A low-temperature liquid storage tank production and manufacturing tank body inner wall polishing equipment

Abstract

The application relates to the technical field of low-temperature liquid storage tank production and manufacturing, and particularly discloses a tank body inner wall polishing equipment for low-temperature liquid storage tank production and manufacturing, a fixed part is fixedly connected to the middle part of the side of a workbench, a transmission part is fixedly connected to the side, away from the fixed part, of the workbench, a polishing part is fixedly connected to one side of the top of the workbench, and positioning parts are fixedly connected to the two sides of the top of the workbench. The tank body inner wall polishing equipment for low-temperature liquid storage tank production and manufacturing is provided with a buffer mechanism; when the limiting assembly moves synchronously with the polishing wheel in the tank body inner cavity, the buffer mechanism can continuously play a buffering role by following the position change of the polishing wheel in real time, so that the polishing pressure is stable; in the process, the bellows is synchronously stretched or shrunk with the movement of the limiting assembly, so that the adjusting requirement of different movement amplitudes is met.

Description

Technical Field

[0001] This invention relates to the field of cryogenic liquid storage tank manufacturing technology, specifically to a tank inner wall polishing device for cryogenic liquid storage tank manufacturing. Background Technology

[0002] Cryogenic liquid storage tanks (hereinafter referred to as "cryotanks") are special equipment designed specifically for storing cryogenic liquids with boiling points below -100°C (such as liquid nitrogen, liquid oxygen, liquid argon, liquefied natural gas (LNG), liquefied petroleum gas (LPG), etc.). Their core function is to minimize evaporation loss of the cryogenic medium through efficient insulation and pressure control technologies, while ensuring safety during storage and transportation. Their design must meet multiple stringent requirements, including cryogenic material properties, insulation performance, pressure regulation, and explosion-proof safety. They are widely used in energy, medical, industrial, and aerospace fields. The structure of cryogenic storage tanks must simultaneously meet the dual requirements of "cryogenic insulation" and "safe pressure bearing." A typical structure includes five core components: an inner liner, an outer liner, an insulation layer, a support system, and safety accessories.

[0003] In the processing of cryogenic liquid storage tanks, inner wall polishing is a key process to ensure the performance of the tank. However, in actual operation, if the polishing wheel vibrates due to fluctuations in working conditions, it can easily lead to over-polishing of the inner wall of the tank, affecting the accuracy and integrity of the inner wall surface. Summary of the Invention

[0004] To achieve the above objectives, the present invention provides the following technical solution: a tank inner wall polishing device for manufacturing cryogenic liquid storage tanks, comprising:

[0005] A workbench, wherein a fixing component is fixedly connected to the middle of the side of the workbench, a transmission component is fixedly connected to the side of the workbench away from the fixing component, a polishing component is fixedly connected to one side of the top of the workbench, and positioning components are fixedly connected to both sides of the top of the workbench.

[0006] A collection component is used to collect debris generated during the polishing of the inner wall of the tank. The side of the collection component is fixedly connected to the side of the worktable away from the polishing component.

[0007] The positioning component includes four positioning frames and two lead screws. The bottom of the positioning frame is slidably connected to the top of the worktable. An electric rotating wheel is fixedly connected to the inner side of the positioning frame. Both ends of the lead screw are rotatably connected to the inner side of the worktable. One end of the lead screw is fixedly connected to the output end of the transmission component. The bottom of the positioning frame is threadedly connected to the side of the lead screw through a slider.

[0008] The polishing component includes a connecting frame, the bottom of which is fixedly connected to the top of the worktable, a driving component fixedly connected to the side of the connecting frame, a connecting shaft slidably connected to the side of the connecting frame away from the driving component, one end of the connecting shaft being fixedly connected to the output end of the driving component, a polishing wheel fixedly connected to the other end of the connecting shaft, a connecting disc fixedly connected to the side of the polishing wheel away from the connecting shaft, and a round rod fixedly connected to the inner side of the connecting disc.

[0009] Preferably, the collecting component includes a collecting rack, the bottom of which is fixedly connected to the top of the workbench, a buffer mechanism is fixedly connected to the side of the collecting rack near the polishing wheel, and a collecting mechanism is fixedly connected to the other side of the collecting rack;

[0010] Preferably, when the polishing wheel contacts the inner wall of the tank for polishing, the buffer mechanism engages with the polishing wheel in real time to prevent unstable contact caused by vibration through buffering and shock absorption, thereby preventing over-polishing of the inner wall of the tank; at the same time, the collection mechanism is activated simultaneously to collect the metal debris generated during the polishing process to ensure the cleanliness of the inner cavity.

[0011] Preferably, the buffer mechanism includes a buffer frame, the side of the buffer frame away from the buffer shaft is fixedly connected to the side of the collection frame, the side of the buffer frame is evenly provided with buffer shafts, the side of the buffer shaft is slidably connected to the inner side of the buffer frame, the other end of the buffer shaft is fixedly connected to a limit component, the middle part of the buffer frame is fixedly connected to a bellows, and a first spring is sleeved on the buffer shaft, one end of the first spring is fixedly connected to the buffer frame, and the other end of the first spring is fixedly connected to the side of the limit tube away from the limit plate.

[0012] Preferably, before the polishing wheel moves toward the inner wall of the tank, the buffer shaft is driven by the tension of the first spring, which in turn pushes the limiting component to abut against the side of the polishing wheel. The elastic deformation of the spring provides a continuous flexible buffer force to avoid the vibration of the polishing wheel caused by rigid drive and reduce the risk of local overcutting of the inner wall caused by vibration.

[0013] Preferably, when the limiting component moves synchronously with the polishing wheel in the inner cavity of the tank, it can continuously play a buffering role by following the position change of the polishing wheel in real time, ensuring stable polishing pressure. During this process, the bellows stretches or contracts synchronously with the movement of the limiting component to adapt to the adjustment requirements of different movement amplitudes.

[0014] Preferably, the limiting component includes a limiting tube, the side of the limiting tube away from the limiting plate is fixedly connected to a buffer shaft, a guide tube is fixedly connected to the inner cavity of the limiting tube, the end of the guide tube away from the buffer shaft is fixedly connected to a bellows, a collection groove is evenly formed on the inner side of the limiting tube, a limiting shaft is slidably connected to the middle of the inner side of the limiting tube, a second spring is sleeved on the limiting shaft, one end of the second spring is fixedly connected to the limiting plate, the other end of the second spring is fixedly connected to the inner side of the limiting tube, the other end of the limiting shaft is fixedly connected to the limiting plate, a limiting block is fixedly connected to the side of the limiting plate away from the limiting shaft, and limiting holes are evenly formed on the side of the limiting plate, the limiting holes being concentrically arranged with the round rod;

[0015] Preferably, under the tension of the first spring, the limiting tube transmits power through the buffer shaft, causing the limiting shaft to move in the direction of the polishing wheel, and then the limiting shaft pushes the limiting plate to contact and fit with the side of the polishing wheel;

[0016] Preferably, after the limiting plate contacts the inner side of the connecting plate, the round rod on the side of the connecting plate abuts against the limiting holes evenly opened on the limiting plate to form a limit, which can limit the relative displacement between the connecting plate and the limiting plate, avoid the deviation of the polishing trajectory due to the loosening of the components during the polishing process, and ensure the stability of the polishing path.

[0017] Preferably, when the polishing wheel vibrates or shakes while polishing the inner wall of the tank, the second spring sleeved on the limiting shaft absorbs the vibration energy through elastic deformation, converting the impact force into the elastic potential energy of the spring. This damping mechanism reduces the vibration amplitude of the polishing block, reduces defects such as local over-polishing and scratches caused by vibration, and improves the surface smoothness and uniformity of the inner wall polishing.

[0018] Preferably, when the polishing block is being polished, the suction machine can be turned on simultaneously. The negative pressure suction generated by the suction machine is transmitted to the bellows through the air pipe, and then continues to act on the collection grooves that are evenly opened on the side of the limiting tube near the polishing wheel, so as to achieve directional adsorption of polishing debris. The evenly distributed collection grooves can cover the working area of ​​the polishing wheel and prevent debris from remaining in the gaps of the inner wall of the tank.

[0019] Preferably, after the debris enters the inner side of the limiting tube through the collection trough, it is guided by the pre-set frustum-shaped guide tube inside the tube to prevent the debris from accumulating and blocking inside the tube. The debris is smoothly guided to the corrugated tube. Finally, the debris is continuously transported to the collection shell through the connecting channel between the corrugated tube and the air pipe to complete centralized collection. The entire process is sealed to avoid dust diffusion, which not only ensures a clean working environment, but also facilitates subsequent debris recycling and processing.

[0020] Preferably, the collection mechanism includes a collection shell, the bottom of which is fixedly connected to the side of the collection frame, an air pipe fixedly connected to the side of the collection shell, the other end of which passes through the collection frame and is fixedly connected to a corrugated pipe, a cleaning port fixedly connected to the side of the collection shell away from the air pipe, an air aspirator fixedly connected to the bottom of the inner cavity of the collection shell, a mesh plate fixedly connected to the inner side of the collection shell, and a cleaning component rotatably connected to the top of the mesh plate;

[0021] Preferably, when impurities generated during polishing are continuously introduced into the inner cavity of the collection shell through the air pipe under the suction of the air pump, the stable suction of the air pump provides continuous power for the conveying of debris, ensuring that impurities such as metal debris generated during polishing are introduced into the collection area, and preventing debris from scattering and contaminating the inner wall of the tank or the working environment.

[0022] Preferably, at the same time, the airflow generated by the inhaler drives the cleaning component to rotate on the top of the mesh plate inside the collection housing. The cleaning component continuously cleans the inner wall of the collection housing with the airflow, avoiding the adhesion of debris to the inner wall of the housing due to static electricity or stickiness, ensuring that the collection housing always maintains a high effective capacity, while maintaining the suction power of the inhalation system.

[0023] Preferably, when it is necessary to process the collected debris, the preset cleaning port can be opened directly to quickly empty the debris inside the collection shell.

[0024] Preferably, the cleaning assembly includes a cleaning rod, the bottom of which is rotatably connected to the top of the mesh plate. A spiral blade is fixedly connected to the bottom of the cleaning rod. Cleaning shafts are evenly arranged on the side of the cleaning rod. The side of the cleaning shafts is fixedly connected to the inner side of the cleaning rod. A sliding rod is slidably connected to the inner side of the cleaning shaft. A scraper is fixedly connected to the other end of the sliding rod. A third spring is sleeved on the sliding rod. One end of the third spring is fixedly connected to the end of the cleaning shaft away from the cleaning rod, and the other end of the third spring is fixedly connected to the side of the scraper.

[0025] This invention provides a polishing device for the inner wall of a cryogenic liquid storage tank during manufacturing. It offers the following advantages:

[0026] 1. The inner wall polishing equipment for the production of this cryogenic liquid storage tank is equipped with a buffer mechanism. When the limiting component moves synchronously with the polishing wheel in the inner cavity of the tank, it can continuously play a buffering role by following the position change of the polishing wheel in real time, so as to ensure stable polishing pressure. During this process, the bellows stretches or contracts synchronously with the movement of the limiting component to adapt to the adjustment needs of different movement amplitudes.

[0027] 2. The tank inner wall polishing equipment used in the production of this cryogenic liquid storage tank is equipped with a limit component. When the polishing wheel vibrates or shakes during polishing of the inner wall of the tank, the second spring sleeved on the limit shaft absorbs the vibration energy through elastic deformation, converting the impact force into the elastic potential energy of the spring. This damping mechanism reduces the vibration amplitude of the polishing block, reduces defects such as local over-polishing and scratches caused by vibration, and improves the surface smoothness and uniformity of the inner wall polishing.

[0028] 3. The inner wall polishing equipment for the production of this cryogenic liquid storage tank is equipped with a collection mechanism. When impurities generated during polishing are continuously drawn into the inner cavity of the collection shell through the air pipe by the suction force of the air suction machine, the stable suction force of the air suction machine provides continuous power for the conveying of debris, ensuring that metal debris and other impurities generated during the polishing process are introduced into the collection area, and preventing debris from scattering and contaminating the inner wall of the tank or the working environment.

[0029] 4. The tank inner wall polishing equipment used in the production of this cryogenic liquid storage tank is equipped with a cleaning component. By adaptively adjusting the contact pressure between the scraper and the inner wall through centrifugal force, and in conjunction with the rotational motion of the cleaning shaft, the scraper can fully cover the inner wall of the collection shell, remove the attached debris, and avoid the decline in collection efficiency caused by the accumulation of impurities. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the internal wall polishing equipment for manufacturing the cryogenic liquid storage tank of the present invention.

[0031] Figure 2 This is an axonometric view of the present invention;

[0032] Figure 3 This is a schematic diagram of the positioning component of the present invention;

[0033] Figure 4 This is a schematic diagram of the polishing component of the present invention;

[0034] Figure 5 This is a schematic diagram of the structure of the collecting component of the present invention;

[0035] Figure 6 This is a schematic diagram of the buffer mechanism of the present invention;

[0036] Figure 7 This is a schematic diagram of the structure of the limiting component of the present invention;

[0037] Figure 8 This is a schematic diagram of the collection mechanism of the present invention;

[0038] Figure 9 This is a schematic diagram of the cleaning component of the present invention.

[0039] In the diagram: 1. Workbench; 2. Fixed component; 3. Transmission component; 4. Positioning component; 41. Positioning frame; 42. Electric rotating wheel; 43. Lead screw; 5. Polishing component; 51. Connecting frame; 52. Drive component; 53. Connecting shaft; 54. Polishing wheel; 55. Connecting disc; 56. Round rod; 6. Collection component; 61. Collection frame; 62. Collection mechanism; 621. Collection shell; 622. Air pipe; 623. Cleaning port; 624. Suction machine; 625. Mesh plate; 626. Cleaning assembly; 626 1. Cleaning rod; 6262. Cleaning shaft; 6263. Slide rod; 6264. Scraper; 6265. Third spring; 6266. Spiral blade; 63. Buffer mechanism; 631. Buffer frame; 632. Buffer shaft; 633. First spring; 634. Limiting assembly; 6341. Limiting tube; 6342. Guide tube; 6343. Collection trough; 6344. Limiting shaft; 6345. Limiting plate; 6346. Limiting block; 6347. Limiting hole; 6348. Second spring; 635. Bellows. Detailed Implementation

[0040] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0041] Please see Figures 1-2 This invention provides a technical solution: a tank inner wall polishing device for manufacturing cryogenic liquid storage tanks, comprising:

[0042] Workbench 1, a fixing component 2 is fixedly connected to the middle of the side of the workbench 1, a transmission component 3 is fixedly connected to the side of the workbench 1 away from the fixing component 2, a polishing component 5 is fixedly connected to one side of the top of the workbench 1, and positioning components 4 are fixedly connected to both sides of the top of the workbench 1.

[0043] Collection component 6 is used to collect debris generated during polishing of the inner wall of the tank. The side of collection component 6 is fixedly connected to the side of the worktable 1 away from the polishing component 5.

[0044] Please see Figures 1-3 The positioning component 4 includes four positioning frames 41 and two lead screws 43. The bottom of the positioning frame 41 is slidably connected to the top of the worktable 1. An electric rotating wheel 42 is fixedly connected to the inner side of the positioning frame 41. Both ends of the lead screw 43 are rotatably connected to the inner side of the worktable 1. One end of the lead screw 43 is fixedly connected to the output end of the transmission component 3. The bottom of the positioning frame 41 is threadedly connected to the side of the lead screw 43 through a slider.

[0045] According to the diameter of the tank to be processed, the spacing of the four positioning frames 41 on both sides of the top of the workbench 1 is adjusted to match. After the transmission component 3 is started, its output end drives two lead screws 43 to rotate synchronously inside the workbench 1. The positioning frames 41 are moved along the inside of the workbench 1 through the lead screws 43 until the spacing of the positioning frames 41 matches the diameter of the tank.

[0046] After the positioning frame 41 is adjusted, the tank is hoisted and placed stably on the electric rotating wheels 42 at the top of the four positioning frames 41, so that the electric rotating wheels 42 can provide stable support for the tank.

[0047] The electric rotating wheel 42 can be started to rotate on the positioning frame 41, thereby driving the tank to rotate synchronously, providing a stable rotation condition for the polishing process of the inner wall of the tank;

[0048] Please see Figures 1-4 The polishing component 5 includes a connecting frame 51. The bottom of the connecting frame 51 is fixedly connected to the top of the worktable 1. A driving component 52 is fixedly connected to the side of the connecting frame 51. A connecting shaft 53 is slidably connected to the side of the connecting frame 51 away from the driving component 52. One end of the connecting shaft 53 is fixedly connected to the output end of the driving component 52. A polishing wheel 54 is fixedly connected to the other end of the connecting shaft 53. A connecting disk 55 is fixedly connected to the side of the polishing wheel 54 away from the connecting shaft 53. A round rod 56 is fixedly connected to the inner side of the connecting disk 55.

[0049] Select a polishing wheel 54 that matches the specifications of the inner wall of the tank and complete the installation and fixation;

[0050] The tank is driven to rotate at a constant speed by an electric rotary disc, providing a stable circumferential working condition for the polishing operation.

[0051] When the drive unit 52 is turned on, its output end is driven by the connecting shaft 53 to drive the polishing wheel 54 to move in the inner cavity of the tank. With the continuous rotation of the tank, the polishing wheel 54 polishes the inner wall of the tank evenly.

[0052] Please see Figures 1-5 The present invention provides a technical solution: the collecting component 6 includes a collecting rack 61, the bottom of the collecting rack 61 is fixedly connected to the top of the workbench 1, a buffer mechanism 63 is fixedly connected to the side of the collecting rack 61 near the polishing wheel 54, and a collecting mechanism 62 is fixedly connected to the other side of the collecting rack 61.

[0053] When the polishing wheel 54 contacts the inner wall of the tank for polishing, the buffer mechanism 63 engages with the polishing wheel 54 in real time to prevent unstable contact caused by vibration of the polishing wheel 54 through buffering and shock absorption, thereby preventing over-cutting of the inner wall of the tank during polishing; at the same time, the collection mechanism 62 is activated to collect the metal debris generated by the polishing wheel 54 during the polishing process of the inner wall, ensuring the cleanliness of the inner cavity.

[0054] Please see Figures 1-6 The buffer mechanism 63 includes a buffer frame 631. The side of the buffer frame 631 away from the buffer shaft 632 is fixedly connected to the side of the collection frame 61. Buffer shafts 632 are evenly arranged on the side of the buffer frame 631. The side of the buffer shaft 632 is slidably connected to the inner side of the buffer frame 631. The other end of the buffer shaft 632 is fixedly connected to a limit assembly 634. A bellows 635 is fixedly connected to the middle of the buffer frame 631. A first spring 633 is sleeved on the buffer shaft 632. One end of the first spring 633 is fixedly connected to the buffer frame 631. The other end of the first spring 633 is fixedly connected to the side of the limit tube 6341 away from the limit plate 6345.

[0055] Before the polishing wheel 54 moves toward the inner wall of the tank, the first spring 633 pulls the buffer shaft 632, which in turn pushes the limiting component 634 to abut against the side of the polishing wheel 54. The elastic deformation of the spring provides a continuous flexible buffer force to avoid the vibration of the polishing wheel 54 caused by rigid drive and reduce the risk of local overcutting of the inner wall caused by vibration.

[0056] Meanwhile, when the limiting component 634 moves synchronously with the polishing wheel 54 in the inner cavity of the tank, it can continuously play a buffering role by following the position change of the polishing wheel 54 in real time to ensure stable polishing pressure. During this process, the bellows 635 stretches or contracts synchronously with the movement of the limiting component 634 to adapt to the adjustment requirements of different movement amplitudes.

[0057] Please see Figures 1-7 The limiting component 634 includes a limiting tube 6341. The side of the limiting tube 6341 furthest from the limiting plate 6345 is fixedly connected to a buffer shaft 632. A guide tube 6342 is fixedly connected to the inner cavity of the limiting tube 6341. The end of the guide tube 6342 furthest from the buffer shaft 632 is fixedly connected to a bellows 635. Collection grooves 6343 are evenly distributed on the inner side of the limiting tube 6341. A limiting shaft 6344 is slidably connected to the middle of the inner side of the limiting tube 6341. The limiting shaft 6344... A second spring 6348 is sleeved on the side of the limiting plate 6345. One end of the second spring 6348 is fixedly connected to the limiting plate 6345, and the other end of the second spring 6348 is fixedly connected to the inner side of the limiting tube 6341. The other end of the limiting shaft 6344 is fixedly connected to the limiting plate 6345. The side of the limiting plate 6345 away from the limiting shaft 6344 is fixedly connected to the limiting block 6346. Limiting holes 6347 are evenly opened on the side of the limiting plate 6345. The limiting holes 6347 are concentrically arranged with the round rod 56.

[0058] Driven by the tension of the first spring 633, the limiting tube 6341 transmits power through the buffer shaft 632, driving the limiting shaft 6344 to move towards the polishing wheel 54, and then the limiting shaft 6344 pushes the limiting plate 6345 to contact and adhere to the side of the polishing wheel 54.

[0059] After the limiting plate 6345 contacts the inner side of the connecting plate 55, the round rod 56 on the side of the connecting plate 55 abuts against the limiting holes 6347 evenly opened on the limiting plate 6345 to form a limit, which can restrict the relative displacement between the connecting plate 55 and the limiting plate 6345, avoid the polishing trajectory deviation caused by component loosening during the polishing process, and ensure the stability of the polishing path.

[0060] When the polishing wheel 54 vibrates or shakes while polishing the inner wall of the tank, the second spring 6348, which is sleeved on the limiting shaft 6344, absorbs the vibration energy through elastic deformation and converts the impact force into the elastic potential energy of the spring. This damping mechanism reduces the vibration amplitude of the polishing block, reduces defects such as local over-polishing and scratches caused by vibration, and improves the surface smoothness and uniformity of the inner wall polishing.

[0061] When the polishing block is polishing, the suction machine 624 can be turned on simultaneously. The negative pressure suction generated by the suction machine 624 is transmitted to the bellows 635 through the air pipe 622, and then continues to act on the collection groove 6343 that is evenly opened on the side of the limiting pipe 6341 near the polishing wheel 54, so as to achieve directional adsorption of polishing debris. The evenly distributed collection groove 6343 can cover the working area of ​​the polishing wheel 54, preventing debris from remaining in the gaps of the inner wall of the tank.

[0062] After the debris enters the inner side of the limiting tube 6341 through the collection trough 6343, it is guided by the pre-set frustum-shaped guide tube 6342 inside the tube to prevent the debris from accumulating and blocking inside the tube. The debris is smoothly guided to the corrugated tube 635. Finally, the debris is continuously transported to the collection shell 621 through the continuous channel between the corrugated tube 635 and the air pipe 622 for centralized collection. The entire process is a closed transmission to avoid dust diffusion, which not only ensures a clean working environment, but also facilitates subsequent debris recycling and processing.

[0063] Please see Figures 1-8 The collection mechanism 62 includes a collection housing 621. The bottom of the collection housing 621 is fixedly connected to the side of the collection rack 61. An air pipe 622 is fixedly connected to the side of the collection housing 621. The other end of the air pipe 622 passes through the collection rack 61 and is fixedly connected to the corrugated pipe 635. A cleaning port 623 is fixedly connected to the side of the collection housing 621 away from the air pipe 622. An air aspirator 624 is fixedly connected to the bottom of the inner cavity of the collection housing 621. A mesh plate 625 is fixedly connected to the inner side of the collection housing 621. A cleaning component 626 is rotatably connected to the top of the mesh plate 625.

[0064] When impurities generated during polishing are continuously drawn into the inner cavity of the collection shell 621 through the air pipe 622 under the suction of the air suction machine 624, the stable suction of the air suction machine 624 provides continuous power for the conveying of debris, ensuring that metal debris and other impurities generated during polishing are introduced into the collection area, and preventing debris from scattering and contaminating the inner wall of the tank or the working environment.

[0065] At the same time, the airflow generated by the inhaler 624 drives the cleaning component 626 to rotate on top of the mesh plate 625 inside the collection housing 621. The cleaning component 626 continuously cleans the inner wall of the collection housing 621 with the airflow, preventing debris from adhering to the inner wall of the housing due to static electricity or stickiness, ensuring that the collection housing 621 always maintains a high effective capacity, and maintaining the suction power of the inhalation system is stable.

[0066] When it is necessary to process the collected debris, the preset cleaning port 623 can be opened directly to quickly empty the debris inside the collection shell 621 through the cleaning port 623.

[0067] Please see Figures 1-9 The cleaning component 626 includes a cleaning rod 6261, the bottom of which is rotatably connected to the top of the mesh plate 625. A spiral blade 6266 is fixedly connected to the bottom of the cleaning rod 6261. Cleaning shafts 6262 are evenly arranged on the side of the cleaning rod 6261. The side of the cleaning shafts 6262 is fixedly connected to the inside of the cleaning rod 6261. A sliding rod 6263 is slidably connected to the inside of the cleaning shafts 6262. A scraper 6264 is fixedly connected to the other end of the sliding rod 6263. A third spring 6265 is sleeved on the sliding rod 6263. One end of the third spring 6265 is fixedly connected to the end of the cleaning shaft 6262 away from the cleaning rod 6261. The other end of the third spring 6265 is fixedly connected to the side of the scraper 6264.

[0068] When the suction machine 624 is working, the suction force it generates drives the spiral blade 6266 to rotate at the bottom of the screen plate 625. In turn, the spiral blade 6266 drives the cleaning rod and the cleaning shaft 6262 to rotate synchronously above the screen plate 625. During the rotation, the centrifugal force causes the slide rod 6263 to slide along the inner side of the cleaning shaft 6262. At the same time, it pulls the third spring 6265 sleeved on the slide rod 6263 to produce elastic deformation, which finally drives the scraper 6264 to approach and contact the inner wall of the collection shell 621.

[0069] By adaptively adjusting the contact pressure between the scraper 6264 and the inner wall through centrifugal force, and in conjunction with the rotational motion of the cleaning shaft 6262, the scraper 6264 can fully cover the inner wall of the collection shell 621, remove the attached debris, and avoid the decrease in collection efficiency caused by the accumulation of impurities.

[0070] The elastic support of the third spring 6265 keeps the scraper 6264 in flexible contact with the inner wall, which can not only ensure the cleaning effect, but also avoid rigid collisions that could cause scratches and damage to the inner wall of the collection shell 621, thus extending the service life of the equipment.

[0071] Specific workflow:

[0072] First, thoroughly clean the inner wall of the tank to completely remove any remaining welding spatter, weld beads, scale, oil, and other impurities, ensuring that there are no hard particles remaining on the inner wall.

[0073] According to the tank diameter specifications, the positioning distance between the positioning components 4 is adjusted accordingly. After the adjustment is completed, the tank is hoisted onto the positioning fixture to ensure that it is placed stably.

[0074] The fixing mechanism is activated, and the tank placed on the positioning fixture is fastened by the fixing component 2 to prevent the tank from shifting during the polishing process;

[0075] Activate polishing component 5, allowing it to extend into the inner cavity of the tank. Polishing component 5 starts from one end of the cylinder and feeds at a uniform speed along the axial direction. At the same time, it covers the inner wall circle by circle through radial movement to achieve uniform polishing.

[0076] The collecting component 6 works synchronously with the polishing component 5. By contacting and adhering to the polishing head, it collects the metal debris generated during the polishing process in real time, preventing debris residue from contaminating the inner wall or affecting the polishing accuracy.

[0077] Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of them. All other embodiments obtained by those skilled in the art and related fields based on the embodiments of the present invention without inventive effort should fall within the scope of protection of the present invention. Structures, devices, and operating methods not specifically described and explained in the present invention, unless otherwise specified or limited, shall be implemented according to conventional means in the art.

Claims

1. A polishing device for the inner wall of a cryogenic liquid storage tank during manufacturing, characterized in that, Include: Workbench (1), the middle of the side of the workbench (1) is fixedly connected with a fixed part (2), the side away from the fixed part (2) of the workbench (1) is fixedly connected with a transmission part (3), one side of the top of the workbench (1) is fixedly connected with a polishing part (5), both sides of the top of the workbench (1) are fixedly connected with a positioning part (4); The collecting part (6) is used for collecting the debris generated during polishing the inner wall of the tank, and the side of the collecting part (6) is fixedly connected with the side of the workbench (1) away from the polishing part (5); The positioning part (4) includes four positioning frames (41) and two lead screws (43), the bottom of the positioning frame (41) is slidably connected with the top of the workbench (1), the inner side of the positioning frame (41) is fixedly connected with an electric rotating wheel (42), both ends of the lead screw (43) are rotatably connected with the inner side of the workbench (1), one end of the lead screw (43) is fixedly connected with the output end of the transmission part (3), and the bottom of the positioning frame (41) is threadedly connected with the side of the lead screw (43) through a sliding block; The polishing part (5) includes a connecting frame (51), the bottom of the connecting frame (51) is fixedly connected with the top of the workbench (1), the side of the connecting frame (51) is fixedly connected with a driving part (52), the side away from the driving part (52) of the connecting frame (51) is slidably connected with a connecting shaft (53), one end of the connecting shaft (53) is fixedly connected with the output end of the driving part (52), the other end of the connecting shaft (53) is fixedly connected with a polishing wheel (54), the side away from the connecting shaft (53) of the polishing wheel (54) is fixedly connected with a connecting disc (55), the inner side of the connecting disc (55) is fixedly connected with a round rod (56); The collecting part (6) includes a collecting frame (61), the bottom of the collecting frame (61) is fixedly connected with the top of the workbench (1), the side close to the polishing wheel (54) of the collecting frame (61) is fixedly connected with a buffer mechanism (63), and the other side of the collecting frame (61) is fixedly connected with a collecting mechanism (62); The buffer mechanism (63) includes a buffer frame (631), the side of the buffer frame (631) is uniformly provided with a buffer shaft (632), the side of the buffer shaft (632) is slidably connected with the inner side of the buffer frame (631), the other end of the buffer shaft (632) is fixedly connected with a limiting assembly (634), the middle of the buffer frame (631) is fixedly connected with a bellows (635), and the buffer shaft (632) is provided with a first spring (633). The limiting component (634) includes a limiting pipe (6341), the inner cavity of the limiting pipe (6341) is fixedly connected with a guide pipe (6342), the inner side of the limiting pipe (6341) is uniformly provided with a collecting groove (6343), the middle of the inner side of the limiting pipe (6341) is slidably connected with a limiting shaft (6344), the limiting shaft (6344) is sleeved with a second spring (6348), the other end of the limiting shaft (6344) is fixedly connected with a limiting plate (6345), the side, away from the limiting shaft (6344), of the limiting plate (6345) is fixedly connected with a limiting block (6346), and the side of the limiting plate (6345) is uniformly provided with a limiting hole (6347).

2. A tank inner wall polishing apparatus for manufacturing a cryogenic liquid storage tank according to claim 1, characterized in that: The side, away from the buffer shaft (632), of the buffer frame (631) is fixedly connected with the side of the collecting frame (61), one end of the first spring (633) is fixedly connected with the buffer frame (631), and the other end of the first spring (633) is fixedly connected with the side, away from the limiting plate (6345), of the limiting pipe (6341).

3. A tank body inner wall polishing apparatus for manufacturing a cryogenic liquid storage tank according to claim 1, characterized in that: The side, away from the limiting plate (6345), of the limiting pipe (6341) is fixedly connected with the buffer shaft (632), one end of the second spring (6348) is fixedly connected with the limiting plate (6345), and the other end of the second spring (6348) is fixedly connected with the inner side of the limiting pipe (6341).

4. A tank interior wall polishing apparatus for the manufacture of cryogenic liquid storage tanks according to claim 1, characterized in that: The collecting mechanism (62) includes a collecting shell (621), the bottom of the collecting shell (621) is fixedly connected with the side of the collecting frame (61), the side of the collecting shell (621) is fixedly connected with an air pipe (622), the other end of the air pipe (622) penetrates through the collecting frame (61) and is fixedly connected with the corrugated pipe (635), the side, away from the air pipe (622), of the collecting shell (621) is fixedly connected with a cleaning port (623), the bottom of the inner cavity of the collecting shell (621) is fixedly connected with an air suction machine (624), the inner side of the collecting shell (621) is fixedly connected with a mesh plate (625), and the top of the mesh plate (625) is rotatably connected with a cleaning assembly (626).

5. A tank interior wall polishing apparatus for the manufacture of cryogenic liquid storage tanks according to claim 4, characterized in that: The cleaning assembly (626) includes a cleaning rod (6261), the bottom of the cleaning rod (6261) is fixedly connected with a spiral blade (6266), the side of the cleaning rod (6261) is uniformly provided with a cleaning shaft (6262), the side of the cleaning shaft (6262) is fixedly connected with the inner side of the cleaning rod (6261), the inner side of the cleaning shaft (6262) is slidably connected with a sliding rod (6263), the other end of the sliding rod (6263) is fixedly connected with a scraper (6264), and the sliding rod (6263) is sleeved with a third spring (6265).

6. A tank interior wall polishing apparatus for the manufacture of cryogenic liquid storage tanks according to claim 5, characterized in that: The bottom of the cleaning rod (6261) is rotationally connected with the top of the screen plate (625), one end of the third spring (6265) is fixedly connected with the end of the cleaning shaft (6262) away from the cleaning rod (6261), and the other end of the third spring (6265) is fixedly connected with the side surface of the scraper (6264).

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