Preparation method for thinning multilayer tungsten disulfide nanosheet and application

The thinning of multilayer tungsten disulfide nanosheets by neutron irradiation solves the problems of low efficiency and property damage in the existing technology, and realizes efficient and pollution-free preparation of nanosheets, which are suitable for electronic devices, energy storage, catalytic degradation and other fields.

CN120614893APending Publication Date: 2025-09-09MIANYANG TEACHERS COLLEGE
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Patent Information

Application Number
CN202510760248.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-06-09
Publication Date
2025-09-09

AI Technical Summary

Technical Problem

Existing technologies have problems in the process of thinning WS2 nanosheets, such as low efficiency, easy breakage, uneven thickness, introduction of impurities and complex processes, making it difficult to precisely control the number of layers and maintain the intrinsic properties of the material.

Method used

Neutron irradiation is used to thin multilayer tungsten disulfide nanosheets. By controlling the total neutron injection and irradiation time, uniform thinning of the nanosheets is achieved, avoiding the use of toxic reagents and by-products, and retaining the physical and chemical properties of the nanosheets.

Benefits of technology

It achieves efficient and pollution-free nanosheet thinning, maintains the structural integrity and performance of the material, and is suitable for the preparation of high-quality nanosheets in fields such as electronic devices, energy storage and catalytic degradation.

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Abstract

The invention belongs to the field of semiconductor film preparation, and particularly relates to a preparation method for thinning a multilayer tungsten disulfide nanosheet and application. One purpose of the invention is to provide a preparation method for thinning a multilayer tungsten disulfide nanosheet. The preparation method comprises the following steps: irradiating the multilayer tungsten disulfide nanosheet with neutrons. The irradiation condition is set as follows: the total neutron fluence is 1 * 10 < 12 >-5 * 10 < 13 > n / cm < 2 > / s. According to the method, the thin and uniform multilayer tungsten disulfide (WS2) nanosheets can be prepared by adopting a neutron irradiation method with different doses, the method has the advantages of simple operation process, high yield, high efficiency, no pollution and the like, and meanwhile, the physicochemical properties of the nanosheet material are reserved in the preparation process.
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