Deposition apparatus for improving measurement accuracy of substrate position

Abstract

The invention discloses a deposition device. A deposition apparatus according to one aspect of the present invention may comprise: a deposition chamber for providing a deposition space; a first plate separable from an upper side of the deposition chamber; a second plate supported by the first plate and disposed on the upper side of the first plate; the six-degree-of-freedom platform is connected to the second plate, passes through the first plate and extends to the deposition space; the fixing unit is arranged on the lower side of the six-degree-of-freedom platform and is used for fixing a substrate for deposition of deposition particles; a first support portion extending from the second plate to the deposition space and configured to support a mask opposed to the substrate; a camera arranged on the first plate and used for confirming the position of the substrate; and a light source portion disposed on a lower side of the fixing unit and configured to irradiate light, the light of the light source portion being capable of passing through the substrate and being transmitted to the camera.

Description

Technical Field

[0001] The present invention relates to a deposition technology, and more particularly, to a deposition device for improving the measurement accuracy of a substrate position. Background Art

[0002] In recent years, the demand for organic light-emitting diodes (OLEDs) in the display market has grown significantly. In particular, in the TV and smartphone display markets, demand for higher resolution and larger OLED displays is growing.

[0003] The core process in the manufacturing of high-resolution organic light-emitting diodes (OLEDs) used to create these displays is the deposition process for producing RGB pixels. This process involves heating organic material through a deposition source located at the bottom of a chamber, causing the heated organic material to sublime. The sublimated organic material is then deposited onto a substrate through a mask, forming a thin-film transistor (TFT).

[0004] Furthermore, in order to realize a high-resolution display using such a thin film transistor, the thin film transistor needs to be deposited in a manner that reduces its size.

[0005] However, when there is a slight curvature of such a substrate, there is a problem of reduced deposition quality during the deposition process of thin film transistors with smaller sizes.

[0006] Furthermore, as the size of a substrate decreases while achieving higher resolution of a display, there is a need to more accurately adjust the position of the substrate. Summary of the Invention

[0007] Problems to be solved by the invention

[0008] The present invention aims to solve the above-mentioned problem, and an object of the present invention is to provide a deposition device that precisely adjusts the position of a substrate by precisely measuring the position of the substrate.

[0009] Problems of the present invention are not limited to the above-mentioned problems, and other unmentioned problems can be clearly understood by those skilled in the art through the following description.

[0010] Means used to solve problems

[0011] According to one aspect of the present invention, a deposition device is provided, comprising: a deposition chamber for providing a deposition space; a first plate capable of being separated from the upper side of the deposition chamber; a second plate supported by the first plate and arranged on the upper side of the first plate; a six-degree-of-freedom platform connected to the second plate, passing through the first plate and extending to the deposition space; a fixing unit arranged on the lower side of the six-degree-of-freedom platform and fixing a substrate for depositing particles; a first supporting portion extending from the second plate to the deposition space and used to support a mask opposite to the substrate; a camera arranged on the first plate and used to confirm the position of the substrate; and a light source portion arranged on the lower side of the fixing unit and used to irradiate light; light from the light source portion passes through the substrate and is transmitted to the camera.

[0012] At this time, the camera may include: a shell, which is configured on the camera anti-vibration part; a light receiving part, which is configured inside the shell and is used to receive light from the light source part; and a reflecting part, which is connected to the first supporting part and is used to reflect the light from the light source part and guide it to the light receiving part.

[0013] At this time, the reflecting part may include: a first reflecting part, which is arranged on the lower side of the light source part; and a second reflecting part, which is separated from the first reflecting part and is arranged on the lower side of the shell; and the light from the light source part passes through the substrate, the first reflecting part and the second reflecting part in sequence and is transmitted to the light receiving part.

[0014] At this time, the deposition device may further include: a camera anti-vibration portion disposed between the first plate and the camera and configured to prevent vibration of the first plate from being transmitted to the camera.

[0015] At this time, the deposition device may further include: a third plate, arranged on the upper side of the second plate; a vibration-proof portion, arranged between the first plate and the second plate, and used to prevent the vibration of the first plate from being transmitted to the second plate; a second support portion, extending from either the second plate or the third plate to the deposition space, and moving along the up and down directions of the deposition chamber; and a magnetic portion, connected to the second support portion, and arranged on the upper side of the fixed unit.

[0016] At this time, the mask is made of metal material, and when the magnetic part moves and approaches the fixing unit, the magnetic part can attract the mask.

[0017] In addition, according to another aspect of the present invention, a deposition device is provided, including: a deposition chamber for providing a deposition space; a first plate capable of being separated from the upper side of the deposition chamber; a second plate supported by the first plate and arranged on the upper side of the first plate; a six-degree-of-freedom platform connected to the second plate, passing through the first plate and extending to the deposition space; a fixing unit arranged on the lower side of the six-degree-of-freedom platform and used to fix a substrate for depositing particles; a first supporting portion extending from the second plate to the deposition space and used to support a mask opposite to the substrate; a camera arranged on the second plate to prevent vibration of the first plate from being transmitted and used to confirm the position of the substrate; and a light source portion arranged below the substrate and used to irradiate light that passes through the substrate and is transmitted toward the camera.

[0018] In this case, the light source unit may be disposed on the first supporting portion so as to be located below the mask.

[0019] In this case, the light source unit may be disposed inside the camera, and a reflective unit for reflecting light from the light source unit may be disposed on an upper side of the mask, and the light reflected by the reflective unit may be transmitted to the camera.

[0020] In this case, a fixing unit hole for allowing light from the light source to pass therethrough may be formed in the fixing unit.

[0021] At this time, the substrate can have: a first area, in which a pattern of metal material is formed; and a second area surrounding the outside of the first area, with a third area formed in a part of the second area to allow light to pass through, and the light source part, the camera and the third area are arranged in a row.

[0022] At this time, the deposition device may further include: a vibration-proof portion disposed between the first plate and the second plate and configured to prevent vibration of the first plate from being transmitted to the second plate.

[0023] At this time, the deposition device may further include: a third plate, arranged on the upper side of the second plate; a second support portion, extending from either the second plate or the third plate to the deposition space, and moving along the up and down directions of the deposition chamber; and a magnetic portion, connected to the second support portion and arranged on the upper side of the fixed unit.

[0024] Effects of the Invention

[0025] According to the above configuration, the deposition apparatus according to the embodiment of the present invention can precisely control the alignment of the substrate by precisely measuring the position of the substrate.

[0026] Furthermore, since vibration is prevented from being transmitted to the camera, the position of the substrate can be precisely measured by the camera.

[0027] Furthermore, since the flatness of the substrate is improved by preventing the substrate from being bent, a high-resolution display can be realized.

[0028] Furthermore, according to the deposition apparatus of the embodiment of the present invention, the path of light can be minimized by using light transmitted through the substrate, thereby precisely measuring the position of the substrate.

[0029] Furthermore, as the position of the substrate is precisely measured, the alignment of the substrate can be precisely controlled. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 FIG. 1 is a diagram schematically showing a deposition apparatus according to an embodiment of the present invention.

[0031] Figure 2 FIG. 1 is a diagram focusing on the interior of a deposition apparatus according to an embodiment of the present invention.

[0032] Figure 3 1 is a perspective view showing a state in which a camera and a camera anti-vibration portion of a deposition apparatus according to an embodiment of the present invention are arranged on a first plate.

[0033] Figure 4 is a diagram illustrating a state in which a position of a substrate is measured by a camera in a state in which the substrate and a mask are spaced apart from each other in a deposition apparatus according to an embodiment of the present invention.

[0034] Figure 5 1 is a diagram illustrating a state in which a position of a substrate is measured by a camera in a state in which a substrate and a mask are close to each other in a deposition apparatus according to an embodiment of the present invention.

[0035] Figure 6 FIG. 1 is a diagram schematically showing a deposition apparatus according to another embodiment of the present invention.

[0036] Figure 7 FIG. 1 is a diagram focusing on the interior of a deposition apparatus according to another embodiment of the present invention.

[0037] Figure 8 1 is a perspective view showing a state in which a camera and a camera anti-vibration portion of a deposition apparatus according to another embodiment of the present invention are arranged on a first plate.

[0038] Figure 9 FIG. 1 is a diagram illustrating a state in which light from a light source portion of a deposition apparatus according to another embodiment of the present invention is transmitted to a camera.

[0039] Figure 10 is a plan view illustrating a substrate applied to a deposition apparatus according to another embodiment of the present invention.

[0040] Figure 11FIG. 1 is a diagram illustrating a state in which light from a light source portion of a deposition apparatus according to yet another embodiment of the present invention is transmitted to a camera.

[0041] 100: Deposition device 110: Deposition chamber

[0042] 210: First plate 220: Second plate

[0043] 221: First support part 240: Six-degree-of-freedom platform

[0044] 250: Fixing unit 255: Light source

[0045] 300: Camera DETAILED DESCRIPTION

[0046] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily implement the present invention. The present invention can be implemented in various forms and is not limited to the embodiments described herein. To clearly illustrate the present invention, portions not relevant to the description are omitted from the accompanying drawings, and the same reference numerals are assigned to the same or similar components throughout the specification.

[0047] The words and terms used in this specification and claims are not limited to the usual or dictionary meanings, but should be interpreted as meanings and concepts that are consistent with the technical ideas of the present invention based on the principle that inventors can define terms and concepts to explain their own inventions in the best way.

[0048] Therefore, the embodiments described in this specification and the structures shown in the drawings are only preferred embodiments of the present invention and do not represent all technical ideas of the present invention. Therefore, the structure can be replaced by various equivalents and modifications at the time of application of the present invention.

[0049] It should be understood that in this specification, terms such as "including" or "having" are intended to illustrate the existence of the features, numbers, steps, actions, constituent elements, parts or their combinations described in this specification, without excluding in advance the existence or additional possibilities of one or more other features or numbers, steps, actions, constituent elements, parts or their combinations.

[0050] Unless otherwise specified, a component being “located in front of,” “behind,” “above,” or “below” another component includes being directly in contact with, and positioned “in front of,” “behind,” “above,” or “below” the other component, as well as being positioned between the other component. Furthermore, unless otherwise specified, a component being “connected to” another component includes not only being directly connected but also being indirectly connected.

[0051] Hereinafter, a deposition apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings.

[0052] Figure 1 FIG. 1 is a diagram schematically showing a deposition apparatus according to an embodiment of the present invention.

[0053] Reference Figure 1 , a deposition apparatus 100 according to an embodiment of the present invention includes a deposition chamber 110 , a deposition source 120 , and an alignment apparatus 200 .

[0054] The deposition chamber 110 provides a deposition space 110a for depositing particles on a substrate. The deposition chamber 110 is generally in a cubic shape. However, the deposition chamber 110 is not limited to a cubic shape and may also adopt various shapes for providing the deposition space 110a.

[0055] Furthermore, the deposition chamber 110 is made of metal. However, the deposition chamber 110 is not limited to being made of metal, and may also be made of various materials (such as rigid plastic).

[0056] Furthermore, the deposition space 110 a of the deposition chamber 110 maintains a vacuum atmosphere. Furthermore, the deposition chamber 110 is connected to a vacuum pump (not shown) for maintaining the vacuum atmosphere. Furthermore, the vacuum pump can be installed outside or inside the deposition chamber 110 .

[0057] The deposition chamber 110 includes a lower portion 111, an upper portion 112, and a plurality of side portions 113. The lower portion 111 is flat. Furthermore, according to various embodiments of the present invention, the lower portion 111 can be positioned on the ground at predetermined intervals. The upper portion 112 is positioned above and opposite the lower portion 111. The plurality of side portions 113 are positioned between the lower portion 111 and the upper portion 112.

[0058] The deposition source 120 is disposed at the lower side 111 of the deposition chamber 110. Furthermore, the deposition source 120 is used to contain a deposition material, which is converted into deposition particles by heat. The deposition material can be organic or metal. Furthermore, the deposition particles can be liquid or solid deposition material that has been vaporized or sublimated.

[0059] Furthermore, the deposition source 120 is provided with a heating unit (not shown) for heating the deposition material. Furthermore, the heating unit may be in the shape of a coil. Furthermore, the heating unit may receive power and generate heat by resistance or electromagnetic induction.

[0060] Furthermore, the deposition source 120 may be provided with a driving unit (not shown) for moving within the deposition chamber 110. The deposition source 120 moves within the deposition chamber 110 to appropriately spray the deposition particles onto the substrate. Furthermore, when the deposition source 120 moves below the deposition chamber 110, vibrations caused by the movement of the deposition source 120 may be transmitted to the deposition chamber 110.

[0061] The alignment device 200 is used to align the positions of the substrate and the mask. Furthermore, the alignment device 200 is placed on the upper portion 112 of the deposition chamber 110 and accommodated in the deposition space 110a of the deposition chamber 110. A latching portion 112a for latching the alignment device 200 is formed on the upper portion 112, and an insertion hole 112b is formed on the upper portion 112 for partially inserting the alignment device 200 into the deposition space 110a.

[0062] Thus, the alignment device 200 can be accommodated in the deposition space 110 a through the upper portion 112 of the deposition chamber 110 , or can be easily separated from the deposition chamber 110 through the upper portion 112 for maintenance or repair.

[0063] The alignment device 200 will be described in detail later with reference to the accompanying drawings.

[0064] Figure 2 is a diagram focusing on the interior of a deposition apparatus according to an embodiment of the present invention, Figure 3 1 is a perspective view showing a state in which a camera and a camera anti-vibration portion of a deposition apparatus according to an embodiment of the present invention are arranged on a first plate.

[0065] Reference Figure 2 and Figure 3 The alignment device 200 of the deposition device according to an embodiment of the present invention includes: a first plate 210, a second plate 220, a third plate 230, a six-degree-of-freedom platform 240, a fixing unit 250, a first supporting part 221, an anti-vibration part 280, a camera 300 and a camera anti-vibration part 290.

[0066] The first plate 210 is placed on the upper side 112 of the deposition chamber (see Figure 1 The first plate 210 is in a flat plate shape. Also, the first plate 210 may be fixed to the upper side of the deposition chamber 110 or may be separated from the upper side of the deposition chamber 110 .

[0067] Thus, when the first plate 210 is separated from the upper side of the deposition chamber 110 , there is an advantage that the interior of the deposition chamber 110 can be easily maintained and serviced.

[0068] At this time, the area of ​​the first plate 210 is larger than the insertion hole 112b (refer to Figure 1 The first plate 210 serves to maintain the vacuum state of the deposition chamber 110 by closing the insertion hole 112b.

[0069] The second plate 220 is supported by the first plate 210. The second plate 220 is disposed on an upper side of the first plate 210. The second plate 220 is spaced apart from the first plate 210 and disposed in parallel.

[0070] The third plate 230 is disposed on the upper side of the second plate 220. In addition, the third plate 230 is spaced apart from and disposed in parallel with the second plate 220. In this case, the third plate 230 can be supported by the second plate 220.

[0071] The six-degree-of-freedom platform 240 includes a connection portion 241 connected to the second plate 220 . That is, the six-degree-of-freedom platform 240 is supported on the second plate 220 via the connection portion 241 .

[0072] The 6DOF platform 240 extends through the first plate 210 and into the deposition space 110a. Furthermore, the 6DOF platform 240 can adjust the position of the fixing unit 250. The 6DOF platform 240 utilizes a multi-axis structure to tilt the fixing unit 250 and move it in the vertical direction, thereby adjusting the position of the substrate S fixed to the fixing unit 250.

[0073] Furthermore, although not shown in the drawings, the six-degree-of-freedom platform 240 is equipped with six linear actuators (not shown) to form a six-axis structure. The six linear actuators are driven independently.

[0074] In addition, the alignment device 200 of the deposition apparatus according to the embodiment of the present invention is provided with a position adjustment portion 245 for adjusting the position and inclination of the fixing unit 250 on a plane.

[0075] Furthermore, after the six-degree-of-freedom platform 240 performs a preliminary adjustment on the position of the fixing unit 250 , the position adjustment unit 245 performs a second adjustment on the position of the fixing unit 250 .

[0076] The fixing unit 250 is disposed on the underside of the 6-DOF platform 240. Furthermore, the fixing unit 250 may be an electrostatic chuck that utilizes static electricity to secure the substrate S. In this case, the substrate S may be made of silicon. However, the substrate S is not limited to silicon and may be made of any material that can be secured by the electrostatic force of the fixing unit 250.

[0077] The first support portion 221 extends from the second plate 220 to the deposition space 110a. On the other hand, the first support portion 221 and the vibration-proof portion 280 are spaced apart from each other and do not interfere with each other.

[0078] The first support portion 221 supports the mask M opposite to the substrate S. Furthermore, the first support portion 221 is provided with a first frame 221 a disposed below the mask M. The first frame 221 a is annular in shape so as not to interfere with the movement of the deposited particles toward the substrate S.

[0079] Furthermore, a second frame 221b is provided on the first support portion 221 and is disposed above the first frame 221a. Here, the second frame 221b supports the mask M. In addition, according to various embodiments of the present invention, the second frame 221b can fix the mask M using static electricity.

[0080] Meanwhile, the substrate S is fixed by the fixing unit 250 , but due to the load on the substrate S, the substrate S slightly deflects downward. This deflection of the substrate S may form a slightly curved portion on the substrate S. This curved portion may hinder the realization of a high-resolution display.

[0081] To solve this problem, the substrate S is moved downward by the 6-DOF platform 240 and pressurizes the mask M. As the substrate S is pressed and contacts the mask M, the curved portion of the substrate S is eliminated, thereby achieving flattening.

[0082] The anti-vibration portion 280 is disposed between the first plate 210 and the second plate 220 . That is, the first plate 210 supports the anti-vibration portion 280 , and the anti-vibration portion 280 supports the second plate 220 .

[0083] Also, the vibration-isolating portion 280 prevents vibration of the first plate 210 from being transmitted to the second plate 220 .

[0084] Thus, the vibration of the first plate 210 is prevented from being transmitted to the six-degree-of-freedom platform 240 , so that the position of the substrate S can be precisely adjusted by the six-degree-of-freedom platform 240 .

[0085] And, as Figure 3 As shown, the first plate 210 is provided with a six-degree-of-freedom platform 240 (refer to Figure 2 ) through-hole 210a.

[0086] The vibration isolation part 280 (refer to Figure 2) are provided in plurality and include a first vibration prevention portion 280a, a second vibration prevention portion 280b, a third vibration prevention portion 280c and a fourth vibration prevention portion 280d.

[0087] The plurality of anti-vibration parts 280 may be arranged at equal intervals. In addition, the plurality of anti-vibration parts 280 may be arranged symmetrically with the through hole 210a being placed in the middle. That is, the plurality of anti-vibration parts 280 may be placed in the middle of the six-degree-of-freedom platform 240 (refer to Figure 2 ) are arranged symmetrically with each other.

[0088] Thus, the plurality of vibration-proof parts 280 can disperse and absorb the first plate 210 (refer to Figure 2 ) vibration.

[0089] Furthermore, the alignment device 200 of the deposition device according to the embodiment of the present invention is provided with a second support portion 212 extending from either the second plate 220 or the third plate 230 to the deposition space 110 a and a magnetic portion 270 connected to the second support portion 212 .

[0090] The second supporting portion 212 is formed parallel to the first supporting portion 221 . Also, the second supporting portion 212 can be moved in a vertical direction of the deposition chamber 110 by a driving portion (not shown) provided on the third plate 230 .

[0091] The magnetic portion 270 is disposed above the fixing unit 250. When the second supporting portion 212 moves downward and approaches the fixing unit 250, the magnetic portion 270 attracts the mask M, thereby preventing the mask M from bending downward. In this case, the mask M is made of metal.

[0092] In addition, a mask supporting portion 260 for supporting the mask M may be provided in the alignment device 200 .

[0093] The mask support portion 260 is connected to the first support portion 221 . The mask support portion 260 is made of metal. When the magnetic portion 270 moves and approaches the fixing unit 250 , the magnetic portion 270 attracts the mask support portion 260 .

[0094] In this case, the mask M is made of a non-magnetic material. Furthermore, since the mask M is supported by the mask support portion 260 , the mask M can be prevented from being flexed.

[0095] The camera 300 is positioned on the first plate 210 and confirms the position of the substrate S. Specifically, the camera 300 confirms the position of the substrate S and determines whether the substrate S is optimally positioned during the deposition process. For example, if the substrate S is not optimally positioned, the six-degree-of-freedom platform 240 can be used to adjust the position of the substrate S. The camera 300 will be described in detail later with reference to the accompanying drawings.

[0096] The camera anti-vibration part 290 is disposed between the first plate 210 and the camera 300. That is, the first plate 210 supports the camera anti-vibration part 290, and the camera anti-vibration part 290 supports the camera 300. Figure 3 As shown, the camera anti-vibration portion 290 is configured to be separated from the anti-vibration portion 280 .

[0097] Also, the camera anti-vibration portion 290 prevents vibration of the first plate 210 from being transmitted to the camera 300 .

[0098] As described above, as the camera anti-vibration portion 290 prevents vibration from being transmitted to the camera 300 , the camera 300 can accurately measure the position of the substrate S.

[0099] Figure 4 1 is a diagram illustrating a state in which a position of a substrate is measured by a camera in a state in which a substrate and a mask are spaced apart from each other in a deposition apparatus according to an embodiment of the present invention, Figure 5 1 is a diagram illustrating a state in which a position of a substrate is measured by a camera in a state in which a substrate and a mask are close to each other in a deposition apparatus according to an embodiment of the present invention.

[0100] Reference Figure 4 and Figure 5 A light source portion 255 for irradiating light toward the substrate S is provided at the lower side of the fixing unit 250 .

[0101] The light source unit 255 is disposed adjacent to the upper side of the substrate S. Light from the light source unit 255 transmits through the substrate S and moves toward the lower side of the substrate S. Furthermore, the light source unit 255 may be an LED. Furthermore, according to various embodiments of the present invention, the light source unit 255 is not limited to an LED and may be a variety of lighting devices that output light.

[0102] As described above, since the light source unit 255 is disposed adjacent to the substrate S, the light transmission path from the light source unit 255 to the camera 300 is minimized, thereby preventing measurement errors of the substrate S.

[0103] Furthermore, the camera 300 includes a housing 310 , a light receiving unit 320 , and reflecting units 361 and 362 .

[0104] The housing 310 is disposed on the camera anti-vibration portion 290 (see Figure 3 ). In addition, a light transmission unit 330 is provided inside the housing 310, and the light transmission unit 330 is used to transmit light.

[0105] The light transmitting portion 330 may be formed of, for example, a lens.

[0106] Furthermore, the housing 310 is provided with an extension portion 311 extending downward.

[0107] The light receiving unit 320 is disposed inside the housing 310 and is configured to receive light. Furthermore, the light receiving unit 320 is configured to be connected to the light transmitting unit 330 . Thus, the light is transmitted to the light receiving unit 320 via the light transmitting unit 330 .

[0108] Furthermore, the light receiving unit 320 may measure the position of the substrate S based on the received light.

[0109] The reflecting parts 361 and 362 are connected and fixed to the first supporting part 221. However, the reflecting parts 361 and 362 are not limited to being connected and fixed to the first supporting part 211 (see Figure 2 ), which can be connected to various fixing devices and configured in the deposition chamber 110 (refer to Figure 1 ) inside.

[0110] Furthermore, the reflecting parts 361 and 362 can reflect the light from the light source part 255 and guide the light to the light receiving part 320. Furthermore, the reflecting parts 361 and 362 include a first reflecting part 361 and a second reflecting part 362.

[0111] The first reflective portion 361 is disposed below the light source 255. The first reflective portion 361 moves light traveling from the upper side to the lower side in a horizontal direction.

[0112] The second reflecting portion 362 is spaced apart from the first reflecting portion 361 and is disposed at the lower side of the housing 310. The second reflecting portion 362 moves the light transmitted in the horizontal direction from the first reflecting portion 361 upward.

[0113] Thus, the light L from the light source unit 255 passes through the first reflecting unit 361 and the second reflecting unit 362 in sequence and is transmitted to the light receiving unit 320. At this time, when the light reflected by the first reflecting unit 361 enters the housing 310, it is reflected by the third reflecting unit 340 and is transmitted to the light receiving unit 320 through the light transmitting unit 330.

[0114] And, as Figure 5As shown, the camera 300 confirms that the substrate S is configured at a set position, and the substrate S passes through the six-degree-of-freedom platform 240 (refer to Figure 2 ) moves toward the first direction ① which is the lower direction and approaches the mask M.

[0115] Figure 6 FIG. 1 is a diagram schematically showing a deposition apparatus according to another embodiment of the present invention.

[0116] Reference Figure 6 , a deposition apparatus 100 according to another embodiment of the present invention includes a deposition chamber 110 , a deposition source 120 , and an alignment apparatus 200 .

[0117] The deposition chamber 110 provides a deposition space 110a for depositing particles on a substrate. The deposition chamber 110 is generally in a cubic shape. However, the deposition chamber 110 is not limited to a cubic shape and may also be in various shapes that provide a deposition space 110a.

[0118] Furthermore, the deposition chamber 110 is made of metal. However, the deposition chamber 110 is not limited to being made of metal, and can be made of various materials (eg, rigid plastic).

[0119] Furthermore, the deposition space 110 a of the deposition chamber 110 maintains a vacuum atmosphere. Furthermore, the deposition chamber 110 is connected to a vacuum pump (not shown) for maintaining the vacuum atmosphere. Furthermore, the vacuum pump can be installed outside or inside the deposition chamber 110 .

[0120] The deposition chamber 110 includes a lower portion 111, an upper portion 112, and a plurality of side portions 113. The lower portion 111 is flat. Furthermore, according to various embodiments of the present invention, the lower portion 111 can be disposed on the ground at predetermined intervals. The upper portion 112 can be disposed above the lower portion 111 and opposite to the lower portion 111. The plurality of side portions 113 are disposed between the lower portion 111 and the upper portion 112.

[0121] The deposition source 120 is disposed at the lower side 111 of the deposition chamber 110. Furthermore, the deposition source 120 is used to contain a deposition material that is converted into deposition particles by heat. In this case, the deposition material can be organic or metal. Furthermore, the deposition particles can be liquid or solid deposition material that has been vaporized or sublimated.

[0122] Furthermore, the deposition source 120 is provided with a heating unit (not shown) for heating the deposition material. Furthermore, the heating unit may be in the shape of a coil. Furthermore, the heating unit may receive power and generate heat by resistance or electromagnetic induction.

[0123] Furthermore, the deposition source 120 may be provided with a driving unit (not shown) for moving within the deposition chamber 110. The deposition source 120 moves within the deposition chamber 110 and appropriately sprays the deposition particles onto the substrate. Furthermore, when the deposition source 120 moves below the deposition chamber 110, vibrations caused by the movement of the deposition source 120 may be transmitted to the deposition chamber 110.

[0124] The alignment device 200 is used to align the positions of the substrate and the mask. Furthermore, the alignment device 200 is placed on the upper portion 112 of the deposition chamber 110 and accommodated in the deposition space 110a of the deposition chamber 110. A latching portion 112a for latching the alignment device 200 is formed on the upper portion 112, and an insertion hole 112b is formed on the upper portion 112 for partially inserting the alignment device 200 into the deposition space 110a.

[0125] Thus, the alignment device 200 is configured to be accommodated in the deposition space 110 a through the upper portion 112 of the deposition chamber 110 , or to be easily separated from the deposition chamber 110 through the upper portion 112 for maintenance or repair.

[0126] The alignment device 200 will be described in detail later with reference to the accompanying drawings.

[0127] Figure 7 is a diagram focusing on the interior of a deposition apparatus according to another embodiment of the present invention, Figure 8 1 is a perspective view showing a state in which a camera anti-vibration portion of a deposition apparatus according to another embodiment of the present invention is disposed on a second plate.

[0128] Reference Figure 7 and Figure 8 , an alignment device 200 of a deposition device according to another embodiment of the present invention includes: a first plate 210, a second plate 220, a third plate 230, a six-degree-of-freedom platform 240, a fixing unit 250, a first supporting part 221, an anti-vibration part 280, a camera 300 and a camera anti-vibration part 290.

[0129] The first plate 210 is placed on the upper side 112 of the deposition chamber (see Figure 6The first plate 210 is in a flat plate shape. Also, the first plate 210 may be fixed to the upper side of the deposition chamber 110 or may be separated from the upper side of the deposition chamber 110 .

[0130] Thus, when the first plate 210 is separated from the upper side of the deposition chamber 110 , there is an advantage that the interior of the deposition chamber 110 can be easily maintained and serviced.

[0131] At this time, the area of ​​the first plate 210 is larger than the insertion hole 112b (refer to Figure 6 The first plate 210 serves to maintain the vacuum state of the deposition chamber 110 by closing the insertion hole 112b.

[0132] The second plate 220 is supported by the first plate 210. The second plate 220 is disposed on an upper side of the first plate 210. The second plate 220 is spaced apart from the first plate 210 and disposed in parallel.

[0133] The third plate 230 is disposed on the upper side of the second plate 220. In addition, the third plate 230 is spaced apart from and disposed in parallel with the second plate 220. In this case, the third plate 230 can be supported by the second plate 220.

[0134] The six-degree-of-freedom platform 240 includes a connection portion 241 connected to the second plate 220 . That is, the six-degree-of-freedom platform 240 is supported on the second plate 220 via the connection portion 241 .

[0135] The 6DOF platform 240 extends through the first plate 210 and into the deposition space 110a. Furthermore, the 6DOF platform 240 can adjust the position of the fixing unit 250. The 6DOF platform 240 utilizes a multi-axis structure to tilt the fixing unit 250 and simultaneously move the fixing unit 250 vertically, thereby adjusting the position of the substrate S fixed to the fixing unit 250.

[0136] Furthermore, although not shown in the drawings, the six-degree-of-freedom platform 240 is equipped with six linear actuators (not shown) to form a six-axis structure. The six linear actuators are driven independently.

[0137] In addition, the alignment device 200 of the deposition device according to another embodiment of the present invention is provided with a position adjustment portion 245 for adjusting the position and inclination of the fixing unit 250 on a plane.

[0138] Furthermore, after the six-degree-of-freedom platform 240 performs a preliminary adjustment on the position of the fixing unit 250 , the position adjustment unit 245 performs a secondary adjustment on the position of the fixing unit 250 .

[0139] The fixing unit 250 is disposed on the lower side of the 6-DOF platform 240. Furthermore, the fixing unit 250 may be an electrostatic chuck that utilizes static electricity to fix the substrate S. In this case, the substrate S may be made of silicon. However, the substrate S is not limited to silicon and may be made of any material that can be fixed by the electrostatic force of the fixing unit 250.

[0140] The first support portion 221 extends from the second plate 220 to the deposition space 110a. On the other hand, the first support portion 221 is spaced apart from the vibration-proof portion 280 so as not to interfere with each other.

[0141] The first support portion 221 supports the mask M opposite to the substrate S. Furthermore, the first support portion 221 is provided with a first frame 221 a disposed under the mask M. The first frame 221 a is annular so as not to interfere with the movement of the deposited particles toward the substrate S.

[0142] Furthermore, a second frame 221b is provided on the first support portion 221 and is disposed above the first frame 221a. Here, the second frame 221b supports the mask M. In addition, according to various embodiments of the present invention, the second frame 221b can fix the mask M using static electricity.

[0143] Meanwhile, the substrate S is fixed by the fixing unit 250 , but due to the load on the substrate S, the substrate S slightly deflects downward. This deflection of the substrate S may form a slightly curved portion on the substrate S. This curved portion may hinder the realization of a high-resolution display.

[0144] To solve this problem, the substrate S is moved downward by the 6-DOF platform 240 and pressurizes the mask M. As the substrate S is pressed and contacts the mask M, the curved portion of the substrate S is eliminated, thereby achieving flattening.

[0145] The anti-vibration portion 280 is disposed between the first plate 210 and the second plate 220 . That is, the first plate 210 supports the anti-vibration portion 280 , and the anti-vibration portion 280 supports the second plate 220 .

[0146] Furthermore, the vibration-isolating portion 280 prevents the vibration of the first plate 210 from being transmitted to the second plate 220 . This prevents the vibration of the first plate 210 from being transmitted to the 6-DOF platform 240 , allowing the position of the substrate S to be precisely adjusted by the 6-DOF platform 240 .

[0147] And, as Figure 8 As shown, the first plate 210 is provided with a six-degree-of-freedom platform 240 (refer to Figure 7 ) through-hole 210a.

[0148] The vibration isolation part 280 (refer to Figure 7 ) are provided in plurality and include a first vibration prevention portion 280a, a second vibration prevention portion 280b, a third vibration prevention portion 280c and a fourth vibration prevention portion 280d.

[0149] The plurality of anti-vibration parts 280 may be arranged at equal intervals. In addition, the plurality of anti-vibration parts 280 may be arranged symmetrically with the through hole 210a being placed in the middle. That is, the plurality of anti-vibration parts 280 may be placed in the middle of the six-degree-of-freedom platform 240 (refer to Figure 7 ) are arranged symmetrically with each other.

[0150] Thus, the plurality of vibration-proof parts 280 can disperse and absorb the first plate 210 (refer to Figure 7 ) vibration.

[0151] Furthermore, the alignment device 200 of the deposition device according to another embodiment of the present invention is provided with a second support portion 212 extending from either the second plate 220 or the third plate 230 to the deposition space 110 a and a magnetic portion 270 connected to the second support portion 212 .

[0152] The second supporting portion 212 is formed parallel to the first supporting portion 221 . Also, the second supporting portion 212 can be moved in a vertical direction of the deposition chamber 110 by a driving portion (not shown) provided on the third plate 230 .

[0153] The magnetic portion 270 is disposed above the fixing unit 250. When the second supporting portion 212 moves downward and approaches the fixing unit 250, the magnetic portion 270 attracts the mask M, thereby preventing the mask M from bending downward. In this case, the mask M is made of metal.

[0154] In addition, a mask supporting portion 260 for supporting the mask M may be provided in the alignment device 200 .

[0155] The mask support portion 260 is connected to the first support portion 221 . The mask support portion 260 is made of metal. When the magnetic portion 270 moves and approaches the fixing unit 250 , the magnetic portion 270 attracts the mask support portion 260 .

[0156] In this case, the mask M is made of a non-magnetic material. Furthermore, since the mask M is supported by the mask support portion 260 , the mask M can be prevented from being flexed.

[0157] The camera 300 is disposed on the second plate 220 and confirms the position of the substrate S. Specifically, the camera 300 confirms the position of the substrate S and determines whether the substrate S is positioned optimally during the deposition process. For example, if the substrate S is not positioned optimally, the six-degree-of-freedom platform 240 can be used to adjust the position of the substrate S.

[0158] Furthermore, as the camera 300 is disposed on the second plate 220 , vibration of the first plate 210 is prevented from being directly transmitted to the camera 300 .

[0159] In addition, since the vibration-proof portion 280 prevents the vibration of the first plate 210 from being transmitted to the second plate 220 , the camera 300 disposed on the second plate 220 can be protected from the vibration of the first plate 210 .

[0160] Furthermore, the camera 300 may receive light transmitted through the first light receiving hole 210b of the first plate 210 and the second light receiving hole 220b of the second plate 220. The camera 300 will be described in detail later with reference to the accompanying drawings.

[0161] The camera anti-vibration portion 290 is disposed between the second plate 220 and the camera 300 . That is, the second plate 220 supports the camera anti-vibration portion 290 , and the camera anti-vibration portion 290 supports the camera 300 .

[0162] Thus, as the camera anti-vibration portion 290 prevents vibration from being transmitted to the camera 300 , the camera 300 can precisely measure the position of the substrate S.

[0163] Figure 9 is a diagram illustrating a state in which light from a light source portion of a deposition apparatus according to another embodiment of the present invention is transmitted to a camera. Figure 10 is a plan view illustrating a substrate applied to a deposition apparatus according to another embodiment of the present invention.

[0164] like Figure 9 As shown, a light source unit 350 for irradiating light toward the mask M is provided on the lower side of the mask M.

[0165] The light source unit 350 is disposed on the second frame 221 b of the first supporting portion and irradiates light upward toward the mask M.

[0166] At this time, the mask M can be made of a light-transmitting material. For example, the mask M can be made of silicon. In addition, according to various embodiments of the present invention, the mask M can be made of a metal material and formed with a hole that allows the light to pass through.

[0167] After passing through the mask M, the light then passes through the substrate S. In this case, the substrate S can be made of a light-transmitting material. For example, the substrate S can be made of silicon.

[0168] In addition, if Figure 10 As shown, according to various embodiments of the present invention, the substrate S has a first region A with a metal pattern and a second region B surrounding the first region A. Furthermore, a third region C is formed in a portion of the second region B to allow light to pass through.

[0169] In this case, the third region C may be made of silicon. In addition, according to various embodiments of the present invention, the third region C may be formed of a through hole for allowing light to pass through. In other words, the third region C functions as a mark for confirming the position of the substrate S.

[0170] Thus, the light from the light source unit 350 sequentially passes through the mask M and the substrate S and moves upward.

[0171] Furthermore, a fixing unit hole 250 a is formed in the fixing unit 250 , and light from the light source 350 passes through the fixing unit hole 250 a . Thus, light that has passed through the substrate S moves upward through the fixing unit hole 250 a .

[0172] The camera 300 is disposed above the light source 350 and receives light from the light source 350 .

[0173] Furthermore, the light source unit 350 , the camera 300 , and the third area C are arranged in a row. Thus, light from the light source unit 350 passes through the third area C and reaches the camera 300 , minimizing the light path, thereby accurately confirming the position of the substrate S.

[0174] Figure 11 FIG. 1 is a diagram illustrating a state in which light from a light source portion of a deposition apparatus according to yet another embodiment of the present invention is transmitted to a camera.

[0175] Reference Figure 11In the deposition apparatus according to another embodiment of the present invention, the camera 300 ′ is provided with a light receiving portion 320 ′ for receiving light.

[0176] In this case, a light source unit 310' for irradiating light is disposed inside the camera 300'. The light source unit 310' is disposed apart from the light receiving unit 320'.

[0177] Furthermore, the light from the light source 310 ′ is irradiated downwardly toward the substrate S. Furthermore, the light from the light source 310 ′ moves downwardly through the fixing unit hole 250 a.

[0178] Furthermore, the light passing through the fixing unit hole 250 a passes through the substrate S.

[0179] At this time, a reflective portion 360' for reflecting light is disposed on the upper side of the mask M. The reflective portion 360' can be made of a metal material. However, the reflective portion 360' is not limited to being made of a metal material, and can be made of various materials that can reflect light.

[0180] Furthermore, the light reflected by the mask M passes through the substrate S and the fixing unit hole 250 a and is transmitted to the light receiving portion 320 ′.

[0181] As described above, according to another embodiment of the present invention, unlike the aforementioned embodiments, the moving distance of the light passing through the mask M is shortened, so the light can be more stably transmitted to the camera 300 ′, thereby precisely measuring the position of the substrate S.

[0182] In addition, the light receiving portion 320 ′ is disposed above the reflective portion 360 ′, and the light reflected by the reflective portion 360 ′ moves upward toward the light receiving portion 320 ′.

[0183] At this time, the light from the light source 310 ′ is irradiated toward the substrate S at a predetermined angle to the upper direction. Thus, the light from the light source 310 ′ can minimize interference with the light reflected by the reflective portion 360 ′, thereby enabling precise measurement of the position of the substrate S.

[0184] Although the embodiments of the present invention have been described, the concept of the present invention is not limited to the embodiments presented in this specification, and ordinary technicians who understand the concept of the present invention can easily propose other embodiments within the scope of the same concept by adding, changing, deleting, and appending constituent elements, but this will also fall within the scope of the concept of the present invention.

Claims

1. A deposition device, characterized in that: include: A deposition chamber, used for providing a deposition space; a first plate detachable from an upper side of the deposition chamber; a second plate supported by the first plate and disposed on an upper side of the first plate; a six-degree-of-freedom platform connected to the second plate, passing through the first plate and extending to the deposition space; a fixing unit, disposed on the lower side of the six-degree-of-freedom platform and fixing a substrate for depositing particles; a first supporting portion extending from the second plate to the deposition space and configured to support the mask opposite to the substrate; a camera, disposed on the first plate and used to confirm the position of the substrate; and The light source is disposed on the lower side of the fixing unit and is used to irradiate light. Light from the light source passes through the substrate and is transmitted to the camera.

2. The deposition device according to claim 1, wherein: The camera includes: case, a light receiving portion, disposed inside the housing and configured to receive light from the light source portion, and The reflecting portion is connected to the first supporting portion and is used to reflect the light from the light source portion and guide the light to the light receiving portion.

3. The deposition device according to claim 2, characterized in that The reflecting portion includes: a first reflecting portion, disposed on the lower side of the light source portion, and a second reflecting portion, separated from the first reflecting portion and disposed on a lower side of the housing; Light from the light source portion sequentially passes through the substrate, the first reflecting portion, and the second reflecting portion and is transmitted to the light receiving portion.

4. The deposition device according to claim 1, wherein: Also includes: The camera anti-vibration part is arranged between the first plate and the camera and is used to prevent the vibration of the first plate from being transmitted to the camera.

5. The deposition device according to claim 1, wherein: Also includes: a third plate, disposed on an upper side of the second plate; an anti-vibration portion, disposed between the first plate and the second plate and configured to prevent vibration of the first plate from being transmitted to the second plate; a second supporting portion extending from either the second plate or the third plate to the deposition space and moving along a vertical direction of the deposition chamber; and The magnetic portion is connected to the second supporting portion and is disposed on the upper side of the fixing unit.

6. The deposition device according to claim 5, characterized in that The mask is made of metal material. When the magnetic portion moves and approaches the fixing unit, the magnetic portion attracts the mask.

7. A deposition device, characterized in that: include: A deposition chamber, used for providing a deposition space; a first plate detachable from an upper side of the deposition chamber; a second plate supported by the first plate and disposed on an upper side of the first plate; a six-degree-of-freedom platform connected to the second plate, passing through the first plate and extending to the deposition space; a fixing unit, disposed on the lower side of the six-degree-of-freedom platform and used to fix a substrate for depositing particles; a first supporting portion extending from the second plate to the deposition space and configured to support the mask opposite to the substrate; a camera disposed on the second plate to prevent the vibration of the first plate from being transmitted, and the camera is used to confirm the position of the substrate; and The light source portion is used to irradiate light that passes through the substrate and is transmitted toward the camera.

8. The deposition device according to claim 7, characterized in that The light source unit is disposed on the first supporting portion so as to be located below the mask.

9. The deposition device according to claim 7, characterized in that: The light source is arranged inside the camera. A reflecting portion for reflecting light from the light source is disposed on the upper side of the mask. The light reflected by the reflection portion is transmitted to the camera.

10. The deposition device according to claim 7, wherein: The fixing unit has a fixing unit hole formed therein for allowing light from the light source to pass therethrough.

11. The deposition device according to claim 7, wherein: The substrate has: The first area is formed with a pattern of metal material; and A second region surrounding the outside of the first region, A third region that transmits light is formed in a portion of the second region. The light source part, the camera, and the third area are arranged in a row.

12. The deposition device according to claim 7, wherein: Also includes: The vibration-proof portion is disposed between the first plate and the second plate and is used to prevent the vibration of the first plate from being transmitted to the second plate.

13. The deposition device according to claim 7, wherein: Also includes: a third plate, disposed on an upper side of the second plate; a second supporting portion extending from either the second plate or the third plate to the deposition space and moving along a vertical direction of the deposition chamber; and The magnetic portion is connected to the second supporting portion and is disposed on the upper side of the fixing unit.

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