X-ray backscattering for part inspection
By using a band sheet device in an X-ray backscattering device, the hard X-ray flow is focused and directed to the inspection filter, the heat and weight increase caused by high power density in the prior art is solved, and higher quality X-ray imaging and system performance improvements are achieved.
Patent Information
- Application Number
- CN202510686884.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2016-09-14
- Filing Date
- 2017-07-27
- Publication Date
- 2025-08-19
AI Technical Summary
When the existing X-ray backscattering technology improves image quality, it is often accompanied by problems such as heat generation, energy consumption, weight increase and operating costs, and it is difficult to reduce these side effects while ensuring high power density.
Using a band-sheet device, by focusing and directing the hard X-ray flow generated by the X-ray emitter to the inspection filter, the energy density of the incident X-ray rays is reduced, thereby improving image quality and reducing system weight and energy consumption.
It realizes the image resolution, clarity and inspection angle of X-ray imaging without increasing the system weight and energy consumption, reduces image distortion and cooling requirements, and enhances the durability and lightness of the system.
Smart Images
Figure CN120507380A_ABST
Abstract
Description
[0001] This application is a divisional application of Chinese patent application No. 201710621462.9, filed on July 27, 2017, entitled “X-RAY BACKSCATTERING FOR PARTS INSPECTION”. Technical Field
[0002] The present disclosure relates generally to nondestructive inspection of parts, and more particularly to inspection of parts utilizing X-ray backscatter devices, systems, and methods. Background Art
[0003] When damage to the part being inspected is undesirable, some inspection techniques (such as nondestructive testing, foreign object detection, nonlinear inspection of parts, etc.) are used. Certain X-ray inspection techniques provide penetrating scanning or inspection of parts. Such X-ray inspection techniques are used in a variety of applications, such as homeland security, oil and gas exploration and refining, pipeline inspection, transportation, automotive, aviation, maritime, mining, shipping and storage, and other applications.
[0004] Some inspection techniques utilize the detection of X-rays that pass through a part from one side to the opposite side. However, in other inspection techniques, such as X-ray backscattering, X-rays reflected from the part (e.g., backscattered X-rays) are detected and subsequently used to generate an image or analyze the part. The pattern and intensity of the backscattered X-rays depend on the material and structure of the part. Therefore, the pattern and intensity of the backscattered X-rays can be used to generate an image, from which the quality, characteristics, or defects of the part can be determined.
[0005] Generally, the quality of an image generated by X-ray backscattering techniques corresponds to the power density of the X-rays at the point where they impact the part being inspected. For example, a higher power density generally results in higher image quality. However, according to conventional techniques, an increase in the power density of the X-rays at the point of impact with the part generally corresponds to an increase in potentially undesirable effects, such as increased heat generation, energy consumption, weight, and assembly and operating costs. Summary of the Invention
[0006] The subject matter of the present application was developed in response to the current state of the art, and in particular in response to the shortcomings of conventional X-ray backscatter devices, which have not been fully addressed by currently available technology. Accordingly, the subject matter of the present application was developed to provide a backscatter device with a zone plate and associated apparatus, systems, and methods that overcome at least some of the above-mentioned shortcomings of the prior art.
[0007] Disclosed herein is an X-ray backscatter device for nondestructive inspection of parts. The device includes an X-ray emitter and a zone plate. The X-ray emitter includes an X-ray shield, a vacuum tube, a cathode, and an anode. The X-ray shield has an emission aperture. The vacuum tube is within the X-ray shield. The cathode is enclosed within the vacuum tube and selectively operable to generate electron emissions. The anode is enclosed within the vacuum tube and positioned relative to the cathode to receive the electron emissions and convert the electron emissions from the cathode into a hard X-ray stream. In one embodiment, an X-ray stream is defined as a hard X-ray stream if the X-rays of the stream have an energy level greater than 5-10 keV. In another embodiment, an X-ray stream is a hard X-ray stream if the X-rays of the stream have an energy level greater than 50 keV. In a further embodiment, an X-ray stream is a hard X-ray stream if the X-rays of the stream have an energy level between approximately 60 keV and approximately 80 keV. In other embodiments, the hard X-ray stream includes X-rays having an energy level greater than 80 keV. The anode is positioned relative to the emission aperture to direct at least a portion of the hard X-ray stream through the emission aperture. A zone plate is positioned outside the X-ray shield and relative to the emission aperture. The zone plate receives the portion of the hard X-ray stream from the emission aperture of the X-ray shield and focuses the portion of the hard X-ray stream received from the emission aperture into a focused hard X-ray stream. The foregoing subject matter of this paragraph describes features of Example 1 of the present disclosure.
[0008] The zone plate includes a plurality of Fresnel zones. The foregoing subject matter of this paragraph describes features of Example 2 of the present disclosure, wherein Example 2 also includes subject matter according to Example 1 above.
[0009] At least one of the plurality of Fresnel zones of the zone plate has at least one radius corresponding to the focal length of the zone plate. The foregoing subject matter of this paragraph describes features of Example 3 of the present disclosure, wherein Example 3 also includes subject matter according to either of Examples 1 or 2 above.
[0010] The zone plate is at least partially made of carbon nanotubes.The foregoing subject matter of this paragraph describes features of Example 4 of the present disclosure, wherein Example 4 also includes subject matter according to any of Examples 1-3 above.
[0011] The zone plate is at least partially fabricated from lead.The foregoing subject matter of this paragraph describes features of Example 5 of the present disclosure, where Example 5 also includes subject matter according to any of Examples 1-4 above.
[0012] The zone plate includes a surface plating.The foregoing subject matter of this paragraph describes features of Example 6 of the present disclosure, wherein Example 6 also includes subject matter according to any one of Examples 1-5 above.
[0013] The surface plating is gold. The foregoing subject matter of this paragraph describes features of Example 7 of the present disclosure, wherein Example 7 also includes subject matter according to any one of Examples 1-6 above.
[0014] The hard X-ray flux has an energy level between about 60 keV and about 80 keV. The foregoing subject matter of this paragraph describes features of Example 8 of the present disclosure, wherein Example 8 also includes the subject matter of any of Examples 1-7 above. Also disclosed herein is an X-ray backscattering system for nondestructive inspection of parts. The system includes a base, an X-ray emitter, an inspection filter, and a zone plate. The X-ray emitter is connected to the base. The inspection filter is movably connected to the base and is selectively operable to receive hard X-ray emissions from the X-ray emitter and pass at least a portion of the hard X-ray emissions through a filter aperture in the inspection filter to a selectable location on the part. The zone plate is inserted between the X-ray emitter and the inspection filter. The zone plate receives the hard X-ray emissions from the X-ray emitter and modifies the beam pattern of the hard X-ray emissions received from the X-ray emitter. The foregoing subject matter of this paragraph describes features of Example 9 of the present disclosure. The system further includes a detector connected to the base and selectively operable to detect hard X-rays backscattered from the part. The foregoing subject matter of this paragraph describes features of Example 10 of the present disclosure, where Example 10 also includes the subject matter described according to Example 9 above.
[0015] The zone plate is movable relative to the X-ray emitter to further modify the beam pattern of the hard X-ray emission received from the X-ray emitter. The foregoing subject matter of this paragraph describes features of Example 11 of the present disclosure, wherein Example 11 also includes subject matter according to any of Examples 9 or 10 above.
[0016] The X-ray emitter and the zone plate are adjustable relative to the base to modify the emission direction relative to the base. The foregoing subject matter of this paragraph describes features of Example 12 of the present disclosure, wherein Example 12 also includes subject matter according to any of Examples 9-11 above.
[0017] The base includes a mobility system operable to move the base relative to the part.The foregoing subject matter of this paragraph describes features of Example 13 of the present disclosure, wherein Example 13 also includes subject matter according to any of the above Examples 9-12.
[0018] The mobility system includes at least one of rollers, tires, rails, tracks, drums, cables, pulleys, motors, slides, and bearings. The foregoing subject matter of this paragraph describes features of Example 14 of the present disclosure, wherein Example 14 also includes subject matter according to any one of Examples 9-13 above.
[0019] The system further includes a control unit for controlling the position of the zone plate relative to the X-ray emitter or relative to the inspection filter. The foregoing subject matter of this paragraph describes features of Example 15 of the present disclosure, wherein Example 15 also includes subject matter according to any one of Examples 9-14 above.
[0020] The inspection filter includes a rotatable ring having a plurality of holes. At least one of the plurality of holes is different from another of the plurality of holes. The foregoing subject matter of this paragraph describes features of Example 16 of the present disclosure, wherein Example 16 also includes subject matter according to any of Examples 9-15 above.
[0021] Also disclosed herein is a method for nondestructive inspection of a part by X-ray backscattering. The method includes receiving hard X-ray emissions from an X-ray emitter at a zone plate. The method also includes focusing the hard X-ray emissions into a focused hard X-ray stream using the zone plate. The method also includes directing at least a portion of the focused hard X-ray stream through a first filter aperture of an inspection filter and onto a first portion of the part using the zone plate. The foregoing subject matter of this paragraph describes features of Example 17 of the present disclosure.
[0022] The method further includes adjusting the orientation of the inspection filter relative to the zone plate so that the focused hard X-ray stream is directed through a second filter aperture of the inspection filter and onto a second portion of the part. The second filter aperture is different from the first filter aperture. The foregoing subject matter of this paragraph describes features of Example 18 of the present disclosure, wherein Example 18 also includes subject matter according to Example 17 above.
[0023] Focusing the hard X-ray emissions includes focusing the hard X-ray emissions by between about 30% and about 40%.The foregoing subject matter of this paragraph describes features of Example 19 of the present disclosure, wherein Example 19 also includes subject matter according to any of Examples 17 and 18 above.
[0024] The portion of the focused hard X-ray stream directed through the first filter aperture constitutes between about 60% and about 70% of the hard X-ray emission from the X-ray emitter. The foregoing subject matter of this paragraph describes features of Example 20 of the present disclosure, wherein Example 20 also includes subject matter according to any of Examples 17-19 above.
[0025] The features, structures, advantages and / or characteristics of the described subject matter of the present disclosure may be combined in one or more embodiments and / or implementations in any appropriate manner. In the following description, many specific details are provided to give a thorough understanding of the embodiments of the subject matter of the present disclosure. Those skilled in the relevant art will recognize that the subject matter of the present disclosure can be implemented in the absence of one or more of the specific features, details, components, materials and / or methods of a particular embodiment or implementation. In other cases, the additional features and advantages that may not be present in all embodiments or implementations may be recognized in certain embodiments and / or implementations. Further, in some cases, well-known structures, materials or operations are not shown or described in detail to avoid obscuring the aspects of the subject matter of the present disclosure. The features and advantages of the subject matter of the present disclosure will more fully emerge from the following description and the appended claims, or may be known by the implementation of the subject matter as set forth below. BRIEF DESCRIPTION OF THE DRAWINGS
[0026] In order that the advantages of the subject matter may be more readily understood, a more particular description of the subject matter, as briefly described above, will be rendered by reference to specific embodiments thereof as illustrated in the accompanying drawings. Understanding that these drawings depict only typical embodiments of the subject matter and are therefore not to be considered limiting of the scope of the subject matter, the subject matter will be described and explained with additional specificity and detail through the use of the accompanying drawings, in which:
[0027] Figure 1A is a schematic diagram of an X-ray backscattering device according to one or more embodiments of the present disclosure;
[0028] Figure 1B is a schematic diagram of an X-ray emitter of the X-ray backscatter device of FIG. 1 according to one or more embodiments of the present disclosure;
[0029] Figure 2A is a schematic cross-sectional side view of an X-ray backscatter device according to one or more embodiments of the present disclosure;
[0030] Figure 2B According to one or more embodiments of the present disclosure Figure 2A A schematic cross-sectional side view of an X-ray emitter of an X-ray backscattering device;
[0031] Figure 2C According to one or more embodiments of the present disclosure Figure 2A A schematic side view of an X-ray backscattering device;
[0032] Figure 3 is a schematic side view of an X-ray backscatter system according to one or more embodiments of the present disclosure;
[0033] Figure 4 are perspective and cross-sectional side views of a zone plate according to one or more embodiments of the present disclosure;
[0034] Figure 5 is a scanning electron microscope micrograph of a zone plate according to one or more embodiments of the present disclosure; and
[0035] Figure 6 is a schematic flowchart of a method for performing nondestructive inspection of a part by X-ray backscattering according to one or more embodiments of the present disclosure. DETAILED DESCRIPTION
[0036] Reference throughout this specification to "one embodiment," "an embodiment," or similar language means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the present disclosure. The appearance of the phrases "in one embodiment," "in an embodiment," and similar language throughout this specification may, but do not necessarily, all refer to the same embodiment. Similarly, use of the term "an embodiment" means an embodiment having a particular feature, structure, or characteristic described in connection with one or more embodiments of the present disclosure; however, an embodiment may relate to one or more embodiments when there is no clear correlation to indicate otherwise.
[0037] refer to Figure 1A , an X-ray backscatter device 10 is shown. The X-ray backscatter device 10 includes an X-ray emitter 12 to produce incident X-ray emissions 14, an inspection filter 16 having a plurality of filter apertures 18 to produce filtered X-ray emissions 20, and a base 22.
[0038] The X-ray emitter 12 is connected to a base 22. The X-ray emitter 12 generates incident X-ray emissions 14 and projects the incident X-ray emissions 14 onto an inspection filter 16 near a filter aperture 18. Only a portion of the incident X-ray emissions 14 (i.e., filtered X-ray emissions 20) passes through the filter aperture 18. The filtered X-ray emissions 20 are then used to inspect a part or other object. As shown in the depicted embodiment, the filtered X-ray emissions 20 are a relatively small percentage of the incident X-ray emissions 14 generated by the X-ray emitter 12. As such, the power density of the filtered X-ray emissions 20 (which is the power density of the X-rays that strike the part and can be used for inspection of the part) is less than the power density of the incident X-ray emissions 14. Consequently, in some cases, most of the incident X-ray emissions 14 generated by the X-ray emitter 12 are lost at the inspection filter 16. To compensate for this loss in power density, in some cases, the X-ray emitter 12 generates incident X-ray emissions 14 having a power density that is much greater than that required at the part, resulting in reduced efficiency.
[0039] Figure 1B Show Figure 1A The X-ray emitter 12 of the X-ray backscatter device 10 is shown. The X-ray emitter 12 includes an X-ray shield 24. In addition, the X-ray shield 24 includes an emission aperture 26. In addition to having the emission aperture 26, the X-ray shield 24 also encloses a vacuum tube 28. The vacuum tube 28 encloses a cathode 30 and an anode 32. The cathode 30 and the anode 32 are connected to a voltage source through a lead sheet 40. The cathode 30 is further connected to a filament power line 42 and is selectively operable to generate electron emission, which is received at the anode 32. The anode 32 receives the electron emission from the cathode 30 and generates a hard X-ray stream. The hard X-ray stream is directed toward the emission aperture 26 of the X-ray shield 24. A portion of the hard X-ray stream from the anode 32 passes through the emission aperture 26, while a separate portion of the hard X-ray stream is blocked by the X-ray shield 24. The portion of the hard X-ray stream that passes through the emission aperture 26 is the incident X-ray emission 14.
[0040] In the illustrated representation, the anode 32 of the X-ray emitter 12 is a rotating anode. However, in other representations, the anode 32 of the X-ray emitter 12 does not rotate. The anode 32 may be a tungsten anode connected to a rotor 34. The rotor 34 is supported by a rotor support 36 and may be connected to the rotor support 36 using bearings or other structures that facilitate relative rotation between the rotor 34 and the rotor support 36. The rotor 34 is driven by a motor 38. The magnetic field generated by applying an electrical signal to the motor 38 exerts a force on the rotor 34, thereby rotating the rotor 34 and the anode 32.
[0041] In the embodiment shown, as combined Figure 1A As depicted, the incident X-ray emissions 14 then reach the inspection filter 16. Due to the relative unfocused nature of the incident X-ray emissions 14 and the relatively small size of the filter aperture 18, only a portion of the incident X-ray emissions 14 that reach the inspection filter 16 passes through the filter aperture 18. In other words, the portion of the incident X-ray emissions 14 that passes through the filter aperture 18 (i.e., the filtered X-ray emissions 20) is small relative to the incident X-ray emissions 14, and even smaller than the X-rays generated by the anode 32 before exiting the emission aperture 26.
[0042] Figure 2A is a schematic cross-sectional view of an X-ray backscattering device 100. The X-ray backscattering device 100 includes Figure 1A The features of the X-ray backscatter device 10 are similar in that like numbers refer to like features / parts. However, Figure 2A The X-ray backscatter device 100 provides beyond Figure 1AAdvantages of the X-ray backscatter device 10 are provided. For example, the X-ray backscatter device 100 includes a zone plate 102 interposed between the X-ray emitter 12 and the filter aperture 18 of the inspection filter 16. Generally, the zone plate receives incident X-ray emissions 14 from the X-ray emitter 12 and focuses the incident X-ray emissions 14 into focused X-ray emissions 104. The focused X-ray emissions 104 are directed by the zone plate 102 toward the filter aperture 18 of the inspection filter 16. A portion of the focused X-ray emissions 104 passes through the filter aperture 18 to define filtered X-ray emissions 20. By first focusing the incident X-ray emissions 14 into focused X-ray emissions 104 before passing through the filter aperture 18 of the inspection filter 16, a higher number or concentration of X-rays, and therefore a higher power density of X-rays, pass through the filter aperture 18 and impinge on the part to be inspected. Thus, due to the zone plate 102 , a greater portion of the incident X-ray emissions 14 is converted into filtered X-ray emissions 20 with the X-ray backscatter device 100 than with the X-ray backscatter device 10 .
[0043] Thus, to achieve the same power density of filtered X-ray emissions 20, the X-ray backscatter device 100 can generate incident X-ray emissions 14 having a lower energy density than the X-ray backscatter device 10, which facilitates certain advantages. For example, the X-ray backscatter device 100 facilitates one or more of the following compared to the X-ray backscatter device 10: a wider range of X-ray imaging, a larger field of view, a larger inspection angle, improved image resolution, improved image clarity, a reduced number of lateral scans required, a dynamic field of view and a transient field of view, reduced image distortion, reduced pin-cushing effects at imaging corners, reduced power requirements, reduced cooling requirements, reduced system weight, reduced system size, improved portability, improved durability for a wider range of testing scenarios, and improved component life.
[0044] As used herein, focused X-ray emissions 104 may include any X-ray emissions or X-ray streams in which at least a portion of the X-rays of the focused X-ray emissions 104 are modified by the zone plate 102 to be less divergent than the X-rays of the incident X-ray emissions 14 from the X-ray emitter 12. Focused X-ray emissions 104 may also include any X-ray streams in which a portion of the X-rays of the focused X-ray emissions 104 are modified from a diverging mode to a converging mode by the zone plate 102. The zone plate 102 may also modify the received X-rays from a diverging mode to a collimated mode. In some examples, the zone plate 102 may receive the incident X-ray emissions 14 in an at least partially converging mode and further focus the X-rays to be more converging. Alternatively, the zone plate 102 may receive the incident X-ray emissions 14 in a diverging mode and focus the incident X-ray emissions 14 to be less diverging.
[0045] In some examples, the zone plate 102 can provide focusing of between about 20% and about 40% of the received X-rays. More specifically, the zone plate 102 can provide focusing of about 30%. Other embodiments of the zone plate 102 can provide more or less focusing than the above examples. In some embodiments, the zone plate 102 can focus the incident X-ray emissions 14 sufficiently that about 60% to 70% of the incident X-ray emissions 14 pass through the filter aperture 18 as focused X-ray emissions 104.
[0046] In some embodiments, the zone plate 102 can be made entirely or partially of lead. In some embodiments, the density of the lead plate allows the zone plate 102 to have a greater impact on the incident X-ray emission 14. In some embodiments, the zone plate 102 can include carbon nanotubes. Carbon nanotubes provide benefits in terms of weight reduction, heat conduction and cooling, and strength. The zone plate 102 can also include a surface treatment. The surface treatment can include electroplating, doping, hardening, coating, or some other chemical, mechanical, or thermal treatment.
[0047] The zone plate 102 can be positioned to receive some or all of the incident X-ray emissions 14 from the X-ray emitter 12. In the illustrated embodiment, the zone plate 102 is shown in a horizontal orientation. However, the zone plate 102 can be oriented at a zero or non-zero orientation from the horizontal. In some embodiments, the zone plate 102 can be oriented at a zero or non-zero angle relative to the X-ray emitter 12, relative to the filter aperture 18, relative to the base 22, or relative to other physical reference points or structural reference points on or outside the X-ray backscatter device 100. In some embodiments, the positioning and orientation of the zone plate 102 is adjustable. The adjustability of the zone plate 102 is provided by a frame or other mounting structure (not shown) to which the zone plate 102 is connected. In other embodiments, the zone plate 102 is connected to a cooling system to cool the zone plate 102 by conduction, convection, or radiation.
[0048] While the illustrated embodiment depicts the zone plate 102 as being external to the X-ray emitter 12, in other embodiments, the zone plate 102 is incorporated into the X-ray emitter 12 as an integral part of the X-ray emitter 12. In alternative embodiments, multiple zone plates 102 are connected to the inspection filter 16 to correspond individually to each filter aperture 18, or such that each zone plate 102 corresponds to multiple filter apertures 18 on the inspection filter 16.
[0049] refer to Figure 2B , Figure 2A The zone plate 102 is relative to Figure 1B An X-ray emitter 12 is shown. In the illustrated embodiment, a zone plate 102 is positioned relative to an emission aperture 26 of the X-ray emitter 12. In this arrangement, the zone plate 102 receives at least a portion of the incident X-ray emissions 14 that pass through the emission aperture 26. In some embodiments, the zone plate 102 is coaxial with the emission aperture 26, or oriented at some other angle. In alternative embodiments, the zone plate 102 is coaxial with the filter aperture 18. In the illustrated embodiment, the zone plate 102 is shown between the X-ray emitter 12 and the inspection filter 16. In some embodiments, the zone plate 102 is positioned closer to the X-ray emitter 12 or closer to the inspection filter 16. In other embodiments, the zone plate 102 is positioned equidistant from the X-ray emitter 12 and the inspection filter 16. In some embodiments, the position of the zone plate 102 relative to at least one of the X-ray emitter 12 and the inspection filter 16 is adjustable. In some embodiments, when inspection filter 16 is translated or rotated relative to X-ray emitter 12 , zone plate 102 rotates to direct focused X-ray emissions 104 to filter aperture 18 .
[0050] Figure 2C yes Figure 2ASchematic side view of an X-ray backscatter device 100. The illustrated embodiment includes a detector 106 coupled to the base 22. The detector 106 is positioned to receive X-rays backscattered from a part during inspection. Two detectors 106 are shown. In some alternative embodiments, the X-ray backscatter device 100 includes fewer or more detectors 106. For example, the X-ray backscatter device 100 may include a single detector 106 positioned in front of the outer edge of the inspection filter 16 so as to be close to the point of impact of the X-rays on the part. Alternatively, the X-ray backscatter device 100 may include three or more detectors 106 to collect additional backscattered X-rays to produce a more complete and clearer image of the part. In an exemplary embodiment, the detector 106 is shielded from X-rays reflected or refracted from the X-ray emitter 12, the zone plate 102, the inspection filter 16, and / or the filter aperture 18. In one embodiment, detector 106 is fixed, but in other embodiments, detector 106 is adjustable relative to base 22 to improve detection of backscattered X-rays, reduce image noise from non-backscattered X-rays, or accommodate inspection constraints. In additional embodiments, once the optimal position of detector 106 is determined, detector 106 can be fixed relative to base 22.
[0051] In the depicted embodiment, the zone plate 102 is located between the X-ray emitter 12 and the inner surface of the inspection filter 16. As the inspection filter 16 rotates around the X-ray emitter 12, the zone plate 102 remains in place. The position of the inspection filter 16 is controlled by a motor 108 connected to the inspection filter 16. As described above, some embodiments include multiple zone plates 102 that are connected to the inspection filter 16 at different points along the interior of the inspection filter 16. The placement of each of the multiple zone plates 102 corresponds to the position of one or more filter apertures 18.
[0052] In the depicted embodiment, the filter apertures 18 are positioned at uniform intervals along the perimeter of the inspection filter 16, with each filter aperture 18 being a different distance from the edge of the inspection filter 16. In some embodiments, the filter apertures 18 are uniform, but in other embodiments, the position, spatial frequency, size, shape, geometry, material (or lack of material), or other characteristics of the filter apertures 18 vary. In some embodiments, the zone plate 102 is positioned based on the characteristics of the filter apertures 18 positioned to receive focused X-ray emission from the zone plate 102. In other embodiments, the zone plate 102 is fixed but configured to produce focused X-ray emission sufficient for each filter aperture 18.
[0053] Figure 3A schematic diagram of an X-ray backscatter system 109 is illustrated. In the depicted embodiment, X-ray backscatter system 109 is positioned to inspect part 110. Specifically, X-ray emitter 12 generates incident X-ray emissions 14, which are received by zone plate 102. Zone plate 102 modifies the beam pattern of incident X-ray emissions 14 to generate focused X-ray emissions 104. Focused X-ray emissions 104 strike inspection filter 16 approximately at filter aperture 18. Filter aperture 18 filters focused X-ray emissions 104, allowing a portion of focused X-ray emissions 104 to pass. In some embodiments, filtered X-ray emissions 20 at part 110 have a specific pattern or characteristic imposed by filter aperture 18 to facilitate inspection. Filtered X-ray emissions 20 that pass through filter aperture 18 reach part 110, and some of the X-rays are backscattered toward detector 106. Some of the backscattered X-rays 112 are detected by detector 106. Signals corresponding to the detected backscattered X-rays 112 are sent from detector 106 to control system 114. In some embodiments, inspection filter 16 can be rotated so that different portions of part 110 receive and backscatter X-rays. Additional signals are generated at detector 106 and sent to control system 114.
[0054] In some embodiments, the control system 114 interprets the signals to generate an image or other inspection result. In some embodiments, the control system 114 also provides signals for controlling the generation of X-rays by the X-ray emitter 12, the movement of the inspection filter 16, the movement of the base 22 relative to the part 110, the movement of the zone plate 102, the control of the cooling system or power supply, or the monitoring of the status of the system or individual components via sensors or other devices. The control system 114 includes a connection 116 to the X-ray backscatter system 109. The connection 116 can be a wired or wireless connection. In the depicted embodiment, the control system 114 is separate from the X-ray backscatter system 109. Alternatively, the control system 114 is connected to the base 22 or otherwise integrated into the X-ray backscatter system 109.
[0055] Figure 4 A perspective view and a cross-sectional side view of the zone plate 102 are shown. In the embodiment shown, the zone plate 102 has a focal length f. Given a specific focal length f of a system (from Figure 3 The radius characteristics of the zone plate 102 can be determined by measuring the distance from the zone plate 102 to the filter aperture 18 or the component 110. In some embodiments, the zone plate 102 includes a surface treatment 119. The surface treatment 119 can include electroplating, doping, hardening, coating, or other chemical, mechanical, or thermal treatments. In one example, the surface treatment 119 includes gold plating.
[0056] Similarly, in the case of the Fresnel zone plate 102, the radii and corresponding spacings of the plurality of Fresnel zones 120 in the Fresnel zone plate 102 can be determined. In some embodiments, a focal length f corresponds to the focal point F of each of the plurality of Fresnel zones 120. In other embodiments, the Fresnel zones 120 can be configured with different focal lengths f or focal points F to facilitate inspection at a range of depths within the part.
[0057] Figure 5 FIG2 is a scanning electron microscope micrograph 200 of the zone plate 102. The micrograph 200 illustrates a plurality of Fresnel zones 120. The micrograph 200 depicts a 25 nm segmentation of the outermost portion of the zone plate 102. In this example, the zone plate 102 has a diameter of 63 mm, has 628 Fresnel zones 120, and is plated with gold over the lead plate. In other examples, the zone plate 102 may include fewer or more Fresnel zones, a larger or smaller diameter, and other electroplated or no electroplated materials or surface treatments.
[0058] refer to Figure 6 , a method 300 for nondestructive inspection of a part using X-ray backscatter is shown. The method 300 includes, at 302, receiving hard X-ray emissions from an X-ray emitter at a zone plate. Furthermore, the method 300 includes, at 304, focusing the hard X-ray emissions into focused hard X-ray emissions using the zone plate. The method 300 further includes, at 306, directing, using the zone plate, at least a portion of the focused hard X-ray emissions through a first filter aperture of an inspection filter and onto a first portion of a part.
[0059] In the above description, specific terms such as "upper", "lower", "upper", "lower", "horizontal", "vertical", "left", "right", "above", "below" and the like may be used. These terms are used, where applicable, to provide some clarity when dealing with relative relationships. However, these terms are not intended to imply absolute relationships, positions and / or orientations. For example, for an object, the "upper" surface can be turned into the "lower" surface by simply turning the object over. However, it is still the same object. Further, unless expressly stated otherwise, the terms "comprises", "includes", "has" and their variations mean "including but not limited to". Unless expressly stated otherwise, a list of enumerated items does not imply that any or all of the items are mutually exclusive and / or mutually inclusive. Unless expressly stated otherwise, the terms "a", "an" and "said / the" also refer to "one or more". Further, the term "plurality" may be defined as "at least two".
[0060] In addition, the examples in this specification where an element is "connected" to another element can include direct and indirect connections. Direct connection can be defined as an element being connected to another element and having some contact with the other element. Indirect connection can be defined as a connection between two elements that is not in direct mutual contact, but has one or more additional elements between the connected elements. Further, as used herein, an element being fixed to another element can include direct fixing and indirect fixing. In addition, as used herein, "adjacent" does not necessarily mean contact. For example, an element can be adjacent to another element without contacting the other element.
[0061] As used herein, when used with a list of items, the phrase "at least one of" means that different combinations of one or more of the listed items may be used, and only one item from the list may be required. The item may be a specific object, thing, or category. In other words, "at least one of" means that any combination or multiple items from the list may be used, and all of the items in the list may not be required. For example, "at least one of Item A, Item B, and Item C" may mean Item A; Item A and Item B; Item B; Item A, Item B, and Item C; or Item B and Item C. In some cases, "at least one of Item A, Item B, and Item C" may mean, for example, but not limited to, two Item A, one Item B, and ten Item C; four Item B and seven Item C; or some other appropriate combination.
[0062] Unless otherwise indicated, the terms "first," "second," etc., as used herein, are merely labels and are not intended to impose order, position, or hierarchy requirements on the items to which these terms refer. Furthermore, reference to, for example, a "second" item does not require or preclude the presence of, for example, a "first" or lower-numbered item and / or, for example, a "third" or higher-numbered item.
[0063] As used herein, a system, device, structure, article, element, component, or hardware that is “configured to” perform a specified function is actually capable of performing the specified function without any modification, rather than merely having the potential to perform the specified function after further modification. In other words, a system, device, structure, article, element, component, or hardware that is “configured to” perform a specified function is specifically selected, created, implemented, used, programmed, and / or designed for the purpose of performing the specified function. As used herein, “configured to” means that there are features of the system, device, structure, article, element, component, or hardware that enable the system, device, structure, article, element, component, or hardware to perform the specified function without further modification. For purposes of this disclosure, a system, device, structure, article, element, component, or hardware that is described as being “configured to” perform a particular function may additionally or alternatively be described as being “adapted to” and / or “operative to” perform that function.
[0064] Furthermore, the present disclosure includes embodiments according to the following clauses:
[0065] Clause 1. An X-ray backscatter device for nondestructive inspection of parts, the device comprising:
[0066] An X-ray emitter comprising:
[0067] An X-ray shield including an emission aperture;
[0068] Vacuum tubes within X-ray shields;
[0069] a cathode enclosed within the vacuum tube and selectively operable to generate electron emission; and
[0070] an anode enclosed within the vacuum tube and positioned relative to the cathode to receive and convert electron emissions from the cathode into hard X-ray emissions, and positioned relative to the emission aperture to direct at least a portion of the hard X-ray emissions through the emission aperture; and
[0071] A zone plate is outside the X-ray shield and positioned relative to the emission aperture to receive a portion of the hard X-ray emission from the emission aperture of the X-ray shield and focus a portion of the hard X-ray emission received from the emission aperture into focused hard X-ray emission.
[0072] Clause 2. The apparatus of clause 1, wherein the zone plate comprises a plurality of Fresnel zones.
[0073] Clause 3. The apparatus of clause 2, wherein at least one of the plurality of Fresnel zones of the zone plate has at least one radius corresponding to a focal length of the zone plate.
[0074] Clause 4. The device of clause 1, wherein the zone plate is at least partially fabricated from carbon nanotubes.
[0075] Clause 5. The device of clause 1, wherein the zone plate is fabricated at least in part from lead.
[0076] Clause 6. The device of clause 1, wherein the zone plate comprises a surface treatment.
[0077] Clause 7. The device of clause 6, wherein the surface treatment is gold plating.
[0078] Clause 8. The apparatus of clause 1, wherein the hard X-ray streamlines have an energy level between about 60 keV and about 80 keV.
[0079] Clause 9. An X-ray backscatter system for nondestructive inspection of parts, the system comprising:
[0080] base;
[0081] an X-ray emitter connected to the base;
[0082] an inspection filter movably connected to the base and selectively operable to receive hard X-ray emissions from the X-ray emitter and pass at least a portion of the hard X-ray emissions through a filter aperture in the inspection filter to a selectable location on the part; and
[0083] A zone plate is inserted between the X-ray emitter and the inspection filter to receive hard X-ray emissions from the X-ray emitter and modify a beam pattern of the hard X-ray emissions received from the X-ray emitter.
[0084] Clause 10. The system of clause 9, further comprising a detector coupled to the base and selectively operable to detect hard X-rays backscattered from the part.
[0085] Clause 11. The system of clause 9, wherein the zone plate is movable relative to the X-ray emitter to further modify a beam pattern of the hard X-ray emission received from the X-ray emitter.
[0086] Clause 12. The system of clause 9, wherein the X-ray emitter and the zone plate are adjustable relative to the base to modify the emission direction relative to the base.
[0087] Clause 13. The system of clause 9, wherein the base includes a mobility system operable to move the base relative to the part.
[0088] Clause 14. The system of clause 13, wherein the mobility system comprises at least one of the group consisting of rollers, tires, rails, tracks, drums, cables, pulleys, magnets, motors, slides, and bearings.
[0089] Clause 15. The system according to clause 9, further comprising a control unit for controlling the position of the zone plate relative to the X-ray emitter or relative to the inspection filter.
[0090] Clause 16. The system of clause 9, wherein the inspection filter comprises a rotatable ring having a plurality of apertures, wherein at least one of the plurality of apertures is different from another of the plurality of apertures.
[0091] Clause 17. A method for nondestructive inspection of a component using X-ray backscatter, the method comprising:
[0092] receiving hard X-ray emission from an X-ray emitter at the zone plate;
[0093] focusing the hard X-ray emission into focused hard X-ray emission using a zone plate; and
[0094] At least a portion of the focused hard X-ray emission is directed with a zone plate through a first filter aperture of the inspection filter and onto a first portion of the part.
[0095] Clause 18. The method of clause 17, further comprising adjusting an orientation of the inspection filter relative to the zone plate such that the focused hard X-ray emission is directed through a second filter aperture of the inspection filter and onto a second portion of the part, wherein the second filter aperture is different from the first filter aperture.
[0096] Clause 19. The method of Clause 17, wherein focusing the hard X-ray emissions comprises focusing the hard X-ray emissions by between about 30% and about 40%.
[0097] Clause 20. The method of Clause 17, wherein the portion of the focused hard X-ray emission directed through the first filter aperture constitutes between about 60% and about 70% of the hard X-ray emission from the X-ray emitter.
[0098] The present invention may be embodied in other specific forms without departing from the spirit or essential characteristics of the present invention. The embodiments described are to be considered in all respects as illustrative and non-restrictive. All changes within the meaning and scope of the equivalents of the claims are to be included within the scope of the claims.
Claims
1. An X-ray backscattering device for non-destructive inspection of parts, the device comprising: An X-ray emitter comprising: An X-ray shield including an emission aperture; a vacuum tube within the X-ray shield; a cathode enclosed within the vacuum tube and selectively operable to generate electron emission; as well as an anode enclosed within the vacuum tube and positioned relative to the cathode to receive the electron emissions and convert the electron emissions from the cathode into hard X-ray emissions, and positioned relative to the emission aperture to direct at least a portion of the hard X-ray emissions through the emission aperture; an inspection filter, which is separate from the X-ray emitter; as well as a zone plate positioned outside the X-ray shield and relative to the emission aperture to receive the portion of the hard X-rays from the emission aperture of the X-ray shield and to focus the portion of the hard X-ray emissions received from the emission aperture into focused hard X-ray emissions, wherein the zone plate is fixed relative to the X-ray emitter and positioned between the X-ray emitter and the inspection filter to direct the focused hard X-ray emissions to the inspection filter, the inspection filter being rotatable relative to the zone plate to pass a portion of the focused hard X-ray emissions based on a rotational position of the inspection filter relative to the zone plate.
2. The apparatus of claim 1, wherein the zone plate comprises a plurality of Fresnel zones.
3. The apparatus of claim 2, wherein at least one of the plurality of Fresnel zones of the zone plate has at least one radius corresponding to a focal length of the zone plate.
4. The device of claim 1, wherein the zone plate is fabricated at least in part from carbon nanotubes.
5. The apparatus of claim 1, wherein the zone plate is fabricated at least in part from lead.
6. The device of claim 1, wherein the zone plate comprises a surface treatment.
7. The device of claim 6, wherein the surface treatment is gold plating.
8. The apparatus of claim 1, wherein the hard X-ray streamlines have an energy level between about 60 keV and about 80 keV.
9. An X-ray backscatter system for nondestructive inspection of parts, the system comprising: base; an X-ray emitter connected to the base; an inspection filter movably connected to the base and rotatably positionable to receive hard X-ray emissions from the X-ray emitter and direct at least a portion of the hard X-ray emissions through a filter aperture in the inspection filter to a selectable location on the part based on a rotational position of the inspection filter relative to the X-ray emitter; as well as a zone plate inserted between the X-ray emitter and the inspection filter to receive the hard X-ray emissions from the X-ray emitter, modify a beam pattern of the hard X-ray emissions received from the X-ray emitter into a modified beam pattern, and pass the modified beam pattern of the hard X-ray emissions to the inspection filter.
10. The system of claim 9, further comprising a detector coupled to the base and selectively operable to detect hard X-rays backscattered from the part.