Omnibearing magnetron sputtering device and method for glass coating

Abstract

The invention discloses an omnibearing magnetron sputtering device and method for glass coating, and the method comprises the following steps: resetting a first driving motor and a pushing assembly, adjusting a substrate clamping assembly to move to an initial position, and clamping a glass substrate in the substrate clamping assembly; a first driving motor is driven to work, the glass substrate is driven to do a single swing process, one-time turning-over work of the glass substrate is completed in the single swing process, and the same position of the front face and the back face of the glass substrate is coated with a film; pulling the glass substrate to move towards the magnetic control target system by utilizing a pushing assembly; the first driving motor is driven to continue to work, the glass substrate is driven to do a single reverse swing process, and one-time turning-over work of the glass substrate is completed in the single reverse swing process, so that the same position of the front face and the back face of the glass substrate is coated with a film; repeating the steps until the whole glass substrate is coated with the film in all directions; according to the scheme, all-directional sputter coating work of the glass substrate is achieved, and the coating efficiency of the glass substrate is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of magnetron coating, and in particular to an omnidirectional magnetron sputtering device and method for glass coating. Background Art

[0002] Magnetron sputtering is a physical vapor deposition technology that applies an electromagnetic field in a vacuum environment, causing argon ions to bombard the surface of a solid target. The sputtered target atoms are then deposited onto the workpiece, forming a thin film. The core process involves establishing a vacuum environment, generating a plasma, sputtering target atoms, and then depositing them onto the substrate. It boasts controllable coating thickness and minimizes substrate temperature rise.

[0003] The process of magnetron sputtering coating is divided into five stages: vacuum chamber is pumped to 10 -3 After the target reaches the Pa level, argon gas is introduced, adjusting the pressure to 0.1-10 Pa. A voltage of 400-1000V is applied to ignite the plasma, causing argon ions to bombard the target, generating a sputtering atomic stream. The atomic transmission path is optimized by adjusting the spacing of the magnetron targets (e.g., the threaded rod and moving block structure of patent CN222893236U). The substrate rotates and revolves around the target, driven by a planetary transmission mechanism, ensuring uniform film coverage.

[0004] However, most of the existing coating work on the substrate can only ensure uniform coating on a single side of the substrate, but cannot achieve full-scale uniform coating on both sides of the substrate. Summary of the Invention

[0005] The purpose of the present invention is to provide an all-round magnetron sputtering device and method for glass coating, so as to solve the technical problem that most of the existing technologies can only ensure uniform coating on a single side of the substrate, but cannot achieve all-round uniform coating on both sides of the substrate.

[0006] In order to solve the above technical problems, the present invention specifically provides the following technical solutions: An omnidirectional magnetron sputtering device for glass coating, comprising: A substrate clamping assembly is placed in the vacuum chamber and is used to fix the glass substrate. The substrate clamping assembly is located above the magnetron target system. The substrate clamping assembly is installed on a driving assembly. The driving assembly drives the glass substrate on the substrate clamping assembly to flip over during the swinging process so that the film layer is evenly covered on the front and back sides of the glass substrate. The driving assembly is connected to a pushing assembly. The pushing assembly is used to drive the glass substrate on the substrate clamping assembly to move closer to or away from the magnetron target system to coat the glass substrate in the longitudinal direction. The drive assembly includes a horizontal swing drive member and a rotation drive member, wherein the horizontal swing drive member includes a first drive motor and a linkage rod installed on the rotation shaft of the first drive motor, the linkage rod is connected to the substrate clamping assembly, and when the first drive motor rotates, the substrate clamping assembly is driven by the linkage rod to perform horizontal reciprocating swing around its installation position; The rotary drive member includes a driving gear arranged on the non-clamping side of the substrate clamping assembly, and a toothed plate meshing with the driving gear for transmission. During the reciprocating swinging process, the substrate clamping assembly is driven to flip around its installation position through the meshing of the driving gear and the toothed plate.

[0007] As a preferred embodiment of the present invention, the substrate clamping assembly includes a clamping plate and an extension column provided on one side of the clamping plate, wherein a vertical rod is provided on the outer cover of the extension column, and the extension column can rotate freely within a through hole of the vertical rod; The linkage connecting rod of the horizontal swing driving member is movably connected to the lower end of the vertical upright pole. When the first driving motor moves in a circular motion, it drives the clamping plate to swing back and forth in the horizontal direction around the installation position of the vertical upright pole through the linkage connecting rod.

[0008] As a preferred solution of the present invention, a side plate is provided on the outside of the vertical pole, and an outer enclosure plate is provided on the side of the side plate wrapped around the outside of the vertical pole; The vertical upright rod can rotate freely in the vertical hole groove of the outer enclosure plate.

[0009] As a preferred solution of the present invention, the driving gear is mounted at the end of the extension column, the tooth plate is arranged on the side of the outer enclosure plate, and the tooth plate is located below the driving gear; An arc-shaped track for the driving gear to move is formed on the upper surface of the tooth plate, and an arc-shaped rack is provided in the middle of the arc-shaped track. The arc-shaped rack divides the arc-shaped track into two translation sections. The center of the arc-shaped rack is located at the center of the vertical rod. When the driving gear moves in one of the translation sections of the arc-shaped track, the glass substrate can be coated in the width direction. When the driving gear is engaged with the arc-shaped rack, the glass substrate can be turned over, and the turned glass substrate can continue to move in the other translation section to coat the turned glass substrate in the width direction.

[0010] As a preferred solution of the present invention, at least one clamp is provided on the other side of the clamping plate, and the clamp is used to fix the end of the glass substrate so that the glass substrate is exposed to the sputtering range of the magnetron target system; When the glass substrate is transported to an initial position by the first driving motor, the magnetron target system is located close to a side edge of the glass substrate.

[0011] As a preferred solution of the present invention, the side plate is installed on the side of the first drive motor, the telescopic shaft of the pushing component is connected to the side plate, and the pushing component drives the entire driving component to move closer to or away from the magnetron target system through telescopic movement.

[0012] In addition, the present invention also provides an omnidirectional magnetron sputtering device method for glass coating, comprising the following steps: Step 100: Reset the first driving motor and the pushing assembly, adjust the substrate clamping assembly to move to the initial position, and clamp the glass substrate in the substrate clamping assembly; Step 200: driving the first drive motor to drive the glass substrate to perform a single swinging process, and completing a 180° flipping of the glass substrate once in the single swinging process, so as to perform film coating on the same position on the front and back sides of the glass substrate; Step 300: Using a pushing assembly to pull the glass substrate toward the magnetron target system; Step 400: driving the first drive motor to continue operating, driving the glass substrate to perform a single reverse swing process, and completing a 180° flip of the glass substrate once in the single reverse swing process, so as to perform film coating on the same position on the front and back sides of the glass substrate; Step 500: Repeat steps 300 to 400 until the entire glass substrate is fully coated.

[0013] As a preferred embodiment of the present invention, in step 200, when the first driving motor is driven to work for half a revolution, the glass substrate is driven to perform a single swinging process, and a 180° flipping operation of the glass substrate is completed once in the single swinging process; In step 400, when the first driving motor is driven to work for another half circle, the glass substrate is driven to perform a single reverse swing process, and a 180° flipping operation of the glass substrate is completed once in the single reverse swing process.

[0014] As a preferred solution of the present invention, in step 300, when the glass substrate is pulled toward the magnetron target system by the pushing component, the pulling step distance of the pushing component is the length direction dimension of the sputtering area formed by the magnetron target system on the glass substrate.

[0015] As a preferred solution of the present invention, when the substrate clamping assembly moves to the initial position, the magnetron target system forms a sputtering area on the side of the glass substrate.

[0016] Compared with the prior art, the present invention has the following beneficial effects: The present invention combines a horizontal swing drive member, a rotary drive member and a pushing assembly to complete the coating work on the entire front and back sides of the glass substrate, realizing omnidirectional sputtering coating work on the glass substrate. In the entire process, there is no need to manually flip the glass substrate, thereby improving the efficiency of coating the glass substrate. The operation is simple and easy to implement. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] To more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for the embodiments or the description of the prior art. Obviously, the drawings described below are merely exemplary, and those skilled in the art can derive other implementation drawings based on the provided drawings without inventive effort.

[0018] Figure 1 Schematic diagram of the overall structure of the omnidirectional sputtering device according to an embodiment of the present invention; Figure 2 Schematic diagram of the structure of a horizontal swing driving member according to an embodiment of the present invention; Figure 3 is a structural schematic diagram of a substrate clamping assembly according to an embodiment of the present invention; Figure 4 Schematic diagram of the process of the omnidirectional sputtering method according to an embodiment of the present invention; The numbers in the figure represent the following: 1-substrate clamping assembly; 2-magnetic control target system; 3-driving assembly; 4-pushing assembly; 5-side plate; 6-outer enclosure plate; 7-vertical hole slot; 8-clamp; 31- horizontal swing driving member; 32- rotation driving member; 311-first drive motor; 312-linking rod; 321-driving gear; 322-tooth plate; 323-arc track; 324-arc rack; 11- clamping plate; 12- extension column; 13- vertical pole; 14- through hole. DETAILED DESCRIPTION

[0019] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0020] like Figure 1 and Figure 2 As shown, the present invention provides an omnidirectional magnetron sputtering device for glass coating, including a substrate clamping assembly 1 placed in a vacuum chamber and used to fix a glass substrate, the substrate clamping assembly 1 is above a magnetron target system 2, and the substrate clamping assembly 1 is installed on a driving assembly 3. The driving assembly 3 drives the glass substrate on the substrate clamping assembly 1 to flip over during the swinging process so that the film layer is evenly covered on the front and back sides of the glass substrate, and the driving assembly 3 is connected to the pushing assembly 4. The pushing assembly 4 is used to drive the glass substrate on the substrate clamping assembly 1 to approach or move away from the magnetron target system 2 to coat the glass substrate in the length direction.

[0021] Among them, the driving component 3 includes a horizontal swing driving component 31 and a rotating driving component 32, wherein the horizontal swing driving component 31 includes a first driving motor 311, and a linkage link 312 installed on the rotating shaft of the first driving motor 311, the linkage link 312 is connected to the substrate clamping component 1, and when the first driving motor 311 rotates, the substrate clamping component 1 is driven to swing back and forth horizontally around its installation position through the linkage link 312.

[0022] The rotary drive member 32 includes a driving gear 321 arranged on the non-clamping side of the substrate clamping assembly 1, and a tooth plate 322 engaged with the driving gear 321 for transmission. During the reciprocating swinging process, the substrate clamping assembly 1 is driven to flip over around its installation position through the engagement between the driving gear 321 and the tooth plate 322.

[0023] This embodiment provides three types of driving components to ensure that the omnidirectional magnetron sputtering device can automatically achieve film coating operation, namely: a horizontal swing driving component 31, a rotating driving component 32 and a pushing component 4.

[0024] Among them, the horizontal swing drive 31 is used to drive the substrate clamping assembly 1 to swing back and forth horizontally around its installation position. When the horizontal swing drive 31 drives the entire glass to swing based on half a single stroke, it can realize the coating of a single arc segment on the upper surface of the entire glass substrate.

[0025] The rotating driving member 32 can flip the entire glass substrate 180° when the substrate clamping assembly 1 performs a one-way swing around its installation position, thereby performing a single arc segment coating operation on the upper surface of the glass substrate. Therefore, when the horizontal swing driving member 31 drives the substrate clamping assembly 1 to complete a one-way swing, it is possible to achieve coating operation on the front and back sides of a certain length position of the glass substrate.

[0026] After coating the front and back surfaces of a certain length position of the glass substrate, the entire substrate clamping assembly 1 is pulled toward the magnetron target system 2 by pushing the assembly 4 to achieve coating on the lower surface of another length position of the glass substrate. Combined with the horizontal swing drive 31 and the rotation drive 32, when the first drive motor 311 drives the substrate clamping assembly 1 to complete a reciprocating swing process, coating can be achieved on the front and back surfaces of the two positions of the glass substrate.

[0027] Therefore, this embodiment combines the horizontal swing drive member 31, the rotation drive member 32 and the pushing component 4 to complete the coating work on the entire front and back sides of the glass substrate, realizing all-round sputtering coating work on the glass substrate, and the entire process does not require manual flipping of the glass substrate, thereby improving the efficiency of coating the glass substrate, and the operation is simple and easy to implement.

[0028] like Figure 3 As shown, the substrate clamping assembly 1 includes a clamping plate 11 and an extension column 12 arranged on one side of the clamping plate 11. The extension column 12 is provided with a vertical rod 13 on its outer shell, and the extension column 12 can rotate freely in the through hole 14 of the vertical rod 13.

[0029] The linkage rod 312 of the horizontal swing driving member 31 is movably connected to the lower end of the vertical pole 13. When the first driving motor 311 moves in a circular motion, it drives the clamping plate 11 to swing back and forth in the horizontal direction around the installation position of the vertical pole 13 through the linkage rod 312.

[0030] At least one clamp 8 is provided on the other side of the clamping plate 11 . The clamp 8 is used to fix the end of the glass substrate so that the glass substrate is exposed to the sputtering range of the magnetron target system 2 .

[0031] When the glass substrate is transported to the initial position by the first driving motor 311 , the magnetron target system 2 is located close to the side of the glass substrate.

[0032] Among them, when the rotating shaft of the first drive motor 311 rotates one circle, it can drive the entire substrate clamping assembly 1 to complete a reciprocating swing operation through the linkage rod 312. Therefore, when the rotating shaft of the first drive motor 311 rotates half a circle, the substrate clamping assembly 1 completes a one-way swing, and during this one-way swing process, a 180° flip operation is completed by the rotating drive member 32, so that when the substrate clamping assembly 1 swings one way, the front and back surfaces of the glass substrate at the same arc position are coated.

[0033] When the rotating shaft of the first driving motor 311 continues to rotate half a circle, the substrate clamping assembly 1 completes a reverse one-way swing, and during the reverse one-way swing, a 180° flip operation is completed by rotating the driving member 32, so that when the substrate clamping assembly 1 swings in the reverse one-way, the front and back surfaces of the glass substrate are coated at the same arc position.

[0034] Therefore, if the thickness of a single coating of the magnetron target system 2 is relatively thin, the first drive motor 311 can be controlled to rotate at least one circle, thereby achieving at least two coating operations on the front and back sides of the glass substrate at the same arc position, ensuring that the thickness of a single coating of the magnetron target system 2 meets the standard.

[0035] like Figure 2 As shown, a side plate 5 is provided on the outside of the vertical pole 13 , and an outer enclosure plate 6 wrapped around the outside of the vertical pole 13 is provided on the side of the side plate 5 . The vertical pole 13 can rotate freely in the vertical hole 7 of the outer enclosure plate 6 .

[0036] The driving gear 321 is mounted on the end of the extension column 12 , and the tooth plate 322 is disposed on the side of the outer enclosure plate 6 , and the tooth plate 322 is located below the driving gear 321 .

[0037] An arc-shaped track 323 is formed on the upper surface of the tooth plate 322 for the driving gear 321 to move. An arc-shaped rack 324 is provided in the middle position of the arc-shaped track 323. The arc-shaped rack 324 divides the arc-shaped track 323 into two translation sections. The center of the arc-shaped rack 324 is located at the center position of the vertical pole 13. When the driving gear 321 moves in one of the translation sections of the arc-shaped track 323, the glass substrate can be coated in the width direction.

[0038] When the driving gear 321 is engaged with the arc-shaped rack 324 , the glass substrate can be turned over, and the turned glass substrate can continue to move in another translation section to perform coating on the width direction of the turned glass substrate.

[0039] The side plate 5 is installed on the side of the first drive motor 311 , and the telescopic shaft of the pushing component 4 is connected to the side plate 5 . The pushing component 4 drives the driving component 3 as a whole to move closer to or away from the magnetron target system 2 through telescopic movement.

[0040] When the vertical rod 13 is driven to rotate by the linkage link 312, when the driving gear 321 is driven to rotate to one of the translation sections, it is ensured that the upper surface or the lower surface of the glass substrate is coated at this time. When the driving gear 321 is driven to rotate to the arc rack 324 section, the driving gear 321 engages with the arc track 323 to flip the glass substrate, and when the driving gear 321 is driven to rotate to another translation section, the other surface of the glass substrate is coated.

[0041] Then the pushing assembly 4 is driven to work, pulling the side plate 5 close to the magnetron target system 2, and the stepping distance is the length of the sputtering area of ​​the magnetron target system 2, completing the full-scale coating work on the upper and lower surfaces of another position of the glass substrate.

[0042] In addition, Figure 4 As shown, the present invention also provides an omnidirectional magnetron sputtering device method for glass coating, comprising the following steps: Step 100: Reset the first driving motor and the pushing assembly, adjust the substrate clamping assembly to move to the initial position, and clamp the glass substrate in the substrate clamping assembly; Step 200: driving the first driving motor to drive the glass substrate to perform a single swinging process, and completing a 180° flipping of the glass substrate once in the single swinging process, so as to coat the same position on the front and back sides of the glass substrate; Step 300: Using a pushing assembly to pull the glass substrate toward the magnetron target system; Step 400: driving the first drive motor to continue operating, driving the glass substrate to perform a single reverse swing process, and completing a 180° flip of the glass substrate in the single reverse swing process, so as to perform coating on another identical position on the front and back sides of the glass substrate; Step 500: Repeat steps 300 to 400 until the entire glass substrate is fully coated.

[0043] In step 200, when the first driving motor is driven to work half a circle, the glass substrate is driven to perform a single swing process, and a 180° flipping operation of the glass substrate is completed once in the single swing process; In step 400, when the first driving motor is driven to work for another half circle, the glass substrate is driven to perform a single reverse swing process, and a 180° flipping operation of the glass substrate is completed once in the single reverse swing process.

[0044] In step 300, when the glass substrate is pulled toward the magnetron target system by the pushing assembly, the pulling step distance of the pushing assembly is the lengthwise dimension of the sputtering region formed on the glass substrate by the magnetron target system.

[0045] When the substrate clamping assembly moves to the initial position, the magnetron target system forms a sputtering area on the side of the glass substrate.

[0046] In this embodiment, an electromagnetic field is applied in a vacuum environment to cause argon ions to bombard the surface of a solid target material. The sputtered target atoms are deposited on a glass substrate to form a thin film. When the substrate clamping assembly moves to an initial position, the magnetron target system is regulated to operate, and a voltage of 400-1000V is applied to excite the plasma. The Ar+ ions generated by ionization bombard the target material (such as a tungsten target) under acceleration of the electric field, causing the target atoms to gain kinetic energy, escape, and be deposited on the surface of the glass substrate to form a film.

[0047] When the sputtering area size (such as length and width) of the tungsten target is smaller than the glass substrate, the first drive motor needs to rotate half a circle to drive the glass substrate to perform a unidirectional swing process, thereby realizing the coating work on both sides of the glass substrate.

[0048] When the first drive motor continues to rotate half a circle, it drives the glass substrate to perform a reverse unidirectional swing process. At this time, the coating work on the front and back sides of the glass substrate is realized. Assuming that the glass substrate only needs to be coated twice, the next step is to use the pushing component to pull the glass substrate toward the magnetron target system until the moving distance is the sputtering area coverage length of the tungsten target.

[0049] Repeat the driving operation of the first driving motor until the coating operation is performed on both sides of the glass substrate at the next position, and so on until the coating operation is performed on both sides of the entire glass substrate.

[0050] This embodiment combines a horizontal swing drive, a rotation drive and a pushing assembly to complete the coating work on the entire front and back sides of the glass substrate, realizing all-round sputtering coating of the glass substrate, and the entire process does not require manual flipping of the glass substrate, thereby improving the efficiency of coating the glass substrate, and the operation is simple and easy to implement.

[0051] The above embodiments are merely exemplary embodiments of the present application and are not intended to limit the scope of the present application. The scope of protection of the present application is defined by the claims. Those skilled in the art may make various modifications or equivalent substitutions to the present application within the essence and scope of protection of the present application, and such modifications or equivalent substitutions shall also be deemed to fall within the scope of protection of the present application.

Claims

1. An omnidirectional magnetron sputtering device for glass coating, characterized in that: include: A substrate clamping assembly (1) is placed in a vacuum chamber and is used to fix a glass substrate. The substrate clamping assembly (1) is located above a magnetron target system (2). The substrate clamping assembly (1) is mounted on a driving assembly (3). The driving assembly (3) drives the glass substrate on the substrate clamping assembly (1) to flip over during the swinging process so that the film layer is evenly covered on both the front and back sides of the glass substrate. The driving assembly (3) is connected to a pushing assembly (4). The pushing assembly (4) is used to drive the glass substrate on the substrate clamping assembly (1) to move closer to or away from the magnetron target system (2) so as to coat the glass substrate in the longitudinal direction. The drive assembly (3) includes a horizontal swing drive member (31) and a rotation drive member (32), wherein the horizontal swing drive member (31) includes a first drive motor (311) and a linkage link (312) mounted on a rotation axis of the first drive motor (311), wherein the linkage link (312) is connected to the substrate clamping assembly (1), and when the first drive motor (311) rotates, the linkage link (312) drives the substrate clamping assembly (1) to perform a horizontal reciprocating swing around its installation position; The rotary drive member (32) comprises a driving gear (321) arranged on the non-clamping side of the substrate clamping assembly (1), and a toothed plate (322) meshing with the driving gear (321) for transmission. During the reciprocating swinging process, the substrate clamping assembly (1) is driven to flip around its installation position by the meshing of the driving gear (321) and the toothed plate (322).

2. The omnidirectional magnetron sputtering device for glass coating according to claim 1, characterized in that: The substrate clamping assembly (1) comprises a clamping plate (11), and an extension column (12) arranged on one side of the clamping plate (11), wherein a vertical upright rod (13) is provided on the outer shell of the extension column (12), and the extension column (12) can freely rotate in a through hole (14) of the vertical upright rod (13); The linkage link (312) of the horizontal swing driving member (31) is movably connected to the lower end of the vertical upright pole (13). When the first driving motor (311) moves in a circular motion, the linkage link (312) drives the clamping plate (11) to swing back and forth in the horizontal direction around the installation position of the vertical upright pole (13).

3. The omnidirectional magnetron sputtering device for glass coating according to claim 2, characterized in that: A side plate (5) is provided on the outside of the vertical pole (13), and an outer enclosure plate (6) wrapped around the outside of the vertical pole (13) is provided on the side of the side plate (5); The vertical upright rod (13) can rotate freely in the vertical hole groove (7) of the outer enclosure plate (6).

4. The omnidirectional magnetron sputtering device for glass coating according to claim 3, characterized in that: The driving gear (321) is mounted on the end of the extension column (12), the tooth plate (322) is arranged on the side of the outer enclosure plate (6), and the tooth plate (322) is located below the driving gear (321); An arc-shaped track (323) for the driving gear (321) to move is formed on the upper surface of the tooth plate (322); an arc-shaped rack (324) is provided in the middle of the arc-shaped track (323); the arc-shaped rack (324) divides the arc-shaped track (323) into two translation sections; the center of the arc-shaped rack (324) is located at the center of the vertical pole (13); when the driving gear (321) moves in one of the translation sections of the arc-shaped track (323), the glass substrate can be coated in the width direction; When the driving gear (321) is engaged with the arc-shaped rack (324), the glass substrate can be flipped, and the flipped glass substrate can continue to move in the other translation section to coat the flipped glass substrate in the width direction.

5. The omnidirectional magnetron sputtering device for glass coating according to claim 2, characterized in that: At least one clamp (8) is provided on the other side of the clamping plate (11), and the clamp (8) is used to fix the end of the glass substrate so that the glass substrate is exposed within the sputtering range of the magnetron target system (2); When the glass substrate is transported to an initial position by the first driving motor (311), the magnetron target system (2) is located close to the side of the glass substrate.

6. The omnidirectional magnetron sputtering device for glass coating according to claim 3, characterized in that: The side plate (5) is mounted on the side of the first drive motor (311), the telescopic shaft of the pushing component (4) is connected to the side plate (5), and the pushing component (4) drives the driving component (3) as a whole to move closer to or away from the magnetron target system (2) through telescopic movement.

7. A method for omnidirectional magnetron sputtering of glass coating, characterized in that: An omnidirectional magnetron sputtering device for glass coating according to any one of claims 1 to 6 comprises the following steps: Step 100: Reset the first driving motor and the pushing assembly, adjust the substrate clamping assembly to move to the initial position, and clamp the glass substrate in the substrate clamping assembly; Step 200: driving the first drive motor to drive the glass substrate to perform a single swinging process, and completing a 180° flipping of the glass substrate once in the single swinging process, so as to perform film coating on the same position on the front and back sides of the glass substrate; Step 300: Using a pushing assembly to pull the glass substrate toward the magnetron target system; Step 400: driving the first drive motor to continue operating, driving the glass substrate to perform a single reverse swing process, and completing a 180° flip of the glass substrate once in the single reverse swing process, so as to perform film coating on the same position on the front and back sides of the glass substrate; Step 500: Repeat steps 300 to 400 until the entire glass substrate is fully coated.

8. The omnidirectional magnetron sputtering device method for glass coating according to claim 7, characterized in that: In step 200, when the first driving motor is driven to work for half a circle, the glass substrate is driven to perform a single swing process, and a 180° flipping operation of the glass substrate is completed once in the single swing process; In step 400, when the first driving motor is driven to work for another half circle, the glass substrate is driven to perform a single reverse swing process, and a 180° flipping operation of the glass substrate is completed once in the single reverse swing process.

9. The omnidirectional magnetron sputtering device method for glass coating according to claim 7, characterized in that: In step 300, when the glass substrate is pulled toward the magnetron target system by the pushing assembly, the pulling step distance of the pushing assembly is the lengthwise dimension of the sputtering region formed by the magnetron target system on the glass substrate.

10. The omnidirectional magnetron sputtering device for glass coating according to claim 7, characterized in that: When the substrate clamping assembly moves to the initial position, the magnetron target system forms a sputtering area on the side of the glass substrate.

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