Double-sided polishing apparatus
By designing an automatic loading and unloading mechanism and an upper plate assembly, the problems of time-consuming and labor-intensive loading and unloading and easy collisions in existing double-sided polishing machines have been solved, achieving a highly efficient and safe polishing process.
Patent Information
- Application Number
- CN202511019112.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-23
- Publication Date
- 2026-02-06
- Estimated Expiration
- 2045-07-23
AI Technical Summary
Existing double-sided polishing machines require manual loading and unloading, which is time-consuming and labor-intensive. Automatic loading and unloading mechanisms have limited space and are prone to collisions and interference, which limits polishing efficiency and safety.
The system adopts an automatic loading and unloading mechanism and an upper plate assembly design. The upper plate assembly is driven by a clearance drive to switch between a clearance position and a loading and unloading position, ensuring that the planetary wheel is exposed to facilitate automatic loading and unloading. The gear meshing transmission ensures the accuracy and safety of power transmission.
It enables smooth automatic loading and unloading, shortens loading and unloading time, improves polishing efficiency and safety, and avoids collisions and interference between the upper plate and the automatic loading and unloading mechanism.
Smart Images

Figure CN120755778B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of polishing equipment, and in particular to a double-sided polishing equipment. BACKGROUND
[0002] The polishing machine is widely used for double-sided planar polishing of silicon wafers, glass, sapphire, crystal, silicon carbide, gallium arsenide and other semiconductor materials. The lower disc mechanism of the polishing machine includes a sun gear and a ring gear, a wandering star wheel (i.e., a carrier) for carrying workpieces is loaded between the sun gear and the ring gear, and is clamped by an upper disc in the upper disc mechanism and a lower disc in the lower disc mechanism. When the sun gear and the ring gear rotate, the wandering star wheel drives the product to move relatively between the upper disc and the lower disc, so that the polishing pads of the upper disc and the lower disc polish the product from both sides.
[0003] In the related art, the conventional double-sided polishing machine needs manual loading and unloading, which is time-consuming and labor-intensive, and reduces the polishing efficiency. In some double-sided polishing machines, although an automatic loading and unloading mechanism (such as a mechanical arm) is configured, the upper disc mechanism needs to be vertically raised by a certain distance, and the loading and unloading space between the upper disc and the lower disc is limited, which not only limits the smooth completion of the loading action of the automatic loading and unloading mechanism, prolongs the loading and unloading time, and limits the improvement of the polishing efficiency. Moreover, the upper disc is prone to collision and interference with the automatic loading and unloading mechanism, which reduces the safety of the polishing process. SUMMARY
[0004] The present application aims to provide a double-sided polishing machine to realize automatic loading and unloading, improve the polishing efficiency and the safety of the polishing process.
[0005] To achieve this purpose, the technical solution adopted by the present application is as follows:
[0006] The double-sided polishing equipment comprises an automatic loading and unloading mechanism and a polishing machine, the polishing machine comprises a lower disc mechanism and an upper disc mechanism, the lower disc mechanism comprises a rotatable lower disc, a sun gear, a ring gear and a wandering star wheel, the lower disc, the sun gear and the ring gear are coaxially arranged, a plurality of wandering star wheels are movably arranged on the lower disc, and each wandering star wheel is engaged with the sun gear and the ring gear, respectively; the wandering star wheel is provided with an accommodation groove for accommodating products.
[0007] The upper disc mechanism comprises a base, an upper disc assembly and a position avoiding driving member. The base is arranged above the lower disc mechanism. The upper disc assembly comprises a rotatable upper disc. The upper disc assembly is horizontally slidably arranged on the base and has an avoiding position and an upper and lower material position. The position avoiding driving member is in transmission connection with the upper disc assembly to drive the upper disc assembly to switch between the avoiding position and the upper and lower material position. When the upper disc assembly is in the avoiding position, the upper disc is arranged opposite to the lower disc in the height direction. When the upper disc assembly is in the upper and lower material position, at least one of the wandering star wheels is located outside the projection area of the lower disc in the height direction of the upper disc to perform upper and lower material feeding to the accommodation groove of the wandering star wheel through the automatic upper material feeding mechanism.
[0008] As an option, the upper disc assembly further comprises:
[0009] a seat frame slidably arranged on the base. The position avoiding driving member is in transmission connection with the seat frame to drive the seat frame to slide to the avoiding position or the upper and lower material position.
[0010] a first driving member movably arranged on the seat frame and in transmission connection with the upper disc to drive the upper disc to rotate in the axial direction.
[0011] As an option, the upper disc assembly further comprises a second driving member arranged on the seat frame and in transmission connection with the first driving member to drive the upper disc to move up and down in the height direction through the first driving member to switch between a polishing position and the avoiding position, and the avoiding position is above the polishing position.
[0012] As an option, the upper disc assembly further comprises a displacement sensor configured to detect the up and down position of the upper disc in the height direction.
[0013] As an option, the upper disc assembly further comprises:
[0014] a lead screw. The output end of the position avoiding driving member is in transmission connection with the lead screw. The seat frame is in screw connection with the lead screw.
[0015] a slide rail arranged on the base in the axial direction of the lead screw. The seat frame is in sliding fit with the slide rail.
[0016] As an option, the upper disc assembly further comprises a liquid receiving disc arranged on the lower disc mechanism. One end of the liquid receiving disc extends below the upper disc in the upper and lower material position.
[0017] As an option, the lower disc mechanism further comprises a third driving member, a first driving gear and a first driving gear, the output end of the third driving member is in driving connection with the first driving gear, the first driving gear is in meshing transmission with the first driving gear, and the first driving gear is in driving connection with the sun gear, so as to drive the sun gear to rotate axially through the first driving gear.
[0018] The lower disc mechanism further comprises a fourth driving member, a second driving gear and a second driving gear, the output end of the fourth driving member is in driving connection with the second driving gear, the second driving gear is in meshing transmission with the second driving gear, and the second driving gear is in driving connection with the ring gear, so as to drive the ring gear to rotate axially through the second driving gear.
[0019] The lower disc mechanism further comprises a fifth driving member, the fifth driving member is in driving connection with the lower disc, so as to drive the lower disc to rotate axially.
[0020] As an option, the lower disc mechanism further comprises two brake mechanisms, one of the brake mechanisms is in limiting cooperation with the first driving gear, so as to limit the axial rotation of the first driving gear, and the other brake mechanism is in limiting cooperation with the second driving gear, so as to limit the axial rotation of the second driving gear, and the meshing gap between the planet gear and the sun gear and the meshing gap between the planet gear and the ring gear are located on the same side.
[0021] As an option, the brake mechanism comprises a brake driving member and a brake rod, the brake driving member is in driving connection with the brake rod, so as to drive the brake rod to abut against or be separated from the tooth surface of the corresponding sun gear or ring gear.
[0022] As an option, the third driving member and the fourth driving member are both servo motors.
[0023] The beneficial effects of the present application are as follows:
[0024] The double-sided polishing equipment provided by the application drives the upper disc assembly to slide horizontally from the avoiding position to the feeding and discharging position on the base by the avoiding driving member, so that at least one planet wheel is located outside the projection area of the lower disc in the height direction of the upper disc, the upper disc avoids shielding all the planet wheels in the height direction, at least one planet wheel is exposed, the automatic feeding and discharging mechanism places the products to be polished on the accommodation groove of the exposed planet wheel or takes out the products from the accommodation groove of the exposed planet wheel, and the lower disc rotation drives the plurality of planet wheels to be exposed on the upper disc one by one, so that the automatic feeding and discharging operation of the products on the plurality of planet wheels is realized. In the above automatic feeding and discharging process, the upper disc completely gives up the space above the planet wheel located outside the projection area of the lower disc on the upper disc, so as to ensure that the automatic feeding and discharging mechanism has sufficient movement space, the feeding and discharging process is smoothly carried out, the feeding and discharging time is shortened, and the polishing efficiency is improved. Meanwhile, the collision and interference between the upper disc and the automatic feeding and discharging mechanism are avoided, and the safety of the polishing process is improved. BRIEF DESCRIPTION OF DRAWINGS
[0025] Figure 1 is a structural schematic diagram of the double-sided polishing equipment provided by the embodiment of the application;
[0026] Figure 2 is a partial structural schematic diagram of the double-sided polishing equipment provided by the embodiment of the application;
[0027] Figure 3 is a first structural schematic diagram of the lower disc mechanism provided by the embodiment of the application;
[0028] Figure 4 is a second structural schematic diagram of the lower disc mechanism provided by the embodiment of the application;
[0029] Figure 5 is a structural schematic diagram of the upper disc mechanism provided by the embodiment of the application.
[0030] The component names and numbers in the figure are as follows:
[0031] 100, lower disc mechanism; 1, lower disc; 2, sun gear; 3, ring gear; 4, planet wheel; 41, accommodation groove; 5, third driving member; 6, first driving gear; 7, first driving gear; 8, fourth driving member; 9, second driving gear; 10, second driving gear; 11, brake mechanism; 111, brake driving member; 112, brake lever; 12, electrical cabinet; 13, laser sensor;
[0032] 200, upper disc mechanism; 20, upper disc; 21, base; 22, avoiding driving member; 23, seat frame; 24, first driving member; 25, second driving member; 26, displacement sensor; 27, lead screw; 28, sliding rail; 29, liquid receiving disc. DETAILED DESCRIPTION
[0033] In order to make the technical problems solved by the present application, the technical solutions adopted and the technical effects reached more clear, the technical solutions of the present application will be further described below in conjunction with the accompanying drawings and specific embodiments. It can be understood that the specific embodiments described here are only used to explain the present application, but not limit the present application. In addition, it should be noted that, for the convenience of description, only the parts related to the present application are shown in the drawings, not all.
[0034] In the description of the present application, unless otherwise explicitly specified and limited, the terms "connected", "connected", "fixed" should be understood broadly, for example, it can be fixedly connected, or detachably connected, or integrated; it can be mechanically connected, or electrically connected; it can be directly connected, or indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.
[0035] In the present application, unless otherwise explicitly specified and limited, the "upper" or "lower" of the first feature to the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the "upper", "above" and "on" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The "below", "under" and "under" of the first feature to the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.
[0036] In the description of the present embodiment, the terms "upper", "lower", "right", "left" and other orientation or position relationship are based on the orientation or position relationship shown in the drawings, only for the convenience of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore cannot be understood as a limitation to the present application. In addition, the terms "first", "second" are only used to distinguish in description, and have no special meaning.
[0037] The technical solutions of the present application will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0038] As Figure 1 and Figure 2As shown, this embodiment proposes a double-sided polishing device, which includes an automatic loading and unloading mechanism (not shown in the figure) and a polishing machine. The polishing machine includes a lower plate mechanism 100 and an upper plate mechanism 200. The lower plate mechanism 100 includes a rotatable lower plate 1, a sun gear 2, a gear ring 3, and planetary gears 4. The lower plate 1, sun gear 2, and gear ring 3 are coaxially arranged. Multiple planetary gears 4 are movably arranged on the lower plate 1, and each planetary gear 4 meshes with the sun gear 2 and gear ring 3 respectively. A receiving groove 41 for accommodating the product is opened through the planetary gears 4. The upper plate mechanism 200 includes a base 21 and an upper plate 20 assembly. The base 21 is arranged above the lower plate mechanism 100, and the upper plate 20 assembly includes a rotatable upper plate 20. During the polishing process, the product to be polished is located in the receiving groove 41 of the planetary gear 4, and the size of the receiving groove 41 is adapted to the product. The upper plate 20 and the lower plate 1 are aligned along the height direction ( Figure 1 The upper plate 20 is positioned directly above the lower plate 1, with the planetary wheel 4 located between the upper plate 20 and the lower plate 1. During polishing, the upper plate 20, lower plate 1, sun wheel 2, and gear ring 3 rotate at adjustable speeds, causing the planetary wheel 4 to rotate around its own axis under the drive of the sun wheel 2 and gear ring 3. This ensures that the polishing pads of the upper plate 20 and lower plate 1 evenly polish the product within the planetary wheel 4, achieving uniform polishing of the product. The aforementioned automatic loading and unloading mechanism is a robotic arm or similar device. Since the process of achieving automatic loading and unloading using robotic arms or similar devices is existing technology, the mechanism and loading / unloading operation of the robotic arm or similar device will not be described in detail here.
[0039] like Figure 1 As shown, the upper plate mechanism 200 is installed directly above the lower plate mechanism 100. The lower plate mechanism 100 is equipped with a column and an electrical cabinet 12, which together support the base 21 of the upper plate mechanism 200, thereby achieving a compact installation of the polishing machine and making full use of the installation space. Figure 2 As shown, a laser sensor 13 is installed on the rear side of the electrical cabinet 12 to detect the rotational position of the gear ring 3.
[0040] like Figure 3As shown, the lower disc mechanism 100 further comprises a third driving member 5, a first driving gear 6 and a first driven gear 7, the output end of the third driving member 5 is in transmission connection with the first driving gear 6, the first driving gear 6 is in meshing transmission with the first driven gear 7, and the first driven gear 7 is in transmission connection with the sun gear 2, so as to drive the sun gear 2 to rotate axially through the first driven gear 7. The lower disc mechanism 100 further comprises a fourth driving member 8, a second driving gear 9 and a second driven gear 10, the output end of the fourth driving member 8 is in transmission connection with the second driving gear 9, the second driving gear 9 is in meshing transmission with the second driven gear 10, and the second driven gear 10 is in transmission connection with the ring gear 3, so as to drive the ring gear 3 to rotate axially through the second driven gear 10. The lower disc mechanism 100 further comprises a fifth driving member, the fifth driving member is in transmission connection with the lower disc 1, so as to drive the lower disc 1 to rotate axially. The sun gear 2 and the ring gear 3 are driven to rotate axially (i.e. rotate around the respective axes) by the lower disc mechanism 100 in the manner of gear meshing. Since the transmission ratio of the gear transmission is constant, the accuracy of power transmission of the third driving member 5 and the fourth driving member 8 is ensured. Meanwhile, the transmission mode of gear meshing not only runs stably, but also is conducive to reducing the vibration and noise of the polishing machine. Moreover, the structure of gear meshing is relatively small in size, so that the structure of the lower disc mechanism 100 is more compact.
[0041] In the present embodiment, the third driving member 5 and the fourth driving member 8 are both servo motors. The servo motor has the advantages of high control accuracy and stable output, so as to ensure the rotation accuracy of the sun gear 2 and the ring gear 3. The fifth driving member can also be a servo motor, so as to ensure the rotation accuracy of the lower disc 1.
[0042] In the optional embodiment, the lower disc mechanism 100 further comprises two brake mechanisms 11. One of the brake mechanisms 11 is in limiting cooperation with the first driven gear 7, so as to limit the axial rotation of the first driven gear 7. The other brake mechanism 11 is in limiting cooperation with the second driven gear 10, so as to limit the axial rotation of the second driven gear 10, and the meshing gap between the planet gear 4 and the sun gear 2 and the meshing gap between the planet gear 4 and the ring gear 3 are located on the same side. By arranging the two brake mechanisms 11, the brake function is added to the first driven gear 7 and the second driven gear 10 respectively. When the sun gear 2 and the ring gear 3 are stopped, the two brake mechanisms 11 push the meshing gap between the planet gear 4 and the sun gear 2 and the meshing gap between the planet gear 4 and the ring gear 3 to the same side, so as to ensure that the meshing gaps between the ring gear 3 and the planet gear 4 and between the sun gear 2 and the planet gear 4 are always on the same side, and the meshing gaps are not random, thereby improving the positioning accuracy of the planet gear 4 in the lower disc 1, so as to facilitate the robot or the mechanical arm to accurately place or take out the product from the accommodation groove 41 of the planet gear 4, and improve the accuracy and reliability of the automatic feeding and discharging.
[0043] As shown in FIG. 2, the lower disc mechanism 100 further comprises a first brake mechanism 11 and a second brake mechanism 11. The first brake mechanism 11 is in limiting cooperation with the first driven gear 7, so as to limit the axial rotation of the first driven gear 7. The second brake mechanism 11 is in limiting cooperation with the second driven gear 10, so as to limit the axial rotation of the second driven gear 10. The meshing gap between the planet gear 4 and the sun gear 2 and the meshing gap between the planet gear 4 and the ring gear 3 are located on the same side. Figure 4As shown, the braking mechanism 11 includes a braking drive component 111 and a brake lever 112. The braking drive component 111 is connected to the brake lever 112 to drive the brake lever 112 to press against or disengage from the tooth surface of the corresponding sun gear 2 or gear ring 3. The braking drive component 111 is a cylinder. The cylinder has a simple structure, is easy to install and maintain, and responds quickly, enabling it to quickly push out the brake lever 112, thereby quickly stopping the rotation of the sun gear 2 and gear ring 3. When loading or unloading is required on the planetary wheel 4, the third drive component 5 and the fourth drive component 8 stop. The two cylinders respectively drive the corresponding brake lever 112 to extend and press against the tooth surface of the sun gear 2 and the tooth surface of the gear ring 3, thereby completely stopping the rotation of the sun gear 2 and gear ring 3. Under the push of the two brake levers 112, the meshing gap between the gear ring 3 and the sun gear 2 and the planetary wheel 4 is always on the same side, thereby accurately positioning the planetary wheel 4 in the lower plate 1.
[0044] Existing double-sided polishing machines, although equipped with automatic loading and unloading mechanisms, require the upper plate mechanism to be vertically raised a certain distance. The limited loading and unloading space between the upper and lower plates not only restricts the smooth loading and unloading of the automatic mechanism, prolonging the loading and unloading time and limiting the improvement of polishing efficiency, but also makes it easy for the upper plate to collide and interfere with the automatic loading and unloading mechanism, reducing the safety of the polishing process.
[0045] To solve the above problems, such as Figure 1 and Figure 5As shown, the upper disc mechanism 200 of the embodiment further comprises a position-avoiding driving member 22, and the upper disc 20 assembly is horizontally slidably arranged on the base 21 and has an avoiding position and a feeding and discharging position. The position-avoiding driving member 22 is in transmission connection with the upper disc 20 assembly to drive the upper disc 20 assembly to switch between the avoiding position and the feeding and discharging position. When the upper disc 20 assembly is located at the avoiding position, the upper disc 20 is arranged opposite to the lower disc 1 in the height direction. When the upper disc 20 assembly is located at the feeding and discharging position, at least one planet wheel 4 is located outside the projection area of the lower disc 1 in the height direction of the upper disc 20, so as to feed and discharge products into the accommodation groove 41 of the planet wheel 4 through the automatic feeding and discharging mechanism. The position-avoiding driving member 22 drives the upper disc 20 assembly to horizontally slide from the avoiding position to the feeding and discharging position on the base 21, so that at least one planet wheel 4 is located outside the projection area of the lower disc 1 in the height direction of the upper disc 20, avoiding that the upper disc 20 blocks all the planet wheels 4 in the height direction, so that at least one planet wheel 4 is exposed, so that the automatic feeding and discharging mechanism can place the products to be polished in the accommodation groove 41 of the exposed planet wheel 4 or take the products out of the accommodation groove 41 of the exposed planet wheel 4, and the rotation of the lower disc 1 drives the plurality of planet wheels 4 to be exposed on the upper disc 20 one by one, so as to realize the automatic feeding and discharging operation of the products on the plurality of planet wheels 4. In the above automatic feeding and discharging process, the upper disc 20 completely gives up the space above the planet wheel 4 located outside the projection area of the lower disc 1 in the upper disc 20, so as to ensure that the automatic feeding and discharging mechanism has sufficient movement space, realizes smooth feeding and discharging process, shortens the feeding and discharging time, and improves the polishing efficiency. At the same time, the collision interference between the upper disc 20 and the automatic feeding and discharging mechanism is avoided, and the safety of the polishing process is improved. In addition, the polishing liquid of the upper disc 20 will not drip on the vision system or other detection elements of the automatic feeding and discharging mechanism, so as to ensure the reliability of the automatic feeding and discharging mechanism.
[0046] As shown, Figure 5 The upper disc 20 assembly further comprises a seat frame 23 and a first driving member 24, and the seat frame 23 is slidably arranged on the base 21. The position-avoiding driving member 22 is in transmission connection with the seat frame 23 to drive the seat frame 23 to slide to the avoiding position or the feeding and discharging position. The first driving member 24 is movably arranged on the seat frame 23 and is in transmission connection with the upper disc 20 to drive the upper disc 20 to rotate in the axial direction. The above-mentioned first driving member 24 is a motor. When feeding and discharging is needed, the position-avoiding driving member 22 drives the seat frame 23 to horizontally slide from front to back to the feeding and discharging position, at this time, the upper space of one planet wheel 4 is exposed, so that the automatic feeding and discharging mechanism has sufficient movement space to place the products in the accommodation groove 41 of the exposed planet wheel 4 or take the polished products out of the accommodation groove 41 of the exposed planet wheel 4. When the feeding and discharging is completed, the position-avoiding driving member 22 drives the seat frame 23 to horizontally slide from back to front to the avoiding position.
[0047] In an optional embodiment, the upper disc 20 assembly further comprises a lead screw 27 and a slide rail 28, and the output end of the give-way driving member 22 is in transmission connection with the lead screw 27. The seat frame 23 is in threaded connection with the lead screw 27. The slide rail 28 is arranged on the base 21 along the axial direction (front-rear direction in the figure) of the lead screw 27, and the seat frame 23 is in sliding fit with the slide rail 28. Through the threaded connection between the seat frame 23 and the lead screw 27 and the sliding fit between the seat frame 23 and the slide rail 28, the seat frame 23 can be driven to slide horizontally along the slide rail 28 in the front-rear direction under the driving of the lead screw 27, so as to realize the guiding and limiting of the sliding process of the seat frame 23 on the base 21 through the slide rail 28, thereby improving the sliding precision and stability of the seat frame 23.
[0048] In the embodiment, the slide rail 28 extends in the front-rear direction and is arranged in two in the left-right direction, and the seat frame 23 is in sliding fit with both of the slide rails 28, so as to avoid the positional deviation of the seat frame 23 in the sliding process, thereby further improving the sliding precision and stability of the seat frame 23.
[0049] As shown in Figure 5 The upper disc 20 assembly further comprises a second driving member 25 arranged on the seat frame 23 and in transmission connection with the first driving member 24, so as to drive the upper disc 20 to move up and down along the height direction through the first driving member 24, to switch between the polishing position and the give-way position, and the give-way position is above the polishing position. The second driving member 25 can be a pneumatic cylinder. When the feeding and discharging are needed, the second driving member 25 drives the first driving member 24 and the upper disc 20 to move up from the polishing position to the give-way position along the height direction, and then the give-way driving member 22 drives the seat frame 23 to slide horizontally from the front to the rear to the feeding and discharging position. Through the process of first lifting the upper disc 20 and then moving it from the front to the rear to the feeding and discharging position, the upper disc 20 is first pulled away from the lower disc mechanism 100 by a large distance before it slides horizontally to the feeding and discharging position, so as to avoid the interference between the upper disc 20 and the lower disc mechanism 100, thereby improving the safety of the feeding and discharging process. When the feeding and discharging are completed, the give-way driving member 22 drives the seat frame 23 to slide horizontally from the rear to the front to the give-way position, and the second driving member 25 drives the first driving member 24 and the upper disc 20 to move down from the give-way position to the polishing position along the height direction, so that the upper disc 20 is arranged opposite to the lower disc 1 and clamps the planet wheel 4 in the middle, to realize the double-sided polishing of the product.
[0050] As shown in Figure 5 The upper disc 20 assembly further comprises a displacement sensor 26 configured to detect the lifting position of the upper disc 20 along the height direction. Specifically, the polishing machine further comprises a control module, and the displacement sensor 26 is in electrical connection with the control module, so as to transmit the detected lifting position of the upper disc 20 to the control module, and the control module controls the second driving member 25 to drive the upper disc 20 to switch between the polishing position and the give-way position. Since the control module is a prior art, the structure and working process of the control module will not be described herein.
[0051] AsFigure 1 As shown, the upper disc 20 assembly further comprises a liquid receiving disc 29 arranged on the lower disc mechanism 100, one end of the liquid receiving disc 29 extending to below the upper disc 20 at the upper and lower feeding positions. By extending the liquid receiving disc 29 directly below the upper and lower feeding positions, all the polishing liquid dripping from the upper disc 20 after moving to the upper and lower feeding positions is ensured to fall into the liquid receiving disc 29, ensuring the neatness of the environment around the polishing machine. The liquid receiving disc 29 comprises a mounting portion and a disc body containing the polishing liquid, the mounting portion being mounted on the lower disc mechanism 100, and the disc body being detachably arranged on the mounting portion. The liquid receiving disc 29 adopts a split combination mode (such as plug-in or connection by screws, etc.), so that the disc body can be detached from the mounting portion, facilitating the cleaning of the polishing pad in the liquid receiving disc 29.
[0052] It should be noted that since the products to be polished are mostly thin sheet structures, a small amount of the polished products will be adsorbed on the upper disc 20. Therefore, a water polishing process is added after the polishing process is completed, that is, the polishing liquid is replaced with water to continue washing the upper disc 20, so as to reduce the adsorption force between the products and the upper disc 20. The control module controls the second driving member 25 to make the upper disc 20 ascend a small distance, so that the upper disc 20 moves away from the polishing position, but it is still necessary to ensure that the products adsorbed on the upper disc 20 will not move away from the accommodation groove 41 corresponding to the star wheel 4. At this time, the first driving member 24 drives the upper disc 20 to rotate axially, and the star wheel 4 remains stationary, so that the products and the upper disc 20 move relatively, further reducing the adsorption force between them, so that the products and the upper disc 20 can be separated more quickly.
[0053] The above embodiments only illustrate the basic principles and characteristics of the present application, and the present application is not limited to the above embodiments. Without departing from the spirit and scope of the present application, various changes and modifications can be made to the present application, and these changes and modifications all fall within the scope of the present application. The scope of protection of the present application is defined by the appended claims and their equivalents.
Claims
1. A double-sided polishing equipment, characterized in that, The system includes an automatic loading and unloading mechanism and a polishing machine. The polishing machine includes a lower plate mechanism (100) and an upper plate mechanism (200). The lower plate mechanism (100) includes a rotatable lower plate (1), a sun gear (2), a gear ring (3), and planetary gears (4). The lower plate (1), the sun gear (2), and the gear ring (3) are coaxially arranged. Multiple planetary gears (4) are movably arranged on the lower plate (1), and each planetary gear (4) meshes with the sun gear (2) and the gear ring (3) respectively. Each planetary gear (4) has a through-hole for holding a product in a receiving groove (41). The upper plate mechanism (200) includes a base (21), an upper plate assembly, and a clearance drive (22). The base (21) is disposed above the lower plate mechanism (100). The upper plate assembly includes a rotatable upper plate (20). The upper plate assembly is horizontally slidably disposed on the base (21) and has a clearance position and a loading / unloading position. The clearance drive (22) is connected to the upper plate assembly to drive the upper plate assembly to switch between the clearance position and the loading / unloading position. When the upper plate assembly is in the clearance position, the upper plate (20) and the lower plate (1) are directly opposite each other along the height direction. When the upper plate assembly is in the loading / unloading position, at least one planetary wheel (4) is located outside the projection area of the upper plate (20) on the lower plate (1) along the height direction, so as to load / unload the planetary wheel (4) into the receiving groove (41) of the planetary wheel (4) through the automatic loading mechanism.
2. The double-sided polishing equipment according to claim 1, characterized in that, The upper plate assembly also includes: The seat (23) is slidably disposed on the base (21); the clearance drive (22) is connected to the seat (23) in a transmission manner to drive the seat (23) to slide to the clearance position or the loading / unloading position; A first driving member (24) is movably disposed on the seat (23) and connected to the upper plate (20) in a transmission manner to drive the upper plate (20) to rotate axially.
3. The double-sided polishing equipment according to claim 2, characterized in that, The upper plate assembly further includes a second drive member (25), which is disposed on the base (23) and is connected to the first drive member (24) for transmission, so as to drive the upper plate (20) to move up and down in the height direction through the first drive member (24) to switch between the polishing position and the avoidance position, and the avoidance position is located above the polishing position.
4. The double-sided polishing equipment according to claim 3, characterized in that, The upper plate assembly also includes a displacement sensor (26) configured to detect the vertical position of the upper plate (20) along the height direction.
5. The double-sided polishing equipment according to claim 2, characterized in that, The upper plate assembly also includes: The lead screw (27) is connected to the output end of the clearance drive (22) via a transmission connection; the bracket (23) is threadedly connected to the lead screw (27); The slide rail (28) is arranged on the base (21) along the axial direction of the lead screw (27), and the seat (23) slides in cooperation with the slide rail (28).
6. The double-sided polishing equipment according to claim 2, characterized in that, The upper plate assembly also includes a liquid receiving tray (29) disposed on the lower plate mechanism (100), one end of which extends below the upper plate (20) located at the loading / unloading position.
7. The double-sided polishing equipment according to any one of claims 1 to 6, characterized in that, The lower plate mechanism (100) further includes a third drive member (5), a first drive gear (6) and a first drive gear (7). The output end of the third drive member (5) is connected to the first drive gear (6) for transmission. The first drive gear (6) meshes with the first drive gear (7) for transmission. The first drive gear (7) is connected to the sun gear (2) for transmission, so as to drive the sun gear (2) to rotate axially through the first drive gear (7). The lower plate mechanism (100) further includes a fourth driving member (8), a second driving gear (9), and a second driving gear (10). The output end of the fourth driving member (8) is connected to the second driving gear (9) for transmission. The second driving gear (9) meshes with the second driving gear (10) for transmission. The second driving gear (10) is connected to the gear ring (3) for transmission, so as to drive the gear ring (3) to rotate axially through the second driving gear (10). The lower plate mechanism (100) further includes a fifth driving member, which is connected to the lower plate (1) in a transmission manner to drive the lower plate (1) to rotate axially.
8. The double-sided polishing equipment according to claim 7, characterized in that, The lower plate mechanism (100) further includes two braking mechanisms (11), one of which is in a limiting engagement with the first drive gear (7) to restrict the axial rotation of the first drive gear (7); the other braking mechanism (11) is in a limiting engagement with the second drive gear (10) to restrict the axial rotation of the second drive gear (10), and the meshing clearance between the planetary gear (4) and the sun gear (2) and the meshing clearance between the planetary gear (4) and the gear ring (3) are located on the same side.
9. The double-sided polishing equipment according to claim 8, characterized in that, The braking mechanism (11) includes a braking drive (111) and a brake lever (112). The braking drive (111) is connected to the brake lever (112) to drive the brake lever (112) to press against or disengage from the tooth surface of the corresponding sun gear (2) or the gear ring (3).
10. The double-sided polishing equipment according to claim 7, characterized in that, Both the third driving component (5) and the fourth driving component (8) are servo motors.
Citation Information
Patent Citations
Semiconductor wafer double-sided polishing equipment and process
CN115533722A
Double-sided polishing machine
CN208854392U