PH detection sampling device for polishing solution processing

Abstract

The invention relates to the technical field of polishing solutions, and discloses a PH detection sampling device for polishing solution processing, which comprises a reaction kettle, a temperature adjusting assembly is arranged on the surface of the reaction kettle, a liquid storage cylinder is welded at the center of the top of the reaction kettle, a through hole is formed in the top of the reaction kettle in a penetrating manner, and the reaction kettle is communicated with the liquid storage cylinder through the through hole. A stirring assembly is arranged at the axis of the reaction kettle and the liquid storage cylinder, a liquid dropping assembly is arranged at the top of the liquid storage cylinder in a penetrating manner, and a circulating liquid transferring assembly is arranged at the top of the liquid storage cylinder. In the rotating process of a third bevel gear, a rotating disc is driven to rotate, a V-shaped boss extrudes a rubber hose and sweeps the rubber hose, negative pressure is formed in a vertical pipe, reaction liquid in a liquid storage barrel penetrates through the vertical pipe, the rubber hose and a liquid dropping head, and part of the reaction liquid discharged from the bottom end of the liquid dropping head enters the storage barrel; therefore, the reaction liquid in the storage cylinder can be sucked through the suction pipe for sampling, and the purpose of convenient sampling is achieved.

Description

Technical Field

[0001] The invention relates to the technical field of polishing liquid, in particular to a pH detection sampling device for polishing liquid processing. Background Art

[0002] Silicon wafer polishing slurry is a key consumable in the chemical mechanical polishing (CMP) process in semiconductor manufacturing. It is primarily used to remove microscopic irregularities and impurities from the wafer surface, providing a flat surface for the chip's multilayer wiring. During the polishing process, the pH of the slurry must be strictly controlled. For example, semiconductor fine polishing requires a pH of approximately 9.5, while aluminum nitride polishing slurry is weakly alkaline (pH 7.1–8.5).

[0003] Because the polishing liquid contains particulate matter, it is necessary to immediately sample and test the pH value of the polishing liquid after stirring and homogenizing it. Furthermore, the testing time after sampling the polishing liquid is short, so testing needs to be performed as soon as possible after sampling. This requires testers to ensure high sampling and testing efficiency during the sampling process. In addition, when a large number of samples need to be collected, testers frequently sample and test, which is cumbersome and can be further improved. Summary of the Invention

[0004] (1) Technical problems solved

[0005] In view of the shortcomings of the existing technology, the present invention provides a pH detection sampling device for polishing liquid processing, which has the advantages of convenient sampling when monitoring the pH of the reaction liquid, and solves the problem of inconvenient sampling operation when detecting the pH of the reaction liquid multiple times.

[0006] (2) Technical solution

[0007] In order to facilitate sampling when monitoring the pH of the reaction liquid, the present invention provides the following technical solution: a pH detection sampling device for polishing liquid processing, comprising a reactor, a temperature regulating component provided on the surface of the reactor, a liquid storage cylinder welded at the center of the top of the reactor, a through hole penetrated through the top of the reactor, the reactor is connected to the liquid storage cylinder through the through hole, a stirring component is provided at the axis of the reactor and the liquid storage cylinder, a dripping component is provided through the top of the liquid storage cylinder, and a circulating pipetting component is provided on the top of the liquid storage cylinder.

[0008] Preferably, a feeding port is fixedly installed on the top of the reactor, a sealing cover is provided on the top of the feeding port, a discharge port is provided at the bottom of the reactor, and a switch valve is provided on the discharge port.

[0009] Preferably, the stirring assembly includes a motor base welded to the top of the reactor, a driving motor is fixedly mounted on the top of the motor base, a driving shaft is fixedly mounted on the bottom output end of the driving motor, the driving shaft is arranged along the axis of the reactor and the liquid storage cylinder, and a U-shaped rod is fixed in an array on the surface of the driving shaft located inside the reactor, and stirring blades are fixed in an array on the U-shaped rod.

[0010] Preferably, the driving shaft includes an inner core rod fixedly mounted on the bottom output end of the driving motor, a hollow shaft is sleeved on the outer side of the inner core rod, both ends of the hollow shaft are sealed, and the inner core rod is rotatably connected to the center of the top end of the hollow shaft; a bevel gear 1 is fixedly mounted on the surface of the inner core rod, a bevel gear 2 is fixedly mounted on the top of the hollow shaft, a bevel gear 3 is meshed between the bevel gear 1 and the bevel gear 2, and a spiral blade is fixedly mounted on the surface of the inner core rod located inside the hollow shaft; a liquid inlet hole is penetrated by an array on the side surface of the bottom end of the hollow shaft, and the hollow shaft is connected to the reactor through the liquid inlet hole, and a liquid outlet hole is penetrated by an array on the side surface of the top end of the hollow shaft, and the hollow shaft is connected to the liquid storage cylinder through the liquid outlet hole.

[0011] Preferably, the drip assembly includes a support cover fixedly mounted on the top of the liquid storage cylinder, the upper half of the support cover is semicircular, a vertical pipe is fixed through the liquid storage cylinder, the top of the vertical pipe is connected to a rubber hose, the rubber hose is fixedly mounted on the inner wall of the upper half of the support cover, and the other end of the rubber hose is connected to a drip head; a turntable is rotatably connected to the center of the upper half of the support cover, and V-shaped bosses are arranged in an array on the circumferential surface of the turntable, and the turntable is coaxially fixed to the bevel gear.

[0012] Preferably, the circulating pipetting assembly includes an arch frame fixedly mounted on the output end of the driving motor, a rotating ring fixedly mounted on the bottom end of the arch frame, a storage cylinder is fixedly mounted on the array on the rotating ring, the storage cylinder is located directly below the bottom end of the drip head, a sealing valve is provided in the bottom end of each storage cylinder, an avoidance groove is provided through the array on the rotating ring, and the storage cylinder and the avoidance groove are distributed at intervals; an inner support ring and an outer support ring are fixedly mounted on the top of the liquid storage cylinder, a support ring is fixedly mounted between the inner support ring and the outer support ring, a lower recess is provided on the right side of the support ring, the middle of the lower recess is horizontal, and the two ends are inclined; a reflux groove is provided through the middle of the lower recess and the top of the liquid storage cylinder, and the storage cylinder is located directly above the reflux groove.

[0013] Preferably, the tops of the inner support ring and the outer support ring are both higher than the top of the support ring, and the middle of the lower recess is fixedly mounted on the top of the liquid storage cylinder.

[0014] Preferably, the sealing valve includes an embedded ring and a hollow plate fixedly mounted on the inner wall of the storage tube, the embedded ring is located above the hollow plate, and a plurality of water leakage holes are penetrated on the hollow plate and the bottom of the storage tube, a sliding column is penetrated and slidably connected at the center of the hollow plate, and the sliding column is penetrated and slidably connected to the bottom of the storage tube, and an embedded block is fixedly mounted on the top of the sliding column, and the embedded block is inserted in the embedded ring and seals the embedded ring; an annular flange is fixedly mounted on the surface of the sliding column, and the annular flange is located between the hollow plate and the bottom wall of the storage tube, and a spring is sleeved on the outside of the sliding column, and both ends of the spring are respectively fixedly mounted on the bottom of the hollow plate and the top of the annular flange.

[0015] Preferably, a mounting plate is fixedly installed on the top of the liquid storage cylinder, the cross-section of the mounting plate is an inverted L-shaped, the horizontal part of the mounting plate fits on the top of the storage cylinder, and an air blowing pipe is connected to the top of the mounting plate, and the air blowing pipe passes through the top and right side of the liquid storage cylinder.

[0016] Preferably, the temperature regulating assembly includes a covering tube fixedly mounted on the outside of the reactor, the bottom of the covering tube is connected to a water inlet pipe, the top of the covering tube is connected to a water outlet pipe, and spacer rings are arranged in a vertical array between the inner wall of the covering tube and the outer wall of the reactor, each of the spacer rings is penetrated by a guide hole, and the guide holes on two adjacent spacer rings are staggered with each other, and a heater is penetrated on the side of the bottom of the reactor.

[0017] (3) Beneficial effects

[0018] Compared with the prior art, the present invention provides a pH detection sampling device for polishing liquid processing, which has the following beneficial effects:

[0019] 1. The pH detection sampling device for polishing liquid processing drives the inner core rod to rotate through a driving motor. Through the transmission action of bevel gear three, bevel gear one and bevel gear two rotate in opposite directions, thereby causing the inner core rod and hollow shaft to rotate in opposite directions. The hollow shaft drives the U-shaped rod and stirring blades to rotate, stirring the reaction liquid inside the reactor; through the rotation of the inner core rod and spiral blades relative to the hollow shaft, the reaction liquid enters the interior of the hollow shaft through the liquid inlet hole, and the spiral blades then transport the reaction liquid upward. Finally, the reaction liquid passes through the liquid outlet hole and enters the interior of the liquid storage cylinder. The reaction liquid is temporarily stored in the liquid storage cylinder and refluxes to the interior of the reactor through the through hole, thereby transferring the reaction liquid from the bottom layer to the top layer, enhancing the mixing effect of the reaction liquid;

[0020] 2. The pH detection sampling device for polishing liquid processing drives the turntable to rotate during the rotation of the bevel gear 3. The V-shaped boss squeezes the rubber hose and sweeps across the rubber hose, causing negative pressure inside the vertical tube. The reaction liquid inside the liquid storage cylinder passes through the vertical tube, the rubber hose and the dripping head. Part of the reaction liquid discharged from the bottom of the dripping head enters the storage cylinder, so that the reaction liquid inside the storage cylinder can be sucked into the storage cylinder through a straw for sampling, thereby facilitating sampling. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention; Figure 2 This is a schematic diagram of the three-dimensional structure of the temperature adjustment component of the present invention; Figure 3 This is a schematic diagram of the three-dimensional cross-section structure of the present invention after removing the temperature adjustment component; Figure 4 This is a schematic diagram of the three-dimensional structure of the stirring assembly of the present invention; Figure 5 This is a schematic diagram of the main cross-sectional structure of the stirring assembly of the present invention; Figure 6 This is a schematic diagram of the three-dimensional structure of the drip assembly of the present invention; Figure 7 It is a schematic diagram of the three-dimensional structure of the circulating pipetting assembly of the present invention; Figure 8 This is a schematic diagram of the main cross-sectional structure of the storage tube of the present invention; Figure 9 It is a schematic diagram of the three-dimensional structure of the air blowing tube in the circulating pipetting assembly of the present invention.

[0022] In the figure: 100, reactor; 200, temperature regulating assembly; 300, liquid storage cylinder; 400, stirring assembly; 500, drip assembly; 600, circulating pipetting assembly; 101, feeding port; 102, sealing cover; 103, discharge port; 104, switch valve; 105, through hole; 201, coating cylinder; 202, water inlet pipe; 203, water outlet pipe; 204, spacer ring; 205, diversion hole; 206, heater; 401, motor base; 402, drive motor; 403, drive shaft; 404, U-shaped rod; 405, stirring blade; 4031, inner core rod; 4032, hollow shaft; 4033, bevel gear 1; 4034, bevel gear Gear 2; 4035, bevel gear 3; 4036, spiral blade; 4037, liquid inlet; 4038, liquid outlet; 501, support cover; 502, vertical pipe; 503, rubber hose; 504, drip head; 505, turntable; 506, V-shaped boss; 601, arch frame; 602, rotating ring; 603, storage cylinder; 604, avoidance groove; 605, inner support ring; 606, outer support ring; 607, support ring; 608, recessed portion; 609, reflux groove; 610, embedded ring; 611, hollow plate; 612, sliding column; 613, embedded block; 614, annular flange; 615, spring; 616, mounting plate; 617, air blow pipe. DETAILED DESCRIPTION

[0023] In the description of this application, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0025] See also Figure 1-Figure 3 A pH detection and sampling device for polishing liquid processing includes a reactor 100, a temperature adjustment component 200 is provided on the surface of the reactor 100, a liquid storage cylinder 300 is welded at the center of the top of the reactor 100, a through hole 105 is opened through the top of the reactor 100, the reactor 100 is connected with the liquid storage cylinder 300 through the through hole 105, a feeding port 101 is fixedly installed on the top of the reactor 100, a sealing cover 102 is provided on the top of the feeding port 101, a discharge port 103 is provided at the bottom of the reactor 100, and a switch valve 104 is provided on the discharge port 103.

[0026] See also Figure 1-Figure 3 A stirring assembly 400 is provided at the axis of the reactor 100 and the liquid storage cylinder 300. The stirring assembly 400 stirs the reaction liquid inside the reactor 100 and transports the reaction liquid inside the reactor 100 to the liquid storage cylinder 300. Then, the reaction liquid inside the liquid storage cylinder 300 flows back to the reactor 100 through the through hole 105.

[0027] See also Figure 1-Figure 3 The top of the liquid reservoir 300 is provided with a drip assembly 500, and a circulating pipette assembly 600 is provided on top of the liquid reservoir 300. The drip assembly 500 draws the liquid from the liquid reservoir 300 and drips it onto the circulating pipette assembly 600. The reaction liquid on the circulating pipette assembly 600 is then aspirated through a pipette, completing the sampling. The reaction liquid is then dropped onto a pH test paper through the pipette, completing a pH test.

[0028] In this embodiment, the silicon wafer polishing liquid includes the following components in percentage by weight: 75% silica sol, 1.2% sodium hydroxide, 1.8% piperazine, 1.5% sodium tetraborate, 2% sodium bicarbonate, 1.5% sodium lauryl polyoxyethylene ether sulfate, 0.5% polyether defoaming agent Silicon Harbor Chemical, and the balance is deionized water.

[0029] The preparation method of silica sol is as follows:

[0030] A composite surfactant consisting of 1 g of Tween-80 and 1 g of Span-20 was added to the interior of the reactor 100 and mixed with 500 ml of deionized water in the reactor 100. Then, 170 g of silicon tetrachloride was slowly added dropwise. The temperature during the addition of silicon tetrachloride was controlled at 0-5°C and the pH of the reaction solution was monitored at any time. Ammonia water was used to maintain the pH of the reaction solution at 3-4. After the addition was completed, the reaction solution was sealed. Then, by opening the switch valve 104, the reaction solution was transferred to the hydrothermal reactor through the discharge port 103, heated to 125°C for hydrothermal reaction for 10 hours, and then concentrated under reduced pressure until the solid content of the reaction solution reached 50%.

[0031] Production process of the above silicon wafer polishing liquid:

[0032] Add piperazine to the silica sol and mix well, then add sodium tetraborate and sodium bicarbonate, and continue stirring for 30 minutes to obtain a premixed solution. Add sodium hydroxide, sodium lauryl polyoxyethylene ether sulfate, and polyether defoamer into water and mix well, then add dropwise to the premixed solution, and stir for 30 minutes after the addition is completed.

[0033] See also Figure 2 The temperature regulating assembly 200 includes a covering tube 201 fixedly mounted on the outside of the reactor 100, a water inlet pipe 202 is connected to the bottom of the covering tube 201, a water outlet pipe 203 is connected to the top of the covering tube 201, and spacer rings 204 are arranged in an array along the vertical direction between the inner wall of the covering tube 201 and the outer wall of the reactor 100, and each spacer ring 204 is penetrated by a guide hole 205.

[0034] See also Figure 2 The guide holes 205 on two adjacent spacer rings 204 are staggered. When the room temperature is high, the coolant is transported to the interior of the coating tube 201 through the water inlet pipe 202. The separation effect of the multiple spacer rings 204, combined with the communication effect of the guide holes 205, prolongs the time the coolant flows inside the coating tube 201, cooling the reaction liquid inside the reactor 100 and maintaining the reaction liquid temperature between 0-5°C. A heater 206 is installed through the bottom side of the reactor 100. When the room temperature is low, the heater 206 heats the reaction liquid inside the reactor 100 and maintains the reaction liquid temperature between 0-5°C.

[0035] See also Figure 3-Figure 5The stirring assembly 400 includes a motor base 401 welded to the top of the reactor 100. A drive motor 402 is fixedly mounted on the top of the motor base 401. A drive shaft 403 is fixedly mounted on the output end of the bottom of the drive motor 402. The drive shaft 403 is arranged along the axis of the reactor 100 and the liquid storage cylinder 300. U-shaped rods 404 are fixed in an array on the surface of the drive shaft 403 located inside the reactor 100. Stirring blades 405 are fixed in an array on the U-shaped rods 404. The drive motor 402 drives the drive shaft 403 to rotate, so that the U-shaped rods 404 and stirring blades 405 stir the reaction liquid inside the reactor 100.

[0036] See also Figure 3-Figure 5 Drive shaft 403 includes an inner core rod 4031 fixedly mounted on the bottom output end of drive motor 402. A hollow shaft 4032 is sheathed around inner core rod 4031, sealed at both ends. Inner core rod 4031 extends through and rotatably connects to the center of the top end of hollow shaft 4032. A bevel gear 1 4033 is fixedly mounted on the surface of inner core rod 4031, while a bevel gear 2 4034 is fixedly mounted on the top of hollow shaft 4032. A bevel gear 3 4035 meshes between bevel gears 1 4033 and 2 4034. Driven by bevel gear 3 4035, bevel gears 1 4033 and 2 4034 rotate in opposite directions, thereby causing inner core rod 4031 and hollow shaft 4032 to rotate in opposite directions.

[0037] See also Figure 3-Figure 5 The inner core rod 4031 is located inside the hollow shaft 4032 and has spiral blades 4036 fixedly mounted on its surface. The bottom side of the hollow shaft 4032 is provided with an array of liquid inlet holes 4037, which connect the hollow shaft 4032 to the reactor 100 via the liquid inlet holes 4037. The top side of the hollow shaft 4032 is provided with an array of liquid outlet holes 4038, which connect the hollow shaft 4032 to the liquid storage cylinder 300 via the liquid outlet holes 4038. As the inner core rod 4031 and spiral blades 4036 rotate relative to the hollow shaft 4032, the reaction liquid enters the hollow shaft 4032 through the liquid inlet holes 4037. The spiral blades 4036 then transport the reaction liquid upward, and finally, the reaction liquid passes through the liquid outlet holes 4038 and enters the interior of the liquid storage cylinder 300. The reaction liquid is temporarily stored inside the liquid storage cylinder 300 and then flows back into the reactor 100 through the through hole 105, thereby transferring the reaction liquid from the bottom layer to the top layer, enhancing the mixing effect of the reaction liquid.

[0038] See also Figure 6The drip assembly 500 includes a support cover 501 fixedly mounted on the top of the liquid storage cylinder 300. The upper half of the support cover 501 is semicircular. A vertical tube 502 is fixedly mounted on the liquid storage cylinder 300. A gap is reserved between the bottom end of the vertical tube 502 and the top of the reactor 100, allowing the reaction liquid inside the liquid storage cylinder 300 to enter the vertical tube 502 through the gap. A rubber hose 503 is connected to the top of the vertical tube 502. The rubber hose 503 is fixedly mounted on the inner wall of the upper half of the support cover 501. Specifically, the rubber hose 503 can be fixed to the support cover 501 by bonding.

[0039] See also Figure 6 The other end of the rubber hose 503 is connected to a dripping head 504. A turntable 505 is rotatably connected to the center of the upper half of the support cover 501. V-shaped bosses 506 are arranged in an array on the circumference of the turntable 505. The turntable 505 is coaxially fixed to the bevel gear 4035. When the bevel gear 4035 rotates, it drives the turntable 505 to rotate synchronously. The V-shaped bosses 506 squeeze and sweep across the rubber hose 503, creating a negative pressure inside the vertical tube 502. This forces the reaction liquid inside the liquid reservoir 300 to pass through the vertical tube 502, the rubber hose 503, and the dripping head 504, and drip onto the circulating pipetting assembly 600.

[0040] See also Figure 7 The circulating pipetting assembly 600 includes an arch frame 601 fixedly mounted on the output end of the driving motor 402. A rotating ring 602 is fixedly mounted at the bottom end of the arch frame 601. When the driving motor 402 drives the inner core rod 4031 to rotate, the arch frame 601 is driven to rotate synchronously, thereby driving the rotating ring 602 to rotate. Storage cylinders 603 are fixedly arranged on the rotating ring 602. The storage cylinders 603 are located directly below the bottom end of the dripping head 504. A sealing valve is provided at the bottom end of each storage cylinder 603. Avoidance grooves 604 are arranged on the rotating ring 602. The storage cylinders 603 and the avoidance grooves 604 are spaced apart. Therefore, when the rotating ring 602 rotates, the reaction liquid dripping from the bottom end of the dripping head 504 enters the storage cylinders 603 and the avoidance grooves 604. The reaction liquid is temporarily stored in the storage cylinders 603, which facilitates sampling through a pipette.

[0041] See also Figure 7An inner support ring 605 and an outer support ring 606 are fixedly mounted on the top of the liquid storage cylinder 300. A support ring 607 is fixedly mounted between the inner support ring 605 and the outer support ring 606. A recess 608 is provided on the right side of the support ring 607. The middle portion of the recess 608 is horizontal, and the ends are inclined. When the rotating ring 602 rotates, the sealing valve of the storage cylinder 603 sweeps over the support ring 607. When the sealing valve slides against the top of the support ring 607, the sealing valve maintains a sealed state against the storage cylinder 603, allowing the reaction liquid to be stably stored inside the storage cylinder 603. When the sealing valve moves to the recess 608, the sealing valve is in an open state, and the reaction liquid inside the storage cylinder 603 drips onto the top of the recess 608. In addition, the reaction liquid dripped by the drip head 504 on the avoidance groove 604 drips onto the support ring 607, and finally the reaction liquid converges in the recess 608.

[0042] See also Figure 7 A reflux groove 609 extends through the middle of the lower recess 608 and the top of the liquid storage cylinder 300. The storage cylinder 603 is located directly above the reflux groove 609. The tops of the inner support ring 605 and the outer support ring 606 are both higher than the top of the support ring 607. The middle of the lower recess 608 is fixedly mounted on the top of the liquid storage cylinder 300. The reaction liquid at the top of the lower recess 608 then flows through the reflux groove 609 into the interior of the liquid storage cylinder 300.

[0043] See also Figure 8 The sealing valve includes an embedded ring 610 and a hollow plate 611 fixedly mounted on the inner wall of the storage tube 603. The embedded ring 610 is located above the hollow plate 611. A plurality of water leakage holes are formed on the hollow plate 611 and on the bottom of the storage tube 603. A sliding post 612 is slidably connected to the center of the hollow plate 611. The sliding post 612 is slidably connected to the bottom of the storage tube 603. An embedded block 613 is fixedly mounted on the top of the sliding post 612. The embedded block 613 is inserted into the embedded ring 610 and seals the embedded ring 610.

[0044] See also Figure 8 An annular flange 614 is fixedly mounted on the surface of the slide post 612, located between the hollow plate 611 and the bottom wall of the storage tube 603. A spring 615 is sleeved on the outside of the slide post 612, with its ends fixed to the bottom of the hollow plate 611 and the top of the annular flange 614, respectively. The elasticity of the spring 615 causes the slide post 612 and the insert 613 to move downward, separating the insert 613 from the slide post 612. When the storage tube 603 moves on top of the support ring 607, the support ring 607 presses the slide post 612 upward, causing the insert 613 to fit into the insert ring 610, allowing the reaction solution to be stored within the storage tube 603.

[0045] See also Figure 9A mounting plate 616 is fixedly mounted on the top of the liquid storage cylinder 300. The mounting plate 616 has an inverted L-shaped cross-section, and the horizontal portion of the mounting plate 616 fits against the top of the storage cylinder 603. An air blower 617 is connected to the top of the mounting plate 616, passing through the top and right side of the liquid storage cylinder 300. The other end of the air blower 617 is connected to a blower, which blows air into the storage cylinder 603 through the support ring 607, blowing any remaining reaction liquid in the storage cylinder 603 toward the lower recess 608.

[0046] During use, the inner core rod 4031 is driven by the drive motor 402, and the transmission action of the bevel gear 3 4035 causes the bevel gear 1 4033 and the bevel gear 2 4034 to rotate in opposite directions, thereby causing the inner core rod 4031 and the hollow shaft 4032 to rotate in opposite directions. The hollow shaft 4032 drives the U-shaped rod 404 and the stirring blade 405 to rotate, stirring the reaction liquid inside the reactor 100.

[0047] As the inner core rod 4031 and the spiral blade 4036 rotate relative to the hollow shaft 4032, the reaction liquid enters the hollow shaft 4032 through the liquid inlet hole 4037. The spiral blade 4036 then transports the reaction liquid upward. Finally, the reaction liquid passes through the liquid outlet hole 4038 and enters the interior of the liquid storage cylinder 300. The reaction liquid is temporarily stored in the liquid storage cylinder 300 and flows back into the interior of the reactor 100 through the through hole 105, thereby transferring the reaction liquid from the bottom layer to the top layer, thereby enhancing the mixing effect of the reaction liquid.

[0048] As bevel gear three 4035 rotates, it drives the turntable 505 to rotate, and the V-shaped boss 506 squeezes the rubber hose 503 and sweeps across the rubber hose 503, causing negative pressure inside the vertical tube 502. This causes the reaction liquid inside the liquid storage cylinder 300 to pass through the vertical tube 502, the rubber hose 503, and the dripping head 504. Part of the reaction liquid discharged from the bottom end of the dripping head 504 enters the storage cylinder 603, and the other part of the reaction liquid passes through the avoidance groove 604 and drips onto the top of the support ring 607. The reaction liquid then gathers in the lower recess 608 and then passes through the reflux groove 609 into the liquid storage cylinder 300.

[0049] During the rotation of the inner core rod 4031, the rotating ring 602 is driven to rotate by the arch frame 601, so that the storage tube 603 passes over the top of the support ring 607. When the storage tube 603 moves above the lower recess 608, the spring 615 elastically acts to move the slide post 612 and the insert 613 downward, separating the insert 613 from the insert ring 610. The reaction liquid in the storage tube 603 can pass through the insert ring 610, the hollow plate 611, and the bottom of the storage tube 603, and then drip onto the lower recess 608.

[0050] At the same time, the blower cooperates with the air blowing pipe 617 to blow air into the storage tube 603 to blow out the residual reaction liquid in the storage tube 603.

[0051] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A pH detection sampling device for polishing liquid processing, comprising a reactor (100), a liquid storage cylinder (300) welded at the center of the top of the reactor (100), a through hole (105) penetrating the top of the reactor (100), and the reactor (100) communicating with the liquid storage cylinder (300) through the through hole (105), characterized in that: The surface of the reactor (100) is provided with a temperature regulating assembly (200), the axis of the reactor (100) and the liquid storage cylinder (300) is provided with a stirring assembly (400), the top of the liquid storage cylinder (300) is provided with a drip assembly (500), and the top of the liquid storage cylinder (300) is provided with a circulating liquid transfer assembly (600); The stirring assembly (400) comprises a motor base (401) welded to the top of the reactor (100), a driving motor (402) is fixedly mounted on the top of the motor base (401), and a driving shaft (403) is fixedly mounted on the output end of the bottom of the driving motor (402); The driving shaft (403) includes an inner core rod (4031) fixedly mounted on the bottom output end of the driving motor (402), a hollow shaft (4032) is sleeved on the outer side of the inner core rod (4031), both ends of the hollow shaft (4032) are sealed, and the inner core rod (4031) is rotatably connected to the top center of the hollow shaft (4032); A bevel gear 1 (4033) is fixedly mounted on the surface of the inner core rod (4031), a bevel gear 2 (4034) is fixedly mounted on the top of the hollow shaft (4032), and a bevel gear 3 (4035) is meshed between the bevel gear 1 (4033) and the bevel gear 2 (4034); The drip assembly (500) comprises a support cover (501) fixedly mounted on the top of the liquid storage cylinder (300); the upper half of the support cover (501) is semicircular; a vertical tube (502) is fixedly passed through the liquid storage cylinder (300); the top end of the vertical tube (502) is connected to a rubber hose (503); the rubber hose (503) is fixedly mounted on the inner wall of the upper half of the support cover (501); the other end of the rubber hose (503) is connected to a drip head (504); A turntable (505) is rotatably connected to the center of the upper half of the support cover (501), and a V-shaped boss (506) is arranged in an array on the circumferential surface of the turntable (505). The turntable (505) is coaxially fixed to the bevel gear three (4035); The circulating pipetting assembly (600) includes an arch frame (601) fixedly mounted on the output end of the driving motor (402), a rotating ring (602) fixedly mounted on the bottom end of the arch frame (601), a storage cylinder (603) fixedly arranged in an array on the rotating ring (602), the storage cylinder (603) being located directly below the bottom end of the drip head (504), a sealing valve being provided in the bottom end of each storage cylinder (603), an avoidance groove (604) being provided in an array on the rotating ring (602), and the storage cylinder (603) and the avoidance groove (604) being distributed at intervals; An inner support ring (605) and an outer support ring (606) are fixedly installed on the top of the liquid storage cylinder (300), a support ring (607) is fixedly installed between the inner support ring (605) and the outer support ring (606), a lower concave portion (608) is provided on the right side of the support ring (607), and the middle portion of the lower concave portion (608) is horizontal and the two ends are inclined; A reflux groove (609) is provided through the middle of the lower recess (608) and the top of the liquid storage cylinder (300), and the storage cylinder (603) is located directly above the reflux groove (609).

2. The pH detection sampling device for polishing liquid processing according to claim 1, characterized in that: A feeding port (101) is fixedly installed on the top of the reactor (100), a sealing cover (102) is provided on the top of the feeding port (101), a discharge port (103) is provided at the bottom of the reactor (100), and a switch valve (104) is provided on the discharge port (103).

3. The pH detection sampling device for polishing liquid processing according to claim 1, characterized in that: The drive shaft (403) is arranged along the axis of the reactor (100) and the liquid storage cylinder (300). U-shaped rods (404) are fixed in an array on the surface of the drive shaft (403) located inside the reactor (100), and stirring blades (405) are fixed in an array on the U-shaped rods (404).

4. The pH detection sampling device for polishing liquid processing according to claim 1, characterized in that: The inner core rod (4031) is located inside the hollow shaft (4032) and has a spiral blade (4036) fixedly mounted on its surface; The bottom side array of the hollow shaft (4032) is penetrated by a liquid inlet hole (4037), and the hollow shaft (4032) is connected to the reaction kettle (100) through the liquid inlet hole (4037). The top side array of the hollow shaft (4032) is penetrated by a liquid outlet hole (4038), and the hollow shaft (4032) is connected to the liquid storage cylinder (300) through the liquid outlet hole (4038).

5. The pH detection sampling device for polishing liquid processing according to claim 1, characterized in that: The tops of the inner support ring (605) and the outer support ring (606) are both higher than the top of the support ring (607), and the middle of the lower recess (608) is fixedly mounted on the top of the liquid storage cylinder (300).

6. The pH detection sampling device for polishing liquid processing according to claim 1, characterized in that: The sealing valve comprises an embedded ring (610) and a hollow plate (611) fixedly mounted on the inner wall of the storage tube (603); the embedded ring (610) is located above the hollow plate (611); a plurality of water leakage holes are provided on the hollow plate (611) and on the bottom of the storage tube (603); a sliding column (612) is slidably connected through the center of the hollow plate (611); the sliding column (612) is slidably connected through the bottom of the storage tube (603); an embedded block (613) is fixedly mounted on the top of the sliding column (612); the embedded block (613) is plugged into the embedded ring (610) and seals the embedded ring (610); An annular flange (614) is fixedly mounted on the surface of the slide column (612), and the annular flange (614) is located between the hollow plate (611) and the bottom wall of the storage tube (603). A spring (615) is sleeved on the outer side of the slide column (612), and the two ends of the spring (615) are respectively fixedly mounted on the bottom of the hollow plate (611) and the top of the annular flange (614).

7. The pH detection sampling device for polishing liquid processing according to claim 1, characterized in that: A mounting plate (616) is fixedly mounted on the top of the liquid storage cylinder (300), and the cross section of the mounting plate (616) is in an inverted L-shape. The horizontal portion of the mounting plate (616) is attached to the top of the storage cylinder (603). An air blowing pipe (617) is connected to the top of the liquid storage cylinder (300), and the air blowing pipe (617) passes through the top of the liquid storage cylinder (300) and the right side of the liquid storage cylinder (300).

8. The pH detection sampling device for polishing liquid processing according to claim 1, characterized in that: The temperature regulating assembly (200) comprises a covering tube (201) fixedly mounted on the outside of the reactor (100); the bottom of the covering tube (201) is connected to a water inlet pipe (202); the top of the covering tube (201) is connected to a water outlet pipe (203); spacer rings (204) are arranged in an array along a vertical direction between the inner wall of the covering tube (201) and the outer wall of the reactor (100); each of the spacer rings (204) is provided with a guide hole (205); the guide holes (205) on two adjacent spacer rings (204) are staggered; and a heater (206) is provided on the side surface of the bottom of the reactor (100).

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