Temperature and pressure adjusting system of electron accelerator

Abstract

The invention discloses a temperature and pressure regulating system of an electron accelerator, which comprises an SF6 gas cylinder, a first vacuum valve, a second vacuum valve, a first pressure stabilizing device, a high-precision temperature regulating device, a vacuum pump and a third vacuum valve which are sequentially connected in series, and is characterized in that the SF6 gas cylinder provides a gas source for the temperature and pressure regulating system; the high-precision temperature adjusting device is used for adjusting the temperature of the SF6 gas, and the vacuum pump is used for pushing the SF6 gas to flow in one direction; the third vacuum valve is connected with a gas outlet passage so as to be connected with a waveguide vacuum ceramic window, and the second vacuum valve is connected with a return passage so as to be connected with the vacuum ceramic window, so that the second vacuum valve, the first pressure stabilizing device, the high-precision temperature adjusting device, the vacuum pump, the third vacuum valve and the vacuum ceramic window form an SF6 one-way circulating gas path. According to the invention, through SF6 gas circulation, required stable temperature and pressure conditions are provided for the vacuum waveguide ceramic window section.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of electron accelerators, in particular to a temperature and pressure regulating system of an electron accelerator. BACKGROUND

[0002] In the prior art, during the operation of a high-energy electron accelerator, the microwaves output from the klystron gradually increase the temperature of the waveguide and the ceramic window wall when passing through the waveguide section, which eventually leads to deformation of the waveguide and damage to the ceramic, so the waveguide needs to be cooled to take away the heat. Usually, the waveguide or the ceramic window adopts a surface welding cooling waterway, and the waterway is connected to a refrigeration thermostat, which generates water circulation through an external water tank to continuously take away the heat on the surface of the equipment and ensure the stable and normal operation of the high-energy electron accelerator waveguide and ceramic window.

[0003] For example, patent CN201491450U discloses a cooling thermostat for an electron accelerator, which comprises a rack, at least one set of cooling thermostat control systems installed in the rack, each set of cooling thermostat control systems comprising a cooling unit with a cooling water tank, a circulating water pump, a water outlet diverter, a control valve, a cooling output part, a water return diverter, a cooling return part and a flow switch. The cooling water tank is connected to the input end of the circulating water pump, the output end of the circulating water pump is connected to the input end of the water outlet diverter, the output end of the water outlet diverter is connected to the input end of the control valve, the output end of the control valve is connected to the input end of the cooling output part, the water return diverter is installed on the cooling water tank, the cooling return part and the flow switch are installed on the rack, and the flow switch is installed between the water return diverter and the cooling return part. The cooling output part provides cooling water for the electron accelerator, and the heat-exchanged water is returned to the cooling water tank through the water return diverter and the cooling return part to be re-cooled, forming a water circulation.

[0004] As shown in the above patent, the prior art usually uses the flow of water to take away the heat on the surface of the waveguide. However, the microwaves are transmitted through the center of the waveguide and the center of the ceramic window, so taking away only the heat on the surface of the waveguide will cause the heat in the center of the waveguide and the center of the ceramic window to not be effectively dissipated in time, which will easily lead to a sharp increase in the internal pressure of the waveguide cavity as the heat increases, eventually leading to the common ceramic window breakage in the industry, causing serious damage to important parts of the waveguide ceramic window. SUMMARY

[0005] To solve the technical problems existing in the prior art, the purpose of the present application is to provide a temperature and pressure regulating system of an electron accelerator, which provides the required stable temperature and pressure conditions for the vacuum waveguide ceramic window section through SF6 gas circulation.

[0006] The application discloses a temperature and pressure regulating system of an electron accelerator.

[0007] Further, the temperature and pressure regulating system further comprises a second pressure stabilizing device, which is connected in series in a passage between the vacuum pump and the third vacuum valve.

[0008] Specifically, the first pressure stabilizing device and the second pressure stabilizing device are pressure relief valves.

[0009] Further, the temperature and pressure regulating system further comprises a vacuumizing device and a fourth vacuum valve, wherein the vacuumizing device is connected in series in a passage between the second pressure stabilizing device and the third vacuum valve through the fourth vacuum valve.

[0010] Further, the temperature and pressure regulating system further comprises a first filter and a second filter, which are connected in series at the front and back ends of the high-precision temperature regulating device and the vacuum pump respectively.

[0011] Further, the temperature and pressure regulating system further comprises a flow meter, which is connected in series in a passage between the second filter and the second pressure stabilizing device, and the flow meter is used for controlling the gas flow rate of the one-way circulating gas path.

[0012] Further, the temperature and pressure regulating system further comprises a pressure gauge, which is connected in series in a passage between the flow meter and the second pressure stabilizing device.

[0013] Further, the temperature and pressure regulating system further comprises a pressure transmitter, which is connected in series in a passage between the pressure gauge and the second pressure stabilizing device.

[0014] Further, the temperature and pressure regulating system further comprises a vacuum tank, wherein the vacuum pump is arranged in the vacuum tank, and the inside of the tank body is a lead cylinder structure.

[0015] Specifically, the high-precision temperature regulating device is a refrigerator.

[0016] Compared with the prior art, the application has at least the following beneficial effects:

[0017] 1、The present application provides the required stable temperature and pressure conditions for the vacuum waveguide ceramic window section through SF6 gas circulation. It can realize constant temperature and pressure control of SF6 in the closed vacuum cavity, so that the temperature and pressure distribution in each region of the closed space is more balanced, and the quality of the products produced and processed by the high-energy irradiation electron accelerator equipment is higher.

[0018] 2、The first pressure stabilizing device and the second pressure stabilizing device of the present application are pressure relief valves, which are respectively arranged beside the second vacuum valve as the inlet of the one-way circulation gas path and beside the third vacuum valve as the outlet of the one-way circulation gas path, so as to cope with the sudden pressure increase in the one-way circulation gas path and timely relieve the pressure, thereby protecting the present application and the connected waveguide equipment.

[0019] 3、The first filter and the second filter of the present application effectively prevent the fragments or particles that may fall off due to aging or damage of the fan blades of the vacuum pump from entering the one-way circulation gas path and damaging the components of the waveguide equipment, thereby effectively protecting the present application and the connected waveguide equipment.

[0020] 4、The pressure gauge of the present application is used to realize real-time grasping of the pressure conditions in the present application and the waveguide, and the pressure transmitter is used as a double insurance structure to prevent the pressure of SF6 gas in the gas path from being unknown after damage of one component in the gas path, thereby ensuring accurate and controllable display of the pressure in the gas path.

[0021] 5、The lead cylinder structure vacuum tank of the present application is used for protection, which prevents the pump body from being damaged and SF6 gas from leaking due to long-term irradiation. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1 The system flowchart of the present application.

[0023] In the drawings:

[0024] 1-SF6 gas cylinder; 2-first vacuum valve; 3-second vacuum valve; 4-first pressure stabilizing device; 5-first filter; 6-high-precision temperature regulating device; 7-vacuum pump; 8-second filter; 9-flow meter; 10-pressure gauge; 11-pressure transmitter; 12-second pressure stabilizing device; 13-third vacuum valve; 14-vacuum ceramic window; 15-vacuumizing device; 16-fourth vacuum valve; 17-gas outlet passage; 18-gas return passage; 19-vacuum tank. DETAILED DESCRIPTION

[0025] For the convenience of understanding the present application, the technical solutions and advantages of the present application are further described in detail below in combination with the drawings and examples. The mechanisms or methods not described in the present application can refer to the prior art. The specific structures and features of the present application are described below by way of example, which should not constitute any limitation on the present application. At the same time, any one of the technical features mentioned below (including implied or disclosed), as well as any one of the technical features directly shown or implied in the drawings, can continue to be combined or deleted between these technical features, thereby forming more other embodiments that can not be directly or indirectly mentioned in the present application. The preferred embodiments of the present application are shown in the drawings. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive.

[0026] As shown in Figure 1 The temperature and pressure regulating system of the electronic accelerator of the present embodiment includes an SF6 gas cylinder 1, a first vacuum valve 2, a second vacuum valve 3, a first pressure stabilizing device 4, a first filter 5, a high-precision temperature regulating device 6, a vacuum pump 7, a second filter 8, a flow meter 9, a pressure gauge 10, a pressure transmitter 11, a second pressure stabilizing device 12, a third vacuum valve 13, a vacuumizing device 15, and a fourth vacuum valve 16.

[0027] The SF6 gas cylinder 1, the first vacuum valve 2, the second vacuum valve 3, the first pressure stabilizing device 4, the first filter 5, the high-precision temperature regulating device 6, the vacuum pump 7, the second filter 8, the flow meter 9, the pressure gauge 10, the pressure transmitter 11, the second pressure stabilizing device 12, and the third vacuum valve 13 are sequentially connected in series to form a one-way gas path. The third vacuum valve 13 is connected to the vacuum ceramic window 14 of the waveguide through a gas outlet path 17, and the second vacuum valve 3 is connected to the vacuum ceramic window 14 through a return path 18, so as to form a one-way circulating closed circuit of the second vacuum valve 3, the first pressure stabilizing device 4, the first filter 5, the high-precision temperature regulating device 6, the vacuum pump 7, the second filter 8, the flow meter 9, the pressure gauge 10, the pressure transmitter 11, the second pressure stabilizing device 12, the third vacuum valve 13, and the vacuum ceramic window 14, so as to realize the regulation of the temperature and pressure inside the waveguide. The vacuumizing device 15 is connected to the path between the second pressure stabilizing device 12 and the third vacuum valve 13 through the fourth vacuum valve 16, that is, closing the fourth vacuum valve 16 does not intercept the flow of the above-mentioned one-way circulating gas path.

[0028] Specifically, the SF6 gas cylinder 1 is used as the gas source of the temperature and pressure regulating system in this embodiment, and its opening and closing are controlled by the first vacuum valve 2. During the operation of the high-energy electron accelerator, the waveguide device needs to be kept in good working condition for a long time and all day round, as it is an important component for high-energy microwave transmission. However, the waveguide device will absorb a part of the microwave transmission and generate a large amount of heat during use, which requires an efficient heat dissipation structure to keep it in good working condition at all times. The microwave transmission process is high-energy electron microwave, and if there is no insulating medium inside the waveguide, it may cause breakdown under high power. SF6 has stable chemical properties and is not easy to decompose, has excellent insulation and arc extinguishing performance, and its density is about 5 times that of air, which can better maintain the pressure in the vacuum sealed waveguide. Therefore, SF6 gas is usually used in the waveguide section. In this embodiment, SF6 used as the filling gas inside the waveguide is also used as the fluid for controlling the temperature and pressure inside the waveguide, so as to provide stable temperature and pressure regulation function for the waveguide.

[0029] The second vacuum valve 3 is used as the inlet of the above-mentioned one-way circulating gas path, and is connected with the first vacuum valve 2, the first pressure stabilizing device 4 and the vacuum ceramic window 14 through pipelines. The second vacuum valve 3 is connected with the vacuum ceramic window 14 of the waveguide through the return path 18, so as to recycle the gas after heat absorption by the vacuum ceramic window 14, and make the gas flow back into the temperature and pressure regulating system for cooling again. The second vacuum valve 3 is connected with the SF6 gas cylinder 1 through the first vacuum valve 2, so as to obtain SF6 gas. When the first vacuum valve 2 and the second vacuum valve 3 are opened at the same time, the SF6 gas cylinder 1 outputs SF6 gas to the one-way circulating gas path. When the temperature and pressure regulating system is in temperature regulation, the first vacuum valve 2 is usually closed and the second vacuum valve 3 is opened.

[0030] The first pressure stabilizing device 4 is a pressure relief valve, which is arranged beside the second vacuum valve 3 as the inlet of the one-way circulating gas path. The second pressure stabilizing device 12 is also a pressure relief valve, which is arranged beside the third vacuum valve 13 as the outlet of the one-way circulating gas path. When the pressure in the one-way circulating gas path increases sharply, the first pressure stabilizing device 4 and the second pressure stabilizing device 12 can timely release the pressure, so as to protect the temperature and pressure regulating system and the connected waveguide device in this embodiment.

[0031] The high-precision temperature regulating device 6 is a refrigerator, which is used for regulating the temperature of SF6 gas. Stable low-temperature SF6 gas is obtained by the high-precision temperature regulating device 6, and is sent to the vacuum ceramic window 14 of the waveguide to absorb heat.

[0032] Vacuum pump 7 serves as the power source for the temperature and pressure regulation system, pushing SF6 gas in a unidirectional flow. Upon startup, vacuum pump 7 forces the SF6 gas to flow sequentially through the second filter 8, flowmeter 9, pressure gauge 10, pressure transmitter 11, second pressure regulator 12, and third vacuum valve 13. The gas then exits the temperature and pressure regulation system through outlet passage 17 and enters the vacuum waveguide ceramic window 14 to regulate the waveguide's temperature. After heat exchange within the waveguide, the gas flows back into the temperature and pressure regulation system through return passage 18, where it flows sequentially to the second vacuum valve 3, first pressure regulator 4, first filter 5, high-precision temperature regulator 6, and vacuum pump 7, circulating the SF6 gas back and forth within the unidirectional circulation path. Furthermore, when vacuum pump 7 is operational, the high-precision temperature regulator 6 is also activated, ensuring that the SF6 temperature and pressure within the unidirectional circulation path remain at the optimal levels required for the operation of the high-energy irradiation electron accelerator.

[0033] The vacuum pump 7 is placed in the vacuum tank 19 because the usage scenario is a high-irradiation environment. The interior of the tank is a lead tube structure, which is mainly used to prevent the pump body from being irradiated for a long time, causing damage to the pump body and SF6 gas leakage. The first filter 5 and the second filter 8 are respectively arranged at the front and rear ends of the high-precision temperature control device 6 and the vacuum pump 7, located at the inlet and outlet ends of the vacuum pump 7. The first filter 5 at the air inlet end is to prevent impurities in the gas from entering the waveguide device when the SF6 gas enters the gas path, causing sparks. The second filter 8 at the air outlet end is because the vacuum pump 7 has fan blades. During use, as time, temperature, humidity, etc., the fan blades age or break and may drop fragments or particles. In order to protect the waveguide device and the electrical components of the temperature and pressure regulation system of this embodiment, the first filter 5 and the second filter 8 are respectively installed at both ends of the high-precision temperature control device 6 and the vacuum pump 7 to prevent impurities from flowing into the waveguide device and other electrical components of this embodiment. In this embodiment, preferably, the first filter 5 and the second filter 8 are filter screens.

[0034] The flowmeter 9 is used to control the gas flow rate of the one-way circulation gas circuit. Specifically, the flowmeter 9 can be an electronic flowmeter 9, an intelligent flowmeter 9, or a pneumatic flow controller. The electronic flowmeter 9 mainly detects the flow rate of the fluid based on the principles of electronic technology, and automatically controls the flow rate through the built-in corresponding circuit. The intelligent flowmeter 9 combines computer technology, mathematical statistics methods, and air pressure sensing technologies to achieve measurement and control of various media such as liquids and gases. Pneumatic flow controllers usually use a special pressure reducing valve to control the flow rate by using pressure differential.

[0035] The pressure gauge 10 is used to display the gas pressure of the one-way circulation gas circuit. When the pressure of the one-way circulation gas circuit increases, the staff can know and respond in time to protect the waveguide equipment and the temperature and pressure regulation system of this embodiment.

[0036] The pressure transmitter 11 is a device for converting pressure into pneumatic or electric signals for control and remote transmission. It can not only display the pressure of the one-way circulating gas path, but also convert the pressure parameter sensed by the pressure measuring component sensor into a standard electric signal for the secondary instrument such as the indicating alarm instrument, recording instrument, and regulator to measure, indicate, and process adjustment. The pressure gauge 10 and the pressure transmitter 11 are connected in series to prevent the pressure of SF6 gas in the gas path from being unknown when one of the components in the gas path is damaged, and to ensure that the pressure display in the gas path is accurate and controllable, which is a double insurance structure.

[0037] The second pressure stabilizing device 12 is a pressure relief valve as described above. It is arranged beside the fourth vacuum valve 16 as the outlet of the one-way circulating gas path to serve as a pressure protection device to protect the waveguide device and the temperature and pressure regulating system of the embodiment.

[0038] The vacuumizing device 15 is used to remove air in the one-way circulating gas path before SF6 gas is filled. The fourth vacuum valve 16 controls the connection relationship between the vacuumizing device 15 and the one-way circulating gas path. When the temperature and pressure regulating system is in the temperature regulating mode, the first vacuum valve 2 and the third vacuum valve 13 are closed, and the second vacuum valve 3 and the fourth vacuum valve 16 are opened to form a closed one-way circulating gas path.

[0039] The working steps of the embodiment are as follows:

[0040] S1, connect the temperature and pressure regulating system of the embodiment to the waveguide. Specifically, the third vacuum valve 13 is connected to one end of the vacuum ceramic window 14 of the waveguide through the gas outlet path 17, and the second vacuum valve 3 is connected to the other end of the vacuum ceramic window 14 of the waveguide through the return path 18 to form a circulating path.

[0041] S2, before filling SF6 gas, the air in the path needs to be removed first. Specifically, first close the first vacuum valve 2 and open the second vacuum valve 3, the third vacuum valve 13, and the fourth vacuum valve 16. Start the vacuumizing device 15 to remove the air in the path to a vacuum negative pressure state (-0.02 MPa). Observe the pressure gauge 10, and after the vacuumizing is completed, close the fourth vacuum valve 16 and the vacuumizing device 15.

[0042] S3, under the condition that the path reaches a vacuum negative pressure state (-0.02 MPa), fill SF6 gas into the path. Specifically, open the first vacuum valve 2, the second vacuum valve 3, and the third vacuum valve 13, and close the fourth vacuum valve 16. Open the SF6 gas cylinder 1 to fill high-purity SF6 gas into the path to 0.02 MPa. Observe the pressure gauge 10, and after the gas filling is completed, close the first vacuum valve 2. At this time, the first vacuum valve 2 and the fourth vacuum valve 16 are in the closed state, and the second vacuum valve 3 and the third vacuum valve 13 are in the open state to form a vacuum closed loop gas path.

[0043] S4, the vacuum pump 7 is started, SF6 gas unidirectional flow, forming a one-way circulation path. SF6 gas after temperature adjustment by high-precision temperature control device 6 from the outlet path 17 out of temperature and pressure regulating system, into the vacuum waveguide ceramic window 14 to achieve temperature regulation of the waveguide. After heat exchange in the waveguide, SF6 gas through the return path 18 back to the temperature and pressure regulating system, re-enter the high-precision temperature control device 6 to adjust the temperature, and then by vacuum pump 7 again to the waveguide push, cycle.

[0044] Compared with the prior art, the temperature and pressure regulating system of the electronic accelerator of the embodiment provides the required stable temperature and pressure conditions for the vacuum waveguide ceramic window segment through SF6 gas circulation. It can realize constant temperature and pressure control of SF6 in the closed vacuum cavity, so that the temperature and pressure distribution in each region of the waveguide vacuum cavity is more balanced, and the quality of the products produced and processed by the high-energy irradiation electronic accelerator device is higher.

[0045] The above-mentioned embodiments are only preferred embodiments of the present application, and cannot be used to limit the scope of protection of the present application. For those skilled in the art, it can be understood that various changes, modifications, replacements and variations can be made to these embodiments without departing from the principles and spirits of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A temperature and pressure regulation system for an electron accelerator, characterized in that: It includes an SF6 gas cylinder, a first vacuum valve, a second vacuum valve, a first voltage stabilizing device, a high-precision temperature regulating device, a vacuum pump and a third vacuum valve connected in series in sequence, wherein the SF6 gas cylinder provides a gas source for the temperature and pressure regulating system, the high-precision temperature regulating device is used to regulate the temperature of SF6 gas, and the vacuum pump is used to promote the unidirectional flow of SF6 gas; the third vacuum valve is connected to the outlet passage to connect to the vacuum ceramic window of the waveguide, and the second vacuum valve is connected to the return passage to connect to the vacuum ceramic window, so that the second vacuum valve, the first voltage stabilizing device, the high-precision temperature regulating device, the vacuum pump, the third vacuum valve and the vacuum ceramic window form a one-way circulation gas path for SF6.

2. The temperature and pressure regulating system of the electron accelerator according to claim 1, wherein: It also includes a second pressure stabilizing device, which is connected in series to the passage between the vacuum pump and the third vacuum valve.

3. The temperature and pressure regulating system of the electron accelerator according to claim 2, wherein: The first pressure stabilizing device and the second pressure stabilizing device are pressure relief valves.

4. The temperature and pressure regulating system of the electron accelerator according to claim 2, wherein: It also includes a vacuum pumping device and a third vacuum valve. The vacuum pumping device is connected to the passage between the second voltage stabilizing device and the third vacuum valve through the fourth vacuum valve.

5. The temperature and pressure regulating system of the electron accelerator according to claim 2, wherein: It also includes a first filter and a second filter, which are respectively connected in series to the front and rear ends of the high-precision temperature control device and the vacuum pump.

6. The temperature and pressure regulating system for an electron accelerator according to claim 5, wherein: It also includes a flow meter, which is connected in series to the passage between the second filter and the second pressure stabilizing device, and the flow meter is used to control the gas flow rate of the one-way circulation gas path.

7. The temperature and pressure regulating system of the electron accelerator according to claim 6, wherein: It also includes a pressure gauge, which is connected in series to the passage between the flow meter and the second pressure stabilizing device.

8. The temperature and pressure regulating system for an electron accelerator according to claim 7, wherein: It also includes a pressure transmitter, which is connected in series to the passage between the pressure gauge and the second pressure stabilizing device.

9. The temperature and pressure regulating system for an electron accelerator according to claim 1, wherein: It also includes a vacuum tank, the vacuum pump is placed in the vacuum tank, and the interior of the tank is a lead cylinder structure.

10. The temperature and pressure regulating system for an electron accelerator according to claim 1, wherein: The high-precision temperature control device is a refrigerator.

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