Processing liquid supply mechanism and coating device

Abstract

The invention discloses a treatment liquid supply mechanism and a coating device. The processing liquid supply mechanism includes: a nozzle for spraying the processing liquid to a preset spraying point on the surface of the substrate; the angle adjusting assembly is used for installing the nozzle, the angle adjusting assembly is constructed to rotate the nozzle with a preset center point as the rotation center so as to adjust the included angle between the liquid spraying axis of the nozzle and the surface of the substrate, the preset center point is located on the liquid spraying axis, and when the nozzle is located at the working position, the preset center point is located on the liquid spraying axis; the preset center point is configured to overlap with the preset injection point. The technical effects that the position precision of substrate edge cleaning is improved, and the operation steps of the treating fluid supply mechanism are simplified are achieved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor equipment, in particular to a processing liquid supply mechanism and a coating device. BACKGROUND

[0002] Currently, the core machines used in the photolithography process include a coating and developing machine and an exposure machine. The general process of the photolithography process is that after the substrate completes the coating process in the coating module of the coating and developing machine, the substrate is sent into the exposure machine for exposure processing, and then the substrate after exposure is returned to the coating and developing machine to complete the developing process in the developing module of the coating and developing machine.

[0003] The existing coating module generally includes multiple coating devices. During the process of coating glue on the substrate inside the coating device, due to the centrifugal force generated by the rotation of the substrate, the photoresist on the substrate gradually spreads to the edge of the substrate, causing the photoresist to accumulate at the edge of the substrate and form a protruding residue, thereby increasing the risk of contamination of the substrate in the subsequent process. In order to remove the photoresist residue accumulated at the edge of the substrate, an edge bead removal (EBR) process, also known as an edge sphere removal process or an edge glue removal process, is usually added after the glue coating process to remove the photoresist residue at the edge of the substrate. In addition, before the edge bead removal process is performed on the substrate, the spray angle of the edge bead removal nozzle needs to be adjusted according to the actual process. Because when the spray angle of the edge bead removal nozzle is within a certain range, the cleaning liquid sprayed by the edge bead removal nozzle on the surface of the substrate can cause the splashing of liquid droplets inward, resulting in defects on the surface of the substrate. Only some specific spray angles can avoid the splashing of liquid droplets inward, so the spray angle of the edge bead removal nozzle needs to be adjusted to meet the requirements of the edge bead removal process.

[0004] For example, the patent document with the application number 201910785150.0 discloses an edge bead removal device, which includes a support shaft, a driving device, a rotating support, an L-shaped support rod, a spray head device, a first fine adjustment mechanism, and a second fine adjustment mechanism. The driving device is installed at one end of the support shaft, and the rotating support is installed at the other end of the support shaft. The L-shaped support rod includes a vertical support rod and a horizontal support rod, the vertical support rod is rotatably installed at the free end of the rotating support, and the horizontal support rod rotatably installs the spray head device. The first fine adjustment mechanism is installed on the rotating support for driving the L-shaped support rod to rotate, and the second fine adjustment mechanism is installed on the L-shaped support rod for driving the spray head device to rotate. The patent document adjusts the angle of the spray head device by manually adjusting the first fine adjustment mechanism and the second fine adjustment mechanism, controls the width of the edge bead removal and the width of the transition area, so as to achieve the best edge bead removal effect and improve the product quality.

[0005] However, in the process of adjusting the angle of the above-mentioned nozzle device, since the nozzle device rotates around the rotation axis of the first fine adjustment mechanism or the rotation axis of the second fine adjustment mechanism, a large change in the position of the cleaning liquid sprayed by the nozzle to the plane where the substrate is located occurs, thereby affecting the position accuracy of the nozzle device in cleaning the edge of the substrate. Therefore, for the above-mentioned technical solution, in order to ensure the position accuracy of the nozzle device in cleaning the edge of the substrate after the adjustment of the spray angle of the nozzle device is completed, the nozzle device needs to be moved horizontally and vertically to recalibrate the position of the cleaning liquid sprayed by the nozzle to the plane where the substrate is located, resulting in a complicated operation step of the edge cleaning device. SUMMARY

[0006] In view of the above technical problems, the purpose of the present application is to improve the position accuracy of the edge cleaning of the substrate and simplify the operation step of the processing liquid supply mechanism.

[0007] In order to achieve the above-mentioned purpose, the present application provides a processing liquid supply mechanism and a coating device.

[0008] In some embodiments, a processing liquid supply mechanism comprises: a nozzle for spraying a processing liquid to a preset spray point on a substrate surface; and an angle adjustment assembly for mounting the nozzle, the angle adjustment assembly being configured to rotate the nozzle around a preset center point as a rotation center to adjust the included angle between the liquid spray axis of the nozzle and the substrate surface, wherein the preset center point is located on the liquid spray axis, and when the nozzle is positioned at a working position, the preset center point is configured to overlap the preset spray point.

[0009] In some embodiments, a coating device comprises the above-mentioned processing liquid supply mechanism, and further comprises: a carrying mechanism for carrying and rotating a substrate; a coating mechanism for spraying a coating liquid to the substrate; and a control unit in communication connection with the processing liquid supply mechanism, the carrying mechanism and the coating mechanism, the control unit being configured to control the carrying mechanism to carry and rotate the substrate, and during the coating process of the substrate, control the coating mechanism to spray a coating liquid to the center of the substrate, and after the coating process of the substrate is completed, control the processing liquid supply mechanism to move the nozzle from a standby position to the working position, and control the nozzle to spray a cleaning liquid to the preset spray point to clean the edge of the substrate.

[0010] According to the processing liquid supply mechanism of the present application, when in use, the angle adjusting assembly is adjusted to adjust the included angle between the liquid spraying axis of the nozzle and the surface of the substrate. Since the nozzle rotates around the preset center point which is located on the liquid spraying axis, and the preset center point is configured to overlap the preset spraying point when the nozzle is positioned at the working position, therefore, the position of the preset spraying point, i.e. the position of the processing liquid sprayed by the nozzle to the plane where the substrate is located, does not change before and after the angle adjustment of the nozzle, and thus the position accuracy of the edge cleaning of the substrate is improved. BRIEF DESCRIPTION OF DRAWINGS

[0011] The above features, technical characteristics, advantages and implementation manners of the present application will be further described in the following preferred embodiments in a clear and understandable manner in combination with the drawings.

[0012] Figure 1 is a schematic view of a processing liquid supply mechanism of an embodiment of the present application; Figure 2 is Figure 1 is a partial enlarged view of area a; Figure 3 is Figure 1 is a front view of Figure 4 is a schematic view of the angle adjusting assembly with the first fastener removed; Figure 5 is Figure 1 is a right view of Figure 6 is a schematic view of a processing liquid supply mechanism of another embodiment of the present application; Figure 7 is Figure 6 is a partial enlarged view of area b; Figure 8 is Figure 6 is a front view of Figure 9 is Figure 6 is a left view of Figure 10 is a schematic view of the angle adjusting assembly with the first fastener removed; Figure 11 is Figure 10 is a right view after the second fastener is removed; and Figure 12 is a schematic view of a coating device of an embodiment of the present application. DETAILED DESCRIPTION

[0013] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, specific implementation manners of the present application will be described below with reference to the drawings. Obviously, the drawings in the following description only represent some of the embodiments of the present application, and for those skilled in the art, other drawings can be obtained from these drawings without any creative effort, and other embodiments can also be obtained.

[0014] For the sake of simplicity of the drawings, only parts related to the present application are shown in each drawing, which do not represent the actual structure of the product. In addition, in order to make the drawings simple and easy to understand, in some drawings, only one of the components with the same structure or function is shown schematically, or only one of them is marked. In this document, "one" means not only "only one", but also "more than one" situation.

[0015] In this document, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be connected inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0016] In addition, in the description of the present application, the terms "first", "second", etc. are only used for differentiation and description, and cannot be understood as indicating or implying relative importance.

[0017] As shown in Figure 1 , a processing liquid supply mechanism 20 according to an embodiment of the present application is disclosed. The processing liquid supply mechanism 20 includes a nozzle 21 and an angle adjusting assembly 22.

[0018] The nozzle 21 is used to spray a preset spraying point on the surface of the substrate 10, and the processing liquid includes substrate processing liquid such as cleaning liquid and etching liquid. The angle adjusting assembly 22 is used to mount the nozzle 21, and the angle adjusting assembly 22 is configured to rotate the nozzle 21 with a preset center point n as the rotation center, so as to adjust the included angle between the liquid spraying axis m of the nozzle 21, i.e. the trajectory of the processing liquid sprayed by the nozzle 21, and the surface of the substrate 10. Referring to Figure 2 and Figure 3 , the preset center point n is located on the liquid spraying axis m, and when the nozzle 21 is positioned at the working position, the preset center point n is configured to overlap the preset spraying point.

[0019] It is to be noted that, in some embodiments of the present application, during the edge cleaning of the substrate 10 by the nozzle 21 in its working position, the substrate 10 is in a rotating state and the nozzle 21 is in a stationary state with respect to the ground, and thus the above-mentioned preset spraying point is in a stationary state with respect to the nozzle 21 and in a rotating state with respect to the substrate 10.

[0020] In the above-mentioned embodiments, since the nozzle 21 rotates around the preset center point n which is located on the spraying axis m, and the preset center point n is configured to overlap with the preset spraying point when the nozzle 21 is positioned in the working position, the position of the preset spraying point, i.e. the position of the processing liquid sprayed by the nozzle 21 to the plane of the substrate 10, does not change before and after the angle adjustment of the nozzle 21 as long as the working position of the nozzle 21 is unchanged, thereby improving the position accuracy of the edge cleaning of the substrate 10.

[0021] In addition, in actual applications, the nozzle 21 can be angle-adjusted in its working position or in its standby position. If the nozzle 21 is angle-adjusted in its working position, since the preset center point n is configured to overlap with the preset spraying point, the position of the preset spraying point, i.e. the position of the processing liquid sprayed by the nozzle 21 to the plane of the substrate 10, does not change before and after the angle adjustment, and it is no longer necessary to horizontally and vertically move the nozzle 21 to calibrate the position of the processing liquid sprayed by the nozzle 21 to the plane of the substrate 10, thereby simplifying the operation steps of the processing liquid supply mechanism 20.

[0022] If the nozzle 21 is angle-adjusted in its standby position, since the nozzle 21 still needs to be moved to the working position after the angle adjustment in the standby position to perform the edge cleaning of the substrate 10, and since the preset center point n is configured to overlap with the preset spraying point when the nozzle 21 is positioned in the working position, the position of the preset spraying point, i.e. the position of the processing liquid sprayed by the nozzle 21 to the plane of the substrate 10, does not change as long as the working position of the nozzle 21 is unchanged, and thus it is no longer necessary to horizontally and vertically move the nozzle 21 to calibrate the position of the processing liquid sprayed by the nozzle 21 to the plane of the substrate 10 after the nozzle 21 is moved to the working position, thereby simplifying the operation steps of the processing liquid supply mechanism 20.

[0023] In an embodiment of the present application, as shown in Figure 4 and Figure 5 the angle adjustment assembly 22 includes a first connecting member 221, a second connecting member 225 and a support arm 23. The first connecting member 221 includes a first connecting member body 222 and a first sliding block part 223, and the first connecting member body 222 is used to mount the nozzle 21. For example, the nozzle 21 includes a nozzle head 211, a nozzle body 212 and a pipeline connecting interface 213. The first connecting member body 222 is provided with a mounting hole 2221 (refer to Figure 3), the nozzle body 212 is disposed through the mounting hole 2221. In addition, the second connecting member 225 is provided with a first arc-shaped guide rail 229 having a first rotation axis A1, the liquid spraying axis m is perpendicular to the first rotation axis A1, and the preset center point n is the intersection of the liquid spraying axis m and the first rotation axis A1. The first sliding block part 223 cooperates with the first arc-shaped guide rail 229 to drive the nozzle 21 to rotate around the first rotation axis A1. The support arm 23 is used to support the second connecting member 225.

[0024] It should be noted that, assuming that the nozzle 21 and the first connecting member 221 move along the first arc-shaped guide rail 229, the motion trajectory of any point on the nozzle 21 and the first connecting member 221 is an arc-shaped curve. For example, the motion trajectory of the end of the nozzle 21 is recorded as a first arc-shaped curve (not shown in the figure), and the center of the first arc-shaped curve is the preset center point n. The first rotation axis A1 represents a line that passes through the center of the above-mentioned first arc-shaped curve, i.e., the preset center point n, and is perpendicular to the plane in which the above-mentioned first arc-shaped curve lies. Therefore, during the movement of the nozzle 21 and the first connecting member 221 along the first arc-shaped guide rail 229, the nozzle 21 and the first connecting member 221 will rotate around the first rotation axis A1 to adjust the included angle between the liquid spraying axis m of the nozzle 21 and the surface of the substrate 10.

[0025] In an embodiment of the present application, referring again to Figure 4 and Figure 5 When the nozzle 21 is positioned at the working position, the first rotation axis A1 is perpendicular to the diameter d of the substrate 10 passing through the preset center point n.

[0026] It should be noted that, during the movement of the nozzle 21 and the first connecting member 221 along the first arc-shaped guide rail 229, the liquid spraying axis m will rotate in a certain plane, which is recorded as a liquid spraying plane f, with the preset center point n as the center. Because the end of the nozzle 21 is on the liquid spraying axis m, and in combination with the above explanation of the first rotation axis A1, it can be known that the above-mentioned liquid spraying plane f coincides with the plane in which the first arc-shaped curve lies, and further, the above-mentioned liquid spraying plane f is perpendicular to the first rotation axis A1 and intersects at the preset center point n, i.e., the liquid spraying axis m is perpendicular to the first rotation axis A1 and intersects at the preset center point n.

[0027] Therefore, in combination with the present embodiment, the first rotation axis A1 is perpendicular to the diameter d, the diameter d is in the same plane as the liquid spraying plane f, and intersects the preset center point n. Furthermore, during the movement of the nozzle 21 and the first connecting member 221 along the first arc-shaped guide rail 229, the angle a between the liquid spraying axis m and the diameter d will change. Since the extension direction of the diameter d is consistent with the radial direction of the substrate 10, by changing the angle a between the liquid spraying axis m and the diameter d of the substrate 10 passing through the preset center point n, the photoresist residue at the edge of the substrate 10 can be flushed outward in the radial direction of the substrate 10, the processing liquid droplets reflected from the edge of the substrate 10 can be splashed outward in the radial direction of the substrate 10, the inward splashing of the processing liquid droplets is prevented, and surface defects are generated.

[0028] Referring again to Figure 4 In an embodiment of the present application, the first arc-shaped guide rail 229 includes a first scale surface 2292 configured to be perpendicular to the first rotation axis A1, and a plurality of scales 2293 are provided on the first scale surface 2292.

[0029] In the present embodiment, since the first scale surface 2292 is configured to be perpendicular to the first rotation axis A1, the first scale surface 2292 is parallel to or coincides with the liquid spraying plane f, the rotation angle of the liquid spraying axis m in the liquid spraying plane f is equal to the rotation angle in the first scale surface 2292, so as to correspond the angle a to the value of the scale 2293, and facilitate the identification of the angle a between the liquid spraying axis m and the diameter d of the substrate 10 passing through the preset center point n.

[0030] As shown in Figure 6 and Figure 7 In an embodiment of the present application, the first connecting member 221 is the same as that of the previous embodiment, the second connecting member 225 includes a second connecting member body 226 and a second sliding block portion 227, and the first arc-shaped guide rail 229 is provided on the second connecting member body 226. The support arm 23 is provided with a second arc-shaped guide rail 231 having a second rotation axis A2, the liquid spraying axis m is perpendicular to the second rotation axis A2, and the preset center point n is the intersection of the liquid spraying axis m and the second rotation axis A2. The second sliding block portion 227 cooperates with the second arc-shaped guide rail 231 to drive the nozzle 21 to rotate around the second rotation axis A2.

[0031] It is to be noted that the movement trajectory of any point on the nozzle 21, the first connecting member 221 and the second connecting member 225 is also an arc curve during the movement of the nozzle 21, the first connecting member 221 and the second connecting member 225 as a whole along the second arc guide rail 231. For example, the movement trajectory of the end of the nozzle 21 is denoted as a second arc curve (not shown in the figure), and the second rotation axis A2 represents a line that passes through the center of the second arc curve and is perpendicular to the plane on which the second arc curve lies. Therefore, the nozzle 21, the first connecting member 221 and the second connecting member 225 will rotate around the second rotation axis A2 during the movement of the nozzle 21, the first connecting member 221 and the second connecting member 225 as a whole along the second arc guide rail 231, so as to adjust the included angle between the liquid spraying axis m of the nozzle 21 and the surface of the substrate 10.

[0032] In an embodiment of the present application, as shown in Figure 9 the first rotation axis A1 of the first arc guide rail 229 is not parallel to the second rotation axis A2 of the second arc guide rail 231. During the movement of the nozzle 21 along the first arc guide rail 229 and the second arc guide rail 231 respectively, the nozzle 21 rotates around different rotation axes respectively, thereby increasing the adjustment dimension of the spraying angle of the nozzle 21.

[0033] In an embodiment of the present application, as shown in Figure 9 and Figure 10 when the nozzle 21 is positioned at the working position, the second rotation axis A2 coincides with the diameter d of the substrate 10 passing through the preset center point n.

[0034] It is to be noted that the liquid spraying surface f will rotate around the second rotation axis A2 during the movement of the nozzle 21, the first connecting member 221 and the second connecting member 225 as a whole along the second arc guide rail 231. Since the second rotation axis A2 coincides with the diameter d, and the diameter d and the tangent t of the concentric circle of the substrate 10 passing through the preset center point n are perpendicular to each other and intersect at the preset center point n, the tangent t is perpendicular to the second rotation axis A2 and intersects at the preset center point n, thereby changing the included angle β between the liquid spraying surface f and the tangent t during the movement of the nozzle 21, the first connecting member 221 and the second connecting member 225 as a whole along the second arc guide rail 231. Since the liquid spraying axis m is located in the liquid spraying surface f, changing the included angle β between the liquid spraying surface f and the tangent t helps to flush the photoresist residue on the edge of the substrate 10 in the direction of the tangent t, so that the processing liquid droplets reflected by the edge of the substrate 10 are splashed in the rotation direction of the tangent t, preventing the processing liquid droplets from splashing inward and causing surface defects.

[0035] Referring again to Figure 7In an embodiment of the present application, the second arc-shaped guide rail 231 comprises a second scale surface 2312, which is configured to be perpendicular to the second rotation axis A2, and a plurality of scales 2313 are arranged on the second scale surface 2312.

[0036] In the embodiment, since the second scale surface 2312 is configured to be perpendicular to the second rotation axis A2, and the second rotation axis A2 coincides with the diameter d which is located on the liquid spraying surface f, the second scale surface 2312 is perpendicular to the liquid spraying surface f, and the rotation angle of the liquid spraying surface f around the second rotation axis A2 is equal to the rotation angle in the second scale surface 2312, so as to correspond the included angle β to the scale 2313, and facilitate the identification of the included angle β between the liquid spraying surface f and the tangent t.

[0037] In addition, in the previous embodiment, referring to Figure 4 and Figure 5 , since the second connecting member 225 is fixed relative to the support arm 23, the included angle β between the liquid spraying surface f and the tangent t cannot be adjusted, and only the included angle α between the liquid spraying axis m of the nozzle 21 and the diameter d can be adjusted. In the embodiment, referring to Figure 10 and Figure 11 , since the first connecting member 221 and the second connecting member 225 are slidably connected through the first sliding block part 223 and the first arc-shaped guide rail 229, and the second connecting member 225 and the support arm 23 are slidably connected through the second sliding block part 227 and the second arc-shaped guide rail 231, both the included angle β between the liquid spraying surface f and the tangent t and the included angle α between the liquid spraying axis m of the nozzle 21 and the diameter d can be adjusted. In turn, the spraying angle of the nozzle 21 can be flexibly adjusted to achieve the best edge cleaning effect and improve product quality. It should be noted that in Figure 4 and Figure 5 , the second connecting member 225 is only schematically connected to the support arm 23 through the screw 232, and is not used to limit the actual connection mode of the second connecting member 225 and the support arm 23.

[0038] In an embodiment of the present application, referring to Figure 4 and Figure 10 , the first arc-shaped guide rail 229 is configured to pass through a first arc-shaped hole 2291 of the second connecting member body 226. The first sliding block part 223 is arranged to pass through the first arc-shaped hole 2291, and the cross-sectional shape of the first sliding block part 223 is matched with the first arc-shaped hole 2291, and the cross section is perpendicular to the first rotation axis A1. For example, the cross-sectional shape of the first sliding block part 223 is a fan ring shape matched with the first arc-shaped hole 2291.

[0039] The first connecting member 221 further comprises a first fastener 224 detachably connected with the first slider 223, for fixing the first slider 223 at a preset position of the first arc-shaped guide rail 229, so as to fix the angle a between the liquid spraying axis m of the nozzle 21 and the diameter d of the substrate 10 at a preset angle. For example, one end of the first slider 223 is fixedly connected with the first connecting member body 222, and the other end of the first slider 223 is threadedly connected with the first fastener 224. By adjusting the first fastener 224, the first fastener 224 clamps the first arc-shaped guide rail 229 with the first connecting member body 222, so as to fix the first slider 223 at a preset position of the first arc-shaped guide rail 229.

[0040] In the above embodiment, by configuring the first slider 223 to have a cross section matched with the first arc-shaped hole 2291, during the movement of the nozzle 21 and the first connecting member body 222 along the first arc-shaped guide rail 229 through the first slider 223, the nozzle 21 and the first connecting member 221 only rotate around the first rotation axis A1 of the first arc-shaped guide rail 229, preventing the nozzle 21 and the first connecting member body 222 from rotating around the first slider 223, so that the position of the processing liquid sprayed by the nozzle 21 to the plane where the substrate 10 is located changes when the nozzle 21 is positioned at the working position.

[0041] In an embodiment of the present application, as shown in Figure 11 The second arc-shaped guide rail 231 is configured as a second arc-shaped hole 2311 penetrating through the support arm 23. The second slider 227 is arranged to penetrate through the second arc-shaped hole 2311, and the cross section of the second slider 227 is matched with the second arc-shaped hole 2311, and the above-mentioned cross section is perpendicular to the second rotation axis A2. For example, the cross section of the second slider 227 is a fan ring shape matched with the second arc-shaped hole 2311.

[0042] Referring again to Figure 10 The second connecting member 225 further comprises a second fastener 228 detachably connected with the second slider 227, for fixing the second slider 227 at a preset position of the second arc-shaped guide rail 231, so as to fix the angle β between the liquid spraying surface f and the tangent t of the substrate 10 at a preset angle. For example, one end of the second slider 227 is fixedly connected with the second connecting member body 226, and the other end of the second slider 227 is threadedly connected with the second fastener 228. By adjusting the second fastener 228, the second fastener 228 clamps the second arc-shaped guide rail 231 with the second connecting member body 226, so as to fix the second slider 227 at a preset position of the second arc-shaped guide rail 231.

[0043] In the above embodiments, by configuring the second slider portion 227 to have a cross section that matches the second arc-shaped hole 2311, the nozzle 21, the first connecting member 221, and the second connecting member body 226 are only rotated around the second rotation axis A2 of the second arc-shaped guide rail 231 during movement of the nozzle 21, the first connecting member 221, and the second connecting member 225 along the second arc-shaped guide rail 231 through the second slider portion 227, preventing the nozzle 21, the first connecting member 221, and the second connecting member body 226 from rotating around the second slider portion 227, resulting in a change in the position of the processing liquid sprayed by the nozzle 21 to the plane on which the substrate 10 is located when the nozzle 21 is positioned at the working position.

[0044] In an embodiment of the present application, the preset center point n is configured to have a distance L from the end of the nozzle 21 on the liquid spraying axis m, where 0mm < L ≤ 20mm. In order to determine the positions of the preset center point n, the first rotation axis A1, and the second rotation axis A2.

[0045] In an embodiment of the present application, referring again to Figure 1 and Figure 6 , the processing liquid supply mechanism 20 further includes a driving assembly 24. The driving assembly 24 includes a guide rail 241, a horizontal moving portion 242, and a vertical moving portion 243. The horizontal moving portion 242 is mounted on the guide rail 241, the vertical moving portion 243 is mounted on the horizontal moving portion 242, and one end of the support arm 23 away from the nozzle 21 and the angle adjusting assembly 22 is mounted on the vertical moving portion 243. The horizontal moving portion 242 is used to drive the vertical moving portion 243 and components such as the nozzle 21 to move horizontally to adjust the edge cleaning width of the nozzle 21 on the substrate 10, and the vertical moving portion 243 is used to drive the nozzle 21 and other components to move up and down to adjust the vertical distance between the nozzle 21 and the substrate 10.

[0046] As shown in Figure 12 , a coating device 30 according to an embodiment of the present application is disclosed. The coating device 30 includes the processing liquid supply mechanism 20 in any of the above embodiments, and further includes a carrying mechanism 31, a coating mechanism 32, and a control portion 33.

[0047] The carrying mechanism 31 is used to carry and drive the substrate 10 to rotate. The coating mechanism 32 is used to spray coating liquid to the substrate 10. The control portion 33 is in communication connection with the processing liquid supply mechanism 20, the carrying mechanism 31, and the coating mechanism 32, and the control portion 33 is used to control the carrying mechanism 31 to carry and drive the substrate 10 to rotate, and control the coating mechanism 32 to spray coating liquid to the center of the substrate 10 during coating processing of the substrate 10, and after the coating processing of the substrate 10 is completed, control the processing liquid supply mechanism 20 to move the nozzle 21 from the standby position to the working position, and control the nozzle 21 to spray cleaning liquid to the preset cleaning point to clean the edge of the substrate 10.

[0048] In the above embodiment, the coating apparatus 30 is equipped with a treatment liquid supply mechanism 20, so that after the coating mechanism 32 completes the coating process on the substrate 10, the treatment liquid supply mechanism 20 can perform an edge cleaning process on the substrate 10, thereby removing the photoresist residue accumulated on the edge of the substrate 10 during the coating process. In addition, the treatment liquid supply mechanism 20 is equipped with an angle adjustment component 22 for adjusting the spray angle of the nozzle 21 to prevent the cleaning liquid droplets sprayed by the nozzle 21 from splashing inward on the surface of the substrate 10 during the edge cleaning process, thereby causing surface defects on the substrate 10.

[0049] In addition, since the nozzle 21 rotates around the preset center point n, and the preset center point n is located on the liquid spraying axis m, and when the nozzle is positioned at the working position, the preset center point n is configured to overlap with the preset cleaning point. Therefore, before and after the angle of the nozzle 21 is adjusted, as long as the working position of the nozzle 21 remains unchanged, the preset cleaning point, i.e., the position of the cleaning liquid sprayed by the nozzle 21 onto the plane where the substrate 10 is located, does not change, thereby improving the position accuracy of the cleaning of the edge of the substrate 10. Moreover, for this technical solution, after the angle of the nozzle 21 is adjusted, since the position of the cleaning liquid sprayed by the nozzle 21 onto the plane where the substrate 10 is located does not change, as long as the working position of the nozzle 21 remains unchanged, it is no longer necessary to move the nozzle 21 horizontally and vertically to calibrate the position of the cleaning liquid sprayed by the nozzle 21 onto the plane where the substrate 10 is located, thereby simplifying the operating steps of the processing liquid supply mechanism 20 and improving the use efficiency of the coating device 30.

[0050] It should be noted that the above embodiments can be freely combined as needed. The above are only preferred implementations of the present application. For those skilled in the art, without departing from the principles of the present application, several improvements and modifications can be made, and these improvements and modifications should also be considered as the scope of protection of the present application.

Claims

1. A treatment liquid supply mechanism, characterized in that: include: a nozzle for spraying the processing liquid onto a predetermined spraying point on the surface of the substrate; An angle adjustment assembly is used to install the nozzle, and the angle adjustment assembly is constructed to rotate the nozzle with a preset center point as the rotation center to adjust the angle between the spray axis of the nozzle and the surface of the substrate, wherein the preset center point is located on the spray axis, and when the nozzle is positioned at the working position, the preset center point is configured to overlap with the preset injection point.

2. The processing liquid supply mechanism according to claim 1, wherein: The angle adjustment component includes: a first connecting member, comprising a first connecting member body and a first sliding portion connected to each other, wherein the first connecting member body is used to mount the nozzle; a second connecting member, provided with a first arcuate guide rail, the first arcuate guide rail having a first rotation axis, the liquid spraying axis being perpendicular to the first rotation axis, and the predetermined center point being the intersection of the liquid spraying axis and the first rotation axis, wherein the first slider portion cooperates with the first arcuate guide rail to drive the nozzle to rotate about the first rotation axis; and The supporting arm is used to support the second connecting member.

3. The processing liquid supply mechanism according to claim 2, wherein: The second connecting member includes a second connecting member body and a second sliding portion, and the first arc-shaped guide rail is provided on the second connecting member body; The support arm is provided with a second arc-shaped guide rail, the second arc-shaped guide rail has a second rotation axis, the spray axis is perpendicular to the second rotation axis, and the preset center point is the intersection of the spray axis and the second rotation axis, wherein the second slider portion cooperates with the second arc-shaped guide rail to drive the nozzle to rotate around the second rotation axis.

4. The processing liquid supply mechanism according to claim 3, wherein: The first rotation axis is non-parallel to the second rotation axis.

5. The processing liquid supply mechanism according to claim 2 or 3, characterized in that: When the nozzle is positioned at the working position, the first rotation axis is perpendicular to the diameter of the substrate passing through the predetermined center point.

6. The processing liquid supply mechanism according to claim 5, characterized in that: The first arc-shaped guide rail includes a first scale surface, the first scale surface is configured to be perpendicular to the first rotation axis, and a plurality of scales are provided on the first scale surface.

7. The processing liquid supply mechanism according to claim 3, wherein: When the nozzle is positioned at the working position, the second rotation axis coincides with the diameter of the substrate passing through the predetermined center point.

8. The processing liquid supply mechanism according to claim 7, wherein: The second arc-shaped guide rail includes a second scale surface, the second scale surface is configured to be perpendicular to the second rotation axis, and a plurality of scales are provided on the second scale surface.

9. The processing liquid supply mechanism according to claim 3, wherein: The first arc-shaped guide rail is configured as a first arc-shaped hole penetrating through the second connector body; The first sliding block is disposed through the first arc-shaped hole, the first sliding block matches the cross-sectional shape of the first arc-shaped hole, and the cross-sectional shape is perpendicular to the first rotation axis; The first connecting member further includes a first fastener, which is detachably connected to the first sliding block portion and is used to fix the first sliding block portion at a preset position of the first arc-shaped guide rail.

10. The processing liquid supply mechanism according to claim 3, wherein: The second arc-shaped guide rail is configured to penetrate a second arc-shaped hole of the support arm; The second sliding block is provided through the second arc-shaped hole, the second sliding block matches the cross-sectional shape of the second arc-shaped hole, and the cross-sectional shape is perpendicular to the second rotation axis; The second connecting member further includes a second fastener, which is detachably connected to the second sliding block portion and is used to fix the second sliding block portion at a preset position of the second arc-shaped guide rail.

11. The processing liquid supply mechanism according to claim 1, wherein: The preset center point is configured to be at a distance L from the end of the nozzle on the liquid spraying axis, wherein 0 mm < L ≤ 20 mm.

12. A coating device, characterized in that: The processing liquid supply mechanism according to any one of claims 1 to 11 further comprises: A carrying mechanism, used for carrying and driving the substrate to rotate; a coating mechanism, for spraying a coating liquid onto the substrate; A control unit is communicatively connected with the processing liquid supply mechanism, the carrying mechanism and the coating mechanism. The control unit is used to control the carrying mechanism to carry and drive the substrate to rotate, and control the coating mechanism to spray coating liquid toward the center of the substrate during the coating process of the substrate. After the coating process of the substrate is completed, the processing liquid supply mechanism is controlled to move the nozzle from the standby position to the working position, and the nozzle is controlled to spray cleaning liquid toward the preset injection point to clean the edge of the substrate.

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