Fine polishing equipment for large-size photomask glass substrate

Abstract

The invention discloses fine polishing equipment for a large-size photomask glass substrate, and relates to the field of glass substrate grinding, the fine polishing equipment comprises a base and a processing table, and the top of the processing table is provided with an adsorption pad; the grinding assembly comprises a grinding disc and is used for grinding the glass substrate; the fence is arranged on the outer side of the machining table and used for protecting and receiving the cooling liquid; the cooling assembly is used for cooling a processing part when the grinding disc grinds the glass substrate, and cooling liquid is conveyed through a liquid inlet pipe; the baffle plate is used for preventing the cooling liquid from leaking; the cleaning accessory is connected to the interior of the annular channel between the fence and the machining table, and the cleaning accessory is rotationally connected to the interior of the annular channel through the rotating assembly; an electric control assembly and a driving assembly which are used for controlling the equipment to operate and work are arranged in the machine case. The cooling device has the advantages that when a large-size glass substrate is finely polished, the cooling effect can be improved, meanwhile, cooling liquid is prevented from splashing, and the recycling speed of the cooling liquid is increased.

Description

Technical Field

[0001] The invention belongs to the technical field, and in particular relates to a precision polishing device for a large-size photomask glass substrate. Background Art

[0002] A photomask, or mask for short, is a transparent glass or quartz plate coated with a special photosensitive adhesive. Through exposure and development processes, the photosensitive adhesive on the mask transfers the designed circuit pattern onto a silicon wafer. The photomask is manufactured on a glass substrate, which then undergoes polishing and finishing to achieve a smooth surface.

[0003] When fine-polishing large-sized photomask glass substrates, the prior art usually uses grinding equipment for processing. The prior art grinding equipment has the following disadvantages when used: since the grinding wheel required is large in size, the glass substrate needs to be cooled, dissipated and cleaned over a large area during fine-polishing, and the cooling device used in the prior art easily causes the coolant to spray outward, thereby causing waste of coolant. Moreover, when the coolant is used over a large area, the prior art cannot quickly circulate the coolant. Based on this, the present invention designs a fine-polishing device for large-sized photomask glass substrates. Summary of the Invention

[0004] The purpose of the present invention is to solve the problems in the prior art and to propose a precision polishing device for large-size photomask glass substrates.

[0005] A precision polishing device for large-size photomask glass substrates, comprising the following parts:

[0006] base;

[0007] A processing table is provided on the base, and an adsorption pad for fixing the glass substrate is provided on the top of the processing table;

[0008] A grinding assembly, comprising a grinding disc, for grinding a glass substrate;

[0009] A cylindrical enclosure is installed outside the processing table to protect and receive coolant;

[0010] The cooling component is used to cool the processing area when the grinding disc grinds the glass substrate, and the cooling liquid is transported through the liquid inlet pipe;

[0011] An arc-shaped shielding plate, which is provided on the opposite side of the cooling assembly to prevent coolant leakage, and is configured as a detachable structure;

[0012] A cleaning accessory, the cleaning accessory being connected to the annular channel between the enclosure and the processing table and being rotatably connected in the annular channel via the rotating assembly;

[0013] The chassis is provided with an electronic control component and a drive component for controlling the operation and work of the equipment.

[0014] In the above device, the arc plate includes two sub-plates, the two sub-plates are combined to form an arc plate, and the two sub-plates are installed together through a connecting block. The bottom of the connecting block is connected to a bracket rod, and the bracket rod is connected to the cleaning attachment.

[0015] In the above-mentioned equipment, the cleaning attachment includes a fan-shaped plate, which is detachably connected to an annular table arranged on the side of the processing table, and the annular table is connected to a driving motor arranged in the chassis. A cleaning layer for cleaning the bottom of the circular channel is provided at the bottom of the fan-shaped plate, and a recovery pipe for discharging waste liquid in the circular channel is provided on the side of the enclosure.

[0016] In the above-mentioned equipment, the rotating assembly includes a shoulder arranged on the top of the enclosure, the shoulder is a circular ring structure and its width is greater than the thickness of the enclosure, the upper end face of the shoulder is provided with an annular groove, a connecting ring is provided in the annular groove, the cross-section of the arc groove is set to a "T" shape structure and includes an upper part and a lower part, the width of the upper part is greater than the lower part, the connecting ring is rotatably connected to the upper part, and the bottom of the lower part is connected to the liquid inlet pipe.

[0017] In the above-mentioned device, the cooling assembly also includes a fixed plate fixed to the connecting ring, the fixed plate is provided with a movable groove cooperating with the shoulder and is rotatably connected to the shoulder, a delivery pipe is inserted into the fixed plate, the delivery pipe passes through the inner wall of the connecting ring and is connected to the lower part, the upper part of the delivery pipe is connected to a liquid spray pipe, and a swing assembly is connected between the liquid spray pipe and the delivery pipe.

[0018] In the above-mentioned device, the swing assembly includes a swing table, the spray pipe is rotatably connected to the liquid chamber opened in the swing table, the outer side of the spray pipe is connected to a sealing ring, the sealing ring is sealingly rotatably connected to the swing table, the side of the spray pipe is connected to a rotating shaft, the rotating shaft passes through the side wall of the liquid chamber and is rotatably connected to the swing table, the part of the rotating shaft outside the swing table is connected to a cam, the cam is inclined and its top is connected to the swing table through a spring.

[0019] In the above device, the grinding disc is connected to the movable table via a mounting disc, the movable table is connected to a three-degree-of-freedom operating table, and the operating table is fixed to the ground via a fixed table.

[0020] In the above device, the bottom of the arc-shaped plate is fixed to the connecting ring by magnetic attraction, and the arc-shaped plate is fixed to the connecting block by using a pin hole and a pin shaft.

[0021] The beneficial effects of the present invention are as follows: through the provided rotating assembly, cleaning attachment and baffle, the cleaning attachment can rotate to clean the annular channel while the cooling assembly basically rotates along the connecting ring to spray coolant on the glass, thereby increasing the area of ​​action and cooling effect of the coolant, and improving the grinding and fine polishing quality of the glass substrate. At the same time, the cleaning assembly can quickly discharge the coolant in the annular channel through the waste liquid pipe, which can increase the speed of coolant circulation and reduce the amount of coolant prepared. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 This is a structural schematic diagram of a first-viewing angle of view of a precision polishing device for a large-size photomask glass substrate provided by the present invention.

[0023] Figure 2 This is a structural schematic diagram of the second viewing angle of a precision polishing device for a large-size photomask glass substrate provided by the present invention.

[0024] Figure 3 This is a structural schematic diagram of a processing table in a precision polishing device for a large-size photomask glass substrate provided by the present invention.

[0025] Figure 4 This is a structural schematic diagram of the rotating component in the precision polishing equipment for large-size photomask glass substrates provided by the present invention.

[0026] Figure 5 This is a structural schematic diagram of the shielding plate in the precision polishing equipment for large-size photomask glass substrates provided by the present invention.

[0027] Figure 6 This is a structural schematic diagram of the swing component in the precision polishing equipment for large-size photomask glass substrates provided by the present invention.

[0028] Figure 7 This is a structural schematic diagram of the liquid chamber in a precision polishing device for a large-size photomask glass substrate provided by the present invention.

[0029] In the figure: 1 base, 2 processing table, 31 glass substrate, 32 adsorption pad, 33 enclosure, 34 circular channel, 4 grinding assembly, 41 grinding disk, 42 ​​mounting plate, 43 movable table, 44 operating table, 45 fixed table, 5 cooling assembly, 51 liquid inlet pipe, 52 fixed plate, 53 delivery pipe, 54 liquid spray pipe, 55 movable groove, 6 shielding plate, 61 dividing plate, 62 connecting block, 63 bracket rod, 7 cleaning accessory, 71 fan-shaped plate, 72 annular table, 73 cleaning brush layer, 74 recovery pipe, 8 rotating assembly, 81 shoulder, 82 annular groove, 83 connecting ring, 9 chassis, 10 swing assembly, 101 swing table, 102 liquid chamber, 103 rotating shaft, 104 sealing ring, 105 cam, 106 spring. DETAILED DESCRIPTION

[0030] Reference Figures 1 to 7 , a precision polishing device for large-size photomask glass substrates, including the following parts:

[0031] Base 1, used to support the equipment

[0032] A processing table 2 is provided on the base 1. An adsorption pad 32 for fixing a glass substrate 31 is provided on the top of the processing table 2. The adsorption pad 32 fixes the glass on the processing table 2 for grinding by negative pressure.

[0033] A grinding assembly 4, including a grinding disc 41, is used to grind the glass substrate 31. The grinding disc 41 is connected to a movable table 43 via a mounting plate 42. The movable table 43 is connected to a three-degree-of-freedom operating table 44. The operating table 44 is fixed to the ground via a fixed table 45.

[0034] The cylindrical enclosure 33 is arranged on the outside of the processing table 2 for protecting and receiving the coolant. An arc-shaped shielding plate 6 is provided on the top of the enclosure 33. The shielding plate is provided on the opposite side of the cooling assembly 5 to prevent the coolant from leaking. The shielding plate 6 is provided as a detachable structure to facilitate cleaning and installation. The arc-shaped plate 6 includes two sub-plates 61. The two sub-plates 61 are combined to form the arc-shaped plate 6. The two sub-plates 61 are installed together through a connecting block 62. The bottom of the connecting block 62 is connected to a bracket rod 63, and the bracket rod 63 is connected to the cleaning accessory 7.

[0035] The cooling assembly 5 is used to cool the processing area when the grinding disc 41 grinds the glass substrate 31. The coolant is transported through the liquid inlet pipe 51. The cooling assembly 5 also includes a fixed plate 52 fixed to the connecting ring 63. The fixed plate 52 is provided with a movable groove 55 that cooperates with the shoulder 61 and is rotatably connected to the shoulder 61. A delivery pipe 53 is inserted into the fixed plate 52. The delivery pipe 53 passes through the inner wall of the connecting ring 63 and is connected to the lower part. The upper part of the delivery pipe 53 is connected to the spray pipe 54, and the swing assembly 10 is connected between the spray pipe 54 and the delivery pipe 63.

[0036] The swing assembly 10 includes a swing table 101, the liquid spraying pipe 84 is rotatably connected to the liquid chamber 102 opened in the swing table 101, and the outer side of the liquid spraying pipe 84 is connected to a sealing ring 104. The sealing ring 104 is rotatably connected to the swing table 101, so that the liquid spraying pipe 84 can keep the liquid chamber in a sealed state during rotation. The side of the liquid spraying pipe 84 is connected to a rotating shaft 103, which passes through the side wall of the liquid chamber 102 and is rotatably connected to the swing table 101. The rotating shaft 103 is located on the outer side of the swing table 101. The cam 105 is connected to the swing table 101, which is tilted and has a top connected to the swing table 101 through a spring 106. When rotating, the cam 105 produces a small displacement through the spring, thereby driving the spray pipe 84 to swing through the rotating shaft 103. In this way, the spray pipe 84 can achieve the effect of swinging and spraying within a certain range, thereby increasing the spray range and the cooling effect of the coolant. After the processing is completed, the cleaning liquid can also be input through the liquid inlet pipe 51, so that the workpiece can be quickly rinsed, which is convenient to use.

[0037] The cleaning attachment 7 is connected to the annular channel 34 between the enclosure 33 and the processing table 2 and is rotatably connected to the annular channel 34 by the rotating assembly 8. The cleaning attachment 7 includes a fan-shaped plate 71. The fan-shaped plate 71 is detachably connected to an annular table 72 provided on the side of the processing table 2. The annular table 72 is connected to a drive motor provided in the chassis 9. A brush layer 73 for cleaning the bottom of the annular channel 34 is provided at the bottom of the fan-shaped plate 71. A recovery pipe 74 for discharging waste liquid in the annular channel 34 is provided on the side of the enclosure 33 for discharging the waste liquid;

[0038] The rotating assembly 8 includes a shoulder 81 arranged on the top of the enclosure 33. The shoulder 81 is a circular ring structure and its width is greater than the thickness of the enclosure 33. An annular groove 82 is opened on the upper end surface of the shoulder 81, and a connecting ring 83 is arranged in the annular groove 82. The cross section of the arc groove 82 is set to a "T" shape structure and includes an upper part and a lower part. The width of the upper part is greater than that of the lower part. The connecting ring 83 is rotatably connected to the upper part, and the bottom of the lower part is connected to the liquid inlet pipe 51. The shoulder 81 is used to install the connecting ring 83, so that the connecting ring 83 has space for rotational movement and at the same time facilitates the installation of the enclosure 33.

[0039] The chassis 9 is provided with an electronic control component and a driving component for controlling the operation and work of the equipment, wherein the driving component fixes the glass substrate by outputting negative pressure, and drives the annular table 72 to rotate through the driving motor, thereby achieving the effect of driving the cleaning accessory 7 to work.

[0040] It is understood from common technical knowledge that the present invention may be implemented by other embodiments that do not depart from its spirit or essential features. Therefore, the embodiments disclosed above are, in all respects, merely illustrative and not exclusive. All modifications within the scope of the present invention or equivalent to the scope of the present invention are intended to be encompassed by the present invention.

Claims

1. A precision polishing device for large-size photomask glass substrates, characterized in that: Includes the following sections: Base (1); A processing table (2) is arranged on the base (1), and an adsorption pad (32) for fixing the glass substrate (31) is provided on the top of the processing table (2); A grinding assembly (4), comprising a grinding disc (41), for grinding a glass substrate (31); A cylindrical enclosure (33) is provided on the outside of the processing table (2) for protecting and receiving cooling liquid; A cooling assembly (5) is used for cooling the processing area when the grinding disc (41) grinds the glass substrate (31), and the cooling liquid is transported through the liquid inlet pipe (51); an arc-shaped shielding plate (6), the shielding plate being arranged on the opposite side of the cooling assembly (5) for preventing leakage of the coolant, the shielding plate (6) being arranged as a detachable structure; a cleaning attachment (7), the cleaning attachment (7) being connected to the annular channel (34) between the enclosure (33) and the processing table (2), and being rotatably connected in the annular channel (34) via the rotating assembly (8); A chassis (9) is provided with an electric control component and a drive component for controlling the operation and working of the device.

2. The precision polishing equipment for large-size photomask glass substrates according to claim 1, characterized in that: The arc-shaped plate (6) comprises two sub-plates (61), the two sub-plates (61) are combined to form the arc-shaped plate (6), the two sub-plates (61) are mounted together via a connecting block (62), a support rod (63) is connected to the bottom of the connecting block (62), and the support rod (63) is connected to the cleaning attachment (7).

3. The precision polishing equipment for large-size photomask glass substrates according to claim 2, characterized in that: The cleaning attachment (7) comprises a fan-shaped plate (71), the fan-shaped plate (71) being detachably connected to an annular table (72) provided on the side of the processing table (2), the annular table (72) being connected to a driving motor provided in the chassis (9), a cleaning layer (73) for cleaning the bottom of the annular channel (34) being provided at the bottom of the fan-shaped plate (71), and a recovery pipe (74) for discharging waste liquid in the annular channel (34) being provided on the side of the enclosure (33).

4. The precision polishing equipment for large-size photomask glass substrates according to claim 1, characterized in that: The rotating assembly (8) includes a shoulder (81) arranged on the top of the enclosure (33), the shoulder (81) is a circular ring structure and its width is greater than the thickness of the enclosure (33), an annular groove (82) is provided on the upper end surface of the shoulder (81), a connecting ring (83) is provided in the annular groove (82), the cross section of the arc groove (82) is set to a "T"-shaped structure and includes an upper part and a lower part, the width of the upper part is greater than that of the lower part, the connecting ring (83) is rotatably connected to the upper part, and the bottom of the lower part is connected to the liquid inlet pipe (51).

5. The precision polishing equipment for large-size photomask glass substrates according to claim 4, characterized in that: The cooling assembly (5) also includes a fixed plate (52) fixed to the connecting ring (83), the fixed plate (52) is provided with a movable groove (55) cooperating with the shoulder (81) and is rotatably connected to the shoulder (81), a delivery pipe (53) is inserted into the fixed plate (52), the delivery pipe (53) passes through the inner wall of the connecting ring (83) and is connected to the lower part, the upper part of the delivery pipe (53) is connected to the spray pipe (54), and a swing assembly (10) is connected between the spray pipe (54) and the delivery pipe (53).

6. The precision polishing equipment for large-size photomask glass substrates according to claim 4, characterized in that: The oscillating assembly (10) includes an oscillating platform (101), the liquid spraying pipe (84) is rotatably connected to a liquid cavity (102) opened in the oscillating platform (101), a sealing ring (104) is connected to the outer side of the liquid spraying pipe (84), and the sealing ring (104) is rotatably connected to the oscillating platform (101), a rotating shaft (103) is connected to the side of the liquid spraying pipe (84), the rotating shaft (103) passes through the side wall of the liquid cavity (102) and is rotatably connected to the oscillating platform (101), and a cam (105) is connected to the portion of the rotating shaft (103) outside the oscillating platform (101), the cam (105) is tilted and its top is connected to the oscillating platform (101) via a spring (106).

7. The precision polishing equipment for large-size photomask glass substrates according to claim 1, characterized in that: The grinding disc (41) is connected to a movable platform (43) via a mounting disc (42); the movable platform (43) is connected to a three-degree-of-freedom operating platform (44); and the operating platform (44) is fixed to the ground via a fixed platform (45).

8. The precision polishing equipment for large-size photomask glass substrates according to claim 2, characterized in that: The bottom of the arc-shaped plate (6) is fixed to the connecting ring (83) by magnetic attraction, and the arc-shaped plate (6) is connected and fixed to the connecting block (62) by using a pin hole and a pin shaft.

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