Manual adjustment type large-target-surface high-resolution extreme ultraviolet spectrum measuring device

Abstract

The invention discloses a manual adjustment type large-target-surface high-resolution extreme ultraviolet spectrum measuring device which is characterized in that a first cavity and a second cavity are connected through a vacuum straight-through pipe, the second cavity and a third cavity are connected through a welded corrugated pipe, and the interiors of the three cavities are all ultra-vacuum environments; the side wall of the first cavity is provided with a vacuum system connection sealing structure, and a slit is formed in the cavity; a grating is arranged in the second cavity; the third cavity is fixed on the rocker translation table, and a photosensitive device is arranged in the third cavity; and the image collector is arranged behind the photosensitive device. According to the device, spectrums are separated by using the imaging grating with a high scale number and a long optical path of 565mm in a vacuum system, high-sensitivity extreme ultraviolet spectrum measurement is carried out by combining a position-adjustable 80mm large-target surface light sensing device, and 1 / 1000 wavelength resolution extreme ultraviolet spectrum measurement can be realized in a range of 1 to 6 nanometers or 5 to 30 nanometers.

Description

Technical Field

[0001] The present invention relates to the field of extreme ultraviolet spectrum precision measurement, in particular to a manually adjustable large-target high-resolution extreme ultraviolet spectrum measurement device. Background Art

[0002] Spectroscopy is the most precise method for measuring the structural properties of matter. Spectrometers, the instruments used to measure this information, are currently among the most important test instruments in fields such as materials characterization and chemical analysis. They are widely used for calibrating EUV light sources in areas such as integrated circuit design and semiconductor processing. High-resolution EUV spectrometers are also essential instruments for cutting-edge basic research in ultrafast physics, precision measurement physics, condensed matter physics, nanomaterials science, and coherent diffraction imaging. Different types of EUV spectrometers, such as monochromators and broadband spectrometers, are required for EUV light source calibration, depending on the beam generation method (e.g., synchrotron radiation, free electron laser, plasma radiation, or high-harmonic radiation). In the field of EUV ultrafast spectroscopy, the development of new EUV spectroscopic methods, such as gas high-harmonic spectroscopy, attosecond transient absorption spectroscopy, and attosecond transient reflectance spectroscopy, presents new opportunities and challenges for precise measurements of material structure and state evolution. However, the imaging distance of traditional integrated imaging extreme ultraviolet gratings is usually set at 237 mm, the imaging target surface is about 24 mm, and the spectral resolution is only 1 / 100 wavelength. Its precision spectral measurement scale has great limitations and barriers. At present, companies such as Hitachi and Shimadzu have developed 1 / 1000 wavelength high-resolution gratings, but their imaging distance is set at 565 mm, and the effective area of ​​spectral imaging is more than 76 mm, which exceeds the imaging target surface of most high-resolution charge-coupled devices and scientific-grade complementary metal oxide semiconductor devices (common target surface sizes such as 1024*1024, 2048*2048, 4096*4096). Therefore, there is no relevant mature and complete high-resolution extreme ultraviolet spectrometer system that can fully exert the excellent performance of this type of grating. In order to break through this limitation, there is an urgent need for a high-resolution extreme ultraviolet spectrometer with a compact structure, complete functions, vacuum environment-friendly, cost-effective and flexible adjustment of the imaging target surface. From basic research on high-resolution extreme ultraviolet space and time to cutting-edge semiconductor lithography optical detection, this high-resolution extreme ultraviolet spectrometer is of great significance in meeting the needs of precise measurement of extreme ultraviolet spectra in various related fields. Summary of the Invention

[0003] In order to meet the requirements of high-resolution extreme ultraviolet spectrometer design with compact structure, flexible imaging target surface control and high cost-effectiveness, this patent provides a measurement device that uses a high-line grating with 1 / 1000 wavelength resolution to separate the spectrum, an 80 mm large-target microchannel plate image intensifier or a scientific-grade complementary metal oxide semiconductor extreme ultraviolet camera for imaging, connects the extreme ultraviolet detector and the grating spectrometer system by welding bellows, and combines the vacuum imaging device adjustment structure to accurately adjust the angle and position of the photosensitive surface of the photosensitive device, thereby realizing the precise measurement and collection of extreme ultraviolet spectral data with a time resolution of attoseconds.

[0004] The object of the present invention is achieved through the following technical solutions: a manually adjustable large target surface high-resolution extreme ultraviolet spectrum measurement device, the device comprising: a first cavity, a second cavity, a third cavity, a rocker translation stage and an image collector;

[0005] The first cavity and the second cavity are connected by a vacuum straight-through pipe, and the second cavity and the third cavity are connected by a welded bellows, and the interiors of the three cavities are all ultra-vacuum environments;

[0006] The side wall of the first cavity has a vacuum system connection sealing structure, and a slit is installed in the cavity; the second cavity is equipped with a grating; the third cavity is fixed on the rocker translation stage and is equipped with a photosensitive device; the image collector is placed behind the photosensitive device.

[0007] Furthermore, the slit is an adjustable mechanical slit or a nano-piezoelectric electric slit.

[0008] Furthermore, the grating is a reflective soft X-ray field layered replica diffraction grating with an imaging distance of 565 mm, 3600 scribed lines, a wavelength range of 1 to 6 nanometers, and a gold-plated surface, or a reflective soft X-ray field layered replica diffraction grating with an imaging distance of 565 mm, 700 scribed lines, a wavelength range of 5 to 30 nanometers, and a gold-plated surface; gratings with different detection ranges are installed on a nano-piezoelectric displacement stage and are controlled by a vacuum feedthrough connector installed on the cavity wall to realize the function of switching the grating.

[0009] Furthermore, the photosensitive device is a device consisting of an 80 mm large-target microchannel plate image intensifier and a fluorescent screen, or a deep-cooled scientific-grade complementary metal oxide semiconductor extreme ultraviolet camera; according to different installation methods of the photosensitive device, the third cavity is equipped with two models.

[0010] Furthermore, a hand rocker is installed on the rocker translation platform for adjusting the position of the third cavity.

[0011] Furthermore, the image collector is a complementary metal oxide semiconductor camera.

[0012] Furthermore, the second cavity is equipped with a molecular pump for creating an ultra-high vacuum environment.

[0013] Furthermore, an incident light hole is left on the front of the first cavity, and a vacuum connection structure is left around it for connecting to a tightening vacuum quick-release flange, thereby connecting to the extreme ultraviolet light source to be detected.

[0014] Beneficial effects of the present invention:

[0015] This device uses a grating-type spectrum measurement scheme, diffracting different wavelengths of the light to be measured into different regions of space through a grating. These wavelengths are then measured on a photosensitive device, thereby determining the spectrum of the light to be measured. The device also uses an adjustable position photosensitive device, which can be adjusted to the corresponding spatial region according to the wavelength range of the light to be measured using a rocker translation stage. Compared to fixed photosensitive devices that can only detect spatial regions within their own size, adjustable position photosensitive devices can overcome the limitations of the photosensitive device's own size on the detection spatial region, thereby expanding the wavelength range of spectral measurement.

[0016] This device uses a high-resolution grating with a large imaging distance of 565 mm, which can achieve precise spectral measurement with high spatial resolution at the 10-micron level; the detectable wavelength range covers 1 to 30 nanometers, which can realize measurement of a wide spectral range of extreme ultraviolet light sources.

[0017] This device uses a rocker translation stage. Through its mechanical handle, lead screw, slide rail and other structures, it can realize the position control of the photosensitive device outside the vacuum. Compared with the device that uses a complex displacement platform inside the vacuum, it reduces the dependence on the internal vacuum components, effectively reduces the cost, improves the stability of the system's mechanical structure, and makes spectral measurement simpler and more convenient. By accurately controlling the relative position of the photosensitive device and the spectrum to be measured through the adjustable structure, more accurate and comprehensive spectral data collection can be carried out according to the application conditions of different experimental scenarios.

[0018] This device uses an 80mm large target surface microchannel plate image intensifier as a detection device. Through the 80mm large spatial detection area, it can achieve one-time measurement of the entire band of grating diffraction, greatly improving the measurement efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the specific implementation methods and working principles of the present invention, the following is a brief introduction to the drawings required for the description of the specific implementation methods and working principles. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0020] Figure 1 This is a schematic diagram of an embodiment of the present invention using a microchannel plate image intensifier and a fluorescent screen as a photosensitive device.

[0021] Figure 2 This is a schematic diagram of an embodiment of the present invention using a deep-cooled scientific-grade complementary metal oxide semiconductor extreme ultraviolet camera as a photosensor.

[0022] Figure 3 Schematic diagram of the working principle of the reflective diffraction grating used in the present invention for measuring spectral components.

[0023] Figure 4 This is a schematic diagram of the third cavity and the photosensitive device when a microchannel plate image intensifier and a fluorescent screen are used as the photosensitive device.

[0024] Figure 5 Schematic diagram of the third cavity and photosensitive device when a deep-cooled scientific-grade complementary metal oxide semiconductor extreme ultraviolet camera is used as the photosensitive device.

[0025] In the figure, 1. first cavity, 2. vacuum straight-through tube, 3. second cavity, 4. reflective diffraction grating, 5. welded bellows, 6. joystick translation stage, 7. third cavity, 8. complementary metal oxide semiconductor camera, 9. molecular pump, 10. light to be detected, 11. photosensitive device, 12. diffracted light. DETAILED DESCRIPTION

[0026] The specific embodiments of the present invention are further described in detail below with reference to the accompanying drawings.

[0027] like Figure 1 As shown, the present invention provides a manually adjustable large-target high-resolution extreme ultraviolet spectrum measurement device, which includes a first cavity 1, a vacuum straight-through tube 2, a second cavity 3, a reflective diffraction grating 4, a welded bellows 5, a rocker translation stage 6, and a third cavity 7; an incident light hole is left on the front of the first cavity 1, and an adjustable slit is installed inside; the second cavity 3 is connected to a molecular pump 9 for creating an ultra-high vacuum environment, and a reflective diffraction grating 4 is installed in the cavity; the third cavity 7 is fixed on the rocker translation stage 6, and a photosensitive device 11 is installed in the cavity. The position of the third cavity 7 can be adjusted by the hand rocker of the translation stage, thereby accurately adjusting the position of the spectral target surface receiving light; a complementary metal oxide semiconductor camera 8 is placed behind the third cavity 7 for collecting spectral data; the first cavity 1 and the second cavity 3 are connected by the vacuum straight-through tube 2, and the second cavity 3 and the third cavity 7 are connected by the welded bellows 5, and the interiors of the three cavities are an ultra-high vacuum environment.

[0028] When the device is working, the extreme ultraviolet light source is connected to the device, and the molecular pump 9 is turned on to create an ultra-high vacuum environment inside the cavity. The light to be measured is incident into the first cavity 1 and passes through the adjustable slit. Here, the light can be specifically screened by adjusting the slit width to improve the resolution of the final spectral measurement result; then the light is incident on the reflective diffraction grating 4 through the vacuum straight tube 2, and the spectrum is separated by the grating, and the light to be measured in different bands is diffracted into different spatial regions; finally, the diffracted light with the separated spectrum is incident on the photosensitive device 11 in the third cavity 7 through the welded bellows 5, and the intensity of the light signal to be measured is amplified by the 80 mm large target microchannel plate image intensifier, and after the light-to-electric signal conversion on the fluorescent screen, the spectral data information is recorded by the complementary metal oxide semiconductor camera 8. When the 80 mm large target microchannel plate image intensifier and the fluorescent screen are used as the photosensitive device, the third cavity is selected as follows Figure 4 In the model shown, the microchannel plate image intensifier and the phosphor screen are installed inside the third cavity.

[0029] A vacuum connection structure is left around the incident light hole, which can be connected to a tightening vacuum quick-release flange to facilitate access to the extreme ultraviolet light source to be detected. It is suitable for vacuum environments of various extreme ultraviolet light sources.

[0030] The adjustable slit is an adjustable mechanical slit or a nano-piezoelectric electric slit.

[0031] The grating is a reflective soft X-ray layered replica diffraction grating with an imaging distance of 565 mm, 3600 scribed lines, a wavelength range of 1 to 6 nanometers, and a gold-plated surface, or a reflective soft X-ray layered replica diffraction grating with an imaging distance of 565 mm, 700 scribed lines, a wavelength range of 5 to 30 nanometers, and a gold-plated surface; gratings with different detection ranges are mounted on a nano-piezoelectric displacement stage fixed at the bottom of the second cavity and are controlled by a vacuum feedthrough connector installed on the wall of the second cavity to achieve the function of switching the gratings.

[0032] like Figure 2 As shown, the device can also replace the photosensitive device 11 with a deep-cooled scientific-grade complementary metal oxide semiconductor extreme ultraviolet camera from a microchannel plate image intensifier and a fluorescent screen, and the third cavity can be selected as follows: Figure 5 The model shown in the figure connects an extreme ultraviolet camera to the rear of the third cavity, which can simultaneously realize the two functions of photosensitivity and spectral data collection. The basic workflow of the device remains unchanged, so it still has the characteristics of convenience, stability, high spectral resolution, and wide spectral measurement range.

[0033] The basic working principle of this device is as follows Figure 3 As shown, the light 10 to be detected passes through the aforementioned devices and is incident on the reflective diffraction grating 4. The reflective diffraction grating 4 diffracts the incident light according to the following diffraction formula:

[0034] d sinθ=kλ,

[0035] Where d is the grating constant, θ is the angle between the incident light and the diffracted light, k is the diffraction order, and λ is the wavelength of the light. As can be seen from this formula, components of different wavelengths in the light to be detected 10 are diffracted by the reflective diffraction grating 4 at different angles, so the components will be separated in space (e.g. Figure 3 By numerically processing the results recorded by the complementary metal oxide semiconductor camera 8, a spectral image of the light to be detected 10 can be obtained.

[0036] As can be seen from the aforementioned operating principle, if the wavelength span of the components of the light to be detected 10 is large, the corresponding spatial span of the diffracted light 12 will also be large, even exceeding the effective size of the image acquisition device. To address this issue, the present device uses a welded bellows 5 to connect the second cavity 3 with the imaging module containing the photosensitive device 11 and the third cavity 7, allowing the imaging module to be freely moved according to measurement requirements. By shaking the handle of the joystick translation stage 6, the position of the photosensitive device 11 and the third cavity 7 can be adjusted, thereby measuring the components of the light to be detected 10 in different wavelength bands.

[0037] Those skilled in the art will readily appreciate other embodiments of the present application after considering the specification and practicing the contents disclosed herein. This application is intended to cover any variations, uses, or adaptations of the present application that follow the general principles of the present application and include common knowledge or customary techniques in the art not disclosed herein. The description and examples are to be considered merely as exemplary, and the true scope and spirit of the present application are indicated by the claims.

[0038] It should be understood that the above general description and detailed description are merely exemplary and illustrative and do not limit the present application. The present application is not limited to the precise structure described above and shown in the accompanying drawings, and various modifications and changes may be made without departing from the scope of the present application. The scope of the present application is limited only by the appended claims.

Claims

1. A manually adjustable large-target high-resolution extreme ultraviolet spectrum measurement device, characterized in that: The device comprises: a first cavity, a second cavity, a third cavity, a rocker translation stage and an image collector; The first cavity and the second cavity are connected by a vacuum straight-through pipe, and the second cavity and the third cavity are connected by a welded bellows, and the interiors of the three cavities are all ultra-vacuum environments; The side wall of the first cavity has a vacuum system connection sealing structure, and a slit is installed in the cavity; the second cavity is equipped with a grating; the third cavity is fixed on the rocker translation stage and is equipped with a photosensitive device; the image collector is placed behind the photosensitive device.

2. The manually adjustable large-target high-resolution extreme ultraviolet spectrum measuring device according to claim 1, characterized in that: The slit is an adjustable mechanical slit or a nano-piezoelectric electric slit.

3. The manually adjustable large-target high-resolution extreme ultraviolet spectrum measuring device according to claim 1, characterized in that: The grating is a reflective soft X-ray layered replica diffraction grating with an imaging distance of 565 mm, 3600 scribed lines, a wavelength range of 1 to 6 nanometers, and a gold-plated surface, or a reflective soft X-ray layered replica diffraction grating with an imaging distance of 565 mm, 700 scribed lines, a wavelength range of 5 to 30 nanometers, and a gold-plated surface; gratings with different detection ranges are installed on a nano-piezoelectric displacement stage and are controlled by a vacuum feedthrough connector installed on the cavity wall to achieve the function of switching the grating.

4. The manually adjustable large-target high-resolution extreme ultraviolet spectrum measuring device according to claim 1, characterized in that: The photosensitive device is a device consisting of an 80 mm large-target microchannel plate image intensifier and a fluorescent screen, or a deeply cooled scientific-grade complementary metal oxide semiconductor extreme ultraviolet camera; the 80 mm large-target microchannel plate image intensifier and the fluorescent screen are installed inside the third cavity, and the deeply cooled scientific-grade complementary metal oxide semiconductor extreme ultraviolet camera is connected to the rear of the third cavity.

5. The manually adjustable large-target high-resolution extreme ultraviolet spectrum measuring device according to claim 1, characterized in that: A hand rocker is installed on the rocker translation platform for adjusting the position of the third cavity.

6. The manually adjustable large-target high-resolution extreme ultraviolet spectrum measuring device according to claim 1, characterized in that: The image collector is a complementary metal oxide semiconductor camera.

7. The manually adjustable large-target high-resolution extreme ultraviolet spectrum measuring device according to claim 1, characterized in that: The second cavity is equipped with a molecular pump for creating an ultra-high vacuum environment.

8. The manually adjustable large-target high-resolution extreme ultraviolet spectrum measuring device according to claim 1, characterized in that: An incident light hole is left on the front of the first cavity, and a vacuum connection structure is left around it for connecting to a tightening vacuum quick-release flange, thereby connecting to the extreme ultraviolet light source to be detected.

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