

[0045] Figure 10 for Figure 9 Cross-sectional view at DD in the middle;

[0046] Figure 11 for Figure 9 Cross-sectional view at EE;

[0047] Figure 12 for Figure 9 Cross-sectional view at FF;

[0048] Figure 13 This is a schematic structural diagram of a third type of dimming film provided in an embodiment of the present application;

[0049] Figure 14 for Figure 13 Cross-sectional view at GG in the middle;

[0050] Figure 15 for Figure 13 Cross-sectional view at HH in the middle;

[0051] Figure 16 for Figure 13 Cross-sectional view at JJ in the middle;

[0052] Figure 17 This is a flowchart of the steps of a method for manufacturing a dimming film provided in an embodiment of the present application.

[0053] 1. Outer glass;

[0054] 2. First bonding layer;

[0055] 3. Bonding the edge layer;

[0056] 4. Dimming film;

[0057] 401, first side;

[0058] 402, second side;

[0059] 403, third side;

[0060] 404, fourth side;

[0061] 40. Isolation structure;

[0062] 405. First isolation structure;

[0063] 406. Second isolation structure;

[0064] 41. a first substrate layer;

[0065] 42. a first conductive layer;

[0066] 423, Part III;

[0067] 424, Part IV;

[0068] 43. Dimming layer;

[0069] 44. a second conductive layer;

[0070] 441, Part I;

[0071] 442, Part II;

[0072] 45. a second substrate layer;

[0073] 460, first electrode;

[0074] 470, second electrode;

[0075] 46. Common electrode;

[0076] 47. Partition electrode;

[0077] 480, step structure;

[0078] 481, first spacer;

[0079] 482, second spacer;

[0080] 49. Partition line;

[0081] 5. Second adhesive layer;

[0082] 6. Inner glass;

[0083] 7. Sheltered area. DETAILED DESCRIPTION

[0084] The technical solution of the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that these embodiments are only used to illustrate the present invention and are not used to limit the scope of the present invention. After reading the present invention, modifications of various equivalent forms of the present invention by those skilled in the art all fall within the scope defined by the claims attached to this application.

[0085] It should be noted that when an element is referred to as being "disposed on" another element, it may be directly on the other element or there may be an element centered thereon. When an element is referred to as being "connected to" another element, it may be directly connected to the other element or there may be an element centered thereon. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only implementations.

[0086] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art to which this application pertains. The terms used herein in the specification of this application are intended only to describe specific embodiments and are not intended to limit this application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0087] like Figure 1 As shown, generally, the structure of the dimming film mainly includes: upper substrate 81 + upper ITO conductive layer 82 + liquid crystal layer 83 + lower ITO conductive layer 84 + lower substrate 85.

[0088] The process of making electrodes in the dimming film is as follows:

[0089] The upper substrate 81 is half-cut, the liquid crystal layer 83 is removed, the lower ITO conductive layer 84 of the lower substrate 85 is exposed, and silver paste is applied to form a common electrode. The partition electrodes are made in the same way, the lower substrate 85 is half-cut, the liquid crystal layer 83 is removed, the upper ITO conductive layer 82 of the upper substrate 81 is exposed, and silver paste is applied to form a partition electrode.

[0090] The inventors of the present application have discovered that the service life of existing dimming films is limited, and in particular, the electrodes in the dimming films are prone to failure.

[0091] Furthermore, the inventors of the present application discovered that when the dimming film is placed under high temperature for power on / off testing, partition failure is likely to occur, and the service life of the dimming film is unlikely to meet the predetermined service life.

[0092] Further analysis revealed that: due to the formation of a step at the above-mentioned "half-cut" position, which was subjected to pressure during the glass lamination process, the step position was subjected to greater force, resulting in a smaller distance between the upper ITO conductive layer 82 and the lower ITO conductive layer 84. During the test, the current was too large, causing the ITO on the half-cut line to burn. When burning occurred at the half-cut position, the partition electrode close to the half-cut position would also be affected and burn. In addition, the partition electrode is usually short. After a period of use, the partition electrode is gradually damaged due to burning, which makes the partition function easy to fail.

[0093] The present invention provides a dimming diaphragm and a manufacturing method thereof, dimming glass, and a vehicle, which can effectively improve the service life of electrodes, thereby extending the service life of the dimming diaphragm. In particular, a dimming diaphragm provided with partitions can effectively extend the service life of the partition electrodes and prevent the partition function from failing.

[0094] Please refer to the comprehensive Figures 2 to 16In an embodiment of the present application, a dimming film 4 is provided. The dimming film 4 may include: a first substrate layer 41, a dimming layer 43, and a second substrate layer 45. The first substrate layer 41 has a first surface away from the dimming layer 43 and a second surface close to the dimming layer 43, and the second surface is provided with a first conductive layer 42; the second substrate layer 45 has a third surface close to the dimming layer 43 and a fourth surface away from the dimming layer 43, and the third surface is provided with a second conductive layer 44; a first predetermined edge of the first conductive layer 42 is provided with a first electrode group, the first electrode group includes at least one first electrode 460, and a first spacer 481 is formed between the first electrode group and the second conductive layer 44. A second electrode group is provided at the second predetermined edge of the second conductive layer 44, the second electrode group includes at least one second electrode 470, a second spacing area 482 is formed between the second electrode group and the first conductive layer 42, and at least one electrode length of the first electrode 460 and the second electrode 470 is ≤300 mm; the electrode with an electrode length ≤300 mm is provided on one conductive layer, and the other conductive layer is provided with an isolation structure 40 within a predetermined range of the isolation area close to the electrode with an electrode length ≤300 mm, and the isolation structure 40 separates the other conductive layer into a first part 441 that can be electrically connected to the electrode on the other conductive layer and a second part 442 that is disconnected from the electrode on the other conductive layer.

[0095] In this embodiment, the specific form of the dimming film 4 provided with the dimming layer 43 may include, but is not limited to, PDLC (Polymer Dispersed Liquid Crystal), SPD (Solid-State Polymer Dispersed Liquid Crystal), EC (Electrochromic), LC (Liquid Crystal), etc. Of course, the specific form of the dimming film 4 may also be other forms and is not limited to the above description. Persons skilled in the art may make other changes based on the technical essence of this application. However, as long as the functions and effects achieved are the same or similar to those of this application, they shall be covered by the scope of protection of this application.

[0096] The dimming film 4 can be used in dimming glass to meet the user's dimming needs for dimming glass. In the embodiment of the present application, the dimming film 4 mainly includes: a first substrate layer 41 provided with a first conductive layer 42, a dimming layer 43, and a second substrate layer 45 provided with a second conductive layer 44. The dimming layer 43 includes but is not limited to a liquid crystal layer, such as PDLC, SPD, LC, and EC.

[0097] The first substrate layer 41 has a first surface away from the dimming layer 43 and a second surface close to the dimming layer 43 , and the first conductive layer 42 is disposed on the second surface of the first substrate.

[0098] The material of the first substrate layer 41 can specifically be PET (polyethylene terephthalate). In addition, the material of the first substrate layer 41 can also be other materials such as PC (polycarbonate), PMMA (polymethyl methacrylate), PVC (polyvinyl chloride), TAC (triacetyl cellulose), etc. In the embodiments of the present application, the first substrate layer 41 is mainly described as PET.

[0099] The first conductive layer 42 can be provided on the surface of the first substrate layer 41 by coating. Of course, the first conductive layer 42 can also be provided on the surface of the first substrate layer 41 by other methods, such as vacuum coating or printing. The material of the first conductive layer 42 can be selected from metal oxide materials and conductive polymer materials. Specifically, the material of the first conductive layer 42 can be selected from indium tin oxide (ITO). Indium tin oxide (ITO): It is a transparent conductive oxide with good transparency and conductivity. It has a high transmittance in the visible light range and can provide good conductive properties, so that the dimming film can maintain a high transparency while realizing the dimming function.

[0100] The second substrate layer 45 has a third surface close to the dimming layer 43 and a fourth surface away from the dimming layer 43, and the second conductive layer 44 is arranged on the third surface. The material of the second substrate layer 45 can be the same as that of the first substrate layer 41, or of course it can be different. Specifically, the material of the second substrate layer 45 can be PET (polyethylene terephthalate). In addition, the material of the second substrate layer 45 can also be other materials such as PC (polycarbonate), PMMA (polymethyl methacrylate), PVC (polyvinyl chloride), TAC (triacetyl cellulose), etc. In the embodiments of the present application, the second substrate layer 45 is mainly PET as an example for illustration.

[0101] The second conductive layer 44 can be provided on the surface of the second substrate layer 45 by coating. Of course, the second conductive layer 44 can also be provided on the surface of the second substrate layer 45 by other methods, such as vacuum coating or printing. The material of the second conductive layer 44 can be selected from metal oxide materials and conductive polymer materials. Specifically, the material of the second conductive layer 44 can be selected from indium tin oxide (ITO). In the embodiments of the present application, the first conductive layer 42 and the second conductive layer 44 are mainly illustrated by using ITO as an example.

[0102] The dimming film 4 provided in the embodiment of the present application takes the dimming film 4 as an example of PDLC. When in use, an AC voltage is connected to the first conductive layer 42 and the second conductive layer 44 to form an electric field, so that the liquid crystal molecules in the middle dimming layer 43 are deflected, thereby realizing the dimming function.

[0103] The inventors of this application have discovered that for electrodes with a length of less than 300 mm, their service life is difficult to meet the predetermined lifespan requirements during on-off testing at high temperatures. Electrodes with a length of less than 300 mm are hereinafter referred to as fragile electrodes.

[0104] Further analysis revealed that due to the formation of first spacer 481 between the first electrode group and the second conductive layer 44, and second spacer 482 between the second electrode group and the first conductive layer 42, the conductive layer, substrate layer, and dimming layer 43 at corresponding locations in the first and second spacers 481 and 482 were removed by half-cutting, forming a half-cut position. This creates a stepped structure 480 at the first and second spacers 481 and 482. When power is applied, excessive current can easily cause ablation along the half-cut position in the stepped structure 480, thereby reducing the service life of the electrodes near the half-cut position.

[0105] In order to extend the service life of the electrode, especially to extend the service life of the vulnerable electrode with an electrode length ≤300 mm, in an embodiment of the present application, an isolation structure 40 is provided on another conductive layer (a conductive layer opposite to the conductive layer where the electrode with an electrode length ≤300 mm is located) within a predetermined range of the isolation area close to the electrode with an electrode length ≤300 mm. The isolation structure 40 separates the other conductive layer into a first part 441 that can be electrically connected to the electrode on the other conductive layer and a second part 442 that is disconnected from the electrode on the other conductive layer.

[0106] When in use, the isolation structure 40 can effectively prevent the problem of excessive current at the half-cut position and ablation along the half-cut position. The electrode isolated by the isolation structure 40 is not easily damaged, thereby effectively improving the service life of the electrode, thereby extending the service life of the dimming film 4; especially the dimming film 4 with partitions can effectively extend the service life of the partition electrode 47 and prevent the partition function from failing.

[0107] In the embodiment of the present application, the dimming film 4 can be a dimming film with partitions or a dimming film without partitions.

[0108] The following describes different implementations with examples.

[0109] Please refer to Figures 2 to 6or Figures 13 to 16 , first take the dimming film 4 as a dimming film with partitions as an example for explanation.

[0110] In some embodiments, multiple partitions are formed in the first conductive layer 42, and the first electrode 460 is a partition electrode 47 formed in the first predetermined edge area of the first conductive layer 42 corresponding to each partition; the second electrode 470 is a common-pole electrode 46 formed in the second predetermined edge area of the second conductive layer 44, and the partition electrodes 47 include multiple ones, and the length of at least one of the partition electrodes 47 and / or the electrode length of the common-pole electrode 46 is ≤300 mm.

[0111] Multiple partitions are formed in the first conductive layer 42, and a partition electrode 47 is formed in the first predetermined edge area of the first conductive layer 42 corresponding to each partition, and a first spacing area 481 is formed between the multiple partition electrodes 47 and the second conductive layer 44; a common electrode 46 is formed in the second predetermined edge area of the second conductive layer 44, and a second spacing area 482 is formed between the common electrode 46 and the first conductive layer 42. The second conductive layer 44 is provided with an isolation structure 40 within a predetermined distance range from the first spacing area 481, and the isolation structure 40 separates the second conductive layer 44 into a first part 441 that can be electrically conductive with the common electrode 46 and a second part 442 that is disconnected from the common electrode 46.

[0112] In an embodiment of the present application, the dimming film 4 is provided with an isolation structure 40 near the partition half-cut position (the second conductive layer 44 is within a predetermined distance range from the first spacing area 481), and the isolation structure 40 is used to separate the second conductive layer 44 into a first part 441 that can be electrically conductive with the common electrode 46 and a second part 442 that is disconnected from the common electrode 46. When in use, the isolation structure 40 can effectively prevent the problem of excessive current at the half-cut position and ablation along the half-cut position, and the partition electrode 47 is not easily damaged, thereby effectively improving the service life of the dimming film 4 and preventing the partition function from failing.

[0113] For one of the multiple situations in which the length of at least one partition electrode 47 and / or the electrode length of the common electrode 46 is ≤300 mm, the electrode length of at least two of the partition electrodes 47 is ≤300 mm, and the number of the isolation structures 40 is set corresponding to the partition electrodes 47 with electrode lengths ≤300 mm; or, the number of the isolation structures 40 is one, and one isolation structure 40 completely isolates all partition electrodes 47 with electrode lengths ≤300 mm.

[0114] like Figure 2As shown, a plurality of partitions are formed in the first conductive layer 42 , for example, a first partition S1 , a second partition S2 , a third partition S3 , a fourth partition S4 , a fifth partition S5 , a sixth partition S6 , a seventh partition S7 , an eighth partition S8 , and a ninth partition S9 .

[0115] The length of the partition electrode 47 corresponding to the first partition S1 is 200 mm, the length of the partition electrode 47 corresponding to the second partition S2 is 200 mm, the length of the partition electrode 47 corresponding to the third partition S3 is 200 mm, the length of the partition electrode 47 corresponding to the fourth partition S4 is 200 mm, the length of the partition electrode 47 corresponding to the fifth partition S5 is 197 mm, the length of the partition electrode 47 corresponding to the sixth partition S6 is 202 mm, the length of the partition electrode 47 corresponding to the seventh partition S7 is 202 mm, the length of the partition electrode 47 corresponding to the eighth partition S8 is 197 mm, and the length of the partition electrode 47 corresponding to the ninth partition S9 is 134 mm. In addition, the length of the common-pole electrode 46 is 2856 mm. In this specific embodiment, the lengths of all the partition electrodes 47 are within 300 mm, and the length of the common-pole electrode 46 is greater than 300 mm.

[0116] Since the length of the common electrode 46 is 2856 mm, which is much longer than 300 mm, and the lengths of all the partition electrodes 47 are less than 300 mm, the isolation structure 40 can be provided for all the partition electrodes 47. Specifically, when providing the isolation structure 40, a separate isolation structure 40 can be provided for each partition electrode 47. In addition, a common isolation structure 40 can also be provided for the partition electrodes 47 with a length less than 300 mm. When a common isolation structure 40 is provided for the partition electrodes 47 with a length less than 300 mm, as shown in FIG. Figure 2 As shown, the isolation structure 40 can be entirely disposed around the periphery of all partition electrodes 47. From a process perspective, when a common isolation structure 40 is provided, the number of isolation structures 40 can be reduced, the process can be simplified, production efficiency can be improved, and the yield rate can be increased.

[0117] In addition, it should be noted that, when a plurality of partition electrodes 47 are arranged in sequence, if the length of at least one partition electrode 47 in the middle is greater than 300 mm, theoretically, the partition electrode 47 does not need to be provided with an isolation structure. When the isolation structure 40 is provided for the above scenario, the isolation structures 40 can be provided for the partition electrodes on both sides of the partition electrode with a length greater than 300 mm respectively, or a common isolation structure 40 can be provided as a whole to also protect the partition electrode with a length greater than 300 mm.

[0118] If isolation structures 40 are provided for the partition electrodes 47 on both sides of the partition electrode 47 having a length greater than 300 mm, a common isolation structure 40 may be provided for each partition electrode 47 on each side. Alternatively, one isolation structure 40 may be provided for each partition electrode 47, or multiple common isolation structures 40 may be provided for some partition electrodes 47 on one side. Specifically, the number and combination of the isolation structures 40 may be adjusted based on actual product design requirements and structural differences.

[0119] Please refer to Figure 5 or Figure 6 , wherein the predetermined distance D1 from the isolation structure 40 to the first spacer area 481 is between 1 mm and 15 mm. When the predetermined distance D1 from the isolation structure 40 to the first spacer area 481 is above 1 mm, the requirement of preventing short circuits can be met while also ensuring reliability during process manufacturing. Taking the above-mentioned isolation structure 40 formed by laser etching as an example, when the predetermined distance D1 between the isolation structure 40 and the first spacer area 481 is too small, it is difficult to control the position of the laser etching, and it is easy to not etch in place, thereby directly affecting the yield of the dimming film 4. In addition, when the predetermined distance D1 from the isolation structure 40 to the first spacer area 481 is controlled within 15 mm, it can be ensured that when the dimming film 4 is applied to the dimming glass, the isolation structure 40 can be shielded by the shielding area 7, thereby ensuring the aesthetic performance of the dimming glass.

[0120] like Figure 2 As shown, in order to achieve monotonic light control for different areas and thus realize the effect of zoned gradient display, multiple zones are formed in the first conductive layer 42. The specific number and position of the zones can be set accordingly according to the actual product and design requirements, and this application does not make any specific restrictions here.

[0121] like Figure 4 As shown, when partitioning is performed, it can be achieved by setting partition lines 49 in the conductive layer. In a specific application scenario, a laser can be used to perform internal engraving on the first conductive layer 42 through the first substrate layer 41 to form partitions, and the dimming of each area can be controlled separately. Figure 2 As shown, the dimming film 4 is divided into 9 parts by partition lines 49 , and the dimming function of each part can be independently controlled by the common electrode 46 and the partition electrode 47 .

[0122] When the first conductive layer 42 is divided into a plurality of partitions, each portion may be provided with a partition electrode 47. Specifically, the partition electrode 47 may be provided in a manner as follows: in a first predetermined edge region of the first conductive layer 42, for example, near Figure 3Within a certain width distance range from the right side inward, the second substrate layer 45 is half-cut by a laser or a knife wheel, and the dimming layer 43 is removed (that is, the second substrate layer 45 and the dimming layer 43 in the first predetermined edge area are removed to form a step structure 480), exposing the first conductive layer 42 of the first substrate layer 41, and a partition electrode 47 is set on the first conductive layer 42. When setting the partition electrode 47, the partition electrode 47 can be formed by applying silver paste, that is, the partition electrode 47 can be formed by silver paste, or the partition electrode 47 can be formed by setting a conductive tape, in which case the partition electrode 47 can be a conductive tape. Of course, the specific form of the partition electrode 47 is not limited to the above examples. In the embodiment of the present application, the form of silver paste is mainly used as an example for illustration.

[0123] The dimming film 4 has a first side 401 and a second side 402 opposite to each other. Figure 2 As shown, the first side 401 can be located on the left side of the dimming film 4, and the second side 402 can be located on the right side of the dimming film 4. The first predetermined edge area is arranged near the first side 401. When the above-mentioned partition electrode 47 is arranged, the second substrate layer 45 and the dimming layer 43 of a first size can be removed from the first side 401 toward the second side 402 to obtain a first spacing area 481 and the first predetermined edge area that can be used to arrange the partition electrode 47. The first spacing area 481 is specifically located between the partition electrode 47 and the step structure 480. The first spacing area 481 is an area where the partition electrode 47 is not arranged after the second substrate layer 45 and the dimming layer 43 are removed. The first spacing area 481 can be used to prevent the partition electrode 47 from conducting the first conductive layer 42 and the second conductive layer 44, thereby forming a short circuit.

[0124] like Figure 5 or Figure 6 As shown, specifically, the cross-sectional width D3 of the first spacer 481 can be between 1 mm and 15 mm. When the cross-sectional width D3 of the first spacer 481 is above 1 mm, it can achieve a reliable anti-short circuit effect. In addition, in order to achieve an aesthetic effect after the dimming film 4 is applied to the dimming glass and to ensure that the spacer can be shielded by the shielding area 7 of the dimming glass, the cross-sectional width D3 of the first spacer 481 can be controlled within 15 mm. The shielding area 7 can be a black edge formed by printing. Of course, the form of the shielding area 7 is not limited to the above example, and it can also be other forms.

[0125] like Figure 3The cross-sectional width D0 of the first predetermined edge region may be between 2 mm and 12 mm. The cross-sectional width D0 of the first predetermined edge region is used to ensure that the partition electrode 47 has a sufficient width. In addition, the width of the partition electrode 47 also needs to be controlled within a reasonable range to ensure that the partition electrode 47 and the first spacer 481 and the isolation structure 40 located inside the partition electrode 47 are all shielded by the shielding area 7 of the dimming glass, so that the dimming film 4 can achieve an aesthetically pleasing effect when used in the dimming glass.

[0126] In addition, if Figure 2 As shown, in this embodiment, the common electrode 46 is disposed in a second predetermined edge region of the second conductive layer 44. Specifically, the dimming film 4 has a first side 401 and a second side 402 opposite to each other, and a third side 403 and a fourth side 404 connected between the first side 401 and the second side 402. At least a portion of the common electrode 46 may extend along the second side 402.

[0127] The common electrode 46 is arranged in a similar manner to the partition electrode 47. Specifically, it can be arranged in a second predetermined edge region of the second conductive layer 44, for example, near Figure 3 Within a certain width distance range from the left side inward, the first substrate layer 41 is half-cut by a laser or a knife wheel, and the dimming layer 43 is removed (that is, the first substrate layer 41 and the dimming layer 43 in the second predetermined edge area are removed to form a step structure 480), exposing the second conductive layer 44 of the second substrate layer 45, and a common electrode 46 is set on the second conductive layer 44. When setting the common electrode 46, the common electrode 46 can be formed by applying silver paste, that is, the common electrode 46 can be formed by silver paste, or the common electrode 46 can be formed by setting a conductive tape, in which case the common electrode 46 can be a conductive tape. Of course, the specific form of the common electrode 46 is not limited to the above examples. In the embodiment of the present application, the silver paste form is mainly used as an example for illustration.

[0128] like Figure 2 As shown, the first side 401 can be located on the left side of the dimming film 4, the second side 402 can be located on the right side of the dimming film 4, the third side 403 can be located on the front side of the dimming film 4, and the fourth side 404 can be located on the rear side of the dimming film 4. The second predetermined edge area is located near the second side 402, or near the second side 402 and the third side 403. The specific location of the second predetermined edge area is not limited to the above example.

[0129] In this embodiment, the simplest example is described: the second predetermined edge region is disposed near the second side 402. When disposing the common electrode 46, a first-size portion of the first substrate layer 41 and the dimming layer 43 can be removed from the second side 402 toward the first side 401 to obtain the second spacer 482 and the second predetermined edge region for disposing the common electrode 46.

[0130] The second spacer 482 is specifically located between the common electrode 46 and the stepped structure 480. The second spacer 482 is the area where the common electrode 46 is not disposed after the first substrate layer 41 and the dimming layer 43 are removed. The second spacer 482 prevents the common electrode 46 from electrically connecting the first conductive layer 42 and the second conductive layer 44, thereby preventing a short circuit.

[0131] like Figure 5 or Figure 6 Specifically, the cross-sectional width D3 of the second spacer 482 can be between 1 mm and 15 mm. When the cross-sectional width D3 of the second spacer 482 is greater than 1 mm, it can reliably prevent short circuits. Furthermore, to ensure that the switchable film 4 achieves an aesthetically pleasing effect when used in switchable glass and that the spacer can be shielded by the shielding area 7 of the switchable glass, the cross-sectional width D3 of the second spacer 482 can be controlled within 15 mm.

[0132] The cross-sectional width D0 of the second predetermined edge region may be between 2 mm and 12 mm. The cross-sectional width D0 of the second predetermined edge region is used to ensure that the common electrode 46 has a sufficient width. In addition, the width of the common electrode 46 also needs to be controlled within a reasonable range to ensure that the common electrode 46 and the second spacer 482 located inside the common electrode 46 are shielded by the shielding area 7 of the dimming glass, so that the dimming film 4 can achieve an aesthetically pleasing effect when used in the dimming glass.

[0133] In this embodiment, the second conductive layer 44 is provided with an isolation structure 40 within a predetermined distance range from the first spacing area 481. The isolation structure 40 separates the second conductive layer 44 into a first portion 441 that is electrically conductive with the common electrode 46 and a second portion 442 that is disconnected from the common electrode 46. Specifically, the isolation structure 40 can be made by removing at least part of the conductive material at a predetermined distance from the step contact at the first spacing area 481 formed on the second conductive layer 44. The isolation structure 40 extends as a whole along the spacing arrangement direction of the plurality of partition electrodes 47. Figure 2As shown, the extension direction of the isolation structure 40 can be basically the same as the spacing arrangement direction of the partition electrodes 47. Specifically, in a plane, the isolation structure 40 can be arranged around the periphery of the partition electrode 47, with one end connected to the first side 401 and the other end connected to the fourth side 404, thereby isolating the partition electrode 47.

[0134] Specifically, the isolation structure 40 has a long side extending longitudinally along the length of the vulnerable electrode on a surface parallel to the dimming diaphragm 4. For example, when the isolation structure 40 includes only long sides, it can be in a straight line shape. Furthermore, the isolation structure 40 can also include short sides disposed at at least one end of the long side. When the isolation structure 40 includes one long side and one short side, it can be in an L-shape. When the isolation structure 40 includes one long side and two short sides, the two short sides are located at both ends of the long side and extend to the edge of the dimming diaphragm 4.

[0135] The predetermined distance between the short side of the isolation structure 40 and the spacing region adjacent to electrodes with a length of 300 mm or less is at least 2 mm, ensuring that the isolation structure 40 can reliably isolate and protect the ends of the electrodes along their length. Specifically, the predetermined distance between the short side of the isolation structure 40 and the spacing region adjacent to electrodes with a length of 300 mm or less can be determined based on the actual distribution of the electrodes in the dimming film 4 and the specific structure of the product.

[0136] By setting up the isolation structure 40, the current transmitted from the common electrode 46 to the second conductive layer 44 can only flow through the first part 441 to the isolation structure 40, and cannot flow through the isolation structure 40 to the second part 442, which is equivalent to no current flowing through the second part 442. In this way, even if the first conductive layer 42 and the second conductive layer 44 are close to each other in the future, the current of the two will not increase and ablation will occur along the half-cut position, causing the relatively short partition electrode 47 to gradually fail, and then the partition failure problem occurs.

[0137] like Figure 5 As shown, in one embodiment, the isolation structure 40 includes: an etched line, which is obtained by removing material of the second conductive layer 44 with a predetermined removal width D2 on the second conductive layer 44 .

[0138] In this embodiment, the isolation structure 40 can be an etching line, and the etching line can be formed by laser etching. Of course, the etching line can also be formed by other methods. In this embodiment, laser etching is mainly used as an example. When the isolation structure 40 is an etching line, the predetermined removal width D2 of the etching line is within 100μm. Specifically, the etching line can be between 20μm and 50μm. Of course, the predetermined removal width of the isolation structure 40 can be adjusted according to the current manufacturing process, and this application does not strictly limit its specific value.

[0139] like Figure 6 As shown, or, in another embodiment, the isolation structure 40 includes: a cutting portion, which is obtained by removing material of the second conductive layer 44 with a predetermined removal width D2 and removing the second base material layer 45 with a predetermined removal width D2 on the second conductive layer 44.

[0140] In this embodiment, the isolation structure 40 can also be formed by cutting away material. Specifically, the cut portion can be obtained by cutting inward from the second base material layer 45 using a cutting tool, and removing the second base material layer 45 having a predetermined removal width D2 and the second conductive layer 44 having a predetermined removal width D2.

[0141] Of course, the above-mentioned isolation structure 40 can be set in other forms and is not limited to the above description. Technical personnel in the relevant field may make other changes based on the technical essence of this application, but as long as the functions and effects achieved are the same or similar to those of this application, they should be covered within the scope of protection of this application.

[0142] like Figure 2 As shown, in one embodiment, the dimming film 4 has a first side 401 and a second side 402 relative to each other, the first predetermined edge area is arranged close to the first side 401, and the second predetermined edge area is arranged close to the second side 402, and a plurality of the partition electrodes 47 are arranged at intervals along the first side 401 to form a longitudinal partition electrode assembly, and the dimming film 4 has a third side 403 and a fourth side 404 connected between the first side 401 and the second side 402, and the common electrode 46 extends along the second side 402 and the third side 403, and one end of the common electrode 46 is arranged close to one end of the partition electrode assembly.

[0143] In this embodiment, the dimming film 4 may have a first side 401 and a second side 402 opposite to each other, and a third side 403 and a fourth side 404 connected between the first side 401 and the second side 402 .

[0144] The partition electrode assembly formed by the multiple partition electrodes 47 can be arranged at intervals along the first side 401. When the first side 401 or the projection of the first side 401 is roughly linear, the partition electrode assembly formed by the multiple partition electrodes 47 is in a straight line. The common electrode 46 can extend along the second side 402 and the third side 403. One end of the supply electrode can be arranged close to one end of the partition electrode assembly. For example, one end of the common electrode 46 can extend from the third side 403 to the first side 401, thereby being close to one end of the partition electrode assembly. When one end of the common electrode 46 is arranged close to one end of the partition electrode assembly, wiring and connection are facilitated. In actual dimming glass applications, it is usually necessary to independently control multiple partitions. The partition electrodes 47 and common electrode 46 arranged close together can reduce the complexity of wiring, reduce the possibility of line crossing and interference, make the circuit layout more compact and reasonable, and also help improve the stability and reliability of the control system, facilitating the precise control of different partitions.

[0145] A method for manufacturing a dimming film, the dimming film 4 includes: a first substrate layer 41, a dimming layer 43 and a second substrate layer 45, the first substrate layer 41 is provided with a first conductive layer 42, and the second substrate layer 45 is provided with a second conductive layer 44; Figure 17 As shown, the manufacturing method of the dimming film may include the following steps:

[0146] Step S10: forming a plurality of partitions on the first conductive layer 42;

[0147] Step S12: forming a common electrode 46 on one side of the second conductive layer 44 and forming a partition electrode 47 for each partition on the other side of the first conductive layer 42, with a first spacer 481 formed between the plurality of partition electrodes 47 and the second conductive layer 44, and a second spacer 482 formed between the common electrode 46 and the first conductive layer 42;

[0148] Step S14: An isolation structure 40 is set within a predetermined distance range between the second conductive layer 44 and the first spacer area 481, and the second conductive layer 44 is separated into a first part 441 and a second part 442 relative to each other along the isolation structure 40, wherein the first part 441 is relatively close to the common electrode 46 and can be electrically conductive with the common electrode 46, and the second part 442 is relatively far away from the common electrode 46 and disconnected from the common electrode 46.

[0149] In this embodiment, the basic manufacturing material of the dimming film 4 includes a first base material layer 41 provided with a first conductive layer 42 , a dimming layer 43 , and a second base material layer 45 provided with a second conductive layer 44 .

[0150] Among them, the above-mentioned various parts can refer to the specific description of the implementation method of the dimming film 4, and this application will not elaborate on them here.

[0151] In step S10, the step of forming partitions may specifically include:

[0152] The plurality of partitions are etched by using a laser to act on the first conductive layer 42 through the first substrate layer 41 or by using a laser to act directly on the first conductive layer 42. In this embodiment, the partitions can be formed by laser etching. The laser etching method can accurately control the position, shape and size of the etching, thereby ensuring the accuracy of the partitions. In addition, since laser etching does not require contact with the material, it is a non-contact processing method, which can avoid scratching the first substrate layer 41. In addition, laser etching can be processed on plates of different materials and shapes, and can be applied to structures with curved surfaces, with strong applicability and flexibility.

[0153] In this embodiment, when the first conductive layer 42 is divided into a plurality of partitions, each portion may be provided with a partition electrode 47. Specifically, the partition electrode 47 may be provided in a manner such that: in a first predetermined edge region of the first conductive layer 42, for example, near Figure 3 Within a certain width distance range from the right side inward, the second substrate layer 45 is half-cut by a laser or a knife wheel, and the dimming layer 43 is removed (that is, the second substrate layer 45 and the dimming layer 43 in the first predetermined edge area are removed to form a step structure 480), exposing the first conductive layer 42 of the first substrate layer 41, and a partition electrode 47 is set on the first conductive layer 42. When setting the partition electrode 47, the partition electrode 47 can be formed by applying silver paste, that is, the partition electrode 47 can be formed by silver paste, or the partition electrode 47 can be formed by setting a conductive tape, in which case the partition electrode 47 can be a conductive tape. Of course, the specific form of the partition electrode 47 is not limited to the above examples. In the embodiment of the present application, the form of silver paste is mainly used as an example for illustration.

[0154] The dimming film 4 has a first side 401 and a second side 402 opposite to each other. Figure 2 As shown, the first side 401 can be located on the left side of the dimming film 4, and the second side 402 can be located on the right side of the dimming film 4. The first predetermined edge region is located near the first side 401. When arranging the partition electrode 47, the second substrate layer 45 and the dimming layer 43 of a first size can be removed from the first side 401 toward the second side 402 to obtain the first spacer 481 and the first predetermined edge region for arranging the partition electrode 47.

[0155] The first spacer 481 is specifically located between the partition electrode 47 and the stepped structure 480. The first spacer 481 is the area where the partition electrode 47 is not provided after the second substrate layer 45 and the dimming layer 43 are removed. The first spacer 481 prevents the partition electrode 47 from electrically connecting the first conductive layer 42 and the second conductive layer 44, thereby preventing a short circuit.

[0156] The common electrode 46 is arranged in a similar manner to the partition electrode 47. Specifically, it can be arranged in a second predetermined edge region of the second conductive layer 44, for example, near Figure 3 Within a certain width distance range from the left side inward, the first substrate layer 41 is half-cut by a laser or a knife wheel, and the dimming layer 43 is removed (that is, the first substrate layer 41 and the dimming layer 43 in the second predetermined edge area are removed to form a step structure 480), exposing the second conductive layer 44 of the second substrate layer 45, and a common electrode 46 is set on the second conductive layer 44. When setting the common electrode 46, the common electrode 46 can be formed by applying silver paste, that is, the common electrode 46 can be formed by silver paste, or the common electrode 46 can be formed by setting a conductive tape, in which case the common electrode 46 can be a conductive tape. Of course, the specific form of the common electrode 46 is not limited to the above examples. In the embodiment of the present application, the silver paste form is mainly used as an example for illustration.

[0157] like Figure 2 As shown, the first side 401 can be located on the left side of the dimming film 4, the second side 402 can be located on the right side of the dimming film 4, the third side 403 can be located on the front side of the dimming film 4, and the fourth side 404 can be located on the rear side of the dimming film 4. The second predetermined edge area is located near the second side 402, or near the second side 402 and the third side 403. The specific location of the second predetermined edge area is not limited to the above example.

[0158] In this embodiment, the second predetermined edge region is disposed near the second side 402 as an example. When disposing the common electrode 46, a first dimension of the first substrate layer 41 and the dimming layer 43 can be removed from the second side 402 toward the first side 401 to obtain the second spacer 482 and the second predetermined edge region for disposing the common electrode 46.

[0159] The second spacer 482 is specifically located between the common electrode 46 and the stepped structure 480. The second spacer 482 is the area where the common electrode 46 is not disposed after the first substrate layer 41 and the dimming layer 43 are removed. The second spacer 482 prevents the common electrode 46 from electrically connecting the first conductive layer 42 and the second conductive layer 44, thereby preventing a short circuit.

[0160] In this embodiment, when setting the isolation structure 40, taking the isolation structure 40 including an etching line as an example, the steps of setting the isolation structure 40 specifically include: using laser to act on the second conductive layer 44 through the second substrate layer 45 to etch the etching line.

[0161] The isolation structure 40 separates the second conductive layer 44 into a first portion 441 that is electrically conductive with the common electrode 46 and a second portion 442 that is disconnected from the common electrode 46. Specifically, the isolation structure 40 can be formed by removing at least a portion of the conductive material from the second conductive layer 44 at a predetermined distance from the step contact formed at the first spacer 481. The isolation structure 40 extends entirely along the direction in which the plurality of partition electrodes 47 are spaced apart.

[0162] By setting up the isolation structure 40, the current transmitted from the common electrode 46 to the second conductive layer 44 can only flow through the first part 441 to the isolation structure 40, and cannot flow through the isolation structure 40 to the second part 442, which is equivalent to no current flowing through the second part 442. In this way, even if the first conductive layer 42 and the second conductive layer 44 are close to each other in the future, the current of the two will not increase and ablation will occur along the half-cut position, causing the relatively short partition electrode 47 to gradually fail, and then cause the partition failure problem.

[0163] Please refer to Figure 13 、 Figure 14 、 Figure 15 、 Figure 16 As shown, in one embodiment, the electrode length of the common electrode 46 is ≤300 mm, the electrode length of at least one of the partition electrodes 47 is ≤300 mm, and the isolation structure 40 includes a first isolation structure 405 and a second isolation structure 406; the first isolation structure 405 is arranged on the second conductive layer 44 within a predetermined distance range from the first spacing area 481, and the first isolation structure 405 separates the second conductive layer 44 into a first part 441 that can be electrically connected to the common electrode 46 and a second part 442 that is disconnected from the common electrode 46; the second isolation structure 406 is arranged on the first conductive layer 42 within a predetermined distance range from the second spacing area 482, and the second isolation structure 406 separates the first conductive layer 42 into a third part 423 that can be electrically connected to the partition electrode 47 and a fourth part 424 that is disconnected from the partition electrode 47.

[0164] For one of the multiple situations in which the length of at least one of the partition electrodes 47 and / or the electrode length of the common electrode 46 is ≤300 mm, the length of one of the partition electrodes 47 is within 300 mm, the length of the common electrode 46 is within 300 mm, and the other length of the partition electrode 47 is greater than 300 mm.

[0165] like Figure 13 and Figure 14 As shown, a first partition S1 and a second partition S2 are formed in the first conductive layer 42 through a partition line 49 .

[0166] The length of the partition electrode 47 corresponding to the first partition S1 is ≤300 mm, for example, 150 mm, and the length of the partition electrode 47 corresponding to the second partition S2 is greater than 300 mm, for example, 800 mm. The length of the common electrode 46 is ≤300 mm, for example, 250 mm.

[0167] like Figure 16 As shown, a first isolation structure 405 can be set for the partition electrode 47 of the first partition S1. Specifically, the first isolation structure 405 is set on the second conductive layer 44 within a predetermined distance range from the first spacing area 481. The first isolation structure 405 separates the second conductive layer 44 into a first part 441 that can be electrically conductive with the common electrode 46 and a second part 442 that is disconnected from the common electrode 46.

[0168] like Figure 15 As shown, a second isolation structure 406 may be provided for the common electrode 46. Specifically, the second isolation structure 406 is provided on the first conductive layer 42 within a predetermined distance from the second spacing region 482. The second isolation structure 406 separates the first conductive layer 42 into a third portion 423 electrically connected to the partition electrode 47 with an electrode length of ≤300 mm and a fourth portion 424 disconnected from the partition electrode.

[0169] The specific structures, parameters and corresponding technical effects of the first isolation structure 405 and the second isolation structure 406 can be referred to the specific description of the above embodiment, and will not be repeated in this application.

[0170] Please refer to Figures 9 to 12 When the dimming film 4 is a dimming film without partitions, that is, Figure 10As shown, the cross-section of the dimming film 4 does not have partition lines. The first electrode group generally includes a first electrode 460, and the second electrode group generally includes a second electrode 470. If the length of at least one of the first electrode 460 and the second electrode 470 is less than 300 mm, an isolation structure 40 can be provided for the electrode with a length less than 300 mm.

[0171] by Figure 9 For example, the length of the first electrode 460 is within 300 mm, such as 260 mm, and the length of the second electrode 470 is greater than 300 mm, such as 500 mm. In this way, the isolation structure 40 can be set only for the first electrode.

[0172] Specific settings, such as Figure 12 As shown, a first electrode 460 is formed corresponding to the first predetermined edge region of the first conductive layer 42, and a first spacing region 481 is formed between the first electrode 460 and the second conductive layer 44; Figure 11 As shown, a second electrode 470 is formed in a second predetermined edge area of the second conductive layer 44, a second spacing area 482 is formed between the second electrode 470 and the first conductive layer 42, and an isolation structure 40 is provided on the second conductive layer 44 within a predetermined distance range from the first spacing area 481. The isolation structure 40 separates the second conductive layer 44 into a first part 441 that can be electrically conductive with the second electrode 470 and a second part 442 that is disconnected from the second electrode 470.

[0173] The specific structure, parameters and corresponding technical effects of the above-mentioned isolation structure 40 can be referred to the specific description of the above-mentioned embodiment, and this application will not repeat them here.

[0174] The above-mentioned method for manufacturing a dimming film is mainly designed for a dimming film 4 with partitions. For a dimming film 4 without partitions, the present application also provides a method for manufacturing a dimming film. The dimming film 4 includes: a first substrate layer 41, a dimming layer 43, and a second substrate layer 45. The first substrate layer 41 is provided with a first conductive layer 42, and the second substrate layer 45 is provided with a second conductive layer 44. The method for manufacturing the dimming film includes the following steps:

[0175] Step S20 : forming a first electrode 460 at a first predetermined edge of the first conductive layer 42 , and forming a first spacer 481 between the first electrode 460 and the second conductive layer 44 ;

[0176] Step S22 : forming a second electrode 470 at a second predetermined edge of the second conductive layer 44 ; forming a second spacer 482 between the second electrode 470 and the first conductive layer 42 ;

[0177] Step S24: When at least one of the first electrode 460 and the second electrode 470 has a length ≤300 mm, the electrode with a length ≤300 mm is arranged on a conductive layer, and an isolation structure 40 is arranged on another conductive layer within a predetermined range of an isolation area close to the electrode with a length ≤300 mm, separating the other conductive layer into a first part 441 that can be electrically connected to the electrode on the other conductive layer and a second part 442 that is disconnected from the electrode on the other conductive layer.

[0178] In general, the method for manufacturing the dimming film without partitions is basically the same or similar to the method for manufacturing the dimming film with partitions, except that the step S10 of setting partitions is omitted, and the present application will not elaborate on the steps here.

[0179] Please refer to Figure 3 、 Figure 7 and Figure 8 As shown, a dimming glass is also provided in the embodiment of the present application, and the dimming glass mainly includes the above-mentioned dimming film 4. The dimming glass can achieve the technical effect achieved by the dimming film 4 embodiment by setting the dimming film 4. For details, please refer to the specific description of the above-mentioned embodiment, and this application will not repeat it here.

[0180] Furthermore, the dimming glass may also include: an outer glass 1 and an inner glass 6, the outer glass 1 and the dimming film 4 are connected by a first adhesive layer 2, and the inner glass 6 and the dimming film 4 are connected by a second adhesive layer 5, the outline size of the dimming film 4 is smaller than the outline size of the outer glass 1 and the inner glass 6, and the outer periphery of the dimming film 4 is also provided with an adhesive filling layer, the inner side of the adhesive filling layer is connected to the dimming film 4, and the outer side of the adhesive filling layer is the same as the outline size of the outer glass 1 or the inner glass 6.

[0181] In this embodiment, the switchable glass may include an outer glass 1, a first adhesive layer 2, a switchable film 4, a second adhesive layer 5, and an inner glass 6 which are stacked in sequence from the inside out.

[0182] In the embodiments of the present application, the application of the smart glass in a vehicle (especially a smart electric vehicle) is mainly used as an example for illustration. When the smart glass is used in other scenarios, this application can be used as a reference.

[0183] The outer glass 1 must meet predetermined transmittance requirements. Specifically, the transmittance of the outer glass 1 must be greater than 70%. Specifically, the outer glass 1 can have a color combination of SG / G / C (dark green / green / transparent), any combination of the three, not limited to the inner and outer order. The outer glass 1 has opposing first and second surfaces, with the first surface being the outer surface in contact with the vehicle's exterior, and the second surface being used for bonding the first adhesive layer 2.

[0184] The material of the first adhesive layer 2 can be any one of the following: PVB (polyvinyl butyral), EVA (ethylene-vinyl acetate copolymer), TPU (thermoplastic polyurethane elastomer), SGP (ionic interlayer) and other adhesive films.

[0185] The inner glass 6 must meet predetermined transmittance requirements. Specifically, the transmittance of the inner glass 6 must be greater than 70%. Specifically, the glass color composition of the inner glass 6 can be: SG / G / C (dark green / green / transparent), any combination of the three, not limited to the inner and outer order. The inner glass 6 has opposing third and fourth surfaces, with the fourth surface being the inner surface in contact with the vehicle interior, and the third surface being used for bonding the second adhesive layer 5.

[0186] The material of the second adhesive layer 5 can be selected from any one of the following: PVB (polyvinyl butyral), EVA (ethylene-vinyl acetate copolymer), TPU (thermoplastic polyurethane elastomer), SGP (ionic interlayer) and other adhesive films.

[0187] The outline dimensions of the dimming film 4 are smaller than those of the outer glass 1 and the inner glass 6. A filler area is formed between the outer contour of the dimming film 4 and the outer contours of the outer glass 1 and the inner glass 6, and the adhesive filler layer fills this filler area. The thickness of the adhesive filler layer is the same as or substantially the same as that of the dimming film 4. The adhesive filler layer surrounds the outer periphery of the dimming film 4, providing a circumferential seal around the dimming film 4.

[0188] The material of the adhesive filling layer can be any one of the following: PVB (polyvinyl butyral), EVA (ethylene-vinyl acetate copolymer), TPU (thermoplastic polyurethane elastomer), SGP (ionic interlayer) and other adhesive films.

[0189] In one embodiment, the switchable glass may further include: a shielding area 7, wherein the shielding area 7 is arranged in a predetermined peripheral area between the first adhesive layer 2 and the outer glass 1, and a predetermined outer ring area between the second adhesive layer 5 and the inner glass 6, and a distance D4 from the isolation structure 40 to the inner side of the edge of the shielding area 7 is at least 2 mm.

[0190] In this embodiment, the shielding area 7 is provided at the edge of the switchable glass to shield the partition electrodes 47, the common electrode 46, and the isolation structure 40, thereby ensuring the overall neatness and aesthetics of the switchable glass. Since the isolation structure 40 is the innermost of all structures to be shielded, to ensure that the isolation structure 40 is reliably shielded by the shielding area 7, the distance D4 from the isolation structure 40 to the inner edge of the shielding area 7 must be at least 2 mm.

[0191] A vehicle is also provided in an embodiment of the present application, and the above-mentioned dimming glass is provided on the doors and windows of the vehicle. By providing the above-mentioned dimming glass, the vehicle can achieve the technical effect achieved by the dimming glass embodiment. For details, please refer to the specific description of the above-mentioned embodiment, and this application will not repeat it here.

[0192] It should be noted that, in the description of this application, the terms "first," "second," etc., are used solely for descriptive purposes and to distinguish similar objects. There is no order of precedence between the two, nor should they be understood to indicate or imply relative importance. Furthermore, in the description of this application, unless otherwise specified, "plurality" means two or more.

[0193] The above-mentioned various embodiments in this specification are described in a progressive manner. The same or similar parts between the various embodiments can be referenced to each other. Each embodiment focuses on the differences from other embodiments.

[0194] The above are only a few embodiments of the present invention. Although the embodiments disclosed in the present invention are as above, the contents are only embodiments adopted to facilitate understanding of the present invention and are not intended to limit the present invention. Any person skilled in the art of the present invention may make any modifications and changes in the form and details of the embodiments without departing from the spirit and scope disclosed in the present invention. However, the scope of patent protection of the present invention shall still be based on the scope defined by the appended claims.

Claims

1. A dimming film, characterized in that: The dimming film comprises: a first substrate layer, a dimming layer, and a second substrate layer, wherein the first substrate layer has a first surface away from the dimming layer and a second surface close to the dimming layer, and a first conductive layer is provided on the second surface; the second substrate layer has a third surface close to the dimming layer and a fourth surface away from the dimming layer, and a second conductive layer is provided on the third surface; A first electrode group is provided at a first predetermined edge of the first conductive layer, the first electrode group includes at least one first electrode, and a first spacing region is formed between the first electrode group and the second conductive layer; a second electrode group is provided at a second predetermined edge of the second conductive layer, the second electrode group includes at least one second electrode, and a second spacing region is formed between the second electrode group and the first conductive layer; At least one of the first electrode and the second electrode has a length of ≤300 mm; the electrode with a length of ≤300 mm is arranged on a conductive layer, and the other conductive layer is provided with an isolation structure within a predetermined range of an isolation area close to the electrode with a length of ≤300 mm, and the isolation structure separates the other conductive layer into a first part that can be electrically connected to the electrode on the other conductive layer and a second part that is disconnected from the electrode on the other conductive layer.

2. The dimming film according to claim 1, wherein: A plurality of partitions are formed in the first conductive layer, and the first electrode is a partition electrode formed in a first predetermined edge region of the first conductive layer corresponding to each of the partitions; The second electrode is a common electrode formed in a second predetermined edge region of the second conductive layer; The partition electrodes include a plurality of partition electrodes, and the length of at least one partition electrode and / or the electrode length of the common electrode is ≤300 mm.

3. The dimming film according to claim 2, wherein: The electrode length of at least two of the partition electrodes is ≤300mm, and the number of the isolation structures is set corresponding to the partition electrodes with electrode length ≤300mm; or, the number of the isolation structure is one, and one isolation structure completely isolates all partition electrodes with electrode length ≤300mm.

4. The dimming film according to claim 2, wherein: The electrode length of the common electrode is ≤300 mm, the electrode length of at least one of the partition electrodes is ≤300 mm, and the isolation structure includes a first isolation structure and a second isolation structure; The first isolation structure is provided in the second conductive layer within a predetermined distance range from the first spacing region, and the first isolation structure separates the second conductive layer into a first portion electrically connected to the common electrode and a second portion disconnected from the common electrode; The second isolation structure is arranged in the first conductive layer within a predetermined distance range from the second spacing area, and the second isolation structure separates the first conductive layer into a third part that can be electrically conductive with the partition electrode with an electrode length of ≤300mm and a fourth part that is disconnected from the partition electrode with a length of ≤300mm.

5. The dimming film according to claim 1, wherein: The isolation structure includes: an etching line, which is obtained by removing material of the other conductive layer with a predetermined removal width on the other conductive layer; or, the isolation structure includes: a cutting portion, which is obtained by removing material of the other conductive layer with a predetermined removal width on the other conductive layer and removing the substrate layer outside the other conductive layer with the predetermined removal width.

6. The dimming film according to claim 1, wherein: The predetermined distance between the isolation structure and the spacing area close to the electrode with a length of ≤300 mm is between 1 mm and 15 mm.

7. The dimming film according to claim 1, wherein: The cross-sectional width of the first spacer region or the second spacer region is between 1 mm and 15 mm.

8. The dimming film according to claim 1, wherein: The cross-sectional width of the first predetermined edge region is between 2 mm and 12 mm, and the cross-sectional width of the second predetermined edge region is between 2 mm and 12 mm.

9. The dimming film according to claim 3, wherein: The isolation structure extends entirely along a direction in which the plurality of partition electrodes are arranged at intervals.

10. The dimming film according to claim 9, wherein: The dimming film has a first side and a second side opposite to each other, the first predetermined edge area is arranged close to the first side, and the second predetermined edge area is arranged close to the second side, and a plurality of partition electrodes are arranged at intervals along the first side to form a longitudinal partition electrode assembly. The dimming film has a third side and a fourth side connected between the first side and the second side, the common electrode extends along the second side and the third side, and one end of the common electrode is arranged close to one end of the partition electrode assembly.

11. A dimming glass, characterized in that: The switchable glass comprises the switchable film according to any one of claims 1 to 10.

12. The switchable glass according to claim 11, wherein: The smart glass further includes: an outer sheet of glass and an inner sheet of glass, the outer sheet of glass being connected to the smart film by a first adhesive layer, and the inner sheet of glass being connected to the smart film by a second adhesive layer. The smart glass further includes: a shielding area, the shielding area being arranged in a predetermined peripheral area between the first adhesive layer and the outer sheet of glass, and in a predetermined outer ring area between the second adhesive layer and the inner sheet of glass, and the distance from the isolation structure to the inner side of the edge of the shielding area is at least 2 mm.

13. A vehicle, characterized in that: The vehicle comprises the switchable glass according to any one of claims 11 to 12.

14. A method for manufacturing a dimming film, characterized in that: The dimming film comprises: a first substrate layer, a dimming layer, and a second substrate layer, wherein the first substrate layer is provided with a first conductive layer, and the second substrate layer is provided with a second conductive layer; and a method for manufacturing the dimming film comprises the following steps: forming a first electrode at a first predetermined edge of the first conductive layer, and forming a first spacing region between the first electrode and the second conductive layer; forming a second electrode at a second predetermined edge of the second conductive layer; and forming a second spacing region between the second electrode and the first conductive layer; When the length of at least one of the first electrode and the second electrode is ≤300 mm, the electrode with a length ≤300 mm is arranged on a conductive layer, and an isolation structure is arranged on another conductive layer within a predetermined range of an isolation area close to the electrode with a length ≤300 mm, so as to separate the other conductive layer into a first part that can be electrically connected to the electrode on the other conductive layer and a second part that is disconnected from the electrode on the other conductive layer.

15. A method for manufacturing a dimming film, characterized in that: The dimming film comprises: a first substrate layer, a dimming layer, and a second substrate layer, wherein the first substrate layer is provided with a first conductive layer, and the second substrate layer is provided with a second conductive layer; and a method for manufacturing the dimming film comprises the following steps: Forming a plurality of partitions on the first conductive layer; A common electrode is formed on one side of the second conductive layer, and a partition electrode is formed for each partition on the other side of the first conductive layer, a first spacing region is formed between the plurality of partition electrodes and the second conductive layer, and a second spacing region is formed between the common electrode and the first conductive layer; An isolation structure is provided within a predetermined distance range between the second conductive layer and the first spacing region, and the second conductive layer is separated into a first part and a second part relative to each other along the isolation structure, wherein the first part is relatively close to the common electrode and can be electrically conductive with the common electrode, and the second part is relatively far away from the common electrode and is disconnected from the common electrode.

16. The method for manufacturing a dimming film according to claim 15, wherein: The step of forming partitions specifically includes: The plurality of partitions are etched by using a laser to act on the first conductive layer through the first substrate layer or by using a laser to act directly on the first conductive layer.

17. The method for manufacturing a dimming film according to claim 15, wherein: The isolation structure includes an etched line, and the steps of providing the isolation structure specifically include: The laser is used to penetrate the second base material layer and act on the second conductive layer to etch the etching line.

18. The method for manufacturing a dimming film according to claim 17, wherein: The predetermined removal width of the etching line is within 100 μm.

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