Vacuum coating equipment and coating method for preparing perovskite battery

Abstract

The invention relates to the technical field of vacuum coating, and discloses vacuum coating equipment for preparing a perovskite battery, which comprises a sheet inlet chamber, a pretreatment buffer chamber, a pretreatment transition chamber, a coating chamber, a second transition chamber, a second buffer chamber and a sheet outlet chamber which are connected in sequence, and transmission assemblies are arranged in the sheet feeding chamber, the pretreatment buffer chamber, the pretreatment transition chamber, the coating chamber, the second transition chamber, the second buffer chamber and the sheet discharging chamber. According to the invention, the substrate feeding chamber, the pretreatment buffer chamber, the pretreatment transition chamber, the film coating chamber, the second transition chamber, the second buffer chamber and the substrate discharging chamber are arranged in sequence, so that the film coating process of the perovskite battery can be completed at one time after the substrate is fed, and the preparation efficiency of the prior art is greatly improved.

Description

Technical Field

[0001] The present invention relates to the field of vacuum coating technology, and in particular to a vacuum coating device and a coating method for preparing a perovskite battery. Background Art

[0002] The structure of perovskite battery mainly includes the following key parts:

[0003] Transparent conductive substrate:

[0004] Typically made of materials such as fluorine-doped tin oxide (FTO) or indium-doped tin oxide (ITO), they have high light transmittance and good electrical conductivity. Their primary function is to introduce sunlight and collect the resulting current.

[0005] Electron transport layer:

[0006] Located between the transparent conductive substrate and the perovskite light-absorbing layer, its main function is to transport electrons.

[0007] Commonly used electron transport layer materials include titanium dioxide (TiO2), zinc oxide (ZnO), etc. These materials have good electron mobility and stability.

[0008] Perovskite light-absorbing layer:

[0009] This is the core part of perovskite solar cells, which is mainly composed of organic halide perovskite materials with ABX3 structure.

[0010] These materials have excellent photoelectric conversion properties and can effectively convert sunlight energy into electrical energy.

[0011] Hole transport layer:

[0012] Located between the perovskite light-absorbing layer and the metal electrode, its main function is to transport holes.

[0013] Commonly used hole transport layer materials include Spiro-OMeTAD, nickel oxide, etc. These materials can effectively extract and transport photogenerated holes, thereby improving the photoelectric conversion efficiency of the battery.

[0014] Metal electrodes:

[0015] This is the last step in the perovskite solar cell process, which is mainly responsible for transmitting charges and connecting to external circuits.

[0016] It is usually made by evaporating a layer of gold, silver or aluminum on the outside of the hole transport layer to improve the conductivity of the electrode.

[0017] These components work together to enable perovskite cells to efficiently absorb sunlight and convert it into electricity.

[0018] However, the inventors found that the current preparation of perovskite cells requires the collaboration of multiple devices, which is rather inconvenient. Summary of the Invention

[0019] The purpose of the present invention is to solve the problems existing in the prior art and to propose a vacuum coating device for preparing perovskite batteries.

[0020] In order to achieve the above object, the present invention adopts the following technical solutions:

[0021] A vacuum coating device for preparing perovskite cells, comprising a film feed chamber, a pretreatment buffer chamber, a pretreatment transition chamber, a coating chamber, a second transition chamber, a second buffer chamber, and a film discharge chamber connected in sequence, wherein the film feed chamber, the pretreatment buffer chamber, the pretreatment transition chamber, the coating chamber, the second transition chamber, the second buffer chamber, and the film discharge chamber are all provided with a transmission assembly;

[0022] Among them, the film input chamber, pretreatment buffer chamber, pretreatment transition chamber, coating chamber, second transition chamber, second buffer chamber and film output chamber are all connected through gate valves, and the other end of the film input chamber and the other end of the film output chamber are connected to the outside world through gate valves.

[0023] Preferably, the coating chamber includes several groups of coating chambers and buffer chambers connected in sequence, and a magnetron sputtering cathode is provided at the bottom of one part of the coating chambers, and magnetron sputtering is performed from bottom to top, and an evaporation source is provided at the bottom of another part of the coating chambers, and vapor deposition is performed from bottom to top.

[0024] Preferably, the film input chamber and the film output chamber are both connected to a first vacuum mechanical pump through a first valve. Valves are installed in the film input chamber and the film output chamber, and the first vacuum mechanical pump is connected to the film input chamber and the film output chamber. When the valve is closed, the first vacuum mechanical pump draws vacuum.

[0025] Preferably, the pretreatment buffer chamber, pretreatment transition chamber, buffer cavity, second transition chamber and second buffer chamber are all equipped with molecular pumps, and the other end of the molecular pump is connected to the second valve, and the other ends of several second valves are connected to the second vacuum mechanical pump.

[0026] Preferably, the transmission mechanism includes a plurality of transmission wheels, and the plurality of transmission wheels are driven to rotate by a rotary drive mechanism.

[0027] A coating method for preparing a perovskite battery, using a vacuum coating device for preparing a perovskite battery, comprising the following steps:

[0028] S1, open the front gate valve of the film feed chamber, the substrate enters the film feed chamber, then close the gate valve, and cooperate with the first vacuum mechanical pump to reach the vacuum degree;

[0029] S2, the gate valve at the front end of the pretreatment buffer chamber is opened, and the substrate enters the buffer chamber for pretreatment to improve the film quality;

[0030] S3, then the front gate valve of the pretreatment transition chamber is opened, and the substrate enters the pretreatment transition chamber under the transmission wheel and is vacuumed by the molecular pump to achieve vacuum balance with the coating chamber behind;

[0031] S4, the substrate enters the coating chamber under the transmission wheel transmission, and the transparent conductive substrate is subjected to magnetron sputtering coating. After the coating is completed, the substrate enters the next buffer chamber under the transmission wheel transmission, and then continues to enter the next coating chamber to perform magnetron sputtering coating of the electron transport layer. After the coating is completed, the substrate enters the next buffer chamber under the transmission wheel transmission, and then continues to enter the next coating chamber to perform evaporation of the perovskite light absorption layer.

[0032] S5, after the coating is completed, the substrate enters the next buffer chamber under the transmission wheel, and then continues to enter the next coating chamber for magnetron sputtering coating of the hole transport layer. After the coating is completed;

[0033] S6, the substrate enters the next buffer chamber under the transmission wheel, and then continues to enter the next coating chamber for evaporation of metal electrodes;

[0034] S7, after the coating is completed, the substrate passes through the second transition chamber, the second buffer chamber and the film discharge chamber in sequence to complete the film discharge.

[0035] Compared with the prior art, the present invention has the following beneficial effects:

[0036] The present invention arranges a film feeding chamber, a pretreatment buffer chamber, a pretreatment transition chamber, a coating chamber, a second transition chamber, a second buffer chamber and a film discharge chamber in sequence, and can complete the coating process of the perovskite cell at one time after the substrate is fed in, thereby greatly improving the preparation efficiency of the existing technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Figure 1 This is a schematic diagram of the composition of a vacuum coating device for preparing perovskite batteries proposed in the present invention;

[0038] Figure 2 This is a schematic diagram of the coating chamber of a vacuum coating equipment for preparing perovskite cells proposed in the present invention.

[0039] In the figure: 1. Film feeding chamber; 2. Pretreatment buffer chamber; 3. Pretreatment transition chamber; 4. Coating chamber; 5. Second transition chamber; 6. Second buffer chamber; 7. Film discharge chamber; 8. Coating chamber; 9. Buffer chamber; 10. Magnetron sputtering cathode; 11. Evaporation source; 12. First valve; 13. Second valve; 14. First vacuum mechanical pump; 15. Second vacuum mechanical pump; 16. Molecular pump; 17. Transmission wheel. DETAILED DESCRIPTION

[0040] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0041] Reference Figure 1 and Figure 2 A vacuum coating device for preparing perovskite cells includes a film feeding chamber 1, a pretreatment buffer chamber 2, a pretreatment transition chamber 3, a coating chamber 4, a second transition chamber 5, a second buffer chamber 6, and a film discharge chamber 7 connected in sequence, wherein the film feeding chamber 1, the pretreatment buffer chamber 2, the pretreatment transition chamber 3, the coating chamber 4, the second transition chamber 5, the second buffer chamber 6, and the film discharge chamber 7 are all provided with a transmission assembly;

[0042] Among them, the film input chamber 1, the pretreatment buffer chamber 2, the pretreatment transition chamber 3, the coating chamber 4, and the second transition chamber 5, the second buffer chamber 6 and the film output chamber 7 are all connected through gate valves, and the other end of the film input chamber 1 and the other end of the film output chamber 7 are connected to the outside world through gate valves.

[0043] In this embodiment, the coating chamber 4 includes several groups of coating chambers 8 and buffer chambers 9 connected in sequence, and a magnetron sputtering cathode 10 is provided at the bottom of one part of the coating chambers 8, and magnetron sputtering is performed from bottom to top, and an evaporation source 11 is provided at the bottom of another part of the coating chambers 8, and vapor deposition is performed from bottom to top.

[0044] In this embodiment, the film input chamber 1 and the film output chamber 7 are both connected to a first vacuum mechanical pump 14 via a first valve 12 .

[0045] In this embodiment, the pretreatment buffer chamber 2, pretreatment transition chamber 3, buffer cavity 9, second transition chamber 5, and second buffer chamber 6 are all equipped with a molecular pump 16, and the other end of the molecular pump 16 is connected to the second valve 13, and the other ends of several second valves 13 are connected to the second vacuum mechanical pump 15.

[0046] In this embodiment, the transmission mechanism includes a plurality of transmission wheels 17 , and the plurality of transmission wheels 17 are driven to rotate by a rotary drive mechanism.

[0047] In the existing technology, perovskite cells are structurally composed of multiple functional thin films stacked together, and their preparation method is to stack thin films layer by layer on a substrate. In the whole process, the preparation of three thin films (hole transport layer HTL, perovskite layer, electron transport layer ETL) is the most critical, with plating, coating, and laser etching as the core links, and coating equipment (PVD, RPD), laser equipment and coaters as the core equipment.

[0048] Taking the inverted planar structure as an example, the process flow is: preparation of conductive transparent glass - laser P1 etching - preparation of the first transmission layer film - annealing / drying - preparation of the perovskite layer film - annealing and drying - preparation of the second transmission layer film - annealing / drying - laser P2 etching - preparation of the bottom electrode (back electrode) - laser P3 etching - laser edge cleaning - testing, sorting and packaging.

[0049] The existing functional layer coating equipment is a separate device, which is debugged separately, and the sample flow and comprehensive debugging are complicated. The present invention integrates the preparation of each functional layer into one device. By arranging the film feeding chamber 1, pretreatment buffer chamber 2, pretreatment transition chamber 3, coating chamber 4, second transition chamber 5, second buffer chamber 6 and film discharge chamber 7 in sequence, the coating process of the perovskite battery can be completed at one time after the substrate is fed in, which greatly improves the preparation efficiency of the existing technology.

[0050] In addition, it should be noted that, in this embodiment, when the pump body acts on more than one cavity, multiple valves can be connected respectively through multiple pipelines to enable a single pump body to act on multiple chambers.

[0051] A method for preparing a perovskite battery, using a vacuum coating device for preparing a perovskite battery, comprises the following steps:

[0052] S1, open the gate valve at the front end of the film feed chamber 1, and the substrate enters the film feed chamber 1, then close the gate valve and cooperate with the first vacuum mechanical pump 14 to reach the vacuum degree;

[0053] S2, the front gate valve of pretreatment buffer chamber 2 is opened, and the substrate enters the buffer chamber for pretreatment to improve the film quality;

[0054] S3, then the front gate valve of the pretreatment transition chamber 3 is opened, and the substrate enters the pretreatment transition chamber 3 under the transmission wheel 17 and is evacuated by the molecular pump 16 to achieve vacuum balance with the coating chamber 8 behind;

[0055] S4, the substrate enters the coating chamber 8 under the transmission wheel 17 for magnetron sputtering coating of the transparent conductive substrate. After the coating is completed, the substrate enters the next buffer chamber 9 under the transmission wheel 17, and then continues to enter the next coating chamber 8 for magnetron sputtering coating of the electron transport layer. After the coating is completed, the substrate enters the next buffer chamber 9 under the transmission wheel 17, and then continues to enter the next coating chamber 8 for evaporation of the perovskite light absorbing layer.

[0056] S5, after the coating is completed, the substrate enters the next buffer chamber 9 under the transmission wheel 17, and then continues to enter the next coating chamber 8 for magnetron sputtering coating of the hole transport layer. After the coating is completed;

[0057] S6, the substrate enters the next buffer chamber 9 under the transmission wheel 17, and then continues to enter the next coating chamber 8 for evaporation of metal electrodes;

[0058] S7, after the coating is completed, the substrate passes through the second transition chamber 5, the second buffer chamber 6 and the film discharge chamber 7 in sequence to complete the film discharge.

[0059] The above description is only a preferred specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field, within the technical scope disclosed by the present invention, who makes equivalent replacements or changes based on the technical solution and inventive concept of the present invention, should be covered by the scope of protection of the present invention.

Claims

1. A vacuum coating device for preparing perovskite cells, characterized by: It includes a film feeding chamber, a pretreatment buffer chamber, a pretreatment transition chamber, a coating chamber, a second transition chamber, a second buffer chamber and a film discharge chamber connected in sequence, wherein the film feeding chamber, the pretreatment buffer chamber, the pretreatment transition chamber, the coating chamber, the second transition chamber, the second buffer chamber and the film discharge chamber are all provided with a transmission assembly; Among them, the film input chamber, pretreatment buffer chamber, pretreatment transition chamber, coating chamber, second transition chamber, second buffer chamber and film output chamber are all connected through gate valves, and the other end of the film input chamber and the other end of the film output chamber are connected to the outside world through gate valves.

2. The vacuum coating device for preparing a perovskite battery according to claim 1, characterized in that: The coating chamber includes several groups of coating chambers and buffer chambers connected in sequence, and a magnetron sputtering cathode is set at the bottom of one part of the coating chambers, and magnetron sputtering is performed from bottom to top, and an evaporation source is set at the bottom of another part of the coating chambers, and vapor deposition is performed from bottom to top.

3. The vacuum coating device for preparing a perovskite battery according to claim 1, characterized in that: The film input chamber and the film output chamber are both connected to the first vacuum mechanical pump through the first valve. The film input chamber and the film output chamber are both installed with the first valve. The first vacuum mechanical pump is connected to the film input chamber and the film output chamber. When the first valve is closed, the first vacuum mechanical pump draws vacuum.

4. The vacuum coating device for preparing a perovskite battery according to claim 2, characterized in that: The pretreatment buffer chamber, pretreatment transition chamber, buffer cavity, second transition chamber and second buffer chamber are all equipped with molecular pumps, and the other end of the molecular pump is connected to the second valve, and the other ends of several second valves are connected to the second vacuum mechanical pump.

5. The vacuum coating device for preparing a perovskite battery according to claim 1, characterized in that: The transmission mechanism includes a plurality of transmission wheels, and the plurality of transmission wheels are driven to rotate by a rotary drive mechanism.

6. A coating method for preparing a perovskite battery, using the vacuum coating equipment for preparing a perovskite battery according to any one of claims 1 to 5, characterized in that: The following steps are involved: S1, open the front gate valve of the film feed chamber, the substrate enters the film feed chamber, then close the gate valve, and cooperate with the first vacuum mechanical pump to reach the vacuum degree; S2, the gate valve at the front end of the pretreatment buffer chamber is opened, and the substrate enters the buffer chamber for pretreatment to improve the film quality; S3, then the front gate valve of the pretreatment transition chamber is opened, and the substrate enters the pretreatment transition chamber under the transmission wheel and is vacuumed by the molecular pump to achieve vacuum balance with the coating chamber behind; S4, the substrate enters the coating chamber under the transmission wheel transmission, and the transparent conductive substrate is subjected to magnetron sputtering coating. After the coating is completed, the substrate enters the next buffer chamber under the transmission wheel transmission, and then continues to enter the next coating chamber to perform magnetron sputtering coating of the electron transport layer. After the coating is completed, the substrate enters the next buffer chamber under the transmission wheel transmission, and then continues to enter the next coating chamber to perform evaporation of the perovskite light absorption layer. S5, after the coating is completed, the substrate enters the next buffer chamber under the transmission wheel, and then continues to enter the next coating chamber for magnetron sputtering coating of the hole transport layer. After the coating is completed; S6, the substrate enters the next buffer chamber under the transmission wheel, and then continues to enter the next coating chamber for evaporation of metal electrodes; S7, after the coating is completed, the substrate passes through the second transition chamber, the second buffer chamber and the film discharge chamber in sequence to complete the film discharge.

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