Gas mixing device for perovskite coating

Abstract

The invention discloses a gas mixing device for perovskite coating, and particularly relates to the technical field of perovskite coating, the gas mixing device comprises a mounting bracket, a first seat is fixedly mounted in the middle of the mounting bracket, a primary mixing mechanism is mounted on the first seat, a second seat is fixedly mounted at the bottom of the mounting bracket, and a secondary mixing mechanism is mounted on the second seat; a third seat is fixedly mounted at the top of the mounting bracket, and a purification mechanism is mounted on the third seat. By arranging the primary mixing mechanism and adopting the diversified slotted hole design, the flowing direction and speed of gas are effectively guided, the gas is promoted to be more uniformly distributed among different areas, and the gas mixing uniformity is further improved; by adopting the proportion configuration, the gas can be fully diffused when flowing through different areas, so that an ideal mixing effect is achieved.

Description

Technical Field

[0001] This invention relates to the field of perovskite coating technology, specifically to a gas mixing device for perovskite coating. Background Technology

[0002] Perovskite materials (such as formamidine lead iodine, cesium lead iodine, etc.) are extremely sensitive to the environment, and thin film growth (such as vapor deposition, solution-assisted deposition, etc.) depends on precise control of the gas atmosphere. Therefore, in the perovskite coating process, it is necessary to mix multiple gases in a specific ratio according to process requirements to provide a stable and controllable gas environment for thin film growth. This process directly affects the crystal quality, chemical composition and photoelectric properties of perovskite thin films, and is a key step to ensure coating consistency and repeatability. In existing perovskite thin-film battery fabrication processes, there are two main gas mixing methods: a three-way gas mixing device and a simple gas mixing tank. Different gases are mixed through simple pipes and simple gas mixing tanks, respectively. Usually, the uniformity of the mixed gas is poor, making it difficult to achieve high quality requirements. In high-quality perovskite thin films, such as ITO thin films, the most important electrical characteristic (sheet resistance uniformity) needs to reach 5% or lower, which is usually difficult to achieve with existing gas mixing solutions. Therefore, we propose a gas mixing device for perovskite coating to solve the above problems. Summary of the Invention

[0003] The purpose of this invention is to provide a gas mixing device for perovskite coating to solve the problems mentioned in the background art.

[0004] To achieve the above objectives, the present invention provides the following technical solution: a gas mixing device for perovskite coating, comprising a mounting bracket, a first seat fixedly mounted in the middle of the mounting bracket, a primary mixing mechanism mounted on the first seat, a second seat fixedly mounted at the bottom of the mounting bracket, a secondary mixing mechanism mounted on the second seat, and a third seat fixedly mounted at the top of the mounting bracket, a purification mechanism mounted on the third seat.

[0005] Preferably, the initial mixing mechanism includes a mixing outer cylinder, which is fixedly installed on a first base. Two air inlet pipes are fixedly fastened to the top of the mixing outer cylinder, and an air outlet pipe is fixedly fastened to the bottom of the mixing outer cylinder. A first mixing baffle, a second mixing baffle, and a third mixing baffle are fixedly installed on the inner side of the mixing outer cylinder from top to bottom. The first mixing baffle has multiple first mixing grooves, which are concentrated in the middle of the first mixing baffle. The second mixing baffle has multiple second mixing grooves, which are dispersed at the edges of the second mixing baffle. The third mixing baffle has multiple third mixing grooves, which are evenly distributed in the middle of the third mixing baffle.

[0006] Preferably, the first mixing baffle, the second mixing baffle, and the third mixing baffle divide the interior of the mixing outer cylinder into four mixing regions, and the length ratio of the four mixing regions is 1:2:3:8.

[0007] Preferably, the purification mechanism includes a storage frame, with two symmetrically distributed purification components below the storage frame. A first Y-shaped guide frame is fixedly installed at the top of the two purification components, and the top of the first Y-shaped guide frame is fixedly installed at the bottom of the storage frame. A second Y-shaped guide frame is fixedly installed at the bottom of the two purification components, and a waste storage frame is fixedly installed at the bottom of the second Y-shaped guide frame. The storage frame and the waste storage frame are fixedly installed on a third seat. A top cover is installed at the top of the storage frame via a hinge, and a bottom cover is installed at the bottom of the waste storage frame via a hinge. The storage frame and the bottom cover are fixedly installed on the third seat.

[0008] Preferably, the purification component includes a purification outer cylinder, a first pipe fixedly installed at one end of the purification outer cylinder, and a second pipe fixedly installed at the end of the purification outer cylinder away from the first pipe. The positions of the first pipe and the second pipe are coaxially corresponding. A rotating inner cylinder is rotatably installed in the purification outer cylinder. Multiple storage bins are arranged in a circular array on the rotating inner cylinder. One of the storage bins is interconnected with the first pipe and the second pipe. A feeding slot is provided on the outer side of the rotating inner cylinder, which is interconnected with each storage bin. A feeding port is provided on the top side of the purification outer cylinder, which is interconnected with one of the feeding slots. A discharge port is provided on the bottom side of the purification outer cylinder, which is interconnected with one of the feeding slots.

[0009] Preferably, the bottom end of the first Y-shaped guide frame is fixedly installed with the inlet of each of the two purification components, and the top end of the second Y-shaped guide frame is fixedly installed with the outlet of each of the two purification components.

[0010] Preferably, each end of the first pipe in the purification component is fixedly equipped with an air inlet hose, each end of the second pipe in the purification component is fixedly equipped with a first pump, each output port of the first pump is fixedly equipped with a guide bend, each bottom end of the guide bend is fixedly equipped with a gas flow meter, and the bottom end of the gas flow meter is fixedly installed with the top end of the corresponding air inlet pipe.

[0011] Preferably, the shaft end of the rotating inner cylinder extends out of the outer side of the purification outer cylinder and is fixedly installed with a first gear. A second gear is rotatably installed on the side end of the rotating inner cylinder near the second tube. The second gear and the first gear are meshed and connected at adjacent positions. The second gears at the side ends of the two purification components are meshed and connected.

[0012] Preferably, a first motor is provided on the side of one of the purification components away from the first gear. The first motor is fixedly installed on the outside of the corresponding purification outer cylinder, and the drive end of the first motor is fixedly installed on the shaft end of the corresponding rotating inner cylinder.

[0013] Preferably, the secondary mixing mechanism includes a secondary mixing outer cylinder, which is fixedly mounted on a second seat. The secondary mixing outer cylinder has a spiral inner tube inside, with the pitch at the middle position of the spiral inner tube being smaller than the pitch at both ends. A third tube is fixedly mounted at one end of the spiral inner tube, and a fourth tube is fixedly mounted at the end of the spiral inner tube away from the third tube. The third and fourth tubes are respectively fixedly mounted at both ends of the secondary mixing outer cylinder. A second pump is fixedly mounted at the outer end of the third tube, and a gas guide branch pipe is fixedly mounted at the end of the second pump. The end of the gas guide branch pipe is fixedly mounted at the bottom end of the gas outlet pipe. A third pump is fixedly mounted at the outer end of the fourth tube, and an exhaust hose is fixedly mounted at the end of the third pump.

[0014] Compared with the prior art, the beneficial effects of the present invention are as follows: 1. By setting up a primary mixing mechanism and adopting this diversified slot design, the flow direction and speed of the gas are effectively guided, which promotes a more uniform distribution of the gas in different areas and further improves the uniformity of gas mixing.

[0015] 2. By setting up a primary mixing mechanism and adopting this proportion, the gas can diffuse sufficiently as it flows through different areas, thereby achieving the ideal mixing effect.

[0016] 3. By setting up a purification mechanism, the mixed gas can be purified, reducing impurities in the gas and affecting the overall quality of the subsequent perovskite coating, and facilitating the automatic unloading of waste particles.

[0017] 4. By setting up a secondary mixing mechanism, the gas after the primary mixing is completed will move in a spiral motion as the channel rotates. Under the action of centrifugal force, the gases will collide and diffuse with each other, thereby achieving full mixing. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is a schematic diagram of the structure of the present invention.

[0020] Figure 2This is a schematic diagram of the initial mixing mechanism in this invention.

[0021] Figure 3 This is a schematic diagram of the purification mechanism in this invention.

[0022] Figure 4 This is a schematic diagram showing the structural connection of the first Y-shaped guide frame, the second Y-shaped guide frame, and the purification component in this invention.

[0023] Figure 5 This is a schematic diagram of the purification component in this invention.

[0024] Figure 6 This is a structural schematic diagram of the purification component from another angle in this invention.

[0025] Figure 7 This is a schematic diagram of the secondary mixing mechanism in this invention.

[0026] In the diagram: 1. Mounting bracket; 11. First seat; 12. Second seat; 13. Third seat; 2. Primary mixing mechanism; 3. Purification mechanism; 4. Secondary mixing mechanism; 21. Mixing outer cylinder; 22. First mixing baffle; 23. Second mixing baffle; 24. Third mixing baffle; 201. First mixing tank; 202. Second mixing tank; 203. Third mixing tank; 211. Inlet pipe; 212. Outlet pipe; 31. Storage frame; 311. Top cover; 32. Purification component; 33. First Y-shaped guide frame; 34. Second Y-shaped guide frame; 35. Waste storage frame; 351. Bottom cover; 36. 361. First gear; 362. Second gear; 363. First motor; 37. Inlet hose; 38. First pump; 381. Air guide bend; 382. Gas flow meter; 321. Purification outer cylinder; 3211. First pipe; 3212. Second pipe; 3201. Feed inlet; 3202. Discharge outlet; 322. Rotating inner cylinder; 323. Storage bin; 324. Feed trough; 41. Secondary mixing outer cylinder; 42. Spiral inner pipe; 421. Third pipe; 422. Fourth pipe; 43. Second pump; 431. Air guide branch pipe; 44. Third pump; 441. Exhaust hose. Detailed Implementation

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0028] Example: Figure 1-7As shown, the present invention provides a gas mixing device for perovskite coating, including a mounting bracket 1, a first seat 11 fixedly mounted in the middle of the mounting bracket 1, a primary mixing mechanism 2 mounted on the first seat 11, a second seat 12 fixedly mounted at the bottom of the mounting bracket 1, a secondary mixing mechanism 4 mounted on the second seat 12, and a third seat 13 fixedly mounted at the top of the mounting bracket 1, a purification mechanism 3 mounted on the third seat 13.

[0029] The initial mixing mechanism 2 includes a mixing outer cylinder 21, which is fixedly installed on the first base 11. Two air inlet pipes 211 are fixedly mounted on the top of the mixing outer cylinder 21, and an air outlet pipe 212 is fixedly mounted on the bottom of the mixing outer cylinder 21. A first mixing baffle 22, a second mixing baffle 23, and a third mixing baffle 24 are fixedly installed on the inner side of the mixing outer cylinder 21 from top to bottom. Multiple first mixing grooves 201 are formed on the first mixing baffle 22, and these grooves are concentrated on the first mixing baffle 22. In the middle position, the second mixing baffle 23 has multiple second mixing grooves 202, which are distributed at the edge of the second mixing baffle 23. The third mixing baffle 24 has multiple third mixing grooves 203, which are evenly distributed in the middle position of the third mixing baffle 24. This diversified groove design effectively guides the flow direction and speed of the gas, promotes a more uniform distribution of the gas in different areas, and further improves the uniformity of gas mixing.

[0030] The first mixing baffle 22, the second mixing baffle 23, and the third mixing baffle 24 divide the interior of the mixing outer cylinder 21 into four mixing zones with a length ratio of 1:2:3:8. This ratio configuration allows the gas to diffuse sufficiently as it flows through different zones, thereby achieving an ideal mixing effect.

[0031] The purification mechanism 3 includes a storage frame 31. Two symmetrically distributed purification components 32 are provided below the storage frame 31. A first Y-shaped guide frame 33 is fixedly installed at the top of the two purification components 32. The top of the first Y-shaped guide frame 33 is fixedly installed at the bottom of the storage frame 31. A second Y-shaped guide frame 34 is fixedly installed at the bottom of the two purification components 32. A waste storage frame 35 is fixedly installed at the bottom of the second Y-shaped guide frame 34. The storage frame 31 and the waste storage frame 35 are fixedly installed on the third seat 13. A top cover 311 is installed at the top of the storage frame 31 via a hinge. When the top cover 311 is opened, the particles for physical adsorption purification are buffered in the storage frame 31. A bottom cover 351 is installed at the bottom of the waste storage frame 35 via a hinge. The storage frame 31 and the bottom cover 351 are fixedly installed on the third seat 13.

[0032] The purification component 32 includes a purification outer cylinder 321. A first pipe 3211 is fixedly installed at one end of the purification outer cylinder 321, and a second pipe 3212 is fixedly installed at the end of the purification outer cylinder 321 away from the first pipe 3211. The positions of the first pipe 3211 and the second pipe 3212 are coaxially corresponding. A rotating inner cylinder 322 is rotatably installed inside the purification outer cylinder 321. Multiple storage bins 323 are arranged in a circular array on the rotating inner cylinder 322. One of the storage bins 323 is interconnected with the first pipe 3211 and the second pipe 3212. A feeding slot 324 is provided on the outer side of the rotating inner cylinder 322 and is interconnected with each storage bin 323. A feeding port 3201 is provided on the top side of the purification outer cylinder 321 and is interconnected with one of the feeding slots 324. A discharge port 3202 is provided on the bottom side of the purification outer cylinder 321 and is interconnected with one of the feeding slots 324. Interconnected; the bottom end of the first Y-shaped guide frame 33 is fixedly installed with the inlet 3201 of the two purification components 32 respectively, and the top end of the second Y-shaped guide frame 34 is fixedly installed with the outlet 3202 of the two purification components 32 respectively. The physical adsorption purification particles buffered in the storage frame 31 are introduced into the purification components 32 on both sides through the first Y-shaped guide frame 33 and the inlet 3201, and are introduced into the corresponding storage bin 323 through the corresponding feed groove 324. With the control of the rotation of the inner cylinder 322, the storage bin 323 containing the physical adsorption purification particles is aligned with the first pipe 3211 and the second pipe 3212. The gas can be introduced into the corresponding storage bin 323 through the corresponding first pipe 3211 and purified by the physical adsorption purification particles. Then it is discharged through the second pipe 3212, thereby achieving the purification treatment of the mixed gas, reducing impurities in the gas, and affecting the overall quality of the subsequent perovskite coating. When the particles need to be replaced and discharged after a period of adsorption and purification, simply control the inner cylinder 322 to continue rotating. The other storage bin 323 stores the particles and rotates in accordance with the first tube 3211 and the second tube 3212 to continue adsorption and purification. After rotating again, the storage bin 323 and the discharge port 3202 where the particles need to be discharged correspond to each other. The particles are then directly introduced into the waste storage box 35 through the discharge port 3202 and the second Y-shaped guide frame 34 for storage, thereby realizing the automatic unloading of waste particles.

[0033] In the purification component 32, an air inlet hose 37 is fixedly installed at the end of the first pipe 3211, and a first pump 38 is fixedly installed at the end of the second pipe 3212. A guide pipe 381 is fixedly installed at the output port of the first pump 38, and a gas flow meter 382 is fixedly installed at the bottom end of the guide pipe 381. The bottom end of the gas flow meter 382 is fixedly installed at the top end of the corresponding air inlet pipe 211. When the first pump 38 is turned on, the mixed gas is introduced into the corresponding purification component 32 through the corresponding air inlet hose 37 for adsorption and purification, and then discharged through the guide pipe 381 and introduced into the gas flow meter 382 for measurement.

[0034] The shaft end of the rotating inner cylinder 322 extends out of the outer side of the purification outer cylinder 321 and is fixedly installed with a first gear 36. A second gear 361 is rotatably installed on the side end of the rotating inner cylinder 322 near the second tube 3212. The second gear 361 and the first gear 36 are meshed and connected at adjacent positions. The second gears 361 at the side ends of the two purification components 32 are meshed and connected. A first motor 362 is provided on the side of one of the purification components 32 away from the first gear 36. The first motor 362 is fixedly installed on the outer side of the corresponding purification outer cylinder 321. The drive end of the first motor 362 is fixedly installed with the shaft end of the corresponding rotating inner cylinder 322. By controlling the first motor 362 to turn, the corresponding rotating inner cylinder 322 is driven to rotate. With the meshing connection of the second gear 361 and the first gear 36, the other rotating inner cylinder 322 is driven to rotate synchronously in the opposite direction.

[0035] The secondary mixing mechanism 4 includes a secondary mixing outer cylinder 41, which is fixedly mounted on the second seat 12. A spiral inner tube 42 is provided inside the secondary mixing outer cylinder 41. The pitch of the spiral inner tube 42 at its middle position is smaller than the pitch at both ends of the spiral inner tube 42. A third tube 421 is fixedly installed at one end of the spiral inner tube 42, and a fourth tube 422 is fixedly installed at the end of the spiral inner tube 42 away from the third tube 421. The third tube 421 and the fourth tube 422 are respectively fixedly installed at both ends of the secondary mixing outer cylinder 41. A second pump 43 is fixedly installed at the outer end of the third tube 421, and a gas guide branch pipe 431 is fixedly installed at the end of the second pump 43. The end of the gas guide branch pipe 431 is fixedly installed in the outlet pipe. At the bottom of 212, a third pump 44 is fixedly installed at the outer end of the fourth pipe 422. An exhaust hose 441 is fixedly installed at the end of the third pump 44. After the gas is initially mixed by the primary mixing mechanism 2, the second pump 43 and the third pump 44 are turned on. The gas after primary mixing is introduced into the spiral inner tube 42 through the gas guide branch pipe 431 and the third pipe 421. It will make spiral motion as the channel rotates. Under the action of centrifugal force, the gases collide and diffuse with each other, thereby achieving full mixing. Since the pitch of the spiral inner tube 42 in the middle position is smaller than the pitch of the spiral inner tube 42 at both ends, the reduction of the pitch can enhance the centrifugal force of the gas rotation and further improve the mixing efficiency.

[0036] Working principle: Open the top cover 311 and buffer the physical adsorption purification particles in the storage frame 31. The physical adsorption purification particles buffered in the storage frame 31 are introduced into the purification components 32 on both sides through the first Y-shaped guide frame 33 and the inlet 3201, and then introduced into the corresponding storage bin 323 through the corresponding feed groove 324. With the control of the rotation of the inner cylinder 322, the storage bin 323 containing the physical adsorption purification particles is aligned with the first pipe 3211 and the second pipe 3212. The gas can be introduced into the corresponding storage bin 323 through the corresponding first pipe 3211 and purified by the physical adsorption purification particles. Then it is discharged through the second pipe 3212, thereby achieving the purification treatment of the mixed gas and reducing impurities in the gas. When the particles need to be replaced and discharged after a period of adsorption and purification, simply control the inner cylinder 322 to continue rotating. Another storage bin 323 stores the particles and rotates in accordance with the first tube 3211 and the second tube 3212 to continue adsorption and purification. After rotating again, the storage bin 323 and the discharge port 3202 where the particles need to be discharged correspond to each other. The particles are then directly introduced into the waste storage box 35 through the discharge port 3202 and the second Y-shaped guide frame 34 for storage, thereby realizing the automatic unloading of waste particles. After adsorption and purification, the gas is discharged and introduced into the gas flow meter 382 through the gas guide bend 381 for measurement. It is then introduced into the mixing outer cylinder 21 through two gas inlet pipes 211. It passes through the first mixing baffle 22, the second mixing baffle 23 and the third mixing baffle 24 in sequence, thereby undergoing full diffusion in four mixing areas and effectively guiding the flow direction and speed of the gas, promoting a more uniform distribution of the gas in different areas and improving the uniformity of gas mixing. After the gas is initially mixed by the primary mixing mechanism 2, the second pump 43 and the third pump 44 are turned on. The gas after primary mixing is introduced into the spiral inner tube 42 through the gas guide branch pipe 431 and the third pipe 421. It will make spiral motion as the channel rotates. Under the action of centrifugal force, the gases collide and diffuse with each other, thereby achieving full mixing. Since the pitch of the spiral inner tube 42 in the middle position is smaller than the pitch of the spiral inner tube 42 at both ends, the reduced pitch can enhance the centrifugal force of the gas rotation and further improve the mixing efficiency.

[0037] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A gas mixing device for perovskite coating, comprising a mounting bracket (1), characterized in that: The mounting bracket (1) has a first seat (11) fixedly installed in the middle, and a primary mixing mechanism (2) is installed on the first seat (11). The mounting bracket (1) has a second seat (12) fixedly installed at the bottom, and a secondary mixing mechanism (4) is installed on the second seat (12). The mounting bracket (1) has a third seat (13) fixedly installed at the top, and a purification mechanism (3) is installed on the third seat (13).

2. The gas mixing device for perovskite coating according to claim 1, characterized in that: The initial mixing mechanism (2) includes a mixing outer cylinder (21), which is fixedly installed on the first seat (11). Two air inlet pipes (211) are fixedly fastened to the top of the mixing outer cylinder (21), and an air outlet pipe (212) is fixedly fastened to the bottom of the mixing outer cylinder (21). A first mixing baffle (22), a second mixing baffle (23), and a third mixing baffle (24) are fixedly installed on the inner side of the mixing outer cylinder (21) from top to bottom. The first mixing baffle (22) has multiple openings. A first mixing groove (201) is provided, and the first mixing groove (201) is concentrated in the middle of the first mixing baffle (22). A second mixing baffle (23) is provided with a plurality of second mixing grooves (202), and the second mixing grooves (202) are dispersed at the edge of the second mixing baffle (23). A third mixing baffle (24) is provided with a plurality of third mixing grooves (203), and the third mixing grooves (203) are evenly distributed in the middle of the third mixing baffle (24).

3. The gas mixing device for perovskite coating according to claim 2, characterized in that: The first mixing baffle (22), the second mixing baffle (23) and the third mixing baffle (24) divide the interior of the mixing outer cylinder (21) into four mixing regions, and the length ratio of the four mixing regions is 1:2:3:

8.

4. The gas mixing device for perovskite coating according to claim 2, characterized in that: The purification mechanism (3) includes a storage frame (31). Two symmetrically distributed purification components (32) are provided below the storage frame (31). A first Y-shaped guide frame (33) is fixedly installed at the top of the two purification components (32). The top of the first Y-shaped guide frame (33) is fixedly installed at the bottom of the storage frame (31). A second Y-shaped guide frame (34) is fixedly installed at the bottom of the two purification components (32). A waste storage frame (35) is fixedly installed at the bottom of the second Y-shaped guide frame (34). The storage frame (31) and the waste storage frame (35) are fixedly installed on the third seat (13). A top cover (311) is installed at the top of the storage frame (31) via a hinge. A bottom cover (351) is installed at the bottom of the waste storage frame (35) via a hinge. The storage frame (31) and the bottom cover (351) are fixedly installed on the third seat (13).

5. The gas mixing device for perovskite coating according to claim 4, characterized in that: The purification component (32) includes a purification outer cylinder (321). A first pipe (3211) is fixedly installed at one end of the purification outer cylinder (321), and a second pipe (3212) is fixedly installed at the other end of the purification outer cylinder (321) away from the first pipe (3211). The positions of the first pipe (3211) and the second pipe (3212) are coaxially corresponding. A rotating inner cylinder (322) is rotatably installed in the purification outer cylinder (321). Multiple storage bins (323) are arranged in a ring array on the rotating inner cylinder (322), one of which is a storage bin. (323) is interconnected with the first pipe (3211) and the second pipe (3212). The outer side of the rotating inner cylinder (322) is provided with a feeding slot (324) that is interconnected with each storage bin (323). The top side of the purification outer cylinder (321) is provided with a feeding port (3201). The feeding port (3201) and one of the feeding slots (324) are interconnected. The bottom side of the purification outer cylinder (321) is provided with a discharge port (3202). The discharge port (3202) and one of the feeding slots (324) are interconnected.

6. The gas mixing device for perovskite coating according to claim 5, characterized in that: The bottom end of the first Y-shaped guide frame (33) is fixedly installed with the inlet (3201) of the two purification components (32), and the top end of the second Y-shaped guide frame (34) is fixedly installed with the outlet (3202) of the two purification components (32).

7. The gas mixing device for perovskite coating according to claim 5, characterized in that: The first pipe (3211) of the purification component (32) is fixedly equipped with an air inlet hose (37) at the end. The second pipe (3212) of the purification component (32) is fixedly equipped with a first pump (38) at the end. The output port of the first pump (38) is fixedly equipped with a guide pipe (381). The bottom end of the guide pipe (381) is fixedly equipped with a gas flow meter (382). The bottom end of the gas flow meter (382) is fixedly installed with the top end of the corresponding air inlet pipe (211).

8. The gas mixing device for perovskite coating according to claim 5, characterized in that: The shaft end of the rotating inner cylinder (322) extends out of the outer side of the purification outer cylinder (321) and is fixedly installed with a first gear (36). A second gear (361) is rotatably installed on the side end of the rotating inner cylinder (322) near the second tube (3212). The second gear (361) and the first gear (36) are meshed and connected at adjacent positions. The second gears (361) at the side ends of the two purification components (32) are meshed and connected.

9. The gas mixing device for perovskite coating according to claim 8, characterized in that: One of the purification components (32) has a first motor (362) on the side away from the first gear (36). The first motor (362) is fixedly installed on the outside of the corresponding purification outer cylinder (321). The drive end of the first motor (362) and the shaft end of the corresponding rotating inner cylinder (322) are fixedly installed.

10. The gas mixing device for perovskite coating according to claim 2, characterized in that: The secondary mixing mechanism (4) includes a secondary mixing outer cylinder (41), which is fixedly installed on the second seat (12). A spiral inner tube (42) is provided inside the secondary mixing outer cylinder (41). The pitch of the spiral inner tube (42) at its middle position is smaller than the pitch at both ends of the spiral inner tube (42). A third tube (421) is fixedly installed at one end of the spiral inner tube (42), and a fourth tube (422) is fixedly installed at the end of the spiral inner tube (42) away from the third tube (421). The third tube (421)... 21) and the fourth pipe (422) are respectively fixedly installed at both ends of the secondary mixing outer cylinder (41). The outer end of the third pipe (421) is fixedly installed with a second pump (43). The end of the second pump (43) is fixedly installed with a gas guide branch pipe (431). The end of the gas guide branch pipe (431) is fixedly installed at the bottom end of the gas outlet pipe (212). The outer end of the fourth pipe (422) is fixedly installed with a third pump (44). The end of the third pump (44) is fixedly installed with an exhaust hose (441).

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