Novel high-flux and high-selectivity special base polyamide acid-resistant nanofiltration membrane and preparation method thereof

Abstract

The invention discloses a novel high-flux and high-selectivity turger base polyamide acid-resistant nanofiltration membrane and a preparation method thereof. The preparation method comprises the following steps: firstly, adding a self-made novel 3, 3 '-bis (4-aminophenyl)-turger base (called DAPTB for short) monomer into a polyether sulfone (PES) membrane casting solution, uniformly stirring, standing, defoaming, blade-coating a non-woven fabric with the mixture, preparing a PES supporting base membrane with the surface rich in DAPTB through nonsolvent induced phase inversion, and preparing the PES supporting base membrane with the surface rich in DAPTB. And carrying out interfacial polymerization with polyacyl chloride to prepare the special base polyamide acid-resistant nanofiltration membrane. Based on the flexibility and hydrophobicity of a biphenyl unit in a DAPTB monomer molecule and the special rigidity, hydrophilicity and acidity binding property of a turger base unit, the acid resistance, permeability and separation selectivity of the prepared turger base nanofiltration membrane are synchronously improved, and the prepared turger base nanofiltration membrane can be effectively used for efficient separation of organic matter and inorganic salt under the strong acid condition; the application of the nanofiltration technology in the fields of acid wastewater resourceful treatment and acid feed liquid separation and concentration is expected to be promoted.

Description

Technical Field

[0001] The present invention relates to the technical field of water treatment polymer separation membranes, and in particular to a method for preparing a novel Teregu base polyamide acid-resistant nanofiltration membrane. Background Art

[0002] Acidic wastewater primarily originates from industries such as electroplating, metallurgy, textile printing and dyeing, and food processing. It contains large amounts of inorganic acids, heavy metal ions, and organic pollutants. Direct discharge can severely disrupt the ecological balance of water bodies and harm human health through accumulation in the food chain. Nanofiltration (NF) membrane technology is an emerging separation technology between ultrafiltration and reverse osmosis. It selectively retains multivalent ions and organic macromolecules (molecular weight 200-1000 Da) through size separation and the Donnan effect, while allowing monovalent ions and small molecules to pass through, thereby separating monovalent from multivalent salts and salt from organic matter. Compared to traditional chemical precipitation and biological wastewater treatment technologies, as well as traditional concentration techniques such as evaporation, distillation, and extraction, NF offers advantages such as high efficiency, energy efficiency, ease of operation, and ease of integration. Consequently, it has been widely adopted in wastewater resource recovery and industrial clean production processes.

[0003] At present, the mainstream polypiperazineamide nanofiltration membrane on the market is mainly composed of a porous support layer and an active separation layer. However, the amide bond (-NH-CO-) in its separation layer is easily hydrolyzed under strongly acidic conditions, resulting in a sharp decline in the separation performance of the membrane and a significant reduction in the service life of the membrane. This seriously limits the application of nanofiltration technology in the field of acidic wastewater treatment, so there is an urgent need to develop high-performance acid-resistant nanofiltration membranes. In recent years, Zhang Suojiang et al. (Chemical Engineering Journal, 2022, 450: 137965) prepared an acid-resistant COF layer and a polysulfonamide layer on a PES support layer in sequence by in situ interfacial polymerization to obtain an acid-resistant composite nanofiltration membrane; Patents (CN202011482126.9, CN202410615519.4, CN202211410595.9) prepared a series of acid-resistant nanofiltration membranes by polymerization of sulfonamide monomers or polyamine monomers with polyacyl chloride monomers or polysulfonyl chloride monomers; Patent (CN202110880867.0) used a non-planar conformational compound with at least two hydroxyl groups and an acid-binding agent as an aqueous phase solution and a triazine compound as an oil phase solution by interfacial polymerization to prepare an acid-resistant high-flux polyarylether composite nanofiltration membrane. Although the above technologies can improve the acid resistance of nanofiltration membranes, they also face some difficulties. For example, the COF layer will cause the separation layer of the nanofiltration membrane to peel off due to insufficient interfacial bonding strength, the water flux of polysulfonamide nanofiltration membranes will decrease to a certain extent, and the retention rate of nanofiltration membranes based on non-planar conformations is relatively low. Summary of the Invention

[0004] The purpose of the present invention is to overcome the application bottlenecks of conventional commercial polypiperazineamide nanofiltration membranes, which have insufficient acid resistance and low selectivity for separation of organic matter / inorganic salts, and to develop a new type of high-throughput and high-selectivity Teleg base polyamide nanofiltration membrane and its preparation method. The nanofiltration membrane is prepared by first adding a homemade 3,3'-bis(4-aminophenyl)-Teleg base (abbreviated as DAPTB) monomer to a polyethersulfone (PES) casting solution, stirring it evenly, standing it for degassing, and then coating it on a non-woven fabric to form a liquid film. It is then placed in a coagulation bath to prepare a polyethersulfone porous support base membrane rich in DAPTB on the surface through a non-solvent-water induced phase transformation, and then contacted with an organic phase solution containing an acyl chloride monomer on one side for interfacial polymerization. After the reaction is completed, the remaining organic phase solution is removed, and the membrane is dried in the shade and then heat-treated to obtain the membrane. Because the DAPTB molecule contains a Teleg base with a unique rigid twisted structure and a long molecular chain, the membrane has excellent acid resistance and improves the water flux and dye / salt separation selectivity of the membrane.

[0005] The present invention proposes to dissolve DAPTB monomer and polyethersulfone in a polar solution to obtain a casting solution, then uniformly enrich DAPTB on the surface of the polyethersulfone base membrane through non-solvent induced phase transformation, and then prepare a new type of Teregu base polyamide nanofiltration membrane through in situ interfacial polymerization.

[0006] A novel high-flux and high-selectivity Teregu base polyamide acid-resistant nanofiltration membrane was prepared as follows:

[0007] (1) A certain amount of DAPTB monomer is added to the polyethersulfone casting solution, and the mixture is continuously stirred until it is completely uniform. The mixture is then allowed to stand for degassing, and finally a uniform and bubble-free polyethersulfone casting solution containing DAPTB is obtained;

[0008] (2) The casting solution prepared in step (1) is evenly applied to the surface of the non-woven fabric with a scraper, and then the non-woven fabric with the casting solution is quickly immersed in a coagulation bath to perform a non-solvent-water induced phase transformation, and then the membrane surface is rinsed with deionized water to remove impurities, and then air-dried to obtain a polyethersulfone support base membrane with DAPTB monomer evenly distributed on the surface;

[0009] (3) The organic phase solution containing the polyacyl chloride monomer is evenly poured onto the surface of the polyethersulfone support membrane containing the DAPTB monomer that has been dried in the shade in step (2). After a period of reaction, the remaining organic phase solution is removed. The membrane is then heat-treated for a period of time, and then the resulting membrane is immersed in deionized water for cleaning, thereby finally obtaining a high-throughput and high-selectivity Teregu base polyamide acid-resistant nanofiltration membrane.

[0010] Furthermore, in the step (1), the stirring temperature is 20 to 60° C., the stirring time is 10 to 24 hours, and the standing degassing time is 10 to 24 hours.

[0011] Furthermore, in step (1), the total content of DAPTB monomer in the casting solution is 0.1 to 3 wt %. Preferably, based on 100 wt %, the weight percentages of DAPTB monomer, polyethersulfone and polar solvent in the casting solution are:

[0012] DAPTB monomer 0.1-1.5 wt%;

[0013] Polyethersulfone 10-20wt%;

[0014] Polar solvent balance.

[0015] Furthermore, the polar solvent in step (1) is one or any combination of N,N-dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide or N-methylpyrrolidone; the polyacyl chloride monomer in step (3) is one or any combination of isophthaloyl chloride, 1,3,5-triazine-2,4,6-trichloride, adipic acid chloride, biphenyltetracarboxylic acid chloride, trimesoyl chloride or phthaloyl chloride; the organic solvent in the organic phase solution of the polyacyl chloride monomer in step (3) is one or any combination of solvent oil Isopar G, cyclohexane, n-hexane or n-heptane.

[0016] Furthermore, in step (2), the coagulation bath is pure water, and the time for the non-solvent-water induced phase transition is 30 to 300 seconds, preferably 30 to 90 seconds;

[0017] Furthermore, in the step (2), the shade drying time is 10 to 60 minutes;

[0018] Furthermore, in the step (3), the concentration of the polyacyl chloride monomer in the organic phase solution containing the polyacyl chloride monomer is 0.01 to 0.35 wt%, preferably 0.05 to 0.25 wt%;

[0019] Furthermore, in the step (3), the reaction time in the polyacyl chloride monomer solution is 30 to 300 seconds, preferably 60 to 120 seconds;

[0020] Furthermore, in step (3), the heat treatment temperature is 25-40° C. and the time is 20-60 min.

[0021] The present invention also provides a novel high-flux and high-selectivity Teregu base polyamide acid-resistant nanofiltration membrane prepared by the above preparation method.

[0022] Compared with the prior art, the present invention has the following beneficial effects:

[0023] The present invention adds a novel, homemade tereug-base diamine monomer, DAPTB, to the casting solution. DAPTB is then introduced into the polyamide separation layer via a coupling method of non-solvent-induced phase transformation and in-situ interfacial polymerization, thereby producing a novel, high-throughput, high-selectivity tereug-base-based polyamide acid-resistant nanofiltration membrane. Compared to conventional polypiperazineamide nanofiltration membranes, this membrane, thanks to the homemade DAPTB monomer containing both biphenyl and tereug-base structures, exhibits enhanced acid resistance, permeability, and separation selectivity due to the specific flexibility and hydrophobicity of the biphenyl unit and the exceptional rigidity, hydrophilicity, and acid-binding properties of the tereug-base unit. This membrane is effective for the efficient separation of organic matter and inorganic salts under strongly acidic conditions, and has broad application prospects. In addition, since DAPTB is insoluble in the coagulation bath, it can be directly added to the casting solution to enrich the terephthalate phenylenediamine monomer to the surface of the supporting base membrane through the non-solvent induced phase inversion method, which can eliminate the water phase preparation and dipping steps, simplifying the nanofiltration membrane preparation process, improving the membrane production efficiency, reducing the generation of wastewater, and reducing the membrane production cost, making it easy to industrialize. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 The chemical structure diagram of the 3,3'-bis(4-aminophenyl)-tetramer base (DAPTB) monomer of the present invention is shown.

[0025] Figure 2 The present invention provides attenuated total reflection Fourier infrared (ATR-FTIR) spectra of the Teregu base polyamide nanofiltration membranes containing different DAPTB monomer concentrations, including DAPTB4-TMC membrane and DAPTB8-TMC membrane, as well as traditional polypiperazineamide nanofiltration membrane PIP-TMC and blank PES porous support bottom membrane.

[0026] Figure 3 The present invention provides SEM images of the novel Teregu base polyamide acid-resistant nanofiltration membrane (DAPTB4-TMC membrane) and the traditional polypiperazineamide nanofiltration membrane (PIP-TMC) after being immersed in a 20 wt % H2SO4 solution for different periods of time. DETAILED DESCRIPTION

[0027] The following is a further detailed description of the specific embodiments to make the content of the invention clearer, but the content and scope of the invention of this patent are not limited to the following embodiments. Without departing from the content and scope of the invention, the changes should be included in the technical scope of the invention.

[0028] Example 1:

[0029] ① Preparation of casting solution

[0030] 0.4 wt % DAPTB, 16.2 wt % polyethersulfone and dimethyl sulfoxide were added to a round-bottom flask, stirred at 25° C. for 12 h and allowed to stand for 12 h for degassing to obtain a uniform and bubble-free casting solution.

[0031] ② Non-solvent induced phase transformation

[0032] The casting liquid was evenly and quickly poured onto the non-woven fabric, and then scraped into a uniform liquid film with a 200 μm scraper. The non-woven fabric coated with the liquid film was immersed in 2 L of coagulation bath aqueous solution for non-solvent induced phase inversion for 60 s to obtain the base film.

[0033] ③ In situ interfacial polymerization

[0034] A 0.15 w / v% n-hexane solution containing 1,3,5-benzenetricarboxylic acid chloride was evenly and quickly poured onto the surface of a shade-dried PES porous support membrane for in situ interfacial polymerization for 120 seconds. The excess organic phase solution on the membrane surface was removed, and the membrane was then heat-treated at 30°C for 30 minutes to obtain a polyamide nanofiltration membrane containing a Teregu base, which was recorded as a DAPTB4-TMC membrane.

[0035] Figure 1 The chemical structure diagram of the 3,3'-bis(4-aminophenyl)-Tereger's base (DAPTB) monomer used in the preparation process of the present invention is shown. The synthesis method of the 3,3'-bis(4-aminophenyl)-Tereger's base comprises the following steps:

[0036] Step 1: The raw material 4-bromoaniline (1) and polyformaldehyde are dispersed in trifluoroacetic acid to react first to obtain 3,3'-dibromo-Teleg base, which is then added to a solvent tetrahydrofuran (THF), and then an organic lithium reagent is added dropwise to fully react for a certain period of time, followed by adding dropwise a borate compound for further reaction. After the reaction is completed, ice water is added to quench the reaction, and then dichloromethane is added for extraction. The upper aqueous phase is taken and hydrochloric acid is added to acidify to produce a white precipitate, which is filtered and dried to obtain the intermediate 3,3'-diboronate-Teleg base (2).

[0037]

[0038] Step 2: The intermediate 3,3'-diboronate-Teleg base obtained in step 1, a p-nitrobenzene compound, a metal catalyst, a ligand, a base, and water are uniformly dispersed in a polar solvent, and stirred under inert conditions to react to obtain the intermediate 3,3'-di(4-nitrophenyl)-Teleg base (3).

[0039]

[0040] Step 3: The intermediate 3,3'-bis(4-nitrophenyl)-tetramer obtained in step 2 and palladium carbon are dispersed in an alcohol reagent, and subjected to a hydrazine hydrate reduction reaction under heating conditions and then post-treated to obtain the final product 3,3'-bis(4-aminophenyl)-tetramer (4), i.e., the tetramer diamine monomer DAPTB.

[0041]

[0042] For other details about the preparation method of DAPTB monomer, please refer to the Chinese invention patent application number 2025101894495, which will not be described in detail here.

[0043] Example 2:

[0044] The concentration of the diamine monomer DAPTB in step ① was changed from 0.4 wt % to 0.2 wt %. Other operations were the same as in Example 1. The performance data of the prepared membrane are listed in Table 1.

[0045] Example 3:

[0046] The concentration of the diamine monomer DAPTB in step ① was changed from 0.4 wt % to 0.6 wt %. Other operations were the same as in Example 1. The performance data of the prepared membrane are listed in Table 1.

[0047] Example 4:

[0048] The concentration of the diamine monomer DAPTB in step ① was changed from 0.4 wt % to 0.8 wt %. Other operations were the same as in Example 1 to prepare a nanofiltration membrane, which was recorded as DAPTB8-TMC membrane. The performance data of the prepared membrane are listed in Table 1.

[0049] Comparative Example 1:

[0050] The diamine monomer DAPTB in step ① was replaced with piperazine. Other operations were the same as in Example 1. The obtained membrane was recorded as PIP-TMC membrane. The obtained membrane was used for comparative testing, and the performance data are listed in Tables 3-5.

[0051] Table 1: Comparison of separation performance of nanofiltration membranes prepared in Examples 1-4

[0052]

[0053] Note: Table 1 is for the mixed feed solution of chrome black T and sodium sulfate.

[0054] Table 2: Comparison of separation performance of nanofiltration membranes prepared in Examples 1-4

[0055]

[0056] Note: Table 2 is for the mixed feed solution of Congo red and sodium sulfate.

[0057] Table 3: Changes in the retention rate of chrome black T and sodium sulfate after the nanofiltration membrane prepared in Example 1 was immersed in strong acid for different times

[0058] Number of days Eriochrome Black T Retention Rate (%) Sodium sulfate retention rate (%) 0 99.8 7.17 3 99.92 6.06 9 99.99 2.91 15 99.99 3.48 30 99.99 5.05 36 99.78 7.16 48 98.95 6.25 60 99.52 5.28

[0059] Note: The strong acid is 20wt% H2SO4 solution.

[0060] Table 4: Changes in the retention rate of chrome black T and sodium sulfate after the nanofiltration membrane prepared in Comparative Example 1 was immersed in strong acid for different times

[0061] Number of days Eriochrome Black T Retention Rate (%) Sodium sulfate retention rate (%) 0 99.99 73.29 3 99.99 18.1 9 99.99 5.02 15 99.99 6.12 30 99.72 6.71 36 98.88 6.36 48 98.17 5.42 60 97.53 5.69

[0062] Note: The strong acid is 20wt% H2SO4 solution.

[0063] Table 5: Water flux (Lm) of the nanofiltration membranes prepared in Example 1 and Comparative Example 1 after soaking in strong acid for different times - 2 .h -1 .bar -1 )

[0064] Number of days Example 1 Comparative Example 1 0 25.15 5.76 3 30.78 10.36 9 28.02 21.36 15 32.92 26.88 30 24.66 21.97 36 24.36 23.85 48 20.01 22.61 60 23.42 24.36.

[0065] According to the above results, compared with conventional polypiperazineamide nanofiltration membranes, the Teleg base acid-resistant nanofiltration membrane prepared by the present invention has higher water flux, excellent dye / divalent salt separation selectivity and strong acid tolerance. After being soaked in a 20wt% H2SO4 solution for 60 days, the retention of chrome black T and sodium sulfate by the polypiperazineamide nanofiltration membrane was significantly reduced, and the membrane surface was significantly damaged; while the new Teleg base polyamide nanofiltration membrane prepared based on DAPTB always maintained stable retention of chrome black T and sodium sulfate during the 60-day soaking in a 20wt% sulfuric acid solution, and the separation selectivity and flux of chrome black T / sodium sulfate also remained stable and excellent, and the membrane structure remained intact. Therefore, the high-flux and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane prepared by the present invention has huge application potential in clean production fields such as acidic high-salt organic wastewater treatment, pharmaceutical separation and concentration, and food processing.

[0066] Figure 2 The attenuated total reflectance Fourier transform infrared (ATR-FTIR) spectra of the Tereger base polyamide nanofiltration membranes containing different DAPTB monomer concentrations described in the present invention, including DAPTB4-TMC membrane and DAPTB8-TMC membrane, as well as traditional polypiperazineamide nanofiltration membrane PIP-TMC and blank PES porous support membrane. The chemical structure of the DAPTB-based nanofiltration (NF) membrane was analyzed by ATR-FTIR and compared with that of the polyethersulfone support membrane (M PES ) and conventional polypiperazineamide nanofiltration membrane (M PIP-TMC) for comparison. In the spectrum, 3376cm -1 The absorption peak at is attributed to the NH asymmetric stretching vibration of the residual unreacted free amino group (-NH2) in the DAPTB monomer, indicating that after the interfacial polymerization reaction, M DAPTB-TMC Uncross-linked DAPTB molecules exist on the membrane surface. 1678cm -1 The absorption peak at 1526 cm corresponds to the amide I band (C=O stretching vibration) in the separation layer. -1 The absorption peak at 1526 cm corresponds to the amide II band (coupling of NH in-plane bending vibration and CN stretching vibration). The appearance of these characteristic peaks indicates that DAPTB and TMC form a cross-linked polyamide structure through interfacial polymerization. In addition, as the concentration of aqueous monomer DAPTB increases from 0.4 wt% to 0.8 wt%, the absorption peak at 1526 cm -1 and 1678cm -1 The intensity of the characteristic peak at α / β increases with the monomer dosage, indicating that the crosslinking degree of the separation layer increases with the monomer dosage. No amide characteristic peak is observed in the spectrum of the pure PES support layer, further confirming the existence of the polyamide separation layer and its chemical structure specificity.

[0067] Figure 3 The present invention provides SEM images of the novel Terleger base polyamide acid-resistant nanofiltration membrane (DAPTB4-TMC) and the traditional polypiperazineamide nanofiltration membrane (PIP-TMC) after being immersed in a 20 wt % H2SO4 solution for different periods of time. Figure 3 Showing M PIP-TMC Membrane and M DAPTB4-TMC The surface morphology of the membrane before and after immersion in sulfuric acid solution. Comparison shows that after immersion in acid solution for 30 days, the piperazine membrane has obvious nanoscale holes on the surface and local structural collapse. DAPTB4-TMC Under the same conditions (30 days of acid immersion), the membrane maintained a smooth, dense surface morphology. Even after 60 days of immersion, the membrane surface showed primarily enlarged nodules, but no obvious pores were observed. This phenomenon suggests that the rigid "V"-shaped molecular structure of the DAPTB monomer effectively inhibits the hydrolysis of the amide bond in the acidic environment, causing only limited swelling, thereby maintaining the integrity of the membrane structure.

[0068] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any modifications or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in the present invention should be included in the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be based on the scope of protection of the claims.

Claims

1. A method for preparing a high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane, characterized in that: The specific steps include: (1) A self-prepared 3,3'-bis(4-aminophenyl)-tetramer base (DAPTB) monomer was added to a polyethersulfone casting solution, stirred continuously until completely homogeneous, and then allowed to stand for degassing, finally obtaining a uniform and bubble-free polyethersulfone casting solution containing DAPTB; (2) The casting solution prepared in step (1) is evenly applied to the surface of the non-woven fabric with a scraper, and then the non-woven fabric with the casting solution is quickly immersed in a coagulation bath to perform a non-solvent-water induced phase transformation, and then the membrane surface is rinsed with deionized water to remove impurities, and then dried in the shade to obtain a polyethersulfone support base membrane with DAPTB monomer evenly distributed on the surface; (3) pouring the organic phase solution containing the polyacyl chloride monomer evenly onto the surface of the polyethersulfone support membrane containing the DAPTB monomer dried in step (2), reacting for a period of time, and removing the remaining organic phase solution; then heat-treating the membrane for a period of time, and then immersing the obtained membrane in deionized water for cleaning, thereby finally obtaining a high-flux and high-selectivity Teregu base polyamide acid-resistant nanofiltration membrane; The structural formula of the 3,3'-bis(4-aminophenyl)-Tereger's base monomer is as follows:

2. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 1, characterized in that: In step (1), the mixture is stirred at 20 to 60° C. for 10 to 24 hours and then allowed to stand for 10 to 24 hours for degassing.

3. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 1, characterized in that: In step (1), the weight percentages of DAPTB monomer, polyethersulfone and polar solvent in the casting solution are calculated as 100% by weight: DAPTB monomer 0.1-3 wt%; Polyethersulfone 10-20wt%; Polar solvent balance.

4. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 3, characterized in that: The polar solvent is one or a combination of any two of N,N-dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide or N-methylpyrrolidone.

5. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 1, characterized in that: In step (2), the coagulation bath is pure water, and the time for the non-solvent-water induced phase transformation is 30 to 300 seconds.

6. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 1, characterized in that: In step (2), the time for shade drying after phase inversion is 10 to 60 minutes.

7. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 1, characterized in that: In step (3), the polyacyl chloride monomer is one or a combination of any two of isophthaloyl chloride, 1,3,5-triazine-2,4,6-trichloride, adipic acid chloride, biphenyltetracarboxylic acid chloride, trimesoyl chloride or phthaloyl chloride, and the concentration of the polyacyl chloride monomer in the organic phase solution containing the polyacyl chloride monomer is 0.01 to 0.35 wt%.

8. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 1, wherein: In step (3), the organic solvent in the organic phase solution of the polyacyl chloride monomer is one or any combination of solvent oil Isopar G, cyclohexane, n-hexane or n-heptane.

9. The method for preparing the novel high-throughput and high-selectivity Teleg base polyamide acid-resistant nanofiltration membrane according to claim 1, characterized in that: In step (3), the reaction time in the polyacyl chloride monomer solution is 30 to 300 seconds, the heat treatment temperature is 25 to 40° C., and the time is 20 to 60 minutes.

10. A novel high-flux, high-selectivity Teregu base polyamide acid-resistant nanofiltration membrane prepared by the preparation method according to any one of claims 1 to 9.

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