Cleaning agent as well as preparation method and use method thereof

Abstract

The invention discloses a cleaning agent and a preparation method and a use method thereof, and relates to the technical field of material cleaning, the cleaning agent comprises the following raw material components by mass: 1-5 wt% of an alkali, 2-10 wt% of an organic acid, 0.5-2 wt% of a chelating agent, 0.5-2 wt% of a dispersant, 1-7 wt% of a settling agent, 0.01-1 wt% of an antifoaming agent, 0.5-1 wt% of an antistatic agent, 1-10 wt% of an organic solvent, and the balance of water; and the pH value of the cleaning agent at room temperature is 8.5-9.5. The cleaning agent provided by the invention is a phosphorus-free alkalescent cleaning agent after being prepared into a working solution, and a phosphorus-containing auxiliary agent is replaced by the synergistic effect of the organic acid, the chelating agent, the settling agent and the destaticizing agent, so that the cleaning effect on the nano cerium oxide polishing powder on the surface of the microcrystalline glass is improved; and meanwhile, the probability that the nano cerium oxide polishing powder floating in the cleaning tank is enriched on the surface of the microcrystalline glass again is reduced, and the yield and the production efficiency are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of material cleaning, and in particular to a cleaning agent and a preparation method and a use method thereof. Background Art

[0002] With its excellent scratch resistance and other properties, microcrystalline glass has gradually become the mainstream choice for protective cover panels in consumer electronic products such as smartphones and tablets.

[0003] During the preparation process of microcrystalline glass, the polished microcrystalline glass is usually cleaned to remove impurities such as polishing powder and improve the cleanliness of the microcrystalline glass surface.

[0004] However, the use of nano-cerium oxide as a polishing powder in existing technologies often results in a re-dirt phenomenon on the surface of the cleaned glass-ceramics, leading to low production efficiency. Furthermore, to maintain cleaning performance, current weakly alkaline glass-ceramics cleaning agents often contain phosphorus additives such as hydroxyethylidene diphosphonic acid, sodium tripolyphosphate, and potassium pyrophosphate, which can lead to environmental problems such as eutrophication of water bodies. Summary of the Invention

[0005] The main purpose of the present invention is to provide a cleaning agent and its preparation method and use method, aiming to solve the problem in the prior art that after microcrystalline glass is polished with nano-cerium oxide, the surface will become dirty during cleaning.

[0006] To achieve the above-mentioned object, the present invention provides a cleaning agent for cleaning polished micro-ceramics, comprising the following raw material components in percentage by mass:

[0007] 1-5wt% alkali, 2-10wt% organic acid, 0.5-2wt% chelating agent, 0.5-2wt% dispersant, 1-7wt% sedimentation agent, 0.01-1wt% defoaming agent, 0.5-1wt% antistatic agent, 1-10wt% organic solvent, and the balance is water; the pH of the cleaning agent at room temperature is 8.5-9.5.

[0008] In one embodiment, the base comprises one or more of sodium hydroxide, potassium hydroxide, and triethanolamine; and / or,

[0009] The dispersant includes one or more of sodium polyacrylate, polyvinyl pyrrolidone, and sodium dodecylbenzene sulfonate; and / or,

[0010] The organic solvent includes one or more of isopropyl alcohol, ethylene glycol, and ethanol.

[0011] In one embodiment, the organic acid comprises one or more of citric acid, glycolic acid, and benzoic acid.

[0012] In one embodiment, the chelating agent includes one or more of disodium edetate, tetrasodium edetate, and sodium gluconate.

[0013] In one embodiment, the sedimentation agent includes one or more of polyacrylamide, polyacrylic acid, and polyamine.

[0014] In one embodiment, the antistatic agent includes one or more of tetrabutylammonium fluoride, propylene acetate, and hexadecyltrimethylammonium chloride.

[0015] In one embodiment, the defoaming agent includes a silicon-free defoaming agent, and the silicon-free defoaming agent includes one or more of polyoxypropylene glycerol ether, acetylenic alcohol defoaming agent, and xylonic acid diester.

[0016] The present invention also provides a method for preparing the aforementioned cleaning agent, comprising the following steps:

[0017] S10, dissolving a base, an acid, and an organic solvent in water in sequence to obtain a first mixed solution;

[0018] S20, mixing the first mixed solution with a chelating agent, a dispersant, a precipitant, a defoaming agent, and an antistatic agent to obtain the cleaning agent.

[0019] The present invention also provides a method for using the aforementioned cleaning agent, comprising the following steps:

[0020] Dilute the cleaning agent with water to a mass percentage of 5-10 wt % to obtain a working solution;

[0021] The working liquid is heated to 40-60° C. to clean the microcrystalline glass with nano-cerium oxide polishing powder remaining on the surface.

[0022] In the technical solution of the present invention, the cleaning agent provided by the present invention is a weakly alkaline cleaning agent that does not contain phosphorus after being configured as a working liquid. The phosphorus-containing additives are replaced by the synergistic effect of organic acids, chelating agents, precipitants and antistatic agents, thereby improving the cleaning effect of nano-cerium oxide polishing powder on the surface of microcrystalline glass. At the same time, it also reduces the probability of nano-cerium oxide polishing powder floating in the cleaning tank to be re-enriched on the surface of the microcrystalline glass, thereby improving the yield rate and production efficiency.

[0023] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments. DETAILED DESCRIPTION

[0024] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Where specific conditions are not specified in the embodiments, they are carried out according to conventional conditions or the conditions recommended by the manufacturer. Where the reagents or instruments used are not specified by the manufacturer, they are all conventional products that can be purchased commercially. In addition, the meaning of "and / or" appearing in the full text includes three parallel schemes. Taking "A and / or B" as an example, it includes scheme A, or scheme B, or schemes that A and B meet at the same time. In addition, the technical solutions between the various embodiments can be combined with each other, but must be based on the ability of ordinary technicians in this field to achieve. When the combination of technical solutions is contradictory or cannot be achieved, it should be considered that the combination of such technical solutions does not exist and is not within the scope of protection required by the present invention. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0025] With its excellent scratch resistance and other properties, microcrystalline glass has gradually become the mainstream choice for protective cover panels in consumer electronic products such as smartphones and tablets.

[0026] During the preparation process of microcrystalline glass, the polished microcrystalline glass is usually cleaned to remove impurities such as polishing powder and improve the cleanliness of the microcrystalline glass surface.

[0027] However, in the prior art, when nano-cerium oxide is used as polishing powder, it usually causes the surface of the cleaned micro-ceramic glass to become dirty, resulting in low production efficiency. The specific reasons for this include: (1) Due to the static electricity generated by the mechanical friction between the micro-ceramic glass and the cerium oxide polishing powder and the dissolution of cations inside the micro-ceramic glass, the surface of the micro-ceramic glass remains negatively charged after polishing, and the Zeta potential reaches -30mV to -50mV. This will electrostatically adsorb the nano-cerium oxide polishing powder floating in the cleaning tank, causing the surface of the cleaned micro-ceramic glass to become dirty; (2) The brush of the flatbed cleaning machine usually accumulates the organic silicon defoaming agent from the cleaning agent, which will also cause the surface of the cleaned micro-ceramic glass to become dirty. It is necessary to add a manual wiping process, resulting in low production efficiency and the need for improvement. In addition, in order to maintain the cleaning ability, the weak alkaline cleaning agent for micro-ceramic glass currently contains phosphorus additives, such as hydroxyethylidene diphosphonic acid, sodium tripolyphosphate, potassium pyrophosphate, etc., which can cause environmental problems such as eutrophication of water bodies.

[0028] It should be noted that since an acidic environment with a pH value less than 3 or an alkaline environment with a pH value greater than 10 will destroy the internal crystal structure of the microcrystalline glass, conventional strong alkaline cleaning agents cannot be used in the cleaning process of the microcrystalline glass after nano-cerium oxide polishing. However, weak alkaline cleaning agents are usually not very efficient in cleaning polishing powder and other dirt.

[0029] In view of this, the present invention proposes a cleaning agent for cleaning polished microcrystalline glass, comprising the following raw material components in mass percentage: 1-5wt% alkali, 2-10wt% organic acid, 0.5-2wt% chelating agent, 0.5-2wt% dispersant, 1-7wt% precipitant, 0.01-1wt% defoaming agent, 0.5-1wt% antistatic agent, 1-10wt% organic solvent, and the balance is water; the pH of the cleaning agent at room temperature is 8.5-9.5.

[0030] In the technical solution of the present invention, the cleaning agent provided by the present invention is a weakly alkaline cleaning agent that does not contain phosphorus after being configured as a working liquid. The phosphorus-containing additives are replaced by the synergistic effect of organic acids, chelating agents, precipitants and antistatic agents, thereby improving the cleaning effect of nano-cerium oxide polishing powder on the surface of microcrystalline glass. At the same time, it also reduces the probability of nano-cerium oxide polishing powder floating in the cleaning tank to be re-enriched on the surface of the microcrystalline glass, thereby improving the yield rate and production efficiency.

[0031] In some embodiments of the present invention, the base includes one or more of sodium hydroxide, potassium hydroxide, and triethanolamine. It is understood that the base can be any one of these, or two or three of these, all within the scope of the present invention. These bases are used to provide a weakly alkaline environment, ensuring that the crystal structure within the glass-ceramics is not easily destroyed.

[0032] In some embodiments of the present invention, the dispersant includes one or more of sodium polyacrylate, polyvinyl pyrrolidone, and sodium dodecylbenzene sulfonate. It is understood that the dispersant may be any one of sodium polyacrylate, polyvinyl pyrrolidone, and sodium dodecylbenzene sulfonate, or two or three of these, all falling within the scope of the present invention. The dispersant is used to uniformly disperse the raw materials.

[0033] In some embodiments of the present invention, the organic solvent includes one or more of isopropyl alcohol, ethylene glycol, and ethanol. It is understood that the organic solvent may be any one of isopropyl alcohol, ethylene glycol, and ethanol, or two or three of these, all within the scope of the present invention. The above-mentioned organic solvents are used to assist in dissolving the various raw materials.

[0034] In some embodiments of the present invention, the organic acid comprises one or more of citric acid, glycolic acid, and benzoic acid. It is understood that the organic acid may be any one of citric acid, glycolic acid, and benzoic acid, or two or three of these, all within the scope of the present invention. The above-mentioned organic acids have a weak complexing function and can replace the function of a portion of the phosphorus-containing adjuvant and exert a buffering effect.

[0035] In some embodiments of the present invention, the chelating agent includes one or more of disodium EDTA, tetrasodium EDTA, and sodium gluconate. It is understood that the chelating agent can be any one of disodium EDTA, tetrasodium EDTA, and sodium gluconate, or two or three of the sodium gluconates, all falling within the scope of the present invention. The above-mentioned chelating agent has a strong complexing function and can replace the function of a portion of the phosphorus-containing auxiliary agent to promote the removal of residual nano-cerium oxide on the surface of the microcrystalline glass.

[0036] In some embodiments of the present invention, the sedimentation agent includes one or more of polyacrylamide, polyacrylic acid, and polyamine. It is understood that the sedimentation agent can be any one of these, or two or three of these, all within the scope of the present invention. These sedimentation agents have a strong complexing function and can replace some of the phosphorus-containing additives, promoting the sedimentation of nano-cerium oxide washed from the surface of the glass-ceramics and preventing it from returning to the surface of the glass-ceramics.

[0037] In some embodiments of the present invention, the antistatic agent includes one or more of tetrabutylammonium fluoride, propylene acetate, and hexadecyltrimethylammonium chloride. It is understandable that the antistatic agent can be any one of tetrabutylammonium fluoride, propylene acetate, and hexadecyltrimethylammonium chloride, or two or three of tetrabutylammonium fluoride, propylene acetate, and hexadecyltrimethylammonium chloride, all of which are within the scope of protection of the present invention. The above-mentioned antistatic agent has antistatic and penetration functions, which can replace the role of part of the phosphorus-containing auxiliary agent, and can also promptly eliminate the negative charge remaining on the surface of the microcrystalline glass, reducing the problem of dirtiness caused by electrostatic adsorption of floating cerium oxide particles on the surface of the microcrystalline glass.

[0038] In some embodiments of the present invention, the defoamer includes a silicon-free defoamer, and the silicon-free defoamer includes one or more of polyoxypropylene glycerol ether, acetylene alcohol defoamer, and xylonate diester. It is understandable that the silicon-free defoamer can be any one of polyoxypropylene glycerol ether, acetylene alcohol defoamer, and xylonate diester, or two or three of polyoxypropylene glycerol ether, acetylene alcohol defoamer, and xylonate diester, all of which are within the scope of protection of the present invention. The above-mentioned silicon-free defoamer is added to the formula and will not precipitate from the cleaning agent, so the brush surface is clean, further reducing the problem of dirt on the surface of the microcrystalline glass.

[0039] The present invention also provides a method for preparing a cleaning agent, comprising the following steps: S10, dissolving an alkali, an acid, and an organic solvent in water in sequence to obtain a first mixed solution; S20, mixing the first mixed solution with a chelating agent, a dispersant, a precipitant, a defoaming agent, and an antistatic agent to obtain the cleaning agent. The preparation method of the cleaning agent provided by the present invention is simple, convenient, and easy to use.

[0040] The present invention also provides a method for using a cleaning agent, comprising the following steps: diluting the cleaning agent with water to a mass percentage of 5-10wt% to obtain a working solution; heating the working solution to 40-60°C to clean the microcrystalline glass with residual nano-cerium oxide polishing powder on the surface. Controlling the concentration of the cleaning agent in the working solution to 5wt%-10wt% (i.e., the mass of the cleaning agent accounts for 5%-10% of the mass of the working solution) and simultaneously controlling the temperature of the working solution to 40-60°C can more thoroughly remove the residual nano-cerium oxide polishing powder on the surface of the microcrystalline glass. It should be noted that the prepared working solution can be placed in the tank of a flatbed cleaning machine, heated to 40-60°C, and the polished microcrystalline glass can be cleaned with the aid of a brush. Since the cleaning agent does not contain a silicon defoamer, the brush will not be enriched with the silicon defoamer after cleaning with the working solution, thereby causing the surface of the microcrystalline glass to become dirty again.

[0041] The technical solutions of the present invention are further described in detail below in conjunction with specific embodiments. It should be understood that the following embodiments are only used to explain the present invention and are not used to limit the present invention.

[0042] Example 1

[0043] A cleaning agent comprising the following qualities of raw materials:

[0044] 89.4g deionized water, 1g sodium hydroxide, 1.5g benzoic acid, 0.5g disodium ethylenediaminetetraacetic acid, 0.5g sodium polyacrylate, 1g polyacrylamide, 5g isopropyl alcohol, 0.1g polyoxypropylene glycerol ether, 0.5g tetrabutylammonium fluoride; the pH of the cleaning agent at room temperature is 8.5.

[0045] Example 2

[0046] A cleaning agent comprising the following qualities of raw materials:

[0047] 74.75g deionized water, 2.5g sodium hydroxide, 5g citric acid, 1.25g sodium gluconate, 1.25g polyvinyl pyrrolidone, 4g polyacrylic acid, 5.5g ethylene glycol, 5g acetylenic alcohol defoaming agent, 0.75g propylene acetate; the pH of the cleaning agent at room temperature is 9.1.

[0048] Example 3

[0049] A cleaning agent comprising the following qualities of raw materials:

[0050] 62g deionized water, 5.5g triethanolamine, 10g glycolic acid, 2g tetrasodium ethylenediaminetetraacetic acid, 2g sodium dodecylbenzenesulfonate, 7g polyamine, 10g ethanol, 1g xylonic acid diester, 1g hexadecyltrimethylammonium chloride; the pH of the cleaning agent at room temperature is 9.5.

[0051] Comparative Example 1

[0052] Comparative Example 1 is different from Example 1 in that:

[0053] No disodium edetate was added, water was added in a differential amount, and other ingredients were the same as in Example 1.

[0054] Comparative Example 2

[0055] Comparative Example 2 is different from Example 1 in that:

[0056] Sodium polyacrylate was not added, water was added in a differential amount, and other ingredients were the same as in Example 1.

[0057] Comparative Example 3

[0058] Comparative Example 3 is different from Example 1 in that:

[0059] No polyacrylamide was added, water was added in a differential amount, and other ingredients were the same as in Example 1.

[0060] Comparative Example 4

[0061] Comparative Example 4 is different from Example 1 in that:

[0062] No isopropyl alcohol was added, and water was added in a differential amount. Other ingredients were the same as in Example 1.

[0063] Comparative Example 5

[0064] Comparative Example 5 is different from Example 1 in that:

[0065] No polyoxypropylene glycerol ether was added, and TEGO Antifoam X206 (a silicone defoaming agent) was added in the difference amount. Other ingredients were the same as those in Example 1.

[0066] Comparative Example 6

[0067] Comparative Example 6 is different from Example 1 in that:

[0068] Tetrabutylammonium fluoride was not added, water was added in a differential amount, and other ingredients were the same as in Example 1.

[0069] Table 1 Sources and descriptions of polymer additives used in all examples and comparative examples

[0070]

[0071] Performance Testing

[0072] 900 identically sized glass-ceramics for smartphone cover panels, polished with nano-cerium oxide, were randomly divided into nine groups of 100 pieces each. The cleaning agents used in Examples 1-4 and Comparative Examples 1-5 were diluted with water at a ratio of 90:10, yielding nine groups of 10wt% working solutions. Each of these nine working solutions was poured into the tank of a flatbed cleaning machine and heated to 40-60°C. Using a brush, these nine groups of glass-ceramics were cleaned sequentially to remove residual nano-cerium oxide and other contaminants from the polishing process. The amount of residual contaminants on the surfaces of the cleaned samples was measured. The inspection tool used was a defect detector from Zhongke Huihuiyuan. This defect detector uses a green light source (543-576nm wavelength) and a yellow filter to filter out interfering light. It can detect defects or particles as small as 10 microns, making it suitable for flaw detection on glass surfaces. Using a high-resolution industrial camera (an in-line detector), the device captures surface images, automatically identifies and counts particles, and generates inspection reports using customized software. The test results are shown in Table 2.

[0073] Table 2 Cleaning effect of the cleaning agents in Examples 1 to 3 and Comparative Examples 1 to 6 on polished glass-ceramics

[0074]

[0075] The above are merely preferred embodiments of the present invention and are not intended to limit the scope of the present invention. Those skilled in the art will readily appreciate that the present invention is susceptible to various modifications and variations. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention shall be included within the scope of the present invention.

Claims

1. A cleaning agent for cleaning polished glass-ceramics, characterized in that: The raw material components include the following mass percentages: 1-5wt% alkali, 2-10wt% organic acid, 0.5-2wt% chelating agent, 0.5-2wt% dispersant, 1-7wt% sedimentation agent, 0.01-1wt% defoaming agent, 0.5-1wt% antistatic agent, 1-10wt% organic solvent, and the balance is water; the pH of the cleaning agent at room temperature is 8.5-9.

5.

2. The cleaning agent according to claim 1, wherein The base includes one or more of sodium hydroxide, potassium hydroxide, and triethanolamine; and / or, The dispersant includes one or more of sodium polyacrylate, polyvinyl pyrrolidone, and sodium dodecylbenzene sulfonate; and / or, The organic solvent includes one or more of isopropyl alcohol, ethylene glycol, and ethanol.

3. The cleaning agent according to claim 1, wherein The organic acid includes one or more of citric acid, glycolic acid, and benzoic acid.

4. The cleaning agent according to claim 1, wherein The chelating agent includes one or more of disodium edetate, tetrasodium edetate, and sodium gluconate.

5. The cleaning agent according to claim 1, wherein The sedimentation agent includes one or more of polyacrylamide, polyacrylic acid, and polyamine.

6. The cleaning agent according to claim 1, wherein The antistatic agent includes one or more of tetrabutylammonium fluoride, propylene acetate, and hexadecyltrimethylammonium chloride.

7. The cleaning agent according to claim 1, wherein The defoaming agent includes a silicon-free defoaming agent, and the silicon-free defoaming agent includes one or more of polyoxypropylene glycerol ether, acetylene alcohol defoaming agent, and xylonic acid diester.

8. A method for preparing the cleaning agent according to any one of claims 1 to 7, characterized in that: The following steps are involved: S10, dissolving a base, an acid, and an organic solvent in water in sequence to obtain a first mixed solution; S20, mixing the first mixed solution with a chelating agent, a dispersant, a precipitant, a defoaming agent, and an antistatic agent to obtain the cleaning agent.

9. A method for using the cleaning agent according to any one of claims 1 to 7, characterized in that: The following steps are involved: Dilute the cleaning agent with water to a mass percentage of 5-10 wt % to obtain a working solution; The working liquid is heated to 40-60° C. to clean the microcrystalline glass with nano-cerium oxide polishing powder remaining on the surface.

Images