Easy-to-clean microcrystalline glass and preparation method thereof

Abstract

The invention relates to the field of glass ceramics, in particular to easy-to-clean microcrystalline glass and a preparation method thereof, and the microcrystalline glass is prepared by the following method: polishing an etched microcrystalline glass panel; the glass ceramic panel which is subjected to sand blasting treatment and acid etching treatment after 50-100-mesh carborundum is selected as the raw material, the surface roughness is 2-7 microns, and the glossiness is 1-10 GU. The roughness of the treated microcrystalline glass is 1-2 microns, and the glossiness is 15-60 GU. The microcrystalline glass provided by the invention is polished by adopting proper polishing powder, is free of a coating, can be applied to a high-temperature hot-state working environment, in particular to infrared cooking utensils, has very good easy-to-clean property when being used in the environment, and can be applied to the infrared cooking utensils, so that the service life of the infrared cooking utensils is prolonged. According to the present invention, the corresponding glass ceramic has characteristics of high mechanical strength and good scratch resistance, and the certain glass ceramic material has characteristics of matte appearance, aesthetic feeling, and diamond-like bright crystal appearance after the gloss change.

Description

Technical Field

[0001] This invention relates to the field of glass ceramics, and more specifically to an easy-to-clean microcrystalline glass and its preparation method. Background Technology

[0002] A cooktop is a household appliance used for cooking rice and other foods. One type of cooktop is a glass-ceramic cooktop that includes a glass panel on which pots, pans, and other cooking utensils are heated by multiple radiant heating elements located beneath the glass panel.

[0003] Glass-ceramics, also known as microcrystalline glass, possess many excellent properties, such as high mechanical strength, adjustable coefficient of thermal expansion, low dielectric loss, wear and corrosion resistance, and good chemical and thermal stability. They can be used as work plates for stovetops, and their main component is aluminosilicate, preferably lithium aluminosilicate.

[0004] Glass generally has high surface activity, so it has poor hydrophobicity and oleophobicity, meaning it is easy for dirt to adhere to it, and once the surface is dirty, it is difficult to clean it.

[0005] Etching is a surface treatment process for glass-ceramics, which imparts an anti-glare (AG) effect to the surface, helping to scatter reflected light, reduce glare and fingerprint visibility, while maintaining high light transmittance. The etching process typically involves pretreatment with sandblasting, followed by selective etching of the glass phase on the surface using an acidic etching solution (such as a mixture of hydrofluoric acid and acetic acid), thereby forming a uniform micron-scale textured structure on the glass-ceramic surface.

[0006] However, the cleaning performance of microcrystalline glass surfaces that have only undergone etching treatment is still insufficient, especially for stubborn grease from cooking.

[0007] To impart more properties to glass-ceramics, the following reports are relevant: 1) Anti-fouling coating: A colorless and transparent anti-fouling layer with a thickness of 4-30nm is attached to the outer surface of the transparent microcrystalline glass. The anti-fouling layer is a fluorosilicone hydrolysis compound (paragraph 80 of the instruction manual of CN208747932U). 2) Enhance hydrophobic and oleophobic properties: Add a hydrophobic and oleophobic layer, an intermediate layer, and a base layer to the surface of the microcrystalline glass. First, coat the glass with an oxide layer containing Si-O or a mixed silicon oxide layer to form the base layer. Then, coat the surface with an intermediate layer and finally coat the hydrophobic and oleophobic layer. The intermediate layer is formed by using at least one ionic crystal from LiF, NaF, and / or KF as the original coating material. The hydrophobic and oleophobic layer is a fluorinated polymer layer (CN116589191A). 3) Abrasion resistance: The acid pickling equipment sprays the reagent onto the surface of the microcrystalline glass, and then the horizontal glass sandblasting machine polishes it to achieve a high abrasion resistance. The reagents used include: 25 parts water, 15 parts ammonium sulfate, 30 parts barium sulfate, 15 parts oxalic acid and 18 parts ammonium fluoride. The polishing time is 8 minutes. Then the "acid pickling, polishing and cleaning" steps are repeated 4 times. After drying, scratch-resistant AG microcrystalline glass (CN118993557A) is obtained.

[0008] The inventors discovered that the above solutions have limitations: some solutions (such as anti-fouling, water-repellent and oil-repellent, and self-cleaning coatings) can improve the anti-fouling properties or ease of cleaning, but when applied to cooktop panels, they may encounter oil droplets, food stains, rice stains, etc., which may appear on the heated area of ​​the glass surface. If not cleaned in time, the stains will easily adhere to the surface after heating, making subsequent cleaning very difficult.

[0009] Furthermore, for cooktops operating at extremely high temperatures (such as infrared ovens, where heating temperatures can reach over 500°C), the heat resistance of the applied organic or inorganic coatings (including self-cleaning films) is usually insufficient. These coatings may begin to deteriorate, become damaged, delaminate, or even peel off at temperatures around 250°C (CN115066405A), not only losing their easy-to-clean and stain-resistant properties but also potentially contaminating food or affecting the appearance of the panel.

[0010] Existing acid-etched microcrystalline glass products on the market are difficult to simultaneously meet the requirements of long-term stability at ultra-high temperatures (>250℃, especially >500℃), excellent easy cleaning, and high mechanical strength / scratch resistance.

[0011] CN115066405A discloses a technique for applying textured or untextured organic or inorganic hydrophobic / oleophobic coatings to the working surface of microcrystalline glass to avoid fingerprints, contamination, and reduce the visibility of scratches. However, the patent also explicitly points out that such coatings have poor durability and are prone to deterioration under repeated thermal and mechanical stress. The patent proposes an alternative: by precisely controlling a specific roughness range on the microcrystalline glass surface, it simultaneously imparts scratch-resistant, oil-resistant, dirt-resistant, and light-scattering properties to the surface without adding any surface coating, without adversely affecting the aesthetic effect of the matte surface. While this solution mentions its ability to facilitate the cleaning of potential contaminants, it lacks detailed documentation and verification of its specific cleaning performance (ease of cleaning) under high-temperature conditions (especially stubborn grease commonly found after cooking). More importantly, neither this patent nor the cited prior art solves the problem of achieving excellent ease of cleaning, high mechanical strength, and scratch resistance for uncoated microcrystalline glass in ultra-high temperature (e.g., above 500°C) working environments (such as infrared ovens).

[0012] Therefore, there is currently a lack of literature on an uncoated acid-etched microcrystalline glass that can work stably for a long time in ultra-high temperature hot environments such as infrared furnaces above 500°C, and still exhibit excellent easy-to-clean properties (for common high-temperature stains in the kitchen) under these harsh conditions, while maintaining high mechanical strength and good scratch resistance. Summary of the Invention

[0013] In order to improve the cleaning performance, hardness and heat resistance of acid-etched microcrystalline glass, this application provides a microcrystalline glass and its preparation method, especially an uncoated microcrystalline glass with good cleaning properties, high surface hardness and scratch resistance.

[0014] In a first aspect, this application provides an easy-to-clean microcrystalline glass, which is prepared by the following method: polishing an etched microcrystalline glass panel; the treated microcrystalline glass has a roughness of 1-2 μm and a gloss of 15-60 GU.

[0015] In the easily cleanable microcrystalline glass: The raw material is a microcrystalline glass panel that has been sandblasted with 50-100 mesh diamond abrasive and then acid-etched. The surface roughness is 2-7 μm and the gloss is 1-10 GU. Preferably, the surface roughness is 2-5 μm and the gloss is 1.4-10 GU. The etched microcrystalline glass panel is processed using conventional etching methods or the following method: using microcrystalline glass as a substrate, the surface glass phase is selectively etched using a 50-100 mesh diamond sandblasting process and a mixed acid solution such as hydrofluoric acid at 30-40℃, so that micron-level textures are formed on the surface of the microcrystalline glass.

[0016] This application provides a microcrystalline glass that is easy to clean, with a roughness of 1.5-2 μm and a gloss of 20-45 GU, preferably with a roughness of 1.6-1.9 μm and a gloss of 20-32 GU.

[0017] The polishing method includes the following steps: 1) Prepare a 1-20% solution of the polishing agent; 2) Polish the etched microcrystalline glass with the polishing agent solution prepared in step 1). The glass surface pressure is 10-40 kPa, the polishing speed is 100-150 r / min, the glass temperature is controlled at 30-60℃, and the polishing time is 0.5-40 min.

[0018] The polishing agent contains at least 50% cerium oxide, preferably 50-70% cerium oxide. The particle size of the polishing powder is 1-50μm, preferably 4-30μm.

[0019] The concentration of the polishing powder is 1.5-5%, preferably 3-5%, or 1.5-3%, or 2-3%.

[0020] Secondly, this application provides a method for preparing microcrystalline glass, the method comprising the following steps: 1) Prepare a 1-20% solution of the polishing agent; 2) Polish the etched microcrystalline glass with the polishing agent solution prepared in step 1). The glass surface pressure is 10-40 kPa, the polishing speed is 100-150 r / min, the glass temperature is controlled at 30-60℃, and the polishing time is 0.5-40 min.

[0021] The concentration of the polishing powder is 1.5%-5%, preferably 3-5%, or 1.5-3%, or 2-3%.

[0022] Thirdly, this application provides an application of the above-mentioned glass ceramic in the preparation of cooktop panels.

[0023] This application has the following advantages: 1. Microcrystalline glass, especially after working for a long time at operating temperatures of 250℃-500℃, still has a high degree of ease of cleaning for common kitchen stains (such as oil stains, milk, ketchup, vinegar, etc.). For example, at 250℃ (the highest operating temperature of an induction cooker), stains on the glass surface are almost invisible after cleaning; at 500℃ (the highest operating temperature of an infrared oven), stains on the glass surface are invisible or almost invisible after cleaning.

[0024] In using microcrystalline glass raw materials, this invention considered first increasing the hardness of the microcrystalline glass to increase its wear resistance, thereby achieving the goal of cleaning without damaging the glass. First, the inventors attempted to sandblast the surface of the microcrystalline glass only. Using the polishing method and parameter control of this invention, its Mohs hardness level could only be the same as that of ordinary mirror microcrystalline glass, reaching only Mohs hardness level 5, not Mohs hardness level 7.

[0025] In addition, the inventors also tried using finer-particle diamond abrasive for sandblasting, which could directly reduce the surface roughness of the glass to 1-2 μm. However, after sandblasting and subsequent acid etching, the surface appearance was prone to developing dark marks or streaks caused by sand leakage or blockage. These appearance defects are difficult to remove even after polishing.

[0026] Therefore, the inventors selected microcrystalline glass with a roughness of 2-7μm, which was sandblasted with 50-100 mesh diamond abrasive and then acid-etched, as the raw material.

[0027] The acid-etched microcrystalline glass raw material has a roughness of 2-7µm and a gloss of 1.5-10GU. After polishing the microcrystalline glass with the polishing powder selected in this application, its roughness is controlled between 1-2μm and its gloss is 15-60GU (preferably 1.5-2μm, preferably 20-45GU).

[0028] 2. In the polishing process of this invention: First, the cerium oxide content directly affects the polishing efficiency. For example, if the cerium oxide content is less than 50%, there will be too many other impurities, which will lead to a decrease in activity and reduce the polishing efficiency. If the cerium oxide content is too high, it may cause excessive reaction of the acid etching layer and disrupt the phase structure balance.

[0029] Secondly, the particle size of the polishing powder determines the final roughness. Although the mechanical cutting force is strong when the particle size is too large, it will remove the loose layer of acid etching and form an "orange peel" texture, which will increase the roughness and fail to meet the roughness and gloss requirements of this invention.

[0030] Third, the particle size difference of the polishing powder should not be too large, so that the particle force is uniform and the glass phase and crystalline phase are etched away simultaneously, avoiding the height difference between phases (Ra can be reduced by more than 50%).

[0031] 3. The microcrystalline glass provided in this application is polished with appropriate polishing powder, without coating, and can be used in high-temperature hot working environments, especially in infrared stoves. It has good easy cleaning properties when used in this environment, and the corresponding microcrystalline glass still has high mechanical strength and good scratch resistance. At the same time, some microcrystalline glass materials have a matte appearance and even a diamond-like sparkling appearance.

[0032] 4. The processing method of this application is simple and solves the problem of microcrystalline glass being difficult to clean. Attached Figure Description

[0033] Figure 1 : The visible glass surface outline of sample 1 observed under a microscope; Figure 2 , 3 : These are the visible glass surface contours of samples 2 and 3 as observed under a microscope; Figure 4 Images showing the cleaning effects of samples 1-5 at two different temperatures. Figure 4-1 This is a picture of sample 1 before the experiment was performed. Figure 4-2 Figure 4-3 shows the cleaning effect of sample 1 at two different temperatures; Figure 4-4 This is a picture of sample 5 before the experiment was performed. Figure 4-5 Figures 4-6 show the cleaning effect of sample 5 at two different temperatures; Figure 4-7 is a picture of sample 4 before the experiment was performed. Figure 4 -8 and 4-9 are images showing the cleaning effect of sample 4 at two different temperatures; Figure 4-1 Image 0 shows sample 3 before the experiment was performed. Figure 4-1 Figures 1 and 4-12 show the cleaning effect of sample 3 at two different temperatures; Figure 4-1 Image 3 shows sample 2 before the experiment. Figure 4-1 4. Figures 4-15 show the cleaning effect of sample 2 at two different temperatures; Figure 5 The results of four rounds of heating and cleaning tests on samples 3 and 6 are shown in the figure. Figure 5-1 This is a picture of sample 3 before the experiment was performed. Figure 5-2 Figures 5-9 show the results of different heating and cleaning tests performed on sample 3. Figure 5-1 Image 0 is of sample 6 before the experiment was performed. Figure 5-1 Figures 1 to 5-18 show the results of different heating and cleaning tests performed on sample 6. Detailed Implementation

[0034] The following examples are used to illustrate the present invention, but are not intended to limit the scope of the invention.

[0035] The raw material used in this invention is microcrystalline glass, or etched microcrystalline glass; Microcrystalline glass can be etched using conventional methods, such as first blasting with 60-mesh diamond abrasive for 3-5 minutes, and then chemically etching with a mixed acid solution such as hydrofluoric acid at a temperature of 30-40°C.

[0036] The surface roughness is arithmetic roughness, denoted as Ra, and should be understood as the arithmetic mean of the deviations from the surface profile, as defined in standard ISO 4287. (This explanation is correct and is the same as Oukai patent CN115066405A.) Gloss unit (represented as "Gloss Unit" or GU); Purchased etched microcrystalline glass or self-etched microcrystalline glass has a surface roughness between 3-5μm and a gloss level of 1.4-10 GU.

[0037] The relevant parameters of the polishing powder are listed below: Nano-grade cerium oxide polishing powder: cerium oxide content is 99.50%, particle size ≤0.1μm; Micron-sized cerium oxide polishing powder: cerium oxide content is 99.64%, and particle size is 10-50μm; Polishing powder (red): cerium oxide content is 67.00%, and particle size is 1-30μm; Polishing powder (white): cerium oxide content is 55.00%, and particle size is 4-30μm.

[0038] Preparation Example 1: Polishing the etched microcrystalline ceramic substrate, specifically as follows: 1) Prepare a 1-20% concentration solution of the polishing agent; 2) Polish the etched microcrystalline glass with the polishing agent solution prepared in step 1). During the polishing process, control the glass surface pressure to be 10-40 kPa, the polishing speed to be 100-120 r / min, the glass temperature to be 30-60℃, and the polishing time to be 0.5-40 min.

[0039] Example 1: Treatment of nano-sized cerium oxide polishing powder 1. Experimental Method: Nano-sized cerium oxide polishing powder was prepared into solutions with concentrations of 1%, 1.5%, 2%, 3%, 5%, 10%, 15%, and 20% using water. The polishing speed was 120 rpm, and the glass surface pressure was controlled at 23 kPa. For specific preparation methods, please refer to Preparation Example 1.

[0040] 2. Testing indicators and methods: Same as those in CN115066405A.

[0041] 2.1 Roughness: Arithmetic roughness, denoted as Ra, should be understood as the arithmetic mean of the deviations in surface profile, as defined in standard ISO 4287.

[0042] 2.2 Gloss: Gloss as defined in standard ISO 2813, measured at 60°. It is usually expressed in gloss units (represented as "Gloss Unit" or GU).

[0043] 3. The test results are shown in Table 1 below. Table 1: Polishing time for different concentrations of nano-sized cerium oxide polishing powder to achieve the same gloss level

[0044] Example 2: Comparison of gloss effects of micron-sized cerium oxide polishing powder at different concentrations and polishing times 1. Experimental Method: Micron-sized cerium oxide polishing powder was prepared into solutions with concentrations of 1%, 1.5%, 2%, 3%, 5%, 10%, 15%, and 20% using water. The polishing speed was 120 r / min, and the glass surface pressure was controlled at 23 kPa. For specific preparation details, please refer to Preparation Example 1.

[0045] 2. Detection indicators and methods: Same as in Example 1.

[0046] 3. The test results are shown in Table 2 below: Table 2: Polishing time for different concentrations of micron-sized cerium oxide polishing powder with the same gloss

[0047] Example 3: Comparison of roughness and gloss effects of polishing powder (red) with different concentrations and polishing times 1. Experimental Method: Polishing powder (red) was prepared into solutions with concentrations of 1%, 1.5%, 2%, 3%, 5%, 10%, 15%, and 20% using water. The polishing speed was 120 r / min, and the pressure on the glass surface was controlled at 23 kPa. For specific preparation details, please refer to Preparation Example 1.

[0048] 2. Detection indicators and methods: Same as in Example 1.

[0049] 3. The test results are shown in Table 3 below: Table 3: Polishing time for different concentrations of polishing powder (red) to achieve the same gloss level.

[0050] Example 4: Comparison of roughness and gloss effects of polishing powder (white) with different concentrations and polishing times 1. Experimental Method: Polishing powder (white) was prepared into solutions with concentrations of 1%, 1.5%, 2%, 3%, 5%, 10%, 15%, and 20% using water. The polishing speed was 120 r / min, and the pressure on the glass surface was controlled at 23 kPa. For specific preparation details, please refer to Preparation Example 1.

[0051] 2. Detection indicators and methods: Same as in Example 1.

[0052] 3. The test results are shown in Table 4 below: Table 4: Polishing time for different concentrations of polishing powder (white) to achieve the same gloss level.

[0053] Analysis of the experimental results from Examples 1-4: When obtaining glass ceramics with the required roughness and gloss, micron-sized cerium oxide polishing powder and polishing powder (white) have the shortest polishing time.

[0054] Therefore, micron-sized cerium oxide and polishing powder (white) are the optimal choices. Micron-sized cerium oxide is prone to settling and clogging of pipes during use, resulting in uneven polishing and poor surface quality consistency. In contrast, polishing powder (white) is more economical and has slightly higher polishing efficiency. The surface quality of the microcrystalline glass is easier to observe during the polishing process, and the polishing process parameters can be adjusted in a timely manner, resulting in a high yield.

[0055] Example 5: Microcrystalline glass treated with different polishing agents Summarizing Examples 1-4, with surface roughness set to 1.5μm-2μm, gloss set to 15-40GU, ​​and polishing powder prepared at a concentration of 1.5-5%, the required polishing time, required cerium oxide content, particle size distribution, and characteristics of each polishing powder are listed below: Table 5: Polishing powder used in each embodiment

[0056] Table 5 shows that nano-sized cerium oxide, with a cerium oxide content of over 90%, has a small particle size (≤0.1μm) and a polishing time of 4-26 min. To achieve the same polishing effect, the cerium oxide content needs to reach over 90%, which is not economical and has extremely low polishing efficiency. It is suitable for glass polishing in high-precision optical instruments.

[0057] Micron-sized cerium oxide, with a cerium oxide content of over 90%, moderate particle size (10-50μm), and short polishing time (0.5-14min), may exhibit solid-liquid stratification (polishing powder tends to settle) during use, which can easily clog pipes and lead to uneven polishing. It requires shaking to ensure uniformity, increasing the complexity of the operation process, resulting in high cost and poor economic efficiency. The polishing powder (red) contains 50-70% cerium oxide and has an uneven particle size distribution (1-30μm). The polishing time is relatively long (1.1-15min). The red polishing agent easily covers the defects on the surface of the microcrystalline glass, making it difficult to observe some defects generated during the polishing process in a timely manner. This affects the timely adjustment of the polishing process conditions, resulting in a high scrap rate and increased difficulty in wastewater treatment.

[0058] The polishing powder (white) contains 50-60% cerium oxide, has a moderate particle size (4-30μm), the shortest polishing time (0.5-11min), the highest efficiency, and allows for easy observation of the microcrystalline glass surface quality during the polishing process. It is also less prone to settling during use and offers the best cost-performance ratio.

[0059] Polishing was performed using the methods and polishing powders of Examples 1-4, and the gloss and roughness were positively correlated.

[0060] Based on the combined results of Examples 1-5, the polishing powder (white) was ultimately determined to be the most preferred polishing powder.

[0061] Experimental Example 1: Observation of Microscopic Surface Profiles 1. Sample: Sample 1: CN115066405A, Example 3 in Table 1 of paragraph 85 of the specification, using no polishing process and no coating, with gloss controlled at 5.52 GU and roughness at 3.77 μm; Samples 2 and 3 were polished using the polishing powder (white) from Example 4 on the etched microcrystalline glass. The polishing powder concentration was 1.5-3%, the polishing speed was 120 r / min, and the glass surface pressure was controlled at 23 kPa. Sample 2: The gloss after polishing was controlled at 20 GU, and the roughness was 1.8 μm; Sample 3: The gloss after polishing was controlled at 30 GU, and the roughness was 1.68 μm; 2. Detection method: Observe the microscopic contour features under a microscope (the microscope magnification is 40x).

[0062] 3. Test results: such as Figures 1-3 Figure 1 The glass surface contour (i.e., the surface texture after acid etching) of sample 1 (glass with patent number CN115066405A) is more prominent, more numerous and of uneven size. Figure 2 , Figure 3 All applications used the polishing solution from Example 4. Microscopic observation of the polished surfaces of the chemically etched microcrystalline glass revealed that the polished glass surface contours (i.e., the surface texture after acid etching) were smoother and flatter, with a significant reduction in the number of protrusions. Figure 3 For best results.

[0063] Experiment Example 2: Investigation of Scratch Resistance 1. Sample: Sample 1 (CN115066405A, Example 3 in Table 1 of paragraph 85 of the specification): No polishing process was used, no coating was applied, the gloss was controlled at 5.52 GU, and the roughness was 3.77 μm; Samples 2-5 were polished using the polishing powder (white) from Example 4 on etched microcrystalline glass. The polishing powder concentration was 3%, the polishing speed was 120 r / min, and the glass surface pressure was controlled at 23 kPa. Sample 2: The gloss after polishing was controlled at around 20 GU (specifically 20.66 GU), and the roughness was 1.8 μm; Sample 3: The gloss after polishing was controlled at around 30 GU (specifically 31.7 GU), and the roughness was 1.68 μm; Sample 4: The gloss after polishing was controlled at around 40 GU (specifically 42.94 GU), and the roughness was 1.59 μm; Sample 5: The gloss after polishing was controlled at 70 GU, and the roughness was 0.63 μm.

[0064] 2. Testing methods: Three different testing methods were used to test the scratch resistance of the glass surface at room temperature. 2.1 The first method is to use a Newton pen (hardness test pen) to scratch the glass surface under different forces. Under the same light, observe the level of force at which scratches become visible on the surface of microcrystalline glass with different roughness values. 2.2 The second method involves using Mohs hardness testers of different grades to perform scratch tests on the glass surface. The grade is the Mohs hardness level. The higher the grade number, the higher the surface hardness and the better the scratch resistance. 2.3 The third method is to use a linear abrasion tester, and use 800-grit silicon carbide sandpaper with a weight of 1250g to scratch the glass surface once, or use a green sponge made of melamine resin with a weight of 750g to scratch the glass surface back and forth 10 times, and observe the scratches on the glass surface corresponding to different roughness values.

[0065] 3. Experimental Results: 3.1 Detection results of the first method: Scratches are visible on the following samples: Sample 1 has scratches visible starting from 12N, Sample 2 has scratches visible starting from 17N, Sample 3 has scratches visible starting from 14N, Sample 4 has scratches visible starting from 15N, and Sample 5 has scratches visible starting from 12N.

[0066] Regarding scratch uniformity: the scratches on the glass surfaces of samples 2-5 are relatively uniform, while the scratches on the glass surface of sample 1 are very uneven. This may be due to the large surface roughness of sample 1, poor consistency of surface corrosion pits, and uneven jumping during the Newton pen test.

[0067] Therefore, samples 2-4 have better scratch resistance.

[0068] 3.2, Detection results of the second method: Samples 1-4 all passed the Level 7 test, and sample 5 passed the Level 6 test.

[0069] 3.3, Detection results of the third method: Sample 1 has slight scratches on its surface that are almost invisible; Samples 2-4 have slight scratches that are almost invisible; and Sample 5 has more obvious scratches on its surface.

[0070] 4. Results Analysis: When samples with the same roughness value were tested for scratch resistance, samples 2-4 showed better scratch resistance. The scratch resistance of the microcrystalline glass surface of sample 5 was significantly reduced, and the matte texture gradually weakened. This was mainly because the polishing time of sample 5 was longer. Over-polishing would change the microstructure of the glass surface, resulting in some irregular unevenness, which would reduce the mechanical strength and scratch resistance of the glass.

[0071] In summary, through three different scratch resistance tests, it can be seen that when polishing powder (white) is used, the gloss of the polished microcrystalline glass is 20-45 GU and the roughness is 1.5-2 μm, the sample also has good scratch resistance.

[0072] Experiment Example 3: Examination of Cleaning Performance 1. Sample: Samples 1-5 are the same as in Experiment 2.

[0073] 2. Experimental methods: 2.1 Cleanliness test: Common kitchen stains and corresponding easy-to-clean burning test samples were used. The thermal scenarios were tested at the maximum operating temperatures of induction cookers and infrared cookers: 240-250℃ and ≥500℃. The cleaning test was conducted on the corresponding burner area after heating to 240-250℃. The results were obtained by first removing the stains and residue with a scraper, and then rinsing with a cleaning sponge, water, and cleaning solution. The result after rinsing with a cleaning sponge, water, and cleaning solution at the highest operating temperature of the infrared furnace (≥500℃).

[0074] 2.2 Classification of stain residue severity: 0: Invisible; 1: Very slight, or only visible from a specific angle; 2: As can be seen, there are residual shadows on the test material; 3: It is clearly visible that there is significant residue of the test material; 2.3, which refers to numbers 1-9 in Table 7 below, representing the types of stains.

[0075] 3. Experimental results, as shown in Tables 7 and 8. Figure 4 (include Figure 4-1 arrive Figure 4-1 As shown in 5): Table 7: Cleaning performance results of samples 1, 5, and 4 at two different temperatures.

[0076] Table 8: Cleaning performance results of samples 3 and 2 at two different temperatures

[0077] As can be seen from Tables 7 and 8 above: 3.1 In terms of cleaning performance: Samples 2-5 all scored <10 points in cleaning effect at 240-250℃ and <5 points in cleaning effect at ≥500℃, indicating good cleaning effect; while Sample 1 scored above 20 points in cleaning effect regardless of whether it was at 240-250℃ or ≥500℃, indicating the worst cleaning effect. 3.2, Under hot conditions at 240-250℃: 1) Compared to before treatment (as shown in sample 2) Figure 4-1 3. Sample 4 (4-7) and Sample 5 (4-4) show that the stains on the glass surfaces of Samples 2, 4 and 5 are almost invisible after cleaning. Only some vegetable oils, some corrosive aqueous solutions and some concentrated liquids or sauces have slight marks. 2) Compared to before treatment (as shown in sample 3) Figure 4-1 Sample 3 showed the best cleaning effect, with only very slight marks from vegetable oil and milk, which were almost invisible to the naked eye. The slight marks on the glass surfaces of Samples 2-5 could be completely removed by using ordinary cleaning solutions. 3) Compared to before treatment (as shown in sample 1) Figure 4-1 The stains on the surface of sample 1 were difficult to clean, and a spatula was needed to remove the food residue. In addition to flour, there were traces on other parts that could not be completely removed.

[0078] 3.3, Under a hot-state scenario at 500℃: Compared to untreated (as shown in sample 2) Figure 4-1 3. Sample 3 shown Figure 4-1 0. Sample 4 (4-7) and Sample 5 (4-4) are examples of samples 2-5. After cleaning, the stains on the glass surface are invisible or almost invisible because the stains are completely carbonized at this high temperature. The cleaning is thorough. Only some corrosive aqueous solutions, such as vinegar, leave very slight marks, which are almost invisible to the naked eye. They can be completely removed by using ordinary cleaning solutions. Sample 1 requires cleaning with a sponge, but traces remain in all areas and cannot be completely removed. Due to its rough surface, the stains in the corrosion pits are more difficult to remove. Therefore, Sample 1 is not suitable for the high-temperature environment of an infrared oven, as it has poor cleaning properties and cannot effectively remove common kitchen stains.

[0079] Sample 3 is the best, followed by Sample 5, but Sample 5 has relatively poor scratch resistance.

[0080] Experiment Example 4: Service Life Test 1. Sample: Sample 3 is the same as Sample 3 in Example 7; Sample 6 is Example 3 in Table 1 of paragraph 85 of the specification of patent CN115066405A. The surface roughness Ra is 3.77μm and the gloss is 5.52GU. It is different from Sample 1 of Experimental Examples 1-3 of the present invention. Sample 6 contains a 3-5μm thick self-cleaning liquid (Huaxia Jiahe Nanotechnology M600 nano oleophobic coating). 2. Detection method: 2.1 The ease of cleaning of the microcrystalline glass surface under hot conditions was repeatedly tested, i.e., a lifespan test, in which: The result of first removing stains and residue with a scraper and then rinsing with a cleaning sponge, water, and cleaning solution at the highest operating temperature of the induction cooker (240-250℃); The result after rinsing with a cleaning sponge, water, and cleaning solution at the highest operating temperature of the infrared furnace (≥500℃).

[0081] The above two methods are used to perform heating and the first test, followed by heating and testing again, and this process is repeated 4 times for the cleaning test; 2.2 Classification of stain residue severity: 0: Invisible 1: Very slight, or only visible from a specific angle; 2: As can be seen, there are residual shadows on the test material; 3: It is clearly visible that there is significant residue of the test material; 3. Experimental Results: 3.1 The results of four rounds of heating and cleaning tests on sample 3 are shown in Table 9 and Figure 5-1 arrive Figure 5 -9: Table 9: Sample 3 underwent 4 rounds of heating and cleaning tests

[0082] 3.2 The results of four rounds of heating and cleaning tests on sample 6 are shown in Table 10 and... Figure 5-1 1 to Figure 5-1 8: Table 10: Sample 6 underwent 4 rounds of heating and cleaning tests

[0083] As can be seen from the table above: Compared to untreated sample 3 (see Figure 5-1 Regardless of whether the temperature was 240-250℃ or ≥500℃, the cleaning effect of sample 3 was relatively stable after repeated heating and cleaning tests in the same area, and the cleaning effect score was <10 points.

[0084] Compared to untreated sample 6 (see Figure 5-10), Sample 6, ① Repeated heating and cleaning tests were conducted in the same area at 240-250℃. When the third round was conducted, the surface cleaning effect score began to be >10 points, indicating that the glass surface coating had gradually begun to fail. When the fourth round of testing was conducted, the surface cleaning effect score was as high as 18 points, indicating that the glass surface coating had failed. ② When tested at 500℃, the glass surface cleaning effect score was 14 points after the first round of testing, 20 points after the third round of testing, and 27 points after the fourth round of testing. This score result indicates that the glass surface coating cannot withstand high temperatures ≥500℃. In the scenario of using the infrared furnace at its maximum setting, the surface coating cannot play the corresponding easy-cleaning role.

[0085] In summary, the surface roughness of the microcrystalline glass of the present invention is preferably 1.5μm-1.8μm, and the gloss is preferably 15-40GU. It can be used not only in ordinary microwave ovens, but also in high-temperature hot working environments, especially in infrared stoves. When used in this environment, it has good easy cleaning properties, and the corresponding microcrystalline glass still has high mechanical strength and good scratch resistance. At the same time, some microcrystalline glass materials have a matte finish for aesthetic appeal; and it also has properties that resist oil stains, dirt adhesion, and light scattering.

[0086] Although the present invention has been described in detail above with general descriptions, specific embodiments, and experiments, modifications or improvements can be made to it, which will be obvious to those skilled in the art. Therefore, all such modifications or improvements made without departing from the spirit of the present invention fall within the scope of protection claimed by the present invention.

Claims

1. A type of easy-to-clean microcrystalline glass, characterized in that, It is prepared by polishing the etched microcrystalline glass panel; the roughness of the microcrystalline glass after the treatment is 1-2μm and the gloss is 15-60GU.

2. The microcrystalline glass according to claim 1, characterized in that, The raw material is a microcrystalline glass panel that has been sandblasted with 50-100 mesh diamond abrasive and then acid-etched, with a surface roughness of 2-7μm and a gloss of 1-10GU.

3. The microcrystalline glass according to claim 1, characterized in that, The raw material is selected from microcrystalline glass with a surface roughness of 2-5μm and a gloss of 1.4-10GU.

4. The microcrystalline glass according to claim 1, characterized in that, The treated microcrystalline glass has a roughness of 1.5-2 μm and a gloss of 20-45 GU; or a roughness of 1.6-1.9 μm and a gloss of 20-32 GU.

5. The microcrystalline glass according to claim 1, characterized in that, The polishing method includes the following steps: 1) Prepare a 1-20% solution of the polishing agent; 2) Polish the etched microcrystalline glass with the polishing agent solution prepared in step 1). The glass surface pressure is 10-40 kPa, the polishing speed is 100-150 r / min, the glass temperature is controlled at 30-60℃, and the polishing time is 0.5-40 min.

6. The microcrystalline glass according to claim 5, characterized in that, The polishing method includes the following steps: 1) Prepare a 1-20% solution of the polishing agent; 2) Polish the etched microcrystalline glass with the polishing agent solution prepared in step 1). The glass surface pressure is 10-40 kPa, the polishing speed is 100-150 r / min, the glass temperature is controlled at 30-60℃, and the polishing time is 0.5-40 min.

7. The microcrystalline glass according to claim 5, characterized in that, The polishing agent contains at least 50% cerium oxide and has a particle size of 1-50 μm.

8. The microcrystalline glass according to claim 5, characterized in that, The concentration of polishing powder is 1.5-5%, or 3-5%, or 1.5-3%, or 2-3%.

9. The microcrystalline glass according to claim 7, characterized in that, The polishing agent contains 50-70% cerium oxide and has a particle size of 4-30 μm.

10. A method for preparing the microcrystalline glass according to any one of claims 1-9, the method comprising the following steps: 1) Prepare a 1-20% solution of the polishing agent; 2) Polish the etched microcrystalline glass with the polishing agent solution prepared in step 1). The glass surface pressure is 10-40 kPa, the polishing speed is 100-150 r / min, the glass temperature is controlled at 30-60℃, and the polishing time is 0.5-40 min.

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