Magnetron sputtering machine and vacuum coating method thereof

Abstract

The invention provides a magnetron sputtering machine and a vacuum coating method thereof.The magnetron sputtering machine comprises a vacuum coating cavity and a winding system, the winding system comprises a winding roller arranged in the vacuum coating cavity, the winding roller comprises an unwinding roller and a winding roller, and a base film conveying path is formed between the unwinding roller and the winding roller; the auxiliary film penetrating mechanism is arranged in the vacuum coating cavity, forms an auxiliary film penetrating path and is used for pulling the base film to move along the auxiliary film penetrating path and pulling the base film to the base film conveying path; and the auxiliary flattening mechanism is at least partially arranged in the vacuum coating cavity. According to the device, the auxiliary film penetrating mechanism can replace manual film penetrating, the film penetrating efficiency and the film penetrating quality are improved, then the production efficiency is improved, the auxiliary flattening mechanism can adjust the free span between the auxiliary roller and the surface of a film roll on the winding roller during winding and unwinding, flattening of a base film is achieved, wrinkles generated during film coating are reduced, and the film forming quality is improved; and the performance of the magnetron sputtering machine is improved.

Description

Technical Field

[0001] The present application relates to the field of vacuum coating technology, and in particular to a magnetron sputtering machine and a vacuum coating method thereof. Background Art

[0002] A magnetron sputtering machine is a device that uses magnetron sputtering technology to deposit thin films on various substrate materials. The composite films produced are widely used in the semiconductor industry.

[0003] The working principle of a magnetron sputtering machine is based on the effects of electric and magnetic fields on charged particles. An inert gas (such as argon) is introduced into the vacuum coating chamber. When voltage is applied, the gas is ionized to produce a plasma. The electrons in the plasma are accelerated toward the substrate by the electric field, colliding with argon atoms during flight, ionizing them to produce argon ions and new electrons. Under the influence of the electric field, the argon ions are accelerated toward the cathode target and bombard the target surface with high energy, causing the target atoms or molecules to gain sufficient energy to be sputtered from the target surface. These sputtered particles are deposited on the substrate to form a thin film. At the same time, the secondary electrons generated are affected by the combined effects of the electric and magnetic fields, performing a cycloidal motion near the target surface. This lengthens the motion path, increasing the probability of collision with gas atoms, thereby increasing the plasma density and sputtering rate.

[0004] However, the performance of existing magnetron sputtering machines needs to be improved. Summary of the Invention

[0005] In view of this, the purpose of this application is to provide a magnetron sputtering machine that is conducive to improving production efficiency and film quality.

[0006] Based on the above objectives, the present application provides a magnetron sputtering machine, including a vacuum coating chamber and a winding system, wherein the winding system includes:

[0007] A winding roller is provided in the vacuum coating chamber, the winding roller comprises a unwinding roller and a winding roller, and a base film transmission path is formed between the unwinding roller and the winding roller;

[0008] An auxiliary film-penetrating mechanism is provided in the vacuum coating chamber, the auxiliary film-penetrating mechanism forms an auxiliary film-penetrating path, and is used to pull the base film to move along the auxiliary film-penetrating path and to pull the base film to the base film transmission path;

[0009] An auxiliary flattening mechanism is at least partially arranged in the vacuum coating chamber. The auxiliary flattening mechanism includes an auxiliary roller. The auxiliary roller is arranged on the base film transmission path. The position of the auxiliary roller is adjustable to adjust the distance from the surface of the film roll on the corresponding winding roller when the winding roller is reeled and unwound.

[0010] In a preferred embodiment, the auxiliary membrane penetration mechanism includes a membrane penetration drive, multiple membrane penetration wheels and a membrane penetration traction assembly. The membrane penetration traction assembly is wound around the multiple membrane penetration wheels and forms an auxiliary membrane penetration path. The membrane penetration drive is connected to the membrane penetration wheel and drives the membrane penetration wheel to rotate. The membrane penetration wheel drives the membrane penetration traction assembly to move along the auxiliary membrane penetration path. When the membrane penetration traction assembly moves, it pulls the basement membrane to the basement membrane transmission path.

[0011] In a preferred embodiment, the base film transmission path includes multiple sub-transmission paths, the magnetron sputtering machine includes at least one auxiliary film-penetrating mechanism, and the at least one auxiliary film-penetrating mechanism forms multiple auxiliary film-penetrating paths.

[0012] In a preferred embodiment, the winding system further includes a first main drum and a second main drum sequentially arranged along the base film transmission path, and the plurality of sub-transmission paths include a first sub-transmission path located between the unwinding roller and the first main drum, a second sub-transmission path located between the first main drum and the second main drum, and a third sub-transmission path located between the second main drum and the winding roller;

[0013] The auxiliary film-penetrating mechanism includes a first auxiliary film-penetrating mechanism and a second auxiliary film-penetrating mechanism, wherein the first auxiliary film-penetrating mechanism is partially arranged between the unwinding roller and the first main drum, and partially arranged between the first main drum and the second main drum, and the second auxiliary film-penetrating mechanism is arranged between the second main drum and the winding roller;

[0014] The auxiliary film penetration path corresponding to the first auxiliary film penetration mechanism is partially located between the unwinding roller and the first main drum, partially overlaps with the base film transmission path on the first main drum, and partially is located between the first main drum and the second main drum; the auxiliary film penetration path corresponding to the second auxiliary film penetration mechanism is located between the second main drum and the winding roller.

[0015] In a preferred embodiment, the winding system further includes a first roller group and a second roller group, the auxiliary roller, the first roller group, the first main drum, the second roller group and the second main drum are sequentially arranged along the base film transmission path, the first roller group includes a first guide roller; the second roller group includes a second guide roller, a third guide roller and a fourth guide roller sequentially arranged along the base film transmission path;

[0016] The plurality of membrane-penetrating wheels in the first auxiliary membrane-penetrating mechanism include a first tensioning wheel, a first pulley, a second pulley, a third pulley, a fourth pulley, a fifth pulley and a sixth pulley which are sequentially arranged along the auxiliary membrane-penetrating path;

[0017] Among them, the first guide roller is arranged in the auxiliary film-penetrating path and is located between the first tensioning wheel and the sixth pulley, the second guide roller and the third guide roller are arranged in the auxiliary film-penetrating path and are located between the third pulley and the fourth pulley, and the fourth guide roller is arranged in the auxiliary film-penetrating path and is located between the fourth pulley and the fifth pulley.

[0018] In a preferred embodiment, the first roller group further includes a first flattening roller and a first tension roller, and the first guide roller, the first flattening roller and the first tension roller are sequentially arranged along the base film transmission path;

[0019] And / or, the second roller group also includes a second tension roller, a second flattening roller and a third tension roller, and the second tension roller, the second guide roller, the third guide roller, the second flattening roller, the fourth guide roller and the third tension roller are arranged in sequence along the base film transmission path.

[0020] In a preferred embodiment, the winding system further includes a third roller group, the magnetron sputtering machine further includes a first roller group and a second roller group, the first roller group, the first main drum, the second roller group, the second main drum, the third roller group and the auxiliary roller are sequentially arranged along the base film transmission path, and the third roller group includes a fifth guide roller;

[0021] The multiple membrane-penetrating wheels in the second auxiliary membrane-penetrating mechanism include a seventh pulley, an eighth pulley, a second tensioning pulley, a ninth pulley, a tenth pulley and an eleventh pulley which are sequentially arranged along the auxiliary membrane-penetrating path.

[0022] In a preferred embodiment, the third roller group further includes a fourth tension roller and a third flattening roller, and the fourth tension roller, the third flattening roller and the fifth guide roller are sequentially arranged along the base film transmission path.

[0023] In a preferred embodiment, the film-penetrating traction assembly includes two sets of parallel and spaced belts; when assisting in film penetration, both sides of the base film are bonded to the two sets of belts respectively.

[0024] In a preferred embodiment, the auxiliary flattening mechanism includes:

[0025] The swing arm assembly includes a main shaft, a swing arm, and a swing arm driver. The swing arm driver is connected to the main shaft and drives the main shaft to rotate around its axis. The main shaft is connected to the swing arm and drives the swing arm to swing. Both ends of the auxiliary roller are rotatably connected to the swing arm.

[0026] The swing arm swings when the winding roller is reeled in and unreeled to adjust the distance between the auxiliary roller and the surface of the film roll on the corresponding winding roller.

[0027] In a preferred embodiment, the main shaft includes a first sub-shaft, a second sub-shaft, a first support tube and a second support tube connected in sequence, a portion of the first sub-shaft is located outside the vacuum coating chamber and connected to the swing arm drive, and the other portion is located inside the vacuum coating chamber and connected to the second sub-shaft.

[0028] In a preferred embodiment, the swing arm includes a first swing arm and a second swing arm, the second sub-shaft and the first support tube clamp the first swing arm and fasten it through a first fastener, the first support tube and the second support tube clamp the second swing arm and fasten it through a second fastener, and the two ends of the auxiliary roller are respectively rotatably connected to the first swing arm and the second swing arm.

[0029] In a preferred embodiment, the auxiliary flattening mechanism also includes a first support plate and a second support plate, the first support plate supports the second sub-shaft, the second support plate supports the second support tube, the second sub-shaft is rotatably connected to the first support plate, and the second support plate is rotatably connected to the second support tube.

[0030] In a preferred embodiment, the auxiliary flattening mechanism further includes a sealing member, and the sealing member is provided at the connection position between the first sub-shaft and the vacuum coating chamber;

[0031] And / or, the auxiliary flattening mechanism further includes a coupling, and the first sub-shaft and the second sub-shaft are connected via the coupling.

[0032] In a preferred embodiment, the swing arm assembly further includes a bracket and a connecting piece, the bracket is connected to the outer wall of the vacuum coating chamber, the swing arm driving member includes a cylinder, the cylinder body of the cylinder is rotatably connected to the bracket, the piston rod of the cylinder is rotatably connected to the connecting piece, and the connecting piece is connected to the main shaft and rotates synchronously with the main shaft;

[0033] And / or, the auxiliary flattening mechanism further includes a mechanical limiting structure, wherein the mechanical limiting structure is configured to abut against the swing arm to limit the swing range of the swing arm;

[0034] And / or, the swing arm driving component is arranged outside the vacuum coating chamber, and the main shaft passes through the cavity wall of the vacuum coating chamber and is connected to the swing arm driving component.

[0035] In a preferred embodiment, the auxiliary rollers include a first auxiliary roller and a second auxiliary roller, both ends of the first auxiliary roller and the second auxiliary roller are rotatably connected to the swing arm, the axis of the first auxiliary roller is parallel to the axis of the second auxiliary roller, the distance between the first auxiliary roller and the main shaft is greater than the distance between the second auxiliary roller and the main shaft, and the second auxiliary roller is arranged on the base film transmission path;

[0036] Alternatively, the auxiliary roller includes a first auxiliary roller and a second auxiliary roller, both ends of the first auxiliary roller and the second auxiliary roller are rotatably connected to the swing arm, the axis of the first auxiliary roller is parallel to the axis of the second auxiliary roller, the distance between the first auxiliary roller and the main shaft is greater than the distance between the second auxiliary roller and the main shaft, and the second auxiliary roller is arranged on the base film transmission path; wherein, the position of the second auxiliary roller on the swing arm is adjustable.

[0037] In a preferred embodiment, the auxiliary roller includes an unwinding auxiliary roller and a winding auxiliary roller, and the auxiliary flattening mechanism includes an unwinding auxiliary flattening mechanism and a winding auxiliary flattening mechanism. The unwinding auxiliary roller is arranged on one side of the unwinding roller, and the winding auxiliary roller is arranged on one side of the winding roller. The unwinding auxiliary roller adjusts the distance from the surface of the film roll on the unwinding roller when the unwinding roller is unwinding; the winding auxiliary roller adjusts the distance from the surface of the film roll on the winding roller when the winding roller is winding.

[0038] In a preferred embodiment, the magnetron sputtering machine further includes a movable carriage, the winding system is fixed to a side wall of the movable carriage, and a chamber door for opening or closing the vacuum coating chamber is further provided between the winding system and the movable carriage;

[0039] And / or, the magnetron sputtering machine also includes a first vacuum pump and a second vacuum pump, both of which are connected to the vacuum coating chamber, the first vacuum pump is used to evacuate the vacuum coating chamber to a first vacuum state, the first vacuum pump and the second vacuum pump are used to evacuate the vacuum coating chamber from the first vacuum state to a second vacuum state, and the vacuum degree of the second vacuum state is greater than the vacuum degree of the first vacuum state.

[0040] In a preferred embodiment, the magnetron sputtering machine further includes a deflection correction sensor, which is disposed in the vacuum coating chamber and located on one side of the base film transmission path, and is used to detect the position of the base film during transmission of the base film;

[0041] And / or, the auxiliary flattening mechanism further includes a distance sensor, which is provided on the auxiliary roller and is used to detect the distance between the auxiliary roller and the surface of the film roll on the winding roller.

[0042] Based on the same inventive concept, the present application also provides a vacuum coating method, which is applied to the above-mentioned magnetron sputtering machine. The vacuum coating method includes the following steps:

[0043] Placing a film roll on the unwinding roller; wherein the film roll is formed by winding a base film;

[0044] Using the auxiliary membrane-penetrating mechanism to pull the basement membrane to move along the auxiliary membrane-penetrating path, and to pull the basement membrane to the basement membrane transmission path;

[0045] The base film is wound using the winding roller and unwound using the unwinding roller, so that the base film moves along the base film transmission path; at the same time, the surface of the base film is coated, and the distance between the auxiliary roller and the corresponding film roll surface on the winding roller is adjusted during coating.

[0046] From the above description, it can be seen that the magnetron sputtering machine provided in the present application is equipped with an auxiliary film penetration mechanism and an auxiliary flattening mechanism. The auxiliary film penetration mechanism can replace manual film penetration, improve the film penetration efficiency and quality, and thus improve production efficiency. The auxiliary flattening mechanism can adjust the free span of the auxiliary roller and the film roll surface on the winding roller when winding and unwinding, thereby achieving flattening of the base film, reducing wrinkles generated during coating, improving film quality, and improving the performance of the magnetron sputtering machine. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] In order to more clearly illustrate the technical solutions in this application or related technologies, the following briefly introduces the drawings required for use in the embodiments or related technical descriptions. Obviously, the drawings described below are merely embodiments of this application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0048] Figure 1 This is an axonometric diagram of a magnetron sputtering machine in one embodiment of the present application;

[0049] Figure 2 This is a schematic diagram of the structural decomposition of a magnetron sputtering machine in one embodiment of the present application;

[0050] Figure 3 This is a schematic diagram of the partial structure of a magnetron sputtering machine in one embodiment of the present application;

[0051] Figure 4 Schematic diagram of a winding system in one embodiment of the present application Figure 1 ;

[0052] Figure 5 Schematic diagram of a winding system in one embodiment of the present application Figure 2 ;

[0053] Figure 6 This is a schematic diagram of the assembly of the auxiliary flattening mechanism in one embodiment of the present application;

[0054] Figure 7 This is a schematic diagram of the overall structure of the auxiliary flattening mechanism in one embodiment of the present application;

[0055] Figure 8This is a structural diagram of a swing arm assembly in one embodiment of the present application;

[0056] Figure 9 This is a schematic diagram of the assembly of the auxiliary flattening mechanism in another embodiment of the present application;

[0057] Figure 10 This is a flow chart of a vacuum coating method in another embodiment of the present application.

[0058] Reference numerals

[0059] 100, magnetron sputtering machine; 10, winding roller; 101, unwinding roller; 102, first main drum; 103, second main drum; 104, take-up roller; 105, base film; 106, deflection correction sensor; 20, cathode; M, base film transmission path; M1, first sub-transmission path; M2, second sub-transmission path; M3, third sub-transmission path; N, auxiliary film transmission path; N1, first auxiliary film transmission path; N2, second auxiliary film transmission path;

[0060] 110, first roller group; 111, first guide roller; 112, first flattening roller; 113, first tension roller;

[0061] 120, second roller group; 121, second guide roller; 122, third guide roller; 123, fourth guide roller; 124, second tension roller; 125, second flattening roller; 126, third tension roller;

[0062] 130, third roller group; 131, fifth guide roller; 132, fourth tension roller; 133, third flattening roller;

[0063] 141. First tensioner; 142. First pulley; 143. Second pulley; 144. Third pulley; 145. Fourth pulley; 146. Fifth pulley; 147. Sixth pulley;

[0064] 151, seventh pulley; 152, eighth pulley; 153, second tensioning pulley; 154, ninth pulley; 155, tenth pulley; 156, eleventh pulley;

[0065] 160. Belt;

[0066] 200, auxiliary flattening mechanism; 201, seal; 202, coupling;

[0067] 210, main shaft; 211, first sub-shaft; 212, second sub-shaft; 213, first support tube; 214, second support tube;

[0068] 220, swing arm assembly; 221, swing arm; 2211, first swing arm; 2212, second swing arm; 222, swing arm driving member; 2221, cylinder; 2222, piston rod; 223, first fastener; 224, second fastener; 225, bracket; 226, connecting member;

[0069] 230, auxiliary roller; 231, first auxiliary roller; 232, second auxiliary roller; 250, distance sensor; 260, first support plate; 270, second support plate; 280, mechanical limit structure;

[0070] 300, vacuum coating chamber; 310, chamber door; 320, chamber wall; 400, winding system; 500, mobile trolley; 610, first vacuum pump; 611, vacuum pipe; 620, second vacuum pump; 700, cooling system. DETAILED DESCRIPTION

[0071] In order to make the objectives, technical solutions and advantages of this application more clear, this application is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0072] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present application should have the usual meanings understood by people with ordinary skills in the field to which this application belongs. The "first", "second" and similar words used in the embodiments of the present application do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0073] Reference Figure 1-5 As shown, an embodiment of the present application discloses a magnetron sputtering machine 100 , including a vacuum coating chamber 300 and a winding system 400 , wherein the winding system 400 includes a winding roller 10 , an auxiliary film-threading mechanism, and an auxiliary flattening mechanism 200 .

[0074] The winding roller is arranged in the vacuum coating chamber 300, and the winding roller 10 includes a unwinding roller 101 and a winding roller 104, and a base film transmission path M is formed between the unwinding roller 101 and the winding roller 104; the auxiliary film penetration mechanism is arranged in the vacuum coating chamber 300, and the auxiliary film penetration mechanism forms an auxiliary film penetration path N. The auxiliary film penetration mechanism is used to pull the base film 105 along the auxiliary film penetration path N and pull the base film 105 to the base film transmission path M; the auxiliary flattening mechanism 200 is at least partially arranged in the vacuum coating chamber 300, and the auxiliary flattening mechanism 200 includes an auxiliary roller 230. The auxiliary roller 230 is arranged on the base film transmission path M, and the position of the auxiliary roller 230 can be adjusted to adjust the distance from the surface of the film roll on the corresponding winding roller 10 when the winding roller 10 is unwound.

[0075] Specifically, the auxiliary roller 230 can be provided corresponding to the unwinding roller 101 , and the position of the auxiliary roller 230 can be adjusted to adjust the distance from the surface of the film roll on the unwinding roller 101 when the unwinding roller 101 is unwinding.

[0076] Alternatively, the auxiliary roller 230 is provided corresponding to the winding roller 104 , and the position of the auxiliary roller 230 is adjustable to adjust the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 104 when the winding roller 104 is winding.

[0077] Alternatively, one group of auxiliary rollers 230 is set corresponding to the unwinding roller 101, and another group of auxiliary rollers 230 is set corresponding to the winding roller 104. One group of auxiliary rollers 230 adjusts the distance from the surface of the film roll on the unwinding roller 101 when the unwinding roller 101 is unwinding, and the other group of auxiliary rollers 230 adjusts the distance from the surface of the film roll on the winding roller 104 when winding.

[0078] The magnetron sputtering machine 100 provided in the present application is provided with an auxiliary film penetration mechanism and an auxiliary flattening mechanism 200. The auxiliary film penetration mechanism can replace manual film penetration, improve the film penetration efficiency and quality, and thus improve production efficiency. The auxiliary flattening mechanism 200 can adjust the free span between the auxiliary roller 230 and the film roll surface on the winding roller 10 when winding and unwinding, thereby achieving flattening of the base film 105, reducing wrinkles generated during coating, improving film quality, and improving the performance of the magnetron sputtering machine.

[0079] Among them, when winding and unwinding, the diameter of the film roll on the winding roller 10 will change. The auxiliary roller 230 adjusts the distance from the corresponding film roll surface on the winding roller 10 when the winding roller 10 is wound and unwound, thereby reducing the free span between the auxiliary roller 230 and the film roll surface on the winding roller 10, and reducing the wrinkles generated during coating.

[0080] Before coating, the auxiliary film-passing mechanism pulls the base film 105 along the auxiliary film-passing path N and onto the base film transport path M. During coating, the film is unwound using the unwinding roller 101 and rewound using the rewinding roller 104. Argon gas is filled into the vacuum coating chamber 300, and a high-voltage direct current is applied between the target material on the cathode and the anode chamber. A magnetic rod inside the target material generates a magnetronized glow discharge. Under the influence of the electric field, electrons collide with the incoming argon atoms, generating argon ions and electrons. The incident argon ions bombard the target material, depositing atoms from the target material on the surface of the base film 105, completing the coating on one side of the base film 105. Simultaneously, the distance between the auxiliary roller 230 and the film roll surface on the corresponding winding roller 10 is adjusted to flatten the base film 105 and reduce wrinkles caused by coating.

[0081] Reference Figure 1-2 As shown, in one embodiment, the magnetron sputtering machine 100 further includes a movable carriage 500. The winding system 400 is fixed to a side wall of the movable carriage 500. A chamber door 310 for opening or closing the vacuum coating chamber 300 is disposed between the winding system 400 and the movable carriage 500. The chamber door 310 is disposed on the movable carriage 500. As the movable carriage 500 drives the winding system 400 in and out of the vacuum coating chamber 300, the chamber door 310 is simultaneously closed and opened, thereby improving production efficiency.

[0082] Specifically, during coating, the film roll is placed on the unwinding roller 101. The mobile carriage 500 moves, driving the winding system 400 into the vacuum coating chamber 300. Coating can then begin when the chamber door 310 closes. After coating is complete, the mobile carriage 500 moves, driving the chamber door 310 to open, allowing the winding system 400 to exit the vacuum coating chamber 300 and remove the coated film roll from the winding roller 104.

[0083] Reference Figure 1-2 As shown, in one embodiment, the magnetron sputtering machine 100 further includes a first vacuum pump 610 and a second vacuum pump 620, both of which are connected to the vacuum coating chamber 300. The first vacuum pump 610 is used to evacuate the vacuum coating chamber 300 to a first vacuum state, and the first vacuum pump 610 and the second vacuum pump 620 are used to evacuate the vacuum coating chamber 300 from the first vacuum state to a second vacuum state, wherein the vacuum degree of the second vacuum state is greater than the vacuum degree of the first vacuum state.

[0084] Specifically, the first vacuum pump 610 performs a first evacuation of the vacuum coating chamber 300, bringing the vacuum coating chamber 300 to a low vacuum environment. Then, the second vacuum pump 620 is turned on and, simultaneously with the first vacuum pump 610, performs a second evacuation of the vacuum coating chamber 300, bringing the vacuum coating chamber 300 to a high vacuum environment. Optionally, the second vacuum pump 620 is a molecular pump. The first vacuum pump 610 brings the vacuum coating chamber 300 to a low vacuum environment, creating the necessary conditions for the molecular pump to start.

[0085] Among them, the molecular pump is a precision exhaust device that exchanges momentum with gas molecules through a high-speed rotating rotor (the speed can reach thousands to tens of thousands of revolutions per minute), and pushes the gas molecules to the exhaust port in a direction to obtain high vacuum (10-1Pa) or even ultra-high vacuum (10-10Pa). Its core principle is to use the collision between the rotor and the gas molecules to transfer momentum and realize the directional migration of the gas. According to the structure, it can be divided into turbomolecular pumps, traction molecular pumps and compound molecular pumps (combining the advantages of the first two). It has the characteristics of high pumping speed, high ultimate vacuum degree and no oil pollution. Since it cannot be started directly under high pressure, it needs to be pre-vacuumed with a rough vacuum pump (such as a mechanical pump) to create a low-pressure starting environment for it. It is widely used in semiconductor manufacturing, vacuum coating, aerospace, scientific research experiments and other fields with strict vacuum requirements. It is a key equipment for achieving ultra-high vacuum environment.

[0086] Reference Figure 1-2 As shown, in one embodiment, the magnetron sputtering machine 100 includes multiple first vacuum pumps 610. The multiple first vacuum pumps 610 are connected to the vacuum coating chamber 300 via a vacuum pipe 611. The multiple first vacuum pumps 610 operate simultaneously to improve vacuuming efficiency. For example, the number of first vacuum pumps 610 is two, three, four, etc., but this is not limited to a specific number.

[0087] Reference Figure 1-2 As shown, in one embodiment, the magnetron sputtering machine 100 includes multiple second vacuum pumps 620. The multiple second vacuum pumps 620 are spaced apart along the circumference of the vacuum coating chamber 300. The multiple second vacuum pumps 620 operate simultaneously to ensure the vacuum level of the vacuum coating chamber 300 and improve the efficiency of vacuuming. For example, the number of second vacuum pumps 620 is two, three, four, five, six, etc., and the specific number is not limited thereto.

[0088] In one embodiment, referring to Figure 2 As shown, the magnetron sputtering machine 100 further includes a cooling system 700, which is used to absorb heat generated during vacuum coating to prevent damage to the base film 105. The cooling system 700 can be water-cooled or air-cooled. Optionally, the cooling system 700 includes a cooling circulation pipe containing a coolant (e.g., water) to remove heat from the vacuum coating chamber 300 through the circulation of the coolant.

[0089] Reference Figure 4-5 As shown, in one embodiment, the auxiliary membrane penetration mechanism includes a membrane penetration drive, multiple membrane penetration wheels and a membrane penetration traction assembly. The membrane penetration traction assembly is wound around the multiple membrane penetration wheels and forms an auxiliary membrane penetration path N. The membrane penetration drive is connected to the membrane penetration wheel and drives the membrane penetration wheel to rotate. The membrane penetration wheel drives the membrane penetration traction assembly to move along the auxiliary membrane penetration path N. When the membrane penetration traction assembly moves, it pulls the base film 105 to the base film transmission path M.

[0090] Specifically, film penetration is required before coating. During film penetration, the base film 105 is pulled out from the unwinding roller 101 and fixed on the film penetration traction assembly; then, the film penetration wheel is driven to rotate by the film penetration drive component, and the film penetration wheel drives the film penetration traction assembly to move along the auxiliary film penetration path N, and the film penetration traction assembly pulls the base film 105 to move; then, the base film 105 is tightened so that the base film 105 reaches the base film transmission path M.

[0091] Optionally, the auxiliary membrane penetration path N forms multiple intersections with the base membrane transmission path M. It can be understood that the membrane penetration traction component pulls the base membrane 105 back and forth on both sides of the base membrane transmission path M, so that the base membrane 105 reaches the base membrane transmission path M after the base membrane 105 is tightened.

[0092] Reference Figure 5 As shown, in one embodiment, the film-threading traction assembly includes two sets of parallel and spaced belts 160; during auxiliary film threading, the two sides of the base film 105 are bonded to the two sets of belts 160. The two sides of the base film 105 refer to the positions on the base film 105 near the side edges of the base film 105, which are located between the center and the side edges of the base film 105. It should be noted that during film threading, only the two sides of the starting section of the base film 105 need to be bonded to the two sets of belts 160, and the rear portion of the starting section of the base film 105 does not need to be bonded to the belts 160. The belts 160 drive the starting section of the base film 105 to move along the auxiliary film threading path N, and then when the base film 105 is tightened, the base film 105 is tightened and reaches the base film transmission path M. Optionally, the two sides of the base film 105 are bonded to the belts via tape. Optionally, the film threading drive member is a rotary motor or a rotary cylinder.

[0093] In another embodiment, instead of using a belt, the film-threading traction assembly may include two sets of parallel, spaced chains. During auxiliary film threading, the two sides of the base film 105 are bonded to the two sets of chains. It should be noted that during film threading, only the two sides of the initial segment of the base film 105 need to be bonded to the two sets of chains. The portion of the base film 105 extending from the initial segment does not need to be bonded to the chains. The chains drive the initial segment of the base film 105 along the auxiliary film threading path N. When the base film 105 is tightened, the base film 105 is tightened and reaches the base film transmission path M.

[0094] In one embodiment, the base film transfer path M includes multiple sub-transfer paths, and the magnetron sputtering machine 100 includes at least one auxiliary film-penetrating mechanism. The at least one auxiliary film-penetrating mechanism forms multiple auxiliary film-penetrating paths N to meet the film-penetrating requirements of different sub-transfer paths. Adjacent sub-transfer paths may also share a single auxiliary film-penetrating mechanism.

[0095] Reference Figure 3-5 As shown, in one embodiment, the magnetron sputtering machine 100 also includes a first main drum 102 and a second main drum 103 arranged in sequence along the base film transmission path M. The first main drum 102 and the second main drum 103 serve to cool the base film 105. The base film 105 is coated on the first side when passing through the first main drum 102, and is coated on the second side when passing through the second main drum 103, thereby achieving double-sided coating.

[0096] The multiple sub-transmission paths of the base film transmission path M include a first sub-transmission path M1 located between the unwinding roller 101 and the first main drum 102, a second sub-transmission path M2 located between the first main drum 102 and the second main drum 103, and a third sub-transmission path M3 located between the second main drum 103 and the winding roller 104.

[0097] The multiple auxiliary film-penetrating mechanisms include a first auxiliary film-penetrating mechanism and a second auxiliary film-penetrating mechanism. The first auxiliary film-penetrating mechanism is partially arranged between the unwinding roller 101 and the first main drum 102, and partially arranged between the first main drum 102 and the second main drum 103. The second auxiliary film-penetrating mechanism is arranged between the second main drum 103 and the winding roller 104.

[0098] The auxiliary film penetration path N corresponding to the first auxiliary film penetration mechanism is partially located between the unwinding roller 101 and the first main drum 102, partially overlaps with the base film transmission path M on the first main drum 102, and partially is located between the first main drum 102 and the second main drum 103; the auxiliary film penetration path N corresponding to the second auxiliary film penetration mechanism is located between the second main drum 103 and the winding roller 104.

[0099] The first auxiliary film-penetrating mechanism realizes film penetration between the unwinding roller 101 and the second main drum 103 , and the second auxiliary film-penetrating mechanism realizes film penetration between the second main drum 103 and the winding roller 104 .

[0100] The magnetron sputtering machine 100 further includes a first main drum driver and a second main drum driver. The first main drum driver is connected to the first main drum 102 for driving the first main drum 102 to rotate, and the second main drum driver is connected to the second main drum 103 for driving the first main drum 102 to rotate. Optionally, the first main drum driver is a rotary motor or a rotary cylinder, and the second main drum driver is a rotary motor or a rotary cylinder, etc.

[0101] Reference Figure 3As shown, in one embodiment, the magnetron sputtering machine 100 further includes a cathode 20, and a plurality of cathodes 20 are arranged around the first main drum 102 and the second main drum 103, and the distances between different cathodes 20 and the first main drum 102 or the second main drum 103 are equal to ensure the uniformity of the coating at each position.

[0102] In one embodiment, there is one ion source, one base target, and eight finished targets on the left and right sides of the cathode 20. The base target uses an alloy as the first layer material on the base film 105 to increase the bonding strength between the base film 105 and the required metal; the finished target material is consistent with the required film-forming surface metal material, and multiple targets are provided to increase the required metal thickness.

[0103] In one embodiment, the magnetron sputtering machine 100 further includes an electrostatic power supply for firmly adsorbing the base film 105 on the surfaces of the first main drum 102 and the second main drum 103 .

[0104] Reference Figure 3-5 As shown, in one embodiment, the magnetron sputtering machine 100 also includes a first roller group 110 and a second roller group 120, the auxiliary roller 230, the first roller group 110, the first main drum 102, the second roller group 120 and the second main drum 103 are arranged in sequence along the base film transmission path M, the first roller group 110 includes a first guide roller 111; the second roller group 120 includes a second guide roller 121, a third guide roller 122, and a fourth guide roller 123 which are arranged in sequence along the base film transmission path M; the multiple film-penetrating wheels in the first auxiliary film-penetrating mechanism include a first tensioning wheel 141, a first pulley 142, a second pulley 143, a third pulley 144, a fourth pulley 145, a fifth pulley 146 and a sixth pulley 147 which are arranged in sequence along the auxiliary film-penetrating path N.

[0105] The first guide roller 111 is disposed in the auxiliary film-threading path N and is located between the first tensioning pulley 141 and the sixth pulley 147. The second guide roller 121 and the third guide roller 122 are disposed in the auxiliary film-threading path N and are located between the third pulley 144 and the fourth pulley 145. The fourth guide roller 123 is disposed in the auxiliary film-threading path N and is located between the fourth pulley 145 and the fifth pulley 146. The first tensioning pulley 141 serves to tighten the belt 160.

[0106] During film threading, the first auxiliary film threading mechanism winds the base film 105 onto the first guide roller 111 , the first main drum 102 , the second guide roller 121 , the third guide roller 122 and the fourth guide roller 123 .

[0107] Reference Figure 3-5As shown, in one embodiment, the first roller assembly 110 further includes a first flattening roller 112 and a first tensioning roller 113. The first guide roller 111, the first flattening roller 112, and the first tensioning roller 113 are sequentially arranged along the base film transport path M (specifically, M1 described above). The first flattening roller 112 flattens the base film 105, while the first tensioning roller 113 adjusts the tension of the base film 105. Furthermore, the signal collected by the first tensioning roller 113 is used to adjust the unwinding speed.

[0108] In one embodiment, the second roller assembly 120 further includes a second tension roller 124, a second flattening roller 125, and a third tension roller 126. The second tension roller 124, the second guide roller 121, the third guide roller 122, the second flattening roller 125, the fourth guide roller 123, and the third tension roller 126 are sequentially arranged along the base film transport path M (specifically, M2 described above). The second flattening roller 125 flattens the base film 105, and the second tension roller 124 adjusts the tension of the base film 105. Furthermore, the signals collected by the second tension roller 124 and the third tension roller 126 are used to adjust the second guide roller 121, the third guide roller 122, the second flattening roller 125, and the fourth guide roller 123.

[0109] Reference Figure 3-5 As shown, in one embodiment, the magnetron sputtering machine further includes a third roller group 130. The first roller group 110, the first main drum 102, the second roller group 120, the second main drum 103, the third roller group 130, and the auxiliary rollers 230 are sequentially arranged along the base film transmission path M. The third roller group 130 includes a fifth guide roller 131. The multiple film-threading pulleys in the second auxiliary film-threading mechanism include a seventh pulley 151, an eighth pulley 152, a second tensioning pulley 153, a ninth pulley 154, a tenth pulley 155, and an eleventh pulley 156, sequentially arranged along the auxiliary film-threading path N. During film threading, the second auxiliary film-threading mechanism winds the base film 105 around the fifth guide roller 131. The second tensioning pulley 153 serves to tension the belt 160.

[0110] In one embodiment, the third roller assembly 130 further includes a fourth tension roller 132 and a third flattening roller 133. The fourth tension roller 132, the third flattening roller 133, and the fifth guide roller 131 are sequentially arranged along the base film transport path M (specifically, M3). The third flattening roller 133 flattens the base film 105, while the fourth tension roller 132 adjusts the tension of the base film 105. Furthermore, the signal collected by the fourth tension roller 132 is used to adjust the winding speed.

[0111] Specifically, the auxiliary transmembrane path N includes a first auxiliary transmembrane path N1 and a second auxiliary transmembrane path N2, wherein the first auxiliary transmembrane path N1 forms a first closed ring, and the second auxiliary transmembrane path N2 forms a second closed ring, wherein the first closed ring and the second closed ring can be irregular rings.

[0112] The first tension roller 113, the fourth guide roller 123, the second tension roller 124, and the second flattening roller 125 are located outside the first closed ring; the first guide roller 111, the first flattening roller 112, the second guide roller 121, the third guide roller 122, and the third tension roller 126 are located inside the first closed ring.

[0113] The fifth guide roller 131 and the third flattening roller 133 are located outside the second closed ring, and the fourth tension roller 132 is located inside the second closed ring.

[0114] During the auxiliary film threading process, both sides of the starting section of the base film 105 are first bonded to the two sets of belts 160. The first auxiliary film threading mechanism is activated, and the base film driving member drives the belts 160 to move. Simultaneously, the first main drum driving member is activated and drives the first main drum 102 to rotate, transferring the starting section of the base film 105 to the sixth pulley 147. Specifically, driven by the belts 160, the base film 105 moves along the first auxiliary film threading path N1, first passing between the first flattening roller 112 and the first tensioning roller 113, then being wound around the first main drum 102, then passing between the second guide roller 121 and the second tensioning roller 124, then between the third guide roller 122 and the second flattening roller 125, and finally between the fourth guide roller 123 and the third tensioning roller 126.

[0115] Then, the starting section of the base film 105 is removed and adhered to the second main drum 103. The second main drum driving member is turned on and drives the second main drum 103 to rotate, tightening the base film 105 and transferring the starting section of the base film 105 to a position near the seventh pulley 151. At this point, the base film 105 has passed from the first auxiliary mold-threading path N1 to the first sub-transfer path M1 and the second sub-transfer path M2.

[0116] Then, the starting section of the base film 105 is removed and adhered to the seventh pulley 151. The second auxiliary film-threading mechanism is activated, and the base film driving member drives the belt 160 to move, transferring the starting section of the base film 105 to a position near the winding roller 104. Specifically, driven by the belt 160, the base film 105 moves along the second auxiliary film-threading path N2, first passing between the fourth tension roller 132 and the third flattening roller 133, and then passing between the third flattening roller 133 and the fifth guide roller 131.

[0117] Then, the starting section of the base film 105 is removed and adhered to the winding roller 104, and the winding roller 104 is driven to rotate to tighten the base film 105. At this time, the base film 105 reaches the third sub-transmission path M3 from the second auxiliary mold-passing path N2.

[0118] As can be seen from the above description, in this embodiment, the first auxiliary film-threading mechanism is used for both the film threading between the unwinding roller 101 and the first main drum 102 and the film threading between the unwinding roller 101 and the first main drum 102. In another embodiment, a separate auxiliary film-threading mechanism can be provided for the film threading between the unwinding roller 101 and the first main drum 102, and a separate auxiliary film-threading mechanism can be provided for the film threading between the first main drum 102 and the second main drum 103.

[0119] Reference Figure 3-5 As shown, in one embodiment, the magnetron sputtering machine 100 further includes a deflection correction sensor 106, which is disposed on one side of the base film transport path M. The deflection correction sensor 106 is used to detect the position of the base film 105 during transport, allowing for real-time adjustment of the base film 105 to achieve deflection correction. Specifically, the deflection correction sensor 106 is disposed on one side of the base film 105 to detect the position of the side edge of the base film 105 and compare it with a preset reference position to determine the deflection of the base film 105. If the deflection is excessive, deflection correction is achieved by adjusting the unwinding roller 101 and / or the winding roller 104 in the axial direction.

[0120] Furthermore, a correction sensor 106 is provided on one side of the first sub-transmission path M1, and is located near the unwinding roller 101 to correct the unwinding. A correction sensor 106 is provided on one side of the third sub-transmission path M3, and is located near the winding roller 104 to correct the winding.

[0121] Reference Figure 6-8 As shown, in one embodiment, the auxiliary flattening mechanism 200 further includes a swing arm assembly 220, which includes a main shaft 210, a swing arm 221, and a swing arm driver 222. The swing arm driver 222 is connected to the main shaft 210 and drives the main shaft 210 to rotate about the axis Q of the main shaft 210. The main shaft 210 is connected to the swing arm 221 and drives the swing arm 221 to swing. Both ends of the auxiliary roller 230 are rotatably connected to the swing arm 221. Furthermore, the axis of the auxiliary roller 230 is parallel to the axis of the main shaft 210.

[0122] The auxiliary roller 230 is arranged on the transmission path of the base film 105 , and the swing arm 221 swings when the winding roller 10 is reeled in and unreeled to adjust the distance between the auxiliary roller 230 and the film roll surface on the winding roller 10 .

[0123] The auxiliary flattening mechanism 200 provided in this embodiment is provided with a swing arm assembly 220, and uses the swing arm 221 to swing when the winding roller 10 is reeled in and unreeled, so as to adjust the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10, thereby reducing the free span between the auxiliary roller 230 and the surface of the film roll on the winding roller 10 and reducing the wrinkles generated during coating.

[0124] Specifically, the swing arm 221 swings when the winding roller 10 is reeled in or unreeled to adjust the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10, so that the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10 is maintained at a target distance. The target distance can be a fixed value or a range of values.

[0125] In one embodiment, the auxiliary roller 230 includes a first auxiliary roller 231 and a second auxiliary roller 232, both ends of the first auxiliary roller 231 and the second auxiliary roller 232 are rotatably connected to the swing arm 221, the axis of the first auxiliary roller 231 is parallel to the axis of the second auxiliary roller 232, the distance between the first auxiliary roller 231 and the main shaft 210 is greater than the distance between the second auxiliary roller 232 and the main shaft 210, and the second auxiliary roller 232 is arranged on the transmission path of the base film.

[0126] The second auxiliary roller 232 serves as a transition between the first auxiliary roller 231 and the other guide rollers, reducing the free span between the first auxiliary roller 231 and the other guide rollers and minimizing wrinkles during coating. Furthermore, because the distance between the second auxiliary roller 232 and the main shaft 210 is smaller than the distance between the first auxiliary roller 231 and the main shaft 210 (the distance between the first auxiliary roller 231 and the main shaft 210 is d1, and the distance between the second auxiliary roller 232 and the main shaft 210 is d2), d2 > d1. During swinging, at the same swing / rotation angle, the second auxiliary roller 232 exhibits less positional variation relative to the first auxiliary roller 231, facilitating smoothing of the base film 105.

[0127] Optionally, the position of the second auxiliary roller 232 on the swing arm 221 is adjustable. For example, the swing arm 221 is provided with a U-shaped groove, and the end of the second auxiliary roller 232 can be adjusted within the U-shaped groove and secured with bolts or the like. Alternatively, the swing arm 221 is provided with multiple mounting holes along its length that mate with the second auxiliary roller 232. The second auxiliary roller 232 can be mounted in different mounting holes to adjust its position.

[0128] Reference Figure 7As shown, in one embodiment, the main shaft 210 includes a first sub-shaft 211, a second sub-shaft 212, a first support tube 213, and a second support tube 214, which are connected in sequence. A portion of the first sub-shaft 211 is located outside the vacuum coating chamber 300 and connected to the swing arm driver 222, while another portion is located inside the vacuum coating chamber 300 and connected to the second sub-shaft 212. The main shaft 210 is configured in multiple sections to facilitate installation and commissioning.

[0129] Reference Figure 7 As shown, in one embodiment, the swing arm 221 includes a first swing arm 2211 and a second swing arm 2212. The second split shaft 212 and the first support tube 213 clamp the first swing arm 2211 and fasten it via a first fastener 223. The first support tube 213 and the second support tube 214 clamp the second swing arm 2212 and fasten it via a second fastener 224. The first auxiliary roller 231 is rotatably connected to the first and second swing arms 2211 and 2212 at both ends, and the second auxiliary roller 232 is rotatably connected to the first and second swing arms 2211 and 2212 at both ends. Optionally, the first fastener 223 is a bolt or screw, and the second fastener 224 is a bolt or screw, for ease of assembly and disassembly. The first and second swing arms 2211 and 2212 are spaced apart and arranged parallel to each other, and can swing synchronously under the action of the swing arm driver 222.

[0130] The first auxiliary roller 231 supports the first swing arm 2211 and the second swing arm 2212 .

[0131] Optionally, both ends of the first auxiliary roller 231 are rotatably connected to the first swing arm 2211 and the second swing arm 2212 via bearings, and both ends of the second auxiliary roller 232 are rotatably connected to the first swing arm 2211 and the second swing arm 2212 via bearings. The second auxiliary roller 232 also supports the first swing arm 2211 and the second swing arm 2212 to increase structural stability.

[0132] Reference Figure 7 As shown, in one embodiment, the auxiliary flattening mechanism 200 further includes a first support plate 260 and a second support plate 270. The first support plate 260 supports the second sub-shaft 212, and the second support plate 270 supports the second support tube 214. The second sub-shaft 212 is rotatably connected to the first support plate 260, and the second support plate 270 is rotatably connected to the second support tube 214. Optionally, the first support plate 260 and the second support plate 270 are connected to the bottom of the vacuum coating chamber 300 to provide stable support for the second sub-shaft 212 and the second support tube 214, thereby ensuring the stability of the main shaft 210 during rotation.

[0133] Reference Figure 7As shown, in one embodiment, the auxiliary flattening mechanism 200 further includes a seal 201. The connection between the first sub-shaft 211 and the vacuum coating chamber 300 is connected to the vacuum coating chamber 300 via the seal 201. The seal 201 can prevent leakage from the vacuum coating chamber 300. Optionally, the seal 201 can be a mechanical seal, a sealing packing, or the like. Furthermore, when the seal 201 is a mechanical seal, as an example, the seal 201 can include a sealing ring.

[0134] Optionally, the seal 201 is sealed with magnetic fluid. Furthermore, the seal 201 can be configured with water cooling according to the design temperature to achieve cooling of the seal 201 and avoid structural damage caused by excessive temperature, which affects the service life.

[0135] Reference Figure 7 As shown, in one embodiment, the auxiliary flattening mechanism 200 further includes a coupling 202, which connects the first sub-shaft 211 and the second sub-shaft 212 to facilitate disassembly. The coupling 202 can be a diaphragm coupling to facilitate adjustment of axial, radial, and angular deviations between the first sub-shaft 211 and the second sub-shaft 212.

[0136] Reference Figure 7-8 As shown, in one embodiment, the swing arm assembly 220 further includes a bracket 225 and a connector 226. The bracket 225 is connected to the outer wall of the vacuum coating chamber 300. The swing arm driver 222 includes a cylinder. The cylinder body 2221 is rotatably connected to the bracket 225. The cylinder piston rod 2222 is rotatably connected to the connector 226. The connector 226 is connected to the spindle 210 and rotates synchronously with the spindle 210. When the cylinder piston rod 2222 is extended or retracted, it drives the connector 226 and the spindle 210 to rotate, converting linear motion into rotational motion.

[0137] Optionally, the cylinder body 2221 is rotatably connected to the bracket 225 via a rotating shaft, and the cylinder piston rod 2222 is rotatably connected to the connector 226 via a rotating shaft. The connector 226 is welded to the main shaft 210 or connected by bolts. In other embodiments, the swing arm driver 222 may be a motor that drives the main shaft 210 to rotate via a belt or chain. Optionally, the connector 226 may be a connecting rod or a connecting plate.

[0138] Optionally, the cylinder is provided with a magnetic switch, which is used to prevent the first auxiliary roller 231 from colliding with the winding roller 10. The non-contact characteristic of the magnetic switch enables it to output a signal by inducing a change in magnetic field position before the object collides.

[0139] Reference Figure 6As shown, in one embodiment, the auxiliary flattening mechanism 200 further includes a mechanical limiting structure 280, which is configured to abut against the swing arm 221 to limit the swing range of the swing arm 221. The mechanical limiting structure 280 can prevent the first auxiliary roller 231 from colliding with the winding roller 10. Alternatively, the mechanical limiting structure 280 can be a limiting block or a limiting plate. The mechanical limiting structure 280 can also include a spring to provide a cushioning effect when abutting against the swing arm 221.

[0140] Reference Figure 7 As shown, in one embodiment, the swing arm driver 222 is disposed outside the vacuum coating chamber 300, and the spindle 210 passes through the chamber wall 320 of the vacuum coating chamber 300 and is connected to the swing arm driver 222. Placing the swing arm driver 222 outside the vacuum coating chamber 300 can reduce the risk of leakage in the vacuum coating chamber 300.

[0141] In one embodiment, the auxiliary flattening mechanism 200 further includes a distance sensor 250, which is disposed on the auxiliary roller 230. The distance sensor 250 detects the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10. The swing arm driving member 222 drives the main shaft 210 to rotate around the axis Q of the main shaft 210 according to the distance detected by the distance sensor 250. Specifically, referring to Figure 1 As shown, when the distance detected by the distance sensor 250 is greater than the target distance, the swing arm driving member 222 drives the swing arm 221 to rotate counterclockwise to reduce the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10. When the distance detected by the distance sensor 250 is less than the target distance, the swing arm driving member 222 drives the swing arm 221 to rotate clockwise to increase the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10. The swing arm driving member 222 is controlled by the control system.

[0142] Optionally, the distance sensor 250 is an ultrasonic distance sensor, a laser distance sensor, an infrared distance sensor, or the like.

[0143] Reference Figure 9 As shown, in one embodiment, the auxiliary roller 230 includes an unwinding auxiliary roller and a winding auxiliary roller, and the auxiliary flattening mechanism 200 includes an unwinding auxiliary flattening mechanism and a winding auxiliary flattening mechanism. The unwinding auxiliary roller is arranged on one side of the unwinding roller 101, and the winding auxiliary roller is arranged on one side of the winding roller 104. The unwinding auxiliary roller adjusts the distance from the surface of the film roll on the unwinding roller 101 when the unwinding roller 101 is unwinding; the winding auxiliary roller adjusts the distance from the surface of the film roll on the winding roller 104 when the winding roller 104 is winding.

[0144] Specifically, during the unwinding process of the unwinding roller 101, the diameter of the film roll on the unwinding roller 101 gradually decreases, and the unwinding auxiliary roller decreases the distance between the unwinding auxiliary roller and the unwinding roller 101, so that the distance between the unwinding auxiliary roller and the surface of the film roll on the unwinding roller 101 is within the target distance. During the rewinding process of the rewinding roller 104, the diameter of the film roll on the rewinding roller 104 gradually increases, and the rewinding auxiliary roller increases the distance between the rewinding auxiliary roller and the surface of the film roll on the rewinding roller 104, so that the distance between the rewinding auxiliary roller and the surface of the film roll on the rewinding roller 104 is within the target distance.

[0145] In summary, the magnetron sputtering machine 100 in the present application has a compact structure, which is beneficial for saving space and cost, and can also improve production efficiency and film quality.

[0146] Reference Figure 10 Based on the same inventive concept, another embodiment of the present application discloses a vacuum coating method, which is applied to the magnetron sputtering machine 100 in any of the above embodiments. The vacuum coating method includes the following steps:

[0147] Step S10: placing a film roll on the unwinding roller 101; wherein the film roll is formed by winding the base film 105;

[0148] Step S20: Using the auxiliary film-transmitting mechanism to pull the base film 105 along the auxiliary film-transmitting path N, and to pull the base film 105 to the base film transmission path M;

[0149] Step S30: Use the winding roller 104 to wind up and the unwinding roller 101 to unwind, so that the base film 105 moves along the base film transmission path M; at the same time, the surface of the base film 105 is coated, and the distance between the auxiliary roller 230 and the surface of the film roll on the corresponding winding roller is adjusted during coating.

[0150] The vacuum coating method provided in the present application replaces manual film penetration with an auxiliary film penetration mechanism, and flattens the base film 105 through an auxiliary flattening mechanism 200 during coating, thereby improving the film penetration efficiency and quality, thereby improving production efficiency, reducing wrinkles generated during coating, and improving film quality.

[0151] Specifically, combined Figure 1-9During the auxiliary film threading process, the two sides of the starting section of the base film 105 are first bonded to the two sets of belts 160 respectively. The first auxiliary film threading mechanism is activated, and the base film driving member drives the belts 160 to move. At the same time, the first main drum driving member is activated and drives the first main drum 102 to rotate, transferring the starting section of the base film 105 to the sixth pulley 147. Specifically, driven by the belts 160, the base film 105 moves along the first auxiliary film threading path N1, first passing between the first flattening roller 112 and the first tensioning roller 113, then being wound around the first main drum 102, then passing between the second guide roller 121 and the second tensioning roller 124, then between the third guide roller 122 and the second flattening roller 125, and finally between the fourth guide roller 123 and the third tensioning roller 126.

[0152] Then, the starting section of the base film 105 is removed and adhered to the second main drum 103. The second main drum driving member is turned on and drives the second main drum 103 to rotate, tightening the base film 105 and transferring the starting section of the base film 105 to a position near the seventh pulley 151. At this point, the base film 105 has passed from the first auxiliary mold-threading path N1 to the first sub-transfer path M1 and the second sub-transfer path M2.

[0153] Then, the starting section of the base film 105 is removed and adhered to the seventh pulley 151. The second auxiliary film-threading mechanism is activated, and the base film driving member drives the belt 160 to move, transferring the starting section of the base film 105 to a position near the winding roller 104. Specifically, driven by the belt 160, the base film 105 moves along the second auxiliary film-threading path N2, first passing between the fourth tension roller 132 and the third flattening roller 133, and then passing between the third flattening roller 133 and the fifth guide roller 131.

[0154] Then, the starting section of the base film 105 is removed and adhered to the winding roller 104, and the winding roller 104 is driven to rotate to tighten the base film 105. At this time, the base film 105 reaches the third sub-transmission path M3 from the second auxiliary mold-passing path N2.

[0155] During coating, the swing arm 221 swings when the winding roller 10 is reeled in and out to adjust the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10, so that the distance between the auxiliary roller 230 and the surface of the film roll on the winding roller 10 is maintained at the target distance.

[0156] It should be noted that the above description is limited to some embodiments of the present application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recited in the claims can be performed in a different order than that described in the above embodiments and still achieve the desired results. Furthermore, the processes depicted in the accompanying drawings do not necessarily require the specific order or sequential order shown to achieve the desired results.

[0157] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present application (including the claims) is limited to these examples. Within the scope of the present application, the technical features of the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of different aspects of the above embodiments of the present application, which are not provided in detail for the sake of simplicity.

[0158] The embodiments of the present application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present application should be included in the scope of protection of this application.

Claims

1. A magnetron sputtering machine, characterized in that, It includes a vacuum coating chamber and a winding system, and the winding system includes: A winding roller is provided in the vacuum coating chamber, the winding roller comprises a unwinding roller and a winding roller, and a base film transmission path is formed between the unwinding roller and the winding roller; An auxiliary film-penetrating mechanism is provided in the vacuum coating chamber, the auxiliary film-penetrating mechanism forms an auxiliary film-penetrating path, and is used to pull the base film to move along the auxiliary film-penetrating path and to pull the base film to the base film transmission path; An auxiliary flattening mechanism is at least partially arranged in the vacuum coating chamber. The auxiliary flattening mechanism includes an auxiliary roller. The auxiliary roller is arranged on the base film transmission path. The position of the auxiliary roller is adjustable to adjust the distance from the surface of the film roll on the corresponding winding roller when the winding roller is reeled and unwound.

2. The magnetron sputtering machine according to claim 1, characterized in that The auxiliary membrane-penetrating mechanism includes a membrane-penetrating drive, multiple membrane-penetrating wheels and a membrane-penetrating traction assembly. The membrane-penetrating traction assembly is wound around the multiple membrane-penetrating wheels and forms an auxiliary membrane-penetrating path. The membrane-penetrating drive is connected to the membrane-penetrating wheel and drives the membrane-penetrating wheel to rotate. The membrane-penetrating wheel drives the membrane-penetrating traction assembly to move along the auxiliary membrane-penetrating path. When the membrane-penetrating traction assembly moves, it pulls the basement membrane to the basement membrane transmission path.

3. The magnetron sputtering machine according to claim 2, characterized in that: The base film transmission path includes multiple sub-transmission paths, and the magnetron sputtering machine includes at least one auxiliary film-penetrating mechanism, and the at least one auxiliary film-penetrating mechanism forms multiple auxiliary film-penetrating paths.

4. The magnetron sputtering machine according to claim 3, characterized in that The winding system further includes a first main drum and a second main drum sequentially arranged along the base film transmission path, the plurality of sub-transmission paths including a first sub-transmission path between the unwinding roller and the first main drum, a second sub-transmission path between the first main drum and the second main drum, and a third sub-transmission path between the second main drum and the winding roller; The auxiliary film-penetrating mechanism includes a first auxiliary film-penetrating mechanism and a second auxiliary film-penetrating mechanism, wherein the first auxiliary film-penetrating mechanism is partially arranged between the unwinding roller and the first main drum, and partially arranged between the first main drum and the second main drum, and the second auxiliary film-penetrating mechanism is arranged between the second main drum and the winding roller; The auxiliary film penetration path corresponding to the first auxiliary film penetration mechanism is partially located between the unwinding roller and the first main drum, partially overlaps with the base film transmission path on the first main drum, and partially is located between the first main drum and the second main drum; the auxiliary film penetration path corresponding to the second auxiliary film penetration mechanism is located between the second main drum and the winding roller.

5. The magnetron sputtering machine according to claim 4, characterized in that The winding system further comprises a first roller group and a second roller group, wherein the auxiliary roller, the first roller group, the first main drum, the second roller group and the second main drum are sequentially arranged along the base film transmission path, the first roller group comprises a first guide roller; the second roller group comprises a second guide roller, a third guide roller and a fourth guide roller sequentially arranged along the base film transmission path; The plurality of membrane-penetrating wheels in the first auxiliary membrane-penetrating mechanism include a first tensioning wheel, a first pulley, a second pulley, a third pulley, a fourth pulley, a fifth pulley and a sixth pulley which are sequentially arranged along the auxiliary membrane-penetrating path; Among them, the first guide roller is arranged in the auxiliary film-penetrating path and is located between the first tensioning wheel and the sixth pulley, the second guide roller and the third guide roller are arranged in the auxiliary film-penetrating path and are located between the third pulley and the fourth pulley, and the fourth guide roller is arranged in the auxiliary film-penetrating path and is located between the fourth pulley and the fifth pulley.

6. The magnetron sputtering machine according to claim 5, characterized in that: The first roller group further includes a first flattening roller and a first tension roller, and the first guide roller, the first flattening roller and the first tension roller are sequentially arranged along the base film transmission path; And / or, the second roller group also includes a second tension roller, a second flattening roller and a third tension roller, and the second tension roller, the second guide roller, the third guide roller, the second flattening roller, the fourth guide roller and the third tension roller are arranged in sequence along the base film transmission path.

7. The magnetron sputtering machine according to claim 4, characterized in that The winding system further includes a third roller group, the magnetron sputtering machine further includes a first roller group and a second roller group, the first roller group, the first main drum, the second roller group, the second main drum, the third roller group and the auxiliary roller are sequentially arranged along the base film transmission path, and the third roller group includes a fifth guide roller; The multiple membrane-penetrating wheels in the second auxiliary membrane-penetrating mechanism include a seventh pulley, an eighth pulley, a second tensioning pulley, a ninth pulley, a tenth pulley and an eleventh pulley which are sequentially arranged along the auxiliary membrane-penetrating path.

8. The magnetron sputtering machine according to claim 7, characterized in that: The third roller group further includes a fourth tension roller and a third flattening roller. The fourth tension roller, the third flattening roller and the fifth guide roller are sequentially arranged along the base film transmission path.

9. The magnetron sputtering machine according to claim 2, characterized in that: The film-penetrating traction assembly comprises two groups of parallel and spaced belts; when assisting in film penetration, both sides of the base film are bonded to the two groups of belts respectively.

10. The magnetron sputtering machine according to claim 1, characterized in that: The auxiliary flattening mechanism also includes: The swing arm assembly includes a main shaft, a swing arm, and a swing arm driver. The swing arm driver is connected to the main shaft and drives the main shaft to rotate around its axis. The main shaft is connected to the swing arm and drives the swing arm to swing. Both ends of the auxiliary roller are rotatably connected to the swing arm. Wherein, the swing arm swings when the winding roller is reeled in and unreeled to adjust the distance between the auxiliary roller and the surface of the film roll on the corresponding winding roller.

11. The magnetron sputtering machine according to claim 10, characterized in that: The main shaft includes a first sub-shaft, a second sub-shaft, a first support tube and a second support tube connected in sequence, a portion of the first sub-shaft is located outside the vacuum coating chamber and connected to the swing arm drive, and the other portion is located inside the vacuum coating chamber and connected to the second sub-shaft.

12. The magnetron sputtering machine according to claim 11, characterized in that: The swing arm includes a first swing arm and a second swing arm, the second sub-shaft and the first support tube clamp the first swing arm and fasten it through a first fastener, the first support tube and the second support tube clamp the second swing arm and fasten it through a second fastener, and the two ends of the auxiliary roller are respectively rotatably connected to the first swing arm and the second swing arm.

13. The magnetron sputtering machine according to claim 11, characterized in that The auxiliary flattening mechanism also includes a first support plate and a second support plate, the first support plate supports the second sub-shaft, the second support plate supports the second support tube, the second sub-shaft is rotatably connected to the first support plate, and the second support plate is rotatably connected to the second support tube.

14. The magnetron sputtering machine according to claim 11, characterized in that The auxiliary flattening mechanism further includes a sealing member, and the sealing member is provided at the connection position between the first sub-shaft and the vacuum coating chamber; And / or, the auxiliary flattening mechanism further includes a coupling, and the first sub-shaft and the second sub-shaft are connected via the coupling.

15. The magnetron sputtering machine according to claim 10, characterized in that The swing arm assembly further includes a bracket and a connecting piece, wherein the bracket is connected to the outer wall of the vacuum coating chamber, and the swing arm driving piece includes a cylinder, wherein the cylinder body is rotatably connected to the bracket, the piston rod of the cylinder is rotatably connected to the connecting piece, and the connecting piece is connected to the main shaft and rotates synchronously with the main shaft; And / or, the auxiliary flattening mechanism further includes a mechanical limiting structure, wherein the mechanical limiting structure is configured to abut against the swing arm to limit the swing range of the swing arm; And / or, the swing arm driving component is arranged outside the vacuum coating chamber, and the main shaft passes through the cavity wall of the vacuum coating chamber and is connected to the swing arm driving component.

16. The magnetron sputtering machine according to claim 10, characterized in that The auxiliary rollers include a first auxiliary roller and a second auxiliary roller, both ends of the first auxiliary roller and the second auxiliary roller are rotatably connected to the swing arm, the axis of the first auxiliary roller is parallel to the axis of the second auxiliary roller, the distance between the first auxiliary roller and the main shaft is greater than the distance between the second auxiliary roller and the main shaft, and the second auxiliary roller is arranged on the base film transmission path; Alternatively, the auxiliary roller includes a first auxiliary roller and a second auxiliary roller, both ends of the first auxiliary roller and the second auxiliary roller are rotatably connected to the swing arm, the axis of the first auxiliary roller is parallel to the axis of the second auxiliary roller, the distance between the first auxiliary roller and the main shaft is greater than the distance between the second auxiliary roller and the main shaft, and the second auxiliary roller is arranged on the base film transmission path; wherein, the position of the second auxiliary roller on the swing arm is adjustable.

17. The magnetron sputtering machine according to claim 1, characterized in that The auxiliary roller includes an unwinding auxiliary roller and a winding auxiliary roller, and the auxiliary flattening mechanism includes an unwinding auxiliary flattening mechanism and a winding auxiliary flattening mechanism. The unwinding auxiliary roller is arranged on one side of the unwinding roller, and the winding auxiliary roller is arranged on one side of the winding roller. The unwinding auxiliary roller adjusts the distance from the surface of the film roll on the unwinding roller when the unwinding roller is unwinding; the winding auxiliary roller adjusts the distance from the surface of the film roll on the winding roller when the winding roller is winding.

18. The magnetron sputtering machine according to claim 1, characterized in that The magnetron sputtering machine further includes a movable carriage, the winding system is fixed to a side wall of the movable carriage, and a chamber door for opening or closing the vacuum coating chamber is provided between the winding system and the movable carriage; And / or, the magnetron sputtering machine also includes a first vacuum pump and a second vacuum pump, both of which are connected to the vacuum coating chamber, the first vacuum pump is used to evacuate the vacuum coating chamber to a first vacuum state, the first vacuum pump and the second vacuum pump are used to evacuate the vacuum coating chamber from the first vacuum state to a second vacuum state, and the vacuum degree of the second vacuum state is greater than the vacuum degree of the first vacuum state.

19. The magnetron sputtering machine according to any one of claims 1 to 18, characterized in that: The magnetron sputtering machine further includes a deflection correction sensor, which is arranged in the vacuum coating chamber and located on one side of the base film transmission path, and is used to detect the position of the base film when the base film is being transmitted; And / or, the auxiliary flattening mechanism further includes a distance sensor, which is provided on the auxiliary roller and is used to detect the distance between the auxiliary roller and the surface of the film roll on the winding roller.

20. A vacuum coating method, applied to the magnetron sputtering machine according to any one of claims 1 to 19, characterized in that: The vacuum coating method comprises the following steps: Placing a film roll on the unwinding roller; wherein the film roll is formed by winding a base film; Using the auxiliary membrane-penetrating mechanism to pull the basement membrane to move along the auxiliary membrane-penetrating path, and to pull the basement membrane to the basement membrane transmission path; The base film is wound using the winding roller and unwound using the unwinding roller, so that the base film moves along the base film transmission path; at the same time, the surface of the base film is coated, and the distance between the auxiliary roller and the corresponding film roll surface on the winding roller is adjusted during coating.

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