Ion source and coating device

Abstract

The application relates to the technical field of vacuum coating, and particularly discloses an ion source and a coating device, which comprise two groups of linear monomers distributed at an included angle, the linear monomer comprises a base provided with a containing groove extending along a length direction and a base gas inlet interface communicated with the containing groove, a permanent magnet arranged in the containing groove, an electrode arranged in the containing groove and located at two sides of the permanent magnet, an insulating layer arranged in the containing groove and used for isolating the electrode and the permanent magnet, the insulating layer is uniformly provided with a plurality of gas inlets along the length direction, an outer frame mounted on the base and located at an opening of the containing groove, and an inner plate arranged in the outer frame, a gap region is formed between an outer edge of the inner plate and an inner wall of the outer frame, and the base gas inlet interface, the gas inlets and the gap region are sequentially penetrated. The ion source and the coating device improve the coating uniformity and the coating deposition rate.

Description

Technical Field

[0001] This invention relates to the field of vacuum coating technology, and in particular to an ion source and a coating apparatus. Background Technology

[0002] PECVD (Plasma Enhanced Chemical Vapor Deposition) is a process in which reactive gases gain initiation energy from the plasma under high-frequency plasma driving conditions, initiating and enhancing the chemical reaction, thereby achieving chemical vapor deposition and ultimately forming a solid film on the sample surface.

[0003] In current coating technologies, PECVD technology is widely used in semiconductor manufacturing, optical device production, and solar cell fabrication. However, current PECVD coating equipment still has many shortcomings. For example, the uniformity of the plasma is difficult to meet the requirements of large-area, high-precision coating, resulting in inconsistent coating quality; the performance of the ion source limits the degree of ionization of the reactant gas, affecting the density and adhesion of the coating, leading to low production efficiency. Therefore, the technical solution of this application is urgently needed to solve the above problems. Summary of the Invention

[0004] The purpose of this invention is to provide an ion source and a coating apparatus that improve coating uniformity and increase coating deposition rate.

[0005] To achieve the above objectives, in a first aspect, the present invention provides an ion source comprising: two groups of linear monomers distributed at an included angle, wherein the linear monomers include:

[0006] The base has a receiving groove extending along its length and a base air inlet communicating with the receiving groove;

[0007] A permanent magnet is disposed in the receiving groove;

[0008] Electrodes are disposed in the receiving groove and located on both sides of the permanent magnet;

[0009] An insulating layer is disposed in the receiving groove and is used to isolate the electrode and the permanent magnet. The insulating layer has a plurality of air inlets evenly distributed along the length direction.

[0010] The outer frame is mounted on the base and located at the opening of the receiving groove; and

[0011] An inner panel is disposed within the outer frame, and a gap area is formed between the outer edge of the inner panel and the inner wall of the outer frame;

[0012] The base air inlet, the air inlet hole, and the gap area are sequentially connected.

[0013] In some embodiments, the linear monomer includes an isolation shield that is sealed to the base and covers one end of the electrode.

[0014] In some embodiments, the linear monomer includes a bellows, one end of which is sealed to the isolation cover, and the interior of the bellows is in communication with the interior of the isolation cover.

[0015] The electrode is a water-cooled electrode, which has a water-cooling interface and a power connection terminal. The water-cooling interface is used to connect to a cooling system, and the power connection terminal is used to connect to a power source.

[0016] In some embodiments, the base has an airflow channel extending along the length direction, and the base air inlet is connected to the air inlet through the airflow channel.

[0017] In some embodiments, the base includes two support frames, and the two ends of the base are rotatably connected to the two support frames about the length direction.

[0018] In some embodiments, the linear unit includes an angle indicator and a rotation damper. The angle indicator is disposed between one end of the base and the support frame to indicate the rotation angle of the base relative to the support frame. The rotation damper is disposed between the other end of the base and the support frame to provide rotational damping.

[0019] In a second aspect, the present invention provides a coating apparatus, comprising:

[0020] A vacuum chamber, having a vacuum cavity;

[0021] A cavity cover, installed in the vacuum cavity and used to open or close the vacuum cavity, the cavity cover having a cavity cover vent;

[0022] An air supply unit is installed on the cavity cover;

[0023] The ion source provided in the first aspect is disposed within the vacuum cavity, and the ion source is mounted on the cavity cover; and

[0024] A gas equalization pipe is provided in the vacuum chamber and is installed between the two sets of linear units. The gas equalization pipe has a gas equalization pipe inlet and multiple exhaust holes evenly distributed along the length direction.

[0025] The air supply unit is connected to the air inlet of the base and the air inlet of the equalization pipe through the air port of the cavity cover.

[0026] In some embodiments, the gas equalization pipe has a partition that divides the internal space of the gas equalization pipe into a first cavity and a second cavity that are connected to each other. The first cavity is connected to the air inlet of the gas equalization pipe, and the second cavity is connected to the exhaust port.

[0027] In some embodiments, the gas supply unit is provided in multiple sets, and the gas supply unit includes a gas source, a flow controller and a shut-off valve. The gas source is connected to the flow controller and the shut-off valve in sequence and is branched to the base air inlet and the gas equalization pipe air inlet.

[0028] This invention provides an ion source and a coating apparatus, which have the following advantages compared with the prior art:

[0029] The base has a receiving groove extending along its length and a base air inlet communicating with the receiving groove. A permanent magnet is disposed in the receiving groove, and electrodes are disposed in the receiving groove and located on both sides of the permanent magnet. An insulating layer is disposed in the receiving groove and is used to isolate the electrodes and the permanent magnet. A gap region is formed between the outer edge of the inner plate and the inner wall of the outer frame. The base air inlet, the air inlet hole, and the gap region are sequentially connected. In this way, by inputting voltage to the electrodes, the gas can be ionized. The electromagnetic field generated by the permanent magnet and the electrodes constrains the ionized gas and accelerates electron collisions, ultimately forming and maintaining plasma in the gap region. By using two sets of linear monomers distributed at an angle, the coating uniformity and coating deposition rate are improved. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the installation structure of an ion source provided for some embodiments of the present invention.

[0031] Figure 2 This is a three-dimensional magnified schematic diagram of a linear monomer of an ion source provided for some embodiments of the present invention.

[0032] Figure 3 This is a magnified side view of a linear monomer structure of an ion source provided in some embodiments of the present invention.

[0033] Figure 4 for Figure 3 Enlarged cross-sectional view along the AA direction.

[0034] Figure 5 This is a schematic diagram of the cavity cover and air supply unit installation structure of a coating device provided in some other embodiments of the present invention.

[0035] Figure 6 This is a schematic diagram of the exploded structure of a coating device, including the cavity cover, gas supply unit, ion source, and gas equalization pipe, provided for some other embodiments of the present invention.

[0036] Figure 7 This is an enlarged schematic diagram of the internal structure of the gas equalization tube of a coating device provided in some other embodiments of the present invention.

[0037] In the diagram: 1. Base; 11. Receiving groove; 12. Base air inlet; 2. Permanent magnet; 3. Electrode; 4. Insulating layer; 41. Air inlet; 5. Outer frame; 6. Inner plate; 61. Gap area; 7. Isolation cover; 8. Bellows; 9. Support frame; 101. Angle indicator; 102. Rotation damper; 13. Airflow channel; 100. Linear unit; 200. Cavity cover; 201. Cavity cover air port; 300. Air supply unit; 301. Gas source; 302. Flow controller; 303. Shut-off valve; 400. Gas equalization pipe; 401. Gas equalization pipe air inlet; 402. Exhaust port; 403. Partition; 404. First cavity; 405. Second cavity; x, length direction. Detailed Implementation

[0038] The technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments.

[0039] It should be understood that in the description of this application, the terms "upper," "lower," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are used solely for the convenience of describing this application and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. That is, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. Furthermore, unless otherwise stated, "a plurality of" means two or more.

[0040] Furthermore, the technical features involved in the different embodiments of this application described below can be combined with each other as long as they do not conflict with each other.

[0041] like Figures 1-4As shown, the ion source of some embodiments of the present invention includes: two sets of linear monomers 100 distributed at an angle. Each linear monomer 100 includes: a base 1, a permanent magnet 2, an electrode 3, an insulating layer 4, an outer frame 5, and an inner plate 6. During operation, by inputting a voltage to the electrode 3, the gas can be ionized. The electromagnetic field generated by the permanent magnet 2 and the electrode 3 confines the ionized gas and accelerates electron collisions, ultimately forming and maintaining plasma in the gap region 61 between the outer frame 5 and the inner plate 6. Furthermore, by adjusting the spacing and angle of the two sets of linear monomers 100, the distribution and energy density of the plasma can be more precisely controlled, and the magnetic field direction can form a cross structure to optimize the plasma distribution, increase the plasma density, enhance the focusing effect of the ion beam, and ensure a uniform coating effect on a large-area substrate.

[0042] The base 1 has a receiving groove 11 extending along the length direction x and a base air inlet 12 communicating with the receiving groove 11. Thus, the base 1 is elongated, which can enhance the energy and activity of ions and significantly accelerate the deposition rate of thin films. At the same time, the length of the base 1 can be extended to a maximum of 3m, which can realize uniform film deposition on large-area substrates, greatly improve production efficiency, and is suitable for large-scale industrial production.

[0043] The permanent magnet 2 is disposed in the receiving tank 11. The two sets of linear monomers 100 permanent magnets 2 can generate a symmetrical magnetic field. Ionized ions can be accelerated and drawn out under the action of this distributed magnetic field to form a ribbon-shaped ion beam. At the same time, the adjacent magnetic fields superimpose to form a continuous and uniform magnetic field region, further ensuring the uniformity of the plasma along the length direction x.

[0044] Electrode 3 is disposed in the receiving tank 11 and located on both sides of permanent magnet 2. Electrode 3 is used to ionize reactive gas.

[0045] An insulating layer 4 is disposed in the receiving groove 11 and is used to isolate the electrode 3 and the permanent magnet 2. The insulating layer 4 has a plurality of air inlets 41 evenly distributed along its length x. In this way, the plurality of air inlets 41 can ensure the uniformity of gas injection.

[0046] The outer frame 5 is mounted to the base 1 and located at the opening of the receiving groove 11. For example, the outer frame 5 is mounted to the base 1 by screws.

[0047] The inner plate 6 is disposed within the outer frame 5, and a gap region 61 is formed between the outer edge of the inner plate 6 and the inner wall of the outer frame 5. For example, the inner plate 6 is mounted to the permanent magnet 2 and / or the insulating layer 4 by screws.

[0048] In this embodiment, the base air inlet 12, the air inlet 41, and the gap region 61 are connected sequentially.

[0049] Based on the above structural design, the linear monomers 100 with adjustable spacing and angle allow for more precise control of plasma distribution and energy density, thereby ensuring uniform coating on large-area substrates. The structure of the linear monomers 100 enhances the energy and activity of ions, significantly accelerating the film deposition rate and achieving uniform coating on large-area substrates, greatly improving production efficiency and making it suitable for large-scale industrial production.

[0050] like Figure 3 and 4 As shown, in some embodiments, the linear monomer 100 includes an isolation cover 7, which is sealed to the base 1 and covers one end of the electrode 3. Thus, the isolation cover 7 facilitates the connection of the electrode 3 to an external power source.

[0051] like Figure 3 and 4 As shown, in some embodiments, the linear monomer 100 includes a bellows 8, one end of which is sealed to the isolation cover 7, and the interior of the bellows 8 is in communication with the interior of the isolation cover 7. Thus, the bellows 8 facilitates the connection of the electrode 3 to an external power source. By connecting the bellows 8 between the isolation cover 7 and external structures (such as cooling water pipes or power lines), dynamic sealing is achieved through its flexible structure, preventing gas leakage within the vacuum chamber. The extensibility of the bellows 8 can adapt to the oscillation and displacement adjustment of the base.

[0052] like Figure 4 As shown, in some embodiments, electrode 3 is a water-cooled electrode. Electrode 3 has a water-cooling interface and a power connection terminal. The water-cooling interface is used to connect to a cooling system, and the power connection terminal is used to electrically connect to a power source. During installation, the cooling system piping passes through the corrugated pipe 8 and the isolation cover 7 to connect to the water-cooling interface on the water-cooled electrode, and the power supply line passes through the corrugated pipe 8 and the isolation cover 7 to connect to the power connection terminal. Specifically, the water-cooled electrode is made of high-purity copper, which has good conductivity and heat dissipation.

[0053] like Figure 4 As shown, in some embodiments, the base 1 has an airflow channel 13 extending along the length direction x, and the base air inlet 12 is connected to the air inlet 41 through the airflow channel 13. In this way, the airflow channel 13 can ensure smooth gas flow and meet the air intake requirements of multiple air inlets 41.

[0054] like Figure 1 As shown, in some embodiments, two support frames 9 are included, and the two ends of the base 1 are rotatably connected to the two support frames 9 about the length direction x. In this way, the base 1 can be conveniently installed on the cavity cover 200 by means of the support frames 9.

[0055] like Figure 6As shown, in some embodiments, the linear unit 100 includes an angle indicator 101 and a rotation damper 102. One end of the base 1 is rotatably connected to the support frame 9 about the length direction x via the angle indicator 101, and the other end of the base 1 is rotatably connected to the support frame 9 about the length direction x via the rotation damper 102. Thus, the deflection angle of the linear unit 100 can be observed through the angle indicator 101, and the vibration generated during the rotation of the linear unit 100 can be reduced through the rotation damper 102. This achieves the function of adjustable spacing and angle between the two sets of linear units 100, adapting to the coating requirements of substrates with different shapes, sizes, and materials, and providing greater flexibility in use.

[0056] like Figures 5-7 As shown, the coating apparatus of some other embodiments of the present invention includes: a vacuum chamber, a chamber cover 200, a gas supply unit 300, an ion source, and a gas equalization pipe 400. The gas supply unit 300 is used to supply gas to the ion source and the gas equalization pipe 400.

[0057] The vacuum chamber is made of stainless steel, providing excellent sealing and mechanical strength. Its overall rectangular shape allows it to accommodate coating applications on large-area samples.

[0058] A cavity cover 200 is installed in the vacuum chamber and is used to open or close the vacuum chamber. The cavity cover 200 has cavity cover vents 201. There are multiple cavity cover vents 201 to facilitate the installation of air inlet pipes.

[0059] The gas supply unit 300 is installed on the chamber cover 200. The ion source is located inside the vacuum chamber and is installed on the chamber cover 200.

[0060] A gas equalization pipe 400 is disposed within the vacuum chamber and installed between two sets of linear units 100. The gas equalization pipe 400 has a gas equalization pipe inlet 401 and multiple exhaust holes 402 evenly distributed along the length direction x. For example, there are three gas equalization pipes 400, which are designed with a length ratio of 1:3:1 and are arranged along the length direction x in the middle of the two sets of linear units 100.

[0061] During coating, the substrate to be coated is fixed on the substrate support platform of the vacuum chamber, ensuring the substrate surface is clean and free of contaminants. The pressure in the vacuum chamber is evacuated to below 10⁻³ Pa, and the gas supply unit 300 is turned on, introducing an appropriate amount of inert gas and reactive gas, such as silane, ammonia, or argon, into the vacuum chamber. The linear monomer 100 of the linear ion source is activated, and its power is adjusted to generate high-density plasma, causing the reactive gas to decompose and deposit on the substrate. The coating process is optimized by adjusting parameters such as the flow rate of the gas supply unit 300, the power of the linear monomer 100, and the movement speed of the support platform. After coating is completed, the ion source and gas supply unit 300 are turned off, and then air is slowly introduced. The chamber cover 200 is then opened, and the substrate is removed. The thickness, uniformity, and crystal structure of the thin film are detected using scanning electron microscopy and other methods.

[0062] In this embodiment, the air supply unit 300 is connected to the base air inlet 12 and the air distribution pipe air inlet 401 through the cavity cover air port 201.

[0063] Based on the above structural design, the linear monomers 100 with adjustable spacing and angle allow for more precise control of plasma distribution and energy density, thereby ensuring uniform coating on large-area substrates. The structure of the linear monomers 100 enhances the energy and activity of ions, significantly accelerating the film deposition rate and achieving uniform coating on large-area substrates, greatly improving production efficiency and making it suitable for large-scale industrial production.

[0064] In some embodiments, the gas equalization pipe 400 has a partition 403 that divides the internal space of the gas equalization pipe into a first cavity 404 and a second cavity 405 that are connected. The first cavity 404 is connected to the gas equalization pipe inlet 401, and the second cavity 405 is connected to the exhaust port 402. This further improves the uniformity of the injected reactive gas.

[0065] In some embodiments, the gas supply unit 300 is provided in multiple sets, and each gas supply unit 300 includes a gas source 301, a flow controller 302, and a shut-off valve 303. The gas source 301 is connected to the base air inlet 12 and the gas equalization pipe air inlet 401 through the flow controller 302 and the shut-off valve 303, respectively. In this way, the flow rate and velocity of the gas can be precisely controlled by the flow controller 302 and the shut-off valve 303.

[0066] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and substitutions can be made without departing from the technical principles of the present invention, and these improvements and substitutions should also be considered within the scope of protection of the present invention.

Claims

1. An ion source, characterized in that, include: Two groups of linear monomers distributed at an angle, wherein the linear monomers include: The base has a receiving groove extending along its length and a base air inlet communicating with the receiving groove; A permanent magnet is disposed in the receiving groove; Electrodes are disposed in the receiving groove and located on both sides of the permanent magnet; An insulating layer is disposed in the receiving groove and is used to isolate the electrode and the permanent magnet. The insulating layer has a plurality of air inlets evenly distributed along the length direction. The outer frame is mounted on the base and located at the opening of the receiving groove; and An inner panel is disposed within the outer frame, and a gap area is formed between the outer edge of the inner panel and the inner wall of the outer frame; The base air inlet, the air inlet hole, and the gap area are connected sequentially. It includes two support frames, and the two ends of the base are rotatably connected to the two support frames about the length direction; The linear unit includes an angle indicator and a rotation damper. The angle indicator is disposed between one end of the base and the support frame to indicate the rotation angle of the base relative to the support frame. The rotation damper is disposed between the other end of the base and the support frame to provide rotation damping.

2. The ion source according to claim 1, characterized in that, The linear monomer includes an isolation cover, which is sealed to the base and covers one end of the electrode.

3. The ion source according to claim 2, characterized in that, The linear unit includes a bellows, one end of which is sealed to the isolation cover, and the interior of the bellows is in communication with the interior of the isolation cover.

4. The ion source according to claim 3, characterized in that, The electrode is a water-cooled electrode, which has a water-cooling interface and a power connection terminal. The water-cooling interface is used to connect to a cooling system, and the power connection terminal is used to connect to a power source.

5. The ion source according to claim 1, characterized in that, The base has an airflow channel extending along the length direction, and the base air inlet is connected to the air inlet hole through the airflow channel.

6. A coating apparatus, characterized in that, include: A vacuum chamber, having a vacuum cavity; A cavity cover, installed in the vacuum cavity and used to open or close the vacuum cavity, the cavity cover having a cavity cover vent; An air supply unit is installed on the cavity cover; The ion source as described in any one of claims 1-5 is disposed within the vacuum chamber, and the ion source is mounted on the chamber cover; as well as A gas equalization pipe is provided in the vacuum chamber and is installed between the two sets of linear units. The gas equalization pipe has a gas equalization pipe inlet and multiple exhaust holes evenly distributed along the length direction. The air supply unit is connected to the air inlet of the base and the air inlet of the equalization pipe through the air port of the cavity cover.

7. The coating apparatus according to claim 6, characterized in that, The gas equalization pipe has a partition that divides the internal space of the gas equalization pipe into a first cavity and a second cavity that are connected. The first cavity is connected to the air inlet of the gas equalization pipe, and the second cavity is connected to the exhaust port.

8. The coating apparatus according to claim 7, characterized in that, The gas supply unit is provided in multiple sets. The gas supply unit includes a gas source, a flow controller and a shut-off valve. The gas source is connected to the flow controller and the shut-off valve in sequence and is branched to the base air inlet and the gas equalization pipe air inlet.

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