A mixing device for photoresist

Abstract

The application relates to the technical field of photoresist preparation equipment, and provides a mixing device for photoresist, which comprises a stirring tank, a rotating shaft vertically arranged in the stirring tank, an ultrasonic dispersion unit arranged outside the stirring tank, a sleeve fixedly sleeved with the outer periphery of the rotating shaft and provided with a limiting groove with coplanar side walls and separated side walls, a stirring paddle with filter holes penetrating through the limiting groove and rotationally connected with the rotating shaft, and a sliding plate slidingly penetrating through the peripheral wall of the stirring tank; the stirring paddle can be separated in the circumferential direction or coplanar with the filter plate through forward and reverse rotation of the rotating shaft; the sliding plate can be matched with the filter plate to form a material collecting area corresponding to the ultrasonic dispersion unit in the circumferential direction; the lumpy material is intercepted by the filter plate and remains in the material collecting area; after the ultrasonic dispersion unit is started, the ultrasonic energy can be concentrated on the lumpy material in the material collecting area, partial area concentrated dispersion is realized, and the technical problem of low mixing efficiency caused by non-concentration and non-completion of ultrasonic action is solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photoresist preparation equipment, in particular to a photoresist mixing device. BACKGROUND

[0002] In the field of precision electronics such as semiconductor manufacturing and display panel production, photoresist as a key functional material, its composition uniformity directly determines the resolution, line width precision and development stability of the photoresist pattern, and the mixing process is the core link to ensure the composition uniformity of the photoresist. The raw material system of the photoresist often contains resin, photoinitiator, solvent and functional additives. Some raw materials are prone to form lumpy materials during storage or pre-mixing. If such lumpy materials cannot be completely dispersed, it will cause defects such as pinholes and scratches in the photoresist coating, which seriously affects the production yield of downstream devices.

[0003] To solve the problem of lumpy material dispersion, the existing photoresist mixing device usually adopts a composite dispersion structure of "stirring" and "ultrasonic", which mainly includes a sealed stirring cavity, a stirring paddle inserted into the cavity, and an ultrasonic dispersion unit for auxiliary dispersion. Among them, the ultrasonic dispersion unit can destroy the intermolecular force of the lumpy material through the cavitation effect generated by high-frequency vibration, and realize uniform dispersion. It is the key component in the existing technology to improve the dispersion effect.

[0004] However, the ultrasonic dispersion unit of the existing mixing device generally adopts a single-side wall mounting method, that is, the ultrasonic vibrator is fixed to one side wall of the stirring cavity through a flange or welding structure, and the ultrasonic radiation surface faces the inside of the cavity. In the stirring process, the stirring paddle drives the material in the cavity to move in a circular motion, and the lumpy material moves continuously with the whole material flow, and only receives ultrasonic action when flowing through the radiation area of the ultrasonic dispersion unit. Since the ultrasonic radiation has a certain effective action radius, the ultrasonic dispersion unit arranged on the single side wall can only cover a local area of the cavity, and most of the lumpy materials are difficult to enter the effective radiation area or stay in the radiation area for too short a time during the stirring period, resulting in uneven ultrasonic dispersion.

[0005] The above dispersion defects directly lead to a significant reduction in mixing efficiency: in order to achieve the preset dispersion effect, the stirring time needs to be prolonged, which not only increases the production energy consumption, but also may cause thermal aging or solvent evaporation of the photoresist raw materials due to long-time stirring, affecting the performance stability of the photoresist; in addition, even if the stirring time is prolonged, it is still difficult to avoid the existence of lumpy materials that have not been completely dispersed in the local area, resulting in large differences in photoresist uniformity between batches and increasing the difficulty of quality control. SUMMARY

[0006] To overcome the above defects, embodiments of the present application provide a mixing device for photoresist, which solves the technical problem that the ultrasonic dispersion unit of the photoresist stirring device in the prior art is arranged on the side wall of the stirring cavity, and the lumpy material continuously moves in the cavity with the stirring paddle during stirring, so that the ultrasonic dispersion unit cannot disperse the lumpy material uniformly and completely, thereby resulting in low dispersion effect and low mixing efficiency.

[0007] According to one aspect, at least one embodiment of the present application provides a mixing device for photoresist, comprising:

[0008] The stirring tank is internally provided with a rotating shaft arranged vertically, and externally provided with an ultrasonic dispersion unit;

[0009] The sleeve is fixedly sleeved on the outer periphery of the rotating shaft and forms a mounting cavity with the sleeve, the peripheral wall of the sleeve is provided with a plurality of limiting grooves in communication with the mounting cavity, the circumferential angles of the projections of the plurality of limiting grooves increase sequentially from top to bottom, each limiting groove has a coplanar side wall and a separated side wall, the coplanar side walls of the plurality of limiting grooves are arranged coplanarly, and the separated side walls of the plurality of limiting grooves form a stepped structure;

[0010] A plurality of stirring paddles are respectively rotationally connected to the outer periphery of the rotating shaft and correspondingly arranged through the limiting grooves, and the stirring paddles are provided with a plurality of filter holes;

[0011] The sliding plate is slidably arranged through the peripheral wall of the stirring tank and adjacent to the ultrasonic dispersion unit;

[0012] The sleeve can rotate with the rotating shaft in the forward direction to make the plurality of stirring paddles abut against the separated side walls of the plurality of limiting grooves and make the plurality of stirring paddles separate circumferentially, and the sleeve can rotate with the rotating shaft in the reverse direction to make the plurality of stirring paddles abut against the coplanar side walls and make the plurality of stirring paddles coplanar to form a filter plate;

[0013] The sliding plate can slide into the stirring tank to form a material collecting area corresponding to the ultrasonic dispersion unit circumferentially in cooperation with the filter plate.

[0014] For example, the mixing device for photoresist provided by at least one embodiment of the present application further comprises a alignment assembly arranged on the stirring tank, and the alignment assembly comprises:

[0015] The housing is fixedly arranged on the side wall of the stirring tank and located on the side away from the ultrasonic dispersion unit of the sliding plate, and the inner cavity of the housing is in communication with the inside of the stirring tank;

[0016] The rotating member is rotationally connected in the housing and arranged vertically, the rotating member has a blocking protrusion for blocking the sliding plate, and a torsional spring is arranged between the rotating member and the housing, and the torsional spring is used to provide a torsion force for driving the rotating member to rotate to release the sliding plate;

[0017] A plurality of locking mechanisms are vertically arranged on the rotating member and correspondingly arranged with the plurality of stirring paddles, and the locking mechanisms are used to lock the circumferential position of the rotating member and the shell, and the plurality of locking mechanisms can be unlocked under the synchronous action of the plurality of stirring paddles to make the rotating member rotate under the action of the rotating torsion spring and release the sliding plate.

[0018] For example, the mixing device for photoresist provided by at least one embodiment of the present application comprises a rotating member, a shell, a plurality of stirring paddles, a plurality of locking mechanisms, and a sliding plate.

[0019] A trigger rod is rotationally connected to the mounting slot in the middle, and one end of the trigger rod has a trigger end capable of extending into the stirring tank and a connecting end located in the mounting slot, and a guide sliding groove is formed on the connecting end; the trigger end can be swung into the mounting slot under the action of the stirring paddle, and a reset torsion spring is arranged between the trigger rod and the rotating member, and the reset torsion spring is used to provide a reset torsion force for the swing of the trigger rod to make the trigger end reset into the stirring tank.

[0020] A plug-in rod is slidingly connected to the plug-in slot, and one end of the plug-in rod can be clamped into the clamping slot to lock the circumferential position of the rotating member and the shell, and the other end of the plug-in rod is provided with a guide column slidingly and rotationally matched with the guide sliding groove.

[0021] When the rotating shaft rotates forward, the stirring paddle can act on the trigger end to make the trigger rod rotate reversely, so as to drive the plug-in rod to slide by means of the guide column, and the end of the plug-in rod slides into the deep part of the clamping slot, thereby keeping the rotating member and the shell locked.

[0022] When the rotating shaft reversely rotates, the stirring paddle can act on the trigger end to make the trigger rod rotate forward, so as to drive the plug-in rod to slide by means of the guide column, and the end of the plug-in rod slides out of the clamping slot, thereby unlocking the rotating member and the shell.

[0023] For example, the mixing device for photoresist provided by at least one embodiment of the present application comprises a rotating member, a shell, a plurality of stirring paddles, a plurality of locking mechanisms, and a sliding plate.

[0024] The first electromagnetic member can generate a magnetic field repelling the magnetic force plate after being electrified, so that the rotating member reversely rotates against the reset force of the rotating torsion spring, and the end of the plug-in rod is clamped with the clamping slot under the reset action of the trigger rod, thereby locking the circumferential position of the rotating member and the shell.

[0025] For example, the mixing device for photoresist provided by at least one of the embodiments of the present application comprises a sliding plate penetrating through the side wall of the shell and being in sliding fit with the shell, and an elastic member is arranged between the sliding plate and the shell, and the elastic member is used for elastically pushing the sliding plate to make the sliding plate slide into the stirring tank.

[0026] For example, the mixing device for photoresist provided by at least one of the embodiments of the present application comprises a magnetic attraction part arranged on the side of the sliding plate away from the stirring tank, and a second electromagnetic member is slidingly connected to the shell; the second electromagnetic member can generate a magnetic field with the same polarity as the magnetic attraction part after being powered on, so as to magnetically attract the magnetic attraction part and drive the sliding plate to slide away from the stirring tank.

[0027] For example, the mixing device for photoresist provided by at least one of the embodiments of the present application comprises a sleeve, and the sleeve is provided with two groups of axially spaced limiting grooves, and each group of limiting grooves comprises a plurality of limiting grooves, and the limiting grooves are distributed along the axial direction of the sleeve.

[0028] For example, the mixing device for photoresist provided by at least one of the embodiments of the present application comprises a sleeve, and the sleeve is provided with two groups of axially spaced limiting grooves, and each group of limiting grooves comprises a plurality of limiting grooves, and the limiting grooves are distributed along the axial direction of the sleeve.

[0029] For example, the mixing device for photoresist provided by at least one of the embodiments of the present application comprises a sleeve, and the sleeve is provided with two groups of axially spaced limiting grooves, and each group of limiting grooves comprises a plurality of limiting grooves, and the limiting grooves are distributed along the axial direction of the sleeve.

[0030] For example, the mixing device for photoresist provided by at least one of the embodiments of the present application comprises a sleeve, and the sleeve is provided with two groups of axially spaced limiting grooves, and each group of limiting grooves comprises a plurality of limiting grooves, and the limiting grooves are distributed along the axial direction of the sleeve.

[0031] The embodiments of the present application have the following beneficial effects:

[0032] In the present application, when the rotating shaft is reversed, the sleeve is synchronously reversed with the rotating shaft, and when the stirring paddle forms a filter plate, the sliding plate is driven to slide, so that the sliding plate extends into the stirring tank; the sliding plate and the filter plate enclose a material collecting area in the stirring tank, and the circumferential position of the material collecting area corresponds to the ultrasonic dispersion unit, that is, the radiation surface of the ultrasonic dispersion unit is opposite to the material collecting area; the clumped material is intercepted by the filter plate and remains in the material collecting area; after the ultrasonic dispersion unit is started, the ultrasonic energy can be concentrated on the clumped material in the material collecting area, so that the "targeted dispersion" is realized, and the defects of low efficiency caused by the non-concentration and non-completion of ultrasonic action are completely solved. BRIEF DESCRIPTION OF DRAWINGS

[0033] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments of the present application will be briefly introduced. Obviously, the drawings in the following description are only some example embodiments of the present application. For those skilled in the art, other drawings can be obtained according to the contents of the example embodiments of the present application and the drawings without any creative effort.

[0034] Figure 1 A structure diagram of a mixing device stirring state for a photoresist in an embodiment of the present application;

[0035] Figure 2 A cross-sectional top view of the mixing device stirring state in the embodiment of the present application; Figure 1

[0036] Figure 3 An enlarged view of A in the embodiment of the present application; Figure 2

[0037] Figure 4 A structure diagram of a rotating shaft, a sleeve and a stirring paddle stirring state in the embodiment of the present application; Figure 1

[0038] Figure 5 An enlarged view of B in the embodiment of the present application; Figure 2

[0039] Figure 6 An enlarged view of C in the embodiment of the present application; Figure 1

[0040] Figure 7 A cross-sectional internal structure diagram of the mixing device collecting group-shaped material state in the embodiment of the present application; Figure 1

[0041] Figure 8 A cross-sectional top view of the mixing device collecting group-shaped material state in the embodiment of the present application; Figure 1

[0042] Figure 9 An enlarged view of D in the embodiment of the present application; Figure 8

[0043] Figure 10 A structure diagram of a rotating shaft, a sleeve and a stirring paddle collecting group-shaped material state in the embodiment of the present application; Figure 1

[0044] Figure 11 Another view structure diagram of a rotating shaft, a sleeve and a stirring paddle collecting group-shaped material state in the embodiment of the present application. Figure 1

[0045] ​​​​​​​​​​In the figure: 1, stirring tank; 2, ultrasonic dispersion unit; 3, rotating shaft; 4, sleeve; 31, mounting cavity; 41, limiting groove; 411, coplanar side wall; 412, separated side wall; 5, stirring paddle; 51, filter plate; 6, sliding plate; 61, material collecting area; 7, shell; 8, rotating piece; 84, blocking protrusion; 9, locking mechanism; 81, mounting groove; 82, insertion groove; 71, clamping groove; 91, trigger rod; 911, guide sliding groove; 92, insertion rod; 921, guide column; 83, magnetic plate; 10, first electromagnetic piece; 62, elastic piece; 63, magnetic attraction part; 11, second electromagnetic piece; 711, guide chamfer; 912, arc-shaped abutting surface; 101, feeding port; 102, discharging port; 12, material guide plate. DETAILED DESCRIPTION

[0046] The application will be further described below in conjunction with the drawings and examples. It can be understood that the specific examples described herein are only used to explain the application, but not to limit the application.

[0047] In order to make the drawing simple, only the parts related to the disclosure are shown in each figure, which does not represent the actual structure of the product. In addition, in order to make the drawing simple and easy to understand, only one of the parts with the same structure or function is shown in some figures, or only one of them is marked. In this article, "one" not only means "only one", but also means "more than one", and "several" includes "two" and "more than two".

[0048] In this article, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connection" and "connection" should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or the communication between two elements. For those skilled in the art, the specific meaning of the above terms in the application can be understood according to the specific circumstances.

[0049] In the application, unless otherwise explicitly specified and limited, the "upper" or "lower" of the first feature to the second feature can include the direct contact of the first and second features, or the contact of the first and second features through another feature between them. Moreover, the "upper", "upper" and "upper" of the first feature to the second feature includes the vertical direction of the first feature above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The "lower", "lower" and "lower" of the first feature to the second feature includes the vertical direction of the first feature below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0050] In the description of the embodiments, the terms "upper", "lower", "left", "right", and other orientation or positional relationships are based on the orientation or positional relationships shown in the drawings, and are only for the convenience of description and simplification of operation, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application.

[0051] In addition, in the description of the present application, the terms "first", "second", and the like are only used for differentiation in description, and cannot be understood as indicating or implying relative importance.

[0052] In the field of precision electronics such as semiconductor manufacturing and display panel production, photoresist is a key functional material for pattern transfer, and its composition uniformity directly determines the resolution, line width accuracy and development stability of the lithography pattern. If there are un-dispersed lump materials in the photoresist, it will cause defects such as pinholes and scratches in the coating, which will seriously reduce the production yield of downstream devices. As a key link to ensure the composition uniformity of photoresist, the mixing process needs to achieve sufficient mixing of resin, photoinitiator, solvent and functional additives, especially to solve the dispersion problem of lump materials formed during storage or pre-mixing of some raw materials.

[0053] The existing photoresist mixing device mostly adopts a composite dispersion structure combining stirring and ultrasonic, which usually includes a sealed stirring cavity, a fixed stirring paddle extending into the cavity, and an ultrasonic dispersion unit installed on one side wall. Among them, the ultrasonic dispersion unit destroys the intermolecular force of the lump material through the cavitation effect generated by high-frequency vibration, but the single-side wall installation method has a significant defect: when the stirring paddle moves the material in a circular motion, the lump material can only pass through the ultrasonic radiation area for a short time, and the effective action radius of the ultrasonic is limited, so most of the lump material cannot enter the radiation area or stay for too short a time, resulting in non-concentrated ultrasonic vibration and dispersion, which requires longer stirring time to ensure dispersion effect. This not only increases energy consumption, but also may cause thermal aging of photoresist raw materials or solvent evaporation due to long-time stirring, affecting performance stability, and the uniformity difference between batches is large, making it difficult to improve quality control.

[0054] The photoresist mixing device of the present embodiment takes the stirring tank 1 as the core, and the overall structure includes the stirring tank 1, the rotating shaft 3, the ultrasonic dispersion unit 2, the sleeve 4, the stirring paddle 5 and the sliding plate 6, and their connection relationship is as follows:

[0055] As Figure 1 , Figure 7As shown, the stirring tank 1 is a closed cavity with a top inlet 101 and a bottom outlet 102, serving as the core space for material mixing. A guide plate 12 is fixed below the top inlet 101. The guide plate 12 extends downwardly and obliquely away from the inlet 101, guiding the raw materials to fall smoothly into the tank, and enabling the materials to slide along the tank wall to avoid splashing when entering the stirring tank 1. A valve can be configured at the bottom outlet 102 to control the discharge of the mixed photoresist.

[0056] The rotating shaft 3 is vertically arranged inside the stirring tank 1, and is rotatably connected to the top wall and the bottom wall of the stirring tank 1. The upper end of the rotating shaft 3 extends out of the stirring tank 1 and is connected to an external driving mechanism (such as a motor), which can be driven to rotate clockwise or counterclockwise around its own axis to provide power for stirring.

[0057] The ultrasonic dispersion unit 2 is fixed to the outer side wall of the stirring tank 1, with its radiation surface facing the inside of the stirring tank 1. It applies ultrasonic energy to the materials in the tank through high-frequency vibration to destroy the intermolecular forces of the bulk materials and achieve dispersion. The installation position of the ultrasonic dispersion unit 2 corresponds to the circumferential direction of the subsequent material collection area 61 to ensure that the ultrasonic energy is concentrated on the bulk materials.

[0058] As shown in Figure 3 , Figure 4 , Figure 10 , Figure 11 , the sleeve 4 is fixedly sleeved on the outer periphery of the rotating shaft 3. An annular mounting cavity 31 is formed between the sleeve 4 and the rotating shaft 3, which provides space for the rotation of the stirring paddle 5 and limits the radial displacement of the stirring paddle 5. A plurality of limiting grooves 41 are formed in the circumferential wall of the sleeve 4. Each limiting groove 41 penetrates the sleeve 4 radially and communicates with the mounting cavity 31. The circumferential angles of the projections of the limiting grooves 41 on the horizontal plane increase from top to bottom. Each limiting groove 41 has a coplanar side wall 411 and a separate side wall 412. The coplanar side walls 411 of all limiting grooves 41 are in the same plane, and the separate side walls 412 of all limiting grooves 41 are staggered in the circumferential direction of the sleeve 4, forming a stepped structure.

[0059] The number of stirring paddles 5 corresponds to the number of limiting grooves 41. One end of each stirring paddle 5 is rotatably connected to the outer periphery of the rotating shaft 3 through a shaft sleeve structure, and this end is located in the mounting cavity 31. The other end of the stirring paddle 5 extends to the outside of the sleeve 4 through the corresponding limiting groove 41, and can move synchronously with the rotating shaft 3, and can scrape the inner wall of the stirring tank 1. A plurality of filter holes are formed in the plate surface of the stirring paddle 5.

[0060] As shown in Figure 1 , Figure 8As shown, the sliding plate 6 slides through the peripheral wall of the stirring tank 1, and the installation position of the sliding plate 6 is adjacent to the ultrasonic dispersion unit 2. The sliding plate 6 can slide under the driving of external force, and extend into or exit from the stirring tank 1.

[0061] The device realizes the integrated process of stirring dispersion, interception of lump materials, and concentrated ultrasonic treatment through the cooperation structure of the stirring paddle 5 and the sleeve 4, the material collecting structure of the sliding plate 6 and the filter plate 51, the side wall of the limiting groove 41 and the filter hole of the stirring paddle 5. The specific working process is as follows:

[0062] The sleeve 4 rotates synchronously with the rotating shaft 3, and the different side walls of the limiting groove 41 abut against the stirring paddle 5 to drive the stirring paddle 5 to switch between the two states of circumferential separation and coplanar combination:

[0063] As shown in Figure 1 , Figure 2 , Figure 4 , when the rotating shaft 3 rotates forward, the sleeve 4 rotates forward synchronously with the rotating shaft 3, and the separation side wall 412 of the limiting groove 41 rotates with the sleeve 4 and contacts the side wall of the stirring paddle 5. Since the separation side wall 412 is distributed in steps, and the projection circumferential angle of the limiting groove 41 increases from top to bottom, the separation side wall 412 generates a pushing force on the stirring paddle 5, causing each stirring paddle 5 to swing around the connection point with the rotating shaft 3 until it completely abuts against the separation side wall 412 of the corresponding limiting groove 41. At this time, the several stirring paddles 5 are uniformly separated along the circumference of the sleeve 4, rotate synchronously with the rotating shaft 3, and fully stir the materials in the stirring tank 1. The materials can flow bidirectionally through the stirring paddle 5, reducing the stirring dead angle and realizing the dispersion of the materials.

[0064] As shown in Figure 7 , Figure 8 , Figure 10 , Figure 11 , when the rotating shaft 3 reverses, the sleeve 4 reverses synchronously with the rotating shaft 3, and the coplanar side wall 411 of the limiting groove 41 rotates with the sleeve 4 and contacts the stirring paddle 5. Since all the coplanar side walls 411 are in the same plane, the coplanar side wall 411 generates a pushing force on the stirring paddle 5, causing each stirring paddle 5 to swing around the connection point until the side wall of all the stirring paddles 5 abuts against the coplanar side wall 411. At this time, the several stirring paddles 5 are in the same vertical plane, forming a complete filter plate 51, and the area of the filter plate 51 covers most of the outer circumference of the sleeve 4, which can intercept the lump materials in the materials.

[0065] After the stirring paddle 5 forms the filter plate 51, the sliding plate 6 is driven to slide, so that the sliding plate 6 extends into the stirring tank 1. The sliding plate 6 and the filter plate 51 enclose a material collecting area 61 in the stirring tank 1, and the circumferential position of the material collecting area 61 corresponds to the ultrasonic dispersion unit 2, that is, the radiation surface of the ultrasonic dispersion unit 2 is directly opposite to the material collecting area 61. Figure 7 , Figure 8The mass material is intercepted by the filter plate 51 and remains in the aggregate area 61. After the ultrasonic dispersion unit 2 is started, the ultrasonic energy can be concentrated on the mass material in the aggregate area 61, realizing "targeted dispersion" and completely solving the defects of non-concentration and non-completion of ultrasonic action.

[0066] As shown in Figure 4 , Figure 11 , the coplanar side wall 411 of the limiting groove 41 is arranged coplanarly, ensuring that when the rotating shaft 3 reverses, all the stirring paddles 5 can swing to the same plane synchronously, avoiding the occurrence of gaps in the filter plate 51 due to the mispositioning of the side wall, and further preventing the mass material from leaking out of the gaps; the separation side wall 412 forms a stepped structure and the projection circumferential angle increases from top to bottom, so that the stirring paddles 5 at different heights form different circumferential expansion angles when rotating forward, and the expansion angle of the lower stirring paddle 5 is greater than that of the upper stirring paddle 5.

[0067] To avoid the sliding plate 6 from mistakenly extending into the stirring tank 1 when the stirring paddle 5 does not form a complete filter plate 51, the device is provided with a neat assembly on the stirring tank 1, as shown in Figure 1 , Figure 2 , Figure 6 The neat assembly includes a shell 7, a rotating member 8, and a plurality of locking mechanisms 9.

[0068] The shell 7 is fixed to the side wall of the stirring tank 1 and is located on the side away from the ultrasonic dispersion unit 2. The shell 7 is a hollow cavity structure, and the side close to the side wall of the stirring tank 1 is in communication with the side wall of the stirring tank 1, so that the inner cavity of the shell 7 and the inside of the stirring tank 1 form a communication space, providing installation and movement space for the rotating member 8 and the locking mechanism 9.

[0069] The rotating member 8 is vertically arranged in the inner cavity of the shell 7, and the upper and lower ends thereof are rotatably connected to the top wall and the bottom wall of the shell 7 through bearings, so as to freely rotate around its own axis. The outer peripheral wall of the rotating member 8 is integrally formed with a blocking protrusion 84, the position of which corresponds to the sliding plate 6. When the rotating member 8 is in the initial position, the side wall of the blocking protrusion 84 abuts against the sliding plate 6, limiting the sliding plate 6 from sliding into the stirring tank 1. A rotating torsional spring is connected between the inner wall of the shell 7 and the outer peripheral wall of the rotating member 8, one end of the rotating torsional spring is fixed to the inner wall of the shell 7, and the other end is fixed to the outer peripheral wall of the rotating member 8. In the initial state, the rotating torsional spring is in a torsional force storage state, and the torsional force direction is to drive the rotating member 8 to rotate, so that the blocking protrusion 84 moves away from the sliding plate 6, releasing the sliding plate 6 to slide.

[0070] The number of the locking mechanisms 9 corresponds to the number of the stirring paddles 5 and is uniformly spaced along the axial direction of the rotating member 8. The locking mechanisms 9 are used to lock the circumferential position of the rotating member 8 and the shell 7 in the initial state, preventing the rotating member 8 from rotating by itself under the torsional force of the rotating torsion spring. Only when all the stirring paddles 5 are synchronously reversed to the position (i.e. the filter plate 51) and pass through all the locking mechanisms 9, can all the locking mechanisms 9 be synchronously unlocked, so that the rotating member 8 rotates under the torsional force of the rotating torsion spring, and the sliding plate 6 is released.

[0071] The working process of the alignment assembly is as follows: in the initial stirring state, the locking mechanisms 9 are in the locked state, the rotating member 8 cannot rotate, and the blocking protrusion 84 limits the sliding of the sliding plate 6. When the rotating shaft 3 is reversed, the stirring paddles 5 are synchronously swung to the coplanar position, the stirring paddles 5 contact the locking mechanisms 9 and trigger the unlocking, the rotating member 8 rotates under the torsional force of the rotating torsion spring, the blocking protrusion 84 rotates with the rotating member 8 and is separated from the sliding plate 6, and the limitation of the sliding plate 6 is released, so that the sliding plate 6 can freely extend into the stirring tank 1.

[0072] In order to ensure that the locking mechanisms 9 can act synchronously with the stirring paddles 5, the locking mechanisms 9 adopt a transmission structure in which the trigger rods 91 cooperate with the plug-in rods 92, as shown in Figs. 9a and 9b. Figure 3 、 Figure 5 、 Figure 9 As shown in Figs. 9a and 9b, a plurality of vertically spaced installation grooves 81 are formed in the rotating member 8; each installation groove 81 is connected with a plug-in groove 82 corresponding thereto, and the plug-in groove 82 penetrates the side wall of the rotating member 8 in the transverse direction of the rotating member 8; a plurality of clamping grooves 71 corresponding to the plug-in grooves 82 are formed in the inner circumferential wall of the shell 7, and the slot opening of the clamping groove 71 faces the plug-in groove 82, and the depth of the clamping groove 71 is greater than the length of the plug-in rod 92.

[0073] The middle part of the trigger rod 91 is pivotally connected to the installation groove 81 by a pin shaft and can swing in the installation groove 81 about the pin shaft; one end of the trigger rod 91 is a trigger end which extends out of the installation groove 81 and into the stirring tank 1 and can contact the stirring paddle 5; the other end of the trigger rod 91 is a connecting end which is located in the installation groove 81, and a guide sliding groove 911 is formed in the connecting end, which is a waist-shaped long hole. A reset torsion spring is connected between the trigger rod 91 and the rotating member 8, one end of the reset torsion spring is fixed to the connecting end of the trigger rod 91, and the other end is fixed to the inner wall of the installation groove 81. In the initial state, the reset torsion spring is in a natural state, and the torsional force direction of the reset torsion spring drives the trigger rod 91 to swing, so that the trigger end remains in the state of extending out of the installation groove 81 and into the stirring tank 1.

[0074] The plug rod 92 is slidingly connected in the plug slot 82 and can reciprocatingly slide along the plug slot 82. One end of the plug rod 92 extends out of the plug slot 82 and is clamped in the clamping slot 71 of the shell 7. The plug rod 92 and the clamping slot 71 are matched to lock the circumferential position of the rotating member 8 and the shell 7. The other end of the plug rod 92 is integrally formed with a guide column 921 which is inserted into the guide sliding slot 911 of the trigger rod 91. The guide column 921 and the guide sliding slot 911 are slidingly and rotatably matched, that is, the guide column 921 can slide along the length direction of the guide sliding slot 911.

[0075] When the rotating shaft 3 rotates forward, the stirring paddle 5 rotates with the rotating shaft 3 and contacts the trigger end of the trigger rod 91 to push the trigger end to swing into the mounting slot 81. The trigger rod 91 reversely rotates around the middle pin shaft. The guide sliding slot 911 swings and moves with the trigger rod 91. The inner wall of the guide sliding slot 911 generates a pushing force to the guide column 921 to push the guide column 921 to the clamping slot 71. The end of the plug rod 92 can slide into the deep part of the clamping slot 71. At this time, the circumferential position of the rotating member 8 and the shell 7 is still locked, the rotating member 8 cannot rotate, and the blocking protrusion 84 keeps limiting the sliding plate 6.

[0076] When the rotating shaft 3 reversely rotates, the stirring paddle 5 reversely rotates with the rotating shaft 3 and again contacts the trigger end to push the trigger end to swing into the mounting slot 81. The trigger rod 91 forwardly rotates around the middle pin shaft. The guide sliding slot 911 swings and moves with the trigger rod 91. The inner wall of the guide sliding slot 911 generates a pulling force to the guide column 921 to pull the guide column 921 away from the clamping slot 71. The plug rod 92 slides away from the clamping slot 71 until the end of the plug rod 92 completely slides out of the clamping slot 71. At this time, the locking between the rotating member 8 and the shell 7 is released. The rotating member 8 rotates under the torsion of the rotating torsion spring to release the sliding plate 6.

[0077] The cooperation of the trigger rod 91 and the plug rod 92 can make the locking mechanism 9 not affect the circumferential locking state between the rotating member 8 and the shell 7 when the rotating shaft 3 drives the stirring paddles to rotate forward. It can also ensure that the trigger part of the trigger rod 91 can always swing into the stirring tank 1 under the driving of the reset torsion spring. When all the stirring paddles 5 can be vertically aligned to form the filter plate 51, the locking of all the locking mechanisms 9 can be triggered at the same time to make the rotating member 8 rotate under the action of the rotating torsion spring to release the sliding of the sliding plate 6.

[0078] In order to reset the rotating member 8 and re-lock the sliding plate 6 after the ultrasonic treatment is completed, a magnetic plate 83 is arranged on the upper end of the rotating member 8, and a first electromagnetic member 10 is arranged on the top of the shell 7. When the rotating member 8 is rotated to the position of the magnetic plate 83, the first electromagnetic member 10 is turned on to generate a magnetic force to attract the magnetic plate 83 and reset the rotating member 8. Figure 6The upper end of the rotating member 8 penetrates the top wall of the shell 7 in the vertical direction, and the rotating member 8 is rotatably connected to the top wall of the shell 7 through a bearing. A magnetic plate 83 is fixed to the outer circumferential wall of the upper end of the rotating member 8, and the magnetic plate 83 has a fixed polarity (for example, N-pole).

[0079] A first electromagnetic member 10 is fixed to the top end face of the shell 7 through bolts, and the position of the first electromagnetic member 10 corresponds to the position of the magnetic plate 83. The first electromagnetic member 10 can be controlled to be turned on or turned off through an external circuit. When the first electromagnetic member 10 is turned on, a magnetic field with a polarity repelling the magnetic plate 83 (for example, N-pole) is generated. When the first electromagnetic member 10 is turned off, the magnetic field disappears.

[0080] The working process is as follows: after ultrasonic treatment, the sliding plate 6 slides out of the stirring tank 1. When it is necessary to lock the sliding plate 6 again, the first electromagnetic member 10 is turned on, and the first electromagnetic member 10 generates a magnetic field repelling the magnetic plate 83. The magnetic field force drives the magnetic plate 83 to rotate in the reverse direction around the axis of the rotating member 8, and the rotating member 8 overcomes the torsional force of the torsional spring during rotation. At the same time, the trigger rod 91 is swung and reset under the action of the torsional force of the reset torsional spring, and the plug-in rod 92 is slid to the direction of the clamping groove 71 through the guide column 921 until the end of the plug-in rod 92 is clamped into the clamping groove 71 again with the rotation of the rotating member 8. The circumferential position of the rotating member 8 and the shell 7 is locked again, the blocking protrusion 84 is reset with the rotation of the rotating member 8, and is recombined with the sliding plate 6 to limit the sliding of the sliding plate 6. Then, the power supply of the first electromagnetic member 10 is turned off, the magnetic field disappears, and the rotating member 8 remains in the initial position under the action of the locking mechanism 9, waiting for the next round of stirring.

[0081] In order to ensure the smooth rotation of the rotating member 8, the upper and lower ends of the rotating member 8 can be extended outside the shell 7, and corresponding magnetic plates 83 and first electromagnetic members 10 are arranged at the upper and lower ends to realize the smooth rotation of the rotating member 8 through the synchronous repulsion of the magnetic forces of the upper and lower ends.

[0082] In order to realize the automatic extension and withdrawal of the sliding plate 6, the elastic member 62 arranged between the shell 7 and the sliding plate 6 provides the extension power, and the second electromagnetic member 11 provides the withdrawal power. Figure 6 、 Figure 9 The end of the sliding plate 6 away from the stirring tank 1 slides in the shell 7, and the sliding connection is realized in the form of a guide hole and a guide column. The elastic member 62 arranged between the shell 7 and the sliding plate 6 is sleeved on the guide column. The elastic member 62 is in a compressed state in the initial state, and the elastic force direction is to push the sliding plate 6 to slide into the stirring tank 1.

[0083] The magnetic attraction part 63 is a block structure made of magnetic material. The second electromagnetic member 11 is arranged on the outer side wall of the shell 7, and the sliding direction of the second electromagnetic member 11 is consistent with the sliding direction of the sliding plate 6. The position of the second electromagnetic member 11 corresponds to the position of the magnetic attraction part 63. The shell 7 is further provided with a driving mechanism capable of driving the second electromagnetic member 11 to slide. The driving mechanism can be a rotating motor driving screw rod arranged on the shell 7. The screw rod is threadedly connected with the second electromagnetic member 11. The shell 7 is further provided with a guide rod for assisting the second electromagnetic member 11 to slide. When the second electromagnetic member 11 is powered, a magnetic field with the same polarity as the magnetic attraction part 63 can be generated (for example, the side of the magnetic attraction part 63 close to the second electromagnetic member 11 is S pole, and the side of the second electromagnetic member 11 close to the magnetic attraction part 63 is N pole). When the second electromagnetic member 11 is powered off, the magnetic field disappears.

[0084] When the rotating member 8 is unlocked and the blocking protrusion 84 releases the sliding plate 6, if the second electromagnetic member 11 is in a powered-off state, the elastic member 62 releases the compression elastic force and pushes the sliding plate 6 to slide into the stirring tank 1 until the sliding plate 6 cooperates with the filter plate 51 to form the aggregate collection area 61.

[0085] When the sliding plate 6 needs to be withdrawn, the second electromagnetic member 11 is powered, and the second electromagnetic member 11 generates a magnetic field that attracts the magnetic attraction part 63. The magnetic field force enables the sliding plate 6 to slide with the second electromagnetic member 11. The second electromagnetic member 11 can pull the magnetic attraction part 63 to drive the sliding plate 6 to slide away from the stirring tank 1 under the rotation of the screw rod. The elastic member 62 is compressed during the sliding of the sliding plate 6 until the sliding plate 6 completely exits the stirring tank 1. After the sliding plate 6 exits the stirring tank 1, the first electromagnetic member 10 is powered to reverse the rotating member 8 to lock the position between the rotating member 8 and the shell 7 through the locking mechanism 9, thereby limiting the sliding of the sliding member. After the second electromagnetic member 11 completes the reset sliding of the sliding plate 6, it can be powered off and reversely slide to be reset close to the stirring tank 1.

[0086] It should be noted that the sleeve 4 is provided with two groups of axially spaced limiting grooves 41 in the embodiment. The corresponding stirring paddles 5 and locking mechanisms 9 are divided into two groups, and the number of the stirring paddles 5 and the locking mechanisms 9 corresponds to the number of the limiting grooves 41. Alternatively, three or more groups of axially spaced limiting grooves 41 can be arranged according to the height of the stirring tank 1. By arranging multiple groups of stirring paddles 5, the stirring effect can be more uniform, and the number can also be increased with the height of the stirring tank.

[0087] To avoid the insertion rod 92 from being unable to align with the clamping groove 71 due to the reset angle deviation of the rotating member 8, a guide chamfer 711 is arranged at the opening end of the clamping groove 71. Figure 5 , Figure 9The edges of the opening end of the clamping groove 71 are both provided with a guide chamfer 711, which is inclined outward along the depth direction of the clamping groove 71, forming a horn-shaped guide structure, and the inclination angle of the guide chamfer 711 is adapted to the sliding direction of the plug-in rod 92, that is, when the plug-in rod 92 slides into the clamping groove 71, the end of the plug-in rod 92 can first contact the inclined surface of the guide chamfer 711 and slide along the inclined surface into the clamping groove 71.

[0088] When the rotating member 8 is reversely rotated under the pushing of the first electromagnetic member 10, the plug-in rod 92 slides into the clamping groove 71 under the driving of the trigger rod 91; the end of the plug-in rod 92 first contacts the inclined surface of the guide chamfer 711, and the lateral component force generated by the inclined surface can slightly adjust the position of the plug-in rod 92 or the rotating member 8, so as to ensure that the plug-in rod 92 can smoothly slide into the clamping groove 71, and the reliability of the reset of the locking mechanism 9 is improved.

[0089] Further, in order to avoid the clamping or local wear of the stirring paddle 5 and the trigger rod 91, the device is provided with an arc-shaped abutting surface 912 on the trigger end of the trigger rod 91, as shown in Figure 5 、 Figure 9 The two side walls of the trigger end are both arc-shaped abutting surfaces 912, and the curvature radius of the arc-shaped abutting surface 912 is the same as that of the inner wall of the stirring tank 1, and the center of the arc-shaped abutting surface 912 coincides with the center of the stirring tank 1, so that the arc-shaped abutting surface 912 and the inner wall of the stirring tank 1 are concentrically arranged.

[0090] When the stirring paddle 5 rotates around the center of the stirring tank 1 with the rotating shaft 3, the edge of the stirring paddle 5 smoothly contacts the arc-shaped abutting surface 912 of the trigger end, avoiding the deformation or wear of the stirring paddle 5 or the trigger end due to the local excessive force; at the same time, the pushing force of the stirring paddle 5 on the trigger end is more uniform, ensuring the stable swing of the trigger rod 91, avoiding the sliding jam of the plug-in rod 92 due to the uneven force, and improving the stability of the action of the locking mechanism 9.

[0091] In order to avoid the direct impact of the raw materials on the moving parts such as the stirring paddle 5 and the sleeve 4 when the raw materials are poured from the feeding port 101, the device is provided with a guide plate 12 below the feeding port 101, as shown in Figure 1 、 Figure 7 The guide plate 12 is fixed to the inner top wall of the stirring tank 1 by bolts and is located directly below the feeding port 101; the guide plate 12 extends downward along the direction away from the feeding port 101, and the lower end of the guide plate 12 is close to the inner wall of the stirring tank 1; the width of the guide plate 12 is adapted to the width of the feeding port 101, and the inclination angle of the guide plate 12 is appropriate for the slow sliding of the raw materials along the plate surface, and is usually set to 30°-60°.

[0092] When the photoresist raw material is added into the stirring tank 1, the raw material will first fall onto the surface of the guide plate 12 and slowly slide down the inclined surface of the guide plate 12 after being poured into the inlet 101. After the raw material slides out of the lower end of the guide plate 12, it will fall into the material in the tank along the inner wall of the stirring tank 1 instead of directly impacting the stirring paddle 5, sleeve 4 or rotating shaft 3, which not only protects the moving parts from position deviation or damage caused by impact, but also reduces the adhesion of the raw material on the inner wall of the top of the stirring tank 1, reduces waste of the raw material, and ensures the accuracy of the proportioning of the photoresist raw material.

[0093] The complete working process of the photoresist mixing device according to the embodiment is as follows:

[0094] Preliminary stirring and dispersion stage: start the external driving mechanism to drive the rotating shaft 3 to rotate forward; the sleeve 4 rotates forward synchronously with the rotating shaft 3, the separation side wall 412 of the limiting groove 41 pushes the stirring paddle 5 to swing until the plurality of stirring paddles 5 are circumferentially separated; the stirring paddle 5 rotates with the rotating shaft 3 to stir the raw material in the tank.

[0095] Mass material concentration stage: switch the rotating direction of the rotating shaft 3 to make the rotating shaft 3 rotate reversely; the sleeve 4 rotates reversely synchronously with the rotating shaft 3, the coplanar side wall 411 of the limiting groove 41 pushes the stirring paddle 5 to swing inward until all the stirring paddles 5 are coplanar to form a filter plate 51; the stirring paddle 5 reversely rotating pushes the trigger end to make the insertion rod 92 slide out of the clamping groove 71, and the rotating member 8 is unlocked; the rotating member 8 rotates under the action of the rotating torsional spring, the blocking protrusion 84 moves away from and releases the sliding plate 6, the elastic member 62 releases the elastic force to push the sliding plate 6 to extend into the stirring tank 1 to form a material collection area 61 with the filter plate 51; the fine particles in the material flow out through the filter holes of the filter plate 51, and the mass material is intercepted in the material collection area 61.

[0096] Concentrated ultrasonic dispersion stage: start the ultrasonic dispersion unit 2, the ultrasonic energy acts on the mass material in the material collection area 61 to destroy the intermolecular force and achieve complete dispersion; after the ultrasonic treatment is completed, the ultrasonic dispersion unit 2 is turned off.

[0097] Resetting and discharging stage: the second electromagnetic member 11 is powered on to drive the magnetic attraction part 63 to drive the sliding plate 6 to exit the stirring tank 1; the first electromagnetic member 10 is powered on to push the rotating member 8 to rotate reversely to reset, the insertion rod 92 re-enters the clamping groove 71, and the blocking protrusion 84 limits the sliding plate 6; the rotating shaft 3 is switched to rotate forward, the stirring paddle 5 is circumferentially separated again to stir the dispersed material for the second time to ensure uniformity; the valve of the discharge port 102 at the bottom of the stirring tank 1 is opened, and the mixed photoresist is discharged from the discharge port 102; after the discharge is completed, the driving mechanism and all the electromagnetic members are turned off, the device returns to the initial state, and waits for the next operation.

[0098] It should be noted that the above examples are only used to illustrate the technical solutions of the present application but not limit the present application. Although the present application is described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present application can be modified or equivalently replaced, without departing from the spirit and scope of the technical solutions of the present application, which should be covered in the scope of the claims of the present application.

Claims

1. A mixing device for photoresist, characterized by comprising: The utility model relates to a stirring tank (1) internally is equipped with vertical setting rotation axis (3), is externally equipped with ultrasonic dispersion unit (2); Sleeve (4) is fixedly sleeved in the outer circumference of rotation axis (3), and installation cavity (31) is formed between sleeve (4), a plurality of limiting grooves (41) are equipped on the circumferential wall of sleeve (4) and are communicated with installation cavity (31), the circumferential angle of a plurality of limiting grooves (41) projects is increased from top to bottom in turn, each limiting groove (41) has coplanar side wall (411) and separate side wall (412), a plurality of coplanar side walls (411) of limiting groove (41) are coplanar, and a plurality of separate side walls (412) of limiting groove (41) form stepped structure; A plurality of stirring paddles (5) are respectively rotationally connected to the outer circumference of the rotation axis (3) and are one-to-one corresponding to the limiting grooves (41), and a plurality of filter holes are provided on the stirring paddles (5); A sliding plate (6) is slidably penetrated through the circumferential wall of the stirring tank (1) and is arranged adjacent to the ultrasonic dispersion unit (2); Wherein, the sleeve (4) can rotate with the rotation axis (3) to make a plurality of stirring paddles (5) respectively abut against a plurality of separate side walls (412) of the limiting grooves (41), and make a plurality of stirring paddles (5) circumferentially separate; the sleeve (4) can rotate with the rotation axis (3) to make a plurality of stirring paddles (5) abut against the coplanar side wall (411), and make a plurality of stirring paddles (5) coplanar to form a filter plate (51); The sliding plate (6) can slide into the stirring tank (1) to cooperate with the filter plate (51) to form a material collecting area (61) corresponding to the ultrasonic dispersion unit (2) circumferentially. Further comprising a neat assembly arranged on the stirring tank (1), the neat assembly comprising:

2. The mixing device for photoresist according to claim 1, wherein An outer shell (7) fixedly arranged on the side wall of the stirring tank (1) and located on the side of the sliding plate (6) away from the ultrasonic dispersion unit (2), the inner cavity of the outer shell (7) is communicated with the inside of the stirring tank (1); A rotating member (8) rotationally connected in the outer shell (7) and arranged vertically, the rotating member (8) has a blocking protrusion (84) for blocking the sliding plate (6), a rotating torsion spring is arranged between the rotating member (8) and the outer shell (7), the rotating torsion spring is used to provide a torsion force to drive the rotating member (8) to rotate to release the sliding plate (6); A plurality of locking mechanisms (9) vertically arranged on the rotating member (8) and one-to-one corresponding to a plurality of stirring paddles (5), the locking mechanisms (9) are used to lock the circumferential position of the rotating member (8) and the outer shell (7), a plurality of locking mechanisms (9) can be unlocked under the synchronous action of a plurality of stirring paddles (5) to make the rotating member (8) rotate under the action of the rotating torsion spring and release the sliding plate (6). ​ 3. The mixing device for photoresist according to claim 2, wherein The rotating member (8) is provided with a plurality of vertically spaced mounting grooves (81) and a plurality of plug-in grooves (82) corresponding to the mounting grooves (81), the plug-in grooves (82) are arranged through the transverse direction of the rotating member (8), the inner circumferential wall of the shell (7) is provided with a clamping groove (71) corresponding to the plug-in groove (82), and the locking mechanism (9) comprises: A trigger lever (91) is rotationally connected to the mounting groove (81), one end of the trigger lever (91) has a trigger end capable of extending into the stirring tank (1) and a connecting end located in the mounting groove (81), and a guide sliding groove (911) is formed in the connecting end; the trigger end can be swung into the mounting groove (81) under the urging of the stirring paddle (5), a reset torsional spring is arranged between the trigger lever (91) and the rotating member (8), and the reset torsional spring is used to provide a reset torsion of the trigger lever (91) to make the trigger end reset into the stirring tank (1); A plug-in rod (92) is slidingly connected to the plug-in groove (82), one end of the plug-in rod (92) can be clamped into the clamping groove (71) to lock the circumferential position of the rotating member (8) and the shell (7), and the other end of the plug-in rod (92) is provided with a guide column (921) slidingly and rotationally matched with the guide sliding groove (911); When the rotating shaft (3) rotates forward, the stirring paddle (5) can urge the trigger end to reverse the trigger lever (91), so as to drive the plug-in rod (92) to slide by means of the guide column (921), so that the end of the plug-in rod (92) slides to the deep part of the clamping groove (71), and the rotating member (8) and the shell (7) are locked; When the rotating shaft (3) reverses, the stirring paddle (5) can urge the trigger end to rotate the trigger lever (91), so as to drive the plug-in rod (92) to slide by means of the guide column (921), so that the end of the plug-in rod (92) slides out of the clamping groove (71), and the rotating member (8) and the shell (7) are unlocked.

4. The mixing device for photoresist according to claim 3, wherein The upper end of the rotating member (8) penetrates the top wall of the shell (7), and the upper end of the rotating member (8) is provided with a magnetic plate (83), the top of the shell (7) is provided with a first electromagnetic member (10), and the rotating member (8) can rotate under the action of the rotating torsional spring to drive the magnetic plate (83) to approach the first electromagnetic member (10); The first electromagnetic member (10) can generate a magnetic field repelling the magnetic plate (83) after being energized, so that the rotating member (8) reversely rotates against the reset force of the rotating torsional spring, and the end of the plug-in rod (92) is clamped with the clamping groove (71) under the reset action of the trigger lever (91), so as to lock the circumferential position of the rotating member (8) and the shell (7).

5. The mixing device for photoresist according to claim 2, wherein The sliding plate (6) penetrates the side wall of the shell (7) and is in sliding fit with the shell (7), and an elastic element (62) is arranged between the sliding plate (6) and the shell (7), the elastic element (62) is used for elastically pushing the sliding plate (6) to make the sliding plate (6) slide into the stirring tank (1).

6. The mixing device for photoresist according to claim 5, wherein The side of the sliding plate (6) away from the stirring tank (1) is provided with a magnetic attraction part (63), and the shell (7) is slidably connected with a second electromagnetic element (11); the second electromagnetic element (11) can generate a magnetic field with the same polarity as the magnetic attraction part (63) after being powered on, so as to magnetically attract the magnetic attraction part (63) and drive the sliding plate (6) to slide away from the stirring tank (1).

7. The mixing device for photoresist according to claim 1, wherein The sleeve (4) is provided with two groups of axially spaced limiting grooves (41), and the number of limiting grooves (41) in each group is several, and the several limiting grooves (41) are distributed along the axial direction of the sleeve (4).

8. The mixing device for photoresist according to claim 3, wherein The opening end of the clamping groove (71) is provided with a guide chamfer (711) on both sides of the edge, and the guide chamfer (711) is used for guiding the end of the plug-in rod (92) into the clamping groove (71).

9. The mixing device for photoresist according to claim 3, wherein Both sides of the trigger end are provided with arc-shaped abutting surfaces (912) for contacting the stirring paddle (5), and the arc-shaped abutting surfaces (912) have the same curvature radius as the inner wall of the stirring tank (1).

10. The mixing device for photoresist according to claim 1, wherein The top of the stirring tank (1) is provided with a feeding port (101), and the bottom of the stirring tank (1) is provided with a discharging port (102), and a guide plate (12) is arranged below the feeding port (101) and extends downward to guide the material.

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