High-performance wear-resistant coating applicable to hydrogen working condition and preparation method of high-performance wear-resistant coating

Abstract

The invention relates to the technical field of surface protection of mechanical key parts, and discloses a high-performance wear-resistant coating suitable for a hydrogen working condition and a preparation method thereof. The method comprises: 1) cleaning the surface of a stainless steel substrate; (2) reverse sputtering plasma cleaning is carried out in the furnace chamber under a certain vacuum degree; (3) in the Ar gas atmosphere, the TiNbCrZrCu splicing target material is subjected to pre-sputtering; the width of a Cu target strip in the TiNbCrZrCu spliced target material is 1 mm, and the width of each of the other target strips is 3 mm; the width of the whole spliced target material is about 170mm; ti, Nb, Cr and Zr target strips form a splicing unit (Ti * 2-Nb * 2-Cr * 1-Zr * 2) according to the sequence of two Ti, two Nb, one Cr and two Zr, the Cu target strips are uniformly dispersed and interspersed in the whole splicing target formed by the (Ti * 2-Nb * 2-Cr * 1-Zr * 2) splicing units, and the Cu content is regulated and controlled through the set number of the Cu target strips; and 4) sputtering a TiNbCrZrCu target material in a mixed atmosphere of Ar gas and N2 by using a magnetron sputtering technology to form a TiNbCrZrCuN coating on the surface of the stainless steel, thereby achieving the purpose of improving the wear resistance and hydrogen embrittlement resistance of the surface of the stainless steel.

Description

Technical Field

[0001] This invention relates to the field of surface protection technology for key mechanical components, specifically to a high-performance wear-resistant coating suitable for hydrogen-exposed working conditions and its preparation method, particularly a high-entropy nitride film (HEANF) with excellent resistance to hydrogen embrittlement. Background Technology

[0002] In industrial applications, critical components often experience performance degradation or failure due to wear. To effectively improve wear resistance without compromising the mechanical properties of the substrate, preparing high-performance wear-resistant coatings on the substrate surface is currently one of the optimal solutions. High-entropy nitride films (HEANF), as a novel coating material developed in the last decade, have shown great application potential in the field of surface protection for critical components due to their combination of excellent mechanical properties (such as ultra-high hardness), outstanding corrosion resistance, and good wear resistance.

[0003] However, with increasingly complex and harsh service environments, especially in hydrogen-rich environments (such as chemical hydrogenation equipment and hydrogen energy system components), existing HEANF coatings face severe challenges: hydrogen atoms penetrating into the coating can induce hydrogen embrittlement. Hydrogen embrittlement significantly weakens the material's toughness, making the coating prone to brittle fracture (including internal cracking or delamination at the film-substrate interface). Although HEANF has certain advantages over traditional metal coatings due to its higher hardness and chemical inertness, its inherent brittleness is further amplified in hydrogen-rich environments (hydrogen embrittlement), significantly reducing the coating's resistance to fracture. This hydrogen embrittlement-induced fracture behavior severely damages the coating's structural integrity and is a key bottleneck restricting its ability to provide long-term, safe protection for critical components in hydrogen-rich environments. Summary of the Invention

[0004] The purpose of this invention is to overcome the shortcomings of existing high-entropy nitride films, which are prone to fracture due to hydrogen embrittlement in hydrogen-bearing service environments and thus fail to meet the requirements for long-term safety protection. This invention provides a method for preparing high-entropy nitride films that have both excellent mechanical properties and wear resistance, and significantly improved resistance to hydrogen embrittlement.

[0005] The present invention adopts the following technical solution:

[0006] As one embodiment, a method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions includes the following steps:

[0007] (1) Clean the stainless steel substrate material to remove surface impurities;

[0008] (2) Place the cleaned stainless steel substrate material on the sample stage inside the vacuum chamber of the magnetron sputtering equipment, and maintain the vacuum level inside the chamber at less than 2 × 10⁻⁶.-3 Pa performs anti-sputtering plasma cleaning;

[0009] (3) In an Ar atmosphere, TiNbCrZrCu splicing target is pre-sputtered to remove impurities and oxides adsorbed on the target surface;

[0010] In the TiNbCrZrCu spliced ​​target material, the width of the Cu target strip is 1 mm, and the width of the other target strips is 3 mm; the width of the entire spliced ​​target material is about 170 mm; the Ti, Nb, Cr, and Zr target strips are arranged in the order of 2 Ti, 2 Nb, 1 Cr, and 2 Zr to form a splicing unit (Ti×2–Nb×2–Cr×1–Zr×2), while the Cu target strips are evenly distributed and interspersed in the entire spliced ​​target composed of the (Ti×2–Nb×2–Cr×1–Zr×2) splicing units, and the Cu content is controlled by the number of Cu target strips.

[0011] In the above technical solution, the purity of Ti, Nb, Cr, Zr, and Cu in the TiNbCrZrCu splicing target is 99.9%, the width of the copper target strip is 1mm, and the width of the remaining target strips is 3mm; the width of the entire splicing target material is about 170mm, and the thickness is generally 3-10mm (thickness has no effect on the coating composition and is not limited thereto; it can be selected according to the situation); the splicing sequence of the target strips is (Ti×2–Nb×2–Cr×1–Zr×2)1, (Ti×2–Nb×2–Cr×1–Zr×2)2,..., (Ti×2–Nb×2–Cr×1–Zr×2) n The copper target strips are distributed and interspersed throughout the fixed positions of the splicing target. When the copper content is low, the Cu target strips are placed in the middle of the splicing target material at the 1 / 2 position; when the copper content is medium, the Cu target strips can be placed at the 3 / 8 or 5 / 8 positions; when the copper content is high, the Cu target strips can be placed at the 1 / 8, 3 / 8, 5 / 8, or 7 / 8 positions. See appendix. Figure 1 As shown.

[0012] Preferably, the number of Cu target strips is one.

[0013] (4) In a mixed atmosphere of Ar and N2, TiNbCrZrCu target material is sputtered by magnetron sputtering technology to form a TiNbCrZrCuN coating on the stainless steel surface, thereby improving the wear resistance and hydrogen embrittlement resistance of the stainless steel surface.

[0014] As one example, the stainless steel substrate is 304 stainless steel or 316 stainless steel.

[0015] As one embodiment, in step (2), the anti-sputtering plasma cleaning conditions are: sputtering gas is Ar, sputtering pressure is 3.5 Pa, sputtering bias voltage is -1350 to -1500 V, and sputtering time is 20-30 min.

[0016] In the above technical solution, in order to form a wear-resistant and hydrogen embrittlement-resistant TiNbCrZrCuN coating on the stainless steel surface, and to further remove impurities from the surface of the 304 stainless steel substrate in preparation for the deposition of the TiNbCrZrCuN coating, the stainless steel substrate is installed on the sample stage inside the vacuum furnace of the vacuum magnetron sputtering equipment, and then subjected to reverse sputtering cleaning.

[0017] As one embodiment, in step (3), the pre-sputtering conditions are: Ar atmosphere at 0.5-0.6 Pa, target voltage at 800 V, pulse width at 150, frequency at 200, and cleaning time at 10-15 min.

[0018] In the above technical solution, after the stainless steel substrate surface is cleaned by reverse sputtering, a high-power pulse power supply is used to quickly ignite the TiNbCrZrCu target material, and the TiNbCrZrCu target material is pre-sputtered to remove oxides and adsorbed impurities from the target material surface.

[0019] In one embodiment, in step (4), the N2 flow rate is 8 sccm.

[0020] In one embodiment, in step (4), the distance between the target and the stainless steel substrate is 80 mm; a -50V bias voltage is applied to the stainless steel substrate, and no heating is performed.

[0021] As one embodiment, in step (4), the sputtering pressure is 0.6-0.8 Pa, the Ar gas flow rate is controlled at 40 sccm, and the sputtering time is 35-45 min.

[0022] The present invention also discloses a high-performance wear-resistant coating suitable for hydrogen-bearing conditions, which is prepared by any of the methods described above. The resulting TiNbCrZrCuN coating exhibits a typical biphase nanocomposite structure, specifically: the main body is composed of a highly disordered amorphous continuous phase consisting of nitrides rich in transition metal elements Ti, Nb, Cr and Zr, and copper-rich nanocrystals are randomly distributed in the amorphous matrix.

[0023] Preferably, the TiNbCrZrCuN coating thickness is 850-950 nm, and the atomic percentages of each element in the coating are as follows: Ti, 14-17 at.%; Nb, 9-13 at.%; Cr, 9-13 at.%; Zr, 11-13 at.%; Cu, 2-10 at.%; N, 45-48 at.%.

[0024] The present invention also discloses the application of the above-mentioned TiNbCrZrCuN coating in hydrogen-bearing conditions.

[0025] Preferably, the TiNbCrZrCuN coating is used for surface protection of chemical hydrogenation equipment, hydrogen energy system components, etc.

[0026] Compared with the prior art, the beneficial effects of the present invention are:

[0027] (1) Introducing Cu into the TiNbCrZrN coating transforms the coating structure from an FCC structure to a copper nanocrystalline / amorphous structure. The solid solution strengthening effect generated by copper doping and the interface strengthening effect in the copper nanocrystalline / amorphous structure coating can provide it with high strength, while the interface and the soft surface of the alloy can inhibit the initiation and propagation of cracks and provide it with high toughness.

[0028] (2) By using unbalanced magnetron sputtering technology, the composition and thickness of TiNbCrZrCuN coating can be precisely controlled by adjusting parameters such as reaction gas flow rate and sputtering pressure, thereby preparing TiNbCrZrCuN coating with excellent mechanical properties, wear resistance and hydrogen embrittlement resistance.

[0029] (3) A dense TiNbCrZrCuN coating with a thickness between 850-950 nm can be obtained on a stainless steel surface using unbalanced magnetron sputtering technology. Copper doping induces amorphization of the coating, thereby generating a tortuous and complex hydrogen diffusion pathway, which slows down hydrogen diffusion. At the same time, the copper nanocrystalline / amorphous interface acts as a hydrogen trap to capture hydrogen, further reducing the number of diffusible hydrogen atoms. Moreover, with the increase of coating toughness, the coating's resistance to hydrogen embrittlement is significantly improved. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the splicing target arrangement of the present invention.

[0031] Figure 2 The surface morphology of the coatings prepared for comparative examples and Example 1 of this invention is shown in the figure.

[0032] Figure 3 This is a grazing incidence XRD pattern of the coating prepared in comparison to the present invention.

[0033] Figure 4 The Vickers indentation morphology of the coatings prepared for comparative examples and Example 1 of this invention is shown in the figure.

[0034] Figure 5 Hydrogen diffusion curves of coatings prepared for comparative examples and Example 1 of this invention.

[0035] Figure 6 The surface morphology images of the coatings prepared for the comparative examples and Example 1 of this invention after electrochemical hydrogen charging for different times are shown.

[0036] Figure 7 The image shows the wear track profile of the coating prepared in the comparative example and Example 1 of this invention. Detailed Implementation

[0037] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0038] Comparative Example

[0039] This comparative example demonstrates the deposition of a TiNbCrZrN coating on a 304 stainless steel substrate using unbalanced magnetron sputtering. The sputtering target used was a spliced ​​target composed of Ti, Nb, Cr, and Zr, with the target strips arranged in a specific order: (Ti×2–Nb×2–Cr×1–Zr×2)1, (Ti×2–Nb×2–Cr×1–Zr×2)2, ..., (Ti×2–Nb×2–Cr×1–Zr×2) n The purity of the target material is 99.9%, and the purity of the working gas Ar is 99.999%. The specific preparation process includes the following steps:

[0040] (1) Pretreatment of matrix material

[0041] Process 304 stainless steel into square pieces of 10mm×30mm×1.5mm, polish them smooth, and then ultrasonically clean them with acetone and anhydrous ethanol for 15 minutes in sequence, and blow them dry for later use.

[0042] (2) Backsplash cleaning of substrate material

[0043] The pretreated 304 stainless steel substrate was placed on the sample stage inside the vacuum chamber of the magnetron sputtering equipment, and the vacuum level inside the chamber was maintained at less than 2 × 10⁻⁶. -3 Pa, adjust the baffle between the target and the substrate, then introduce Ar gas, maintain the sputtering pressure at 3.5 Pa, control the bias voltage at -1500 V, and perform reverse sputtering cleaning on the 304 stainless steel substrate for 20 minutes.

[0044] (3) Pre-sputtering cleaning of target material

[0045] Continuing with Ar as the working gas, the sputtering pressure was adjusted to 0.45 Pa. Under the working parameters of 800 V, 150 rpm, and 200 rpm, the TiNbCrZr splicing target was rapidly ignited, followed by 10 minutes of pre-sputtering.

[0046] (4) Sputtered TiNbCrZrN coating

[0047] Ar gas was used as the working gas at a flow rate of 40 sccm. A bias voltage of -50V was applied. The 304 stainless steel substrate was not heated. The target-substrate distance was 80 mm. The sputtering pressure was adjusted to 0.6 Pa. The target power was the same as that of the pre-sputtering. The reactive gas N2 was introduced at a flow rate of 8 sccm. The baffle was removed and sputtering was carried out for 40 min. Thus, a TiNbCrZrN coating was obtained on the surface of the 304 stainless steel.

[0048] Example 1

[0049] This embodiment employs unbalanced magnetron sputtering technology to deposit a TiNbCrZrCuN coating on the surface of a 304 stainless steel substrate. The sputtering target used is a spliced ​​target composed of Ti, Nb, Cr, Zr, and Cu, with the target strips arranged in a specific order: (Ti×2–Nb×2–Cr×1–Zr×2)1, (Ti×2–Nb×2–Cr×1–Zr×2)2, ..., (Ti×2–Nb×2–Cr×1–Zr×2) n The number of Cu target strips is 1, located at 1 / 2 of the entire splicing target. The purity of the target material is 99.9%. The reaction gas is N2 with a purity of 99.999%, and the working gas is Ar with a purity of 99.999%.

[0050] (1) Pretreatment of matrix material

[0051] Process 304 stainless steel into square pieces of 10mm×30mm×1.5mm, polish them smooth, and then ultrasonically clean them with acetone and anhydrous ethanol for 15 minutes in sequence, and blow them dry for later use.

[0052] (2) Backsplash cleaning of substrate material

[0053] The pretreated 304 stainless steel substrate was placed on the sample stage inside the vacuum chamber of the magnetron sputtering equipment, and the vacuum level inside the chamber was maintained at less than 2 × 10⁻⁶. -3 Pa, adjust the baffle between the target and the substrate, then introduce Ar gas, maintain the sputtering pressure at 3.5 Pa, control the bias voltage at -1500 V, and perform reverse sputtering cleaning on the 304 stainless steel substrate for 20 minutes.

[0054] (3) Pre-sputtering cleaning of target material

[0055] Continuing with Ar gas as the working gas, the sputtering pressure was adjusted to 0.45 Pa. Under the working parameters of 800 V voltage, 150 pulse width, and 200 Hz frequency, the TiNbCrZrCu splicing target was rapidly ignited, followed by 10 minutes of pre-sputtering.

[0056] (4) Sputtered TiNbCrZrCuN coating

[0057] Ar gas was used as the working gas at a flow rate of 40 sccm. A bias voltage of -50V was applied. The 304 stainless steel substrate was not heated. The target-substrate distance was 80 mm. The sputtering pressure was adjusted to 0.6 Pa. The target power was the same as that of the pre-sputtering. The reactive gas N2 was introduced at a flow rate of 8 sccm. The baffle was removed and sputtering was carried out for 40 min.

[0058] Example 2

[0059] This embodiment employs unbalanced magnetron sputtering technology to deposit a TiNbCrZrCuN coating on the surface of a 304 stainless steel substrate. The sputtering target used is a spliced ​​target composed of Ti, Nb, Cr, Zr, and Cu, with the target strips arranged in a specific order: (Ti×2–Nb×2–Cr×1–Zr×2)1, (Ti×2–Nb×2–Cr×1–Zr×2)2, ..., (Ti×2–Nb×2–Cr×1–Zr×2) n The number of Cu target strips is 2, located at 3 / 8 and 5 / 8 of the entire splicing target. The purity of the target material is 99.9%. The reaction gas is N2 with a purity of 99.999%, and the working gas is Ar with a purity of 99.999%.

[0060] (1) Pretreatment of matrix material

[0061] Same as Example 1.

[0062] (2) Backsplash cleaning of substrate material

[0063] Same as Example 1.

[0064] (3) Pre-sputtering cleaning of target material

[0065] Same as Example 1.

[0066] (4) Sputtered TiNbCrZrCuN coating

[0067] Same as Example 1.

[0068] Example 3

[0069] This embodiment employs unbalanced magnetron sputtering technology to deposit a TiNbCrZrCuN coating on the surface of a 304 stainless steel substrate. The sputtering target used is a spliced ​​target composed of Ti, Nb, Cr, Zr, and Cu, with the target strips arranged in a specific order: (Ti×2–Nb×2–Cr×1–Zr×2)1, (Ti×2–Nb×2–Cr×1–Zr×2)2, ..., (Ti×2–Nb×2–Cr×1–Zr×2) nThe number of Cu target strips is 4, located at 1 / 8, 3 / 8, 5 / 8 and 7 / 8 of the entire spliced ​​target. The purity of the target material is 99.9%. The reaction gas is N2 with a purity of 99.999%, and the working gas is Ar with a purity of 99.999%.

[0070] (1) Pretreatment of matrix material

[0071] Same as Example 1.

[0072] (2) Backsplash cleaning of substrate material

[0073] Same as Example 1.

[0074] (3) Pre-sputtering cleaning of target material

[0075] Same as Example 1

[0076] (4) Sputtered TiNbCrZrCuN coating

[0077] Same as Example 1

[0078] Characterization of the structure, mechanical properties, hydrogen embrittlement resistance, and wear resistance of TiNbCrZrCuN coating deposited on a 304 stainless steel substrate:

[0079] (1) Structural and morphological characteristics

[0080] The coatings prepared in the comparative example and the coatings prepared in Example 1 were analyzed by scanning electron microscopy (SEM). The results are as follows: Figure 2 As shown in the figure, it is clear from the image that the coatings prepared in the comparative example and Example 1 have a dense and continuous surface, with no obvious defects observed over a large area, and the coating thickness is uniform, approximately 850 nm. Grazing incidence XRD was used to analyze the comparative example and Examples 1, 2, and 3, as shown in the figure. Figure 3 As shown, the results indicate that with copper doping, the structure transforms from an FCC structure to an amorphous structure.

[0081] (2) Mechanical properties

[0082] Hardness analysis was performed on the coatings prepared in the comparative example and the coating prepared in Example 1 using a nanoindenter. As shown in Table 1, the hardness of the coating obtained in Example 1 was approximately 18.5 GPa, which is about 2.1 GPa higher than that of the comparative example coating (16.4 GPa). Toughness testing was conducted on the coatings prepared in the comparative example and the coating prepared in Example 1 using a Vickers hardness tester with a load of 3 N. The test results are shown below. Figure 4 As shown, compared with the comparative film which showed partial peeling, the coating of Example 1 only showed radial cracks, indicating that the coating of Example 1 has better toughness, which is crucial for the coating to meet the requirements of practical engineering applications.

[0083] Table 1

[0084]

[0085] (3) Resistance to hydrogen embrittlement

[0086] The coatings prepared in the comparative example and the 304 stainless steel coated with TiNbCrZrCuN prepared in Example 1 were placed at room temperature and subjected to electrochemical testing using an electrochemical workstation with a constant potential of 0.35V and a current of 10mA / cm. 2 The hydrogen barrier performance of the comparative example and Example 1 was tested using a constant current density of 10 mA / cm². 2 The current density was used to charge hydrogen with constant current for 5h, 10h, 20h and 25h, respectively, for the comparative example and Example 1.

[0087] Finally, the hydrogen barrier performance of the coatings prepared in the comparative example and the coatings prepared in Example 1 were compared, and SEM analysis was performed on the coatings after hydrogen charging. The comparative analysis results are as follows: Figure 5 , Figure 6 As shown, compared with the coating prepared in the comparative example, the coating prepared in Example 1 has a stable permeation current density reduced by approximately 50%, and the hydrogen diffusion coefficient D... eff The hydrogen permeability was reduced by 70%. After 20 hours of hydrogen embrittlement, only a few pores appeared on the surface, with no significant peeling. In contrast, the comparative example showed numerous pores and large-area peeling after 10 hours of hydrogen embrittlement. The main reason is that Cu doping promotes partial amorphization of the nitride matrix, thereby creating a geometrically complex diffusion pathway that inhibits hydrogen permeation. Furthermore, the copper nanocrystalline / amorphous interface acts as a hydrogen trap, further reducing the number of diffusible hydrogen atoms. The results indicate that the coating prepared in Example 1 has good resistance to hydrogen embrittlement.

[0088] (4) Tribological testing of the coating

[0089] To investigate the wear behavior of coatings under frictional conditions, 304 stainless steel surfaces coated with both the comparative and Example 1 coatings were placed on a friction and wear test apparatus and subjected to frictional tests under the following conditions: load 2 N, displacement amplitude 6 mm, cycle count 3000, and frequency 3 Hz. Figure 7 As shown, the wear track depth of the coating prepared in Example 1 is significantly smaller than that of the coating prepared in the comparative example. Further analysis of the wear rate of the coatings revealed, as shown in Table 1, that the wear rate of the coating prepared in Example 1 was 2.43 × 10⁻⁶. -6 mm 3 / Nm, significantly lower than the wear rate of the coating prepared in the comparative example (approximately 4.26 × 10⁻⁶ Nm). -6 mm 3 / Nm).

[0090] Of course, the above description is not intended to limit the present invention, and the present invention is not limited to the examples given above. Any changes, modifications, additions or substitutions made by those skilled in the art within the scope of the present invention should also fall within the protection scope of the present invention.

Claims

1. A method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions, characterized in that, Includes the following steps: (1) Clean the stainless steel substrate material to remove surface impurities; (2) Place the cleaned stainless steel substrate material on the sample stage inside the vacuum chamber of the magnetron sputtering equipment, and maintain the vacuum level inside the chamber at less than 2 × 10⁻⁶. -3 Pa performs anti-sputtering plasma cleaning; (3) In an Ar atmosphere, TiNbCrZrCu splicing target is pre-sputtered to remove impurities and oxides adsorbed on the target surface; In the TiNbCrZrCu spliced ​​target material, the width of the Cu target strip is 1 mm, and the width of the other target strips is 3 mm; the width of the entire spliced ​​target material is about 170 mm; the Ti, Nb, Cr, and Zr target strips are arranged in the order of 2 Ti, 2 Nb, 1 Cr, and 2 Zr to form a splicing unit (Ti×2–Nb×2–Cr×1–Zr×2), while the Cu target strips are evenly distributed and interspersed in the entire spliced ​​target composed of the (Ti×2–Nb×2–Cr×1–Zr×2) splicing units, and the Cu content is controlled by the number of Cu target strips. (4) In a mixed atmosphere of Ar and N2, TiNbCrZrCu target material is sputtered by magnetron sputtering technology to form a TiNbCrZrCuN coating on the stainless steel surface, thereby improving the wear resistance and hydrogen embrittlement resistance of the stainless steel surface.

2. The method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions according to claim 1, characterized in that, The number of Cu target strips is 1.

3. The method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions according to claim 1, characterized in that, In step (2), the conditions for anti-sputtering plasma cleaning are: sputtering gas is Ar, sputtering pressure is 3.5 Pa, sputtering bias voltage is -1350 to -1500 V, and sputtering time is 20-30 min.

4. The method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions according to claim 1, characterized in that, In step (3), the pre-sputtering conditions are: Ar atmosphere at 0.5-0.6 Pa, target voltage at 800 V, pulse width at 150, frequency at 200, and cleaning time at 10-15 min.

5. The method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions according to claim 1, characterized in that, In step (4), the N2 flow rate is 8 sccm.

6. The method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions according to claim 1, characterized in that, In step (4), the distance between the target and the stainless steel substrate is 80 mm; a -50V bias voltage is applied to the stainless steel substrate, and no heating is performed.

7. The method for preparing a high-performance wear-resistant coating suitable for hydrogen-bearing conditions according to claim 1, characterized in that, In step (4), the sputtering pressure is 0.6-0.8 Pa, the Ar gas flow rate is controlled at 40 sccm, and the sputtering time is 35-45 min.

8. A high-performance wear-resistant coating suitable for hydrogen-bearing conditions, characterized in that, The TiNbCrZrCuN coating prepared by any one of claims 1-7 exhibits a typical biphase nanocomposite structure, specifically: the main body is composed of a highly disordered amorphous continuous phase consisting of nitrides rich in transition metal elements Ti, Nb, Cr and Zr, and copper-rich nanocrystals are randomly distributed in the amorphous matrix.

9. The TiNbCrZrCuN coating according to claim 8, characterized in that, The TiNbCrZrCuN coating thickness is 850-950 nm; the atomic percentages of each element in the coating are as follows: Ti, 14-17 at.%; Nb, 9-13 at.%; Cr, 9-13 at.%; Zr, 11-13 at.%; Cu, 2-10 at.%; N, 45-48 at.%.

10. The application of the TiNbCrZrCuN coating as described in claim 8 in hydrogen-bearing conditions, characterized in that, Used for surface protection of chemical hydrogenation equipment and hydrogen energy system components.

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