High-entropy nitride photo-thermal conversion film, preparation method and inverted solar evaporation water treatment device

Abstract

The invention discloses a high-entropy nitride photothermal conversion film, a preparation method and an inverted solar evaporation water treatment device. The high-entropy nitride photothermal conversion film is composed of a high-entropy nitride coating, a transition layer and a substrate, the high-entropy nitride coating is (CrNbTiZrMo) Nx, and x ranges from 10 to 30; the thin film absorbs solar energy and efficiently converts the solar energy into heat energy, the heat energy is transmitted to hydrogel / aerogel to drive water to be efficiently evaporated, steam is collected from the bottom after being condensed, a traditional top light-transmitting cover plate is not needed, 30% of optical loss is reduced, the energy efficiency is improved to 85% (traditionally 58%), and the photo-thermal temperature of 70 DEG C can be achieved under irradiation of standard sunlight (AM 1.5 G). The temperature is far higher than that of other systems such as TiZrNbN (only 38.8 DEG C); the device adopting the film is simple in structure, easy to modularize and suitable for seawater desalination, high-salinity wastewater treatment and other scenes, and has the advantages of low energy consumption, environmental protection, low cost and the like.

Description

Technical Field

[0001] This invention relates to a photothermal conversion thin film, particularly a high-entropy nitride photothermal conversion thin film, and also to a method for manufacturing the aforementioned thin film and an inverted solar evaporation water treatment device made using the thin film. Background Technology

[0002] With the increasing global water scarcity and pollution problems, it is crucial to develop simple, low-cost seawater desalination and wastewater treatment technologies suitable for remote areas. However, existing solar interfacial evaporation technologies suffer from several technical bottlenecks: 1) Low energy efficiency: Traditional evaporators, being in direct contact with water, lose heat through conduction. Furthermore, the use of a top condenser reduces optical transmittance by approximately 30% (Balu et al. Energy Mater 2024) and increases equipment costs; 2) Complex material preparation and limited performance: Porous aerogel or hydrogel evaporators rely on complex processes for fabrication, and their evaporation rate is typically below 1.5 kg / m³ under one solar radiation (AM 1.5G). 2 h) It is difficult to meet the needs of large-scale application; 3) The application contradiction of high-entropy nitrides: Although high-entropy alloys (HEAs) exhibit excellent photothermal properties due to the synergistic effect of multiple components (such as MoTaTiZrAlN coating at 1kW / m 2 Under light, the temperature can rise to over 50°C (He et al., Materials Today Physics 2022), but the hydrophobicity of its surface on both sides makes it difficult to effectively collect condensate, and its stability under long-term high temperature (>100°C) or high salt environments is insufficient. Although the thermal stability and broad-spectrum absorption capacity of high-entropy nitrides offer breakthrough potential for solar desalination technology, how to design a coating-device integrated system that combines high thermal efficiency, structural simplification, and long-term stability remains the core challenge restricting its large-scale application. Summary of the Invention

[0003] Purpose of the invention: The purpose of this invention is to provide a high-entropy nitride photothermal conversion thin film with good light absorption capacity and low heat loss, as well as a method for making the above-mentioned thin film, and an inverted solar evaporation water treatment device using the above-mentioned thin film with high photothermal conversion efficiency, excellent mechanical properties, strong corrosion resistance and good salt resistance.

[0004] Technical solution: The high-entropy nitride photothermal conversion thin film of the present invention is composed of a high-entropy nitride coating, a transition layer and a substrate, wherein the high-entropy nitride coating is (CrNbTiZrMo)N x x is 10 to 30.

[0005] The transition layer is a single metallic Cr transition layer, which improves the bonding strength between the film and the substrate.

[0006] The substrate is at least one of glass, silicon wafer, alumina ceramic, quartz, glass ceramic, stainless steel, copper sheet, aluminum sheet, titanium sheet, or nickel sheet.

[0007] The above-mentioned high-entropy nitride photothermal conversion thin film is prepared by magnetron sputtering, sequentially depositing a transition layer and then plasma sputtering a high-entropy nitride coating on a substrate; specifically, it includes the following steps:

[0008] (1) Clean the substrate with anhydrous ethanol and petroleum ether using ultrasonic cleaning for 10-20 minutes, and fix it on the sample stage in the vacuum chamber;

[0009] (2) Evacuate the cavity until the cavity pressure drops to 10. -7 ~10 -5 Below Pa, high-purity argon gas (99.999% by volume) is introduced, with a flow rate of 80-100 sccm and a working pressure of 0.8-1 Pa. Under a substrate bias voltage of -700V to -800V, argon ions are used to bombard the substrate surface for plasma sputtering cleaning for 8-15 minutes to remove residual oxides and particles and activate the substrate surface.

[0010] (3) A Cr transition layer is deposited on the substrate using a target current of 1.8 to 2 A and a bias voltage of -80 V to -100 V;

[0011] (4) Using a Cr–Nb–Ti–Zr–Mo spliced ​​target and setting the target current to 2–3 A, deposit (CrNbTiZrMo)N at an N2 flow rate of 10–30 sccm. x This yields a high-entropy nitride photothermal conversion thin film.

[0012] This invention also discloses an inverted solar evaporation water treatment device employing the aforementioned high-entropy nitride photothermal conversion film. From top to bottom, the device comprises a photothermal conversion layer, a hydrophobic film, a water evaporation layer, and a freshwater condensation tank. The photothermal conversion layer is a high-entropy nitride photothermal conversion film, with a substrate bonded to the hydrophobic film. The photothermal conversion layer is placed on the hydrophobic film to prevent damage from wastewater. The water evaporation layer is placed below the hydrophobic film for water treatment, and the freshwater condensation tank is placed below the water evaporation layer for collection.

[0013] The water evaporation layer is connected to the water tank to be treated and the wastewater tank for collecting the concentrated brine after evaporation at both ends, respectively. The bottom of the freshwater condensation tank is provided with a freshwater outlet. The coarse brine to be evaporated is added to the water tank to be treated. Water treatment can be achieved by inserting one end of the water evaporation layer into the water. The container is easy to carry and can be used on a large scale.

[0014] The water evaporation layer is a hydrophilic hydrogel / aerogel material or a capillary absorbent material. The hydrogel / aerogel material is at least one of polyvinyl alcohol (PVA), polypyrrole (PPy), chitosan (CS), cellulose nanofibers (CNF), acrylamide (AM), and melamine (MF). The capillary absorbent material is a fabric, non-woven fabric, or sponge.

[0015] The hydrophobic film is at least one of polytetrafluoroethylene (PTFE), polyvinylidene fluoride (PVDF), polypropylene (PP), polyethylene (PE), polycarbonate (PC), polyimide (PI), silicone material (PDMS), polypropylene (BOPP), polyvinyl chloride (PVC), and polyethylene terephthalate (PET).

[0016] The freshwater condensation tank is made of acrylic sheet, aluminum sheet, copper sheet, galvanized aluminum sheet or 316 stainless steel.

[0017] The application of the inverted solar evaporation water treatment device employs inverted distillation technology, placing the water evaporation layer above the freshwater condensation tank. One end of the water evaporation layer is immersed in seawater or freshwater, while the other end collects high-concentration brine. A hydrophobic film is bonded to the water evaporation layer through interfacial bonding. Both the photothermal conversion layer and the hydrophobic film are located above the water surface. The photothermal conversion layer is in direct contact with sunlight, achieving zero light loss and absorbing solar energy to convert it into heat energy. The heat is transferred to the water evaporation layer to desalinate the seawater, thereby achieving directional collection of freshwater.

[0018] Invention Principle: The high-entropy nitride photothermal conversion thin film of this invention utilizes magnetron sputtering technology to bombard a target material with argon plasma in a vacuum environment, sputtering the target material onto the substrate surface to form a thin film. A uniform photothermal conversion layer is formed under different nitrogen flow rates. (CrNbTiZrMo)N is obtained by depositing a Cr–Nb–Ti–Zr–Mo spliced ​​target. x Cr and Ti are 3d transition metals. Ti participates in band transitions, enhancing light absorption, while Cr improves corrosion resistance and thermal stability. Zr, Nb, and Mo are 4d transition metals; the combination of 3d and 4d orbitals further expands the band range and enhances absorption. Therefore, this work innovatively uses Cr, Mo, Nb, Zr, and Ti as the main elements to construct high-entropy alloy nitride films. When the nitrogen flux increases from 0 to 20 sccm, the film density increases with the nitrogen flux, and the film transforms from an amorphous state to a crystalline state. Triangular pyramidal particle morphology begins to appear on the film surface. The pyramidal structure can reduce reflection because its cross-sectional radius gradually changes from zero to its maximum value, and the corresponding optical density gradually diverges, which can match the incident light well, thereby suppressing unnecessary Fresnel reflection. Therefore, by specifically selecting the above materials, high-entropy nitride films with stronger photothermal conversion performance can be obtained.

[0019] The inverted solar evaporation water treatment device of the present invention can maximize the utilization of solar energy and achieve inverted water collection. Since the high-entropy nitride coating is in direct contact with sunlight, no light loss is achieved, effectively reducing heat loss. The heat of the high-entropy nitride coating is continuously transferred to the water evaporation layer through heat transfer, thereby achieving a better balance between rapid water supply and rapid heating, and accelerating the evaporation of the evaporator. At the same time, due to the setting of a hydrophobic film, the photothermal conversion coating does not directly contact the water evaporation layer, thereby minimizing the impact of salt crystallization on the evaporator while rapidly producing fresh water.

[0020] Beneficial effects: Compared with the prior art, the present invention has the following significant advantages: (1) The high-entropy nitride photothermal conversion film of the present invention uses transition metals as raw materials and is prepared by magnetron sputtering technology to produce a high-entropy nitride film with excellent photothermal conversion performance. It has a wide absorption range in the solar spectrum and high photothermal conversion efficiency; (2) The inverted solar evaporation water treatment device of the present invention has a convenient container that can be carried and used on a large scale. It has high photothermal conversion efficiency, excellent mechanical properties, strong corrosion resistance, and good salt resistance. The peak evaporation rate in a 3.5wt% NaCl solution can reach 1.3654kg / m 2 *h, the photothermal conversion efficiency is as high as 85.6%, which is 100% higher than that of traditional solar multi-stage distillation and multi-stage flash evaporation; moreover, the combination method is simple and inexpensive, and has broad application prospects in large-scale seawater desalination. Attached Figure Description

[0021] Figure 1 The above are SEM results of the high-entropy nitride photothermal conversion thin films of the present invention, wherein (a) is the thin film (CrNbTiZrMo)NO of Comparative Example 4, and (b) is the thin film (CrNbTiZrMo)N of Example 2. 10 (c) is the thin film (CrNbTiZrMo)N from Example 1. 20 (d) is the thin film (CrNbTiZrMo)N from Example 2. 30 ;

[0022] Figure 2 For high-entropy nitride photothermal conversion thin films at 1kW / m 2 The surface temperature change curve over time under xenon lamp illumination;

[0023] Figure 3 The above are the SEM results of the hydrophilic PVA sponge strips obtained in this invention;

[0024] Figure 4 This is a graph showing the water transport state of the hydrophilic PVA sponge strip obtained in this invention over time.

[0025] Figure 5 Evaporation experiments were conducted on the evaporators obtained in Examples 1 and 2 of this invention in 3.5 wt% brine.

[0026] Figure 6 The stability of the evaporator obtained in Example 1 of the present invention was tested by continuously evaporating in 10wt% brine for 10 hours.

[0027] Figure 7 The results of the evaporator obtained in Example 1 of the present invention were obtained by continuously evaporating in 10wt% brine for 10 hours to test its salt resistance.

[0028] Figure 8 For Comparative Example 1, the high-entropy nitride coating at 1kW / m 2 The surface temperature change curve over time under xenon lamp illumination;

[0029] Figure 9 This is a schematic diagram illustrating the process principle for preparing the high-entropy nitride coating in this embodiment of the invention.

[0030] Figure 10 This is a schematic diagram of the inverted solar evaporation water treatment device of the present invention;

[0031] Figure 11 This is a water treatment simulation diagram of the inverted solar evaporation water treatment device of the present invention;

[0032] Among them, 1-photothermal conversion layer, 2-hydrophobic film, 3-water evaporation layer, 4-freshwater condensation tank, 5-saltwater tank to be treated, 6-concentrated saltwater collection tank, and 7-freshwater outlet. Detailed Implementation

[0033] The technical solution of the present invention will be further described below with reference to the embodiments. The test materials used in the embodiments can all be purchased through conventional means.

[0034] Example 1

[0035] High-entropy nitride photothermal conversion thin film (CrNbTiZrMo)N 20 The sample was fabricated using magnetron sputtering on a pretreated 5083Al wafer (55mm × 55mm × 0.3mm) and a single-crystal Si(100) substrate. Specific fabrication steps are as follows:

[0036] (1) The substrate was ultrasonically cleaned in anhydrous ethanol and petroleum ether for 10 min respectively, and then fixed on the sample stage in the vacuum chamber.

[0037] (2) Start the mechanical pump and turbomolecular pump in sequence to evacuate the cavity. When the cavity pressure drops to 3×10 -4When the pressure is below Pa, high-purity Ar (99.999 vol%) is introduced at a flow rate of 100 sccm, and the working pressure is stabilized at 0.8 Pa through a butterfly valve. Subsequently, under a substrate bias voltage of -700 V, the substrate surface is bombarded with Ar ions for plasma sputter cleaning for 8 min to remove residual oxides and particles and activate the surface.

[0038] (3) To improve the adhesion between the film and the substrate, a Cr transition layer is pre-deposited on the substrate by setting the Cr target current to 1.8A and the bias voltage to –80V.

[0039] (4) Subsequently, keeping the bias voltage constant, a Cr–Nb–Ti–Zr–Mo spliced ​​target was used with the target current set to 2.8A, and the sample (CrNbTiZrMo) was deposited at an N2 flow rate of 20 sccm. 20 (Referred to as N20).

[0040] Example 2

[0041] High-entropy nitride photothermal conversion thin film (CrNbTiZrMo)N 10 (CrNbTiZrMo)N 30 Preparation:

[0042] Compared to Example 1, after setting the splicing target current in step (4), nitrogen gas of different flow rates was introduced into the chamber, and deposition was carried out sequentially at N2 flow rates of 10 and 30 sccm to obtain (CrNbTiZrMo)N 10 and (CrNbTiZrMo)N 30 (Referred to as N10, N30).

[0043] Example 3

[0044] The inverted solar evaporation water treatment device of the present invention has the following structure: Figure 10 As shown, the water treatment device consists of, from top to bottom, a photothermal conversion layer 1, a hydrophobic film 2, a water evaporation layer 3, and a freshwater condensation tank 4. The photothermal conversion layer 1 is a high-entropy nitride photothermal conversion film, and the substrate is bonded to the hydrophobic film 2. The two ends of the water evaporation layer 3 are respectively connected to the water tank to be treated 5 and the wastewater tank 6 for collecting the concentrated brine after evaporation. The freshwater condensation tank 4 has a freshwater outlet 7 at the bottom.

[0045] In this design, the water evaporation layer 3 is a hydrophilic PVA sponge strip, the hydrophobic film 2 is a polypropylene BOPP film, and the freshwater condensation tank 4 is an acrylic plate. The high-entropy nitride photothermal conversion film absorbs solar energy and converts it into heat energy. The converted heat is transferred to the hydrogel / aerogel material in contact with it, thereby promoting water evaporation. Since water cannot pass through the substrate, the water vapor generated by evaporation is guided to the bottom of the device for condensation and collection. This eliminates the need for the glass cover or plastic covering layer required at the top of traditional evaporators, effectively reducing optical loss and improving the structural simplicity and scalability of the device.

[0046] The specific steps for preparing hydrophilic PVA sponge strips are as follows: 20g of PVA powder is added to 100mL of deionized water and stirred at 80℃ for 1 hour until the PVA is completely dissolved, forming a 20% PVA solution. Then, 1.5g of glutaraldehyde crosslinking agent is slowly added and stirred at room temperature for 2 hours to allow the solution to undergo a crosslinking reaction. Next, 2mL of surfactant Tween 80 is added, and foam is generated using a gas blowing method, with the foam volume being three times the solution volume. The foam solution is poured into a pre-designed mold and cured at 120℃ for 3 hours to ensure complete crosslinking. Finally, the cured sponge strips are dried at 60℃ for 24 hours until the moisture content drops below 5%. After cutting, a final density of 0.04-0.06 g / cm³ is obtained. 3 The PVA sponge strips have excellent hydrophilicity and stability.

[0047] Comparative Example 1

[0048] Photothermal conversion layer (CrNbTiZrSi)N x Preparation: (CrNbTiZrSi)N was deposited on a pretreated single-crystal Si(100) substrate using magnetron sputtering. x Thin film. Before the experiment, the substrate was ultrasonically cleaned in anhydrous ethanol and petroleum ether for 10 min each, dried, and then fixed on the sample stage of the sputtering chamber. The mechanical pump, Roots pump, and turbomolecular pump were sequentially activated to evacuate the vacuum until it dropped to 5.0 × 10⁻⁶. -4 When the pressure is below Pa, high-purity Ar is introduced, the total gas flow rate is set to 60 sccm, and the working gas pressure is stabilized at 0.5 Pa through a butterfly valve.

[0049] Under a substrate bias of -500V, the substrate was pretreated with Ar plasma for 8 minutes to remove residual contaminants and activate the surface. Subsequently, a Cr transition layer of approximately 100 nm thickness was deposited using a pure Cr target at a target current of 1.5A and a bias of -80V to enhance the film-substrate adhesion. Afterwards, a Cr-Nb-Ti-Zr-Si alloy spliced ​​target was used, with a target current of 2.5A and a substrate bias maintained at -80V. The main film was then deposited under different nitrogen flow rates (0, 10, 20, 30 sccm), while keeping the total gas flow rate constant, for a deposition time of 90 minutes.

[0050] Comparative Example 2

[0051] Photothermal conversion layer (AlCrTiZrSi)N 20 (AlCrTiZrMo)N 20 (AlCrTiZrNi)N 20 Preparation: The difference between this comparative example and Example 1 is that the photothermal conversion layer was prepared by depositing (AlCrTiZrSi)N on the substrate sequentially with different alloy splicing targets at a nitrogen flow rate of 20 sccm. 20 (AlCrTiZrMo)N 20 (AlCrTiZrNi)N 20 film.

[0052] Comparative Example 3

[0053] Photothermal conversion layer TiN 20 ,(TiZr)N 20 ,(TiZrNb)N 20 ,(TiZrNbAl)N 20 ,(TiZrNbAlMo)N 20 Preparation: Compared with Example 1, the elemental composition of this comparative example was changed, and the above-mentioned thin film was deposited on the substrate under a nitrogen flux of 20 sccm.

[0054] Comparative Example 4

[0055] Preparation of photothermal conversion layer (CrNbTiZrMo)NO: Compared with Example 1, the flow rate of N2 is 0 sccm.

[0056] The high-entropy nitride photothermal conversion films prepared in Examples 1 and 2 and the photothermal conversion layer prepared in Comparative Example 4 were characterized by scanning electron microscopy, such as... Figure 1 As shown in the figure (a, b, c, d are 0, 10, 20, 30 sccm respectively), it can be seen that (CrNbTiZrMo)N 20The surface exhibits a triangular pyramidal structure, within which light undergoes multiple random internal reflections, each interaction resulting in effective absorption. Infrared thermal imaging was used to record (CrNbTiZrMo)N x At 1kW / m 2 The surface temperature change over time under xenon lamp illumination, as shown in the curve. Figure 2 As shown, the surface temperature rises rapidly, reaching as high as 70°C in a short time before stabilizing.

[0057] The prepared hydrophilic PVA sponge strips were characterized using scanning electron microscopy, such as... Figure 3 As shown, the pore structure is a smooth, uniform sphere with numerous tiny secondary pores on the pore walls. This enhances its water-locking performance and allows for faster instantaneous water absorption. Figure 4 ).

[0058] The high-entropy nitride photothermal conversion films prepared in Examples 1-2 and the photothermal conversion layers prepared in Comparative Examples 1-4 were subjected to a 1kW / m 2 The surface temperature was measured under xenon lamp illumination for 600 seconds. The surrounding environment was kept at a constant temperature and humidity. The experimental results are shown in Table 1.

[0059] Table 1 Surface Temperature Test Results

[0060]

[0061]

[0062] Based on the experimental data in Table 1, (CrNbTiZrMo)N 20 High-entropy nitride films, thanks to the synergistic effect of multiple elements and their unique triangular pyramidal morphology, exhibit significantly superior photothermal conversion performance compared to other binary to pentagonal nitride materials. Their high-entropy alloy composition (Cr, Nb, Ti, Zr, Mo) achieves performance breakthroughs through multi-component synergy: the high-temperature stability and high thermal conductivity of molybdenum (Mo) and titanium (Ti) ensure photothermal conversion efficiency, while chromium (Cr), niobium (Nb), and zirconium (Zr), through the formation of a stable oxide layer and surface passivation effect, ensure the material withstands high light irradiation (1kW / m²). 2The material exhibits long-term structural stability under various conditions. Simultaneously, lattice distortion and electronic state optimization between elements enhance light absorption to 92% (compared to ≤85% for traditional materials). Furthermore, its surface triangular pyramidal morphology reduces light reflection and extends the optical path through geometric constraints, while the localized surface plasmon resonance (LSPR) effect accelerates photothermal concentration, ultimately achieving a 15% increase in light absorption efficiency and a 12% reduction in heat loss (compared to >20% for traditional materials). In summary, this material achieves a comprehensive breakthrough in high light absorption, low heat loss, and excellent stability through the dual advantages of elemental synergy and morphology design, providing an efficient solution for solar interfacial evaporation technology.

[0063] The high-entropy nitride photothermal conversion films prepared in Examples 1-2 and the photothermal conversion layer prepared in Comparative Example 4 were assembled as follows: Figure 10 The inverted solar evaporation water treatment device shown is (CrNbTiZrMo)N x The evaporator was further investigated using PVA-BOPP in a simulated solar environment with an evaporator in 3.5 wt% brine.

[0064] (1) Select a high-entropy nitride photothermal conversion film ((CrNbTiZrMo)N) that matches the experimental conditions. 20 ), (CrNbTiZrMo)N 10 );

[0065] (2) Using a simulated solar light source, adjust the light intensity to 1000 W / m². 2 To simulate actual solar radiation conditions, a 3.5 wt% salt solution was prepared, and the solution temperature was controlled within the range of 20–30 °C to ensure stable experimental conditions.

[0066] (3) Combine the photothermal conversion film with the inverted solar evaporation water treatment device to ensure that the film can effectively absorb solar energy and heat the water;

[0067] (4) Use an electronic balance to record the changes in the mass of the two brine tanks and calculate the evaporation rate.

[0068] like Figure 5 As shown, the evaporation rate of the evaporator gradually increases with the increase of nitrogen flux, reaching a peak of 1.3654 kg / m³ at 20 sccm. -2 *h, due to the strong light absorption of the surface structure of the triangular prism, when the nitrogen flux is further increased, excessive nitrogen forms nitrides on the surface of the metal target, causing many microcracks and defects on the film surface, thus reducing the quality of the film.

[0069] The high-entropy nitride photothermal conversion thin film prepared in Example 1 was assembled as follows: Figure 10The inverted solar evaporation water treatment device shown was tested for stability and salt tolerance by continuous evaporation in 10wt% brine (3.5wt%, higher than the average concentration of seawater) for 10 hours. Figure 6 As shown, the evaporator maintains a stable evaporation rate in high-concentration brine, with only a small amount of salt crystals adhering to the hydrophobic film side, such as... Figure 7 As shown in the figure. This evaporator can achieve an average evaporation rate of 1.2465 kg / m³ when continuously evaporating 10 wt% NaCl brine for 10 hours. -2 *h. During the prolonged evaporation process, some brine did not evaporate in time and deposited on the side of the hydrophobic membrane. The hydrophobic membrane coverage prevents salt crystallization from affecting the performance of the high-entropy nitride film, further extending the service life of the device.

[0070] Therefore, this invention optimizes the photothermal conversion efficiency of high-entropy nitride thin films by controlling the nitrogen flux, and provides a device that maximizes solar energy utilization and achieves inverted water collection. A series of high-entropy nitride coatings were prepared on a substrate using magnetron sputtering (PVD), exhibiting excellent photothermal conversion performance, achieving zero light loss and effectively reducing heat loss. Unlike traditional upward evaporation, the inverted solar evaporation water treatment device prepared using high-entropy nitride photothermal conversion thin films absorbs solar energy and converts it into heat energy, which is then transferred to the hydrogel / aerogel material in contact with it, thus promoting water evaporation. The resulting water vapor is guided to the bottom of the device for condensation and collection. This eliminates the need for the glass cover or plastic covering layer required at the top of traditional evaporators, effectively reducing optical loss. Simultaneously, it improves the structural simplicity and scalability of the device, and its overall performance, such as its simple design, low cost, and high water collection capacity, is significantly enhanced, making it highly promising for application.

Claims

1. A high-entropy nitride photothermal conversion thin film, characterized in that, The high-entropy nitride photothermal conversion film consists of a high-entropy nitride coating, a transition layer, and a substrate. The high-entropy nitride coating is (CrNbTiZrMo)N x x is 10 to 30.

2. The high-entropy nitride photothermal conversion thin film according to claim 1, characterized in that, The transition layer is a single metallic Cr transition layer.

3. The high-entropy nitride photothermal conversion thin film according to claim 1, characterized in that, The substrate is at least one of glass, silicon wafer, alumina ceramic, quartz, glass ceramic, stainless steel, copper sheet, aluminum sheet, titanium sheet, or nickel sheet.

4. A method for preparing the high-entropy nitride photothermal conversion thin film according to claim 1, characterized in that, The substrate was prepared by sequentially depositing a transition layer and then plasma-sputtering a high-entropy nitride coating using magnetron sputtering.

5. The manufacturing method according to claim 4, characterized in that, The manufacturing method specifically includes the following steps: (1) The substrate was ultrasonically cleaned with petroleum ether and anhydrous ethanol for 10-20 minutes in sequence and then fixed on the sample stage in the vacuum chamber. (2) Evacuate the cavity until the cavity pressure drops to 10. -7 ~10 -5 Below Pa, argon gas is introduced, with a flow rate of 80-100 sccm and a working pressure of 0.8-1 Pa. Under a substrate bias voltage of -700V to -800V, argon gas is used to bombard the substrate surface with plasma sputtering cleaning for 8-15 minutes to remove residual oxides and particles and activate the substrate surface. (3) A Cr transition layer is deposited on the substrate using a target current of 1.8 to 2 A and a bias voltage of -80 V to -100 V; (4) Using a Cr–Nb–Ti–Zr–Mo spliced ​​target and setting the target current to 2–3 A, deposit (CrNbTiZrMo)N at an N2 flow rate of 10–30 sccm. x This yields a high-entropy nitride photothermal conversion thin film.

6. An inverted solar evaporation water treatment device employing the high-entropy nitride photothermal conversion thin film as described in claim 1, characterized in that, The water treatment device consists of a photothermal conversion layer (1), a hydrophobic film (2), a water evaporation layer (3), and a freshwater condensation tank (4) from top to bottom. The photothermal conversion layer (1) is a high-entropy nitride photothermal conversion film, and the substrate is bonded to the hydrophobic film (2).

7. The inverted solar evaporation water treatment device according to claim 6, characterized in that, The water evaporation layer (3) is connected to the water tank (5) to be treated and the brine tank (6) to be treated at both ends, and the fresh water condensation tank (4) is provided with a fresh water outlet (7) at the bottom.

8. The inverted solar evaporation water treatment device according to claim 6, characterized in that, The water evaporation layer (3) is a hydrophilic hydrogel / aerogel material or a capillary absorbent material. The hydrogel / aerogel material is at least one of polyvinyl alcohol (PVA), polypyrrole (PPy), chitosan (CS), cellulose nanofibers (CNF), acrylamide (AM), and melamine (MF). The capillary absorbent material is a fabric, non-woven fabric, or sponge.

9. The inverted solar evaporation water treatment device according to claim 6, characterized in that, The hydrophobic film (2) is at least one of polytetrafluoroethylene (PTFE), polyvinylidene fluoride (PVDF), polypropylene (PP), polyethylene (PE), polycarbonate (PC), polyimide (PI), silicone material (PDMS), polypropylene (BOPP), polyvinyl chloride (PVC), and polyethylene terephthalate (PET).

10. The inverted solar evaporation water treatment device according to claim 6, characterized in that, The freshwater condensation tank (4) is made of acrylic sheet, aluminum sheet, copper sheet, galvanized aluminum sheet or 316 stainless steel.

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