Coil component

Abstract

The present invention relates to a coil component that improves process conditions when forming a coil pattern of an upper layer without using a dummy pattern. A coil component (1) is provided with: a coil pattern (110) having an innermost peripheral turn (112) and a turn (113b) adjacent thereto; and a coil pattern (210) having an innermost peripheral turn (212) and a turn (213b) adjacent thereto. The innermost peripheral turn (212) includes: a section (212A) extending along the section (112A) of the innermost peripheral turn (112) so as to overlap the section (112A); a section (212B) that extends along the section (112B) of the innermost turn (112) so as to overlap the section (112B), and that increases the interval between the section (212B) and the turn (213b) as the section (212B) advances in the winding direction from the outer peripheral end toward the inner peripheral end; and a section (212C) that does not overlap with the innermost turn (112), and that reduces the interval with the turn (213b) as the section advances in the winding direction from the outer peripheral end toward the inner peripheral end.

Description

Technical Field

[0001] The present disclosure relates to a coil component, and more particularly, to a coil component having a plurality of coil patterns stacked via an insulating layer. Background Art

[0002] Patent Document 1 discloses a chip-type coil component having two coil patterns stacked with an insulating layer. The coil component described in Patent Document 1 adds a dummy pattern to the lower coil pattern to prevent unevenness of the insulating layer caused by the lower coil pattern from deteriorating process conditions when forming the upper coil pattern.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Laid-Open No. 2020-202392 Summary of the Invention

[0006] Technical problem to be solved by the invention

[0007] However, if a dummy pattern is added to the coil pattern, there is a problem in that the high-frequency characteristics are affected, for example, by reflection of the signal due to the dummy pattern.

[0008] The present disclosure describes a technique for improving process conditions when forming an upper layer coil pattern without using a dummy pattern in a coil component having a plurality of coil patterns stacked via an insulating layer.

[0009] Technical solutions to technical problems

[0010] The coil component involved in one aspect of the present disclosure comprises: a first coil pattern, which is wound multiple turns in a spiral shape; and a second coil pattern, which is stacked on the first coil pattern via an insulating layer and is wound multiple turns in a spiral shape, the first coil pattern includes a first turn located at the innermost circumference and a second turn adjacent to the first turn, the second coil pattern includes a third turn located at the innermost circumference and a fourth turn adjacent to the third turn, the first turn includes: a first section, the interval between it and the second turn is a first distance; and a second section, which is located closer to the inner peripheral end than the first section, the interval between it and the second turn is larger than the first distance, and as it proceeds in the winding direction from the outer peripheral end to the inner peripheral end along the first coil pattern, the interval between it and the second turn increases, the third turn includes: a third section The fourth interval is located closer to the inner peripheral end than the third interval, extends along the second interval of the first turn so as to overlap with the second interval of the first turn as viewed from the stacking direction, and the interval between it and the fourth turn is larger than the first distance, and the interval between it and the fourth turn increases as the winding direction from the outer peripheral end to the inner peripheral end along the second coil pattern; and the fifth interval is located closer to the inner peripheral end than the fourth interval, does not overlap with the first turn as viewed from the stacking direction, and the interval between it and the fourth turn decreases as the winding direction from the outer peripheral end to the inner peripheral end along the second coil pattern.

[0011] Another aspect of the present disclosure relates to a coil component comprising: a first coil pattern, which is wound in a spiral shape with a plurality of turns; and a second coil pattern, which is stacked on the first coil pattern via an insulating layer and is wound in a spiral shape with a plurality of turns, the first coil pattern including a first turn located at the outermost periphery and a second turn adjacent to the first turn, the second coil pattern including a third turn located at the outermost periphery and a fourth turn adjacent to the third turn, the first turn including: a first section, the interval between which and the second turn is a first distance; and a second section, which is located closer to the outer peripheral end than the first section, the interval between which and the second turn is larger than the first distance, and the interval between which and the second turn increases as the winding direction from the inner peripheral end to the outer peripheral end of the first coil pattern progresses, the third turn including: a third section The interval, the interval between which and the fourth turn is the first distance, extends along the first interval of the first turn in a manner overlapping with the first interval of the first turn when viewed from the stacking direction; the fourth interval, which is located closer to the outer peripheral end side than the third interval, extends along the second interval of the first turn in a manner overlapping with the second interval of the first turn when viewed from the stacking direction, and the interval between it and the fourth turn is larger than the first distance, and the interval between it and the fourth turn increases as the winding direction from the inner peripheral end to the outer peripheral end along the second coil pattern; and the fifth interval, which is located closer to the outer peripheral end side than the fourth interval, does not overlap with the first turn when viewed from the stacking direction, and the interval between it and the fourth turn decreases as the winding direction from the inner peripheral end to the outer peripheral end along the second coil pattern.

[0012] Effects of the Invention

[0013] According to the present disclosure, it is possible to provide a technology for improving process conditions when forming an upper layer coil pattern without using a dummy pattern in a coil component having a plurality of coil patterns stacked via an insulating layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic perspective view showing the appearance of a coil component 1 according to one embodiment of the technology disclosed herein.

[0015] Figure 2 It is a schematic plan view for explaining the pattern shape of the conductive layer 100 .

[0016] Figure 3 It is a schematic plan view of the insulating layer 10 .

[0017] Figure 4 It is a schematic plan view for explaining the pattern shape of the conductive layer 200 .

[0018] Figure 5 It is a schematic plan view of the insulating layer 20 .

[0019] Figure 6 It is a schematic plan view for explaining the pattern shape of the conductive layer 300 .

[0020] Figure 7 It is a schematic plan view of the insulating layer 30 .

[0021] Figure 8 is an equivalent circuit diagram of the coil component 1.

[0022] Figure 9 It is a schematic enlarged view showing a state where the coil pattern 110 and the coil pattern 210 are overlapped.

[0023] Figure 10 It is a diagram for explaining the pattern shape of a comparative example.

[0024] Figure 11 Is used to illustrate Figure 10 A schematic cross-sectional view illustrating problems of the comparative example shown.

[0025] Figure 12 Is used to illustrate Figure 10 A schematic cross-sectional view illustrating problems of the comparative example shown.

[0026] Figure 13 It is a schematic plan view for explaining the pattern shape of a conductor layer 200A according to a modification.

[0027] Explanation of symbols:

[0028] 1 Coil components

[0029] 2 body

[0030] 10, 20, 30 insulation layers

[0031] Openings 11-15, 21-26, 31-34

[0032] 41 Photoresist

[0033] 41a Poorly exposed part

[0034] 42 photomask

[0035] 43 Light

[0036] 100, 200, 200A, 300 conductor layers

[0037] 110, 210 coil patterns

[0038] 111, 211 outermost circle

[0039] Sections 111A-111C, 112A-112C, 211A-211D, and 212A-212D

[0040] 112, 212 innermost circle

[0041] 113, 213 middle turns

[0042] 113a, 213a from the second turn of the outermost circle

[0043] 113b, 213b from the second turn of the innermost circle

[0044] 113c The third turn from the innermost circle

[0045] 114, 214, 325a, 326a lead-out parts

[0046] 121-125, 221-226, 321-326 connection patterns

[0047] E1~E4 terminal electrodes

[0048] P and Q areas

[0049] S1~S4、S11、S12、S21、S22 interval DETAILED DESCRIPTION

[0050] Below, with reference to the attached Figure 1 The embodiments of the technology disclosed in the present invention will be described in detail.

[0051] Figure 1It is a schematic perspective view showing the appearance of a coil component 1 according to one embodiment of the technology disclosed herein.

[0052] The coil component 1 of the first embodiment is a surface mount chip component that functions as a common mode filter. Figure 1 As shown, the element body 2 is provided with four terminal electrodes E1 to E4 embedded in the element body 2. As will be described later, three conductive layers 100, 200, and 300 stacked with insulating layers interposed therebetween are embedded in the element body 2.

[0053] Figure 2 It is a schematic plan view for explaining the pattern shape of the conductive layer 100 .

[0054] The conductor layer 100 is the bottommost conductor layer and has a spiral coil pattern 110 and connection patterns 121 to 125. Figure 2 In the example shown, coil pattern 110 has approximately 12 turns, including an outermost turn 111, an innermost turn 112, and intermediate turns 113. Intermediate turns 113 are located between turn 113a, adjacent to outermost turn 111 and second from the outermost, and turn 113b, adjacent to innermost turn 112 and second from the innermost. Intermediate turns 113 have approximately 10 turns. The outer end of coil pattern 110 is connected to connection pattern 121 via lead portion 114. The inner end of coil pattern 110 is connected to connection pattern 125. While coil pattern 110 is wound clockwise (rotating clockwise) from the outer end to the inner end, lead portion 114 is not wound clockwise (rotating clockwise) but extends linearly from the outer end to the inner end in the -X direction. Connection patterns 122-124 are provided separately and are not connected to other conductor patterns within conductor layer 100.

[0055] The outermost turn 111 of the coil pattern 110 includes sections 111A and 111B. Section 111A extends along the second turn 113a from the outermost circumference, and the interval S1 between the section 111A and the second turn 113a from the outermost circumference is approximately constant. Section 111B is located closer to the outermost end of section 111A, and the interval between the section 111B and the second turn 113a from the outermost circumference increases as the coil pattern 110 is wound from the inner circumference toward the outer circumference. The interval S2 between section 111B and the second turn 113a from the outermost circumference is larger than the interval S1 between section 111A and the second turn 113a from the outermost circumference.

[0056] The innermost turn 112 of the coil pattern 110 includes sections 112A and 112B. Section 112A extends along the second turn 113b from the innermost circumference, and the interval S3 between the second turn 113b and the innermost circumference is approximately constant. Section 112B is located closer to the innermost end than section 112A, and the interval between the second turn 113b and the innermost circumference increases as the coil pattern 110 is wound from the outer circumference toward the inner circumference. The interval S4 between section 112B and the second turn 113b from the innermost circumference is larger than the interval S3 between section 112A and the second turn 113b from the innermost circumference. Intervals S1 and S3 may also be equal in size.

[0057] Figure 3 It is a schematic plan view of the insulating layer 10 .

[0058] The insulating layer 10 is located between the conductive layer 100 and the conductive layer 200 and has openings 11 to 15. The openings 11 to 15 are provided at positions where the connection patterns 121 to 125 are exposed, respectively.

[0059] Figure 4 It is a schematic plan view for explaining the pattern shape of the conductive layer 200 .

[0060] The conductor layer 200 includes a spiral coil pattern 210 and connection patterns 221 to 226. Figure 4 In the example shown, coil pattern 210 has approximately 12 turns, including outermost turns 211, innermost turns 212, and intermediate turns 213, which are located between the second-largest turn 213a from the outermost turn and the second-largest turn 213b from the innermost turn. Intermediate turns 213 have approximately 10 turns. In other words, the number of turns of coil pattern 110 and coil pattern 210 is approximately the same. Even if there is a difference in the number of turns between coil pattern 110 and coil pattern 210 due to factors such as the position of the lead portion, the difference in the number of turns between coil pattern 110 and coil pattern 210 is preferably 1 / 2 turn or less to ensure the function as a common mode filter.

[0061] The outer end of coil pattern 210 is connected to connection pattern 222 via lead portion 214. The inner end of coil pattern 210 is connected to connection pattern 226. Coil pattern 210 is wound clockwise (rotating clockwise) from the outer end to the inner end, while lead portion 214 extends linearly from the outer end to the inner end in the +X direction. Connection patterns 221, 223, 224, and 225 are provided separately and are not connected to other conductor patterns within conductor layer 200. Connection patterns 221-225 are connected to connection patterns 121-125, respectively, via openings 11-15 provided in insulating layer 10.

[0062] The outermost turn 211 of the coil pattern 210 includes sections 211A, 211B, 211C, and 211D. Section 211A is a section with a substantially constant interval S1 from the second turn 213a from the outermost circumference. Section 211A extends along section 111A of the coil pattern 110, overlapping with section 111A of the coil pattern 110 when viewed in the stacking direction, i.e., the Z-direction. Section 211B is located closer to the outermost side of section 211A and extends along section 111B of the coil pattern 110, overlapping with section 111B of the coil pattern 110 when viewed in the stacking direction, i.e., the Z-direction. Furthermore, the interval S2 from the second turn 213a from the outermost circumference of section 211B increases as section 211B advances in the winding direction from the inner circumference toward the outer circumference of the coil pattern 210. Section 211C is located closer to the outer peripheral end than section 211B and does not overlap with the outermost turn 111 of coil pattern 110 when viewed in the stacking direction, i.e., the Z direction. The interval between section 211C and the second turn 213a from the outermost circumference decreases as the coil pattern 210 is wound from the inner peripheral end toward the outer peripheral end. Section 211D is located closer to the outer peripheral end than section 211C and does not overlap with the outermost turn 111 of coil pattern 110 when viewed in the stacking direction, i.e., the Z direction. The interval S1 between section 211C and the second turn 213a from the outermost circumference decreases as the coil pattern 210 is wound from the inner peripheral end toward the outer peripheral end.

[0063] The innermost turn 212 of the coil pattern 210 includes sections 212A, 212B, 212C, and 212D. Section 212A is a section with a substantially constant interval S1 from the second innermost turn 213b. Section 212A extends along section 112A of the coil pattern 110, overlapping with section 112A of the coil pattern 110 when viewed in the stacking direction, i.e., the Z-direction. Section 212B is located closer to the innermost end of section 212A and extends along section 112B of the coil pattern 110, overlapping with section 112B of the coil pattern 110 when viewed in the stacking direction, i.e., the Z-direction. Furthermore, section 212B increases in interval S4 from the second innermost turn 213b as it advances in the winding direction from the outermost end toward the innermost end of the coil pattern 210. Section 212C is located closer to the innermost circumferential end than section 212B and does not overlap with the innermost turn 112 of coil pattern 110 when viewed in the stacking direction, i.e., the Z direction. The interval between section 212C and the second-from-innermost turn 213b decreases as the coil pattern 210 is wound from the outer circumferential end toward the inner circumferential end. Section 212D is located closer to the innermost circumferential end than section 212C and does not overlap with the innermost turn 112 of coil pattern 110 when viewed in the stacking direction, i.e., the Z direction. The interval S1 between section 212D and the second-from-innermost turn 213b is substantially constant.

[0064] Figure 5 It is a schematic plan view of the insulating layer 20 .

[0065] The insulating layer 20 is located between the conductive layer 200 and the conductive layer 300 and has openings 21 to 26. The openings 21 to 26 are provided at positions where the connection patterns 221 to 226 are exposed, respectively.

[0066] Figure 6 It is a schematic plan view for explaining the pattern shape of the conductive layer 300 .

[0067] Conductive layer 300 includes connection patterns 321 to 326. Connection patterns 321 to 326 are connected to connection patterns 221 to 226, respectively, via openings 21 to 26 provided in insulating layer 20. Connection pattern 325 is connected to connection pattern 323 via lead portion 325a. Connection pattern 326 is connected to connection pattern 324 via lead portion 326a.

[0068] Figure 7 It is a schematic plan view of the insulating layer 30 .

[0069] The insulating layer 30 is the uppermost insulating layer and has openings 31 to 34. The openings 31 to 34 are provided at positions where the connection patterns 321 to 324 are exposed. Figure 1 The terminal electrodes E1 to E4 shown are connected to the connection patterns 321 to 324 via the openings 31 to 34 , respectively.

[0070] With this structure, the outer peripheral end of the coil pattern 110 is connected to the terminal electrode E1, the outer peripheral end of the coil pattern 210 is connected to the terminal electrode E2, the inner peripheral end of the coil pattern 110 is connected to the terminal electrode E3, and the inner peripheral end of the coil pattern 210 is connected to the terminal electrode E4. Figure 8 As shown, the coil pattern 110 connected between the terminal electrode E1 and the terminal electrode E3 is coupled to the coil pattern 210 connected between the terminal electrode E2 and the terminal electrode E4.

[0071] Figure 9 It is a schematic enlarged view showing a state where the coil pattern 110 and the coil pattern 210 are overlapped.

[0072] like Figure 9As shown, the planar position of section 111A of the outermost turn 111 of coil pattern 110 and the planar position of section 211A of the outermost turn 211 of coil pattern 210, when viewed in the stacking direction, i.e., the Z-direction, are approximately identical, and the two substantially completely overlap. Similarly, the planar position of section 111B of the outermost turn 111 of coil pattern 110 and the planar position of section 211B of the outermost turn 211 of coil pattern 210, when viewed in the stacking direction, i.e., the Z-direction, are approximately identical, and the two substantially completely overlap. Outermost turn 111 of coil pattern 110 is located further outward than section 111B and is connected to lead portion 114 via section 111C, which extends from section 111B in the same direction as section 111B.

[0073] On the other hand, the outermost turn 211 of the coil pattern 210 is bent radially outward at a substantially right angle between the section 211B and the section 211C. As a result, the section 111C of the outermost turn 111 of the coil pattern 110 does not overlap with the coil pattern 210. The sections 211C and 211D of the coil pattern 210 also do not overlap with the coil pattern 110.

[0074] like Figure 9 As shown, the planar position of section 112A of the innermost turn 112 of coil pattern 110 and the planar position of section 212A of the innermost turn 212 of coil pattern 210, viewed in the stacking direction, i.e., the Z-direction, are substantially aligned, and the two substantially completely overlap. Similarly, the planar position of section 112B of the innermost turn 112 of coil pattern 110 and the planar position of section 212B of the innermost turn 212 of coil pattern 210, viewed in the stacking direction, i.e., the Z-direction, are substantially aligned, and the two substantially completely overlap. The innermost turn 112 of coil pattern 110 is located closer to the innermost end than section 112B and is connected to connection pattern 125 via section 112C, which extends from section 112B in the same direction as section 112B.

[0075] On the other hand, the innermost turn 212 of the coil pattern 210 is bent radially inward at a substantially right angle between the sections 212B and 212C. Consequently, the section 112C of the innermost turn 112 of the coil pattern 110 does not overlap with the coil pattern 210. Sections 212C and 212D of the coil pattern 210 also do not overlap with the coil pattern 110.

[0076] Figure 10 2 is a diagram for explaining the pattern shape of a comparative example, showing a case where the outermost circumference 211 of the coil pattern 210 does not have the sections 211B and 211C, and the innermost circumference 212 of the coil pattern 210 does not have the sections 212B and 212C. Figure 10 In the comparative example shown, the coil pattern 210 located in the upper layer has a simple spiral shape.

[0077] like Figure 10 As shown, when the coil pattern 210 is a simple spiral shape and the innermost turn 212 of the coil pattern 210 does not have intervals 212B and 212C, when viewed from above in the Z direction, an area P is formed in which the planar position of the innermost turn 112 of the coil pattern 110 and the planar position of the innermost turn 212 of the coil pattern 210 gradually separate as the winding direction proceeds from the outer end toward the inner end.

[0078] Figure 11 and Figure 12 Is used to illustrate Figure 10 The schematic cross-sectional view of the problem of the comparative example shown is taken along Figure 10 The process diagram of the cross-section position of line AA is shown.

[0079] like Figure 11 As shown, when the coil pattern 210 is formed on the surface of the insulating layer 10 covering the coil pattern 110, a photoresist 41 is formed on the surface of the insulating layer 10, and then the photoresist 41 is irradiated with exposure light 43 through a photomask 42. Figure 10 In the cross section taken along line AA, the interval S12 between the second turn 113b from the innermost circumference and the innermost circumference turn 112 is slightly larger than the interval S11 between the turns constituting the intermediate turn 113. In contrast, with respect to the openings of the photomask 42, the interval S21 between the openings for forming the turns constituting the intermediate turn 213 is substantially the same as the interval S22 between the opening for forming the second turn 213b from the innermost circumference and the opening for forming the innermost circumference turn 212.

[0080] When exposure is performed through photomask 42 under these conditions, light 43 is irradiated directly above the second and third innermost turns 113b, 113c, respectively. Conversely, light 43 is irradiated from directly above the innermost turn 112, slightly radially outward. Since the surface of insulating layer 10 is not completely flat and the portion overlapping with coil pattern 110 has a slightly convex surface, light 43 irradiated from directly above the innermost turn 112, slightly outward, is reflected radially outward by the convex surface of insulating layer 10.

[0081] The results, such as Figure 12 As shown, in the developed pattern of the photoresist 41, the bottom of the opening pattern for forming the innermost circumference 212 expands radially outward as indicated by reference numeral 41a. Therefore, when the innermost circumference 212 is formed using such a developed pattern, the pattern width of the innermost circumference 212 partially expands radially outward. This local expansion of the pattern width of the innermost circumference 212 may cause a short circuit failure with the second circumference 213b from the innermost circumference.

[0082] In contrast, in this embodiment, if Figure 9 As shown, the plane position of the innermost circumference 112 of the coil pattern 110 and the plane position of the innermost circumference 212 of the coil pattern 210 are not gradually separated. The innermost circumference 212 of the coil pattern 210 is bent at a substantially right angle between the interval 212B and the interval 212C. In this portion, the innermost circumference 112 of the coil pattern 110 and the innermost circumference 212 of the coil pattern 210 are greatly separated when viewed from above. Therefore, it is not easy to produce Figure 11 and Figure 12 Thus, the process conditions for forming the coil pattern 210 are relaxed.

[0083] Furthermore, even if some exposure failure occurs in the area near the substantially right-angled sections 212B and 212C, this area is sufficiently spaced from the second turn 213b from the innermost circumference, making it less likely for a short circuit to occur in this area. The same applies to the area near the substantially right-angled sections 211B and 211C of the outermost circumference 211. Even if some exposure failure occurs in this area, this area is sufficiently spaced from the second turn 213a from the outermost circumference, making it less likely for a short circuit to occur.

[0084] As described above, the coil component 1 of this embodiment is less susceptible to exposure defects caused by uneven surfaces of the insulating layer 10 because the coil pattern 210 located on the upper layer is not a simple spiral shape and includes sections 211B and 212B that are spaced apart from adjacent turns toward the outer or inner circumference, and sections 211C and 212C that are close to adjacent turns toward the outer or inner circumference. This makes it possible to provide a highly reliable product. Furthermore, since dummy patterns are not required, there is no degradation of high-frequency characteristics.

[0085] Figure 13 It is a schematic plan view for explaining the pattern shape of a conductor layer 200A according to a modification.

[0086] Figure 13 The conductor layer 200A of the modified example shown in FIG. 1 is not bent at a right angle between the innermost circumference 212 and the interval 212B and the interval 212C, but transitions smoothly. The outermost circumference 211 does not have the interval 211B and the interval 211C and the interval S1 between the second circumference turn 213a from the outermost circumference is substantially constant. Figure 4 The conductor layer 200 shown in FIG. 2 has a different pattern shape. The other basic structures are the same as Figure 4 The conductor layer 200 shown has the same pattern shape, and therefore the same elements are denoted by the same reference numerals, and redundant descriptions are omitted.

[0087] exist Figure 13 In FIG, a portion of the planar position of the innermost turn 112 of the coil pattern 110 is indicated by a dotted line. Figure 13 In the example shown, because the transition between section 212B and section 212C is smooth, a region Q is formed in which the planar position of the innermost turn 112 of coil pattern 110 and the planar position of the innermost turn 212 of coil pattern 210 gradually separate as the winding direction progresses from the outer peripheral end toward the inner peripheral end. Therefore, although exposure defects are likely to occur in region Q, this region Q is sufficiently spaced from the second turn 213b from the innermost circumference, so even if some exposure defects occur, a short circuit will not occur.

[0088] Figure 13 In the illustrated variation, it is not essential that the innermost turn 212 bends at a substantially right angle between the sections 212B and 212C, and a smooth transition is possible. Furthermore, it is not essential that the outermost turn 211 has sections 211B and 211C, and the interval S1 between the turn 213a second from the outermost turn 211 may be substantially constant.

[0089] While the embodiments of the technology of the present disclosure have been described above, the technology of the present disclosure is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit and scope thereof, and such modifications are naturally included in the technical scope of the present disclosure.

[0090] The technology disclosed herein includes the following configuration examples, but is not limited thereto.

[0091] The coil component involved in one aspect of the present disclosure comprises: a first coil pattern, which is wound multiple turns in a spiral shape; and a second coil pattern, which is stacked on the first coil pattern via an insulating layer and is wound multiple turns in a spiral shape, the first coil pattern includes a first turn located at the innermost circumference and a second turn adjacent to the first turn, the second coil pattern includes a third turn located at the innermost circumference and a fourth turn adjacent to the third turn, the first turn includes: a first section, the interval between it and the second turn is a first distance; and a second section, which is located closer to the inner peripheral end than the first section, the interval between it and the second turn is larger than the first distance, and as it proceeds in the winding direction from the outer peripheral end to the inner peripheral end along the first coil pattern, the interval between it and the second turn increases, the third turn includes: a third section The fourth section is located closer to the innermost edge of the second coil pattern than the third section, extends along the second section of the first turn so as to overlap with the first section of the first turn as viewed in the stacking direction, and is spaced farther from the fourth turn than the first distance. The spacing between the fourth section and the fourth turn increases as the second coil pattern winds from the outermost edge toward the innermost edge. The fifth section is located closer to the innermost edge of the fourth section, does not overlap with the first turn as viewed in the stacking direction, and decreases in spacing from the fourth turn as the second coil pattern winds from the outermost edge toward the innermost edge. This reduces the risk of short circuits at the innermost turn of the second coil pattern.

[0092] In the coil component described above, the third turn may further include a sixth section located closer to the inner peripheral end than the fifth section and spaced apart from the fourth turn by the first distance.

[0093] Another aspect of the present disclosure relates to a coil component comprising: a first coil pattern, which is wound in a spiral shape with a plurality of turns; and a second coil pattern, which is stacked on the first coil pattern via an insulating layer and is wound in a spiral shape with a plurality of turns, the first coil pattern including a first turn located at the outermost periphery and a second turn adjacent to the first turn, the second coil pattern including a third turn located at the outermost periphery and a fourth turn adjacent to the third turn, the first turn including: a first section, the interval between which and the second turn is a first distance; and a second section, which is located closer to the outer peripheral end than the first section, the interval between which and the second turn is larger than the first distance, and the interval between which and the second turn increases as the winding direction from the inner peripheral end to the outer peripheral end of the first coil pattern progresses, the third turn including: a third section The first section has a first distance between it and the fourth turn, and extends along the first section of the first turn so as to overlap with the first section of the first turn as viewed in the stacking direction. The fourth section is located on the outer peripheral side of the third section, extends along the second section of the first turn so as to overlap with the second section of the first turn as viewed in the stacking direction, and is spaced farther from the fourth turn than the first distance. The spacing between the fourth turn and the fourth turn increases as the second coil pattern is wound from the inner peripheral end to the outer peripheral end. The fifth section is located on the outer peripheral side of the fourth section, does not overlap with the first turn as viewed in the stacking direction, and decreases in spacing from the fourth turn as the second coil pattern is wound from the inner peripheral end to the outer peripheral end. This reduces the risk of short circuit failures at the outermost turn of the second coil pattern.

[0094] In the coil component described above, the third turn may further include a sixth section located closer to the outer peripheral end than the fifth section and spaced apart from the fourth turn by a first distance.

[0095] In the coil component described above, the first turn of the first coil pattern may further include a seventh section extending in the direction in which the second section extends, and the seventh section may not overlap with the second coil pattern when viewed in the stacking direction.

[0096] In the coil component described above, the second coil pattern may be bent at a substantially right angle between the fourth section and the fifth section. This reduces the likelihood of formation defects of the second coil pattern in the region between the fourth section and the fifth section.

Claims

1. A coil component, wherein: have: a first coil pattern wound in a spiral shape with a plurality of turns; and a second coil pattern, which is stacked on the first coil pattern via an insulating layer and is wound in a spiral shape with a plurality of turns; The first coil pattern includes a first turn located at the innermost circumference and a second turn adjacent to the first turn. The second coil pattern includes a third turn located at the innermost circumference and a fourth turn adjacent to the third turn. The first turn comprises: a first interval having a first distance therebetween from the second turn; and The second section is located closer to the inner peripheral end than the first section, and the interval between the second turn and the second section is larger than the first distance, and the interval between the second turn and the second section increases as the winding direction from the outer peripheral end toward the inner peripheral end of the first coil pattern progresses. The third turn comprises: a third section, which is spaced a first distance from the fourth turn and extends along the first section of the first turn so as to overlap with the first section of the first turn when viewed in the stacking direction; a fourth section located closer to the inner peripheral end than the third section, extending along the second section of the first turn so as to overlap with the second section of the first turn as viewed in the stacking direction, and having a spacing from the fourth turn greater than the first distance, and increasing in the winding direction from the outer peripheral end toward the inner peripheral end along the second coil pattern; as well as The fifth section is located closer to the inner peripheral end than the fourth section, does not overlap with the first turn when viewed in the stacking direction, and the distance between the fifth section and the fourth turn decreases as the winding direction from the outer peripheral end toward the inner peripheral end of the second coil pattern progresses.

2. The coil component according to claim 1, wherein The third turn further includes a sixth section located closer to the inner peripheral end than the fifth section, and having a first distance between the sixth section and the fourth turn.

3. A coil component, wherein: have: a first coil pattern wound in a spiral shape with a plurality of turns; and a second coil pattern, which is stacked on the first coil pattern via an insulating layer and is wound in a spiral shape with a plurality of turns; The first coil pattern includes a first turn located at the outermost circumference and a second turn adjacent to the first turn. The second coil pattern includes a third turn located at the outermost circumference and a fourth turn adjacent to the third turn. The first turn comprises: a first interval having a first distance therebetween from the second turn; and The second section is located closer to the outer peripheral end than the first section, and the interval between the second turn and the second section is larger than the first distance, and the interval between the second turn and the second section increases as the winding direction from the inner peripheral end toward the outer peripheral end of the first coil pattern progresses. The third turn comprises: a third section, the interval between which and the fourth turn is the first distance, extending along the first section of the first turn so as to overlap with the first section of the first turn when viewed in the stacking direction; a fourth section located closer to the outer peripheral end than the third section, extending along the second section of the first turn so as to overlap with the second section of the first turn as viewed in the stacking direction, and having a spacing from the fourth turn greater than the first distance, and increasing in the winding direction from the inner peripheral end toward the outer peripheral end along the second coil pattern; as well as The fifth section is located closer to the outer peripheral end than the fourth section, does not overlap with the first turn when viewed in the stacking direction, and the interval between the fifth section and the fourth turn decreases as the winding direction from the inner peripheral end toward the outer peripheral end of the second coil pattern progresses. The coil component according to claim 3 , wherein: The third turn further includes a sixth section located closer to the outer peripheral end than the fifth section, and having a first distance between the sixth section and the fourth turn.

5. The coil component according to any one of claims 1 to 4, wherein The first turn of the first coil pattern further includes a seventh section extending along the extending direction of the second section. The seventh section does not overlap with the second coil pattern when viewed from the stacking direction. The coil component according to claim 5 , wherein The second coil pattern is bent at a substantially right angle between the fourth section and the fifth section.

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