Chlorine flow control device, method and system

Abstract

The invention belongs to the technical field of pipeline cleaning, particularly relates to a chlorine flow control device, method and system, and aims to solve the problems of low chlorine flow control precision and stability. The device comprises an inflation pipeline, a vacuum pipeline and a chlorine flow control pipeline, the vacuum pipeline comprises a vacuum generator, and the chlorine flow control pipeline comprises a mass flow controller; an air outlet of the inflation pipeline is connected with an air inlet of the mass flow controller; a cut-off valve is arranged on the chlorine flow control pipeline; an inflation valve is arranged on the inflation pipeline; vacuum valves are arranged on the vacuum pipeline, the vacuum valves comprise a first vacuum valve and a second vacuum valve, a gas inlet of the vacuum generator is connected with gas supply equipment through the first vacuum valve, and an extraction opening of the vacuum generator is connected with a gas inlet of the mass flow controller through the second vacuum valve. The precision and stability of the mass flow controller can be improved, and stable control over the chlorine flow is guaranteed.

Description

Technical Field

[0001] The present application belongs to the technical field of pipeline cleaning, and specifically relates to a chlorine flow control device, method and system. Background Art

[0002] With the rapid development of the semiconductor industry, chlorine trifluoride has been widely used in the field of electronic cleaning. In the chlorine trifluoride production line, under the condition of a constant fluorine gas flow rate, the fluctuation of the chlorine gas flow rate has a significant impact on its purity and synthesis efficiency, and is a key control parameter.

[0003] In the existing technology, precise control of chlorine flow is often achieved by installing a mass flow controller in the chlorine pipeline. In actual applications, a new mass flow controller can indeed achieve precise chlorine supply. However, after a period of supply, such as a week, the supply of the mass flow controller begins to become very unstable, and deviations in both accuracy and stability performance occur.

[0004] The reason for the deviation may be that the purity of chlorine is insufficient. The water contained in chlorine reacts with chlorine to form hypochlorous acid. Dry chlorine has very weak corrosion to the pipeline, while hypochlorous acid is more corrosive and reacts with the pipeline wall to produce mechanical impurities. Mechanical impurities flow through the flow controller as the chlorine flows in the pipeline, causing the flow controller to be blocked. Summary of the Invention

[0005] In order to solve the above-mentioned problems in the prior art, namely, the problem of low chlorine flow control accuracy and stability, the first aspect of the present application provides a chlorine flow control device, including an inflation pipeline, a vacuum pipeline, and a chlorine flow control pipeline, wherein the vacuum pipeline includes a vacuum generator, and the chlorine flow control pipeline includes a mass flow controller;

[0006] The gas outlet of the gas charging pipeline is connected to the gas inlet of the mass flow controller. The gas charging pipeline is used to charge inert gas. The vacuum generator is used to evacuate the passage where the mass flow controller is located. The mass flow controller is used to control the flow rate of chlorine gas.

[0007] A shutoff valve is provided on the chlorine flow control line to shut off the mass flow controller;

[0008] An inflation valve is provided on the inflation pipeline;

[0009] A vacuum valve is provided on the vacuum pipeline, which is used to start or stop the vacuum generator. The vacuum valve includes a first vacuum valve and a second vacuum valve. The air inlet of the vacuum generator is connected to the gas supply equipment through the first vacuum valve, and the air exhaust port of the vacuum generator is connected to the air inlet of the mass flow controller through the second vacuum valve.

[0010] As a preferred embodiment, the gas inlets of the inflation pipeline and the vacuum pipeline are both connected to a gas supply device, wherein the gas supply device is used to provide an inert gas.

[0011] As a preferred embodiment, a purifier is further installed on the chlorine flow control pipeline, wherein the gas outlet of the purifier is connected to the gas inlet of the mass flow controller through a shut-off valve. The purifier is used to improve the purity of the chlorine in the chlorine flow control pipeline.

[0012] As a preferred embodiment, the vacuum generator includes an air inlet, a nozzle, a valve body, a diffusion pipe, an air extraction port and an air outlet, wherein the air outlet is connected to the exhaust gas removal system.

[0013] As a preferred embodiment, the gas outlet of the vacuum generator is used to discharge the gas sucked in by the vacuum generator, and the exhaust gas removal system is used to process the exhaust gas.

[0014] In a second aspect of the present application, a chlorine gas flow control method is proposed, comprising:

[0015] In response to receiving activation signals for the inflation line and the vacuum line, closing the shutoff valve and opening the first vacuum valve;

[0016] Open the second vacuum valve and monitor the vacuum pumping time of the vacuum generator;

[0017] When the vacuuming time is greater than or equal to the first time threshold, closing the second vacuum valve and opening the inflation valve;

[0018] When the inflation time is greater than or equal to the second time threshold, closing the inflation valve;

[0019] When the number of times the second vacuum valve is opened is greater than or equal to the number threshold, the second vacuum valve is opened to perform a final vacuum pumping on the channel where the mass flow controller is located;

[0020] Close the second vacuum valve and the first vacuum valve in sequence;

[0021] Open the shutoff valve to allow chlorine gas to pass through the mass flow controller.

[0022] As a preferred embodiment, it includes:

[0023] When the number of times the second vacuum valve is opened is less than the number threshold, the second vacuum valve is opened until the vacuuming time is greater than or equal to the first time threshold, and then the second vacuum valve is closed;

[0024] Open the inflation valve until the inflation time is greater than or equal to the second time threshold, and then close the inflation valve;

[0025] The number of times the second vacuum valve is opened is compared with the number threshold again until the number of times the second vacuum valve is opened is greater than or equal to the number threshold.

[0026] As a preferred embodiment, the method further includes:

[0027] Monitoring the last vacuum pumping time of the channel where the mass flow controller is located;

[0028] When the last vacuuming time is greater than or equal to the third time threshold, the second vacuum valve and the first vacuum valve are closed in sequence.

[0029] In a third aspect of the present application, a chlorine gas flow control system is proposed, comprising:

[0030] Host computer, programmable logic controller, valve island box;

[0031] The host computer is used to monitor the device and exchange data with the programmable logic controller;

[0032] The programmable logic controller is used to control the solenoid valves in the valve island box, wherein the solenoid valves are used to control the opening and closing of each valve in the device;

[0033] The programmable logic controller is further used to receive chlorine flow rate data fed back by the mass flow controller and send the set chlorine flow rate to the mass flow controller.

[0034] As a preferred embodiment, the valve is a metal pneumatic diaphragm valve.

[0035] Beneficial effects of this application:

[0036] (1) By performing vacuum operation and filling inert gas on the passage where the mass flow controller is located, impurities in the mass flow controller can be removed, the corrosion of the chlorine reactant on the pipeline and the mass flow controller can be reduced, the accuracy and stability of the mass flow controller can be improved, and the service life of the mass flow controller can be extended.

[0037] (2) The maintenance of the mass flow controller is achieved by vacuuming and filling with inert gas, which can ensure the stable control of the chlorine gas flow rate during the production operation of chlorine trifluoride based on chlorine gas, effectively improving the purity and synthesis efficiency of the product. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] Other features, objects and advantages of the present application will become more apparent upon reading the detailed description of non-limiting embodiments made with reference to the following drawings:

[0039] Figure 1 This is a structural diagram of a chlorine gas flow control device provided by one embodiment of the present application;

[0040] Figure 2 This is a diagram of the internal structure of a vacuum generator provided by one embodiment of the present application;

[0041] Figure 3 is a structural diagram of a chlorine gas flow control device provided by another embodiment of the present application;

[0042] Figure 4 This is a flow chart of a chlorine gas flow control method provided by one embodiment of the present application;

[0043] Figure 5 This is a structural diagram of a chlorine gas flow control system provided by one embodiment of the present application;

[0044] Figure 6 This is a gas automatic purification control flow chart provided by an embodiment of the present application;

[0045] Figure 7 This is a real-time flow diagram of chlorine provided by one embodiment of the present application;

[0046] Figure 8 This is a comparison chart of theoretical and actual weight loss provided by an embodiment of the present application;

[0047] Figure 9 It is a structural diagram of a computer system of a server for implementing the method, system, and device embodiments of the present application. DETAILED DESCRIPTION

[0048] The present application will be further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are intended only to illustrate the relevant invention and are not intended to limit the invention. It should also be noted that, for ease of description, only portions relevant to the relevant invention are shown in the accompanying drawings.

[0049] It should be noted that, in the absence of conflict, the embodiments and features of the embodiments in this application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0050] At present, the main method for synthesizing chlorine trifluoride is: under certain temperature conditions, F2 and Cl2 react to first produce ClF, see formula (1), and ClF further reacts with F2 to synthesize ClF3, see formula (2).

[0051] Cl2 + F2 = 2ClF (1)

[0052] ClF+F2 = ClF3 (2)

[0053] During this process, under a certain fluorine flow rate, if the chlorine flow rate is too low, the reaction will not proceed fully, resulting in a decrease in yield; if the chlorine flow rate is too high, it will increase the burden on the exhaust gas treatment system and cause unnecessary waste. Therefore, accurate measurement of the chlorine flow rate is extremely critical to the purity and efficiency of the synthesis. Based on the process requirements, the chlorine flow rate control accuracy required in this article is ±0.1kg / h.

[0054] In the actual working process of preparing chlorine trifluoride based on chlorine, the theoretical feeding amount is obtained by calculating the chlorine feeding frequency and time, and the weight loss at the feeding point is obtained by actual weighing. The theoretical feeding amount and the weight loss are compared, and it is found that the deviation between the two is relatively large, that is, the mass flow controller has deviations in both accuracy and stability.

[0055] To resolve this issue, see Figure 1 The present application proposes a chlorine flow control device, including an inflation pipeline, a vacuum pipeline, and a chlorine flow control pipeline.

[0056] In the embodiment of the present application, the gas inlets of the inflation line and the vacuum line are both connected to the gas supply device 1, which is used to provide an inert gas. In the embodiment of the present application, the inert gas provided is nitrogen.

[0057] The vacuum line is connected to the gas supply device 1, and then to the mass flow controller 9 through the first vacuum valve 2, the vacuum generator 3, and the second vacuum valve 5. The outlet of the vacuum generator is connected to the exhaust gas treatment device 4. The vacuum generator 3 is used to evacuate the passage where the mass flow controller is located, and the mass flow controller is used to control the flow of chlorine gas.

[0058] It should be noted that the vacuum valve includes a first vacuum valve 2 and a second vacuum valve 5, and the vacuum valve is used to start or stop the vacuum generator, wherein the air inlet of the vacuum generator 3 is connected to the gas supply device 1 through the first vacuum valve 2, and the air exhaust port of the vacuum generator 3 is connected to the air inlet of the mass flow controller 9 through the second vacuum valve 5.

[0059] The charging pipeline is connected to the gas supply device 1 and is connected to the mass flow controller 9 through the charging valve 6. The gas outlet of the charging pipeline is connected to the gas inlet of the mass flow controller 9, and the charging pipeline is used to charge inert gas.

[0060] The chlorine flow control pipeline is connected to the chlorine buffer tank 7, connected to the air inlet of the mass flow controller 9 through the cut-off valve 8, and connected to the air outlet of the mass flow controller 9 through the cut-off valve 10. The cut-off valve is used to cut off the mass flow controller.

[0061] It should be noted that when chlorine is released from the chlorine buffer tank 7 and the shut-off valve 8 and the shut-off valve 10 are both opened, the chlorine flow rate is controlled by the mass flow controller 9 and transmitted to the reactor 11 for the chemical reaction.

[0062] As an example, the device of the present application can put the mass flow controller 9 in a cut-off state by closing the shut-off valve 8 and the shut-off valve 10, thereby preventing the vacuuming and filling operations from destroying the current equilibrium state of the system; further, the first vacuum valve 2 is opened to start the vacuum generator 3, so that the vacuum pipeline begins to circulate vacuum, and the reverse vacuuming of the chlorine metering unit is achieved by opening the second vacuum valve 5; further, after the vacuuming operation is completed, the second vacuum valve 5 is closed, the charging valve 6 is opened, and inert gas is filled from the gas feeding device 1 to clear the passage where the mass flow controller 9 is located.

[0063] When the cleaning operation is completed, close the inflation valve 6, reopen the second vacuum valve 5, and perform the final vacuuming on the passage where the mass flow controller 9 is located. When the vacuuming and cleaning operations are completed, close the second vacuum valve 5, and then close the first vacuum valve 2 to end the purification operation on the mass flow controller 9 and its passage.

[0064] By implementing reverse evacuation and forward nitrogen filling cycle replacement, impurities attached to the pipe wall can be effectively removed and the chlorine metering unit can be kept in a clean and pollution-free environment when not in use.

[0065] Furthermore, after the purification operation is completed, the shut-off valve 8 and the shut-off valve 10 are opened, so that the chlorine released from the chlorine buffer tank 7 is flow-controlled by the mass flow controller 9 .

[0066] It should be noted that the vacuum generator is a vacuum-generating component that does not consume any motor energy, relies on compressed gas, and requires no maintenance. It is a very economical component. The vacuum generator generates negative pressure from a positive pressure gas source based on the Bernoulli principle. When used in places with a positive pressure gas source, it can greatly simplify the vacuum circuit.

[0067] In the embodiment of the present application, the internal structure of the vacuum generator is as shown in FIG. Figure 2As shown, high-purity nitrogen is introduced into the air inlet 21 of the vacuum generator. The air inlet 21 has a relatively large diameter. When it reaches the vacuum generating point, the diameter suddenly becomes smaller, forming a structure as shown in the nozzle 22. Based on this diameter change, when high-purity nitrogen or high-pressure nitrogen is injected, it will form a high-speed jet when flowing through the nozzle 22. The high-speed jet will generate a low-pressure area at the throat of the vacuum generator, thereby generating a vacuum degree. The external gas is further sucked in through the air outlet 23. The valve body 24 is used to adjust the air flow to affect the flow rate at the nozzle, thereby changing the vacuum degree. The inhaled gas mixes with the jet and enters the diffuser 25. Based on the pressure difference formed between the vacuum generator and the connecting pipe, the mixed gas is decelerated and pressurized, and then discharged through the outlet 26 along the nitrogen gas flow.

[0068] The gas outlet 26 is connected to the tail gas treatment device 4 and is used to treat the exhaust gas, such as discharging the gas into the atmosphere or recycling it.

[0069] In the embodiment of the present application, the ultimate vacuum pressure of the vacuum generator used reaches 60 Torr (absolute pressure), which is sufficient to meet the vacuum pressure required for gas pipeline replacement, and its interfaces all use easily replaceable VCR connectors.

[0070] In an embodiment of the present application, high-purity nitrogen provided by the gas supply device 1 is used as the positive pressure gas source of the vacuum generator. In other embodiments, other gases can also be used as the gas source of the vacuum generator, that is, the gas supply of the inflation pipeline and the vacuum pipeline may be inconsistent.

[0071] Preferably, a purifier is also installed on the chlorine flow control, such as Figure 3 As shown, the chlorine buffer tank 7 is connected to the air inlet of the purifier 13 through the chlorine valve 12, and the air outlet of the purifier 13 is connected to the air inlet of the mass flow controller 9 through the shut-off valve 8. The purifier is used to improve the purity of the chlorine in the chlorine flow control pipeline.

[0072] The chlorine purifier can reduce the water content in high-purity chlorine with a purity of more than 99.999% from 1ppm to below 0.015ppm through a combination of physical adsorption and chemical adsorption, thereby reducing the generation of highly corrosive media such as hydrochloric acid and hypochlorous acid, and minimizing corrosion to mass flow controllers and pipelines.

[0073] A chlorine flow control device according to an embodiment of the present application includes an inflation pipeline, a vacuum pipeline, and a chlorine flow control pipeline, wherein the vacuum pipeline includes a vacuum generator and the chlorine flow control pipeline includes a mass flow controller; the air outlet of the inflation pipeline is connected to the air inlet of the mass flow controller, the inflation pipeline is used to fill with inert gas, the vacuum generator is used to vacuum the passage where the mass flow controller is located, and the mass flow controller is used to control the chlorine flow; a shut-off valve is provided on the chlorine flow control pipeline for shutting off the mass flow controller; an inflation valve is provided on the inflation pipeline; a vacuum valve is provided on the vacuum pipeline, and the vacuum valve is used to start or stop the vacuum generator, wherein the vacuum valve includes a first vacuum valve and a second vacuum valve, the air inlet of the vacuum generator is connected to the gas supply equipment through the first vacuum valve, and the air extraction port of the vacuum generator is connected to the air inlet of the mass flow controller through the second vacuum valve. By performing vacuum operation on the passage where the mass flow controller is located and filling it with inert gas, impurities can be removed from the mass flow controller, the corrosion of the chlorine reactant on the pipeline and the mass flow controller can be reduced, the accuracy and stability of the mass flow controller can be improved, and the service life of the mass flow controller can be extended.

[0074] See also Figure 4 The second embodiment of the present application proposes a chlorine flow control method, comprising:

[0075] Step S10 , in response to receiving the start-up signals of the inflation line and the vacuum line, closing the shut-off valve and opening the first vacuum valve.

[0076] Optionally, when the start signals of the inflation line and the vacuum line are received, the mass flow controller needs to be purged. At this time, the mass flow controller is put into the cut-off state by closing the shut-off valve to prevent the vacuuming and filling operations from destroying the current equilibrium state of the system.

[0077] Furthermore, the first vacuum valve is opened to start the vacuum generator, so that the vacuum pipeline begins to circulate and evacuate.

[0078] Step S20: Open the second vacuum valve and monitor the vacuum pumping time of the vacuum generator.

[0079] Optionally, the chlorine metering unit is reversely evacuated by opening the second vacuum valve, and the evacuation time of the vacuum generator is monitored by a monitoring device to determine whether the evacuation operation is completed.

[0080] Step S30: When the vacuuming time is greater than or equal to the first time threshold, the second vacuum valve is closed and the inflation valve is opened.

[0081] Optionally, when the vacuuming time is greater than or equal to the first time threshold, the vacuuming time is sufficient to complete the vacuuming operation, and the second vacuum valve is closed to end the vacuuming operation.

[0082] Furthermore, the charging valve is opened to start forward nitrogen charging. The nitrogen charging can clean the passage where the mass flow controller is located.

[0083] As an example, the first time threshold may be 240 seconds.

[0084] Step S40: When the inflation time is greater than or equal to the second time threshold, close the inflation valve.

[0085] Optionally, when the inflation time is greater than or equal to the second time threshold, the time for filling with nitrogen is sufficient to complete the cleaning of the passage where the mass flow controller is located, and the inflation valve is closed.

[0086] As an example, the second time threshold may be 10 seconds.

[0087] Step S50: When the number of times the second vacuum valve is opened is greater than or equal to a threshold number, the second vacuum valve is opened to perform a final vacuum pumping on the channel where the mass flow controller is located.

[0088] Optionally, the first vacuum valve is opened and not closed until the vacuuming is completed. The second vacuum valve needs to be opened once for each vacuuming operation. Therefore, the number of vacuuming operations can be determined by counting the number of times the second vacuum valve is opened.

[0089] When the number of times the second vacuum valve is opened is greater than or equal to the number threshold, it means that the number of vacuum pumping times is sufficient to effectively remove impurities attached to the tube wall and the mass flow controller, and can ensure that the mass flow controller is maintained in a clean and pollution-free environment. At this time, the second vacuum valve is opened to perform the final vacuum pumping on the channel where the mass flow controller is located.

[0090] As an example, the number threshold may be 50 times.

[0091] As a possible implementation, when the number of times the second vacuum valve is opened is less than a number threshold, the second vacuum valve is opened until the vacuuming time is greater than or equal to the first time threshold, and the second vacuum valve is closed; the inflation valve is opened until the inflation time is greater than or equal to the second time threshold, and the inflation valve is closed; the number of times the second vacuum valve is opened is compared with the number threshold again until the number of times the second vacuum valve is opened is greater than or equal to the number threshold.

[0092] Furthermore, the last vacuuming time should be extended as much as possible to fully prepare for the chlorine feeding process.

[0093] In an embodiment of the present application, the last vacuuming time of the channel where the mass flow controller is located is monitored; when the last vacuuming time is greater than or equal to the third time threshold, step S60 is executed.

[0094] As an example, the third time threshold may be 480 seconds.

[0095] Step S60: close the second vacuum valve and the first vacuum valve in sequence.

[0096] Optionally, the first vacuum valve is closed after all vacuuming operations are completed, so the second vacuum valve is closed first, and after confirming that the vacuuming operations are completed, the first vacuum valve is closed.

[0097] Step S70: Open the shutoff valve to allow the chlorine gas to pass through the mass flow controller.

[0098] Optionally, after executing the above steps, the purification operation of the mass flow controller and the passage in which it is located is completed, and the chlorine reaction can be carried out, and the shut-off valve is opened to allow the chlorine released from the chlorine buffer tank to be flow-controlled through the mass flow controller.

[0099] Maintenance of the mass flow controller by vacuuming and filling with inert gas can ensure stable control of the chlorine gas flow rate during the production operation of chlorine trifluoride preparation based on chlorine gas, effectively improving the purity and synthesis efficiency of the product.

[0100] In response to receiving the start signal of the inflation pipeline and the vacuum pipeline, the embodiment of the present application closes the shutoff valve and opens the first vacuum valve; opens the second vacuum valve and monitors the vacuum pumping time of the vacuum generator; when the vacuum pumping time is greater than or equal to the first time threshold, closes the second vacuum valve and opens the inflation valve; when the inflation time is greater than or equal to the second time threshold, closes the inflation valve; when the number of times the second vacuum valve is opened is greater than or equal to the number threshold, opens the second vacuum valve to perform the last vacuum pumping on the channel where the mass flow controller is located; sequentially closes the second vacuum valve and the first vacuum valve; opens the shutoff valve to allow chlorine to pass through the mass flow controller. By performing the vacuum pumping operation and filling the inert gas in the passage where the mass flow controller is located, the mass flow controller can be cleaned of impurities, the corrosion of the chlorine reactant on the pipeline and the mass flow controller can be reduced, the accuracy and stability of the mass flow controller can be improved, and the service life of the mass flow controller can be extended.

[0101] Although the various steps in the above embodiment are described in the above-mentioned order, those skilled in the art will understand that in order to achieve the effect of this embodiment, different steps do not have to be executed in such an order. They can be executed simultaneously (in parallel) or in a reverse order. These simple changes are within the scope of protection of this application.

[0102] See also Figure 5 The third embodiment of the present application proposes a chlorine flow control system, including: a host computer, a programmable logic controller (PLC), and a valve island box.

[0103] Among them, the host computer is used to monitor the above-mentioned chlorine flow control device and exchange data with the programmable logic controller; the programmable logic controller is used to control the solenoid valve in the valve island box, wherein the solenoid valve is used to control the opening and closing of each valve in the device; the programmable logic controller is also used to receive the chlorine flow data fed back by the mass flow controller and send the set chlorine flow to the mass flow controller.

[0104] In the embodiment of the present application, the valve is a metal pneumatic diaphragm valve.

[0105] Optionally, the host computer and PLC communicate via Ethernet. The PLC controller, through its configured digital output (DO) module, controls the solenoid valves centrally located within the valve island box, enabling air supply and shutoff, thereby opening and closing the pneumatic diaphragm valves. The automated purification process is accomplished by sequentially controlling the opening and closing of the corresponding pneumatic diaphragm valves. Simultaneously, the PLC controller's analog input (AI) module receives real-time chlorine flow data from the mass flow controller and precisely sets the chlorine flow rate through the analog output (AO) module.

[0106] Among them, the gas automatic purification program is written through the sequential control chart (SCC) programming language, and the gas automatic purification control flow chart is as follows: Figure 6 shown.

[0107] In the figure, T1 represents the first time threshold, T2 represents the second time threshold, X represents the number of times threshold, and T3 represents the third time threshold. These specific values ​​can be configured on the host computer monitoring interface. Once the program is started, the shutoff valve is immediately closed to prevent evacuation and nitrogen filling operations from disrupting the system's current equilibrium. Simultaneously, the first vacuum valve is activated to start the vacuum generator. The system then automatically begins a cyclic evacuation and nitrogen filling process. Reverse evacuation of the chlorine metering unit is achieved by operating the second vacuum valve, while forward nitrogen filling is accomplished by operating the gas charging valve. When the second vacuum valve has been opened the set number of times, the final evacuation is performed. The final evacuation time should be extended as much as possible to fully prepare for the chlorine feeding process.

[0108] Further, the chlorine flow rate analysis was performed by the chlorine flow control system of the embodiment of the present application, and 96 hours of chlorine flow rate data were selected. The chlorine flow rate control accuracy was analyzed based on the weight reduction of the electronic scale set under the chlorine cylinder. Sampling was performed every 10 minutes, and the horizontal axis was the sampling time. The following results were obtained: Figure 7 Real-time chlorine flow rate shown.

[0109] It can be seen that during the production operation of chlorine trifluoride, the chlorine flow control is stable and the response time of the chlorine mass flow controller is fast.

[0110] Convert the real-time flow rate into theoretical weight loss per hour and compare it with the actual weight loss on the electronic scale. Sampling is also performed every 10 minutes. The results are as follows: Figure 8 shown.

[0111] It can be seen that when the chlorine flow rate remains stable, the real-time weight loss of the electronic scale weighing the chlorine cylinder is basically consistent with the theoretical weight loss, and the chlorine flow rate fluctuation range is controlled within ±0.1kg / h, meeting the process requirements.

[0112] While the front-end pressure remained stable, before the system of the present invention was used, the chlorine mass flow controller experienced significant flow fluctuations and inaccurate metering within less than a week of use, requiring replacement of the mass flow controller to restore normal operation. However, since adopting the system of the present invention, chlorine flow control has remained accurate and stable, and no corrosion has occurred on the surface of the mass flow controller.

[0113] Test results demonstrate that the device, method, and system described in this application significantly improve the control accuracy and stability of chlorine gas flow, meeting process requirements; effectively increasing product purity and synthesis efficiency; and, at the same time, extending the life of the mass flow controller and significantly reducing resource consumption. Furthermore, this technology has broad application prospects for improving control accuracy and extending instrument life under similar harsh operating conditions, demonstrating its significant practical value.

[0114] Those skilled in the art will clearly understand that, for the convenience and brevity of description, the specific working process and related instructions of the system described above can refer to the corresponding processes in the aforementioned device and method embodiments, and will not be repeated here.

[0115] It should be noted that the chlorine gas flow control system provided in the above embodiment is only illustrated by the division of the above functional modules. In actual applications, the above functions can be assigned to different functional modules as needed, that is, the modules or steps in the embodiments of the present application can be further decomposed or combined. For example, the modules in the above embodiments can be combined into one module or further divided into multiple submodules to complete all or part of the functions described above. The names of the modules and steps involved in the embodiments of the present application are merely for distinguishing the modules or steps and are not considered to be improper limitations of the present application.

[0116] An electronic device according to a fourth embodiment of the present application includes:

[0117] at least one processor; and

[0118] a memory communicatively connected to at least one of the processors; wherein,

[0119] The memory stores instructions that can be executed by the processor, and the instructions are used to be executed by the processor to implement the above-mentioned chlorine gas flow control method.

[0120] A fifth embodiment of the present application provides a computer-readable storage medium, wherein the computer-readable storage medium stores computer instructions, and the computer instructions are used to be executed by the computer to implement the above-mentioned chlorine gas flow control method.

[0121] A sixth embodiment of the present application provides a computer program product. When the computer program product is run on an electronic device, the electronic device is enabled to execute the above-mentioned chlorine gas flow control method.

[0122] Those skilled in the art will clearly understand that, for the convenience and brevity of description, the specific working processes and related instructions of the electronic device, computer-readable storage medium, and computer program product described above can refer to the corresponding processes in the aforementioned method embodiments and will not be repeated here.

[0123] Those skilled in the art should be able to appreciate that, in conjunction with the modules and method steps of each example described in the embodiments disclosed herein, it is possible to implement them with electronic hardware, computer software, or a combination of the two, and the programs corresponding to the software modules and method steps can be placed in random access memory (RAM), internal memory, read-only memory (ROM), electrically programmable ROM, electrically erasable programmable ROM, registers, hard disks, removable disks, CD-ROMs, or any other form of storage medium known in the art. In order to clearly illustrate the interchangeability of electronic hardware and software, the composition and steps of each example have been generally described in terms of function in the above description. Whether these functions are performed in electronic hardware or software depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementation should not be considered to exceed the scope of this application.

[0124] Reference below Figure 9 , which shows a structural diagram of a computer system of a server for implementing the method, system, and device embodiments of the present application. Figure 9 The server shown is merely an example and should not limit the functions and scope of use of the embodiments of the present application.

[0125] like Figure 9 As shown, the computer system includes a central processing unit (CPU) 901, which can perform various appropriate actions and processes according to the program stored in the read-only memory (ROM) 902 or the program loaded from the storage part 908 into the random access memory (RAM) 903. Various programs and data required for system operation are also stored in the RAM 903. The CPU 901, ROM 902, and RAM 903 are connected to each other via a bus 904. An input / output (I / O) interface 905 is also connected to the bus 904.

[0126] The following components are connected to the I / O interface 905: an input section 906 including a keyboard, a mouse, and the like; an output section 907 including devices such as a cathode ray tube (CRT), a liquid crystal display (LCD), and a speaker; a storage section 908 including a hard disk and the like; and a communication section 909 including a network interface card such as a LAN (Local Area Network) card or a modem. The communication section 909 performs communication processing via a network such as the Internet. A drive 910 is also connected to the I / O interface 905 as needed. A removable medium 911, such as a magnetic disk, an optical disk, a magneto-optical disk, a semiconductor memory, and the like, is installed in the drive 910 as needed so that a computer program read therefrom can be installed into the storage section 908 as needed.

[0127] In particular, according to an embodiment of the present disclosure, the process described above with reference to the flowchart can be implemented as a computer software program. For example, an embodiment of the present disclosure includes a computer program product, which includes a computer program carried on a computer-readable medium, and the computer program includes a program code for executing the method shown in the flowchart. In such an embodiment, the computer program can be downloaded and installed from the network through the communication part 909, and / or installed from the removable medium 911. When the computer program is executed by the central processing unit (CPU) 901, the above-mentioned functions defined in the method of the present application are executed. It should be noted that the computer-readable medium mentioned above in the present application can be a computer-readable signal medium or a computer-readable storage medium or any combination of the above two. The computer-readable storage medium can be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device or device, or any combination of the above. More specific examples of computer-readable storage media may include, but are not limited to, an electrical connection having one or more conductors, a portable computer disk, a hard disk, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination thereof. In this application, a computer-readable storage medium may be any tangible medium that contains or stores a program that can be used by or in conjunction with an instruction execution system, apparatus, or device. In this application, a computer-readable signal medium may include a data signal propagated in baseband or as part of a carrier wave, which carries computer-readable program code. Such a propagated data signal may take a variety of forms, including, but not limited to, electromagnetic signals, optical signals, or any suitable combination thereof. A computer-readable signal medium may also be any computer-readable medium other than a computer-readable storage medium that can transmit, propagate, or transfer a program for use by or in conjunction with an instruction execution system, apparatus, or device. The program code embodied on a computer-readable medium may be transmitted using any suitable medium, including, but not limited to, wireless, wire, optical cable, RF, etc., or any suitable combination thereof.

[0128] Computer program code for performing the operations of the present application may be written in one or more programming languages, or a combination thereof, including object-oriented programming languages ​​such as Java, Smalltalk, C++, and conventional procedural programming languages ​​such as "C" or similar programming languages. The program code may be executed entirely on the user's computer, partially on the user's computer, as a stand-alone software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In cases involving a remote computer, the remote computer may be connected to the user's computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or may be connected to an external computer (e.g., through the Internet using an Internet service provider).

[0129] The flow charts and block diagrams in the accompanying drawings illustrate the possible architecture, functions and operations of the systems, methods and computer program products according to various embodiments of the present application. In this regard, each box in the flow chart or block diagram can represent a module, program segment or a part of code, and the module, program segment or a part of code contains one or more executable instructions for realizing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the box can also occur in a different order than that marked in the accompanying drawings. For example, two boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, depending on the functions involved. It should also be noted that each box in the block diagram and / or flow chart, and the combination of the boxes in the block diagram and / or flow chart can be implemented by a dedicated hardware-based system that performs the specified function or operation, or can be implemented by a combination of dedicated hardware and computer instructions.

[0130] The terms "first", "second", etc. are used to distinguish similar objects, rather than to describe or indicate a particular order or sequence.

[0131] The term "comprise" or any other similar term is intended to cover non-exclusive inclusion such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed or inherent to such process, method, article, or apparatus.

[0132] Thus far, the technical solutions of the present application have been described in conjunction with the preferred embodiments shown in the accompanying drawings. However, it is readily understood by those skilled in the art that the scope of protection of the present application is obviously not limited to these specific embodiments. Without departing from the principles of the present application, those skilled in the art may make equivalent changes or substitutions to the relevant technical features, and the technical solutions after such changes or substitutions will fall within the scope of protection of the present application.

Claims

1. A chlorine gas flow control device, characterized in that: It includes an inflation pipeline, a vacuum pipeline, and a chlorine gas flow control pipeline, wherein the vacuum pipeline includes a vacuum generator, and the chlorine gas flow control pipeline includes a mass flow controller; The gas outlet of the gas charging line is connected to the gas inlet of the mass flow controller, the gas charging line is used to fill the inert gas, the vacuum generator is used to perform a vacuum operation on the passage where the mass flow controller is located, and the mass flow controller is used to control the flow rate of chlorine gas; The chlorine flow control pipeline is provided with a shutoff valve for shutting off the mass flow controller; The inflation pipeline is provided with an inflation valve; A vacuum valve is provided on the vacuum pipeline, and the vacuum valve is used to start or stop the vacuum generator, wherein the vacuum valve includes a first vacuum valve and a second vacuum valve, the air inlet of the vacuum generator is connected to the gas supply equipment through the first vacuum valve, and the air exhaust port of the vacuum generator is connected to the air inlet of the mass flow controller through the second vacuum valve.

2. A chlorine gas flow control device according to claim 1, characterized in that: The gas inlets of the inflation pipeline and the vacuum pipeline are both connected to the gas supply equipment, wherein the gas supply equipment is used to provide inert gas.

3. A chlorine gas flow control device according to claim 1, characterized in that: A purifier is also installed on the chlorine flow control pipeline, wherein the gas outlet of the purifier is connected to the gas inlet of the mass flow controller through the shut-off valve, and the purifier is used to improve the purity of the chlorine in the chlorine flow control pipeline.

4. A chlorine gas flow control device according to claim 1, characterized in that: The vacuum generator includes an air inlet, a nozzle, a valve body, a diffusion pipe, an air extraction port and an air outlet, wherein the air outlet is connected to the exhaust gas removal system.

5. A chlorine gas flow control device according to claim 4, characterized in that: The gas outlet of the vacuum generator is used to discharge the gas sucked in by the vacuum generator, and the exhaust gas removal system is used to process the discharged gas.

6. A chlorine gas flow control method, using a chlorine gas flow control device according to any one of claims 1 to 5, characterized in that: The method comprises: In response to receiving activation signals of the inflation line and the vacuum line, closing the shutoff valve and opening the first vacuum valve; Opening the second vacuum valve and monitoring the vacuum pumping time of the vacuum generator; When the vacuuming time is greater than or equal to the first time threshold, closing the second vacuum valve and opening the inflation valve; When the inflation time is greater than or equal to a second time threshold, closing the inflation valve; When the number of times the second vacuum valve is opened is greater than or equal to a threshold number, opening the second vacuum valve to perform a final vacuum pumping on the channel where the mass flow controller is located; Sequentially close the second vacuum valve and the first vacuum valve; The shutoff valve was opened to allow chlorine gas to pass through the mass flow controller.

7. A chlorine gas flow control method according to claim 6, characterized in that: The method further comprises: When the number of times the second vacuum valve is opened is less than the number threshold, opening the second vacuum valve until the vacuuming time is greater than or equal to the first time threshold, and then closing the second vacuum valve; opening the inflation valve until the inflation time is greater than or equal to the second time threshold, and then closing the inflation valve; The number of times the second vacuum valve is opened is compared with the number threshold again until the number of times the second vacuum valve is opened is greater than or equal to the number threshold.

8. A chlorine gas flow control method according to claim 6, characterized in that: The method further comprises: monitoring a last vacuuming time of the channel where the mass flow controller is located; When the last vacuuming time is greater than or equal to a third time threshold, the second vacuum valve and the first vacuum valve are closed sequentially.

9. A chlorine gas flow control system, according to a chlorine gas flow control device according to any one of claims 1 to 5, characterized in that: include: Host computer, programmable logic controller, valve island box; The host computer is used to monitor the device and exchange data with the programmable logic controller; The programmable logic controller is used to control the solenoid valve in the valve island box, wherein the solenoid valve is used to control the opening and closing of each valve in the device; The programmable logic controller is further configured to receive chlorine flow rate data fed back by the mass flow controller and send the set chlorine flow rate to the mass flow controller.

10. A chlorine gas flow control system according to claim 9, characterized in that: The valve is a metal pneumatic diaphragm valve.

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