Electrochromic module, head-mounted device and manufacturing method

Abstract

The invention provides an electrochromic module. The electrochromic module comprises a first conductive layer, a second conductive layer and an electrochromic layer. The first conductive layer comprises a first p-type electrode block and a first n-type electrode block which are spliced with each other; the second conductive layer comprises a second p-type electrode block and a second n-type electrode block which are spliced with each other; the electrochromic layer is located between the first conductive layer and the second conductive layer; the first p-type electrode block, the first n-type electrode block, the second p-type electrode block and the second n-type electrode block are used for carrying out at least partitioned light transmittance regulation and control on the electrochromic layer based on driving voltage. The invention further provides a head-mounted device and a manufacturing method of the electrochromic module.

Description

Technical Field

[0001] The present application relates to an electrochromic module, a head-mounted device including the electrochromic module, and a method for manufacturing the electrochromic module. Background Art

[0002] Traditional augmented reality (AR) glasses are limited by fixed transmittance or mechanical shading structures, making them difficult to adapt to ambient light changes in real time. They also have high size and power consumption. Electrochromic materials (such as inorganic oxides like WO3 and NiO, or organic compounds like viologen) reversibly change their optical properties (transmittance, reflectance, or color) through an applied voltage, enabling stepless and rapid control of AR glasses' transmittance. Furthermore, through electrochromic zoning technology, AR glasses can dynamically adjust the transmittance of different viewing areas to adapt to alternating light and dark environments (such as switching between bright outdoor light and dim indoor light) or selectively enhance the visibility of virtual and real-world content.

[0003] Existing zoning technologies typically use etching or laser cutting to create multiple electrochromic cells on AR glasses. This method can easily result in gaps of tens to hundreds of microns between adjacent electrochromic cells. These gaps can visually create light-dark boundaries, interfering with the seamless integration of AR glasses' displayed content. Especially when displaying high-contrast images (such as bright virtual objects against a dark background), halos or edge diffraction effects in the gaps can reduce the immersive experience of the virtual-real superposition and potentially cause visual fatigue. Summary of the Invention

[0004] In view of this, the present application provides an electrochromic module that can eliminate the gap between two adjacent electrochromic units to improve the display effect.

[0005] In a first aspect, the present application provides an electrochromic module comprising a first conductive layer, a second conductive layer, and an electrochromic layer. The first conductive layer comprises a first p-type electrode block and a first n-type electrode block joined together; the second conductive layer comprises a second p-type electrode block and a second n-type electrode block joined together; the electrochromic layer is located between the first and second conductive layers; the first p-type electrode block, the first n-type electrode block, the second p-type electrode block, and the second n-type electrode block are configured to control the transmittance of at least a subregion of the electrochromic layer based on a driving voltage.

[0006] In the electrochromic module provided in the embodiment of the present application, the first conductive layer includes a first p-type electrode block and a first n-type electrode block spliced ​​together, and the second conductive layer includes a second p-type electrode block and a second n-type electrode block spliced ​​together. After each p-type electrode block contacts each n-type electrode block, the carriers in the p-type electrode block and the n-type electrode block diffuse to form a depletion layer, generating a built-in electric field, and the direction of the electric field points from the n-region to the p-region. When the p-type electrode block is connected to a voltage and the connected voltage is less than the voltage corresponding to the built-in electric field, since the connected voltage cannot completely offset the built-in electric field, a stable and measurable voltage will not be formed on the n-type electrode block. When the n-type electrode block is connected to a voltage, the built-in electric field will be enhanced, and the p-type electrode block may induce a positive voltage, but because of the reverse bias, the voltage of the p-type electrode block is also difficult to maintain (only temporarily storing charge).

[0007] It can be seen from this that when one of the first p-type electrode block and the first n-type electrode block of the first conductive layer receives a voltage, and one of the second p-type electrode block and the second n-type electrode block of the second conductive layer receives a different voltage, according to the PN junction characteristics, a voltage difference will only be formed between the electrode block of the first conductive layer receiving the voltage and the electrode block of the second conductive layer receiving the voltage, causing the transmittance of part of the electrochromic layer to change with the voltage difference, thereby achieving zoned color change of the electrochromic module. When all the electrode blocks of the first conductive layer and all the electrode blocks of the second conductive layer receive a voltage, so that a voltage difference is generated between all the electrode blocks of the first conductive layer and all the electrode blocks of the second conductive layer, due to the close contact between the electrode blocks on each conductive layer, that is, there is no gap between adjacent electrochromic units, the transmittance of all areas of the electrochromic layer changes. At this time, the display screen viewed by the user through the electrochromic module does not have a clear light and dark dividing line, which is conducive to providing users with a better visual experience.

[0008] A second aspect of the present application provides a head-mounted device, comprising a frame and the electrochromic module as described above, wherein a mounting position is provided on the frame; and the electrochromic module is fixed in the mounting position.

[0009] For the above-mentioned head-mounted device, the above-mentioned electrochromic module is integrated, and all the beneficial effects of the above-mentioned electrochromic module can be achieved.

[0010] A third aspect of the present application provides a method for manufacturing an electrochromic module, comprising six steps: Step 1: providing a first substrate layer, wherein a surface of the first substrate layer comprises first regions and second regions that are alternately connected; Step 2: Laminating a shielding material on the first area to form a shielding layer, coating a p-type semiconductor material on the second area to form a first p-type electrode block, and then removing the shielding layer; Step 3: Laminating the shielding material to the surface of the first p-type electrode block away from the first substrate layer to form the shielding layer, coating the first region with an n-type semiconductor material to form the first n-type electrode block, and then removing the shielding layer; splicing the first p-type electrode block and the first n-type electrode block to form a first conductive layer; Step 4: coating an electrochromic material on a side of the first conductive layer away from the first substrate layer to form an electrochromic layer; Step 5: Repeat steps 1 to 3 to produce a second base material layer and a second conductive layer stacked together, wherein the second conductive layer includes a second p-type electrode block and a second n-type electrode block spliced ​​together; and Step six: Laminating the electrochromic layer and the second conductive layer to form the electrochromic module.

[0011] With respect to the manufacturing method of the electrochromic module, the electrochromic module is manufactured, and the electrochromic module can achieve all the beneficial effects described above. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 Schematic diagram of a planar structure of the electrochromic module according to an embodiment of the present application.

[0013] Figure 2 It is a schematic diagram of an arrangement of the first p-type electrode block and the first n-type electrode block.

[0014] Figure 3 FIG. 4 is a schematic diagram of another arrangement of the first p-type electrode block and the first n-type electrode block.

[0015] Figure 4 FIG. 4 is a schematic diagram of another arrangement of the first p-type electrode block and the first n-type electrode block.

[0016] Figure 5 FIG. 4 is a schematic diagram of another arrangement of the first p-type electrode block and the first n-type electrode block.

[0017] Figure 6 FIG. 4 is a schematic diagram of another arrangement of the first p-type electrode block and the first n-type electrode block.

[0018] Figure 7 FIG. 2 is another planar structural schematic diagram of the electrochromic module according to an embodiment of the present application.

[0019] Figure 8 The graph is a relationship curve between the input voltage and the generated current between a p-type semiconductor including lithium nickelate and an n-type semiconductor including lithium strontium scandium oxide.

[0020] Figure 9 Schematic diagram of the curve showing how the transmittance of the electrochromic layer changes over time under the influence of currents of different sizes.

[0021] Figure 10 This is a schematic diagram of the three-dimensional structure of the head-mounted device according to an embodiment of the present application.

[0022] Figure 11 for Figure 10 Schematic diagram of the partial cross-sectional structure of the head-mounted device along the section line XI-XI.

[0023] Figure 12 Schematic diagram of the process of manufacturing the electrochromic module according to an embodiment of the present application.

[0024] Figure 13 Schematic diagram of the structure of the manufacturing method of the electrochromic module according to the embodiment of the present application.

[0025] Description of main component symbols Headset: 1 Electrochromic module: 100 Electrochromic layer: 10 First conductive layer: 11 First p-type electrode block: 111 First n-type electrode block: 112 Second conductive layer: 12 Second p-type electrode block: 121 Second n-type electrode block: 122 First substrate layer: 13 Second base material layer: 14 Isolation frame: 15 Masking layers: 16 Frame: 200 Mounting positions: 20 Thin film transistor array: 300 Driver chip: 400 Steps: S1~S6 The following specific implementation methods will further illustrate the present application in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION

[0026] Herein, the terms "first," "second," and other similar terms are not intended to imply any order, quantity, or importance, but are merely used to distinguish light rays propagating in different directions.

[0027] The technical solution of the present application will be clearly and completely described below in conjunction with the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments.

[0028] See also Figure 1The electrochromic module 100 of the embodiment of the present application includes a first conductive layer 11, a second conductive layer 12, and an electrochromic layer 10 located between the first conductive layer 11 and the second conductive layer 12. The first conductive layer 11 includes a first p-type electrode block 111 and a first n-type electrode block 112 spliced ​​together, and the second conductive layer 12 includes a second p-type electrode block 121 and a second n-type electrode block 122 spliced ​​together. The first p-type electrode block 111, the first n-type electrode block 112, the second p-type electrode block 121 and the second n-type electrode block 122 are used to control the transmittance of at least a certain area of ​​the electrochromic layer 10 based on the driving voltage. "Regional transmittance control" refers to applying different voltage differences to different areas of the electrochromic layer 10, thereby adjusting the transmittance of different areas of the electrochromic layer 10, and realizing local or differentiated control of the optical properties of the electrochromic layer 10.

[0029] At the same time, first p-type electrode block 111, first n-type electrode block 112, and second p-type electrode block 121, second n-type electrode block 122 are also used to uniformly change the transmittance of all areas of electrochromic layer 10 based on the driving voltage. Because adjacent electrode blocks on either side of electrochromic layer 10 are in close contact, when the transmittance of all areas of electrochromic layer 10 changes, the display image generated by ambient light passing through electrochromic module 100 does not contain a bright / dark boundary.

[0030] In some embodiments, the first conductive layer 11 includes a plurality of first p-type electrode blocks 111 and a plurality of first n-type electrode blocks 112, with the first p-type electrode blocks 111 and the first n-type electrode blocks 112 being alternately spliced ​​along any direction. The second conductive layer 12 includes a plurality of second p-type electrode blocks 121 and a plurality of second n-type electrode blocks 122, with the second p-type electrode blocks 121 and the second n-type electrode blocks 122 being alternately spliced ​​along any direction.

[0031] Taking the first conductive layer 11 as an example, Figure 2 、 Figure 3 and Figure 4 1 and 2 are schematic diagrams of the splicing directions of the plurality of first p-type electrode blocks 111 and the plurality of first n-type electrode blocks 112 . Figure 2 In the direction perpendicular to the thickness of the first conductive layer 11 , the plurality of first p-type electrode blocks 111 and the plurality of first n-type electrode blocks 112 are alternately spliced ​​along the extending direction of one side of the first conductive layer 11 . Figure 3 In the thickness direction perpendicular to the first conductive layer 11 , an angle exists between the splicing direction of the plurality of first p-type electrode blocks 111 and the plurality of first n-type electrode blocks 112 and the extending direction of the side length of the first conductive layer 11 . Figure 4In the direction perpendicular to the thickness of the first conductive layer 11 , a plurality of first p-type electrode blocks 111 and a plurality of first n-type electrode blocks 112 are alternately arranged in an array, and each first p-type electrode block 111 is adjacent to two or more first n-type electrode blocks 112 .

[0032] In other embodiments, the first p-type electrode block 111 and the first n-type electrode block 112 in the first conductive layer 11 or the second p-type electrode block 121 and the second n-type electrode block 122 in the second conductive layer 12 may also be spliced ​​in other ways. Taking the first conductive layer 11 as an example, Figure 5 In the embodiment, the first p-type electrode block 111 surrounds the first n-type electrode block 112 and is spliced ​​together. Figure 6 In the embodiment, the first n-type electrode block 112 surrounds the first p-type electrode block 111 and is spliced ​​together.

[0033] The embodiment of the present application does not restrict the splicing method of the electrode blocks in the first conductive layer 11 or the splicing direction of the electrode blocks in the second conductive layer 12. The splicing direction of the electrode blocks in the first conductive layer 11 and the splicing direction of the electrode blocks in the second conductive layer 12 are both perpendicular to the thickness extension direction of the first conductive layer 11 or the second conductive layer 12. The splicing direction of the multiple electrode blocks in the first conductive layer 11 and the splicing direction of the multiple electrode blocks in the second conductive layer 12 can be the same or different.

[0034] Please refer to Figure 1 In some embodiments, the orthographic projections of the first p-type electrode block 111 and the second p-type electrode block 121 on the electrochromic layer 10 completely overlap, and the orthographic projections of the first n-type electrode block 112 and the second n-type electrode block 122 on the electrochromic layer 10 completely overlap. In other embodiments, the orthographic projections of the first p-type electrode block 111 and the second n-type electrode block 122 on the electrochromic layer 10 completely overlap, and the orthographic projections of the first n-type electrode block 112 and the second p-type electrode block 121 on the electrochromic layer 10 completely overlap. These two arrangements of electrode blocks can achieve the same control of the transmittance of each zone of the electrochromic layer 10.

[0035] Taking the case where the orthographic projections of the first p-type electrode block 111 and the second p-type electrode block 121 on the electrochromic layer 10 completely overlap as an example, when each electrode block in the first conductive layer 11 and each electrode block in the second conductive layer 12 receive the same voltage, the transmittance of the electrochromic layer 10 remains constant because the voltage difference between the first conductive layer 11 and the second conductive layer 12 is zero. When the first p-type electrode block 111 and the second p-type electrode block 121 receive different voltages, and the first n-type electrode block 112 and the second n-type electrode block 122 receive a voltage of zero, the transmittance of the electrochromic layer 10 located between the first p-type electrode block 111 and the second p-type electrode block 121 changes, while the transmittance of the electrochromic layer 10 located between the first n-type electrode block 112 and the second n-type electrode block 122 remains constant. That is, the first p-type electrode block 111, the second p-type electrode block 121, and the electrochromic layer 10 located between the first p-type electrode block 111 and the second p-type electrode block 121 constitute one electrochromic unit, and the first n-type electrode block 112, the second n-type electrode block 122, and the electrochromic layer 10 located between the first n-type electrode block 112 and the second n-type electrode block 122 constitute another electrochromic unit. The two electrochromic units each include different portions of the electrochromic layer 10. The electrode blocks in the two electrochromic units are tightly connected to each other, but the changes in the transmittance of the different portions of the electrochromic layer 10 corresponding to the two electrochromic units do not affect each other. When the same voltage difference is simultaneously generated in the electrochromic layer 10 corresponding to the two electrochromic units, since there is no gap between the two electrochromic units, the transmittance of the entire area of ​​the electrochromic layer 10 changes, causing the brightness of the image viewed by the user through the electrochromic module 100 to change and the absence of alternating light and dark stripes in the field of view.

[0036] See also Figure 7 In some embodiments, along the thickness of the first conductive layer 11, the orthographic projections of the first p-type electrode block 111 and the second p-type electrode block 121 or the second n-type electrode block 122 on the electrochromic layer 10 at least partially overlap; and / or the orthographic projections of the first n-type electrode block 112 and the second n-type electrode block 122 or the second p-type electrode block 121 on the electrochromic layer 10 at least partially overlap. When some electrode blocks in the first conductive layer 11 and some electrode blocks in the second conductive layer 12 receive different voltages, the transmittance of some regions of the electrochromic layer 10 changes. The regions of the electrochromic layer 10 where the transmittance changes are the overlapping portions of the projections of the electrode blocks in the first conductive layer 11 receiving the voltage and the projections of the electrode blocks in the second conductive layer 12 receiving the voltage on the electrochromic layer 10. The electrochromic module 100 in this embodiment includes more electrochromic units, which facilitates more precise control of the transmittance of the electrochromic layer 10 in different regions.

[0037] In some embodiments, first p-type electrode block 111 and second p-type electrode block 121 are both p-type semiconductors including lithium nickelate, and first n-type electrode block 112 and second n-type electrode block 122 are both n-type semiconductors including lithium strontium scandium oxide.

[0038] Figure 8 The graph is a curve relationship between the voltage and current between the p-type semiconductor and the n-type semiconductor after the p-type semiconductor including lithium nickel oxide contacts the n-type semiconductor including lithium strontium scandium oxide. Taking the first p-type electrode block 111 and the first n-type electrode block 112 as an example, Figure 8 It can be seen that the voltage corresponding to the built-in electric field formed after the first p-type electrode block 111 contacts the first n-type electrode block 112 is 1V. When the voltage received by the first p-type electrode block 111 is greater than 1V, the current generated in the first p-type electrode block 111 and the first n-type electrode block 112 is 10 -6 Magnitude.

[0039] Figure 9 FIG. 1 is a graph showing how the transmittance of the electrochromic layer 10 of an electrochromic module 100 changes over time under the influence of currents of different magnitudes. Figure 9 As can be seen in the figure, when the current flowing through the electrochromic layer 10 is less than 0.4 mA, the transmittance of the electrochromic layer 10 is barely affected. Because the first p-type electrode block 111 is in contact with the first n-type electrode block 112 and receives a voltage, the current generated within the first p-type electrode block 111 and the first n-type electrode block 112 is much less than 0.4 mA. Therefore, the effect of the current generated within the first p-type electrode block 111 and the first n-type electrode block 112 on the transmittance of the electrochromic layer 10 is negligible.

[0040] The electrochromic module 100 also includes a transparent first substrate layer 13 and a second substrate layer 14, both of which are made of transparent plastic or transparent glass. The first substrate layer 13 is located on the side of the first conductive layer 11 away from the electrochromic layer 10, and the second substrate layer 14 is located on the side of the second conductive layer 12 away from the electrochromic layer 10. The first and second substrate layers 13 and 14 are used to provide mechanical support for the overall structure of the electrochromic module 100 and encapsulate the first and second conductive layers 11 and 12 to ensure the integrity and flatness of the first and second conductive layers 11 and 12, and the electrochromic layer 10.

[0041] In the electrochromic module 100 provided in the embodiment of the present application, the first conductive layer 11 includes a first p-type electrode block 111 and a first n-type electrode block 112 spliced ​​together, and the second conductive layer 12 includes a second p-type electrode block 121 and a second n-type electrode block 122 spliced ​​together. After each p-type electrode block contacts each n-type electrode block, the carriers in the p-type electrode block and the n-type electrode block diffuse to form a depletion layer, generating a built-in electric field, and the direction of the electric field points from the n-region to the p-region. When the p-type electrode block is connected to a voltage and the connected voltage is less than the voltage corresponding to the built-in electric field, since the connected voltage cannot completely offset the built-in electric field, a stable and measurable voltage will not be formed on the n-type electrode block. When the n-type electrode block is connected to a voltage, the built-in electric field will be enhanced, and the p-type electrode block may induce a positive voltage, but because of the reverse bias, the voltage of the p-type electrode block is also difficult to maintain (only temporarily storing charge).

[0042] It can be seen from this that when one of the first p-type electrode block 111 and the first n-type electrode block 112 of the first conductive layer 11 receives a voltage, and one of the second p-type electrode block 121 and the second n-type electrode block 122 of the second conductive layer 12 receives a different voltage, according to the PN junction characteristics, a voltage difference is only formed between the electrode block of the first conductive layer 11 receiving the voltage and the electrode block of the second conductive layer 12 receiving the voltage, causing the transmittance of a portion of the electrochromic layer 10 to change with the voltage difference, thereby achieving zoned color change of the electrochromic module 100. When all the electrode blocks of the first conductive layer 11 and all the electrode blocks of the second conductive layer 12 receive a voltage, so that a voltage difference is generated between all the electrode blocks of the first conductive layer 11 and all the electrode blocks of the second conductive layer 12, because the electrode blocks on each conductive layer are in close contact, that is, there is no gap between adjacent electrochromic units, the transmittance of the entire area of ​​the electrochromic layer 10 changes. At this time, there is no obvious light-dark boundary in the display image viewed by the user through the electrochromic module 100 , which is conducive to providing the user with a better visual experience.

[0043] See also Figure 10 The head-mounted device 1 of the present embodiment includes a frame 200 and an electrochromic module 100. The frame 200 is provided with a mounting position 20, into which the electrochromic module 100 is secured. The electrochromic module 100 is configured to change its transmittance, thereby varying the intensity of ambient light passing through the module 100 and reaching the eyes, thereby preventing excessive ambient light from affecting the user's visual experience. In some embodiments, there are two mounting positions 20, one for each eye of the user.

[0044] Please also refer to Figure 10 and Figure 11In some embodiments, the head-mounted device 1 further includes a thin film transistor array 300 and a driver chip 400 electrically connected to the thin film transistor array 300. The thin film transistor array 300 is located on a side of the first conductive layer 11 away from the electrochromic layer 10. The driver chip 400 is embedded in the frame 200 and is used to drive the thin film transistor array 300 to transmit different voltages to multiple electrode blocks. The drain of each transistor in the thin film transistor array 300 is electrically connected to each electrode block in the first conductive layer 11 to independently control the voltage received by each electrode block. Each electrode block in the second conductive layer 12 is used to receive a fixed voltage, thereby regulating the transmittance of at least a certain area of ​​the electrochromic layer 10.

[0045] In other embodiments, different from the above embodiments, the thin film transistor array 300 is located on the side of the second conductive layer 12 away from the electrochromic layer 10, and the drain of each transistor in the thin film transistor array 300 is electrically connected to each electrode block in the second conductive layer 12 to independently control the voltage received by each electrode block. Each electrode block in the first conductive layer 11 is used to receive a fixed voltage, thereby regulating the transmittance of at least a certain area of ​​the electrochromic layer 10.

[0046] The head-mounted device 1 can be a photochromic glasses or an AR glasses. When the head-mounted device 1 is a photochromic glasses, the user can use the head-mounted device 1 to adapt to the changes in the external ambient light, so that the user can see the environment of a part of the field of view clearly while preventing the excessively bright ambient light from irritating the eyes. When the head-mounted device 1 is an AR glasses, the head-mounted device 1 also includes an optical waveguide structure, which is located on the side of the electrochromic module 100 away from the human eye or close to the human eye, and is used to transmit the virtual image generated in the head-mounted device 1 to the human eye. The head-mounted device 1 changes the transmittance of a part of the electrochromic layer by controlling the magnitude of the voltage received by some electrode blocks in the electrochromic module 100, thereby improving the contrast between the virtual image and the real image in the display screen of the AR glasses, which is beneficial for the user to see clear virtual images and real images of the outside world at the same time when exposed to different external ambient light.

[0047] Please also refer to Figure 12 and Figure 13 The present invention also provides a method for manufacturing an electrochromic module, comprising the following steps: S1, providing a first substrate layer 13, and dividing a surface of the first substrate layer 13 into a first region and a second region joined to each other; S2, laminating a shielding material on the first area to form a shielding layer 16, coating a p-type semiconductor material on the second area to form a first p-type electrode block 111, and then removing the shielding layer 16; S3, a shielding material is applied to the surface of the first p-type electrode block 111 away from the first substrate layer 13 to form a shielding layer 16, an n-type semiconductor material is coated on the first region to form the first n-type electrode block 112, and then the shielding layer 16 is removed; the first p-type electrode block 111 and the first n-type electrode block 112 are spliced ​​together to form the first conductive layer 11; S4, coating an electrochromic material on a side of the first conductive layer 11 away from the first substrate layer 13 to form an electrochromic layer 10; S5, repeating S1 to S3 to produce a stacked second substrate layer 14 and a second conductive layer 12, wherein the second conductive layer 12 includes a second p-type electrode block 121 and a second n-type electrode block 122 spliced ​​together; S6 , laminating the electrochromic layer 10 and the second conductive layer 12 to form the electrochromic module 100 .

[0048] In step S2 , the masking material is an adhesive tape with good acid, alkali and high temperature resistance to ensure that the masking layer 16 will not be corroded or damaged during the process of coating the p-type semiconductor material on the second region.

[0049] The step of laminating the shielding material on the first area to form the shielding layer 16 includes: S21, cleaning the surface of the first substrate layer 13; S22, cutting the tape so that the tape has the same shape as the first area; S23 , laminating the cut tape on the first area to form a shielding layer 16 .

[0050] In step S21 , particles on the surface of the first substrate layer 13 are removed by blowing with a dust-free cloth, compressed air or nitrogen, or the surface of the first substrate layer 13 is cleaned by ultrasonic cleaning.

[0051] In step S23 , the adhesive tape is manually attached to the first area to form a shielding layer 16 , and the shielding layer 16 completely overlaps with the first area.

[0052] The step of removing the shielding layer 16 after coating the p-type semiconductor material on the second area to form the first p-type electrode block 111 includes: Applying a p-type semiconductor material to the second region by sputtering or evaporation to form a first p-type electrode block 111; The shielding layer 16 is removed by manual operation or by ultraviolet irradiation to decompose the shielding layer 16 .

[0053] In step S3, a shielding material is adhered to the surface of the first p-type electrode block 111 away from the first substrate layer 13 in the same manner as in step S2 to form a shielding layer 16, and an n-type semiconductor material is coated on the second area by sputtering or evaporation to form the first n-type electrode block 112, and then the shielding layer 16 is manually removed.

[0054] In step S4, the step of coating the electrochromic material on the side of the first conductive layer 11 away from the first substrate layer 13 to form the electrochromic layer 10 includes: S41, setting an isolation frame 15 around the edge of the first conductive layer 11, wherein the height of the isolation frame 15 is greater than the thickness of the first conductive layer 11; S42, coating an electrochromic material on the surface of the first conductive layer 11 to form an electrochromic layer 10; S43, removing the isolation frame 15.

[0055] The electrochromic material is in solid or liquid form. The isolation frame 15 is used to prevent the electrochromic material from overflowing from the edge of the first conductive layer 11 during the process of coating the electrochromic material on the surface of the first conductive layer 11 .

[0056] When the electrochromic material is in solid state, the electrochromic material is coated on the surface of the first conductive layer 11 by a coating machine to form the electrochromic layer 10 .

[0057] When the electrochromic material is in liquid form, the electrochromic material is dropped onto the surface of the first conductive layer 11 through a dropper until the electrochromic material completely fills the surface of the first conductive layer 11 , and then the electrochromic material is solidified to form the electrochromic layer 10 .

[0058] In step S5, the division of the first area and the second area on the surface of the second substrate layer 14 may be the same as or different from the division of the first area and the second area on the surface of the first substrate layer 13, so that the distribution of the second p-type electrode block 121 and the second n-type electrode block 122 in the formed second conductive layer 12 is the same as or different from the distribution of the first p-type electrode block 111 and the first n-type electrode block 112 in the first conductive layer 11.

[0059] In step S6 , after cleaning the surfaces of the electrochromic layer 10 and the second conductive layer 12 , the electrochromic layer 10 and the second conductive layer 12 are bonded together by gel or solid electrolyte to form the electrochromic module 100 .

[0060] In the electrochromic module 100 fabricated using the above method, adjacent electrode blocks within each conductive layer are in contact with each other, but due to the presence of a PN junction, the electrode blocks do not interfere with each other. This allows the transmittance of the entire electrochromic layer 10 to be altered. This eliminates the need for a user to experience visual fatigue by observing a distinct light-dark boundary in the display through the electrochromic module 100.

[0061] Those skilled in the art should recognize that the above embodiments are merely intended to illustrate the present application and are not intended to limit the present application. As long as they are within the spirit of the present application, appropriate changes and modifications to the above embodiments are within the scope of protection claimed in the present application.

Claims

1. An electrochromic module, characterized in that: include: The first conductive layer includes a first p-type electrode block and a first n-type electrode block spliced ​​together; The second conductive layer includes a second p-type electrode block and a second n-type electrode block spliced ​​together; as well as an electrochromic layer, located between the first conductive layer and the second conductive layer; The first p-type electrode block, the first n-type electrode block, the second p-type electrode block, and the second n-type electrode block are used to control the transmittance of at least a certain area of ​​the electrochromic layer based on a driving voltage.

2. The electrochromic module according to claim 1, wherein: The first conductive layer includes a plurality of first p-type electrode blocks and a plurality of first n-type electrode blocks, and the first p-type electrode blocks and the first n-type electrode blocks are alternately spliced ​​along any direction; and The second conductive layer includes a plurality of second p-type electrode blocks and a plurality of second n-type electrode blocks, and the second p-type electrode blocks and the second n-type electrode blocks are alternately spliced ​​along any direction.

3. The electrochromic module according to claim 1, wherein: The first conductive layer includes a plurality of first p-type electrode blocks and a plurality of first n-type electrode blocks. The plurality of first p-type electrode blocks and the plurality of first n-type electrode blocks are arranged in an alternating array perpendicular to the thickness direction of the first conductive layer, and each first p-type electrode block is adjacent to two or more first n-type electrode blocks. as well as The second conductive layer includes a plurality of second p-type electrode blocks and a plurality of second n-type electrode blocks. In the direction perpendicular to the thickness of the second conductive layer 11, the plurality of second p-type electrode blocks and the plurality of second n-type electrode blocks are arranged in an alternating array, and each second p-type electrode block is adjacent to two or more second n-type electrode blocks.

4. The electrochromic module according to claim 1, wherein: One of the first p-type electrode block and the first n-type electrode block is spliced ​​around the other electrode block; and One of the second p-type electrode block and the second n-type electrode block surrounds the other electrode block.

5. The electrochromic module according to claim 1, wherein: The orthographic projections of the first p-type electrode block and the second p-type electrode block on the electrochromic layer completely overlap, and the orthographic projections of the first n-type electrode block and the second n-type electrode block on the electrochromic layer completely overlap; or The orthographic projections of the first p-type electrode block and the second n-type electrode block on the electrochromic layer completely overlap, and the orthographic projections of the first n-type electrode block and the second p-type electrode block on the electrochromic layer completely overlap.

6. The electrochromic module according to claim 1, wherein: The orthographic projections of the first p-type electrode block and the second p-type electrode block or the second n-type electrode block on the electrochromic layer at least partially overlap; and / or The orthographic projections of the first n-type electrode block and the second n-type electrode block or the second p-type electrode block on the electrochromic layer at least partially overlap.

7. The electrochromic module according to claim 1, wherein: The electrochromic module further includes a first substrate layer and a second substrate layer. The first substrate layer is located on a side of the first conductive layer away from the electrochromic layer, and the first substrate layer is located on a side of the second conductive layer away from the electrochromic layer.

8. The electrochromic module according to claim 1, wherein: The first p-type electrode block and the second p-type electrode block both include lithium nickelate, and the first n-type electrode block and the second n-type electrode block both include lithium strontium scandium oxide.

9. A head-mounted device, characterized in that: include: A frame with a mounting position; as well as The electrochromic module according to any one of claims 1 to 8 is fixed in the mounting position.

10. The head mounted device according to claim 9, wherein: The head-mounted display device also includes a thin-film transistor array, which is located on a side of one of the first conductive layer and the second conductive layer away from the electrochromic layer. Multiple electrode blocks of the other conductive layer of the first conductive layer and the second conductive layer are used to receive a fixed voltage. The drain of each transistor in the thin-film transistor array is electrically connected to each electrode block respectively to independently control the voltage received by each electrode block, thereby regulating the transmittance of at least a certain area of ​​the electrochromic layer.

11. A method for manufacturing an electrochromic module, characterized in that: The steps include: Step 1: providing a first substrate layer, and dividing a surface of the first substrate layer into a first area and a second area that are connected to each other; Step 2: Laminating a shielding material on the first area to form a shielding layer, coating a p-type semiconductor material on the second area to form a first p-type electrode block, and then removing the shielding layer; Step 3: Laminating the shielding material to the surface of the first p-type electrode block away from the first substrate layer to form the shielding layer, coating the first region with an n-type semiconductor material to form the first n-type electrode block, and then removing the shielding layer; splicing the first p-type electrode block and the first n-type electrode block together to form a first conductive layer; Step 4: coating an electrochromic material on a side of the first conductive layer away from the first substrate layer to form an electrochromic layer; Step 5: Repeat steps 1 to 3 to produce a second base material layer and a second conductive layer stacked together, wherein the second conductive layer includes a second p-type electrode block and a second n-type electrode block spliced ​​together; and Step six: Laminating the electrochromic layer and the second conductive layer to form the electrochromic module.

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