Focus drift compensation method, laser processing equipment, controller and program product

Abstract

The invention provides a focus drift compensation method, laser processing equipment, a controller and a program product, and relates to the technical field of laser processing. The method comprises the following steps: determining a focus drift temperature compensation factor of the drift condition of a laser focus of laser processing equipment along with the change of processing time; determining a focus drift time compensation factor of the drift condition of the laser focus along with the power change of the laser processing equipment; determining a focus drift compensation value of the laser processing equipment according to the focus drift temperature compensation factor and the focus drift time compensation factor; and adjusting the position of a target optical device in the laser processing equipment on the optical axis according to the focus drift compensation value. A controller in the laser processing equipment is used for determining a focus drift compensation value of the laser processing equipment according to the determined focus drift temperature compensation factor and focus drift time compensation factor; and controlling a focusing device to adjust the position of the target optical device on the optical axis according to the focus drift compensation value.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of laser processing equipment, in particular to a focal point drift compensation method, a laser processing equipment, a controller and a program product. BACKGROUND

[0002] At present, high-power fiber output type continuous laser processing applications have been very popular. Taking laser cutting as an example, the market of tens of thousands of watts of laser processing is also growing rapidly. As the intermediate core medium between the output end of the laser and the processing end, the stability of the internal optical system of the laser processing head is crucial to the processing.

[0003] Affected by the thermal lens effect, the internal optical system of the laser processing head is heated due to the continuous absorption of beam energy in the beam transmission process, causing the real-time change of the refractive index of the lens, and ultimately leading to the real-time change of the focal point position of the laser processing head on the optical axis. The consequence is that the processing parameters change, the processing stability deteriorates, and even the processing quality and performance deteriorate.

[0004] In order to compensate for the drift of the focal point position, the existing focal point drift compensation methods usually include: fitting compensation by detecting the power and time change curve of the laser processing head through a focal point drift detection instrument, detecting the real-time spot size for compensation by setting a beam splitting spot detection module in the focusing beam section, adjusting the focal point position in real time to achieve quantitative width compensation by detecting the processing width of the visual detection spot, and compensating by monitoring the temperature of each optical lens through temperature sensing and cooperating with the focal point drift temperature coefficient of the lens. Due to the low cost, real-time temperature measurement, etc. of the focal point drift compensation method of monitoring the temperature of the lens in real time, this method is widely used. Based on the detection of multiple groups of temperature and stable focal point drift data, the focal point drift temperature compensation coefficient of each optical lens of the laser processing head is obtained, and the real-time focal point drift is determined by cooperating with the real-time temperature difference.

[0005] In actual application scenarios, the focal point drift temperature compensation coefficient of each optical lens of the laser processing head is a constant, which has good adaptability to focal point drift compensation under gradual temperature change. However, due to the data lag of the temperature sensing detection method itself and the precision under the jump type change of temperature rise, the temperature data acquisition is not timely, and the temperature jump under the sharp change of focal point drift has a double impact, which will cause the existing temperature focal point drift compensation method to be unable to effectively compensate for the focal point drift, so that the processing technology in the initial period of light emission is unstable or even invalid, which may cause resource waste and adversely affect the processing precision, and cannot meet the actual processing demand. SUMMARY

[0006] Therefore, the embodiments of the present application aim to provide a focus drift compensation method, a laser processing device, a controller and a program product to improve the poor focus drift compensation effect in the prior art.

[0007] To solve the above problems, in a first aspect, the embodiments of the present application provide a focus drift compensation method applied to a laser processing device, the method comprising: determining a focus drift temperature compensation factor of a laser focus of the laser processing device varying with processing time; determining a focus drift time compensation factor of the laser focus varying with power of the laser processing device; determining a focus drift compensation value of the laser processing device according to the focus drift temperature compensation factor and the focus drift time compensation factor; adjusting a position of a target optical device on an optical axis in the laser processing device according to the focus drift compensation value.

[0008] In the above implementation process, considering the correlation between the changes of time, temperature and power in the laser processing process, the focus drift temperature compensation factor of the laser focus varying with the processing time and the focus drift time compensation factor of the laser focus varying with the power of the laser processing device are determined first to determine the correlation between the focus drift and multiple influencing parameters such as time, temperature and power, so as to calculate the focus drift compensation value for compensating the focus drift of the laser processing device according to the focus drift temperature compensation factor and the focus drift time compensation factor. Since the actual position of the laser focus is affected by the target optical device corresponding to the focusing in the laser processing device, the position of the target optical device on the optical axis can be adjusted according to the focus drift compensation value, thereby effectively compensating and calibrating the focus drift caused by the laser focus. The method is applicable to the initial light-emitting time period with large temperature and power changes in the laser processing process, and is also applicable to other time periods. The effect of compensating the focus drift is effectively optimized, thereby improving the precision of the laser processing, reducing the resource waste during processing, and meeting the laser processing requirements in various processing scenarios.

[0009] Optionally, the determination of the focus drift temperature compensation factor of the laser focus of the laser processing device varying with the processing time comprises: determining a focus drift temperature coefficient of each optical device in the laser processing device; determining a starting temperature before light emission of each optical device and a real-time temperature at a light emission time; determine a focal point shift temperature compensation coefficient according to the focal point shift temperature coefficients, the initial temperatures and the real-time temperatures; determine the focal point shift temperature compensation factor based on the focal point shift temperature compensation coefficient and a first influence exponential function.

[0010] In the implementation process, since each optical device in the laser device is affected by temperature change, which affects the focal point position, the focal point shift temperature coefficient of each optical device can be determined first. The focal point shift temperature compensation coefficient of the multiple optical devices affecting the focal point shift can be determined according to the initial temperature before light emission of each optical device and the real-time temperature at the light emission time, combined with the focal point shift temperature coefficient. Considering the time change and temperature change, the focal point shift temperature compensation factor varying with the processing time can be determined by combining the focal point shift temperature compensation coefficient and the first influence exponential function reflecting the change. The corresponding focal point shift temperature compensation factor can be calculated by combining the actual focal point shift temperature coefficient of the optical device and the influence exponential function, which improves the effectiveness of the focal point shift temperature compensation factor, thereby improving the effectiveness of the focal point shift compensation value calculated based on the focal point shift temperature compensation factor, to optimize the effect of compensating and calibrating the focal point shift of the laser focal point.

[0011] Optionally, the determining the focal point shift temperature coefficient of each optical device in the laser processing device comprises: determining multiple test power segments according to the available power range of the laser processing device; performing temperature-focal point shift change test on the laser processing device based on each test power segment to obtain temperature data and focal point shift data; determining a stable focal point shift value based on the temperature data and the focal point shift data; determining the focal point shift temperature coefficient of each optical device in the laser processing device based on the stable focal point shift value.

[0012] In the implementation process, since each optical device is different, in order to obtain the focal point shift temperature coefficient of the optical device with higher effectiveness, multiple test power segments can be determined according to the available power range of the laser processing device, so as to perform temperature and focal point shift change test on the laser processing device based on each test power segment to obtain corresponding temperature data and focal point shift data. The stable focal point shift value in the stable condition can be determined by calculating the test obtained temperature data and focal point shift data, and the optimal focal point shift temperature coefficient of each optical device can be determined according to the stable focal point shift value. The focal point shift temperature coefficient can be effectively calibrated according to multiple sets of data under multiple test power segments, which improves the effectiveness of the focal point shift temperature coefficient.

[0013] Optionally, the focal point drift temperature compensation factor comprises: ; ; wherein, is the focal point drift temperature compensation factor, is the focal point drift temperature coefficient, , , is the focal point drift temperature coefficient of the first optical device, , , , is the initial temperature before the light of the first optical device, is the light-out time of the laser processing equipment, , , , is the real-time temperature of the first optical device at the light-out time , is the first influence exponential function, is the thermal correlation influence factor.

[0014] In the above implementation process, the corresponding focal point drift temperature compensation coefficient can be calculated according to the temperature change of the plurality of optical devices in the laser processing equipment and the focal point drift temperature coefficient, and the first influence exponential function can be determined according to the thermal correlation influence factor, time and natural exponential function, so as to determine the focal point drift temperature compensation factor by combining the focal point drift temperature compensation coefficient and the first influence exponential function.

[0015] Optionally, the determination method of the thermal correlation influence factor comprises the following steps: determining the first focal point drift change data under each test power segment according to the focal point drift temperature coefficient; determining the first focal point drift difference value according to the first focal point drift change data and the real-time focal point drift data of the test power segment; obtaining the thermal correlation influence factor according to the first focal point drift difference value and the focal point drift jump time of the pre-light-out stage of the laser processing equipment.

[0016] ​In the implementation process, the thermal correlation influence factor can be calibrated based on the determined focal point drift temperature coefficient. According to the focal point drift temperature coefficient, the first focal point drift change data under each test power section can be determined, and the corresponding first focal point drift difference value can be calculated in combination with the actual real-time focal point drift data of the test power section. In order to target the temperature and focal point drift jump of the pre-emission stage of the light emission, the corresponding thermal correlation influence factor can be determined according to the determined first focal point drift difference value and the focal point drift jump time of the pre-emission stage of the light emission of the laser processing equipment, thereby effectively improving the effectiveness of the focal point drift temperature compensation factor for focal point position compensation of the pre-emission stage of the light emission.

[0017] Optionally, the focal point drift time compensation factor of the laser focal point is determined by: determining an amplitude influence factor and a change speed influence factor affecting the drift of the laser focal point; determining an emission power in a usable power range of the laser processing equipment and a calibration power associated with the amplitude influence factor; determining the focal point drift time compensation factor based on the amplitude influence factor, the change speed influence factor, the emission power, the calibration power, and a second influence exponential function.

[0018] In the implementation process, since the power of the laser processing equipment will change greatly in the pre-emission stage, thereby affecting the drift of the laser focal point, the amplitude influence factor and the change speed influence factor affecting the drift of the laser focal point can be determined, and the emission power in the usable power range of the laser processing equipment and the calibration power associated with the amplitude influence factor can be determined. Therefore, the focal point drift time compensation factor varying with the power of the laser processing equipment can be determined based on the amplitude influence factor, the change speed influence factor, the emission power, the calibration power, and the second influence exponential function capable of reflecting the change. The focal point drift time compensation factor can be calculated according to the actual power in combination with multiple influence factors and influence exponential functions, thereby improving the effectiveness of the focal point drift time compensation factor, and improving the effectiveness of the focal point drift compensation value calculated based on the focal point drift time compensation factor, so as to optimize the compensation and calibration effect of the focal point drift of the laser focal point.

[0019] Optionally, the focal point drift time compensation factor includes: ; wherein, is the focal point drift time compensation factor, is the amplitude influence factor, is the change speed influence factor, for the light output power, for the calibration power, for the second influence exponential function.

[0020] In the implementation process, the amplitude of the focus drift condition can be determined according to the actual light output power of the laser processing equipment, in combination with the calibration power and the amplitude influence factor associated with the calibration power, and the second influence exponential function can be determined according to the change speed influence factor, the time and the natural exponential function, so as to determine the focus drift time compensation factor in combination with the amplitude of the focus drift condition and the second influence exponential function.

[0021] Optionally, the determination of the amplitude influence factor and the change speed influence factor affecting the drift condition of the laser focus includes: determining a plurality of test power segments according to the available power range of the laser processing equipment; determining second focus drift change data under each test power segment according to the focus drift temperature coefficients of the plurality of optical devices in the laser processing equipment; determining a second focus drift difference value according to the second focus drift change data in combination with real-time focus drift data of the test power segment; determining the amplitude influence factor and the change speed influence factor affecting the drift condition of the laser focus according to the second focus drift difference value and the focus drift jump time in the pre-stage of the light output of the laser processing equipment.

[0022] In the implementation process, due to the influence of power change, in order to obtain the amplitude influence factor and the change speed influence factor with higher effectiveness, a plurality of test power segments can be determined according to the available power range of the laser processing equipment, and on the basis of the determined focus drift temperature coefficients of the optical devices, the second focus drift change data under each test power segment can be determined, and the corresponding second focus drift difference value can be calculated in combination with the real-time focus drift data of the test power segment. In order to target the power in the pre-stage of the light output and the jump condition of the focus drift, the amplitude influence factor and the change speed influence factor affecting the drift condition of the laser focus can be determined according to the determined second focus drift difference value and the focus jump time in the pre-stage of the light output of the laser processing equipment, thereby effectively improving the effectiveness of the focus drift time compensation factor for the focus position compensation in the pre-stage of the light output.

[0023] Optionally, the determination of the focus drift compensation value of the laser processing equipment according to the focus drift temperature compensation factor and the focus drift time compensation factor includes: determining a hybrid focus drift compensation algorithm in combination with the determined focus drift scaling coefficient, the time influence factor, the focus drift temperature compensation factor and the focus drift time compensation factor; The current working parameter of the laser processing equipment is brought into the mixed focal point drift compensation algorithm for calculation to obtain the focal point drift compensation value.

[0024] In the implementation process, the mixed focal point drift compensation algorithm can be determined in combination with the determined focal point drift scaling coefficient, the time influence factor, the focal point drift temperature compensation factor and the focal point drift time compensation factor, so that the working parameter of the laser processing equipment at the current working time is brought into the mixed focal point drift compensation algorithm for calculation to obtain the corresponding focal point drift compensation value. The mixed focal point drift compensation algorithm can be used to calculate the focal point drift from the aspects of temperature change, time change, power change and the like, thereby improving the effectiveness and accuracy of the focal point drift compensation value and improving the effectiveness of position adjustment of the target optical device based on the focal point drift compensation value, so as to optimize the compensation effect of the focal point drift of the laser processing equipment.

[0025] Optionally, the determination of the focal point drift scaling coefficient comprises the following steps: determining the detection error of the focal point drift analysis equipment; determining the focal point drift scaling coefficient according to the detection error.

[0026] In the implementation process, the detection error of the focal point drift analysis equipment is considered, so that the actual detection error of the focal point drift analysis equipment can be determined according to the analysis accuracy of the focal point drift analysis equipment, and the corresponding focal point drift scaling coefficient is determined according to the detection error to compensate for the detection error, thereby further improving the effectiveness of the focal point drift compensation value.

[0027] Optionally, the determination of the time influence factor comprises the following steps: determining a mixed focal point drift value of the laser processing equipment in the pre-light emission stage according to the focal point drift temperature compensation factor and the focal point drift time compensation factor; determining a mixed focal point drift difference value according to the mixed focal point drift value and the measured focal point drift value in the pre-light emission stage; determining the time influence factor according to the mixed focal point drift difference value.

[0028] In the implementation process, the difference caused by time to different influence factors during mixed compensation is considered, so that the mixed focal point drift value of the laser processing equipment in the pre-light emission stage can be determined according to the focal point drift temperature compensation factor and the focal point drift time compensation factor, the mixed focal point drift difference value can be determined through the comparison between the mixed focal point drift value and the measured focal point drift value, and the appropriate time influence factor can be determined according to the mixed focal point drift difference value. The time influence factor can be effectively calibrated according to the actual mixed focal point drift, thereby further improving the effectiveness of the mixed focal point drift compensation algorithm.

[0029] Optionally, the mixed focus drift compensation algorithm comprises: wherein, is the focus drift scaling factor, is the time influence factor, is the focus drift temperature compensation factor, is the focus drift temperature compensation factor, is the light-out time of the laser processing device, is a third influence exponential function.

[0030] In the implementation process, the third influence exponential function can be determined according to the time influence factor, the time and the natural exponential function, so that the corresponding mixed focus drift compensation algorithm is obtained by combining the third influence exponential function, the focus drift temperature compensation factor, the focus drift temperature compensation factor and the focus drift scaling factor.

[0031] Optionally, the method further comprises: determining a light-out time period of the laser processing device, and a first light-out time period before the light-out time period and a second light-out time period after the light-out time period; based on the focus drift compensation value, determining a first type of focus drift value at the end of the first light-out time period; after the end of the first light-out time period, adjusting the position of the target optical device on the optical axis based on the first type of focus drift value; based on the first type of focus drift value and a light-out influence factor, determining a second type of focus drift value at the end of the light-out time period; after the end of the light-out time period, adjusting the position of the target optical device on the optical axis based on the second type of focus drift value; based on the second type of focus drift value, determining a light-out equivalent time of the second light-out time period; based on the light-out equivalent time and the focus drift compensation value, determining a third type of focus drift value at the end of the second light-out time period; wherein the third type of focus drift value is used to adjust the position of the target optical device on the optical axis based on the third type of focus drift value after the end of the second light-out time period.

[0032] ​In the implementation process, considering that in an actual laser processing scene, the laser processing device can exist in a frequently switching light working condition, in order to effectively compensate for the focal point drift in the frequently switching light working condition, so that the laser processing device can normally enter the next working stage, the light-off time period of the laser processing device, and the first light-on time period before the light-off time period and the second light-on time period after the light-off time period can be determined first, so as to divide the multiple time periods in the frequently switching light working condition. For the first light-on time period, a first type of focal point drift value at the end of the first light-on time period can be determined according to the calculated focal point drift compensation value, so that after the end of the first light-on time period, the position of the target optical device on the optical axis is adjusted based on the first type of focal point drift value, thereby effectively compensating for the focal point drift in the first light-on time period. For the light-off time period, a second type of focal point drift value at the end of the light-off time period can be determined according to the first type of focal point drift value and a light-off influence factor, so that after the end of the light-off time period, the position of the target optical device on the optical axis is adjusted based on the second type of focal point drift value, thereby effectively compensating for the focal point drift in the light-off time period. For the second light-on time period, the light-on equivalent time of the second light-on time period can be determined according to the second type of focal point drift value, and then a third type of focal point drift value at the end of the second light-on time period can be determined according to the light-on equivalent time and the focal point drift compensation value, so that after the end of the second light-on time period, the position of the target optical device on the optical axis is adjusted based on the third type of focal point drift value, thereby effectively compensating for the focal point drift in the second light-on time period. The focal point drift values at the end of each adjacent time period in the frequently switching light working condition can be associated and calculated, thereby optimizing the focal point drift compensation effect between each time period.

[0033] In a second aspect, the embodiments of the present application also provide a laser processing device, which comprises: a plurality of optical devices, a controller and a focusing device; The controller is connected with the focusing device, and the plurality of optical devices are distributed along the optical axis, and the focusing device is connected with a target optical device in the plurality of optical devices. The controller is configured to: determine a focal point drift temperature compensation factor of a drift condition of a laser focal point of the laser processing device varying with processing time; determine a focal point drift time compensation factor of the drift condition of the laser focal point varying with power of the laser processing device; determine a focal point drift compensation value of the laser processing device according to the focal point drift temperature compensation factor and the focal point drift time compensation factor; control the focusing device to adjust the position of the target optical device on the optical axis according to the focal point drift compensation value.

[0034] In the implementation process, the controller determines a focus drift temperature compensation factor of the laser focus point drift condition varying with the processing time and a focus drift time compensation factor of the laser focus point drift condition varying with the power of the laser processing device, determines the correlation between the focus drift condition and the time, temperature, power and other influencing parameters, calculates the focus drift compensation value for compensating the focus drift condition of the laser processing device according to the focus drift temperature compensation factor and the focus drift time compensation factor, and controls the focusing device to adjust the position of the target optical device on the optical axis, thereby effectively compensating and calibrating the focus drift condition caused by the laser focus point.

[0035] In a third aspect, the embodiments of the present application further provide a controller, which comprises a memory and a processor, and the memory stores program instructions, and the processor executes the program instructions to perform the steps in the focus drift compensation method of any one of the first aspect.

[0036] In a fourth aspect, the embodiments of the present application further provide a computer program product, which comprises computer programs / instructions, and the computer programs / instructions are executed by a processor to implement the steps in the focus drift compensation method of any one of the first aspect.

[0037] In summary, the embodiments of the present application provide a focus drift compensation method, a laser processing device, a controller and a program product, which can adjust the position of the target optical device on the optical axis by using the mixed compensation calculated focus drift compensation value, thereby effectively compensating and calibrating the focus drift condition caused by the laser focus point, which is suitable for the light emission initial time period with large temperature and power variation in the laser processing process, and is also suitable for other time periods, effectively optimizes the compensation effect of the focus drift condition, thereby improving the precision of the laser processing, reducing the resource waste during processing, and meeting the laser processing requirements in various processing scenarios. BRIEF DESCRIPTION OF DRAWINGS

[0038] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments of the present application. It should be understood that the following drawings only show some embodiments of the present application, and therefore should not be regarded as a limitation on the scope, and for those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.

[0039] Figure 1 a flowchart of a first focus drift compensation method provided by the embodiments of the present application; Figure 2 a detailed flowchart of step S100 provided by the embodiments of the present application; Figure 3 A detailed flowchart of step S110 provided for an embodiment of the present application is shown in the following; Figure 4 A flowchart of a second focus drift compensation method provided for an embodiment of the present application is shown in the following; Figure 5 A detailed flowchart of step S200 provided for an embodiment of the present application is shown in the following; Figure 6 A detailed flowchart of step S210 provided for an embodiment of the present application is shown in the following; Figure 7 A detailed flowchart of step S300 provided for an embodiment of the present application is shown in the following; Figure 8 A flowchart of a third focus drift compensation method provided for an embodiment of the present application is shown in the following; Figure 9 A flowchart of a fourth focus drift compensation method provided for an embodiment of the present application is shown in the following; Figure 10 A flowchart of a fifth focus drift compensation method provided for an embodiment of the present application is shown in the following; Figure 11 A structural schematic diagram of a laser processing device provided for an embodiment of the present application is shown in the following.

[0040] Icon: 610-optical device; 620-controller; 630-focusing device; Z-optical axis. DETAILED DESCRIPTION

[0041] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0042] At present, due to the data hysteresis of the temperature sensing detection method itself, and the precision under the step change of temperature rise, etc., the temperature data acquisition is not timely, and the temperature jump under the sharp change of focus drift double influence, which will lead to the existing temperature focus drift compensation method cannot effectively compensate the focus drift, so that the processing technology in the initial time period of light emission is unstable or even invalid, which may cause resource waste and adversely affect the processing precision, and cannot meet the actual processing demand.

[0043] To solve the above problems, the embodiment of the present application provides a focal point drift compensation method, a laser processing device, a controller and a program product, which can mix and compensate the calculated focal point drift compensation value, adjust the position of the target optical device on the optical axis, effectively compensate and calibrate the focal point drift caused by the laser focal point, and is suitable for the light emission initial time period with large temperature and power changes in the laser processing process, and is also suitable for other time periods, effectively optimizes the compensation effect of the focal point drift, thereby improving the precision of laser processing, reducing the waste of resources during processing, and meeting the laser processing needs in various processing scenes.

[0044] The focal point drift compensation method provided by the embodiment of the present application is applied to a controller, the controller is arranged in a laser processing device, the laser processing device can be a corresponding laser processing head and the like, and the controller can be a control chip and the like having a memory and a processor to transmit and process data.

[0045] Please refer to Figure 1 , Figure 1 The flowchart of the first focal point drift compensation method provided by the embodiment of the present application can include steps S100-S400.

[0046] Step S100, determining a focal point drift temperature compensation factor of the drift of the laser focal point of the laser processing device with the change of the processing time.

[0047] Among them, considering the change of the time-focal point drift in the laser processing process, the focal point drift temperature compensation factor of the drift of the laser focal point with the change of the processing time can be determined first.

[0048] Optionally, considering the influence of the temperature on each optical device in the laser processing device, the corresponding focal point drift temperature compensation factor can be calculated according to the focal point drift temperature coefficient (or called thermal focal length drift coefficient, that is, the offset of the focal point position of the optical device with the change of the temperature, usually expressed as the focal length change per degree Celsius, such as μm / °C or mm / °C) of the optical device.

[0049] Step S200, determining a focal point drift time compensation factor of the drift of the laser focal point with the change of the power of the laser processing device.

[0050] Among them, considering the change of the power-focal point drift in the laser processing process, the focal point drift time compensation factor with the change of the power of the laser processing device can be determined first, so as to determine the correlation between the focal point drift and the time, temperature, power and the like based on the focal point drift temperature compensation factor and the focal point drift time compensation factor.

[0051] Optionally, considering that there is a positive linkage between the power and the focus drift, for example, the greater the power, the greater the distance of the focus drift, therefore, the focus drift time compensation factor can be calculated according to the actual change of the power.

[0052] In step S300, the focus drift compensation value of the laser processing device is determined according to the focus drift temperature compensation factor and the focus drift time compensation factor.

[0053] In step S300, the focus drift compensation value of the laser processing device is determined according to the focus drift temperature compensation factor and the focus drift time compensation factor.

[0054] Optionally, the focus drift compensation value can be the distance value of moving the drifted laser focus to the ideal focus position.

[0055] In step S400, the position of the target optical device on the optical axis of the laser processing device is adjusted according to the focus drift compensation value.

[0056] In step S400, the position of the target optical device on the optical axis of the laser processing device is adjusted according to the focus drift compensation value.

[0057] Optionally, the target optical device can be a device in the laser processing device that adjusts the position, such as a collimating mirror. The direction (e.g. moving towards the light outlet or moving in the opposite direction of the light outlet) and distance of the target optical device that need to be moved can be determined based on the focus drift compensation value, so as to realize the position adjustment and realize the position adjustment of the laser focus.

[0058] In Figure 1 In the embodiment shown in the embodiment, the focus drift compensation method provided is suitable for the initial light emitting period of the laser processing process with large temperature and power changes, and is also suitable for other time periods, effectively optimizing the compensation effect of the focus drift, thereby improving the precision of the laser processing, reducing the resource waste during processing, and meeting the laser processing requirements in various processing scenarios.

[0059] Optionally, please refer to Figure 2 , Figure 2 A detailed flowchart of step S100 provided by the embodiment of the present application is provided, and step S100 can include steps S110-S140.

[0060] Step S110, determine the focal point drift temperature coefficient of each optical device in the laser processing equipment.

[0061] Wherein, since each optical device in the laser processing equipment will be affected by temperature change, thereby affecting the focal point position, therefore, the focal point drift temperature coefficient of each optical device can be determined first.

[0062] Step S120, determine the starting temperature before each optical device emits light, and the real-time temperature under the light-emitting time.

[0063] Wherein, in order to determine the influence of temperature change on focal point drift, the starting temperature before each optical device emits light, and the real-time temperature under the light-emitting time can be collected respectively.

[0064] It should be noted that in the laser processing equipment, a corresponding temperature sensor can be set for each optical device, and the temperature sensor can be set on the side of the optical device to reduce the influence on the normal use of the optical device. The temperature detector can detect the temperature of the center area of the lens of the optical device, and the detection area range is 0.2mm-D / 2 diameter, wherein D is the effective clear aperture of the detected optical device. The temperature detector can be a single-pixel sensor or a multi-pixel area sensor with adjustable emissivity, which can improve the accuracy and effectiveness of the obtained starting temperature and real-time temperature.

[0065] Step S130, according to the plurality of focal point drift temperature coefficients, the plurality of starting temperatures and the plurality of real-time temperatures, determine the focal point drift temperature compensation coefficient.

[0066] Wherein, according to the starting temperature before each optical device emits light, and the real-time temperature under the light-emitting time, combined with the focal point drift temperature coefficient, the focal point drift temperature compensation coefficient of the plurality of optical devices affecting the focal point drift can be determined.

[0067] Step S140, determine the focal point drift temperature compensation factor based on the focal point drift temperature compensation coefficient and the first influence exponential function.

[0068] Wherein, considering the time change and temperature change, the focal point drift temperature compensation factor changing with the processing time can be determined by combining the focal point drift temperature compensation coefficient and the first influence exponential function which can reflect the change.

[0069] In Figure 2In the embodiment shown, the corresponding focal point drift temperature compensation factor can be calculated by combining the actual focal point drift temperature coefficient time and the influence index function, which improves the effectiveness of the focal point drift temperature compensation factor, thereby improving the effectiveness of the focal point drift compensation value calculated based on the focal point drift temperature compensation factor, to optimize the effect of compensating and calibrating the focal point drift of the laser focal point.

[0070] Optionally, referring to Figure 3 , Figure 3 A detailed flowchart of step S110 provided by the embodiment of the application is shown, and step S110 can include steps S111-S114.

[0071] In step S111, a plurality of test power segments are determined according to the available power range of the laser processing equipment.

[0072] Since each optical device is different, in order to obtain a focal point drift temperature coefficient of an optical device with high effectiveness, a plurality of test power segments can be determined according to the available power range of the laser processing equipment.

[0073] Optionally, the highest application power of the laser processing equipment The corresponding available power range [0, ] can be determined, which is divided into j test power segments, i.e., [1 / j, 2 / j,..., 1] , and the number of data can be increased by increasing the number of test power segments to improve the effectiveness of calculation and verification based on the data, thereby improving the effectiveness of the finally obtained focal point drift temperature coefficient, for example, j> 2. and j≥2 , For the number of optical devices in the optical system of the laser processing equipment, for example, when the optical devices include a collimating mirror, a focusing mirror, and a protective mirror, i=3.

[0074] In step S112, temperature-focal point drift change tests are performed on the laser processing equipment based on each test power segment to obtain temperature data and focal point drift data.

[0075] In step S112, temperature-focal point drift change tests are performed on the laser processing equipment based on each test power segment to obtain temperature data and focal point drift data.

[0076] Optionally, for each of the j test power segments, the temperature and focal point drift of the light output of each optical device inside the laser processing device is tested, and the unstable light output early stage, such as the temperature change data and the synchronous focal point drift data in the seconds before the light output and during the light output, is recorded until the change of the focal point drift data tends to be stable, and then the light output is stopped.

[0077] Optionally, the basic cooling temperature of each optical device after the last light output is ended can also be calculated as the basis at the beginning of the next light output.

[0078] Step S113, based on the temperature data and the focal point drift data, the stable focal point drift value is determined.

[0079] The stable focal point drift value in the stable state can be determined according to the test obtained temperature data and focal point drift data.

[0080] Optionally, the average temperature of each optical device in the unstable light output early stage, such as the seconds before the light output, can be calculated as the starting temperature of the corresponding test power segment 、 、...、 , the average temperature of each optical device is sampled for several seconds after the light output, and the average temperature is taken as the stable temperature 、 、...、 , the 、 、...、 , and 、 、...、 , and is taken as the corresponding temperature data, and the average value is taken as the stable focal point drift value of the optical system composed of multiple optical devices in the stable state based on the focal point drift data of the same time period sampled above .

[0081] Step S114, based on the stable focal point drift value, the focal point drift temperature coefficient of each optical device in the laser processing device is determined.

[0082] The optimal focal point drift temperature coefficient of each optical device can be determined according to the stable focal point drift value.

[0083] Optionally, based on the temperature data and the stable focal point drift value in the multiple test power segments, the focal point drift temperature coefficient of the multiple optical devices can be calculated by the following formula, that is 、 、...、 : ; wherein the above total j equations, total combinations of ways to solve , ,..., values can be solved based on various combinations of ways to solve , ,..., values to verify all equations, to calculate the corresponding verification of the focal shift value , compared with the original , according to the minimum principle, the optimal solution standard, obtained , ,..., , as the corresponding focal shift temperature coefficient of each optical device.

[0084] Optionally, the focal shift temperature coefficient can be in the range of [-1, 0], the positive and negative values of the focal shift temperature coefficient of each optical device are related to the material properties of its lens, which is specifically affected by the change of the refractive index of the material with temperature and the thermal expansion coefficient. If the two ultimately result in the shortening of the focal length of the optical device with the increase of temperature, the focal shift temperature coefficient is negative, and vice versa. For quartz material, the thermal expansion effect is very small, mainly affected by the change of the refractive index with temperature, and ultimately its focal length is shortened with the increase of temperature; while the lens temperature rise is affected by the material itself and the absorption rate of the coating layer, the greater the absorption, the higher the temperature rise; the proximity of the temperature measurement module (generally infrared non-contact measurement) to the optical device and the emissivity of the temperature measurement module ultimately affect the temperature detection, so these factors may make the focal shift temperature coefficients of different optical devices different.

[0085] In the embodiment shown in Figure 3 , the focal shift temperature coefficient can be effectively calibrated according to the multiple sets of data under multiple test power segments, improving the effectiveness of the focal shift temperature coefficient.

[0086] It should be noted that the focal shift temperature compensation factor can include: ; ; wherein, is the focal shift temperature compensation factor, is the focal shift temperature compensation coefficient, , ,..., is the first The focus drift temperature coefficient of each optical device, 、 ,..., For the 1st The starting temperature of the light front of each optical device, is the light emission time of the laser processing equipment, 、 ,..., For the 1st The optical device emits light at The real-time temperature, is the natural exponential function, is the first influence index function, is a thermally related influencing factor. A corresponding focus drift temperature compensation coefficient can be calculated based on the temperature changes of multiple optical components in the laser processing equipment and the focus drift temperature coefficient. A first influence exponential function is determined based on the thermally related influencing factor, time, and a natural exponential function. The focus drift temperature compensation factor is then determined by combining the focus drift temperature compensation coefficient and the first influence exponential function.

[0087] Optionally, see Figure 4 , Figure 4 This is a flow chart of a second focus drift compensation method provided in an embodiment of the present application. The method may further include steps S151-S153.

[0088] Step S151 : determining first focus drift variation data in each test power range according to the focus drift temperature coefficient.

[0089] The heat-related influencing factors can be calibrated based on the determined focus drift temperature coefficient, and the first focus drift variation data under each test power range can be determined based on the focus drift temperature coefficient.

[0090] Optionally, the calibrated 、 ,..., Substitute the following expression and calculate the first focus drift change data by combining the real-time temperature change values ​​of each optical device measured under the aforementioned j test power ranges: : ; in, 、 ,..., The light emission time of each optical device in the laser processing equipment under the corresponding test power range The temperature at the moment.

[0091] Step S152, according to the first focus shift change data, combining the real-time focus shift data of the test power section, to determine the first focus shift difference value.

[0092] Wherein, the first focus shift difference value can be calculated according to the actual real-time focus shift data of the test power section.

[0093] Optionally, according to the first focus shift change data The real-time focus shift data of the test power section starting from light emission is compared to calculate the corresponding first focus shift difference value.

[0094] Step S153, according to the first focus shift difference value and the focus shift jump time of the pre-stage of the laser processing equipment light emission, to obtain the thermal correlation influence factor.

[0095] Wherein, in order to consider the temperature and focus shift jump of the pre-stage of light emission, the first focus shift difference value and the focus shift jump time of the pre-stage of the laser processing equipment light emission are determined to determine the corresponding thermal correlation influence factor.

[0096] It should be noted that, considering the focus shift situation in the unstable pre-stage of light emission of the laser processing equipment, for example, there is a large jump in the first tens of seconds (for example, 60 seconds) of light emission, and gradually tends to be stable and fluctuates around 0 value with time. The phenomenon increases, the focus shift jump time can be divided into two stages, the first tens of seconds (for example, the first 20 seconds) of the pre-stage of light emission, due to the delay of temperature data, the effectiveness of focus shift compensation is low, the latter part of the pre-stage of light emission (for example, the latter 40 seconds), the focus shift situation is sudden and the compensation changes exponentially, therefore, for the pre-stage of light emission with large focus shift jump, the exponential change of focus shift situation in the latter part of the time period can be calibrated and compensated first, and the focus shift algorithm of The first focus shift difference value in the j test power section in this time period is equal to 0 or close to 0 as the optimization target, and the best As the determined thermal correlation influence factor.

[0097] In the embodiment shown in Figure 4 The effectiveness of the focus shift temperature compensation factor for focus position compensation in the pre-stage of light emission is effectively improved.

[0098] Optionally, please refer to Figure 5 , Figure 5 A detailed flowchart of step S200 provided by the embodiment of the application is shown in the embodiment, and step S200 can include steps S210-S230.

[0099] Step S210 : determining an amplitude influencing factor and a change speed influencing factor that affect the drift of the laser focus.

[0100] Among them, since the power of the laser processing equipment will produce large changes in the early stage of light emission, which will affect the drift of the laser focus, the amplitude influencing factor and the change speed influencing factor that affect the drift of the laser focus can be determined.

[0101] Step S220 , determining the output light power within the available power range of the laser processing equipment and the calibration power associated with the amplitude influence factor.

[0102] Among them, considering the influence of power on focus drift, the light output power within the available power range of the laser processing equipment and the calibration power associated with the amplitude influence factor can be determined.

[0103] Step S230 : determining a focus drift time compensation factor based on the amplitude influence factor, the change speed influence factor, the output light power, the calibration power, and the second influence index function.

[0104] Among them, the focus drift time compensation factor that changes with the power of the laser processing equipment can be determined based on the amplitude influence factor, the change speed influence factor, the light output power, the calibration power, and a second influence index function that can reflect the change situation.

[0105] It should be noted that the focus drift time compensation factor may include: ; in, is the focus drift time compensation factor, is the amplitude influence factor, is the change speed influencing factor, is the optical output power, To calibrate the power, The second influence exponential function is used to determine the amplitude of the focus drift based on the actual output power of the laser processing equipment, the calibration power, and the amplitude influence factor associated with the calibration power. Furthermore, the second influence exponential function is determined based on the change rate influence factor, time, and the natural exponential function. The focus drift time compensation factor is then determined based on the amplitude of the focus drift and the second influence exponential function.

[0106] For example, the amplitude impact factor With calibrated power There is a correlation between them. Taking the laser processing equipment’s power range as [0, Pmax] as an example, the output power P is any value within this range, and the calibration power Also a value within the available power range, calibration power After determining, the amplitude influence factor b is also determined, the focal point drift generated by the laser focal point is positively changed with the power, for example, the maximum power Pmax=20000W, the positive correlation change of the power: focal point drift value can include: 2000W:0.2mm; 4000W:0.4mm; 6000W:0.6mm; 8000W:0.8mm; 10000W:1mm; 15000W:1.5mm; 20000W:2mm.

[0107] For example, taking the calibration power =2000W, then the corresponding amplitude influence factor b=0.2, at this time the focal point drift under any output power P satisfies 0.2*P / 2000. Taking the calibration power =10000W, then the corresponding amplitude influence factor b=1, at this time the focal point drift under any power P satisfies 1*P / 10000. No matter what value the output power P takes, the focal point drift is changed with the algorithm.

[0108] In Figure 5 The embodiment shown improves the effectiveness of the focal point drift time compensation factor, thereby improving the effectiveness of the focal point drift compensation value calculated based on the focal point drift time compensation factor, to optimize the effect of compensating and calibrating the focal point drift of the laser focal point.

[0109] Optionally, please refer to Figure 6 , Figure 6 A detailed flowchart of step S210 provided by the embodiment of the application is shown, and step S210 can include steps S211-S214.

[0110] Step S211, according to the available power range of the laser processing equipment, a plurality of test power segments are determined.

[0111] Step S212, according to the focal point drift temperature coefficient of the plurality of optical devices in the laser processing equipment, the second focal point drift change data under each test power segment is determined.

[0112] Step S213, according to the second focal point drift change data, the real-time focal point drift data of the test power segment is combined to determine the second focal point drift difference value.

[0113] Wherein, due to the influence of power change, in order to obtain the amplitude influence factor and the change speed influence factor with higher effectiveness, a plurality of test power segments can be determined according to the available power range of the laser processing equipment, and on the basis of the determined focal point drift temperature coefficient of the optical device, the second focal point drift change data under each test power segment is determined, and the corresponding second focal point drift difference value is calculated by combining the actual real-time focal point drift data of the test power segment.

[0114] Optionally, the focus drift jump data of the focus drift jump situation in the first ten seconds of the early stage of light emission can be calculated, and the focus drift jump data can be calculated using This algorithm takes is any power value under j test power ranges. On this basis, Next, determine the second focus drift change data within the first ten seconds.

[0115] It should be noted that the method of determining the second focus drift difference based on the determined focus drift temperature coefficient at each test power range is the same as that of Figure 4 The embodiments are similar and will not be described in detail.

[0116] Step S214 , determining an amplitude influencing factor and a change speed influencing factor affecting the drift of the laser focus according to the second focus drift difference and the focus drift jump time of the laser processing equipment in the early stage of light emission.

[0117] Among them, in order to target the power and focus drift jump in the early stage of light emission, the amplitude influencing factor and the change speed influencing factor affecting the drift of the laser focus can be determined based on the determined second focus drift difference and the focus jump time in the early stage of light emission of the laser processing equipment.

[0118] Optionally, the amplitude influence factor and the change speed influence factor are determined in the same manner as Figure 4 The second focus drift difference within the time period under j test power segments can be set as the optimization goal to be equal to or close to 0, and the optimal b and c can be obtained as the determined amplitude influencing factor and change speed influencing factor.

[0119] exist Figure 6 In the illustrated embodiment, the effectiveness of the focus drift time compensation factor in performing focus position compensation in the early light emission stage is effectively improved.

[0120] Optionally, see Figure 7 , Figure 7 A detailed flow chart of step S300 is provided in an embodiment of the present application. Step S300 may include steps S310-S320.

[0121] Step S310 , determining a hybrid focus drift compensation algorithm based on the determined focus drift scaling factor, time impact factor, focus drift temperature compensation factor, and focus drift time compensation factor.

[0122] The hybrid focus drift compensation algorithm may be determined by combining the determined focus drift scaling factor, the time impact factor, the focus drift temperature compensation factor, and the focus drift time compensation factor.

[0123] Optionally, the focus drift scaling coefficient is a coefficient compensating for a hardware detection error existing in the focus drift analysis device, and the time influence factor is an influence factor compensating for a difference in time influence between the focus drift temperature compensation factor and the focus drift time compensation factor.

[0124] In step S320, the current working parameter of the laser processing device is brought into the mixed focus drift compensation algorithm for calculation to obtain a focus drift compensation value.

[0125] In the mixed focus drift compensation algorithm, the current working parameter of the laser processing device can be brought in for calculation to obtain a corresponding focus drift compensation value.

[0126] For example, the working parameter of the laser processing device in the current working state can include a variety of real-time parameters such as the starting temperature, the light output temperature, the light output time, and the power-off power of each optical device.

[0127] In Figure 7 In the embodiment shown, the focus drift can be calculated from multiple angles such as temperature change, time change, and power change, thereby improving the effectiveness and accuracy of the focus drift compensation value, and improving the effectiveness of the position adjustment of the target optical device based on the focus drift compensation value, thereby optimizing the compensation effect of the focus drift of the laser processing device.

[0128] Optionally, referring to Figure 8 , Figure 8 A flowchart of a third focus drift compensation method provided by the embodiment is shown. The method can further include steps S331-S332.

[0129] In step S331, a detection error of the focus drift analysis device is determined.

[0130] In the mixed focus drift compensation algorithm, the current working parameter of the laser processing device can be brought in for calculation to obtain a corresponding focus drift compensation value.

[0131] Optionally, taking the Beamwatch focus drift analysis device as an example, the device uses a lateral shooting light beam as a detection principle. The magnification of the imaging lens used in the focus drift analysis device, optical aberrations such as field curvature and distortion, and the like will affect the detection value. The imaging lens itself is affected by the ambient temperature, and the focal length may change due to temperature rise, thereby affecting the magnification and causing detection errors.

[0132] In step S332, a focus drift scaling coefficient is determined according to the detection error.

[0133] The corresponding focus drift scaling coefficient can be determined according to the detection error to compensate for the detection error, thereby further improving the effectiveness of the focus drift compensation value.

[0134] Optionally, the focus drift scaling factor may be in the range of [0.5, 2], and the value of the calibrated focus drift value fluctuating around 0 may be determined to be the actual focus drift scaling factor.

[0135] exist Figure 8 In the illustrated embodiment, hardware errors of the focus drift analysis device can be effectively compensated.

[0136] Optionally, see Figure 9 , Figure 9 This is a flow chart of a fourth focus drift compensation method provided in an embodiment of the present application. The method may further include steps S341-S343.

[0137] Step S341 , determining a hybrid focus drift value of the laser processing equipment in the early stage of light emission according to the focus drift temperature compensation factor and the focus drift time compensation factor.

[0138] Among them, taking into account the differential effects of time on different influencing factors when performing hybrid compensation, the hybrid focus drift value in the early stage of light emission of the laser processing equipment can be determined based on the focus drift temperature compensation factor and the focus drift time compensation factor.

[0139] Optionally, based on This algorithm calculates the hybrid focus drift value.

[0140] Step S342 : determining a hybrid focus drift difference value based on the hybrid focus drift value and the measured focus drift value in the early stage of light emission.

[0141] Step S343: Determine the time impact factor according to the hybrid focus drift difference.

[0142] The hybrid focus drift difference may be determined by comparing the hybrid focus drift value with the measured focus drift value, so as to determine a suitable time influencing factor according to the hybrid focus drift difference.

[0143] Optionally, the time impact factor is determined in the same way as Figure 4 The embodiment is similar and will not be described in detail. The optimization goal can be to make the hybrid focus drift difference within the time period under j test power segments equal to 0 or close to 0, and the optimal n can be obtained as the determined time impact factor.

[0144] It should be noted that the thermal correlation factor, the change speed factor and the time factor are related to the heat conduction and the heat exchange coefficient of the material, and are related to the time required for the optical device to reach thermal equilibrium. The faster the thermal equilibrium, the smaller the corresponding a, c and n values, and vice versa. For example, the value range of a, c and n can be [0.5, 20].

[0145] Optionally, the determination methods of the focus drift temperature coefficient, the focus drift scaling coefficient, the thermal correlation factor, the change speed factor and the time factor are pre-processing before compensation, and multiple focus drift compensations can be realized on the basis of the determined multiple parameters.

[0146] In Figure 9 In the embodiment shown, the time factor can be effectively calibrated according to the actual mixed focus drift, further improving the effectiveness of the mixed focus drift compensation algorithm.

[0147] It should be noted that the mixed focus drift compensation algorithm can include: ; Among them, is the focus drift scaling coefficient, is the time factor, is the focus drift temperature compensation factor, is the focus drift time compensation factor, is the light-out time of the laser processing equipment, is a third influence exponential function. The third influence exponential function can be determined according to the time factor, the time and the natural exponential function, so as to combine the third influence exponential function, the focus drift temperature compensation factor, the focus drift temperature compensation factor and the focus drift scaling coefficient to obtain the corresponding mixed focus drift compensation algorithm.

[0148] Optionally, please refer to Figure 10 , Figure 10 is a flowchart of a fifth focus drift compensation method provided by the embodiment of the present application. The method can further include steps S510-S550.

[0149] Step S510, determining the light-out time period of the laser processing equipment, and the first light-out time period before the light-out time period and the second light-out time period after the light-out time period.

[0150] In the actual laser processing scene, the laser processing equipment may be frequently turned on and off. In order to effectively compensate the focal point drift under the condition of frequent on-off light, so that the laser processing equipment can normally enter the next working stage, the off-light time period of the laser processing equipment, and the first light-out time period before the off-light time period and the second light-out time period after the off-light time period are determined to divide the multiple time periods under the condition of frequent on-off light.

[0151] It should be noted that the size of the focal point drift decreases with time in the on-off time period, and the size of the focal point drift increases with time in the off-light time period.

[0152] Step S520, based on the focal point drift compensation value, determining a first type focal point drift value at the end time of the first light-out time period.

[0153] For example, in the first light-out time period, the first type focal point drift value at the end time of the first light-out time period can be determined according to the calculated focal point drift compensation value, and the first type focal point drift value is used to adjust the position of the target optical device on the optical axis after the end of the first light-out time period.

[0154] Optionally, since the hybrid focal point drift compensation method is adopted, the temperature data of each lens is involved, in order to avoid the problem of the previous compensation scheme, i.e. the temperature data of each lens at the moment before each light-out is obtained as the initial temperature, because of the delay of the measured temperature data, the focal point drift compensation effect is not ideal and the data is random, the compensation scheme takes the initial temperature before the first light-out as the reference, and calculates the focal point drift under the condition of subsequent frequent light-out.

[0155] For example, in this case, the focal point drift temperature compensation factor under light-out is: ; The calculated first type focal point drift value may be: ; wherein, is the equivalent time of light-out, in the case of taking the first light-out time period as the initial light-out time period, =0, is the end time of the first light-out time period.

[0156] Step S530, according to the first type focal point drift value and the off-light influence factor, determining a second type focal point drift value at the end time of the off-light time period.

[0157] The second type of focus shift value is used to adjust the position of the target optical device on the optical axis after the end of the light-off time period based on the second type of focus shift value.

[0158] Optionally, the light-off influence factor can be: ; wherein, is the end time of the light-off time period, g is a second heat-related influence factor related to the thermal conductivity and heat exchange coefficient of the material, g is related to the time required for the optical device to reach cooling equilibrium from a thermal state, and g belongs to a time type parameter. The faster the cooling equilibrium, the smaller g is, and vice versa. The first type of focus shift value calculated may be: .

[0159] Step S540, determining the light-out equivalent time of the second light-out time period according to the second type of focus shift value.

[0160] Wherein, the light-out equivalent time of the second light-out time period can be determined according to the second type of focus shift value.

[0161] Optionally, the light-out equivalent time can be: .

[0162] Step S550, determining the third type of focus shift value at the end time of the second light-out time period according to the light-out equivalent time and the focus shift compensation value.

[0163] Wherein, the third type of focus shift value at the end time of the second light-out time period can be determined according to the light-out equivalent time and the focus shift compensation value, and the third type of focus shift value is used to adjust the position of the target optical device on the optical axis after the end of the second light-out time period based on the third type of focus shift value.

[0164] Optionally, the third type of focus shift value calculated may be: ; wherein, is the end time of the second light-out time period.

[0165] In Figure 10 the embodiment shown, the focus shift values at the end times of each adjacent time period under the condition of frequent light switching are associated and calculated, thereby optimizing the focus shift compensation effect between each time period.

[0166] Please refer to Figure 11 , Figure 11 A structure schematic diagram of a laser processing device is provided in the embodiment of the present application, wherein the laser processing device can comprise a plurality of optical devices 610, a controller 620 and a focusing device 630; The controller 620 is connected with the focusing device 630, and the plurality of optical devices 610 are distributed along the optical axis direction, and the focusing device 630 is connected with a target optical device 610 in the plurality of optical devices 610; The controller 620 is configured to determine a focal point drift temperature compensation factor of a laser focal point drift of the laser processing device varying with processing time, determine a focal point drift time compensation factor of the laser focal point drift varying with power of the laser processing device, determine a focal point drift compensation value of the laser processing device according to the focal point drift temperature compensation factor and the focal point drift time compensation factor, and control the focusing device 630 to adjust the position of the target optical device 610 on the optical axis Z according to the focal point drift compensation value.

[0167] Optionally, the focusing device 630 can be a motor, a lead screw, a worm gear, a worm, or other devices with position adjustment functions.

[0168] For example, the optical devices are all made of quartz material, and the laser processing device is provided with a collimation protection mirror + a collimation mirror + a focusing mirror + a post-focusing protection mirror, the collimation mirror has a focal length F100, the focusing mirror has a focal length F300, corresponding to k1=-0.05, k2=-0.35, k3=-0.2, k4=-0.15, a=8, b=-2, P0=10000, c=4, n=15. The variation trend of the focal point drift compensation value calculated based on the hybrid focal point drift compensation algorithm is the same as the actual measured focal point drift variation trend, so the target optical device can be compensated by the focusing device. For example, the target optical device is a collimation mirror or a focusing mirror (the protection mirror generally cannot be used as a focal point compensation element because its focal length is theoretically infinite, and only a limited focal length such as collimation or focusing compensation can be used), assuming that the target optical device is a focusing mirror, then the collimation mirror is fixed, and at this time, the focal point drift compensation value can be compensated by moving one-to-one. Assuming that the target optical device is a collimation mirror, then the focusing mirror is fixed, and at this time, according to the proportional relationship, focal point drift compensation value x (F1 / F2) 2 Adjust the collimation distance, wherein F1 is the focal length of the collimation mirror, and F2 is the focal length of the focusing mirror. In addition, in the adjustment direction, if the focal point position is shortened (i.e., moving towards the focusing mirror), then the focusing mirror needs to move towards the focal point end, and vice versa, and the collimation focusing is opposite.

[0169] Since the laser processing device in the embodiment of the present application solves the problem by the similar principle as the foregoing embodiment of the focus drift compensation method, the implementation of the laser processing device in the embodiment can be referred to the description in the foregoing embodiment of the focus drift compensation method, and the repeated parts will not be described herein.

[0170] The embodiment of the present application further provides a computer program product, which comprises computer programs / instructions, and the computer programs / instructions are executed by a processor to implement the steps in any one of the focus drift compensation methods provided in the embodiments of the present application.

[0171] In several embodiments provided in the present application, it should be understood that the disclosed device can also be implemented by other manners. The device embodiments described above are only schematic, for example, the block diagram in the drawings shows the possible implementation architecture, function and operation of the device according to the embodiments of the present application. In this regard, each block in the block diagram can represent a module, a program segment or a part of code, which contains one or more executable instructions for implementing the specified logical function. It should also be noted that, in some alternative implementation manners, the functions noted in the blocks can also occur in different order from that noted in the drawings. For example, two consecutive blocks can actually be executed substantially in parallel, and sometimes they can also be executed in reverse order, depending on the functions involved. It should also be noted that each block in the block diagram, and the combination of the block diagram, can be implemented by a dedicated hardware-based system for implementing the specified function or action, or can be implemented by a combination of dedicated hardware and computer instructions.

[0172] In addition, each functional module in the embodiments of the present application can be integrated together to form an independent part, or each module can exist independently, or two or more modules can be integrated to form an independent part.

[0173] If the functions are implemented in the form of software function modules and sold or used as independent products, they can be stored in a computer readable storage medium. Based on such understanding, the technical solutions of the present application can be embodied in the form of a software product, and the computer software product is stored in a storage medium, and includes a number of instructions for causing a computer device (which can be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the methods described in the embodiments of the present application. The foregoing storage medium includes: a U disk, a mobile hard disk, a read-only memory (ROM, Read-Only Memory), a random access memory (RAM, Random Access Memory), a magnetic disk or an optical disk, and various media that can store program codes.

[0174] The above description is only the specific implementation of the present application, and is not used to limit the protection scope of the present application. For those skilled in the art, the present application can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application. It should be noted that similar reference numerals and letters represent similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0175] The above description is only the specific implementation of the present application, and is not used to limit the protection scope of the present application. For those skilled in the art, the present application can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

[0176] It should be noted that, in the present document, the relationship terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between the entities or operations. Moreover, the terms "include", "contain" or any other variants thereof are intended to cover non-exclusive inclusion, so that the process, method, article or equipment including a series of elements not only includes those elements, but also includes other elements not explicitly listed or inherent to such process, method, article or equipment. Without more limitations, the elements defined by the statement "include" do not exclude the presence of other identical elements in the process, method, article or equipment including the elements.

Claims

1. A focus drift compensation method, characterized in that: Applied to laser processing equipment, the method includes: Determine the focus drift temperature compensation factor of the laser processing equipment as the laser focus drift changes with processing time; Determining a focus drift time compensation factor for a laser focus drift condition that varies with the power of the laser processing equipment; determining a focus drift compensation value of the laser processing equipment according to the focus drift temperature compensation factor and the focus drift time compensation factor; The position of the target optical device in the laser processing equipment on the optical axis is adjusted according to the focus drift compensation value.

2. The method according to claim 1, characterized in that The focus drift temperature compensation factor for determining the drift of the laser focus of the laser processing equipment as it changes with processing time includes: determining a focus drift temperature coefficient for each optical device in the laser processing apparatus; Determining the starting temperature of each optical device before emitting light, and the real-time temperature during the emitting time; determining a focus drift temperature compensation coefficient according to the plurality of focus drift temperature coefficients, the plurality of starting temperatures, and the plurality of real-time temperatures; The focus drift temperature compensation factor is determined based on the focus drift temperature compensation coefficient and a first influence index function.

3. The method according to claim 2, characterized in that Determining the focus drift temperature coefficient of each optical device in the laser processing equipment includes: Determining a plurality of test power sections according to an available power range of the laser processing equipment; Performing a temperature-focus drift variation test on the laser processing equipment based on each test power segment to obtain temperature data and focus drift data; determining a stable focus drift value based on the temperature data and the focus drift data; The focus drift temperature coefficient of each of the optical components in the laser processing equipment is determined based on the stable focus drift value.

4. The method according to claim 3, characterized in that in, The focus drift temperature compensation factor includes: ； ； in, is the focus drift temperature compensation factor, is the focus drift temperature compensation coefficient, 、 ,..., For the 1st the focus drift temperature coefficient of each of the optical devices, 、 ,..., For the 1st the starting temperature of the light front of the optical device, is the light emission time of the laser processing equipment, 、 ,..., For the 1st The optical device has a light emission time The real-time temperature under is the first influence index function, is the heat-related influencing factor.

5. The method according to claim 4, characterized in that in, The method for determining the heat-related impact factor includes the following steps: determining first focus drift variation data under each of the test power sections according to the focus drift temperature coefficient; determining a first focus drift difference according to the first focus drift change data and in combination with the real-time focus drift data of the test power section; The heat-related influencing factor is obtained according to the first focus drift difference and the focus drift jump time of the laser processing equipment in the early stage of light emission.

6. The method according to claim 1, characterized in that The focus drift time compensation factor for determining the drift of the laser focus as the power of the laser processing equipment changes includes: Determining an amplitude influencing factor and a change speed influencing factor that affect the drift of the laser focus; Determining an output light power within an available power range of the laser processing equipment and a calibration power associated with the amplitude influencing factor; The focus drift time compensation factor is determined based on the amplitude influence factor, the change speed influence factor, the optical output power, the calibration power, and a second influence index function.

7. The method according to claim 6, characterized in that in, The focus drift time compensation factor includes: ； in, is the focus drift time compensation factor, is the amplitude influence factor, is the change speed influencing factor, is the optical output power, is the calibration power, is the second influence index function.

8. The method according to claim 6, characterized in that The determining of the amplitude influencing factor and the change speed influencing factor affecting the drift of the laser focus includes: Determining a plurality of test power sections according to an available power range of the laser processing equipment; determining second focus drift variation data at each of the test power sections according to focus drift temperature coefficients of the plurality of optical components in the laser processing equipment; determining a second focus drift difference according to the second focus drift change data and in combination with the real-time focus drift data of the test power section; The amplitude influencing factor and the change speed influencing factor affecting the drift of the laser focus are determined according to the second focus drift difference and the focus drift jump time of the laser processing equipment in the early stage of light emission.

9. The method according to claim 1, characterized in that Determining the focus drift compensation value of the laser processing equipment according to the focus drift temperature compensation factor and the focus drift time compensation factor includes: Determining a hybrid focus drift compensation algorithm in combination with the determined focus drift scaling factor, the time impact factor, the focus drift temperature compensation factor, and the focus drift time compensation factor; The current operating parameters of the laser processing equipment are brought into the hybrid focus drift compensation algorithm for calculation to obtain the focus drift compensation value.

10. The method according to claim 9, characterized in that in, The method for determining the focus drift scaling factor includes the following steps: Determine detection errors of focus drift analysis equipment; The focus drift scaling factor is determined based on the detection error.

11. The method according to claim 9, characterized in that in, The method for determining the time impact factor includes the following steps: Determining a hybrid focus drift value of the laser processing equipment in an early stage of light emission according to the focus drift temperature compensation factor and the focus drift time compensation factor; Determine a hybrid focus drift difference according to the hybrid focus drift value and the measured focus drift value in the early light emission stage; The time impact factor is determined according to the hybrid focus drift difference.

12. The method according to claim 9, characterized in that in, The hybrid focus drift compensation algorithm includes: ； in, is the focus drift scaling factor, is the time impact factor, is the focus drift temperature compensation factor, is the focus drift time compensation factor, is the light emission time of the laser processing equipment, is the third influence index function.

13. The method according to any one of claims 1 to 12, characterized in that The method further comprises: Determining a light-off time period of the laser processing equipment, a first light-emitting time period before the light-off time period, and a second light-emitting time period after the light-off time period; determining, based on the focus drift compensation value, a first type of focus drift value at the end of the first light emitting time period; wherein the first type of focus drift value is used to adjust the position of the target optical device on the optical axis based on the first type of focus drift value after the end of the first light emitting time period; determining, based on the first focus drift value and the light-off impact factor, a second focus drift value at the end of the light-off period; wherein the second focus drift value is used to adjust the position of the target optical device on the optical axis based on the second focus drift value after the end of the light-off period; Determining the light emission equivalent time of the second light emission time period according to the second type of focus drift value; A third type of focus drift value at the end of the second light emitting time period is determined based on the light emitting equivalent time and the focus drift compensation value; wherein the third type of focus drift value is used to adjust the position of the target optical device on the optical axis based on the third type of focus drift value after the end of the second light emitting time period.

14. A laser processing device, characterized in that: The laser processing equipment includes: multiple optical devices, a controller and a focusing device; Wherein, the controller is connected to the focusing device, the plurality of optical devices are distributed along the optical axis direction, and the focusing device is connected to a target optical device among the plurality of optical devices; The controller is used to: Determining a focus drift temperature compensation factor of the laser focus of the laser processing equipment as the focus drift changes with processing time; Determining a focus drift time compensation factor for a laser focus drift condition that varies with the power of the laser processing equipment; determining a focus drift compensation value of the laser processing equipment according to the focus drift temperature compensation factor and the focus drift time compensation factor; The focusing device is controlled to adjust the position of the target optical device on the optical axis according to the focus drift compensation value.

15. A controller, characterized in that: The controller includes a memory and a processor, wherein program instructions are stored in the memory, and when the processor runs the program instructions, the steps in the method according to any one of claims 1 to 13 are executed.

16. A computer program product, characterized in that The computer program product comprises a computer program / instruction, and when the computer program / instruction is executed by a processor, the steps of the method according to any one of claims 1 to 13 are implemented.

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