Semiconductor liquid stirring device

Abstract

The invention provides a semiconductor liquid stirring device which comprises a driving unit, a rotating shaft, rotating blades and an auxiliary stirring unit, the rotating shaft and the driving unit are arranged in a linkage mode, the rotating blades and the rotating shaft are arranged in a linkage mode, and pipelines comprise a first pipeline arranged in the rotating shaft and a second pipeline arranged in the rotating blades. The first pipeline is communicated with the second pipeline; the nozzle is arranged on the rotating blade and is communicated with the second pipeline; the auxiliary stirring unit is connected with the rotating shaft, the auxiliary stirring unit is communicated with the first pipeline, and an auxiliary stirring medium is provided into the pipeline through the auxiliary stirring unit to promote liquid flowing. An auxiliary stirring medium for promoting liquid flow can be provided while stirring is performed, the synergistic effect of stirring and flowing is achieved, and the problems of impurity hardening, pool overflow and the like caused by a flowing blind area formed at the bottom of a pool are prevented.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of semiconductor manufacturing, and relates to a semiconductor liquid stirring device. BACKGROUND

[0002] In the semiconductor process, such as cleaning process, wastewater treatment process, etc., efficient stirring and mixing of liquid is undoubtedly an indispensable key element, and the importance of the stirrer is therefore particularly prominent. In order to effectively prevent the stirrer from being loosened and colliding with the pool loaded with liquid, in order to ensure the safety of the equipment, maintain the stability of the production efficiency, and ensure the qualified rate of the product, the current stirrer mostly maintains a certain distance between the bottom of the stirrer and the bottom surface of the pool.

[0003] However, it is worth noting that although this distance design has its own unique features, in the process of long-time operation, the stirrer may not be able to fully drive the liquid at the bottom of the pool to flow, so that the pool bottom is easy to form a flow blind area, which may cause impurities to gradually solidify on the pool bottom, so that the stirrer cannot operate normally, and the outlet of the pool is blocked by impurities, and the pool overflow phenomenon occurs, so that the setting of the stirrer becomes a potential problem that cannot be ignored.

[0004] Therefore, it is necessary to provide a semiconductor liquid stirring device. SUMMARY

[0005] In view of the above-mentioned shortcomings of the prior art, the purpose of the present application is to provide a semiconductor liquid stirring device for solving the problem that the bottom of the pool is easy to form a flow blind area.

[0006] To achieve the above-mentioned purpose and other related purposes, the present application provides a semiconductor liquid stirring device, which comprises:

[0007] a driving unit;

[0008] a rotating shaft, which is arranged in linkage with the driving unit;

[0009] a rotating blade, which is arranged in linkage with the rotating shaft;

[0010] a pipeline, which comprises a first pipeline arranged in the rotating shaft and a second pipeline arranged in the rotating blade, and the first pipeline and the second pipeline are in communication;

[0011] a nozzle, which is arranged on the rotating blade and in communication with the second pipeline;

[0012] An auxiliary stirring unit is connected with the rotating shaft and communicates with the first pipeline, and the auxiliary stirring unit provides an auxiliary stirring medium into the pipeline to facilitate the flow of liquid.

[0013] Optionally, the auxiliary stirring medium provided by the auxiliary stirring unit includes one or a combination of liquid auxiliary stirring medium and gaseous auxiliary stirring medium.

[0014] Optionally, the auxiliary stirring unit is movably connected with the rotating shaft, and the auxiliary stirring unit is stationary when the rotating shaft rotates.

[0015] Optionally, the auxiliary stirring unit includes an auxiliary cabin, which is arranged outside the rotating shaft and communicates with the first pipeline, and a first sealing connector is arranged between the auxiliary cabin and the rotating shaft.

[0016] Optionally, the auxiliary cabin is provided with a cabin door, and the cabin door is sealingly connected with the auxiliary cabin through a second sealing connector.

[0017] Optionally, the auxiliary stirring unit includes a rotating sealing connector assembly, which includes a first rotating sealing connector and a second rotating sealing connector arranged in pairs, the first rotating sealing connector communicates with the second rotating sealing connector and the first pipeline, and the second rotating sealing connector communicates with an auxiliary stirring medium source, and the second rotating sealing connector is stationary when the first rotating sealing connector rotates.

[0018] Optionally, a water pool is further included, and the rotating blade has a spacing from the bottom of the water pool, and the spacing is greater than 50 cm.

[0019] Optionally, a water pool is further included, and an impurity thickness detector is arranged in the water pool and communicates with the auxiliary stirring unit; the impurity thickness detector includes an ultrasonic sludge concentration sensor.

[0020] Optionally, N≥1 rotating blades are included, and M≥1 nozzles are included on the same rotating blade.

[0021] Optionally, the setting angle of the nozzle on the rotating blade includes 0°-90°; the area of the nozzle close to the first pipeline is smaller than the area of the nozzle away from the first pipeline.

[0022] As described above, the semiconductor liquid stirring device of the present application comprises the driving unit, the rotating shaft, the rotating blade, the pipeline, the nozzle and the auxiliary stirring unit, wherein the rotating shaft is arranged in linkage with the driving unit, the rotating blade is arranged in linkage with the rotating shaft, the pipeline comprises a first pipeline arranged in the rotating shaft and a second pipeline arranged in the rotating blade, and the first pipeline and the second pipeline are in communication, the nozzle is arranged on the rotating blade and in communication with the second pipeline, the auxiliary stirring unit is connected with the rotating shaft, and the auxiliary stirring unit is in communication with the first pipeline, and auxiliary stirring medium is provided in the pipeline through the auxiliary stirring unit to facilitate liquid flow.

[0023] The semiconductor liquid stirring device of the present application, by arranging the pipeline, the nozzle and the auxiliary stirring unit in communication with the pipeline, can provide the auxiliary stirring medium, so that the semiconductor liquid stirring device provides the auxiliary stirring medium to facilitate liquid flow while stirring, to realize the synergy of stirring and flow, and prevent problems such as impurity hardening and tank overflow caused by flow blind area formed at the bottom of the tank. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 The structure of the semiconductor liquid stirring device in the comparative example is shown.

[0025] Figure 2 The structure of the semiconductor liquid stirring device in the first embodiment of the present application is shown.

[0026] Figure 3 The structure of the pipeline and the nozzle in the first embodiment of the present application is shown.

[0027] Figure 4 The structure of the semiconductor liquid stirring device in the second embodiment of the present application is shown.

[0028] REFERENCE SIGNS

[0029] 10, 100 driving unit

[0030] 20, 200 rotating shaft

[0031] 30, 300 rotating blade

[0032] 40, 400 tank

[0033] 500 pipeline

[0034] 501 first pipeline

[0035] 502 second pipeline

[0036] 600 nozzle

[0037] 601 First nozzle

[0038] 602 Second nozzle

[0039] 603 Third nozzle

[0040] 700 Auxiliary Stirring Unit

[0041] 701 Auxiliary Module

[0042] 702 Auxiliary stirring medium source

[0043] 703 Rotary Seal Connection Assembly

[0044] 713 First Rotary Seal Connector

[0045] 723 Second Rotary Seal Connection

[0046] 800 First sealing connection

[0047] 900 Second Sealing Connection

[0048] 110 Impurity Thickness Detector Detailed Implementation

[0049] The following specific examples illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0050] In the detailed description of embodiments of the present invention, cross-sectional views may be partially enlarged beyond the general scale for ease of explanation, and the schematic diagrams are merely examples and should not limit the scope of protection of the present invention. Furthermore, in actual manufacturing, the three-dimensional spatial dimensions of length, width, and depth should be included.

[0051] For ease of description, spatial relation terms such as “below,” “under,” “lower than,” “below,” “above,” and “upper” may be used herein to describe the relationship between one element or feature shown in the accompanying drawings and other elements or features. It will be understood that these spatial relation terms are intended to include directions other than those depicted in the accompanying drawings in use or operation, and may include embodiments in which the first and second features are formed in direct contact, or embodiments in which additional features are formed between the first and second features, such that the first and second features may not be in direct contact. Furthermore, when a layer is referred to as “between” two layers, it may be the only layer between the two layers, or there may be one or more layers in between.

[0052] It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of the present invention. Therefore, the illustrations only show the components related to the present invention and are not drawn according to the actual number, shape and size of the components in the actual implementation. In the actual implementation, the form, quantity and proportion of each component can be arbitrarily changed, and the layout of the components may also be more complex.

[0053] Comparative Example

[0054] like Figure 1 This comparative example provides a semiconductor liquid stirring device, which includes a drive unit 10, a rotating shaft 20, a rotating blade 30, and a water tank 40. The rotating shaft 20 is linked to the drive unit 10, the rotating blade 30 is linked to the rotating shaft 20, and the water tank 40 is used to hold liquid.

[0055] Specifically, the drive unit 10 may include a motor or similar device to provide power for operation. The drive unit 10 drives the rotating shaft 20 to rotate, and the rotating shaft 20 in turn drives the rotating blades 30 to rotate. Thus, when the rotating blades 30 are placed in the water tank 40 and come into contact with the liquid, they can cause the liquid at the bottom of the water tank 40 to flow. However, to avoid unnecessary scraping and collision between the rotating blades 30 and the bottom of the water tank 40, ensuring equipment safety, maintaining stable production efficiency, and ensuring product qualification rate, please refer to [reference needed]. Figure 1 In this comparative example, the bottom of the rotating blade 30 is kept at a certain distance h1 from the bottom surface of the pool 40. The value of h1 may include h1≥50cm, such as 50cm, 80cm, 100cm, etc.

[0056] Because the bottom of the rotating blade 30 and the bottom surface of the water tank 40 have the distance h1, during long-term operation, a flow blind zone is easily formed at the bottom of the water tank 40, which may cause impurities to gradually condense at the bottom of the water tank 40, making the rotating blade 30 unable to operate normally, and causing the outlet of the water tank 40 (not shown) to be blocked by impurities, resulting in overflow and other phenomena.

[0057] To address the problem of a flow blind zone easily forming at the bottom of the water tank 40 of the semiconductor liquid stirring device, specific embodiments are provided below to solve this technical problem.

[0058] Example 1

[0059] See Figure 2This embodiment provides a semiconductor liquid stirring device, which includes a drive unit 100, a rotating shaft 200, a rotating blade 300, a pipe 500, a nozzle 600, and an auxiliary stirring unit 700.

[0060] The semiconductor liquid stirring device also includes a water tank 400 for holding the liquid. The size, material and type of liquid held by the water tank 400 are not limited here, and may include cleaning fluid used in semiconductor cleaning processes or wastewater treatment processes, deionized water, etc.

[0061] Specifically, the drive unit 100 may include a motor or similar device to provide power for operation. The drive unit 100 drives the rotating shaft 200 to rotate, which in turn drives the rotating blades 300 to rotate. Thus, when the rotating blades 300 are placed in the water tank 400 and come into contact with the liquid, they can cause the liquid at the bottom of the water tank 400 to flow. However, to avoid unnecessary scraping and collision between the rotating blades 300 and the bottom of the water tank 400, ensuring equipment safety, maintaining stable production efficiency, and ensuring product qualification rates, please refer to [reference needed]. Figure 2 In this embodiment, the bottom of the rotating blade 300 is kept at a certain distance h2 from the bottom surface of the bottom of the pool 400. The value of h2 may include h2≥50cm, such as 50cm, 80cm, 100cm, etc.

[0062] Because the bottom of the rotating blade 300 and the bottom surface of the water tank 400 have the distance h2, during long-term operation, a flow blind zone is easily formed at the bottom of the water tank 400. This may cause impurities to gradually clump together at the bottom of the water tank 400, making the rotating blade 300 unable to operate normally, and causing the outlet (not shown) of the water tank 400 to be blocked by impurities, resulting in overflow and other phenomena.

[0063] Therefore, refer to Figure 2In this embodiment, the semiconductor liquid stirring device includes the pipe 500, the nozzle 600, and the auxiliary stirring unit 700. The pipe 500 includes a first pipe 501 disposed in the rotating shaft 200 and a second pipe 502 disposed in the rotating blade 300, with the first pipe 501 and the second pipe 502 connected. The nozzle 600 is disposed on the rotating blade 300 and connected to the second pipe 502. The auxiliary stirring unit 700 is connected to the rotating shaft 200 and communicates with the first pipe 501. The auxiliary stirring unit 700 provides an auxiliary stirring medium (not shown) into the pipe 500 to promote liquid flow. This allows the semiconductor liquid stirring device to provide the auxiliary stirring medium that promotes liquid flow while stirring, achieving a synergistic effect of stirring and flow. This prevents problems such as impurity caking and water overflow caused by the formation of a flow blind zone at the bottom of the water tank 400.

[0064] As an example, the auxiliary stirring medium provided by the auxiliary stirring unit 700 may include one or a combination of liquid auxiliary stirring medium and gaseous auxiliary stirring medium.

[0065] Specifically, in this embodiment, the auxiliary stirring medium is preferably a gaseous auxiliary stirring medium, such as air, nitrogen, inert gas, etc., so as to provide high-pressure auxiliary stirring medium to the pipeline 500 through the auxiliary stirring unit 700, thereby promoting liquid flow while stirring, so as to play a synergistic role. Of course, in another embodiment, the auxiliary stirring medium can also be a liquid auxiliary stirring medium, such as deionized water, or the auxiliary stirring medium can also be both liquid and gaseous auxiliary stirring media.

[0066] As an example, the auxiliary stirring unit 700 is movably and sealedly connected to the rotating shaft 200, and the auxiliary stirring unit 700 is stationary when the rotating shaft 200 rotates.

[0067] For details, please refer to Figure 2 In this embodiment, the auxiliary stirring unit 700 includes an auxiliary chamber 701 and an auxiliary stirring medium source 702 containing the auxiliary stirring medium, which is connected to the auxiliary chamber 701. The auxiliary chamber 701 is located on the outside of the rotating shaft 200 and communicates with the first pipe 501. A first sealing connector 800 is provided between the auxiliary chamber 701 and the rotating shaft 200. The first sealing connector 800 achieves a sealed connection between the auxiliary chamber 701 and the rotating shaft 200, preventing leakage of the auxiliary stirring medium and ensuring the pressure of the auxiliary stirring medium.

[0068] Furthermore, in this embodiment, it is preferable that the auxiliary chamber 701 in the auxiliary stirring unit 700 is movably and sealingly connected to the rotating shaft 200 via the first sealing connector 800. This allows the auxiliary stirring unit 700 to remain stationary when the rotating shaft 200 rotates, reducing the probability of leakage of the auxiliary stirring medium. The type of the first sealing connector 800 is not excessively limited here; it can be selected as needed, such as a bearing-type sealing connector.

[0069] For further details, please refer to [link / reference]. Figure 2 In this embodiment, the auxiliary compartment 701 is preferably also provided with a door (not shown) to facilitate opening the auxiliary compartment 701, thereby facilitating the replacement and maintenance of components located within the auxiliary compartment 701. When the door is provided, a second sealing connector 900 can be used to seal the door to the body of the auxiliary compartment 701, ensuring the airtightness of the auxiliary compartment 701, preventing leakage of the auxiliary stirring medium, and ensuring the pressure of the auxiliary stirring medium. The type of the second sealing connector 900 can be selected as needed.

[0070] For further details, please refer to [link / reference]. Figure 2 It may also include an impurity thickness detector 110 disposed in the water tank 400, wherein the impurity thickness detector 110 may include, for example, an ultrasonic sludge concentration sensor, to detect the thickness of impurities located in the water tank 400, so as to obtain the impurity thickness at the bottom of the water tank 400 in a timely manner.

[0071] Preferably, the impurity thickness detector 110 communicates with the auxiliary stirring unit 700 so that the impurity thickness information obtained by the impurity thickness detector 110 is promptly fed back to the auxiliary stirring unit 700, so that the auxiliary stirring unit 700 can adjust the pressure of the auxiliary stirring medium in a timely manner, ensuring the efficiency of the auxiliary stirring medium and promoting liquid flow.

[0072] Specifically, as needed, the auxiliary stirring unit 700 may include a controller for receiving signals, adjusting data, and storing data, as well as a pump for adjusting the pressure of the auxiliary stirring medium. The pump communicates with the controller, so that when the controller receives feedback from the impurity thickness detector 110 regarding the impurity thickness at the bottom of the water tank 400, it can automatically adjust the pump to supply the required amount of auxiliary stirring medium, thereby improving the efficiency of the auxiliary stirring medium, promoting liquid flow, and enhancing operational convenience.

[0073] Of course, if necessary, the controller can be omitted, and a pump body can be directly set to adjust the pressure of the auxiliary stirring medium, and the impurity thickness detector 110 can communicate directly with the pump body to adjust the pressure of the auxiliary stirring medium.

[0074] Regarding the communication method between the impurity thickness detector 110 and the auxiliary stirring unit 700, it may include wired communication and / or wireless communication, and the specific communication method can be selected as needed. For example, when the impurity thickness detector 110 detects that the thickness of the slab layer in the water tank 400 is greater than 5 cm, it can trigger a high-pressure backflushing mode, causing the gaseous or liquid auxiliary stirring medium, such as 0.8 MPa, to be released instantaneously.

[0075] As an example, the rotating blades 300 may include N ≥ 1, and the same rotating blade 300 may include M ≥ 1 nozzles 600.

[0076] For details, please refer to Figure 2 and Figure 3 In this embodiment, only one rotating blade 300 is used as an example, i.e., N is 1, and six nozzles 600 are provided on the same rotating blade 300, i.e., M is 6. However, the values ​​of N and M are not limited to this.

[0077] The value of N is not limited to 1. As needed, the value of N can also include 2, 3, 4, 5, etc. For example, multiple rotating blades 300 can be set as a cross-shaped rotating blade group with intersection points along the horizontal direction, such as a cross-shaped distribution or a star-shaped distribution. Of course, as needed, multiple rotating blades 300 can also be set as an overlapping rotating blade group arranged sequentially along the vertical direction and having overlapping projections along the vertical direction.

[0078] The value of M is not limited to 6. As needed, the value of M can also include 1, 2, 3, 4, 5, 8, 10, etc. The distribution morphology of the multiple nozzles 600 is not excessively restricted here.

[0079] The angle setting of the rotating blade 300 is not limited to... Figure 2 and Figure 3 As shown in the diagram, the horizontal setting implies that the rotating blade 300 can also be configured as a twisted rotating blade with a certain tilt angle, such as a fan blade. The twist angle is not overly restricted here.

[0080] Furthermore, the setting angle of the nozzle 600 on the rotating blade 300 may include 0° to 90°, such as 0°, 30°, 45°, 60°, 90°, etc. By setting the angle of the nozzle 600 on the rotating blade 300, the effect of the auxiliary stirring medium can be further improved.

[0081] Furthermore, it is preferable that the area of ​​the nozzle 600 adjacent to the first pipe 501 is smaller than the area of ​​the nozzle 600 far from the first pipe 501.

[0082] For details, please refer to Figure 3 The rotating blade 300 is provided with a first nozzle 601, a second nozzle 602 and a third nozzle 603. Preferably, the area of ​​the first nozzle 600 adjacent to the first pipe 501 is smaller than the area of ​​the second nozzle 602, and the area of ​​the second nozzle 602 is smaller than the area of ​​the third nozzle 600 away from the first pipe 501. This change in area compensates for the pressure loss of the auxiliary stirring medium caused by the transmission distance, thereby ensuring the effectiveness of the auxiliary stirring medium.

[0083] Example 2

[0084] See Figure 4 This embodiment provides a semiconductor liquid stirring device with another structure. The main difference from the first embodiment is that, in this embodiment, the auxiliary chamber 701 is not provided. Instead, a rotary sealing connection assembly 703 is provided to replace the auxiliary chamber 701 to reduce structural complexity and equipment duty cycle. The configuration of other components of the semiconductor liquid stirring device can be referred to the first embodiment, and will not be repeated here. The following only describes the difference.

[0085] For details, please refer to Figure 4 The rotary sealing connection assembly 703 includes a first rotary sealing connector 713 and a second rotary sealing connector 723. The first rotary sealing connector 713, the second rotary sealing connector 723, and the first pipe 501 are all connected. The second rotary sealing connector 723 is connected to the auxiliary stirring medium source 702. When the first rotary sealing connector 713 rotates, the second rotary sealing connector 723 remains stationary, thereby achieving a seal to provide the auxiliary stirring medium while reducing the probability of leakage of the auxiliary stirring medium. The rotary sealing connection assembly 703 may include a bearing or similar component, and no excessive limitation is made here.

[0086] In summary, the semiconductor liquid stirring device of the present invention includes the driving unit, the rotating shaft, the rotating blade, the pipe, the nozzle, and the auxiliary stirring unit. The rotating shaft is linked to the driving unit, the rotating blade is linked to the rotating shaft, the pipe includes a first pipe disposed in the rotating shaft and a second pipe disposed in the rotating blade, and the first pipe is connected to the second pipe. The nozzle is disposed on the rotating blade and is connected to the second pipe. The auxiliary stirring unit is connected to the rotating shaft and communicates with the first pipe, providing an auxiliary stirring medium into the pipe to promote liquid flow.

[0087] The semiconductor liquid stirring device of the present invention provides an auxiliary stirring medium by setting up the pipe, the nozzle, and adding the auxiliary stirring unit connected to the pipe. This allows the semiconductor liquid stirring device to provide the auxiliary stirring medium that promotes liquid flow while stirring, thereby achieving a synergistic effect of stirring and flow and preventing problems such as impurity caking and water overflow caused by the formation of a flow blind zone at the bottom of the pool.

[0088] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in the present invention should still be covered by the claims of the present invention.

Claims

1. A semiconductor liquid stirring device, characterized in that, The semiconductor liquid stirring device includes: Drive unit; A rotating shaft, which is linked to the drive unit; Rotating blades, wherein the rotating blades are linked to the rotating shaft; The pipe includes a first pipe disposed in the rotating shaft and a second pipe disposed in the rotating blade, wherein the first pipe and the second pipe are connected. The nozzle is disposed on the rotating blade and is connected to the second pipe; An auxiliary stirring unit is provided, which is connected to the rotating shaft and communicates with the first pipe. The auxiliary stirring unit provides an auxiliary stirring medium into the pipe to promote liquid flow.

2. The semiconductor liquid stirring apparatus according to claim 1, characterized in that: The auxiliary stirring medium provided by the auxiliary stirring unit includes one or a combination of liquid auxiliary stirring medium and gaseous auxiliary stirring medium.

3. The semiconductor liquid stirring apparatus according to claim 1, characterized in that: The auxiliary stirring unit is movably and sealed to the rotating shaft. When the rotating shaft rotates, the auxiliary stirring unit is stationary.

4. The semiconductor liquid stirring apparatus according to claim 3, characterized in that: The auxiliary stirring unit includes an auxiliary chamber, which is located outside the rotating shaft and communicates with the first pipe. A first sealing connection is provided between the auxiliary chamber and the rotating shaft.

5. The semiconductor liquid stirring apparatus according to claim 4, characterized in that: The auxiliary compartment is equipped with a door, and the door is sealed to the body of the auxiliary compartment through a second sealing connector.

6. The semiconductor liquid stirring apparatus according to claim 3, characterized in that: The auxiliary stirring unit includes a rotary sealing connection assembly, which includes a first rotary sealing connector and a second rotary sealing connector. The first rotary sealing connector, the second rotary sealing connector, and the first pipe are all connected. The second rotary sealing connector is connected to the auxiliary stirring medium source. When the first rotary sealing connector rotates, the second rotary sealing connector remains stationary.

7. The semiconductor liquid stirring apparatus according to claim 1, characterized in that: It also includes a water tank, and the rotating blades are spaced apart from the bottom of the water tank, the distance being 50cm or more.

8. The semiconductor liquid stirring apparatus according to claim 1, characterized in that: It also includes a water tank, in which an impurity thickness detector is installed and communicates with the auxiliary stirring unit; the impurity thickness detector includes an ultrasonic sludge concentration sensor.

9. The semiconductor liquid stirring apparatus according to claim 1, characterized in that: It includes N≥1 rotating blades, and the same rotating blade includes M≥1 nozzles.

10. The semiconductor liquid stirring apparatus according to claim 9, characterized in that: The nozzle is positioned at an angle of 0° to 90° on the rotating blade; the area of ​​the nozzle adjacent to the first pipe is smaller than the area of ​​the nozzle farther from the first pipe.

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