An etching solution suitable for high transmittance anti-glare glass and its preparation method

Abstract

This application relates to the field of glass etching solution preparation technology, and particularly to a high-transmittance anti-glare glass etching solution and its preparation method. According to mass parts, the high-transmittance anti-glare glass etching solution comprises a base liquid, a modified dispersion, a regulator, and a stabilizer. The preparation method of the modified dispersion includes the following steps: adding molybdenum disulfide nanoparticles and povidone to an ethanol solution, ultrasonically dispersing to obtain a dispersion; adding N-aminoethyl-3-aminopropylmethyldimethoxysilane to the dispersion, raising the temperature of the reaction system to 60°C, and maintaining this temperature while stirring for 1 hour to obtain the modified dispersion. This application addresses the problem in related technologies where non-fluorinated etching solutions have low etching rates and cannot achieve a balance between high transmittance and anti-glare performance by providing a high-transmittance anti-glare glass etching solution and its preparation method.

Description

Technical Field

[0001] This application relates to the field of glass etching solution preparation technology, and in particular to a glass etching solution suitable for high transmittance anti-glare glass and its preparation method. Background Technology

[0002] In the glass processing field, especially for the preparation of high-transmittance anti-glare glass, methods are mainly divided into mechanical and chemical methods. Mechanical processing methods primarily include sandblasting, grinding, and blowing. While these methods can create anti-glare structures, they result in poor surface roughness consistency. Chemical processing methods are more diverse, mainly including chemical etching and glass surface coating. Chemical etching is the most commonly used method, typically involving fluorinated and non-fluorinated etching solutions. Fluorinated etching solutions pose greater hazards and environmental risks, while non-fluorinated etching solutions, although avoiding the use of strong acids, have lower etching rates, making them unsuitable for large-scale production. Furthermore, during chemical etching, the solubility of salts (such as silicon fluoride) formed by the reaction of fluorides with glass varies significantly. In the etching solution, silicon fluoride in some areas tends to precipitate, hindering the etching reaction and causing uneven etching, severely impacting subsequent etching results and product quality. Summary of the Invention

[0003] This application provides an etching solution and preparation method suitable for high transmittance anti-glare glass, in order to solve the problem that non-fluorine etching solutions in related technologies have low etching rates and cannot achieve a balance between high transmittance and anti-glare performance.

[0004] In a first aspect, a suitable etching solution for high-transmittance anti-glare glass is provided, comprising, by weight parts:

[0005] The base liquid consists of 65-75 parts, the modified dispersion consists of 25-35 parts, the modifier consists of 0.2-0.4 parts, and the stabilizer consists of 1.2-1.8 parts.

[0006] The preparation method of the modified dispersion includes the following steps:

[0007] Molybdenum disulfide nanoparticles and povidone were added to an ethanol solution and ultrasonically dispersed for 30 min to obtain a dispersion. The mass ratio of molybdenum disulfide nanoparticles to povidone was (0.8~1):2, the mass-to-volume ratio of molybdenum disulfide nanoparticles to ethanol solution was 1g:10mL, and the concentration of the ethanol solution was 50wt%.

[0008] N-aminoethyl-3-aminopropylmethyldimethoxysilane was added to the dispersion, the temperature of the reaction system was raised to 60°C, and the mixture was stirred at this temperature for 1 hour to obtain a modified dispersion. The mass ratio of N-aminoethyl-3-aminopropylmethyldimethoxysilane to molybdenum disulfide nanoparticles was (0.8~1):1.

[0009] Preferably, the method for preparing the base liquid includes:

[0010] At 35°C, magnesium fluorosilicate was dissolved in deionized water at a mass ratio of (1~2):25 to obtain a solution;

[0011] Triethanolamine was added to the solution, and after stirring for 30 min, maleic anhydride was added. Stirring was continued for 1 h to obtain the base solution. The mass ratio of triethanolamine to deionized water was (0.8~1):50, and the mass ratio of maleic anhydride to deionized water was (0.4~0.5):50.

[0012] Preferably, the method for preparing the modified dispersion further includes the following steps before adding N-aminoethyl-3-aminopropylmethyldimethoxysilane to the dispersion:

[0013] Under stirring conditions, trisodium citrate was added to the dispersion to adjust the pH value to 5.5-6.0;

[0014] The mass ratio of trisodium citrate to molybdenum disulfide nanoparticles is 0.5:1.

[0015] Preferably, the stirring speed is 150~200 r / min.

[0016] Preferably, the stabilizer is zinc borate.

[0017] Preferably, the stabilizer is a modified chitosan-disodium hydrogen phosphate composite system, and its preparation method includes the following steps:

[0018] Chitosan was dissolved in a 2 wt% acetic acid solution, sodium tripolyphosphate was added, and after reacting for 2 hours, it was washed and freeze-dried to obtain modified chitosan. The mass ratio of sodium tripolyphosphate to chitosan was 1:5, and the mass-volume ratio of chitosan to acetic acid solution was 1 g:100 mL.

[0019] Modified chitosan and disodium hydrogen phosphate were mixed and ground in a mass ratio of 3:2 to obtain a modified chitosan-disodium hydrogen phosphate composite system. The total mass of the modified chitosan and disodium hydrogen phosphate was 10% of the mass of deionized water.

[0020] Preferably, the regulator is benzenesulfonamide.

[0021] Secondly, a preparation method is provided for preparing the etching solution suitable for high-transmittance anti-glare glass as described in any of the above claims, comprising the following steps:

[0022] Add the base solution to the reaction vessel and stir at a speed of 200 r / min. Then add the modified dispersion dropwise to the reaction vessel at a rate of 10 mL / min. After the addition is complete, continue stirring for 2 to 3 hours.

[0023] Continue adding a regulator to the reaction vessel to obtain a test solution, then continue adding a stabilizer to the test solution to adjust the pH to 3.8~4.2, and continue stirring for 1 hour to obtain an etching solution suitable for high transmittance anti-glare glass.

[0024] The beneficial effects of the technical solution provided in this application include:

[0025] This application provides an etching solution and preparation method suitable for high-transmittance anti-glare glass. A base solution, modified dispersion, regulator, and stabilizer are rationally mixed to form a stable multi-component system. In the modified dispersion, molybdenum disulfide nanoparticles, through their two-dimensional layered structure, act as templates during the etching process, guiding the formation of uniform pit structures on the glass surface to achieve the anti-glare effect. Povidone, as a dispersant, encapsulates the surface of the molybdenum disulfide nanoparticles through physical adsorption, effectively preventing nanoparticle aggregation and ensuring uniform dispersion in the etching solution. After hydrolysis of N-aminoethyl-3-aminopropylmethyldimethoxysilane, the silanol groups condense with the hydroxyl groups on the glass surface, and the amino groups react with the active sites on the surface of the molybdenum disulfide nanoparticles, causing the nanoparticles to be directionally adsorbed on the glass surface, further precisely guiding the formation of pits. Through this synergistic modification, while ensuring that the haze meets the anti-glare requirements, the high transmittance of the glass is maintained, effectively maintaining a balance between high transmittance and anti-glare performance. Attached Figure Description

[0026] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0027] Figure 1 A flowchart illustrating the preparation process of an etching solution suitable for high-transmittance anti-glare glass, provided in this application. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0029] See Figure 1 As shown, this application provides an etching solution suitable for high transmittance anti-glare glass and a preparation method thereof.

[0030] Example 1

[0031] The method for preparing etching solution suitable for high transmittance anti-glare glass provided in this embodiment includes the following steps:

[0032] Add 70g of base liquid to the reaction vessel and stir at 200r / min. Then add 30g of modified dispersion dropwise to the reaction vessel at a rate of 10mL / min. After the addition is complete, continue stirring for 2h.

[0033] First, add 0.3g of benzenesulfonamide to the reaction vessel to obtain the test solution. Then, add 1.5g of stabilizer to the test solution, adjust the pH to 4, and continue stirring for 1 hour to obtain an etching solution suitable for high transmittance anti-glare glass.

[0034] The method for preparing the base liquid is as follows:

[0035] At 35°C, 7.5g of magnesium fluorosilicate was dissolved in 100g of deionized water to obtain a solution;

[0036] Add 1.8g of triethanolamine to the solution, stir for 30min, then add 0.9g of maleic anhydride, and continue stirring for 1h to obtain the base solution.

[0037] The method for preparing the modified dispersion is as follows:

[0038] 5g of molybdenum disulfide nanoparticles and 11g of povidone were added to 50mL of 50wt% ethanol solution and ultrasonically dispersed for 30min to obtain a dispersion.

[0039] Under stirring conditions of 200 r / min, 2.5 g of trisodium citrate was added to the dispersion to adjust the pH value to 5.7;

[0040] Continue adding 4.5 g of N-aminoethyl-3-aminopropylmethyldimethoxysilane to the dispersion, raise the temperature of the reaction system to 60 °C, and maintain this temperature while stirring for 1 h to obtain the modified dispersion.

[0041] The stabilizer is a modified chitosan-disodium hydrogen phosphate composite system, and its preparation method is as follows:

[0042] 2g of chitosan was dissolved in 200mL of 2wt% acetic acid solution, and then 0.4g of sodium tripolyphosphate was added. After reacting for 2h, the mixture was washed and lyophilized to obtain modified chitosan.

[0043] 1.5g of modified chitosan and 1g of disodium hydrogen phosphate were mixed and ground to obtain a modified chitosan-disodium hydrogen phosphate composite system.

[0044] Example 2

[0045] The difference between this embodiment and Example 1 is that trisodium citrate is not added in the preparation of the modified dispersion.

[0046] Example 3

[0047] The difference between this embodiment and Embodiment 1 is that the stabilizer is replaced with an equal amount of zinc borate.

[0048] Example 4

[0049] The method for preparing etching solution suitable for high transmittance anti-glare glass provided in this embodiment includes the following steps:

[0050] Add 65g of base liquid to the reaction vessel and stir at 200r / min. Then add 25g of modified dispersion dropwise to the reaction vessel at a rate of 10mL / min. After the addition is complete, continue stirring for 2h.

[0051] First, add 0.2g of benzenesulfonamide to the reaction vessel to obtain the test solution. Then, add 1.2g of stabilizer to the test solution, adjust the pH to 3.8, and continue stirring for 1 hour to obtain an etching solution suitable for high transmittance anti-glare glass.

[0052] The method for preparing the base liquid is as follows:

[0053] At 35°C, 4g of magnesium fluorosilicate was dissolved in 100g of deionized water to obtain a solution;

[0054] Add 1.6g of triethanolamine to the solution, stir for 30 min, then add 0.8g of maleic anhydride, and continue stirring for 1 h to obtain the base solution.

[0055] The method for preparing the modified dispersion is as follows:

[0056] 5g of molybdenum disulfide nanoparticles and 12.5g of povidone were added to 50mL of 50wt% ethanol solution and ultrasonically dispersed for 30min to obtain a dispersion.

[0057] Under stirring conditions of 150 r / min, 2.5 g of trisodium citrate was added to the dispersion to adjust the pH value to 5.8;

[0058] Continue to add 4g of N-aminoethyl-3-aminopropylmethyldimethoxysilane to the dispersion, raise the temperature of the reaction system to 60℃, and maintain this temperature while stirring for 1h to obtain the modified dispersion.

[0059] The stabilizer is a modified chitosan-disodium hydrogen phosphate composite system, and its preparation method is as follows:

[0060] 2g of chitosan was dissolved in 200mL of 2wt% acetic acid solution, and then 0.4g of sodium tripolyphosphate was added. After reacting for 2h, the mixture was washed and lyophilized to obtain modified chitosan.

[0061] 1.5g of modified chitosan and 1g of disodium hydrogen phosphate were mixed and ground to obtain a modified chitosan-disodium hydrogen phosphate composite system.

[0062] Example 5

[0063] The method for preparing etching solution suitable for high transmittance anti-glare glass provided in this embodiment includes the following steps:

[0064] Add 75g of base liquid to the reaction vessel and stir at 200r / min. Then add 35g of modified dispersion dropwise to the reaction vessel at a rate of 10mL / min. After the addition is complete, continue stirring for 3h.

[0065] First, add 0.4g of benzenesulfonamide to the reaction vessel to obtain the test solution. Then, add 1.8g of stabilizer to the test solution, adjust the pH to 4.2, and continue stirring for 1 hour to obtain an etching solution suitable for high transmittance anti-glare glass.

[0066] The method for preparing the base liquid is as follows:

[0067] At 35°C, 8g of magnesium fluorosilicate was dissolved in 100g of deionized water to obtain a solution;

[0068] Add 2g of triethanolamine to the solution, stir for 30min, then add 1g of maleic anhydride, and continue stirring for 1h to obtain the base solution.

[0069] The method for preparing the modified dispersion is as follows:

[0070] 5g of molybdenum disulfide nanoparticles and 10g of povidone were added to 50mL of 50wt% ethanol solution and ultrasonically dispersed for 30min to obtain a dispersion.

[0071] Under stirring conditions of 200 r / min, 2.5 g of trisodium citrate was added to the dispersion to adjust the pH value to 5.5;

[0072] Continue to add 5g of N-aminoethyl-3-aminopropylmethyldimethoxysilane to the dispersion, raise the temperature of the reaction system to 60℃, and maintain this temperature while stirring for 1h to obtain the modified dispersion.

[0073] The stabilizer is a modified chitosan-disodium hydrogen phosphate composite system, and its preparation method is the same as in Example 1.

[0074] Comparative Example 1

[0075] The difference between this and Example 1 is that triethanolamine and maleic anhydride are not added in the preparation of the base solution.

[0076] Comparative Example 2

[0077] The difference between this and Example 1 is that in the preparation of the modified dispersion, silica nanoparticles are used instead of molybdenum disulfide nanoparticles, and N-aminoethyl-3-aminopropylmethyldimethoxysilane is not added.

[0078] Comparative Example 3

[0079] The difference from Example 1 is that no stabilizer is added, and in the modified dispersion, trisodium citrate is replaced with an equal amount of sodium citrate.

[0080] The etching solutions (hereinafter referred to as etching solutions) suitable for high transmittance anti-glare glass prepared by the preparation methods of Examples 1-5 and Comparative Examples 1-3 were tested.

[0081] Using soda-lime glass as the substrate (100mm×100mm×1mm), the surface of the substrate is first wiped with anhydrous ethanol to remove oil stains, then ultrasonically cleaned in deionized water for 10 minutes, wiped dry with a lint-free cloth, and the pretreated substrate is obtained for later use.

[0082] The etching solutions prepared by the methods of Examples 1-5 and Comparative Examples 1-3 were poured into a glass container and kept at a constant temperature of 50°C. The pretreated glass substrate was then placed in the container to ensure complete immersion. The container was gently stirred (50 r / min) for 10 min. After removal, the surface was repeatedly rinsed with deionized water to remove residual etching solution. Finally, the container was placed in a 60°C oven to dry for 10 min and cooled to room temperature to obtain the sample to be tested. The transmittance and anti-glare / haze tests were then performed.

[0083] Light transmittance test:

[0084] Referring to GB / T 2410-2008 "Determination of transmittance and haze of plastics", the transmittance, expressed as a percentage, for each sample is calculated using the following formula:

[0085]

[0086] In the formula, T t T1 is the transmittance, T2 is the total transmitted light flux through the sample, and T1 is the incident light flux.

[0087] Anti-glare and haze test:

[0088] Referring to GB / T 2410-2008 "Determination of transmittance and haze of plastics", the haze, expressed as a percentage, for each sample is calculated using the following formula:

[0089]

[0090] In the formula, H is the haze, T4 is the scattered light flux of the instrument and the sample, T2 is the total transmitted light flux through the sample, T3 is the scattered light flux of the instrument, and T1 is the incident light flux.

[0091] For the above-mentioned transmittance and anti-glare / haze tests, first adjust the zero-point knob of the haze meter so that the galvanometer reading is zero in the dark. When the light is unobstructed, adjust the galvanometer reading to 100. Then, follow the steps in Table 1 to read T1, T2, T3, and T4. The data reading steps are shown in Table 1.

[0092] Table 1

[0093]

[0094] Etching rate test:

[0095] Using soda-lime glass as the substrate (50mm×50mm×1mm), the surface of the substrate was first wiped with anhydrous ethanol to remove oil stains, then ultrasonically cleaned in deionized water for 10 minutes, wiped dry with a lint-free cloth, dried at 60℃ to constant weight (the difference between two consecutive weighings is <0.5mg), and cooled to room temperature to obtain the pretreated substrate, the weight of which is recorded as m1.

[0096] The etching solutions prepared by the methods of Examples 1-5 and Comparative Examples 1-3 were poured into a glass cup, kept at a constant temperature of 50°C, and then the pretreated substrate was placed in to ensure complete immersion. The substrate was stirred gently (50 r / min) for 10 min. After removal, the surface was rinsed repeatedly with deionized water to remove residual etching solution. Finally, the substrate was placed in a 60°C oven to dry for 10 min, cooled to room temperature, and weighed and recorded as m2.

[0097] The etching rate (μm / min) is calculated as follows:

[0098]

[0099] In the formula, ρ is the density of glass (2.5 g / cm³). 3 S represents the total area of ​​the pretreated substrate (52cm²). 2 ), t is the etching time (10 min).

[0100] The test results are shown in Table 2.

[0101] Table 2

[0102]

[0103] It can be seen that the etching solutions prepared in Examples 1, 4, and 5 have high light transmittance in glass. Among them, Example 4 slightly adjusted the components of the etching solution, resulting in a slight decrease in etching rate and haze, but good light transmittance; in Example 5, the component concentration was increased, which improved the etching rate, but the excessively high concentration led to increased surface roughness, decreased light transmittance, and increased haze.

[0104] Comparing Example 2 with Example 1, the modified dispersion in Example 2 did not have trisodium citrate added to adjust the pH value, resulting in an increase in acidity, which to some extent inhibited the dissociation of magnesium fluorosilicate and reduced the etching rate.

[0105] Comparing Example 3 with Example 1, the effect of zinc borate as a stabilizer is weaker than that of the modified chitosan-disodium hydrogen phosphate composite system. The resulting etching solution has poor dispersibility, and the etching rate and haze are lower than those of Example 1. The light transmittance is reduced due to the surface inhomogeneity.

[0106] Comparative Example 1 lacks triethanolamine and maleic anhydride, resulting in low fluoride ion activity and an extremely low etching rate; uneven etching leads to a significant decrease in both transmittance and haze.

[0107] In Comparative Example 2, molybdenum disulfide nanoparticles were replaced with silica nanoparticles, and N-aminoethyl-3-aminopropylmethyldimethoxysilane was not added. The silica nanoparticles could not form an effective scattering structure, resulting in extremely low haze and poor anti-glare effect; however, the transmittance of the etched glass was slightly improved due to its good surface flatness.

[0108] Comparative Example 3 lacked a stabilizer, leading to system instability. Furthermore, the replacement of trisodium citrate with sodium citrate in the modification solution resulted in poor pH adjustment, fluctuating etching rate, increased surface roughness, decreased light transmittance, and excessive haze. Trisodium citrate, acting as a complexing agent, combines its carboxyl and hydroxyl groups with fluoride ions generated from the hydrolysis of magnesium fluorosilicate and metal ions (such as calcium and aluminum) in the glass to form stable complexes. This avoids the formation of insoluble fluoride precipitates (such as calcium fluoride and aluminum fluoride) between fluoride ions and metal ions in the glass, preventing uneven etching caused by precipitation. It also alters the chemical activity of the glass surface, promoting a more uniform etching reaction.

[0109] This application provides an etching solution for high-transmittance anti-glare glass and its preparation method. Magnesium fluorosilicate is used in the base solution instead of the traditional highly toxic hydrofluoric acid as the main etching component, reducing environmental harm and operator safety risks. Triethanolamine is added to react with magnesium ions generated from the hydrolysis of magnesium fluorosilicate, altering the electron cloud distribution around the magnesium ions and promoting easier dissociation of magnesium fluorosilicate, effectively enhancing fluoride ion activity. Maleic anhydride hydrolyzes to generate maleic acid, maintaining a weakly acidic environment in the system and further promoting the continuous and stable etching reaction. This approach balances environmental protection with etching efficiency. Molybdenum disulfide nanoparticles in the modified dispersion are dispersed in povidone. These nanoparticles act as templates, guiding the formation of uniform pits on the glass surface to achieve an anti-glare effect. After hydrolysis of N-aminoethyl-3-aminopropylmethyldimethoxysilane, the silanol groups condense with the hydroxyl groups on the glass surface, and the amino groups react with the active sites on the surface of the molybdenum disulfide nanoparticles, causing the nanoparticles to be directionally adsorbed onto the glass surface, further precisely guiding pit formation and effectively balancing high transmittance and anti-glare performance. The benzenesulfonamide regulator in the etching solution reacts with the unetched silanol groups on the glass surface to form a temporary protective film, slowing down the local etching rate and preventing the local reaction from being too fast. The stabilizer buffers the pH of the system, ensuring the uniformity and stability of the etching to a certain extent.

[0110] The above description is merely a specific embodiment of this application, enabling those skilled in the art to understand or implement this application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Therefore, this application is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.

Claims

1. An etching solution suitable for high-transmittance anti-glare glass, characterized in that, According to parts by weight, it includes: The base liquid consists of 65-75 parts, the modified dispersion consists of 25-35 parts, the modifier consists of 0.2-0.4 parts, and the stabilizer consists of 1.2-1.8 parts. The preparation method of the base liquid includes: At 35°C, magnesium fluorosilicate was dissolved in deionized water at a mass ratio of (1~2):25 to obtain a solution; Triethanolamine was added to the solution, and after stirring for 30 min, maleic anhydride was added and stirring was continued for 1 h to obtain the base solution. The mass ratio of triethanolamine to deionized water was (0.8~1):50, and the mass ratio of maleic anhydride to deionized water was (0.4~0.5):

50. The preparation method of the modified dispersion includes the following steps: Molybdenum disulfide nanoparticles and povidone were added to an ethanol solution and ultrasonically dispersed for 30 min to obtain a dispersion. The mass ratio of molybdenum disulfide nanoparticles to povidone was (0.8~1):2, the mass-to-volume ratio of molybdenum disulfide nanoparticles to ethanol solution was 1g:10mL, and the concentration of the ethanol solution was 50wt%. N-aminoethyl-3-aminopropylmethyldimethoxysilane was added to the dispersion, the temperature of the reaction system was raised to 60°C, and the mixture was stirred at this temperature for 1 hour to obtain a modified dispersion. The mass ratio of N-aminoethyl-3-aminopropylmethyldimethoxysilane to molybdenum disulfide nanoparticles was (0.8~1):

1.

2. The etching solution for high-transmittance anti-glare glass as described in claim 1, characterized in that, The method for preparing the modified dispersion further includes the following steps before adding N-aminoethyl-3-aminopropylmethyldimethoxysilane to the dispersion: Under stirring conditions, trisodium citrate was added to the dispersion to adjust the pH value to 5.5-6.0; The mass ratio of trisodium citrate to molybdenum disulfide nanoparticles is 0.5:

1.

3. The etching solution for high-transmittance anti-glare glass as described in claim 2, characterized in that: The stirring speed is 150~200 r / min.

4. The etching solution for high-transmittance anti-glare glass as described in claim 1, characterized in that: The stabilizer is zinc borate.

5. The etching solution for high-transmittance anti-glare glass as described in claim 1, characterized in that: The stabilizer is a modified chitosan-disodium hydrogen phosphate composite system, and its preparation method includes the following steps: Chitosan was dissolved in a 2 wt% acetic acid solution, sodium tripolyphosphate was added, and after reacting for 2 hours, it was washed and freeze-dried to obtain modified chitosan. The mass ratio of sodium tripolyphosphate to chitosan was 1:5, and the mass-volume ratio of chitosan to acetic acid solution was 1 g:100 mL. Modified chitosan and disodium hydrogen phosphate were mixed and ground in a mass ratio of 3:2 to obtain a modified chitosan-disodium hydrogen phosphate composite system. The total mass of the modified chitosan and disodium hydrogen phosphate was 10% of the mass of deionized water.

6. The etching solution for high-transmittance anti-glare glass as described in claim 1, characterized in that: The regulator is benzenesulfonamide.

7. A preparation method for preparing the etching solution for high-transmittance anti-glare glass as described in any one of claims 1 to 6, characterized in that, It includes the following steps: Add the base solution to the reaction vessel and stir at a speed of 200 r / min. Then add the modified dispersion dropwise to the reaction vessel at a rate of 10 mL / min. After the addition is complete, continue stirring for 2 to 3 hours. Continue adding a regulator to the reaction vessel to obtain a test solution, then continue adding a stabilizer to the test solution to adjust the pH to 3.8~4.2, and continue stirring for 1 hour to obtain an etching solution suitable for high transmittance anti-glare glass.

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