Annular heater and semiconductor processing equipment

Abstract

The invention provides an annular heater and semiconductor processing equipment, the annular heater comprises an annular shell, and an annular accommodating cavity is formed in the annular shell; and the heating piece comprises a heating section and a leading-out section, the heating section comprises a plurality of circles of heating parts surrounding the interior of the annular containing cavity, one end of the leading-out section is connected to the end of the heating section, and the other end of the leading-out section is located outside the annular shell. According to the annular heater, the heating part of the heating piece is arranged in the annular containing cavity in the annular shell, the heating section of the heating piece comprises the multiple circles of heating parts surrounding the interior of the annular containing cavity, the multiple circles of heating parts continuously surround to form the heating section, the structural integrity of the heating section is guaranteed, the heating uniformity of the heating section is improved, and the service life of the annular heater is prolonged. And the heat loss is reduced.

Description

Technical Field

[0001] The present application belongs to the field of semiconductor technology, and in particular, relates to a ring heater and semiconductor processing equipment. Background Art

[0002] When a ring heater is used to heat the spray plate through a heating wire, hot spots and cold spots are likely to appear on the heating wire. The temperature at the hot spot is too high, while the temperature at the cold spot is insufficient, resulting in a large temperature difference in the heating area, which seriously affects the uniformity of heating. Moreover, the large temperature difference will increase heat loss and reduce energy utilization efficiency. Summary of the Invention

[0003] One purpose of the embodiments of the present application is to provide a new technical solution for an annular heater and semiconductor processing equipment.

[0004] According to a first aspect of an embodiment of the present application, there is provided an annular heater, comprising:

[0005] An annular housing, wherein an annular accommodating cavity is formed inside the annular housing;

[0006] A heating element, comprising a heating section and a lead-out section, wherein the heating section comprises a multi-circle heating portion surrounding the annular accommodating cavity, one end of the lead-out section is connected to the end of the heating section, and the other end of the lead-out section is located outside the annular shell.

[0007] Optionally, the multiple circles of the heating portion are formed by a heating section surrounding the annular accommodating cavity.

[0008] Optionally, multiple circles of the heating parts are arranged in sequence in the radial direction of the heating section.

[0009] Optionally, multiple circles of the heating parts are arranged in sequence in the axial direction of the heating section.

[0010] Optionally, the end of the heating section is the low-temperature position of the heating section, and the position on the heating section away from the end is the high-temperature position of the heating section, and the temperature difference between the high-temperature position and the low-temperature position is less than or equal to 20°C.

[0011] Optionally, the end of the heating section is located outside the annular shell.

[0012] Optionally, the heating section is die-cast in the annular shell.

[0013] Optionally, the heating portion is bent in the annular accommodating cavity.

[0014] Optionally, the heating section includes a first heating portion and a second heating portion, and the first heating portion and the second heating portion are both wavy;

[0015] In the radial direction of the heating section, the concave region of the first heating portion and the convex region of the second heating portion are opposite to each other, and the convex region of the first heating portion and the concave region of the second heating portion are opposite to each other.

[0016] Optionally, the heating section includes a third heating portion and a fourth heating portion, and the third heating portion and the fourth heating portion are both wavy;

[0017] In the radial direction of the heating section, the concave region of the third heating portion is opposite to the concave region of the fourth heating portion, and the convex region of the third heating portion is opposite to the convex region of the fourth heating portion.

[0018] Optionally, the heating section includes a fifth heating portion and a sixth heating portion, and the fifth heating portion and the sixth heating portion are both wavy;

[0019] In the axial direction of the heating section, the concave region of the fifth heating portion and the convex region of the sixth heating portion are opposite to each other, and the convex region of the fifth heating portion and the concave region of the sixth heating portion are opposite to each other.

[0020] Optionally, the heating section includes a seventh heating portion and an eighth heating portion, and the seventh heating portion and the eighth heating portion are both wavy;

[0021] In the axial direction of the heating section, the concave region of the seventh heating portion is opposite to the concave region of the eighth heating portion, and the convex region of the seventh heating portion is opposite to the convex region of the eighth heating portion.

[0022] According to a second aspect of the embodiments of the present application, there is provided a semiconductor processing device, comprising a shower plate assembly and the annular heater according to the first aspect;

[0023] The annular heater is attached to one side of the shower plate assembly.

[0024] Optionally, the shower plate assembly includes a shower plate, a buffer structure, a cold plate and a cover plate, and the buffer structure, the cold plate and the cover plate are sequentially arranged on one side of the shower plate;

[0025] The annular heater surrounds the buffer structure and contacts the shower plate.

[0026] Optionally, an annular step is provided on a side of the shower plate close to the buffer structure, and the annular heater is provided on the annular step.

[0027] Optionally, the shower plate assembly includes a base, a column and a pressing member, and the base is arranged on a side of the shower plate away from the buffer structure;

[0028] One end of the column is connected to the base, and the other end of the column is provided with the pressing member, which is pressed against a side of the annular heater away from the shower plate.

[0029] Optionally, the pressing member includes a connecting rod, a pressure plate and an elastic member, the connecting rod is connected to the other end of the column, the pressure plate is sleeved on the connecting rod and crimped to the annular heater, and the elastic member is clamped between the end of the connecting rod and the pressure plate.

[0030] One of the technical effects of this application is:

[0031] An embodiment of the present application provides an annular heater, which includes an annular shell with an annular accommodating cavity formed inside the annular shell; a heating element, which includes a heating section and an outlet section. The heating section includes a multi-circle heating portion surrounding the annular accommodating cavity, one end of the outlet section is connected to the end of the heating section, and the other end of the outlet section is located outside the annular shell. The annular heater of the present application sets the heating portion of the heating element in the annular accommodating cavity inside the annular shell. The heating section of the heating element includes a multi-circle heating portion surrounding the annular accommodating cavity. The multi-circle heating portion continuously surrounds to form the heating section, which not only ensures the structural integrity of the heating section, but also improves the heating uniformity of the heating section and reduces heat loss.

[0032] Other features and advantages of the present application will become apparent from the following detailed description of exemplary embodiments of the present application with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the application and, together with the description, serve to explain the principles of the application.

[0034] Figure 1 A schematic diagram of a ring heater provided in one embodiment of the present application;

[0035] Figure 2 A schematic diagram of a heating element of a ring heater provided in the first embodiment of the present application;

[0036] Figure 3 A schematic diagram of a heating element of a ring heater provided in a second embodiment of the present application;

[0037] Figure 4 A schematic diagram of a heating element of a ring heater provided in a third embodiment of the present application;

[0038] Figure 5 An overall diagram of a ring heater provided in one embodiment of the present application;

[0039] Figure 6A schematic diagram of a heating element of a ring heater provided in a fourth embodiment of the present application;

[0040] Figure 7 A schematic diagram of a heating element of a ring heater provided in a fifth embodiment of the present application;

[0041] Figure 8 A schematic diagram of a heating element of a ring heater provided in a sixth embodiment of the present application;

[0042] Figure 9 A schematic diagram of a semiconductor processing device provided in accordance with an embodiment of the present application;

[0043] Figure 10 for Figure 9 Local magnification in Figure 1 ;

[0044] Figure 11 for Figure 9 Local magnification in Figure 2 .

[0045] in:

[0046] 100. Ring heater; 1. Ring housing; 11. Mounting area; 2. Heating element; 21. Heating section; 211. Heating unit; 212. First heating unit; 213. Second heating unit; 214. Third heating unit; 215. Fourth heating unit; 216. Fifth heating unit; 217. Sixth heating unit; 218. Seventh heating unit; 219. Eighth heating unit; 22. Lead-out section;

[0047] 200, spray plate assembly; 201, spray plate; 2011, annular step; 202, buffer structure; 2021, buffer protrusion; 2022, sealing ring; 2023, shielding elastic member; 203, cold plate; 204, cover plate; 205, base; 206, column; 207, pressing member; 2071, connecting rod; 2072, pressing plate; 2073, elastic member;

[0048] 300, RPS cleaning parts. DETAILED DESCRIPTION

[0049] Various exemplary embodiments of the present application will now be described in detail with reference to the accompanying drawings. It should be noted that unless otherwise specifically stated, the relative arrangements of components and steps, numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the present application.

[0050] The embodiments of the present application will be described in detail below, and examples of the embodiments are shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and should not be understood as limiting the present application. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making any creative efforts are within the scope of protection of this application.

[0051] The terms "first" and "second" in the specification and claims of this application may explicitly or implicitly refer to one or more of the features. Throughout the description of this application, unless otherwise specified, "plurality" means two or more. Furthermore, "and / or" in the specification and claims refers to at least one of the connected entities, and the character " / " generally indicates an "or" relationship between the connected entities.

[0052] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0053] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0054] It should be noted that like reference numerals and letters refer to like items in the following figures, and therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0055] In the related art, when the annular heater heats the spray plate through the heating wire, hot spots and cold spots are likely to appear on the heating wire. The temperature at the hot spot is too high, while the temperature at the cold spot is insufficient, resulting in a large temperature difference in the heating area, seriously affecting the uniformity of heating; and the large temperature difference will also increase heat loss and reduce energy utilization efficiency.

[0056] The annular heater provided in the embodiment of the present application sets the heating part of the heating element in the annular accommodating cavity inside the annular shell; the heating section of the heating element includes multiple circles of heating parts surrounding the annular accommodating cavity, and the multiple circles of heating parts are continuously surrounded to form a heating section, which not only ensures the structural integrity of the heating section, but also improves the heating uniformity of the heating section and reduces heat loss.

[0057] Reference Figure 1 and Figure 2 The embodiment of the present application provides a ring heater 100, which includes:

[0058] An annular housing 1, wherein an annular accommodating cavity is formed inside the annular housing 1;

[0059] The heating element 2 includes a heating section 21 and a lead-out section 22. The heating section 21 includes a multi-circle heating portion 211 surrounded by the annular accommodating cavity. For example, the heating section 21 includes two continuously surrounded heating portions 211, three continuously surrounded heating portions 211, or four continuously surrounded heating portions 211. One end of the lead-out section 22 is connected to the end of the heating section 21, and the other end of the lead-out section 22 is located outside the annular shell 1.

[0060] In the above embodiment, the annular housing 1 can be a cast aluminum ring or a steel ring. The annular housing 1 provides structural support and protection for the entire annular heater 100, ensuring the safe and stable operation of the heating elements within the annular heater 100. For example, the annular housing formed within the annular housing 1 provides a suitable surrounding space for the heating element 2, allowing the heating element 2 to lay the foundation for subsequent uniform heating and preventing heating performance from being affected by an unreasonable layout of the heating element 2.

[0061] See also Figure 2 The two ends of the heating section 21 are arranged adjacent to each other to facilitate the common extraction of the ends of the heating section 21; at the cold spot of the traditional heating wire, the surrounding heating part 211 can fill the heat supply of the cold spot area and perform temperature compensation on the cold spot area, so that the temperature of the cold spot area that was originally insufficient in temperature increases; at the same time, the multiple circles of surrounding heating parts 211 can also disperse the heat in the hot spot area to avoid local excessive temperature, effectively reducing the temperature difference between the high temperature position and the low temperature position on the heating section 21, and ensuring the heating uniformity of the ring heater.

[0062] Specifically, the lead-out section 22 may not be used for heating, and the temperature at both ends of the heating section 21 will decrease, that is, there may be a cold spot at the connection between the lead-out section 22 and the heating section 21, resulting in a large temperature difference between the high-temperature position (the position where the heating section 21 is far away from the lead-out section 22) and the low-temperature position (the position where the heating section 21 is close to the lead-out section 22) on the heating section 21; and the heating section 21 is set to be surrounded by multiple circles of heating parts 211, so that temperature compensation can be performed at the cold spot through the surrounding heating parts 211, thereby reducing the temperature difference between the high-temperature position and the low-temperature position on the heating section 21, and ensuring the heating uniformity of the annular heater.

[0063] In the above embodiment, the lead-out section 22 provides a power access point for the heating section 21. The lead-out section 22 introduces the electric energy of the external power supply into the heating section 21, so that the heating section 21 can work normally and generate heat. The lead-out section 22 is an important bridge connecting the annular heater 100 with the external power supply, ensuring the realization of the heating function.

[0064] The annular heater 100 provided in the embodiment of the present application sets the heating part of the heating element 2 in the annular accommodating cavity inside the annular shell 1; the heating section 21 of the heating element 2 includes a multi-circle heating portion 211 surrounding the annular accommodating cavity, and the multi-circle heating portion 211 continuously surrounds to form the heating section 21, which not only ensures the structural integrity of the heating section 21, but also improves the heating uniformity of the heating section 21 and reduces heat loss.

[0065] In one embodiment, the annular heater 100 is used to heat the shower plate. If the heating temperature of the annular heater 100 is uneven, on the one hand, the power output of the annular heater 100 will be too high, reducing the service life of the annular heater 100. On the other hand, it will cause the temperature of the process gas ejected from the shower plate to be uneven, resulting in uneven coating thickness. However, the annular heater 100 provided in the embodiment of the present application has a heating section 21 surrounded by multiple heating parts 211. It can perform temperature compensation at the cold spot through the surrounding heating parts 211, reducing the temperature difference between the high temperature position and the low temperature position on the heating section 21, reducing the power consumption of the annular heater 100, ensuring the heating uniformity and service life of the annular heater, and maintaining the uniformity of the coating thickness of the shower plate.

[0066] In some embodiments, see Figure 2 and Figure 6 The multi-ring heating portion 211 is formed by a single heating segment 21 wrapped around an annular housing. This design, formed by a single heating segment 21 wrapping around the heating segment 21, greatly simplifies the internal structure of the heating element 2. Compared to a structure consisting of multiple heating wires stacked together, this reduces the number of connection points within the heating segment 21, lowering the risk of failure of the entire heating element 2 due to poor connections or local damage, and improving the reliability and service life of the annular heater.

[0067] Moreover, the multiple circles of heating parts 211 formed by continuously surrounding a heating section 21 can ensure that the current is distributed more evenly in the heating element 2, so that the heat generated by each circle of heating parts 211 is also more uniform, thereby achieving uniform heating of the heated object.

[0068] In some embodiments, see Figure 6 The multiple circles of heating parts 211 are arranged in sequence in the radial direction of the heating section 21 .

[0069] In the above embodiment, the radial direction of the heating section 21 can be the horizontal direction of the plane around which the heating section 21 surrounds. Since the shower plate waiting heating element is generally a disc-shaped structure, there may be a problem of uneven heating at different radial positions of the shower plate. The multi-turn heating portion 211 heats the shower plate in the horizontal direction by increasing the number of winding turns. This can not only increase the contact area between the heating section 21 and the shower plate, but also enable heat to be transferred to the shower plate from different radial positions simultaneously. This ensures that all radial positions of the shower plate are heated relatively evenly, avoids overheating or overcooling of some radial areas due to unreasonable distribution of heating elements, effectively reduces the temperature difference in the radial direction, and improves the uniformity of the heating temperature.

[0070] In the above embodiment, the multiple circles of heating parts 211 arranged in sequence in the radial direction can be in contact with each other in sequence to reduce the space occupied by the heating section 21; or the multiple circles of heating parts 211 arranged in sequence in the radial direction can be spaced apart by a set distance, for example, the set distance is 10%, 30%, 50%, 70% or 100% of the diameter of the heating part 211 to avoid excessive temperature between adjacent heating parts 211, wherein the diameter of the heating part 211 is within the range of 0.09-1.6 mm.

[0071] In some embodiments, see Figure 7 The heating section 21 includes a first heating portion 212 and a second heating portion 213, and both the first heating portion 212 and the second heating portion 213 are wavy;

[0072] In the radial direction of the heating section 21 , the concave region of the first heating portion 212 and the convex region of the second heating portion 213 are opposite to each other, and the convex region of the first heating portion 212 and the concave region of the second heating portion 213 are opposite to each other.

[0073] In the above embodiment, the wavy first and second heating portions 212, 213 can increase the actual length of the heating portion within the same radial space, thereby increasing the heating area. This helps improve heat transfer efficiency, enabling the heating portion to transfer heat to the heated component more quickly and effectively, thereby enhancing the overall heating effect. Furthermore, the wavy shape makes the heat distribution on the heating portion more dispersed, avoiding excessive heat concentration in a localized area and helping to reduce the occurrence of hot and cold spots.

[0074] In this embodiment of the present application, the first heating section 212 and the second heating section 213 are nested relative to each other, forming complementary heating zones in the radial direction. For example, when heat is relatively concentrated in the convex region of the first heating section 212, the concave region of the second heating section 213 can disperse and supplement this heat, further reducing the temperature difference between the high-temperature and low-temperature areas within the heating zone, ensuring heating uniformity and improving the stability and consistency of the heating of the shower plate.

[0075] Furthermore, the opposing structure of the first heating portion 212 and the second heating portion 213 promotes coordinated heat transfer in the radial direction. During the heating process, heat can be transferred from the convex area of ​​one heating portion to the concave area of ​​the other heating portion, forming a relay effect of heat transfer, allowing heat to spread more quickly and evenly throughout the heating area, thereby improving the efficiency and effectiveness of heat transfer.

[0076] In another embodiment, see Figure 8 The heating section 21 includes a third heating part 214 and a fourth heating part 215, and the third heating part 214 and the fourth heating part 215 are both wavy; in the radial direction of the heating section 21, the concave area of ​​the third heating part 214 and the concave area of ​​the fourth heating part 215 are opposite, and the convex area of ​​the third heating part 214 and the convex area of ​​the fourth heating part 215 are opposite, so as to improve the structural compactness of the annular heater while ensuring heat transfer.

[0077] In some embodiments, see Figure 2 The multiple circles of heating parts 211 are arranged in sequence in the axial direction of the heating section 21 .

[0078] In the above embodiment, when a circle of heating elements 211 generates heat, the surrounding medium (such as air or other heat transfer medium) quickly absorbs and transfers the heat. Because multiple circles of heating elements 211 operate simultaneously in the axial direction, heat can be transferred and diffused more quickly in the axial direction, reducing heat loss during the transfer process and improving heat transfer efficiency, thereby accelerating the heating of the shower plate and the heating element.

[0079] In the above embodiment, the multiple circles of heating parts 211 arranged in sequence in the axial direction can be in contact with each other in sequence to reduce the occupied space of the heating section 21; or the multiple circles of heating parts 211 arranged in sequence in the axial direction can be spaced apart by a set distance, for example, the set distance is 10%, 30%, 50%, 70% or 100% of the diameter of the heating part 211 to avoid excessive temperature between adjacent heating parts 211.

[0080] In some embodiments, see Figure 3The heating section 21 includes a fifth heating portion 216 and a sixth heating portion 217 , and both the fifth heating portion 216 and the sixth heating portion 217 are wavy;

[0081] In the axial direction of the heating section 21 , the concave region of the fifth heating portion 216 and the convex region of the sixth heating portion 217 are opposite to each other, and the convex region of the fifth heating portion 216 and the concave region of the sixth heating portion 217 are opposite to each other.

[0082] In the above embodiment, the wavy structures of the fifth and sixth heating sections 216 and 217 increase the length of the heating sections within the same axial space, thereby increasing the heating area of ​​the heating sections. This larger heating area allows for faster and more efficient heat transfer to the shower plate, improving heating efficiency and shortening heating time. Furthermore, the wavy structure disperses heat across the heating sections, preventing excessive heat concentration in localized areas and helping to reduce hot and cold spots.

[0083] Furthermore, the wavy shapes of the fifth and sixth heating sections 216 and 217 provide a certain degree of elasticity. During the heating process, the heating sections may expand and contract due to temperature fluctuations. The wavy structure can better withstand such thermal stress, reducing deformation or damage caused by thermal stress and improving the service life and reliability of the heating sections.

[0084] In the embodiment of the present application, the fifth heating section 216 and the sixth heating section 217 are arranged in a nested arrangement, forming complementary heating zones in the axial direction. For example, when heat is concentrated in the convex region of the fifth heating section 216, the concave region of the sixth heating section 217 can disperse and supplement this heat, further reducing the temperature difference between high-temperature and low-temperature areas within the heating zone, ensuring heating uniformity and improving the stability and consistency of heating across the shower plate.

[0085] In another embodiment, see Figure 4 The heating section 21 includes a seventh heating part 218 and an eighth heating part 219, and the seventh heating part 218 and the eighth heating part 219 are both wavy; in the axial direction of the heating section 21, the concave area of ​​the seventh heating part 218 and the concave area of ​​the eighth heating part 219 are opposite, and the convex area of ​​the seventh heating part 218 and the convex area of ​​the eighth heating part 219 are opposite, so as to improve the structural compactness of the annular heater while ensuring heat transfer.

[0086] In some embodiments, the end of the heating section 21 is the low-temperature position of the heating section 21, and the position on the heating section 21 away from the end is the high-temperature position of the heating section 21, and the temperature difference between the high-temperature position and the low-temperature position is less than or equal to 20°C.

[0087] In the above embodiment, the end of the heating section is usually closer to external connecting parts such as cables, which is prone to heat loss. Setting the end of the heating section 21 to a low-temperature position can effectively reduce energy loss due to heat loss and can more efficiently utilize heating energy. In order to ensure that the heated part can reach the required temperature quickly and accurately, the heating section 21 needs to continue to generate heat, resulting in a higher temperature at the position away from the end of the heating section 21. The temperature difference between the high-temperature position and the low-temperature position is less than or equal to 20°C, which can ensure that all parts of the heated part are heated uniformly, avoid product quality problems caused by temperature differences, and thus improve product quality and stability.

[0088] In one embodiment, see Figure 1 The annular shell 1 has an installation area 11 for setting temperature sensors. Two temperature sensors are respectively set close to the low temperature position and the high temperature position to monitor the real-time temperatures of the low temperature position and the high temperature position.

[0089] In some embodiments, the end of the heating section 21 is located outside the annular housing 1 .

[0090] In the above embodiment, the end of the heating section 21 is arranged outside the annular shell 1, so that the heating area of ​​the heating section 21 can be surrounded as much as possible inside the annular shell 1, thereby increasing the effective heating area of ​​the heating section 21; at the same time, the two ends of the heating section 21 can be as close as possible or overlapped to ensure the integrity of the heating area.

[0091] In one embodiment, the heating section 21 is die-cast in the annular housing 1 .

[0092] In the above embodiment, the heating portion 211 of the heating section 21 is die-cast in the annular shell 1, so that the heating section 21 and the annular shell 1 are combined into one body. A tight and firm connection is formed between the heating section 21 and the annular shell 1, which can make the contact surface between the heating portion 211 and the heated part larger and the heating more uniform.

[0093] In a specific embodiment, the spray plate is heated by a ring heater with two radially arranged heating parts. The heating power is 53% of the rated power (rated power is 4KW), the heating temperature is set to 250°C, the diameter of the heating part is 0.5mm, and the heating part includes a protective layer and a heating wire embedded in the protective layer. The material of the heating wire is nickel-chromium alloy (Ni80Gr20), and the protective layer is in the form of stainless steel mesh filled with magnesium oxide, which can reduce the temperature difference between the high temperature position and the low temperature position on the heating section 21 to 18°C.

[0094] In some embodiments, see Figure 3 and Figure 4 The heating portion 211 is bent in the annular accommodating cavity.

[0095] In the above embodiment, the bending setting of the heating part 211 can increase the heating area within the limited space of the annular accommodating cavity, so that the heating area of ​​the annular heater is in more complete contact with the spray plate, which helps to improve the heat transfer efficiency and enables more heat to be transferred to the spray plate quickly and effectively, thereby improving the overall heating effect and ensuring that the spray plate can reach the required temperature faster.

[0096] Furthermore, the curved heating portion 211 allows heat to diffuse in multiple directions, reducing heat concentration. When a hot spot appears in one area of ​​the heating portion 211, the curved portion disperses some of the heat to adjacent areas. Simultaneously, in cold spots, the curved heating portion 211 provides heat from multiple angles for temperature compensation, effectively reducing the temperature difference between hot and cold areas within the heating area and ensuring uniform heating.

[0097] See also Figure 9 , an embodiment of the present application provides a semiconductor processing device, the semiconductor processing device including a shower plate assembly 200 and the above-mentioned ring heater 100;

[0098] The ring heater 100 is attached to one side of the shower plate assembly 200 .

[0099] In the above embodiment, the annular heater 100 of the semiconductor processing equipment sets the heating part of the heating element 2 in the annular accommodating cavity inside the annular shell 1; the heating section 21 of the heating element 2 includes a multi-circle heating portion 211 surrounding the annular accommodating cavity, and the multi-circle heating portion 211 continuously surrounds to form the heating section 21, which not only ensures the structural integrity of the heating section 21, but also improves the heating uniformity of the heating section 21 and reduces heat loss.

[0100] See also Figure 9 The semiconductor processing equipment further includes an RPS (Remote Plasma Source) cleaning component 300 , which is used to clean the internal cavity of the shower plate assembly 200 .

[0101] In some embodiments, see Figure 9 and Figure 10 The shower plate assembly 200 includes a shower plate 201, a buffer structure 202, a cold plate 203 and a cover plate 204. The buffer structure 202, the cold plate 203 and the cover plate 204 are sequentially arranged on one side of the shower plate 201.

[0102] The annular heater 100 surrounds the buffer structure 202 and contacts the shower plate 201 .

[0103] In the above embodiment, the shower plate 201 evenly distributes the process medium to the processing area, ensuring uniform processing of the semiconductor substrate surface and uniform thickness of the semiconductor film. The buffer structure 202, located between the shower plate 201 and the cold plate 203, acts as a buffer for the process gas. The cold plate 203 cools the shower plate assembly 200, removing heat generated within the assembly 200 and thereby precisely controlling the temperature of the assembly 200. The cover plate 204, located on the outermost side of the shower plate assembly 200, provides sealing and protection.

[0104] See also Figure 9 The annular heater 100 surrounds the buffer structure 202 and evenly distributes heat around the spray plate 201, thereby achieving uniform heating of the spray plate 201, avoiding the problem of local overheating or overcooling of the spray plate 201, ensuring the consistency of the overall temperature of the spray plate 201, and improving the uniformity and stability of the spraying process.

[0105] In some embodiments, see Figure 9 and Figure 10 An annular step 2011 is provided on one side of the spray plate 201 close to the buffer structure 202 , and the annular heater 100 is provided on the annular step 2011 .

[0106] In the above embodiment, the annular step 2011 provides a clear installation location for the annular heater 100. When assembling the shower plate assembly 200 and the annular heater 100, the shape and size of the annular step 2011 allow the annular heater 100 to be quickly and accurately placed in the designated location, avoiding problems such as uneven heating and component interference caused by inaccurate installation. Furthermore, the annular step 2011 effectively prevents the annular heater 100 from shifting relative to the shower plate 201, ensuring the relative positional stability between the annular heater 100 and the shower plate 201, thereby ensuring consistent and reliable heating.

[0107] See also Figure 11 The buffer structure 202 has a buffer protrusion 2021, which acts as a thermal insulator to reduce heat loss. A sealing ring 2022 and a shielding elastic member 2023 are provided on the buffer protrusion 2021. The sealing ring 2022 ensures the sealing of the internal space of the buffer structure 202. The shielding elastic member 2023 can be a canted coil spring or a spiral tube made of stainless steel, beryllium copper, or Hastelloy alloy to provide radio frequency shielding and grounding.

[0108] In some embodiments, see Figure 9 and Figure 10The shower plate assembly 200 includes a base 205, a column 206 and a pressing member 207. The base 205 is arranged on a side of the shower plate 201 away from the buffer structure 202;

[0109] One end of the column 206 is connected to the base 205 , and the other end of the column 206 is provided with a pressing member 207 . The pressing member 207 is pressed against a side of the annular heater 100 away from the shower plate 201 .

[0110] In the above embodiment, a plurality of columns 206 can be provided and evenly arranged around the base 205. A clamping piece 207 is provided at the other end of the column 206 so that the clamping piece 207 can be stably pressed onto the annular heater 100, thereby firmly fixing the annular heater 100 on the spray plate 201, ensuring close contact between the annular heater 100 and the spray plate 201, which is conducive to the effective transfer of heat.

[0111] In some embodiments, see Figure 10 The pressing member 207 includes a connecting rod 2071, a pressure plate 2072 and an elastic member 2073. The connecting rod 2071 is connected to the other end of the column 206. The pressure plate 2072 is sleeved on the connecting rod 2071 and crimped to the annular heater 100. The elastic member 2073 is clamped between the end of the connecting rod 2071 and the pressure plate 2072.

[0112] In the above embodiment, the pressure plate 2072 can be annular, and the pressure plate 2072 presses the annular heater 100 to the spray plate 201 to avoid air leakage; the elastic member 2073 can be a compression spring. Due to thermal expansion, the vertical dimensions (extension direction of the column) of the annular heater 100 and the spray plate 201 will increase, and the compression spring can keep the annular heater 100 close to the spray plate 201.

[0113] See also Figure 10 The pressure plate 2072 is sleeved on the connecting rod 2071 and pressed against the annular heater 100. The large contact area of ​​the pressure plate 2072 can evenly distribute the pressing force on the surface of the annular heater 100, thereby preventing the annular heater 100 from being damaged by excessive force in some parts of the annular heater 100. At the same time, it can also ensure a close fit between the annular heater 100 and the spray plate 201, thereby improving the heat transfer efficiency. The elastic member 2073 has a certain elastic deformation ability and can automatically adjust the pressing force according to the thermal expansion and contraction between the annular heater 100 and the spray plate 201. For example, when the annular heater 100 and the spray plate 201 undergo thermal expansion or contraction, the elastic member 2073 can maintain an appropriate pressing force on the annular heater 100 through its own elastic deformation, thereby ensuring the continuity and stability of the heat transfer.

[0114] Although some specific embodiments of the present application have been described in detail by way of examples, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present application. It should be understood by those skilled in the art that the above embodiments may be modified without departing from the scope and spirit of the present application. The scope of the present application is defined by the appended claims.

Claims

1. A ring heater, characterized in that: include: An annular housing (1), wherein an annular accommodating cavity is formed inside the annular housing (1); A heating element (2), the heating element (2) comprising a heating section (21) and a lead-out section (22), the heating section (21) comprising a plurality of heating portions (211) surrounding the annular accommodating cavity, one end of the lead-out section (22) being connected to the end of the heating section (21), and the other end of the lead-out section (22) being located outside the annular shell (1).

2. The ring heater according to claim 1, characterized in that The multiple circles of the heating portion (211) are formed by a heating section (21) surrounding the annular accommodating cavity.

3. The ring heater according to claim 1, characterized in that A plurality of circles of the heating parts (211) are sequentially arranged in the radial direction of the heating section (21).

4. The ring heater according to claim 1, characterized in that A plurality of circles of the heating parts (211) are arranged in sequence in the axial direction of the heating section (21).

5. The ring heater according to claim 1, characterized in that The end of the heating section (21) is the low-temperature position of the heating section (21), and the position on the heating section (21) away from the end is the high-temperature position of the heating section (21), and the temperature difference between the high-temperature position and the low-temperature position is less than or equal to 20°C.

6. The ring heater according to claim 1, characterized in that The end of the heating section (21) is located outside the annular shell (1).

7. The ring heater according to claim 1, characterized in that The heating section (21) is die-cast in the annular housing (1).

8. The ring heater according to claim 1, characterized in that The heating portion (211) is bent and arranged in the annular accommodating cavity.

9. The ring heater according to claim 2, characterized in that The heating section (21) comprises a first heating portion (212) and a second heating portion (213), and both the first heating portion (212) and the second heating portion (213) are wavy; In the radial direction of the heating section (21), the concave area of ​​the first heating portion (212) and the convex area of ​​the second heating portion (213) are opposite to each other, and the convex area of ​​the first heating portion (212) and the concave area of ​​the second heating portion (213) are opposite to each other.

10. The ring heater according to claim 2, characterized in that The heating section (21) comprises a third heating portion (214) and a fourth heating portion (215), and both the third heating portion (214) and the fourth heating portion (215) are wavy; In the radial direction of the heating section (21), the concave area of ​​the third heating portion (214) and the concave area of ​​the fourth heating portion (215) are opposite to each other, and the convex area of ​​the third heating portion (214) and the convex area of ​​the fourth heating portion (215) are opposite to each other.

11. The ring heater according to claim 3, characterized in that The heating section (21) comprises a fifth heating portion (216) and a sixth heating portion (217), and both the fifth heating portion (216) and the sixth heating portion (217) are wavy; In the axial direction of the heating section (21), the concave area of ​​the fifth heating portion (216) and the convex area of ​​the sixth heating portion (217) are opposite to each other, and the convex area of ​​the fifth heating portion (216) and the concave area of ​​the sixth heating portion (217) are opposite to each other.

12. The ring heater according to claim 3, characterized in that The heating section (21) comprises a seventh heating portion (218) and an eighth heating portion (219), and both the seventh heating portion (218) and the eighth heating portion (219) are wavy; In the axial direction of the heating section (21), the concave area of ​​the seventh heating part (218) and the concave area of ​​the eighth heating part (219) are opposite to each other, and the convex area of ​​the seventh heating part (218) and the convex area of ​​the eighth heating part (219) are opposite to each other.

13. A semiconductor processing equipment, characterized in that: It comprises a shower plate assembly (200) and the annular heater (100) according to any one of claims 1 to 12; The annular heater (100) is attached to one side of the shower plate assembly (200).

14. The semiconductor processing equipment according to claim 13, wherein: The shower plate assembly (200) comprises a shower plate (201), a buffer structure (202), a cold plate (203) and a cover plate (204), wherein the buffer structure (202), the cold plate (203) and the cover plate (204) are sequentially arranged on one side of the shower plate (201); The annular heater (100) surrounds the buffer structure (202) and contacts the shower plate (201).

15. The semiconductor processing equipment according to claim 14, wherein: An annular step (2011) is provided on one side of the spray plate (201) close to the buffer structure (202), and the annular heater (100) is provided on the annular step (2011).

16. The semiconductor processing equipment according to claim 14, wherein The spray plate assembly (200) comprises a base (205), a column (206) and a pressing member (207); the base (205) is arranged on a side of the spray plate (201) away from the buffer structure (202); One end of the column (206) is connected to the base (205), and the other end of the column (206) is provided with the pressing member (207), and the pressing member (207) is pressed onto the side of the annular heater (100) away from the spray plate (201).

17. The semiconductor processing equipment according to claim 16, wherein: The pressing member (207) includes a connecting rod (2071), a pressure plate (2072) and an elastic member (2073), wherein the connecting rod (2071) is connected to the other end of the column (206), the pressure plate (2072) is sleeved on the connecting rod (2071) and crimped to the annular heater (100), and the elastic member (2073) is clamped between the end of the connecting rod (2071) and the pressure plate (2072).

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