Glass ceramic thinning device and thinning method thereof

Abstract

The invention discloses a glass ceramic thinning device and a thinning method thereof, and the device comprises an etching groove which can accommodate an etching solution; the fixing assembly can fix the microcrystalline glass; the fixing assembly can be mounted in the insertion basket assembly; and the insertion basket assembly can be arranged in the etching groove. An alkaline etching process is adopted, surface atomization is effectively inhibited by optimizing an etching formula, through a matched developed etching device, the fragment rate is reduced, meanwhile, the etching uniformity is improved, the surface quality is improved, and compared with a traditional hydrofluoric acid etching system, the environment pollution and the operation risk are reduced.

Description

Technical Field

[0001] This invention belongs to the field of electronic device screen cover technology, and particularly relates to a microcrystalline glass thinning device and its thinning method. Background Art

[0002] Due to its excellent thermal stability, mechanical strength, and optical properties, glass-ceramics are widely used in electronic device cover plates (such as smartphones and foldable screens) and semiconductor packaging substrates. With the increasing demand for thinner and lighter electronic devices, higher requirements are being placed on the thinning processing precision (such as thickness uniformity and surface roughness) and processing efficiency of glass-ceramics.

[0003] In the process of realizing this invention, the inventors discovered that the prior art has at least the following problems:

[0004] Currently, there are still many drawbacks in the etching and thinning of glass-ceramics. In acid etching techniques, the multiphase composite structure of glass-ceramics easily leads to the reaction of rare earth elements with hydrofluoric acid to form insoluble fluorides, causing surface deposition and fogging phenomena, which hinder the etching process.

[0005] CN112408805A - Ultra-thin glass thinning support device and thinning device, discloses an ultra-thin glass thinning support device, including a support frame, a sealing cover and an anti-tipping structure. The support frame has openings at both ends, with one end having a larger opening and the other end having a smaller opening. A sealing frame and a protective edge structure are installed inside the support frame. The sealing cover is sealed to the end with the larger opening and has a gas supply port on the sealing cover. However, this does not solve the above-mentioned technical problem. Summary of the Invention

[0006] The technical problem to be solved by this invention is a microcrystalline glass thinning device and method. It adopts an alkaline etching process, effectively suppresses surface fogging by optimizing the etching formula, and reduces the fragmentation rate while increasing etching uniformity and improving surface quality through the developed etching device. Compared with the traditional hydrofluoric acid etching system, it reduces environmental pollution and operational risks.

[0007] To solve the above-mentioned technical problems, the technical solution adopted by the present invention is: a microcrystalline glass thinning device, comprising:

[0008] Etching tank, capable of holding etching solution;

[0009] The fixing component can fix the microcrystalline glass;

[0010] The basket assembly, wherein the fixing component can be installed inside the basket assembly; the basket assembly can be inserted into the etching tank.

[0011] The fixing component has a fixing frame, and the fixing frame is provided with a pressure strip that can press the microcrystalline glass. The pressure strip is connected to the fixing frame by bolts.

[0012] The basket assembly has a basket body, and the basket body is provided with a basket slot for accommodating the fixing component.

[0013] The thinning method of the above-mentioned microcrystalline glass thinning device includes the following steps:

[0014] 1) Prepare etching solutions of specific concentrations according to etching requirements;

[0015] 2) Pour the prepared etching solution into the etching tank;

[0016] 3) Use fixing components to clamp and fix the microcrystalline glass;

[0017] 4) Insert the fixed glass assembly into the basket assembly;

[0018] 5) Immerse the entire basket into the etching tank, ensuring that the microcrystalline glass is completely submerged in the etching solution for the reaction;

[0019] 6) After the preset etching time is reached, the components are removed for quality inspection and evaluation.

[0020] In step 1) above, the glass etching solution composition contains 10-60 wt% potassium hydroxide, 0.1-1 mol / L tetrasodium ethylenediaminetetraacetate, 1-5 wt% sodium metasilicate, and the balance being water.

[0021] In step 2) above, the etching tank is heated by an external heating device to control the temperature of the etching tank.

[0022] The bottom of the etching tank is equipped with a drain port, which is connected to an external filter unit and a circulation pump; the etching tank is made of 304 stainless steel or Teflon.

[0023] In step 4) above, after the microcrystalline glass fixing component is fixed in the basket assembly, the basket is driven to move up and down reciprocatingly by the up-and-down reciprocating motion mechanism.

[0024] In step 5) above, the etching solution in the etching tank is continuously circulated through a filtration unit and a circulation pump.

[0025] One of the above technical solutions has the following advantages or beneficial effects: it adopts an alkaline etching process, effectively suppresses surface fogging by optimizing the etching formula, and reduces the fragmentation rate while increasing etching uniformity and improving surface quality through the development of a matching etching device. Compared with the traditional hydrofluoric acid etching system, it reduces environmental pollution and operational risks. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the microcrystalline glass thinning device provided in an embodiment of the present invention;

[0027] Figure 2 for Figure 1 A schematic diagram of the microcrystalline glass thinning device;

[0028] Figure 3 for Figure 1 A schematic diagram of the microcrystalline glass thinning device;

[0029] Figure 4 for Figure 1 A schematic diagram of the microcrystalline glass thinning device;

[0030] Figure 5 for Figure 1 Surface image after etching under a high-magnification microscope after thinning treatment by the microcrystalline glass thinning device;

[0031] Figure 6 for Figure 1 The thickness of the glass after microcrystalline etching following the thinning process of the microcrystalline glass thinning device (original thickness 200um);

[0032] The markings in the above figures are as follows: 1. Etching groove, 2. Basket assembly, 21. Basket body, 22. Basket slot, 3. Fixing assembly, 4. Fixing frame, 5. Bolt, 6. Pressure strip. DETAILED DESCRIPTION

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0034] Example 1

[0035] See Figures 1-6 A microcrystalline glass thinning device comprises: an etching tank 1 capable of containing etching solution; a fixing component 3 capable of fixing the microcrystalline glass; and a basket assembly 2, in which the fixing component 3 can be installed; the basket assembly 2 can be inserted into the etching tank 1. The fixing component 3 is used to fix a single piece of glass and prevent fragmentation during the etching process. It adopts a frame structure, consisting of a fixing frame 4, pressure strips 6, and bolts 5.

[0036] The fixing component 3 has a fixing frame 4, and the fixing frame 4 is provided with a pressure strip 6 that can press the microcrystalline glass. The pressure strip 6 is connected to the fixing frame 4 by bolts 5.

[0037] The basket assembly 2 has a basket body 21, on which a basket slot 22 is provided to accommodate the fixing component 3. The basket assembly 2 is used to support the fixing component 3, enabling simultaneous etching of multiple glass pieces. It adopts a basket structure with limit slots for easy insertion and removal of the fixing component 3, and can support 3-5 fixed picture frames.

[0038] Etching tank assembly: mainly used to hold etching solution, corrosion resistant and high temperature resistant.

[0039] The fixing component 3 adopts a picture frame structure, consisting of a fixing frame 4, a pressure strip 6, and bolts 5; the basket assembly 2 adopts a basket structure with a limit slot for easy insertion and removal of the fixing component 3, and can support 3-5 fixed picture frames; the fixing component 3 and the basket assembly 2 are preferably made of Teflon (PTFE); the microcrystalline glass moves up and down with the basket assembly 2; the etching tank is preferably made of 304 stainless steel or PTFE (Teflon), and the bottom of the etching tank is provided with a drain port, which is connected to an external filter unit and a circulation pump.

[0040] The glass etching solution composition contains 10-60 wt% potassium hydroxide (KOH), 0.1-1 mol / L tetrasodium ethylenediaminetetraacetate (EDTA-4Na), 1-5 wt% sodium metasilicate (Na2SiO3), and the balance water; preferably 50% KOH and 0.3 mol / L EDTA-4Na.

[0041] The thinning method of the microcrystalline glass thinning device includes the following steps: 1) preparing an etching solution of a specific concentration according to etching requirements; 2) injecting the prepared etching solution into the etching tank; 3) clamping and fixing the microcrystalline glass using the fixing component 3; 4) loading the fixed glass component into the basket component 2; 5) immersing the entire basket into the etching tank to ensure that the microcrystalline glass is completely submerged in the etching solution for reaction; 6) removing the component after the preset etching time is reached for quality inspection and evaluation.

[0042] In step one, the higher the KOH content in the etching solution, the better the etching effect. Considering both cost and etching efficiency, 50% is the optimal value.

[0043] In step one, by adding a chelating agent, metal ions such as zirconium, yttrium, and titanium in the reaction solution are removed to reduce scratches. 0.3 mol / L ethylenediaminetetraacetic acid tetrasodium (EDTA-4Na) is preferred.

[0044] In step two, an external heating system heats the etching tank to control the temperature of the etching solution.

[0045] In step two, a drain outlet is provided at the bottom of the etching tank, which is connected to an external filtration unit and a circulation pump. The etching tank is preferably made of 304 stainless steel or PTFE (Teflon).

[0046] The fixing component 3 and the basket assembly 2 are preferably made of PTFE (Teflon).

[0047] In step four, after the microcrystalline glass fixing component 3 is fixed in the basket assembly 2, the basket can be driven to reciprocate through the up-and-down reciprocating motion mechanism to ensure the uniformity of the etching reaction.

[0048] Furthermore: In step five, during the etching process, the etching solution in the etching tank assembly is continuously circulated through a filtration unit and a circulation pump.

[0049] By optimizing the etching formula, surface fogging is effectively suppressed. With the development of a matching etching device, the fragmentation rate is reduced while the etching uniformity is increased, thus improving the surface quality. Compared with the traditional hydrofluoric acid etching system, environmental pollution and operational risks are reduced.

[0050] Example 2

[0051] The thinning method of the above-mentioned microcrystalline glass thinning device includes the following steps:

[0052] Step 1: Prepare the etching solution based on the total mass of the composition, using 30wt% KOH, 0.1mol / L tetrasodium ethylenediaminetetraacetate (EDTA-4Na), 3wt% sodium metasilicate (Na2SiO3), and the balance water;

[0053] Step 2: Place the prepared etching solution into the etching tank and set the temperature to 60℃;

[0054] Step 3: First, place the microcrystalline glass into the fixing component 3 and clamp it in place;

[0055] Step 4: Insert the three glass pieces and fixing component 3 into the basket assembly 2;

[0056] Step 5: Place the basket assembly 2 into the etching tank assembly, ensuring the microcrystalline glass is completely immersed in the etching solution for the etching reaction. The microcrystalline glass fixing assembly 3 reciprocates within the basket assembly 2 (amplitude 5mm, frequency 0.5Hz).

[0057] Step Six: After 8 hours of etching, the microcrystalline glass was removed for observation and testing. The glass etching depth was 42 μm, and the etching rate was 4 μm. No defects were observed on the surface.

[0058] The alkaline etching process effectively suppresses surface fogging by optimizing the etching formula. With the development of a matching etching device, the fragmentation rate is reduced while the etching uniformity is increased, thus improving the surface quality. Compared with the traditional hydrofluoric acid etching system, it reduces environmental pollution and operational risks.

[0059] Example 3

[0060] The thinning method of the above-mentioned microcrystalline glass thinning device includes the following steps:

[0061] Step 1: Prepare the etching solution based on the total mass of the composition, 50wt% KOH, 0.15mol / L tetrasodium ethylenediaminetetraacetate (EDTA-4Na), 4wt% sodium metasilicate (Na2SiO3) and the balance water;

[0062] Step 2: Place the prepared etching solution into the etching tank and set the temperature to 90℃;

[0063] Step 3: First, place the microcrystalline glass into the fixing component 3 and clamp it in place;

[0064] Step 4: Insert the three glass pieces and fixing component 3 into the basket assembly 2;

[0065] Step 5: Place the basket assembly 2 into the etching tank assembly, ensuring the microcrystalline glass is completely immersed in the etching solution for the etching reaction. The microcrystalline glass fixing assembly 3 reciprocates within the basket assembly 2 (amplitude 5mm, frequency 0.5Hz).

[0066] Step Six: After 8 hours of etching, the microcrystalline glass was removed for observation and testing. The glass etching depth was 64 μm, and the etching rate was 8 μm. No defects were observed on the surface.

[0067] The alkaline etching process effectively suppresses surface fogging by optimizing the etching formula. With the development of a matching etching device, the fragmentation rate is reduced while the etching uniformity is increased, thus improving the surface quality. Compared with the traditional hydrofluoric acid etching system, it reduces environmental pollution and operational risks.

[0068] Example 4

[0069] The thinning method of the above-mentioned microcrystalline glass thinning device includes the following steps:

[0070] A method and apparatus for thinning microcrystalline glass, the actual operation steps of which are as follows:

[0071] Step 1: Prepare the etching solution based on the total mass of the composition: 60 wt% KOH, 0.3 mol / L tetrasodium ethylenediaminetetraacetate (EDTA-4Na), 5 wt% sodium metasilicate (Na2SiO3), and the balance water;

[0072] Step 2: Place the prepared etching solution into the etching tank and set the temperature to 90℃;

[0073] Step 3: First, place the microcrystalline glass into the fixing component 3 and clamp it in place;

[0074] Step 4: Insert the three glass pieces and fixing component 3 into the basket assembly 2;

[0075] Step 5: Place the basket assembly 2 into the etching tank assembly, ensuring the microcrystalline glass is completely immersed in the etching solution for the etching reaction. The microcrystalline glass fixing assembly 3 reciprocates within the basket assembly 2 (amplitude 5mm, frequency 0.5Hz).

[0076] Step Six: After 8 hours of etching, the microcrystalline glass is removed for observation and testing. The glass etching depth is 80 μm, and the etching rate is 10 μm. No defects are observed on the surface.

[0077] The alkaline etching process effectively suppresses surface fogging by optimizing the etching formula. With the development of a matching etching device, the fragmentation rate is reduced while the etching uniformity is increased, thus improving the surface quality. Compared with the traditional hydrofluoric acid etching system, it reduces environmental pollution and operational risks.

[0078] In the description of this invention, it should be understood that the terms "coaxial," "bottom," "one end," "top," "middle," "other end," "upper," "side," "top," "inner," "front," "center," "both ends," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0079] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "setting," "connection," "fixing," "screw connection," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal connection of two components or the interaction between two components. Unless otherwise explicitly limited, those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0080] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A microcrystalline glass thinning device, characterized in that, have: Etching tank, capable of holding etching solution; The fixing component can fix the microcrystalline glass; The basket assembly, wherein the fixing component can be installed inside the basket assembly; the basket assembly can be inserted into the etching tank.

2. The microcrystalline glass thinning device as described in claim 1, characterized in that, The fixing component has a fixing frame, and the fixing frame is provided with a pressure strip that can press the microcrystalline glass. The pressure strip is connected to the fixing frame by bolts.

3. The microcrystalline glass thinning device as described in claim 2, characterized in that, The basket assembly has a basket body, and the basket body is provided with a basket slot for accommodating the fixing component.

4. The thinning method of the microcrystalline glass thinning apparatus according to any one of claims 1 to 3, characterized in that, Includes the following steps: 1) Prepare etching solutions of specific concentrations according to etching requirements; 2) Pour the prepared etching solution into the etching tank; 3) Use fixing components to clamp and fix the microcrystalline glass; 4) Insert the fixed glass assembly into the basket assembly; 5) Immerse the entire basket into the etching tank, ensuring that the microcrystalline glass is completely submerged in the etching solution for the reaction; 6) After the preset etching time is reached, the components are removed for quality inspection and evaluation.

5. The thinning method of the microcrystalline glass thinning apparatus as described in claim 3, characterized in that, In step 1) above, the glass etching solution composition contains 10-60 wt% potassium hydroxide, 0.1-1 mol / L tetrasodium ethylenediaminetetraacetate, 1-5 wt% sodium metasilicate, and the balance being water.

6. The thinning method of the microcrystalline glass thinning apparatus as described in claim 4, characterized in that, In step 2) above, the etching tank is heated by an external heating device to control the temperature of the etching tank.

7. The thinning method of the microcrystalline glass thinning apparatus as described in claim 5, characterized in that, The bottom of the etching tank is equipped with a drain port, which is connected to an external filter unit and a circulation pump; the etching tank is made of 304 stainless steel or Teflon.

8. The thinning method of the microcrystalline glass thinning apparatus as described in claim 6, characterized in that, In step 4) above, after the microcrystalline glass fixing component is fixed in the basket assembly, the basket is driven to move up and down reciprocatingly by the up-and-down reciprocating motion mechanism.

9. The thinning method of the microcrystalline glass thinning apparatus as described in claim 7, characterized in that, In step 5) above, the etching solution in the etching tank is continuously circulated through a filtration unit and a circulation pump.

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