Bacteria cleaning equipment, control method thereof and semiconductor waste gas treatment system

Abstract

The invention relates to the technical field of equipment cleaning, and provides bacteria cleaning equipment, a control method thereof and a semiconductor waste gas treatment system. The bacteria cleaning equipment comprises a water tank, a heating assembly, a water pump assembly and a detection assembly, the water tank is provided with a containing cavity, a water return port and a feeding port, the water return port and the feeding port communicate with the containing cavity, and the water return port is connected with the semiconductor waste gas treatment system; the heating assembly is arranged in the accommodating cavity; the water pump assembly is connected to the water tank; the detection assembly comprises a temperature detector, a flow detector and a pressure detector, the temperature detector is arranged in the containing cavity, and the flow detector and the pressure detector are arranged at the water return opening. According to the bacterium cleaning equipment disclosed by the embodiment of the invention, the water path of the semiconductor waste gas treatment system can be cleaned through the bacterium cleaning equipment, so that the system blockage risk is reduced, whether the cleaned water path is qualified or not can be known by detecting the water return port of the bacterium cleaning equipment, and problems can be found as soon as possible; the replacement cost is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of equipment cleaning, and in particular to a bacteria cleaning device and a control method thereof, and a semiconductor waste gas treatment system. Background Art

[0002] In semiconductor manufacturing, waste gas treatment systems are used to purify process waste gases containing acidic, alkaline, or organic pollutants. However, the organic components, humidity, and temperature in the waste gas, particularly in systems employing wet scrubbing or spray treatment, can easily breed bacteria and microorganisms.

[0003] When the pH value of the circulating water or scrubbing fluid in the exhaust gas treatment system approaches neutral (e.g., 6.0-8.0), bacterial growth accelerates. These bacteria can attach to key components such as pipes, nozzles, pumps, and heat exchangers, leading to blockages, reduced flow, and decreased heat exchange efficiency in the semiconductor exhaust gas treatment system. Over time, these bacteria can cause abnormal pressure in the semiconductor exhaust gas treatment system, overload the pump, and even cause equipment downtime, seriously impacting the stability of semiconductor production and the efficiency of exhaust gas treatment.

[0004] Currently, common solutions include the addition of chemical fungicides, ultraviolet disinfection, and regular manual cleaning. However, chemical fungicides may introduce new pollutants, affecting wastewater treatment; ultraviolet disinfection has limited effectiveness in sterilizing flowing liquids; and manual cleaning is associated with long downtime and high maintenance costs. Summary of the Invention

[0005] This application aims to address at least one of the technical problems existing in the related art. To this end, this application proposes a bacterial cleaning device that can be used to clean the water path of a pre-semiconductor exhaust gas treatment system to reduce the risk of system blockage. Furthermore, by testing the return water outlet of the bacterial cleaning device, it can be determined whether the cleaned water path is qualified, thereby detecting problems early and reducing replacement costs.

[0006] This application also proposes a semiconductor waste gas treatment system.

[0007] This application also proposes a control method for bacteria cleaning equipment.

[0008] A bacteria cleaning device according to an embodiment of the first aspect of the present application includes: A water tank is provided with a receiving cavity, a water return port and a feeding port, wherein the water return port and the feeding port are connected to the receiving cavity, and the water return port is connected to the semiconductor exhaust gas treatment system; A heating component is disposed in the accommodating cavity; a water pump assembly connected to the water tank and adapted to pump the liquid in the accommodating chamber to the outlet of the bacteria cleaning device, wherein the outlet of the bacteria cleaning device is connected to the accommodating chamber; The detection component includes a temperature detector, a flow detector and a pressure detector. The temperature detector is arranged in the accommodating cavity, and the flow detector and the pressure detector are arranged at the water return port.

[0009] According to the bacterial cleaning equipment of the embodiment of the present application, the water channel of the front semiconductor exhaust treatment system can be cleaned by the bacterial cleaning equipment to reduce the risk of system blockage. The return water outlet of the bacterial cleaning equipment can also be tested to know whether the water channel after cleaning is qualified, so as to discover problems as early as possible and reduce replacement costs.

[0010] According to one embodiment of the present application, a controller is included, which is connected to the water pump component, the heating component and the detection component to achieve control of water flow, control of water temperature and control of circulation processing time.

[0011] According to one embodiment of the present application, the controller is adapted to: When the flow detector detects that the water flow rate is between 40 L / min and 60 L / min, the cleaning time of the bacteria cleaning device is controlled to be 15 minutes; When the flow detector detects that the water flow rate is between 30 L / min and 40 L / min, the cleaning time of the bacteria cleaning device is controlled to be 25 minutes; When the flow detector detects that the water flow rate is between 15 L / min and 30 L / min, the cleaning time of the bacteria cleaning device is controlled to be 40 minutes; When the flow detector detects that the water flow rate is below 15 L / min, the cleaning time of the bacteria cleaning device is controlled to be 60 minutes.

[0012] According to one embodiment of the present application, the controller is adapted to control the heating component to heat the liquid in the accommodating chamber to a preset temperature or a set temperature.

[0013] According to one embodiment of the present application, the controller is adapted to control the water pump assembly to switch alternately between a first speed and a second speed.

[0014] According to one embodiment of the present application, the bacteria cleaning device includes an electrical box, the controller is arranged inside the electrical box, a touch screen is provided outside the electrical box, and the touch screen is connected to the controller.

[0015] According to one embodiment of the present application, the bacteria cleaning device includes a moving component, and the water tank, the water pump component and the detection component are arranged on the moving component.

[0016] According to one embodiment of the present application, the bacteria cleaning device includes a drain valve, which is installed at a drain port of the water tank, and the drain port is connected to the accommodating chamber.

[0017] A semiconductor exhaust gas treatment system according to an embodiment of the second aspect of the present application includes: Industrial frequency water pump; A first fluid control element is provided with a first inlet, a second inlet and a first outlet, wherein the first inlet is connected to the power frequency water pump; A Y-type filter connected to the first outlet; A heat exchanger connected to the outlet of the Y-type filter, The switch valve body is connected to the outlet of the heat exchanger. A flow switch connected to the outlet of the switch valve body, a second fluid control element having a third inlet, a second outlet, and a third outlet, wherein the third inlet is connected to the outlet of the flow switch, and the second outlet is suitable for connecting to an external device; In the above-mentioned bacteria cleaning device, the water return port of the bacteria cleaning device is connected to the third outlet, and the outlet of the bacteria cleaning device is connected to the second inlet.

[0018] According to one embodiment of the present application, it includes a first valve body, a second valve body, a third valve body and a fourth valve body, the first valve body is arranged between the industrial frequency water pump and the first fluid control element, the second valve body is arranged between the bacteria cleaning device and the first fluid control element, the third valve body is arranged between the second fluid control element and the external device, and the fourth valve body is arranged between the bacteria cleaning device and the second fluid control element.

[0019] A control method for a bacteria cleaning device according to an embodiment of the third aspect of the present application is applied to the above-mentioned bacteria cleaning device, including: Controlling the heating component to heat the liquid in the water tank; Acquiring the temperature in the water tank, and controlling the water pump assembly to start when the temperature of the water tank reaches a preset temperature or a set temperature; Obtaining the water flow rate of the return water outlet, and determining the cleaning time based on the water flow rate; Controlling the water pump assembly to alternately switch between a first speed and a second speed; After the cleaning time is reached, the water flow rate of the return port is obtained again, and the system status is determined based on the flow rate. If the water flow rate is lower than the preset standard value, a disassembly maintenance signal is generated. If the water flow rate meets the preset standard value, a water channel qualified signal is generated.

[0020] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become obvious from the description below, or will be learned through practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the present invention or the prior art, a brief introduction is given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0022] Figure 1 It is a structural schematic diagram of the bacteria cleaning device provided in an embodiment of the present application.

[0023] Figure 2 It is a structural schematic diagram of the semiconductor waste gas treatment system provided in an embodiment of the present application.

[0024] Figure 3 This is a schematic diagram of the steps of the control method of the bacteria cleaning equipment provided in an embodiment of the present application.

[0025] Reference numerals: 10. Bacteria cleaning equipment; 20. Power frequency water pump; 30. First fluid control element; 31. First inlet; 32. Second inlet; 33. First outlet; 40. Y-type filter; 50. Heat exchanger; 60. Switch valve body; 70. Flow switch; 80, second fluid control element; 81, third inlet; 82, second outlet; 83, third outlet; 91. First valve body; 92. Second valve body; 93. Third valve body; 94. Fourth valve body; 100, water tank; 101, receiving chamber; 102, water return port; 103, feeding port; 104, drain port; 200, heating component; 300. Water pump assembly; 301. Outlet of bacteria cleaning equipment; 400, detection component; 410, temperature detector; 420, flow detector; 430, pressure detector; 500, electrical box; 600. Mobile components. DETAILED DESCRIPTION

[0026] The following embodiments of the present invention are described in further detail with reference to the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0027] In the description of the embodiments of the present application, it should be noted that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing the embodiments of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the embodiments of the present application. In addition, the terms "first", "second", and "third" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0028] In the description of the embodiments of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "connected" and "connection" should be understood in a broad sense. For example, they can refer to fixed or detachable connections, where fixed connections can include integral connections; they can refer to mechanical or electrical connections; and they can refer to direct connections or indirect connections through an intermediary. Those skilled in the art will understand the specific meanings of the above terms in the embodiments of this application based on the specific circumstances.

[0029] In the embodiments of the present application, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Furthermore, a first feature being "above," "above," and "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0030] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the embodiments of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine different embodiments or examples described in this specification and the features of different embodiments or examples, unless they are contradictory.

[0031] In semiconductor exhaust treatment systems, the waterways are prone to clogging after long-term operation due to factors such as bacterial growth, particle deposition, or chemical crystallization. Currently, common cleaning methods rely primarily on manual disassembly and cleaning. For example, filter cleaning requires removing the filter from the pipeline, opening the outer casing, and cleaning the filter layer by layer. This is cumbersome and can easily damage the precision filter element. Heat exchanger 50 cleaning requires removing the heat exchanger 50 from the machine and disassembling the heat exchanger plates for manual scrubbing or chemical soaking, which is time-consuming and requires high operator expertise. Nozzle / pipeline cleaning requires disassembling the pipeline or nozzle in sections and using a high-pressure water gun or ultrasonic cleaning. Frequent disassembly and assembly can lead to seal aging or leakage. Due to the complex steps, long downtime, and the need for professional technicians, users often choose to directly replace clogged components (such as filters, heat exchangers 50, etc.) in actual maintenance, significantly increasing maintenance costs.

[0032] The present application proposes a bacterial cleaning device 10, which can be used to clean the water channel of the front semiconductor exhaust treatment system to reduce the risk of system blockage. The return water port 102 of the bacterial cleaning device 10 can also be tested to know whether the water channel after cleaning is qualified. If the water flow rate of the return water port 102 is qualified, there is no need to replace the components in the water channel. If the water flow rate of the return water port 102 is unqualified, the components in the water channel need to be replaced, so as to discover the problem as early as possible and reduce the replacement cost.

[0033] It should be noted that the bacterial cleaning equipment 10 of the present application can be independent of the semiconductor exhaust treatment system. When the semiconductor exhaust treatment system needs regular maintenance, the water outlet of the bacterial cleaning equipment 10 is connected to the water outlet end of the industrial frequency water pump 20 of the exhaust treatment system, and the return water port 102 of the bacterial cleaning equipment 10 is connected to the end of the water circuit. The heat exchanger 50, filter, circulation pipeline and other parts in the water circuit of the semiconductor exhaust treatment system can be automatically cleaned, avoiding the tedious work burden brought by disassembling the pipeline.

[0034] The bacterial cleaning device 10 of the present application can determine the blockage status of the semiconductor waste gas treatment system waterway based on values such as the water flow rate, thereby adjusting the cleaning time and cleaning plan. After cleaning, the bacterial cleaning device 10 will also determine the cleaning effect based on values such as the water flow rate.

[0035] It should be noted that after the semiconductor exhaust treatment system is connected to the bacterial cleaning device 10 of the present application, bacteria in the semiconductor exhaust treatment system waterway can be treated with high-temperature water or disinfectant. Blockages in the semiconductor exhaust treatment system waterway can be treated by using a pulse method in which the water pump assembly 300 alternates between a first speed and a second speed.

[0036] It should be noted that the entire process of the bacteria cleaning equipment 10 of the present application is controlled by an automated program, and the entire cleaning process reduces manual participation, so that personnel can free up this part of the cleaning time to perform other cleaning work, thereby reducing the overall cleaning time.

[0037] The following combination Figure 1-Figure 3 The bacterial cleaning device 10 and its control method, and the semiconductor exhaust gas treatment system of the present invention are described.

[0038] A bacteria cleaning device 10 proposed in an embodiment of the present application includes: The water tank 100 is provided with a receiving chamber 101, a water return port 102 and a feeding port 103. The water return port 102 and the feeding port 103 are connected to the receiving chamber 101. The water return port 102 is connected to the semiconductor waste gas treatment system. The heating component 200 is disposed in the accommodating cavity 101; The water pump assembly 300 is connected to the water tank 100 and is adapted to pump the liquid in the accommodating chamber 101 to the outlet 301 of the bacteria cleaning device 10 . The outlet 301 of the bacteria cleaning device 10 is connected to the accommodating chamber 101 . The detection assembly 400 includes a temperature detector 410 , a flow detector 420 and a pressure detector 430 . The temperature detector 410 is disposed in the accommodating cavity 101 , and the flow detector 420 and the pressure detector 430 are disposed at the water return port 102 .

[0039] According to the bacterial cleaning device 10 of the embodiment of the present application, the water channel of the front semiconductor exhaust treatment system can be cleaned by the bacterial cleaning device 10 to reduce the risk of system blockage. The return water port 102 of the bacterial cleaning device 10 can also be inspected to know whether the water channel after cleaning is qualified, thereby discovering problems as early as possible and reducing replacement costs.

[0040] As will be understood, the chamber 101 of the water tank 100 is used to store liquid (such as a mixture of disinfectant or cleaning fluid and water) to ensure sufficient cleaning of the semiconductor exhaust treatment system's waterways. The return port 102 is connected to the semiconductor exhaust treatment system's waterways, allowing the cleaned liquid to flow back into the water tank 100, forming a circulating cleaning system. The feed port 103 is used to add cleaning fluid or disinfectant to the chamber 101.

[0041] The heating component 200 is disposed in the accommodating cavity 101 and is used to heat the cleaning liquid. Heating can enhance the activity of the bactericide or cleaning liquid, making it more effective in decomposing or killing bacteria in the waterway, thereby improving the cleaning efficiency.

[0042] The water pump assembly 300 is connected to the water tank 100 and is used to pump the liquid in the accommodating chamber 101 to the outlet 301 of the bacteria cleaning device 10 and form a circulation through the return water port 102 .

[0043] The detection assembly 400 includes a temperature detector 410, a flow detector 420, and a pressure detector 430. The temperature detector 410 is installed in the accommodating chamber 101 and is used to monitor the temperature of the cleaning liquid in real time to ensure that the heating assembly 200 operates within the optimal temperature range. The flow detector 420 and pressure detector 430 are installed at the return water port 102. The flow detector 420 and pressure detector 430 are used to detect the flow rate and pressure of the returning liquid to determine whether the waterway is unobstructed. If the flow rate or pressure is abnormal, it indicates that the waterway is blocked.

[0044] The bacteria cleaning device 10 of the present application realizes the automated cleaning and real-time monitoring of the water channel of the semiconductor waste gas treatment system through the coordinated work of the water tank 100 circulation system, the heating component 200, the water pump component 300 and the detection component 400.

[0045] It should be noted that the bacterial cleaning device 10 of the present application is not only applicable to semiconductor waste gas treatment systems, but can also be extended to other industrial or medical equipment that requires regular waterway cleaning.

[0046] In some possible embodiments, a filtering device is provided in the water tank 100 or the water return port 102 to prevent impurities that fall off during the cleaning process from re-entering the water system.

[0047] According to one embodiment of the present application, a controller is included, which is connected to the water pump component 300, the heating component 200 and the detection component 400 to achieve control of water flow, water temperature and circulation processing time.

[0048] It is understandable that the controller is electrically connected to the water pump assembly 300, the heating assembly 200 and the detection assembly 400 to coordinate the working status of each component and realize an automated cleaning process.

[0049] The water flow control can dynamically adjust the power of the water pump assembly 300 based on feedback data from the flow detector 420, so that the liquid flow rate adapts to waterways with different pipe diameters or pollution levels. In some possible embodiments, the controller controls the water pump assembly 300 to alternate between a first speed and a second speed.

[0050] The water temperature can be controlled in combination with the data from the temperature detector 410 to adjust the power of the heating component 200 to maintain an optimal cleaning temperature (eg, 40-80° C. to enhance the activity of the bactericide).

[0051] The control of the cycle processing time can preset the cleaning cycle to avoid waste of resources caused by excessive cleaning, while ensuring that the waterway is continuously clean.

[0052] According to one embodiment of the present application, the controller is adapted to: When the flow detector 420 detects that the water flow rate is between 40 L / min and 60 L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 15 minutes; When the flow detector 420 detects that the water flow rate is between 30 L / min and 40 L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 25 minutes; When the flow detector 420 detects that the water flow rate is between 15 L / min and 30 L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 40 minutes; When the flow detector 420 detects that the water flow rate is below 15 L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 60 minutes.

[0053] It should be noted that the lower the flow rate, the higher the risk of waterway blockage. Prolonging the cleaning time can ensure that pollutants are completely removed.

[0054] When the flow rate detector 420 detects that the water flow rate is between 40L / min and 60L / min, the water flow rate is close to the normal value, indicating that there is no significant blockage in the waterway. The controller performs a 15-minute quick cleanup, mainly targeting small amounts of bacteria or new sediment.

[0055] When the flow detector 420 detects that the water flow rate is between 30L / min and 40L / min, the decrease in the water flow rate indicates the presence of sediment accumulation or biofilm attachment. The controller selects 25 minutes of cleaning based on the degree of blockage, and enhances the sterilization / dissolution effect by extending the contact time.

[0056] When the flow detector 420 detects that the water flow rate is between 15L / min and 30L / min, the water flow rate further decreases, indicating that sediment has accumulated to a certain extent. The cleaning time of the bacteria cleaning device 10 is controlled to 40 minutes, and the sterilization / dissolution effect is enhanced by extending the contact time.

[0057] When the flow detector 420 detects that the water flow rate is below 15L / min, the water flow rate is seriously insufficient, which may be due to long-term cleaning or hard scaling (such as calcium salt deposition). The cleaning time of the bacteria cleaning device 10 is controlled to 60 minutes, and the water temperature can be increased (such as to 60°C) by the linked heating component 200 to enhance the activity of the cleaning agent.

[0058] It is understandable that the water channel cleaning cycle of a general semiconductor waste gas treatment system is within 2 hours. If the water channel cannot be cleaned within one hour, the components on the water channel need to be directly replaced.

[0059] According to one embodiment of the present application, the controller is adapted to control the heating assembly 200 to heat the liquid in the accommodating chamber 101 to a preset temperature or a set temperature.

[0060] The controller heats the liquid in the accommodating chamber 101 to a preset temperature or a set temperature by adjusting the power of the heating component 200 to ensure the efficiency and safety of the cleaning process.

[0061] The preset temperature is the default recommended temperature of the bacteria cleaning device 10, which is suitable for most common cleaning scenarios. In one embodiment, the preset temperature is 80° C. The set temperature is a temperature value that the user can adjust according to actual needs.

[0062] It should be noted that different fungicides have different optimal activity temperatures, so users can adjust the set temperature according to the fungicide.

[0063] In some possible embodiments, the user may set the target temperature (eg, adjustable from 40° C. to 80° C.) through a controller interface (eg, a touch screen, a knob, or a remote terminal).

[0064] In some possible embodiments, the controller may have built-in recommended temperatures for different cleaning scenarios (such as 50°C for conventional sterilization and 65°C for stubborn dirt), and the user can select it with one click.

[0065] According to one embodiment of the present application, the controller is adapted to control the water pump assembly 300 to switch alternately between a first speed and a second speed.

[0066] The controller controls the water pump assembly 300 to periodically switch between the first speed and the second speed through programming, thereby forming a pulsed water flow.

[0067] In one embodiment, the low speed is set to 30%-50% of the rated speed, and the high speed is set to 100%-120% of the rated speed. The switching cycle between the first speed and the second speed is 2-4 times per minute, and the first speed and the second speed are each maintained for 15-30 seconds.

[0068] According to one embodiment of the present application, the bacteria cleaning device 10 includes an electrical box 500, a controller is disposed inside the electrical box 500, and a touch screen is disposed outside the electrical box 500, which is connected to the controller.

[0069] The electrical box 500 houses and protects the device's internal electronic components, such as the controller. It provides isolation, protection, and support, preventing damage from external factors (such as dust, moisture, and mechanical shock). Placing the controller inside the electrical box 500 provides a relatively stable and safe operating environment.

[0070] The touch screen is located on the outside of the electrical box 500, making it easy for users to operate. Users can control the bacteria removal device 10 by simply performing simple operations on the touch screen without opening the electrical box 500. This design makes the device more intuitive and convenient to operate, reducing user difficulty and improving the device's usability. Furthermore, the connection between the touch screen and the controller ensures that user-entered operational commands are transmitted promptly and accurately to the controller, which can then quickly respond based on the commands, achieving real-time control of the device and improving the device's control accuracy and response speed.

[0071] In one embodiment, the top of the electrical box 500 is waterproof to prevent the water in the water tank 100 from overflowing / splashing onto the electrical box 500 due to some reasons.

[0072] According to one embodiment of the present application, the bacteria cleaning device 10 includes a moving assembly 600 , and the water tank 100 , the water pump assembly 300 and the detection assembly 400 are disposed on the moving assembly 600 .

[0073] The moving component 600 is provided with wheels, which enables the bacteria cleaning device 10 to move freely between different positions, making it easy to disassemble and assemble. When the bacteria cleaning device 10 is no longer needed, the bacteria cleaning device 10 can be removed from the semiconductor exhaust treatment system. When cleaning is required, the bacteria cleaning device 10 can be moved and installed on the semiconductor exhaust treatment system.

[0074] According to one embodiment of the present application, the bacteria cleaning device 10 includes a drain valve, which is installed at a drain port 104 of the water tank 100 , and the drain port 104 is connected to the accommodating chamber 101 .

[0075] After cleaning once, the liquid in the water tank 100 can be drained through the drain port 104. When adding water, it can be filled through the return pipe, and the drain valve can close the drain port 104.

[0076] In one embodiment, the water tank 100 is provided with a visual liquid level gauge to monitor the liquid level filling and prevent water overflow.

[0077] A semiconductor exhaust gas treatment system according to an embodiment of the present application includes: Power frequency water pump 20; The first fluid control element 30 is provided with a first inlet 31, a second inlet 32 and a first outlet 33, wherein the first inlet 31 is connected to the power frequency water pump 20; A Y-type filter 40 connected to the first outlet 33; The heat exchanger 50 is connected to the outlet of the Y-type filter 40. The switch valve body 60 is connected to the outlet of the heat exchanger 50. The flow switch 70 is connected to the outlet of the switch valve body 60. The second fluid control element 80 is provided with a third inlet 81, a second outlet 82 and a third outlet 83. The third inlet 81 is connected to the outlet of the flow switch 70, and the second outlet 82 is suitable for connecting to an external device. In the above-mentioned bacteria cleaning device 10 , the water return port 102 of the bacteria cleaning device 10 is connected to the third outlet 83 , and the outlet 301 of the bacteria cleaning device 10 is connected to the second inlet 32 .

[0078] The semiconductor waste gas treatment system involved in this application is a comprehensive device specifically designed to purify waste gas generated during the semiconductor manufacturing process. Semiconductor manufacturing processes are complex, and during production, waste gas containing various hazardous substances (such as volatile organic compounds, acidic gases, and alkaline gases) is emitted. Direct release of these waste gases into the atmosphere poses serious risks to the environment and human health. This system uses a series of physical, chemical, and biological treatment methods to remove or convert harmful substances from waste gas into harmless substances, ensuring that they meet national emission standards, achieving standard waste gas emissions, and protecting the environment.

[0079] The mains-frequency water pump 20 is a power device used to transport liquids (such as circulating water and absorption liquid) in semiconductor waste gas treatment systems. Powered by a mains-frequency power supply (typically 50Hz or 60Hz AC), it rotates its impeller through a motor, generating a certain pressure and flow rate to transport liquid from the intake to the discharge port. The mains-frequency water pump 20 offers advantages such as simple structure, reliable operation, and easy maintenance, meeting the system's basic liquid transportation requirements.

[0080] The first fluid control element 30 has three interfaces: a first inlet 31, a second inlet 32, and a first outlet 33. Through internal structural design (such as the valve core and valve seat), it can achieve switching and mixing control of the different inlet liquids. In this application, the first inlet 31 is connected to the power-frequency water pump 20 to receive the liquid delivered by the power-frequency water pump 20; the second inlet 32 is used to receive return water from the bacteria removal device 10; and the first outlet 33 outputs the mixed liquid to the subsequent Y-type filter 40.

[0081] Y-type filter 40 is a device used to filter impurities from liquid. Liquid enters through one end of the filter and is filtered by the filter screen of Y-type filter 40, trapping solid impurities (such as particulate matter and rust) in the liquid. The filtered, clean liquid then flows out of the other end of the Y-type filter 40. In this application, Y-type filter 40 is connected to the first outlet 33 of the first fluid control element 30 to perform preliminary filtration of the liquid entering the system, preventing impurities from entering subsequent equipment and affecting its normal operation and service life.

[0082] In a semiconductor waste gas treatment system, the heat exchanger 50 is primarily used to heat or cool the liquid to meet the temperature requirements of the liquid in different process steps of the system. At the same time, the heat exchanger 50 and the Y-type filter 40 are the locations most prone to clogging.

[0083] The on-off valve 60 is a valve used to control the flow of liquid. It has two states: open and closed. Through manual operation or an electric actuator, precise control of liquid flow can be achieved. In this application, the on-off valve 60 is connected to the outlet of the heat exchanger 50 and is used to control the flow of liquid after it has been processed by the heat exchanger 50. When the system needs to stop liquid delivery, closing the on-off valve 60 will cut off the flow of liquid.

[0084] The flow switch 70 is a device for detecting liquid flow and outputting a switch signal.

[0085] The second fluid control element 80, similar to the first fluid control element 30, is also used to control the direction and flow rate of liquid. It has three interfaces: a third inlet 81, a second outlet 82, and a third outlet 83. The third inlet 81 is connected to the outlet of the flow switch 70 to receive liquid after being monitored by the flow switch 70. The second outlet 82 is suitable for connecting to external equipment to deliver the treated liquid for external use. The third outlet 83 is connected to the return port 102 of the bacterial cleaning device 10, returning some of the liquid to the bacterial cleaning device 10, thus achieving liquid recycling.

[0086] It can be understood that the semiconductor waste gas treatment system of the present application realizes efficient treatment of semiconductor waste gas through the coordinated work of various components. The industrial frequency water pump 20 provides stable liquid delivery power for the system to ensure that the liquid can circulate in the system; the first fluid control element 30 and the second fluid control element 80 accurately control the flow direction and flow of the liquid, realizing the reasonable distribution and recycling of the liquid; the Y-type filter 40 performs preliminary filtration on the liquid to remove impurities and protect subsequent equipment; the heat exchanger 50 adjusts the temperature of the liquid to meet the requirements of different process links; the switch valve body 60 and the flow switch 70 monitor and control the on-off and flow of the liquid to ensure the safe and stable operation of the system; the bacterial cleaning device 10 removes bacteria from the liquid to improve the sanitary quality of the liquid.

[0087] It should be noted that the semiconductor waste gas treatment system of the present application includes the above-mentioned bacterial cleaning device 10, and therefore has all the technical effects of the above-mentioned bacterial cleaning device 10, which will not be repeated here.

[0088] According to one embodiment of the present application, it includes a first valve body 91, a second valve body 92, a third valve body 93 and a fourth valve body 94. The first valve body 91 is arranged between the industrial frequency water pump 20 and the first fluid control element 30, the second valve body 92 is arranged between the bacteria cleaning device 10 and the first fluid control element 30, the third valve body 93 is arranged between the second fluid control element 80 and the external device, and the fourth valve body 94 is arranged between the bacteria cleaning device 10 and the second fluid control element 80.

[0089] It can be understood that the bacterial cleaning device 10 of the present application can be independent of the semiconductor exhaust treatment system. When the semiconductor exhaust treatment system needs regular maintenance, the water outlet of the bacterial cleaning device 10 is connected to the water outlet end of the industrial frequency water pump 20 of the exhaust treatment system, and the return water port 102 of the bacterial cleaning device 10 is connected to the end of the water channel.

[0090] When the bacteria cleaning device 10 is needed, the first valve body 91 and the third valve body 93 can be closed, and the second valve body 92 and the fourth valve body 94 can be opened. When the bacteria cleaning device 10 is not needed, the first valve body 91 and the third valve body 93 can be opened, and the second valve body 92 and the fourth valve body 94 can be closed.

[0091] A control method for a bacteria cleaning device 10 according to an embodiment of the present application is applied to the above-mentioned bacteria cleaning device 10 and includes steps 100 , 200 , 300 , 400 and 500 .

[0092] Step 100 : Control the heating component 200 to heat the liquid in the water tank 100 .

[0093] Step 200: Obtain the temperature in the water tank 100. When the temperature of the water tank 100 reaches a preset temperature or a set temperature, control the water pump assembly 300 to start.

[0094] Step 300: Obtain the water flow rate of the water return port 102 and determine the cleaning time based on the water flow rate.

[0095] Step 400: Control the water pump assembly 300 to switch alternately between a first speed and a second speed.

[0096] Step 500: After the cleaning time is reached, the water flow rate of the return water port 102 is obtained again, and the system status is determined based on the flow rate. If the water flow rate is lower than the preset standard value, a disassembly maintenance signal is generated. If the water flow rate meets the preset standard value, a water channel qualified signal is generated.

[0097] In step 100 , the heating component 200 is controlled to heat the liquid in the water tank 100 to provide a liquid environment with a suitable temperature for the subsequent bacteria cleaning process.

[0098] In some possible embodiments, the controller sends a heating instruction to the heating assembly 200, which starts operating and uses electrical energy to heat the liquid in the water tank 100 to a preset or set temperature. During the heating process, a temperature detector 410 can be used to monitor the temperature in the water tank 100 in real time and feed the temperature data back to the control system so that the heating power can be adjusted according to actual conditions to ensure that the temperature remains stable within the target range.

[0099] In step 200 , when the temperature of the water tank 100 reaches a preset temperature or a set temperature, the water pump assembly 300 is started to circulate the heated liquid in the water path of the bacteria cleaning device 10 , thereby starting the bacteria cleaning process.

[0100] When the temperature sensor detects that the temperature of the water tank 100 has reached a preset value, it sends a temperature compliance signal to the controller. Upon receiving this signal, the control system sends a start command to the water pump assembly 300, which begins operation, pumping the liquid out of the water tank 100 and delivering it to other components of the external semiconductor waste gas treatment system before returning it to the water tank 100, completing the liquid circulation process.

[0101] In step 300, the cleaning time is determined according to the water flow rate of the return water port 102 to ensure that the bacteria cleaning process achieves the desired effect.

[0102] During the cleaning process, the water flow rate of the return water port 102 is monitored in real time by a flow sensor. In one possible embodiment, when the flow detector 420 detects that the water flow rate is between 40L / min and 60L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 15 minutes; When the flow detector 420 detects that the water flow rate is between 30 L / min and 40 L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 25 minutes; When the flow detector 420 detects that the water flow rate is between 15 L / min and 30 L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 40 minutes; When the flow detector 420 detects that the water flow rate is below 15 L / min, the cleaning time of the bacteria cleaning device 10 is controlled to be 60 minutes.

[0103] According to one embodiment of the present application, the controller is adapted to control the heating assembly 200 to heat the liquid in the accommodating chamber 101 to a preset temperature or a set temperature.

[0104] According to one embodiment of the present application, the controller is adapted to control the water pump assembly 300 to switch alternately between a first speed and a second speed.

[0105] In step 400, the water pump assembly 300 is controlled to switch alternately between a first speed and a second speed to enhance the flow impact force of the liquid and improve the bacteria cleaning effect.

[0106] In step 500, after the cleaning time has expired, the water flow rate at the return water port 102 is again obtained. Based on the flow rate, the system status is determined to determine whether the bacterial cleaning device 10 requires disassembly and maintenance or whether the water path of the semiconductor exhaust gas treatment system is qualified. When the cleaning time has expired, the control system stops the speed switching operation of the water pump assembly 300 and again obtains the water flow rate at the return water port 102. The obtained water flow rate is compared with a preset standard value. If the water flow rate is lower than the preset standard value, it indicates that the water path of the semiconductor exhaust gas treatment system may be clogged or otherwise faulty, resulting in poor liquid flow. The controller then generates a disassembly and maintenance signal, prompting the operator to disassemble, inspect, and maintain other components of the semiconductor exhaust gas treatment system (e.g., the Y-type filter 40 and the heat exchanger 50). If the water flow rate meets the preset standard value, it indicates that the water path of the semiconductor exhaust gas treatment system is unobstructed and the bacterial cleaning effect is satisfactory. The controller then generates a water path qualification signal, indicating that the bacterial cleaning device 10 can continue to operate normally.

[0107] In one embodiment, the preset standard value of the water flow rate is 50 L / min. If the water flow rate is above 50 L / min, it is qualified. If the water flow rate is below 50 L / min, it is considered that it needs to be disassembled before continued use.

[0108] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the present invention.

Claims

1. A bacteria cleaning device, characterized in that: Applied to semiconductor waste gas treatment systems, including: A water tank is provided with a receiving cavity, a water return port and a feeding port, wherein the water return port and the feeding port are connected to the receiving cavity, and the water return port is connected to the semiconductor exhaust gas treatment system; A heating component is disposed in the accommodating cavity; a water pump assembly connected to the water tank and adapted to pump the liquid in the accommodating chamber to the outlet of the bacteria cleaning device, wherein the outlet of the bacteria cleaning device is connected to the accommodating chamber; The detection component includes a temperature detector, a flow detector and a pressure detector. The temperature detector is arranged in the accommodating cavity, and the flow detector and the pressure detector are arranged at the water return port.

2. The bacteria cleaning device according to claim 1, characterized in that: The system comprises a controller connected to the water pump component, the heating component and the detection component to realize the control of water flow, water temperature and circulation processing time.

3. The bacteria cleaning device according to claim 2, characterized in that: The controller is suitable for: When the flow detector detects that the water flow rate is between 40 L / min and 60 L / min, the cleaning time of the bacteria cleaning device is controlled to be 15 minutes; When the flow detector detects that the water flow rate is between 30 L / min and 40 L / min, the cleaning time of the bacteria cleaning device is controlled to be 25 minutes; When the flow detector detects that the water flow rate is between 15 L / min and 30 L / min, the cleaning time of the bacteria cleaning device is controlled to be 40 minutes; When the flow detector detects that the water flow rate is below 15 L / min, the cleaning time of the bacteria cleaning device is controlled to be 60 minutes.

4. The bacteria cleaning device according to claim 2, characterized in that: The controller is suitable for controlling the heating component to heat the liquid in the accommodating chamber to a preset temperature or a set temperature.

5. The bacteria cleaning device according to claim 2, characterized in that: The controller is suitable for controlling the water pump assembly to switch alternately between a first speed and a second speed.

6. The bacteria cleaning device according to claim 2, characterized in that: The bacteria cleaning device includes an electrical box, the controller is arranged inside the electrical box, and a touch screen is provided outside the electrical box, and the touch screen is connected to the controller.

7. The bacteria cleaning device according to any one of claims 1 to 6, characterized in that: The bacteria cleaning device comprises a moving component, and the water tank, the water pump component and the detection component are arranged on the moving component.

8. The bacteria cleaning device according to any one of claims 1 to 6, characterized in that: The bacteria cleaning device includes a drain valve, which is installed at a drain port of the water tank, and the drain port is connected to the accommodating cavity.

9. A semiconductor waste gas treatment system, characterized in that: include: Industrial frequency water pump; A first fluid control element is provided with a first inlet, a second inlet and a first outlet, wherein the first inlet is connected to the power frequency water pump; A Y-type filter connected to the first outlet; A heat exchanger connected to the outlet of the Y-type filter, The switch valve body is connected to the outlet of the heat exchanger. A flow switch connected to the outlet of the switch valve body, a second fluid control element having a third inlet, a second outlet, and a third outlet, wherein the third inlet is connected to the outlet of the flow switch, and the second outlet is suitable for connecting to an external device; The bacterial cleaning device according to any one of claims 1 to 8, wherein the return water outlet of the bacterial cleaning device is connected to the third outlet, and the outlet of the bacterial cleaning device is connected to the second inlet.

10. The semiconductor waste gas treatment system according to claim 9, characterized in that: It includes a first valve body, a second valve body, a third valve body and a fourth valve body. The first valve body is arranged between the industrial frequency water pump and the first fluid control element, the second valve body is arranged between the bacteria cleaning device and the first fluid control element, the third valve body is arranged between the second fluid control element and the external device, and the fourth valve body is arranged between the bacteria cleaning device and the second fluid control element.

11. A control method for a bacteria cleaning device, applied to the bacteria cleaning device according to any one of claims 1 to 8, characterized in that: include: Controlling the heating component to heat the liquid in the water tank; Acquiring the temperature in the water tank, and controlling the water pump assembly to start when the temperature of the water tank reaches a preset temperature or a set temperature; Obtaining the water flow rate of the return water outlet, and determining the cleaning time based on the water flow rate; Controlling the water pump assembly to alternately switch between a first speed and a second speed; After the cleaning time is reached, the water flow rate of the return port is obtained again, and the system status is determined based on the flow rate. If the water flow rate is lower than the preset standard value, a disassembly maintenance signal is generated. If the water flow rate meets the preset standard value, a water channel qualified signal is generated.

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