Ceramic substrate coating equipment for semiconductor production

Abstract

The invention discloses ceramic substrate coating equipment for semiconductor production, and relates to the technical field of coating equipment, the coating equipment comprises a conveying mechanism, a clamping mechanism, a cleaning mechanism, a coating mechanism and a temperature control mechanism, the conveying mechanism is in transmission connection with the clamping mechanism, the clamping mechanism is in transmission connection with the cleaning mechanism, the conveying mechanism is in fastening connection with the coating mechanism, and the temperature control mechanism is in fastening connection with the coating mechanism. The temperature control mechanism is fixedly connected with the coating mechanism, the conveying mechanism is used for stably transferring workpieces and realizing a limiting blanking process of the workpieces with the clamping mechanism, the cleaning mechanism is used for realizing preheating and cleaning effects in a process of transferring the workpieces to the coating mechanism by the conveying mechanism, and the temperature control mechanism is used for controlling a proper coating temperature in the coating mechanism. Therefore, the manual intervention requirement is reduced, and the overall production efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of coating equipment, in particular to a ceramic substrate coating equipment for semiconductor production. Background Art

[0002] With the rapid development of the electronics, semiconductor, and optical industries, functional coating processes for various components are becoming increasingly important. Physical vapor deposition (PVD) technology, with its advantages of high film uniformity, excellent adhesion, and zero pollution, has been widely used in the manufacturing of ceramic substrates, metal substrates, and semiconductor chips. Demand continues to grow in the fields of electronic components, optical devices, decorative films, and functional coatings, creating a broad market outlook and driving the development of coating equipment towards high automation, high precision, and multi-functionality.

[0003] Existing coating equipment generally includes a conveying device, cleaning and pretreatment equipment, and a basic coating unit. The workpiece is transferred and simply clamped through a mechanical conveyor line, and roller conveyor belts or chains are conventionally used to transport the workpiece; cleaning equipment generally uses simple blowing or liquid flushing methods for surface treatment, and the coating device often uses a magnetron sputtering structure with a fixed single target material. The sputtering environment is established by a vacuum pump and the filling of working gas, and the target material atoms are sputtered onto the substrate by impacting the target material with argon ions.

[0004] Current coating equipment relies heavily on manual intervention or simple mechanical positioning during transportation and unloading, which can easily lead to workpiece position errors and low production efficiency; target position adjustment is mostly a fixed structure, which can easily cause uneven local ablation of the target, resulting in uneven film thickness distribution; traditional coating equipment usually uses a single target for sputtering, lacks the function of dynamic and rapid switching of targets, and is not convenient for the deposition of multi-layer films or multiple materials; in addition, the existing equipment has limited control accuracy of sputtering current, making it difficult to achieve high-precision control of thickness and quality during film deposition, and difficult to meet the current high-end manufacturing industry's stringent requirements for coating quality and stability. Therefore, those skilled in the art provide a ceramic substrate coating equipment for semiconductor production to solve the problems raised in the above background. Summary of the Invention

[0005] The object of the present invention is to provide a ceramic substrate coating device for semiconductor production to solve the problems raised in the prior art.

[0006] To achieve the above object, the present invention provides the following technical solutions: The coating equipment includes a conveying mechanism, a clamping mechanism, a cleaning mechanism, a coating mechanism and a temperature control mechanism. The conveying mechanism and the clamping mechanism are transmission-connected, the clamping mechanism and the cleaning mechanism are transmission-connected, the conveying mechanism and the coating mechanism are fastened, and the temperature control mechanism and the coating mechanism are fastened.

[0007] By adopting the above technical solution, the conveying mechanism is used for the smooth transfer of the workpiece and realizes the limited unloading process of the workpiece with the clamping mechanism. The cleaning mechanism is used to achieve preheating and cleaning effects in the process of transferring the workpiece from the conveying mechanism to the coating mechanism, and the temperature control mechanism is used to control the appropriate coating temperature in the coating mechanism, thereby reducing the need for manual intervention and improving overall production efficiency.

[0008] Furthermore, the conveying mechanism includes a conveying motor, a conveyor belt, a conveying wheel, a transmission frame, a conveying frame and a limiting blanking assembly. The conveying motor and the conveying frame are fastened together, the conveying motor and the conveyor belt are transmission-connected, the conveyor belt and the transmission frame are transmission-connected, the transmission frame and the limiting blanking assembly are transmission-connected, the clamping mechanism and the transmission frame are fastened together, and the cleaning mechanism and the transmission frame are fastened together.

[0009] By adopting this technical solution, the conveyor mechanism uses a conveyor motor to power the conveyor belt, which continuously rotates around the conveyor wheel, forming a smooth transmission path and achieving stable transportation of the workpiece. The continuous movement of the conveyor belt drives the transmission frame to move precisely. The transmission frame then drives the limited unloading assembly through a sophisticated linkage mechanism to accurately position and unload the workpiece, ensuring that the workpiece reaches the designated position accurately and smoothly. At the same time, the clamping mechanism and cleaning mechanism are both tightly connected to the transmission frame, realizing the transmission frame-driven linkage operation of the clamping mechanism and cleaning mechanism, effectively improving the accuracy and stability of workpiece transportation and the connection between various process steps, reducing the need for manual intervention, and improving overall production efficiency.

[0010] Furthermore, the limit blanking assembly includes a limit box, a reset elastic member, a reset rack, a ratchet wheel, a ratchet secondary wheel, an opening and closing tooth block, a first limit block, a second limit block, a hinged rod and a limit elastic member. The limit box is fastened to the conveying frame, the reset elastic member is fastened to the reset rack, the reset rack and the limit box are slidably connected, the reset elastic member and the limit box are fastened to the reset rack and the reset elastic member are fastened to the reset rack, the reset rack and the ratchet wheel are transmission-connected, the ratchet wheel and the ratchet secondary wheel are transmission-connected, the ratchet wheel and the ratchet secondary wheel are both rotatably connected to the limit box, the ratchet secondary wheel is transmission-connected to the opening and closing tooth block, the opening and closing tooth block and the first limit block are transmission-connected, the first limit block is hinged to the hinged rod, the hinged rod and the second limit block are transmission-connected, the second limit block and the limit box are slidingly connected, the limit elastic member and the second limit block are fastened, and the limit elastic member is fastened to the limit box.

[0011] By adopting the above technical solution, the limit box in the limit blanking assembly is firmly installed on the conveyor frame, and the reset elastic part drives the reset rack to slide in the limit box through tension and compression; the reset rack then forms a precise meshing transmission with the ratchet wheel, and the ratchet wheel drives the ratchet secondary wheel to rotate, and the ratchet secondary wheel further drives the opening and closing gear block to open or close, so as to accurately control the position and movement trajectory of the first limit block; the first limit block is connected to the second limit block through a hinged rod, and the swing of the hinged rod drives the second limit block to slide in the limit box, and cooperates with the limit elastic part to ensure the accuracy of positioning, so that the workpiece can be stably limited and automatically unloaded, which significantly improves production efficiency.

[0012] Furthermore, the clamping mechanism includes a clamping claw, a clamping frame and a rotating motor, the clamping claw and the clamping frame are tightly connected, the rotating motor and the clamping frame are transmission-connected, and the rotating motor and the transmission frame are tightly connected.

[0013] By adopting the above technical solution, the rotating motor in the clamping mechanism is connected to the clamping frame through a precise transmission structure. When the rotating motor is started, it can accurately drive the clamping frame to rotate, so that the clamping claw fixed on the clamping frame also rotates, so as to achieve stable clamping, positioning and direction adjustment of the workpiece; the fastening connection design between the clamping claw and the clamping frame ensures that the clamping claw has sufficient rigidity and stability during the clamping process, and can provide a stable and uniform clamping force to ensure that the workpiece will not loosen due to vibration or external force. It is suitable for workpieces of different specifications and greatly improves the adaptability and flexibility of the production line.

[0014] Furthermore, the cleaning mechanism includes a cleaning nozzle, a preheating air pump and a recovery box. The cleaning nozzle and the preheating air pump are connected, and the cleaning nozzle, the preheating air pump and the recovery box are all fastened to the transmission frame.

[0015] By adopting the above technical solution, the preheating air pump in the cleaning mechanism continuously delivers heated high-temperature gas to the cleaning nozzle. After being ejected from the nozzle, the high-temperature gas directly acts on the surface of the workpiece, quickly removing pollutants such as grease, dust, and impurities on the workpiece surface; impurities and waste liquid carried away by the airflow and cleaning liquid during the cleaning process are collected in a dedicated recycling box to prevent pollution of the production environment, effectively ensure the cleanliness and hygiene of the production environment, significantly improve cleaning efficiency and workpiece surface cleanliness, provide good conditions for subsequent processes, and preheat the substrate at the same time, thereby improving the film adhesion ability.

[0016] Furthermore, the temperature control mechanism includes a circulation pump, a heating box, a cooling box and a circulation pipe. The heating box is connected to the cooling box, the cooling box is connected to the circulation pump, the circulation pump is connected to the circulation pipe, and the circulation pipe is connected to the heating box.

[0017] By adopting the above technical solution, the temperature control mechanism relies on a circulation pump to stably drive the heat-conducting liquid to circulate between the heating box and the cooling box, forming a closed-loop heat exchange system through the circulation pipe, so that the internal temperature of the equipment can quickly and accurately reach and be maintained within the specific temperature range required by the process; the temperature control system uses precise temperature sensors to monitor and feedback the temperature changes in the equipment in real time, thereby automatically adjusting the working status of the heating box and the cooling box, maintaining the stable temperature environment required for the coating process, significantly improving the temperature stability during the coating process, and improving the adhesion, uniformity and quality consistency of the film layer.

[0018] Furthermore, the coating mechanism includes an eccentric component, an attachment component, a deposition control component, a vacuum pump, an oxygen pump, a connecting pipe, a recovery pipe and a coating box. The eccentric component and the coating box are tightly connected, the attachment component and the coating box are tightly connected, the deposition control component and the coating box are tightly connected, and the vacuum pump, oxygen pump, argon pump and recovery pipe are all connected to the coating box.

[0019] By adopting the above technical solution, the eccentric component, adhesion component and deposition control component in the coating mechanism are firmly installed in the coating box, and each component works closely and coordinatedly; the vacuum pump quickly establishes and maintains the high vacuum environment required for the coating process, and the oxygen pump and argon pump respectively accurately deliver pure working gas to the coating box through the connecting pipe to form a suitable reaction atmosphere; the control valve slowly introduces high-purity argon gas, loads the target material with direct current, attracts argon ions to form a glow discharge, and the argon ions collide with the first target material at high speed under the action of the electric field, specifically a copper target, thereby generating "momentum transfer" on the surface to knock out copper atoms. The knocked-out copper atoms carry high kinetic energy and fly in a straight line to the surface of the ceramic substrate in a vacuum to form a deposition. The recovery pipe promptly recycles and reuses the incompletely reacted or excess gas, maximizes the utilization of raw materials, ensures the stability and economy of the coating process, and significantly improves the film deposition quality and the environmental friendliness of the production process.

[0020] Furthermore, the eccentric assembly includes a magnetic control box, an electromagnet, a lifting hydraulic cylinder, an eccentric motor, an eccentric block, a rotating shaft, a clamping electromagnetic block, a clamping elastic part and a clamping magnetic block. The magnetic control box and the attachment assembly are fastened together, the electromagnet and the eccentric block are fastened together, the lifting hydraulic cylinder and the magnetic control box are fastened together, the lifting hydraulic cylinder and the eccentric motor are transmission-connected, the eccentric motor and the rotating shaft are transmission-connected, the rotating shaft and the eccentric block are transmission-connected, the clamping electromagnetic block and the eccentric block are fastened together, the clamping electromagnetic block and the clamping elastic part are fastened together, the clamping magnetic block and the clamping elastic part are fastened together, the clamping electromagnetic block and the clamping magnetic block are magnetic pole-repelling transmission, the clamping magnetic block and the eccentric block are slidingly connected, and the clamping magnetic block and the rotating shaft are fastened together.

[0021] By adopting the above technical scheme, the lifting hydraulic cylinder in the eccentric assembly provides up-down adjustment of the electromagnet, the eccentric motor adjusts the rotating speed and position of the rotating shaft, and the eccentric block moves eccentrically under the driving of the motor; the electromagnet, the clamping electromagnet block and the clamping magnetic block cooperate with the clamping elastic member through the magnetic pole repulsion principle, the clamping magnetic block slides in the eccentric block for adjustment, and clamps the rotating shaft, thereby forming the eccentric movement to prevent uneven ablation of the target material during the coating process of the substrate, and indirectly changing the target-substrate distance through adjustment of the magnetic control position and the eccentric angle relative to the substrate, thereby effectively avoiding uneven adhesion of the workpiece caused by local adhesion, thereby ensuring the consistency and reliability of the coating quality.

[0022] Further, the deposition assembly includes a rotating frame, a first target material, a second target material, a switching motor and a rotating plate, the first target material and the second target material are clamped with the rotating plate, the rotating plate and the rotating frame are rotationally connected, the switching motor and the rotating frame are fixedly connected, the switching motor and the rotating plate are transmissionally connected, the rotating frame is provided with a shielding area, the rotating frame is provided with a sputtering area, and the first target material and the second target material are electrically connected with the deposition control assembly.

[0023] By adopting the above technical scheme, the switching motor in the deposition assembly drives the rotating plate to rotate around the rotating frame, and the first target material and the second target material installed on the rotating plate realize switching through the shielding area and the sputtering area of the rotating frame; the target material switching process is fast and stable, without the need to stop the machine, the second target material can be titanium or chromium material, and the adhesion of the first target material, which is copper material, is improved by providing an adhesion layer in advance, thereby improving the continuous production capacity of the equipment, meeting the deposition needs of various film layer materials for complex coating process, and making the equipment have wider applicability and higher production efficiency.

[0024] Further, the deposition control assembly includes a sliding electric block, a resistance block, a cathode block, a control motor and a control rod, the control motor and the rotating plate are fixedly connected, the control motor and the control rod are transmissionally connected, the control rod and the sliding electric block are transmissionally connected, the resistance block and the sliding electric block are electrically connected, the resistance block is provided with a plurality of resistance blocks, the resistance blocks are arranged in a grid shape, the first target material and the second target material are electrically connected with the resistance blocks, and the cathode block and the sliding electric block are electrically connected.

[0025] By adopting the above technical scheme, the control motor in the deposition control assembly drives the control rod to accurately control the position and current size of the sliding electric block, the sliding electric block and the grid-shaped resistance block form precise electrical connection, and the sputtering current is accurately adjusted; the grid design of the resistance block provides detailed current control capability, ensuring the uniformity and stability of the sputtering and deposition of the target material; the cathode block stably provides a negative potential, which can effectively prevent current fluctuation during sputtering, and can control the thickness, uniformity and quality consistency of the coating by controlling the current density of the target, thereby significantly improving the quality stability and product reliability of the coating production.

[0026] Compared with the prior art, the present invention has the following beneficial effects: Driven by the reset spring, the reset rack in the position-limited blanking assembly slides along the limit box, precisely engaging the ratchet wheel and ratchet auxiliary wheel, which in turn opens and closes the toothed blocks, ensuring accurate opening and closing of the first position-limiting block. An articulated rod drives the second position-limiting block to slide and engage the position-limiting spring, ensuring precise workpiece positioning and automatic blanking, eliminating manual alignment and blanking errors and ensuring continuous and stable production.

[0027] The eccentric assembly uses an eccentric motor to drive the eccentric block, and realizes the sliding eccentric adjustment of the rotating shaft through the repulsive effect of the clamping magnetic block and the clamping electromagnetic block. It accurately controls the change of the target-base distance, effectively prevents uneven local ablation of the target material and uneven film layer, ensures the consistency of film layer adhesion, avoids quality problems of the workpiece caused by uneven adhesion, and significantly improves the coating yield.

[0028] The switching motor in the attachment assembly rapidly switches the first and second targets between the sputtering and shielding zones by rotating a rotating plate. The deposition control assembly utilizes precise electrical adjustments of a sliding electrical block on a grid-like resistor block to achieve precise control of the target sputtering current, effectively ensuring target sputtering stability and uniform film deposition, avoiding the uneven thickness and unstable product quality associated with traditional sputtering. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic structural diagram of the conveying mechanism of the present invention; Figure 3 This is a schematic structural diagram of the position limiting blanking assembly of the present invention; Figure 4 This is a schematic structural diagram of the clamping mechanism of the present invention; Figure 5 This is a schematic structural diagram of the cleaning mechanism of the present invention; Figure 6 Schematic diagram of the coating mechanism structure of the present invention; Figure 7 This is a schematic structural diagram of the eccentric assembly of the present invention; Figure 8 This is a schematic diagram of the eccentric block structure of the present invention; Figure 9 This is a schematic diagram of the structure of the attachment assembly of the present invention; Figure 10 This is a schematic diagram of the rotating frame structure of the present invention; Figure 11 Schematic diagram of the structure of the deposition control component of the present invention.

[0030] In the figure: 1, conveying mechanism; 11, conveying motor; 12, conveying belt; 13, conveying wheel; 14, transmission frame; 15, conveying frame; 16, limiting and discharging assembly; 161, limiting box; 162, reset elastic member; 163, reset rack; 164, thorn wheel; 165, thorn auxiliary wheel; 166, opening and closing tooth block; 167, first limiting block; 168, second limiting block; 169, hinged rod; 1610, limiting elastic member; 2, clamping mechanism; 21, clamping jaw; 22, clamping frame; 23, rotating motor; 3, cleaning mechanism; 31, cleaning nozzle; 32, preheating gas pump; 33, recovery box; 4, coating mechanism; 41, eccentric assembly; 411, magnetic control box; 412, electromagnet; 413, lifting hydraulic cylinder; 414, eccentric motor; 415, eccentric block; 416, rotating shaft; 417, clamping electromagnet block; 418, clamping elastic member; 419, clamping magnetic block; 42, adhesion assembly; 421, rotating frame; 4211, shielding area; 4212, sputtering area; 422, first target material; 423, second target material; 424, switching motor; 425, rotating plate; 43, deposition control assembly; 431, sliding electric block; 432, resistance block; 433, cathode block; 434, control motor; 435, control rod; 44, vacuum pump; 45, oxygen pump; 46, communication pipe; 47, recovery pipe; 48, coating box; 5, temperature control mechanism; 51, circulating pump; 52, heating box; 53, cooling box; 54, circulating pipe. DETAILED DESCRIPTION

[0031] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0032] Please refer to Figure 1 - Figure 11 As shown in the figure, the present application provides a ceramic substrate coating equipment technical solution for semiconductor production: The coating equipment includes a conveying mechanism 1, a clamping mechanism 2, a cleaning mechanism 3, a coating mechanism 4, and a temperature control mechanism 5. The conveying mechanism 1 and the clamping mechanism 2 are in transmission connection. The clamping mechanism 2 and the cleaning mechanism 3 are in transmission connection. The conveying mechanism 1 and the coating mechanism 4 are in fastening connection. The temperature control mechanism 5 and the coating mechanism 4 are in fastening connection.

[0033] By adopting the above technical solution, the conveying mechanism 1 is used for the smooth transfer of the workpiece and realizes the limited unloading process of the workpiece with the clamping mechanism 2. The cleaning mechanism 3 is used to achieve preheating and cleaning effects in the process of the conveying mechanism 1 transferring the workpiece to the coating mechanism 4, and the temperature control mechanism 5 is used to control the appropriate coating temperature in the coating mechanism 4, thereby reducing the need for manual intervention and improving overall production efficiency.

[0034] Furthermore, the conveying mechanism 1 includes a conveying motor 11, a conveyor belt 12, a conveying wheel 13, a transmission frame 14, a conveying frame 15 and a limiting blanking assembly 16. The conveying motor 11 and the conveying frame 15 are fastened together, the conveying motor 11 and the conveyor belt 12 are transmission-connected, the conveyor belt 12 and the transmission frame 14 are transmission-connected, the transmission frame 14 and the limiting blanking assembly 16 are transmission-connected, the clamping mechanism 2 and the transmission frame 14 are fastened together, and the cleaning mechanism 3 and the transmission frame 14 are fastened together.

[0035] By adopting the above technical solution, the conveying mechanism 1 uses the conveying motor 11 to provide power to drive the conveyor belt 12 to continuously rotate around the conveyor wheel 13, forming a smooth transmission path and achieving stable transportation of the workpiece. The continuous movement of the conveyor belt 12 drives the transmission frame 14 to move precisely. The transmission frame 14 then drives the limited unloading assembly 16 through a sophisticated linkage mechanism to perform precise positioning and unloading actions, ensuring that the workpiece can accurately and smoothly reach the designated position. At the same time, the clamping mechanism 2 and the cleaning mechanism 3 are both tightly connected to the transmission frame 14, realizing the linkage operation driven by the transmission frame 14, effectively improving the accuracy and stability of workpiece transportation and the connection between various processes, reducing the need for manual intervention, and improving overall production efficiency.

[0036] Furthermore, the limiting blanking assembly 16 includes a limiting box 161, a reset elastic member 162, a reset rack 163, a ratchet wheel 164, a ratchet secondary wheel 165, an opening and closing tooth block 166, a first limiting block 167, a second limiting block 168, a hinged rod 169 and a limiting elastic member 1610, the limiting box 161 is fastened to the conveying frame 15, the reset elastic member 162 is fastened to the reset rack 163, the reset rack 163 is slidably connected to the limiting box 161, the reset elastic member 162 is fastened to the limiting box 161, the reset rack 163 is fastened to the reset elastic member 162, and the reset rack 16 3 is transmission-connected to the ratchet wheel 164, the ratchet wheel 164 is transmission-connected to the ratchet auxiliary wheel 165, the ratchet wheel 164 and the ratchet auxiliary wheel 165 are both rotationally connected to the limit box 161, the ratchet auxiliary wheel 165 is transmission-connected to the opening and closing tooth block 166, the opening and closing tooth block 166 is transmission-connected to the first limit block 167, the first limit block 167 is hinged to the hinged rod 169, the hinged rod 169 is transmission-connected to the second limit block 168, the second limit block 168 is slidingly connected to the limit box 161, the limiting elastic member 1610 is fastened to the second limit block 168, and the limiting elastic member 1610 is fastened to the limit box 161.

[0037] By adopting the above technical solution, the limit box 161 in the limit blanking assembly 16 is firmly installed on the conveying frame 15, and the reset elastic member 162 drives the reset rack 163 to slide in the limit box 161 through tension and compression; the reset rack 163 then forms a precise meshing transmission with the ratchet wheel 164, and the ratchet wheel 164 drives the ratchet auxiliary wheel 165 to rotate, and the ratchet auxiliary wheel 165 further drives the opening and closing gear block 166 to open or close, so as to accurately control the position and movement trajectory of the first limit block 167; the first limit block 167 is connected to the second limit block 168 through the hinge rod 169, and the swing of the hinge rod 169 drives the second limit block 168 to slide in the limit box 161, and cooperates with the limit elastic member 1610 to ensure the accuracy of positioning, so that the workpiece can be stably limited and automatically blanked, which significantly improves production efficiency.

[0038] Furthermore, the clamping mechanism 2 includes a clamping jaw 21, a clamping frame 22 and a rotating motor 23. The clamping jaw 21 and the clamping frame 22 are fastened together, the rotating motor 23 and the clamping frame 22 are transmission-connected together, and the rotating motor 23 and the transmission frame 14 are fastened together.

[0039] By adopting the above technical scheme, the rotating motor 23 in the clamping mechanism 2 is connected with the clamping frame 22 through a precise transmission structure, and when the rotating motor 23 is started, the clamping frame 22 can be accurately driven to rotate, so that the clamping jaw 21 fixed on the clamping frame 22 also rotates, thereby realizing stable clamping, positioning and direction adjustment of the workpiece; the tight connection between the clamping jaw 21 and the clamping frame 22 ensures that the clamping jaw 21 has sufficient rigidity and stability during clamping, can provide stable and uniform clamping force, ensures that the workpiece will not be loosened due to vibration or external force, is suitable for workpieces of different specifications, and greatly improves the adaptability and flexibility of the production line.

[0040] Further, the cleaning mechanism 3 includes a cleaning nozzle 31, a preheating gas pump 32 and a recovery tank 33, the cleaning nozzle 31 and the preheating gas pump 32 are communicated, and the cleaning nozzle 31, the preheating gas pump 32 and the recovery tank 33 are all tightly connected with the transmission frame 14.

[0041] By adopting the above technical scheme, the preheating gas pump 32 in the cleaning mechanism 3 continuously delivers the heated high-temperature gas to the cleaning nozzle 31, and the high-temperature gas directly acts on the surface of the workpiece after being sprayed from the nozzle, quickly removing the contaminants such as oil, dust and impurities existing on the surface of the workpiece; the impurities and waste liquid carried away by the airflow and cleaning liquid during the cleaning process are collected by the special recovery tank 33, preventing pollution of the production environment, effectively protecting the cleanliness of the production environment, significantly improving the cleaning efficiency and the cleanliness of the workpiece surface, providing good conditions for the subsequent process, and preheating the substrate, thereby improving the film adhesion.

[0042] Further, the temperature control mechanism 5 includes a circulating pump 51, a heating tank 52, a cooling tank 53 and a circulating pipe 54, the heating tank 52 and the cooling tank 53 are communicated, the cooling tank 53 and the circulating pump 51 are communicated, the circulating pump 51 and the circulating pipe 54 are communicated, and the circulating pipe 54 and the heating tank 52 are communicated.

[0043] By adopting the above technical scheme, the temperature control mechanism 5 relies on the circulating pump 51 to stably drive the heat-conducting liquid to circulate between the heating tank 52 and the cooling tank 53, and forms a closed-loop heat exchange system through the circulating pipe 54, so that the temperature inside the equipment can quickly and accurately reach and remain in a specific temperature range required by the process; the temperature control system monitors and feeds back the temperature change inside the equipment in real time through a precise temperature sensor, thereby automatically adjusting the working state of the heating tank 52 and the cooling tank 53, maintaining a stable temperature environment required by the film plating process, significantly improving the temperature stability in the film plating process, and improving the adhesion, uniformity and quality consistency of the film layer.

[0044] Furthermore, the coating mechanism 4 includes an eccentric component 41, an attachment component 42, a deposition control component 43, a vacuum pump 44, an oxygen pump 45, a connecting pipe 46, a recovery pipe 47 and a coating box 48. The eccentric component 41 and the coating box 48 are tightly connected, the attachment component 42 and the coating box 48 are tightly connected, the deposition control component 43 and the coating box 48 are tightly connected, and the vacuum pump 44, the oxygen pump 45, the argon pump and the recovery pipe 47 are all connected to the coating box 48.

[0045] By adopting the above technical solution, the eccentric component 41, the attachment component 42 and the deposition control component 43 in the coating mechanism 4 are respectively firmly installed in the coating box 48, and the various components work closely and coordinately. The vacuum pump 44 quickly establishes and maintains the high vacuum environment required for the coating process, and the oxygen pump 45 and the argon pump respectively accurately deliver the pure working gas to the coating box 48 through the connecting pipe 46 to form a suitable reaction atmosphere. The control valve slowly introduces high-purity argon gas, loads the target material with direct current, and attracts argon ions to form a glow discharge. Under the action of the electric field, the argon ions collide with the first target material 422 at high speed, which can be a copper target, thereby generating "momentum transfer" on the surface to knock out copper atoms. The knocked-out copper atoms have high kinetic energy and fly in a straight line to the surface of the ceramic substrate in a vacuum to form a deposition. The recovery pipe 47 promptly recycles and reuses the incompletely reacted or excess gas, maximizes the utilization of raw materials, ensures the stability and economy of the coating process, and significantly improves the film deposition quality and the environmental friendliness of the production process.

[0046] Furthermore, the eccentric assembly 41 includes a magnetic control box 411, an electromagnet 412, a lifting hydraulic cylinder 413, an eccentric motor 414, an eccentric block 415, a rotating shaft 416, a clamping electromagnetic block 417, a clamping elastic member 418 and a clamping magnetic block 419. The magnetic control box 411 is fastened to the attachment assembly 42, the electromagnet 412 is fastened to the eccentric block 415, the lifting hydraulic cylinder 413 is fastened to the magnetic control box 411, the lifting hydraulic cylinder 413 is transmission-connected to the eccentric motor 414, and the eccentric The electromagnet 414 is transmission-connected to the rotating shaft 416, the rotating shaft 416 is transmission-connected to the eccentric block 415, the clamping electromagnetic block 417 is fastened to the eccentric block 415, the clamping electromagnetic block 417 is fastened to the clamping elastic member 418, the clamping magnetic block 419 is fastened to the clamping elastic member 418, the clamping electromagnetic block 417 and the clamping magnetic block 419 are magnetically pole-repelled, the clamping magnetic block 419 is slidingly connected to the eccentric block 415, and the clamping magnetic block 419 is fastened to the rotating shaft 416.

[0047] By adopting the above technical solution, the lifting hydraulic cylinder 413 in the eccentric assembly 41 provides up and down adjustment of the electromagnet 412, and the eccentric motor 414 adjusts the speed and position of the rotating shaft 416, and the eccentric block 415 performs eccentric movement driven by the motor; the electromagnet 412, the clamping electromagnetic block 417 and the clamping magnetic block 419 cooperate with the clamping elastic part 418 through the principle of magnetic pole repulsion, and the clamping magnetic block 419 slides and adjusts in the eccentric block 415 and clamps the rotating shaft 416, thereby forming an offset action to prevent uneven target material ablation during the coating process of the substrate. By adjusting the magnetic control position and the eccentric angle relative to the substrate, the target-base distance is indirectly changed, thereby effectively avoiding uneven workpiece caused by local adhesion concentration, thereby ensuring the consistency and reliability of the coating quality.

[0048] Furthermore, the attachment assembly 42 includes a rotating frame 421, a first target material 422, a second target material 423, a switching motor 424, and a rotating plate 425. The first target material 422 and the second target material 423 are both clamped with the rotating plate 425. The rotating plate 425 and the rotating frame 421 are rotatably connected. The switching motor 424 and the rotating frame 421 are fastened and connected. The switching motor 424 and the rotating plate 425 are transmission-connected. A shielding area 4211 is provided on the rotating frame 421. A sputtering area 4212 is provided on the rotating frame 421. The first target material 422 and the second target material 423 are both electrically connected to the deposition control assembly 43.

[0049] By adopting the above technical solution, the switching motor 424 in the adhesion component 42 drives the rotating plate 425 to rotate around the rotating frame 421, and the first target material 422 and the second target material 423 installed on the rotating plate 425 are switched through the shielding area 4211 and the sputtering area 4212 of the rotating frame 421; the target material switching process is fast and stable without the need for shutdown. The second target material 423 can specifically be titanium or chromium material. By providing an adhesion layer in advance, the adhesion of the first target material 422, specifically copper material, is improved, thereby improving the continuous production capacity of the equipment, meeting the deposition requirements of complex coating processes for multiple film materials, and making the equipment more widely applicable and more efficient.

[0050] Furthermore, the deposition control assembly 43 includes a sliding electrical block 431, a resistor block 432, a cathode block 433, a control motor 434 and a control rod 435. The control motor 434 is fastened to the rotating plate 425, the control motor 434 is transmission-connected to the control rod 435, the control rod 435 is transmission-connected to the sliding electrical block 431, the resistor block 432 is electrically connected to the sliding electrical block 431, a plurality of resistor blocks 432 are provided, and the resistor blocks 432 are arranged in a grid shape. The first target material 422 and the second target material 423 are both electrically connected to the resistor block 432, and the cathode block 433 is electrically connected to the sliding electrical block 431.

[0051] By adopting the above technical solution, the control motor 434 in the deposition control component 43 drives the control rod 435 to accurately control the position and current of the sliding electrical block 431. The sliding electrical block 431 forms a precise electrical connection with the grid-arranged resistor block 432 to accurately adjust the sputtering current; the grid design of the resistor block 432 provides detailed current control capabilities to ensure uniform and stable sputtering and deposition of the target material; the cathode block 433 stably provides a negative electrode potential, which can effectively prevent current fluctuations during the sputtering process, and can also control the thickness, uniformity and quality consistency of the coating by controlling the current density of the target, thereby significantly improving the quality stability and product reliability of the coating production.

[0052] Working principle of the present invention: The reset rack 163 in the position limiting blanking assembly 16 slides along the position limiting box 161 under the drive of the reset elastic member 162, accurately meshing with the ratchet wheel 164 and the ratchet auxiliary wheel 165 to link the opening and closing tooth block 166, thereby realizing the accurate opening and closing of the first position limiting block 167. The articulated rod 169 drives the second limit block 168 to slide with the limit elastic part 1610 to ensure the precise limit and automatic unloading of the workpiece, avoid manual alignment and unloading errors, and ensure continuous and stable production. The eccentric component 41 uses the eccentric motor 414 to drive the eccentric block 415, and realizes the sliding eccentric adjustment of the rotating shaft 416 through the repulsive effect of the magnetic poles of the clamping magnetic block 419 and the clamping electromagnetic block 417, and accurately controls the change of the target base distance, effectively preventing uneven local ablation of the target material and uneven film layer, ensuring the consistency of film layer adhesion, avoiding quality problems caused by uneven adhesion of the workpiece, and significantly improving the coating yield. The switching motor 424 in the attachment component 42 rotates the rotating plate 425 to quickly switch the first and second target materials 423 in the sputtering area 4212 and the shielding area 4211. The deposition control component 43 uses the precise electrical adjustment of the sliding electrical block 431 on the grid-shaped resistance block 432 to achieve fine control of the target sputtering current, effectively ensuring the stability of the target sputtering and the uniformity of the film deposition, avoiding the problems of uneven thickness and unstable product quality in traditional sputtering.

[0053] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above and that the invention can be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the invention is defined by the appended claims, not the foregoing description, and all variations within the meaning and range of equivalents of the claims are intended to be included therein. Any reference sign in a claim should not be construed as limiting the claim to which it relates.

Claims

1. A ceramic substrate coating device for semiconductor production, characterized by: The coating device comprises a conveying mechanism (1), a clamping mechanism (2), a cleaning mechanism (3), a coating mechanism (4) and a temperature control mechanism (5); the conveying mechanism (1) and the clamping mechanism (2) are transmission-connected, the clamping mechanism (2) and the cleaning mechanism (3) are transmission-connected, the conveying mechanism (1) and the coating mechanism (4) are fastened together, and the temperature control mechanism (5) and the coating mechanism (4) are fastened together.

2. The ceramic substrate coating equipment for semiconductor production according to claim 1, characterized in that: The conveying mechanism (1) comprises a conveying motor (11), a conveying belt (12), a conveying wheel (13), a transmission frame (14), a conveying frame (15) and a position-limiting blanking assembly (16); the conveying motor (11) and the conveying frame (15) are fastened together; the conveying motor (11) and the conveying belt (12) are transmission-connected; the conveying belt (12) and the transmission frame (14) are transmission-connected; the transmission frame (14) and the position-limiting blanking assembly (16) are transmission-connected; the clamping mechanism (2) and the transmission frame (14) are fastened together; and the cleaning mechanism (3) and the transmission frame (14) are fastened together.

3. The ceramic substrate coating equipment for semiconductor production according to claim 2, characterized in that: The position-limiting blanking assembly (16) comprises a position-limiting box (161), a reset elastic member (162), a reset rack (163), a ratchet wheel (164), a ratchet secondary wheel (165), an opening and closing tooth block (166), a first position-limiting block (167), a second position-limiting block (168), a hinged rod (169) and a position-limiting elastic member (1610); the position-limiting box (161) is fastened to the conveying frame (15); the reset elastic member (162) is fastened to the reset rack (163); the reset rack (163) is slidably connected to the position-limiting box (161); the reset elastic member (162) is fastened to the position-limiting box (161); the reset rack (163) is fastened to the reset elastic member (162); the reset rack (163) is transmission-connected to the ratchet wheel (164); The ratchet wheel (164) and the ratchet auxiliary wheel (165) are connected in a transmission manner. The ratchet wheel (164) and the ratchet auxiliary wheel (165) are both rotatably connected to the limit box (161). The ratchet auxiliary wheel (165) is connected in a transmission manner to the opening and closing tooth block (166). The opening and closing tooth block (166) is connected in a transmission manner to the first limit block (167). The first limit block (167) is hinged to the hinged rod (169). The hinged rod (169) is connected in a transmission manner to the second limit block (168). The second limit block (168) is connected in a sliding manner to the limit box (161). The limit elastic member (1610) is fixedly connected to the second limit block (168). The limit elastic member (1610) is fixedly connected to the limit box (161). The transmission frame (14) is connected in a transmission manner to the reset rack (163).

4. The ceramic substrate coating equipment for semiconductor production according to claim 3, characterized in that: The clamping mechanism (2) comprises a clamping claw (21), a clamping frame (22) and a rotating motor (23); the clamping claw (21) and the clamping frame (22) are fastened together; the rotating motor (23) and the clamping frame (22) are transmission-connected; and the rotating motor (23) and the transmission frame (14) are fastened together.

5. The ceramic substrate coating equipment for semiconductor production according to claim 4, characterized in that: The cleaning mechanism (3) comprises a cleaning nozzle (31), a preheating air pump (32) and a recovery box (33); the cleaning nozzle (31) and the preheating air pump (32) are in communication; and the cleaning nozzle (31), the preheating air pump (32) and the recovery box (33) are all fixedly connected to the transmission frame (14).

6. The ceramic substrate coating equipment for semiconductor production according to claim 5, characterized in that: The temperature control mechanism (5) includes a circulation pump (51), a heating box (52), a cooling box (53) and a circulation pipe (54); the heating box (52) is connected to the cooling box (53); the cooling box (53) is connected to the circulation pump (51); the circulation pump (51) is connected to the circulation pipe (54); and the circulation pipe (54) is connected to the heating box (52).

7. The ceramic substrate coating equipment for semiconductor production according to claim 6, characterized in that: The coating mechanism (4) includes an eccentric component (41), an attachment component (42), a deposition control component (43), a vacuum pump (44), an oxygen pump (45), a connecting pipe (46), a recovery pipe (47) and a coating box (48), wherein the eccentric component (41) and the coating box (48) are fastened together, the attachment component (42) and the coating box (48) are fastened together, the deposition control component (43) and the coating box (48) are fastened together, and the vacuum pump (44), the oxygen pump (45), the argon pump and the recovery pipe (47) are all connected to the coating box (48).

8. The ceramic substrate coating equipment for semiconductor production according to claim 7, characterized in that: The eccentric assembly (41) includes a magnetic control box (411), an electromagnet (412), a lifting hydraulic cylinder (413), an eccentric motor (414), an eccentric block (415), a rotating shaft (416), a clamping electromagnetic block (417), a clamping elastic member (418) and a clamping magnetic block (419); the magnetic control box (411) and the attachment assembly (42) are fastened together; the electromagnet (412) and the eccentric block (415) are fastened together; the lifting hydraulic cylinder (413) and the magnetic control box (411) are fastened together; the lifting hydraulic cylinder (413) and the eccentric motor (414) are transmission-connected; the eccentric motor The machine (414) is connected to the rotating shaft (416) in a transmission manner, the rotating shaft (416) is connected to the eccentric block (415) in a transmission manner, the clamping electromagnetic block (417) is fixedly connected to the eccentric block (415), the clamping electromagnetic block (417) is fixedly connected to the clamping elastic member (418), the clamping magnetic block (419) is fixedly connected to the clamping elastic member (418), the clamping electromagnetic block (417) and the clamping magnetic block (419) are driven by magnetic pole repulsion, the clamping magnetic block (419) is connected to the eccentric block (415) in a sliding manner, and the clamping magnetic block (419) is fixedly connected to the rotating shaft (416).

9. The ceramic substrate coating equipment for semiconductor production according to claim 8, characterized in that: The attachment assembly (42) includes a rotating frame (421), a first target (422), a second target (423), a switching motor (424) and a rotating plate (425), wherein the first target (422) and the second target (423) are both clamped with the rotating plate (425), the rotating plate (425) and the rotating frame (421) are rotationally connected, the switching motor (424) and the rotating frame (421) are fastened, the switching motor (424) and the rotating plate (425) are transmission-connected, a shielding area (4211) is provided on the rotating frame (421), a sputtering area (4212) is provided on the rotating frame (421), and the first target (422) and the second target (423) are both electrically connected to the deposition control assembly (43).

10. The ceramic substrate coating equipment for semiconductor production according to claim 9, characterized in that: The deposition control assembly (43) includes a sliding electrical block (431), a resistor block (432), a cathode block (433), a control motor (434) and a control rod (435), wherein the control motor (434) and the rotating plate (425) are fastened together, the control motor (434) and the control rod (435) are transmission-connected, the control rod (435) and the sliding electrical block (431) are transmission-connected, the resistor block (432) and the sliding electrical block (431) are electrically connected, a plurality of resistor blocks (432) are provided, and the resistor blocks (432) are arranged in a grid shape, the first target material (422) and the second target material (423) are both electrically connected to the resistor block (432), and the cathode block (433) and the sliding electrical block (431) are electrically connected.

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