Liquid processing apparatus, liquid processing method, and storage medium

Abstract

The invention provides a liquid processing apparatus, a liquid processing method, and a storage medium, which can prevent bad conditions caused by temperature change of processing liquid when liquid processing is carried out on a substrate. The liquid processing apparatus includes: a nozzle that discharges a processing liquid supplied from a processing liquid supply source to a substrate; a first flow path connecting the processing liquid supply source and the nozzle; a second flow path, one end of which is connected to the first connection part in the first flow path and the other end of which is connected to the second connection part downstream of the first connection part, the second flow path forming an annular path together with the main flow path between the first connection part and the second connection part in the first flow path; a liquid delivery unit that is provided in the main flow path and delivers the stored processing liquid to the downstream side; a switching unit that switches the processing liquid discharged from the liquid feeding unit to the nozzle or to the second flow path; a temperature sensor which is provided in the annular path and detects the temperature of the processing liquid; and a control unit that outputs a control signal to control the movement of the processing liquid in the annular path on the basis of the detection result of the temperature sensor.

Description

Technical Field

[0001] This invention relates to liquid treatment apparatus, liquid treatment method, and storage medium. Background Technology

[0002] In the manufacture of semiconductor devices, various processing solutions are supplied to the semiconductor wafer (hereinafter referred to as the wafer) which serves as the substrate. Patent Document 1 discloses a technique in which a solvent for improving the wettability of the photoresist to the surface of the wafer is supplied as a processing solution before a photoresist is supplied to the wafer to form a film.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 2012-589 Summary of the Invention

[0006] The technical problem that the invention aims to solve

[0007] This invention prevents adverse effects caused by temperature changes in the treatment solution when liquid treating a substrate.

[0008] Technical solutions for solving technical problems

[0009] The liquid treatment apparatus of the present invention includes:

[0010] A nozzle that ejects a processing solution supplied from a processing solution supply source toward the substrate;

[0011] The first flow path connects the above-mentioned treatment fluid supply source to the above-mentioned nozzle;

[0012] The second flow path has one end connected to the first connecting part in the first flow path and the other end connected to the second connecting part downstream of the first connecting part, forming a loop path together with the main flow path between the first connecting part and the second connecting part in the first flow path.

[0013] The liquid delivery unit is located in the main channel mentioned above and delivers the stored processing liquid to the downstream side.

[0014] The switching unit switches whether the processing liquid discharged from the liquid delivery unit goes to the nozzle or to the second flow path.

[0015] A temperature sensor, disposed in the aforementioned circular path, is used to detect the temperature of the aforementioned processing liquid; and

[0016] The control unit outputs a control signal based on the detection results of the temperature sensor to control the movement of the treatment liquid in the annular path.

[0017] Invention Effects

[0018] This invention can prevent adverse conditions caused by temperature changes in the treatment solution when liquid treating a substrate. Attached Figure Description

[0019] Figure 1 This is a top view of a liquid treatment apparatus according to one embodiment of the present invention.

[0020] Figure 2 This is a side view of the aforementioned liquid treatment apparatus.

[0021] Figure 3 This is a longitudinal sectional side view of the support portion of the nozzle for diluent provided in the above-mentioned liquid treatment device.

[0022] Figure 4 This is a diagram of the flow path system in the aforementioned liquid treatment device.

[0023] Figure 5 This is an explanatory diagram showing the action of dispensing diluent onto the aforementioned wafer.

[0024] Figure 6 This is an illustration of the anti-retention action of diluent in the above-mentioned flow path system under normal circumstances.

[0025] Figure 7 This is an illustration of the above-mentioned anti-detention actions under normal circumstances.

[0026] Figure 8 This is an explanatory diagram illustrating the aforementioned anti-detention action in the first method.

[0027] Figure 9 This is an explanatory diagram of the anti-detention action in the first method described above.

[0028] Figure 10 This is an explanatory diagram of the anti-detention action in the first method described above.

[0029] Figure 11 This is an explanatory diagram of the anti-detention action in the first method described above.

[0030] Figure 12 This is an explanatory diagram of the anti-detention action in the first method described above.

[0031] Figure 13 This is an explanatory diagram of the anti-detention action in the first method described above.

[0032] Figure 14 This is an explanatory diagram of the anti-detention action in the first method described above.

[0033] Figure 15 This is a flowchart of the anti-detention action in the first method described above.

[0034] Figure 16 This is an explanatory diagram of the anti-detention action in the second method described above.

[0035] Figure 17 This is an explanatory diagram of the anti-detention action in the second method described above.

[0036] Figure 18 This is a flowchart of the anti-detention action in the second method described above.

[0037] Figure 19 This is an explanatory diagram of the anti-detention action in the third method mentioned above.

[0038] Figure 20 This is a flowchart of the anti-detention action in the third method mentioned above.

[0039] Figure 21 This is an explanatory diagram illustrating the method for discharging the aforementioned diluent.

[0040] Figure 22 This is a diagram of another flow path system of the liquid treatment device.

[0041] Figure 23 This is a diagram of another flow path system in a liquid treatment device.

[0042] Figure 24 This is an illustrative diagram showing the flow of diluent in the other flow path system described above.

[0043] Figure 25 This is an explanatory diagram showing the flow state of the diluent in the above-mentioned flow path system.

[0044] Explanation of reference numerals in the attached figures

[0045] C1, C2 connection part

[0046] Thermocouples T1 to T4

[0047] V1~V4 valves

[0048] W chip

[0049] 35 nozzles

[0050] 51 flow path

[0051] 52 Return Flow Path

[0052] 59. Diluent Supply Source

[0053] 61 pumps

[0054] 100 Control Department. Detailed Implementation

[0055] [Overview of the liquid treatment unit]

[0056] Reference Figure 1 The top view illustrates a liquid treatment apparatus 1, which is one embodiment of the liquid treatment apparatus of the present invention. The liquid treatment apparatus 1 dispenses a resist as a coating liquid from a nozzle for resist towards the center of the surface of the wafer W. The resist is spread by rotating the wafer W, forming a resist film over the entire surface.

[0057] Furthermore, in the liquid treatment apparatus 1, before dispensing the photoresist onto the wafer W, a diluent, which is an organic solvent, is dispensed from a diluent nozzle toward the center of the surface of the wafer W. This diluent also spreads across the entire surface of the wafer W due to the rotation of the wafer W. This diluent is a treatment liquid used for a process known as pre-wetting, which modifies the surface of the wafer W to improve the wettability of the photoresist.

[0058] Furthermore, in general, in a liquid processing apparatus for liquid processing wafer W, a nozzle and a flow path system for supplying the processing liquid to the nozzle are provided for each processing liquid used. The flow path system is constructed, for example, by combining flow path forming components such as piping, and includes various components and devices such as pumps, filters, and valves. In a part of the aforementioned flow path system, the processing liquid may be locally heated. As a specific example, electrical equipment for opening and closing valves is located near the piping constituting any flow path system. Heat accumulates around this electrical equipment due to the continuous operation of the apparatus. It can be said that due to this heat, the piping is locally heated, and the processing liquid inside is also heated.

[0059] The heated processing liquid undergoes thermal expansion. Therefore, when a predetermined amount of processing liquid is supplied from the nozzle to the wafer W, the liquid is cooled outside the nozzle, reducing its volume. This causes the supply amount to the wafer W to deviate from the predetermined amount, potentially leading to defects in the processing of the wafer W. Furthermore, assuming the diluent is heated and supplied to the wafer W in this manner, the wafer W is heated by the diluent, and the resist supplied afterward is also heated on the wafer W. In this case, the evaporation of the solvent in the resist accelerates, thereby reducing the fluidity of the resist on the surface of the wafer W. Consequently, the thickness of the resist film may deviate from the predetermined value.

[0060] In the liquid processing apparatus 1, the flow path system is configured to ensure that the temperature of the diluent supplied to the wafer W does not deviate from a predetermined allowable range, and the aforementioned defects are prevented by controlling the flow of the diluent in the flow path system. Furthermore, the following description explains the case where the flow path and the diluent in the flow path are heated as described above; however, even when the flow path and the diluent in the flow path are cooled, defects in the wafer W processing caused by this can be prevented.

[0061] [Structure of the liquid treatment device]

[0062] The following is for reference Figure 2 The longitudinal sectional side view illustrates the structure of each part of the liquid processing apparatus 1. The liquid processing apparatus 1 includes two cup-shaped bodies 2 arranged side by side, each housing a wafer W. The two cup-shaped bodies 2 share a processing unit 3 equipped with the aforementioned nozzles.

[0063] A rotary chuck 21, serving as a mounting section for the wafer W, is disposed within a cup-shaped body 2. The rotary chuck 21 attracts and holds the central portion of the back side of the horizontally mounted wafer W. The cup-shaped body 2 surrounds the periphery of the wafer W held by the rotary chuck 21. The rotary chuck 21 is connected to a rotation mechanism 22 and rotates together with the wafer W. A drain port 23 for discharging resist and diluent that fall and scatter from the wafer W, and an exhaust pipe 24 for venting air from the inside of the cup-shaped body 2, are provided at the bottom of the cup-shaped body 2. Furthermore, 25 in the figure represents a pin that moves up and down using a lifting mechanism 26, transferring the wafer W between a wafer W transport mechanism (not shown) and the rotary chuck 21.

[0064] The processing unit 3 includes: a moving part 31 disposed on the rear side of each cup-shaped body 2; an arm 32 extending forward from the moving part 31; a support part 33 disposed on the front end side of the arm 32 and supported thereon; a nozzle 34 for dispensing resist; and a nozzle 35 for dispensing diluent. The support part 33 is configured as a square block, and the nozzles 34 and 35 are supportedly disposed on the lower side of the support part 33. The moving part 31 is configured to be able to move left and right along the guide 38 and to raise and lower the arm 32. Through the operation of the moving part 31, each nozzle 34 and 35 can move between the standby part 39 located outside the cup-shaped body 32 when viewed from above and the position for dispensing diluent or resist on the center of the wafer W placed on the rotating chuck 21.

[0065] Regarding the resist, similarly to the diluent described later, the resist supplied from the supply source is supplied to the resist discharge nozzle 34 via a flow path (not shown) provided in the piping and support section 33. (Refer to the longitudinal sectional side view of the support section 33.) Figure 3 This describes the flow path of the diluent provided in the support portion 33. The support portion 33, together with the pipes 36 and 37 connected to the support portion 33, constitutes part of the flow path system 5 for supplying the aforementioned diluent to the nozzle 35.

[0066] A flow path 41 is formed in the support portion 33, extending from the front wall of the support portion 33 toward the rear side and then curving downwards. The downstream end of the flow path 41 is connected to a flow path inside the nozzle 35. A valve V1 is provided at the bend of the flow path 41. The flow path 41 is opened and closed by the valve V1 to switch the supply of diluent to the nozzle 35 and to stop the supply.

[0067] The valve V1, serving as the first valve, comprises a deformable diaphragm 42, thinner at its periphery than at its center, a spring 43, a cylinder 44, and a housing 45. The cylinder 44 includes a partition 44A that divides the housing 45 front to back; and a connecting portion 44B that protrudes forward from the partition 44A and connects to the center of the diaphragm 42 (the valve body 42A) outside the housing 45. The spring 43 is positioned between the rear wall of the housing 45 and the partition 44A. The position of the periphery of the diaphragm 42 is fixed relative to the housing 45, while the position of the valve body 42A is movable back and forth along with the cylinder 44. The valve body 42A is forced forward by the spring 43 via the cylinder 44 and contacts the wall 30 forming the flow path 41, thereby closing the flow path 41.

[0068] The space 46 formed by the partition 44A of the housing 45 and the front wall of the housing 45 can be pressurized by supplying air through the air supply mechanism 40. Under this pressurized state, the valve body 42A overcomes the force of the spring 43 and moves rearward along with the cylinder 44, moving away from the wall 30, thereby opening the flow path 41. That is, the valve V1 opens and closes the flow path 41 depending on whether air is supplied to the space 46 from the supply mechanism 40.

[0069] The support portion 33 also has a flow path 47 for returning diluent to the pump front stage as described later, without supplying diluent to the nozzle 35 when the valve V1 is closed. One end (downstream end) of the flow path 47 is connected to the upstream side of the flow path 41 where the valve V1 is located, and the connection between the flow path 41 and the flow path 47 is designated as C1. The flow path 47 is bent and extends rearward from the connection C1, and the other end (downstream end) of the flow path 47 opens in the front wall of the support portion 33. The aforementioned pipes 36 and 37 are connected to the front wall of the support portion 33, with the flow path in pipe 36 communicating with the flow path 41, and the flow path in pipe 37 communicating with the flow path 47.

[0070] A thermocouple T1 is provided at the downstream end of the piping 36, and a detection signal is sent to the control unit 100 (described later). The control unit 100 detects the temperature of the diluent at the location of the thermocouple T1 in the piping 36 based on this detection signal. Furthermore, as described later, in the diluent flow path system 5 formed by the flow path forming component including the piping 36, thermocouples are provided as temperature sensors in addition to the thermocouple T1. The control unit 100 also receives detection signals from thermocouples other than T1, and detects the temperature of the diluent at the location where the thermocouple is located in the flow path system based on these detection signals.

[0071] [Diluent flow path system]

[0072] Reference Figure 4 The flow path system 5 of the diluent connected to the nozzle 35 will be described. Figure 4 It means compared to Figure 3A large-scale schematic diagram. In Figure 4 In this diagram, the flow path connecting the nozzle 35 and the diluent supply source 59, which stores the diluent as the treatment liquid, is represented as flow path 51. Downstream of flow path 51, which is the first flow path, is... Figure 3 The flow path within the piping 36 and the flow path 41 within the support portion 33 are described herein. Therefore, a flow path 51, which serves as a first flow path, is formed in the support portion 33. A valve V1 and a thermocouple T1 are sequentially inserted into this flow path 51 towards the upstream side. Furthermore, a filter 58, a pump unit 6, and a valve V2 are sequentially inserted upstream of the thermocouple T1 in the flow path 51.

[0073] Regarding Figure 3 The flow path 47 and the flow path within the piping 37 described herein constitute a part of its flow path. Figure 4 The return flow path 52 is shown in the diagram. Therefore, the upstream end of the return flow path 52 is connected to the flow path 51 via a connecting portion C1 provided on the support portion 33. As a second flow path, the return flow path 52 is sequentially fitted with a thermocouple T2, a valve V3, and another thermocouple T2, and its downstream end is connected between the valve V2 in the flow path 51 and the pump unit 6. The connecting portion between the flow path 51 and the return flow path 52 is shown as C2. The area between the connecting portions C1 and C2 in the flow path 51 is shown as the main flow path 53, and the main flow path 53 and the return flow path 52 form a loop path 54. The valve V3 is opened when performing the anti-retention operation described later and when discharging diluent from the loop path 54; it is closed when these operations are not performed.

[0074] One end (upstream end) of the drain path 55 is connected between the position of thermocouple T3 in the return flow path 52 and the connection point C2. This connection point between the return flow path 52 and the drain path 55 is designated C3. Therefore, thermocouple T3 is located upstream of the connection point C3 in the return flow path 52, and is positioned closer to the connection point C3 than thermocouples T1 and T2 in the direction of diluent flow in the annular path 54. Furthermore, the other end of the drain path 55 is connected, for example, to the drain path of a plant where the liquid treatment device 1 is installed. A valve V4 is inserted into the drain path 55. When valve V4 is open, the pump unit 6 operates to allow diluent to flow from the annular path 54 to the drain path 55 for draining. Valve V4 is closed during this draining process.

[0075] The diluent supply source 59 corresponds to the processing liquid supply source. Valves V1 to V4 correspond to switching units for changing the diluent supply target. Specifically, by combining the opening and closing of valves V1 and V3, the diluent discharged from pump unit 6 and flowing in the main flow path 53 is switched to either the return flow path 52 or the nozzle 35. Furthermore, by opening and closing valve V4, the diluent is switched to be discharged from the annular path 54 to the drainage path 55. Moreover, connections C1, C2, and C3 correspond to the second connection, the first connection, and the third connection, respectively. Additionally, pump unit 6 includes pump 61 as described later; therefore, thermocouple T1 is located between pump 61 and the second connection C2 in the main flow path 53. Thermocouples T1 and T2 correspond to the first temperature sensor, and thermocouple T3 corresponds to the second temperature sensor.

[0076] The pump unit 6 and the main flow path 53 will be described in further detail. The pump unit 6, serving as the liquid delivery unit, includes two pumps 61 and valves V5 and V6 attached to each pump 61. The main flow path 53 branches upstream into two branches, converging downstream. When these two flow paths are referred to as branch paths 56A and 56B, in each of the branch paths 56A and 56B, valve V5, pump 61, and valve V6 are sequentially arranged from upstream to downstream. Therefore, valve V5 opens and closes during the suction and delivery operations of pump 61, respectively, and valve V6 opens and closes during the delivery and suction operations of pump 61, respectively. In the following description, the pump located in branch path 56A will sometimes be referred to as 61A, and the pump located in branch path 56B will sometimes be referred to as 61B to distinguish them. Since pumps 61A and 61B are configured as described above, they are connected in parallel with the connection points C1 and C2 in the main flow path 53 that connect to the return flow path 52.

[0077] The storage section 62, which is located in pump 61 and stores diluent, is designated as 62. This storage section 62 is a region that expands and contracts during the suction and delivery actions of pump 61. Expansion draws diluent into the storage section 62, while contraction pushes diluent downstream of the flow path 51. The storage section 62 can store diluent sufficient to process multiple wafers W. Therefore, the volume of the storage section 62 is greater than the total amount of diluent dispensed into the wafers W multiple times. Pump 61 is equipped with multiple sensors for detecting the liquid level in the storage section 62. By receiving the detection signals from each sensor, control unit 100 can detect whether the amount of liquid stored in the storage section 62 is within any of a pre-set range. Furthermore, pump 61 is connected to a discharge flow path, through which diluent can be discharged from the storage section 62 during the delivery action; this is not illustrated.

[0078] [Structure of the Control Department]

[0079] Back Figure 1 The following explanation is provided. A control unit 100 is provided in the liquid processing apparatus 1. The control unit 100 is, for example, a computer, and has a program storage unit (not shown). The program storage unit stores a program used for processing the wafer W in the liquid processing apparatus 1, detecting the temperature of the diluent using thermocouples T1 to T3, and handling various responses (described later) when abnormal temperatures are detected. Furthermore, the above program can also be recorded on a computer-readable storage medium and installed from that storage medium into the control unit 100.

[0080] The installed program contains commands (steps) that cause the control unit 100 to output control signals to various parts of the liquid treatment apparatus 1. These control signals are used to control the operation of the pump 61, the opening and closing of each valve V, the rotation of the wafer W using the rotating mechanism 22, and the movement of the nozzles 34 and 35 using the moving part 31. The control unit 100 includes one or more control circuits to enable the execution of the program steps in this manner. Furthermore, in order to perform the various operations of the liquid treatment apparatus 1 described later, the control unit 100 performs temperature detection using detection signals from thermocouples T1 to T3, and various judgments based on the detected temperature, as described above, through the aforementioned program.

[0081] [Basic Operation of the Device]

[0082] Reference Figures 5-7 The step diagram illustrates the operation of the liquid treatment device 1. Figures 5-7 In the figures described later, the sections of the flow path through which the diluent flows are depicted with a thicker outline than other sections. Additionally, closed valves are distinguished from open valves by adding shading.

[0083] The wafer W is fed into the cup-shaped body 2 using a conveying mechanism and placed on the rotating chuck 21. Then, the valves V6 and V1 of the branch path 56A are opened from the closed state of each valve V, and a predetermined amount of diluent is pumped from the pump 61A to the nozzle 35 and discharged to the center of the surface of the wafer W. After the diluent is discharged from the nozzle 35, the valves V1 and V5 are closed.

[0084] The diluent expands under the centrifugal force generated by the rotation of wafer W and is applied to the entire surface of wafer W. Then, resist is ejected from nozzle 34 towards the center of the surface of wafer W. The resist expands due to the centrifugal force generated by the rotation of wafer W and is applied to the entire surface of wafer W to form a resist film. Afterwards, wafer W is conveyed out of cup-shaped body 2 using a transport mechanism.

[0085] The wafer W is sequentially fed into and out of each cup-shaped body 2. The wafer W delivered to the cup-shaped body 2 is coated with a diluent supplied from pump 61A, and a resist film is formed. While the diluent supplied from pump 61A is described, there are also cases where diluent supplied from pump 61B is used for wafer W processing. In this case, the required valves (specifically, valves V6 and V1 in branch path 56B) are opened.

[0086] [Anti-detention actions]

[0087] Under specified conditions, without the aforementioned processing of wafer W, the diluent flows between pumps 61A and 61B via the annular path 54. This operation is performed because, if the processing liquid remains stagnant in the flow path for an extended period, foreign matter may dissolve from the walls forming the flow path and potentially be supplied to wafer W; therefore, this is prevented. The flow of the diluent between pumps 61A and 61B is referred to as the anti-retention operation.

[0088] The anti-retention action is explained in detail. First, valve V3, valve V6 of branch path 56A, and valve V5 of branch path 56B are opened, and pump 61A performs the liquid delivery action and pump 61B performs the liquid suction action. The diluent of pump 61A flows in the annular path 54 and is supplied to pump 61B. Figure 6 ).

[0089] During the supply of diluent to pump 61B, when the amount of diluent stored in pump 61A falls below a predetermined amount, or when the amount of diluent stored in pump 61B exceeds a predetermined amount, the previously opened valves V3, V5, and V6 are closed, and the operation of pumps 61A and 61B ceases. When the amount of diluent stored in pump 61A falls below the predetermined amount, the valve in the flow path from pump 61A to the diluent supply source 59 is opened, and diluent is replenished from the diluent supply source 59, ensuring that the diluent stored in pump 61A through the suction action of pump 61A remains within the predetermined amount. When the amount of diluent stored in pump 61B exceeds the predetermined amount, diluent is discharged through the discharge path (not shown) via the delivery action of pump 61B, ensuring that the diluent stored in pump 61B remains within the predetermined amount.

[0090] After the above-mentioned replenishment or discharge of diluent, valve V3, valve V5 of branch path 56A, and valve V6 of branch path 56B are opened, and pump 61B performs the liquid delivery action and pump 61A performs the liquid suction action. The diluent from pump 61B flows in the annular path 54 and is supplied to pump 61A. Figure 7During the process of supplying diluent to pump 61A, when the amount of diluent stored in pump 61B falls below a predetermined amount or the amount of diluent stored in pump 61A exceeds a predetermined amount, diluent is either added to pump 61B or discharged from pump 61A, similar to the case of supplying diluent from pump 61A to pump 61A. Then, the process is repeated. Figure 6 The description shows the supply of diluent from pump 61A to pump 61B.

[0091] Repeat this alternating process. Figure 6 The diluent flows from pump 61A to pump 61B. Figure 7 The diluent flows from pump 61B to pump 61A. After a predetermined time has elapsed since the start of the flow operation between the pumps 61 (the start of the anti-retention operation), when the amount of diluent stored in the respective storage sections 62 of pumps 61A and 61B is within a predetermined range, the operation of pumps 61A and 61B stops and valve V3 is closed, ending the anti-retention operation. Furthermore, the above anti-retention operation is performed when no abnormal temperature of the diluent (described later) is detected.

[0092] Such as Figure 6 , Figure 7 As shown, the control unit 100 uses thermocouples T1 to T3 to monitor the temperature of the diluent flowing in the annular path 54. If an anomaly is detected regarding the detected temperature, the control unit 100 controls the operation of each part of the flow path system 5 in any of the following first to third modes. For example, the user of the liquid treatment device 1 can pre-select which of the first to third modes to perform.

[0093] [First Method]

[0094] As a summary of the first method, when the temperature of the diluent detected by thermocouple T3 becomes abnormal (i.e., deviates from a predetermined allowable range), the diluent is discharged from the annular path 54, which is connected to the downstream side of thermocouple T3. If the temperature of the diluent detected by either thermocouple T1 or T2 deviates from the allowable range, the diluent is allowed to move from that detection position to the detection position of thermocouple T3. If the temperature detected by thermocouple T3 deviates from the allowable range, the diluent is discharged from the annular path 54. By discharging the diluent with the abnormally high temperature from the annular path 54 in this way, the diluent is prevented from being supplied to the wafer W.

[0095] Reference indicates the flow status of the diluent. Figures 8 to 13 The diagram illustrates the anti-detention action in the first method. Figure 8 In, it means Figure 6 , Figure 7The description describes a state where the temperature of the diluent at the detection position of thermocouple T1 becomes abnormal when the diluent flows through the annular path 54. For ease of explanation, the diluent flowing through the annular path 54 that experiences this abnormal temperature at thermocouple T1 will be referred to as diluent A1. The moment when diluent A1 is located at the detection position of thermocouple T1 will be denoted as t1.

[0096] Pump unit 6 continues to allow the diluent to flow through the annular path 54. More specifically, as described above, the flow from one of pumps 61A and 61B to the other continues, and diluent A1 moves ( Figure 9 Furthermore, similar to the flow pattern in the absence of detected anomalies, the flow of diluent is appropriately switched between pumps 61A and 61B based on the storage status of the diluent in each pump 61A and 61B. Then, the detection temperature monitored by thermocouple T3 is determined at the time (denoted as t2) when diluent A1 reaches the detection position of thermocouple T3 after a predetermined time from time t1. Figure 10 In other words, the detection temperature of thermocouple T3 is determined at time t2 after a predetermined amount of the aforementioned processing liquid has flowed in the annular path 54 through the operation of pump unit 6, starting from time t1 when thermocouple T1 was detected as abnormal. This predetermined amount is equivalent to the volume of the region of the annular path 54 from thermocouple T1 to thermocouple T3.

[0097] The detected temperature at the determined time t2 is judged. If the detected temperature is judged to be abnormal, valve V4 is opened, thereby switching the diluent supply target from one of pumps 61A and 61B to the drainage path 55, and the diluent is discharged from the annular path 54 to the drainage path 55. Figure 11 Then, when the prescribed amount of diluent containing diluent A1 is discharged, valve V4 is closed. Additionally, the operation of pump unit 6 (operation of pumps 61A and 61B) stops, and valve V3 is closed. Thus, the anti-retention operation ends, and the flow of diluent in the annular path 54 ceases.

[0098] On the other hand, if the detected temperature at time t2 is not abnormal, it is considered that cooling has occurred during the flow of the diluent, and the action of discharging the diluent to the drain path 55 by opening valve V4 is not performed. Similarly, as in the case where no abnormality is detected, the flow in the annular path 54 continues. Then, as in the case where no abnormality is detected in thermocouples T1 to T3, when a predetermined time has elapsed since the start of the anti-retention action, the operation of pump unit 6 stops and valve V3 is closed, thus... Figure 12 As shown, the anti-retention action ends, and the flow of diluent in the annular path 54 stops.

[0099] Thus, when the reading of thermocouple T1 deviates from the allowable range (abnormal), the diluent is discharged from the drain path 55 based on the judgment based on the reading of thermocouple T3. That is, the temperature is determined by thermocouple T1, and then again by thermocouple T3. Deciding whether to drain to the drain path 55 based on this re-judgment is preferable in preventing unnecessary discharge of the diluent when the temperature fluctuation of the diluent flowing in the annular path 54 is within the allowable range.

[0100] Specifically, the procedure is described when the detected temperature of thermocouple T1 becomes abnormal, but the same procedure is performed when the detected temperature of thermocouple T2 becomes abnormal. In this case, the detected temperature of thermocouple T3 is measured after the time elapsed since the diluent of the volume from thermocouple T2 to thermocouple T3 has flowed in the annular path 54 following the detection of an abnormality at the detection position of thermocouple T2. The procedure is then performed based on the measured temperature of thermocouple T3. Figure 11 The diluent shown is discharged.

[0101] In addition, Figure 6 , Figure 7 As described, when the diluent flows through the annular path 54, the detection temperature of the diluent for thermocouple T3 deviates from the allowable range while the detection temperatures of thermocouples T1 and T2 remain within the allowable range. Figure 13 For ease of explanation, the diluent flowing in the annular path 54, and the diluent that detects abnormal temperature changes in thermocouple T3, will be referred to as diluent A3.

[0102] In this situation, valve V4 is opened, initiating the liquid delivery operation of pump unit 6. That is, in conjunction with... Figure 11 Similarly, instead of flow to a pump 61 in the annular path 54, the diluent is discharged from the annular path 54 to the drain path 55. Figure 14 Then, when the prescribed amount of diluent containing diluent A3 is discharged, valve V4 is closed, along with... Figure 11 The procedure for discharging diluent A1 is the same as described in the text, such as... Figure 12 As shown, the anti-detention action has ended.

[0103] Figure 15 This is a flowchart summarizing the anti-detention actions in the first method described above. Firstly, as... Figure 7 As described, the anti-retention action begins, and the diluent flows through the annular path 54 (step S1). During this flow, the temperature is monitored and detected using thermocouples T1 to T3 to determine if there is any temperature abnormality (whether it is outside the allowable range) (step S2). When it is determined in step S2 that the detected temperature of thermocouple T1 or T2 is abnormal, as... Figures 8-10As described above, the diluent continues to flow in the annular path 54 so that the diluent that was previously located at thermocouples T1 and T2 is located at thermocouple T3 (step S3), and it is determined whether there is any abnormality in the detection temperature of thermocouple T3 (step S4).

[0104] If the temperature of thermocouple T3 is determined to be abnormal in step S4, such as Figure 11 As explained in the text, after the diluent is discharged into the drainage path 55 (step S5), as Figure 12 As explained, the flow of diluent in the annular path 54 stops (step S6). If it is determined in step S4 that the temperature detected by thermocouple T3 is not abnormal, then step S6 is entered, and the flow of diluent in the annular path 54 stops. That is, no diluent is discharged, and the anti-retention action ends.

[0105] In step S2 above, if it is determined that the temperature detected by thermocouple T3 is abnormal, the following steps, S5, are executed. Specifically, as follows: Figure 13 , Figure 14 As explained, after the diluent is discharged into the drainage path 55, the flow of diluent in the annular path 54 is stopped, and the anti-retention action ends.

[0106] [Second Method]

[0107] Regarding the second method, the explanation will focus on its differences from the first method. In summary, if the detection temperature of the diluent detected by any of the thermocouples T1 to T3 deviates from the permissible range, the diluent at that detection location (the diluent at that detection temperature) continues to flow in the loop path 54 until it reaches the storage section 62 of the pump 61, which is the moving target. Then, upon reaching the storage section 62, the flow stops, ending the anti-retention operation, and the diluent is stored in the storage section 62.

[0108] The storage section 62 of pump 61 has a relatively large volume, and therefore has a small specific heat capacity relative to heat outside the flow path system 5. That is, the diluent stored in pump 61 is not easily affected by heat from outside the flow path system 5. Then, the heat of the diluent supplied to the storage section 62 is dispersed to the diluent stored in the storage section 62. Based on the above, the diluent that has become outside the permissible temperature range is stored in the storage section 62, thereby returning its temperature to the permissible range.

[0109] The following also refers to Figures 16-17 The diagram illustrates the second method in more detail. Similar to the explanation of the first method, when the diluent flows through the annular path 54, as... Figure 8As shown, at time t1, the temperature of the diluent A1 at the detection location of thermocouple T1 becomes abnormal. During this abnormality detection, as... Figure 7 As described, the diluent flows from pump 61B to pump 61A.

[0110] Diluent A1 continues to flow and moves in the annular path 54. Figure 16 When the diluent A1 reaches the storage section 62 of pump 61A, the operation of pump unit 6 stops, and valve V3 is closed, thus stopping the anti-retention operation. That is, the flow of diluent in the annular path 54 stops, and diluent A1 remains in the storage section 62. Figure 17 Its temperature returns to the permissible range.

[0111] If the detection temperature of thermocouples T2 and T3 becomes abnormal, the same operation as if the detection temperature of thermocouple T1 had become abnormal is performed. That is, from the time the abnormality is detected until the diluent at the detection positions of these thermocouples T2 and T3 reaches the storage section 62 of the pump 61, which is the target for supply, the flow of diluent in the annular path 54 continues, and then the flow stops, so that the diluent with the abnormal temperature remains in the storage section 62.

[0112] Figure 18 This is a flowchart summarizing the anti-detention actions in the second method described above. First, as... Figure 7 As described above, the diluent flows through the annular path 54 (step S11). During this flow, the temperature is monitored and detected using thermocouples T1 to T3 to determine whether there is any temperature abnormality (whether it is outside the allowable range) (step S12).

[0113] If no abnormality is detected in step S12, the diluent continues to flow in the annular path 54. If an abnormality is detected in step S12, such as... Figure 16 As explained, the diluent at the detection location of the thermocouple T (T1~T3) where an abnormality is determined to exist continues to flow in the loop path 54 until it reaches the storage section 62 of the pump 61, which is the moving target (step S13). Then, as described... Figure 17 As explained, when the diluent is stored in the storage section 62, the flow of the diluent in the annular path 54 stops, and the anti-retention operation ends (step S14).

[0114] [Third Method]

[0115] Regarding the third method, its outline will be explained focusing on its differences from the first and second methods. When performing the third-party anti-retention action, in addition to the permissible range, a first abnormal range and a second abnormal range are pre-defined for the temperature of the diluent. These permissible ranges, the first abnormal range, and the second abnormal range do not overlap, and the permissible range includes the reference temperature of any diluent. Compared to the first abnormal range, the second abnormal range has a larger deviation from the reference temperature and the permissible range. For a specific example, when the deviation from the reference temperature is X °C, the permissible range is, for example, -0.5 °C ≤ X ≤ +0.5 °C, the first abnormal range is, for example, the range of -0.5 °C < X < -3 °C and the range of +0.5 °C < X < +3 °C, and the second abnormal range is, for example, the range of X ≥ 3 °C and the range of X ≤ -3 °C.

[0116] If the temperature of the diluent detected by thermocouple T3 is within the first abnormal range, the operation is the same as in the second embodiment where thermocouple T3 detects a temperature outside the permissible range; the diluent at the detection location continues to flow in the annular path 54 until it reaches the storage section 62 of the pump 61, which is the moving target. If the temperature of the diluent detected by thermocouple T3 is within the second abnormal range, the diluent at the detection location is discharged from the annular path 54 via the drain path 55, the same as in the first embodiment where thermocouple T3 detects a temperature outside the permissible range. If the temperature of the diluent detected by thermocouple T1 or T2 is outside the permissible range, the diluent at the detection location continues to flow in the annular path 54 until it reaches thermocouple T3. Depending on the detection temperature of thermocouple T3, sometimes storage in the pump 61 or discharge into the drain path 55 is performed as described above.

[0117] The following section provides a more detailed explanation of third-party anti-detention actions. In this explanation, for example... Figure 8 As the diluent flows through the annular path 54, the temperature of the diluent detected by thermocouple T1 deviates from the permissible range. Similar to the description of other operating methods, the diluent that causes such an abnormal temperature is diluent A1. Figure 9 As described in the first method, the diluent A1 continues to flow so that it reaches thermocouple T3, and the temperature of the diluent A1 is detected by thermocouple T3. Then, it is determined whether the detected temperature of thermocouple T3 falls within the allowable range, the first abnormal range, or the second abnormal range. Figure 19 ).

[0118] If it is determined that the liquid is within the permissible range, the aforementioned storage to pump 61 or discharge to drain path 55 is not performed. Similarly, if no abnormality is detected in each thermocouple T, the process ends after the anti-retention action has been performed for a specified duration.

[0119] If it is determined to be included in the first abnormal range, such as Figure 16 As described in the second method, continue the flow of diluent along the annular path 54, as... Figure 17 As explained, when the diluent A1 reaches the storage section 62 of the pump 61, which is the moving target, the anti-retention action ends, and the diluent A1 remains in the storage section 62.

[0120] In cases where it is determined to be included in the second abnormal range, such as in the first method Figures 10-11 As shown in the action, valve V4 is opened, and the pump unit 6 discharges a specified amount of diluent containing diluent A1 into the drainage path 55, after which the anti-retention action ends.

[0121] Thus, when the detection value of thermocouple T1 deviates from the permissible range, based on the judgment of the detection value of thermocouple T3, the diluent is selectively discharged into the drain path 55, or the diluent is allowed to flow through the annular path 54 of the pump 61 for storing the diluent for which the detection value of thermocouple T3 has been obtained. Furthermore, this selection is made based on whether the detection value of thermocouple T3 is included in a first abnormal range or a second abnormal range. Since the diluent is discharged only when it is included in the second abnormal range, i.e., when the deviation from the permissible range is relatively large, it is preferable from the viewpoint of preventing abnormal processing of wafer W and more reliably suppressing the amount of diluent discharged.

[0122] If the detection temperature of thermocouple T2 becomes abnormal, the same actions are performed as if the detection temperature of thermocouple T1 had become abnormal. That is, the diluent at the detection position continues to flow in the annular path 54 to reach the detection position of thermocouple T3, and based on the detection temperature of thermocouple T3, the flow in the annular path 54 is stopped, either by discharging into the drain path 55, storing in the pump 61, or without performing these actions.

[0123] If the detected temperatures of thermocouples T1 and T2 do not become abnormal, but the detected temperature of thermocouple T3 becomes abnormal, determine whether the detected temperature falls within the first abnormal range or the second abnormal range, and then compare it with... Figure 19 The same operation as described above. That is, regarding the diluent at the detection location of thermocouple T3, if it is determined that the diluent is included in the first abnormal range, the diluent is supplied to pump 61 and stored; if it is determined that the diluent is included in the second abnormal range, the diluent is discharged from the drain path 55. After this storage or discharge, the anti-retention operation ends.

[0124] Figure 20 This is a flowchart summarizing the anti-detention actions in the third method described above. First, as... Figure 6 , Figure 7 The anti-stagnation action is initiated as described. That is, flow in the loop path 54 is initiated (step S21). Then, the detection temperatures of thermocouples T1 to T3 are monitored, and it is determined whether each detection temperature is abnormal (whether it is outside the allowable range) (step S22). When it is determined in step S22 that the detection temperature of thermocouple T1 or T2 is outside the allowable range, as... Figure 19 As described above, the diluent at the detection location where the temperature becomes abnormal continues to flow in the annular path 54 so that the diluent is located at thermocouple T3 (step S23), and it is determined whether the detection temperature of thermocouple T3 is abnormal (step S24).

[0125] If, in step S24, it is determined that the detected temperature of thermocouple T3 is abnormal (not within the allowable range), it is determined whether the detected temperature is within the first abnormal range (step S25). If it is determined that the temperature is within the first abnormal range, the diluent at the detection location of thermocouple T3 continues to flow in the annular path 54 so that it moves to the storage section 62 of pump 61 (step S26), after which the anti-retention operation ends. That is, the flow of diluent in the annular path 54 stops (step S27).

[0126] If it is determined in step S25 that the product is not included in the first abnormal range (i.e., it is included in the second abnormal range), the diluent is discharged into the drainage path 55 (step S28). Then, the process proceeds to step S27, and the anti-retention action ends.

[0127] If it is determined in step S22 that the detection temperature of thermocouple T3 is outside the allowable range, the steps below S25 are also performed. That is, after the diluent is moved to pump 61 in step S26 or the diluent is discharged in step S28, the process proceeds to step S27.

[0128] According to the liquid treatment apparatus 1 described above, the connecting portions C1 and C2 in the flow path 51 connecting the nozzle 35 and the diluent supply source 59 are respectively connected to one end and the other end of the return flow path 52 to form an annular path 54. A pump unit 6 is provided in the main flow path 53 between the connecting portions C1 and C2 constituting the annular path 54. In addition, when the pump unit 6 performs liquid delivery, the supply of diluent to the nozzle 35 and the flow of diluent in the annular path 54 are switched by the combination of opening and closing of valves V1 and V3 respectively provided downstream of the connecting portion C1 in the flow path 51. Based on the temperature detection results of the diluent by thermocouples T1 to T3 provided in the annular path 54, the movement in the annular path 54 is controlled as follows: the diluent is moved in the annular path 54 so that it is discharged from the annular path 54 via the drain path 55, or the diluent is moved to the storage section 62 of the pump unit 6 for temperature adjustment. Based on the above, the liquid processing apparatus 1 can prevent the temperature of the diluent supplied to the wafer W from changing from the desired temperature, thereby suppressing the decrease in the yield of semiconductor products produced from the wafer W.

[0129] Furthermore, the valve V1, which switches the flow of diluent through the return flow path 52 in the annular path 54 and the supply of diluent to the nozzle 35, is positioned close to the nozzle 35 by being located on the support portion 33 that supports the nozzle 35. The longer the flow path between the nozzle 35 and the valve V1, the greater the possibility of diluent residue remaining in the flow path when the valve V1 changes from the open state to the closed state and the diluent discharge from the nozzle 35 stops. Therefore, the possibility of deviation in the amount of diluent supplied between the wafers W is also higher. However, in the liquid processing apparatus 1, the flow path is relatively short due to the aforementioned valve V1 configuration. Therefore, deviation in the amount of diluent supplied between the wafers W can be suppressed, and by configuring the valve V1 in this way, the reduction in the yield of semiconductor products produced from the wafers W can also be suppressed.

[0130] Furthermore, one of the thermocouples provided in the aforementioned annular path 54, designated as thermocouple T1, is positioned between the pump unit 6 and the connection point C1 between the flow path 51 and the return flow path 52, thereby placing thermocouple T1 relatively close to the nozzle 35. Due to this position, by controlling the flow of diluent in the annular path 54 using the detection results of thermocouple T1 as described above, it is possible to prevent the supply of diluent at abnormal temperatures to the nozzle 35. As a result, it is possible to more reliably suppress the decrease in yield of semiconductor products manufactured from wafer W.

[0131] [Regarding the configuration of thermocouples and the drainage path of diluent]

[0132] The location and number of thermocouples placed in the annular path 54 are not limited to the examples described above. Furthermore, when draining diluent with abnormal temperatures from the annular path 54, the drainage path 55 described above is not the only option. (See also...) Figure 21 Explanation will be provided. In Figure 4 Illustrations are omitted from the figures, but as shown in the figures below. Figure 21 As shown, one end of the filter 58 is connected to a flow path 63 for venting, and the other end of the flow path 63 is connected to the factory's drainage path, for example, in the same way as the drainage path 55. A valve V7 is inserted into the flow path 63. By operating the pump unit 6 and opening and closing the valves V of the flow path system 5, including the valve V7, the gas remaining in the filter 58 can be discharged along with the diluent into the flow path 63.

[0133] exist Figure 21 In the flow path system 5 shown, a thermocouple T4 is installed between the pump unit 6 and the filter 58 in the main flow path 53. In the first and third methods described above, instead of discharging the diluent from the drain path 55 when an abnormal temperature is detected using the thermocouple T3, for example... Figure 21 As shown, diluent is discharged from flow path 63 when an abnormal temperature is detected using thermocouple T4. Alternatively, diluent with an abnormal temperature can be removed from the annular path 54 in this manner to prevent temperature fluctuations in the diluent supplied to wafer W.

[0134] Alternatively, in cases where a temperature anomaly is detected using thermocouple T4, the diluent with the abnormal temperature can be discharged from the annular path 54 instead of being discharged from the flow path 63, by supplying diluent to the nozzle 35. That is, in the main flow path 53, the downstream side of the connection C1 connecting to the return flow path 52 and the nozzle 35 are used as the drainage path. In cases where the diluent is discharged from the annular path 54 using the downstream side of the main flow path 53 and the nozzle 35, the nozzle 35 can be configured so that the diluent discharged from the nozzle 35 is not supplied to the wafer W. Specifically, for example, the diluent can be discharged while the nozzle 35 is in the standby section 39. As described above, the position of the thermocouple provided in the annular path 54 is not limited to... Figure 4 The locations shown are not limited to those indicated by thermocouples. Furthermore, the location of the drain path for discharging the diluent using thermocouples is not limited to those indicated by thermocouples. Figure 4 The positions shown are as indicated.

[0135] [About the treatment solution]

[0136] Although the description is omitted, in the liquid processing apparatus 1, in addition to the pre-wetting processing unit 3, a processing unit for performing a process called EBR (edge ​​bead removal) is also provided. This EBR processing unit is configured similarly to the pre-wetting processing unit 3, specifically including a nozzle and a moving part that moves the nozzle between the wafer W and a standby section (not shown). Furthermore, the EBR nozzle is connected to a flow path system for supplying diluent, and the nozzle ejects the diluent supplied from the flow path system towards the periphery of the wafer W where a resist film is formed, removing unwanted resist film. The diluent flow path system for this EBR can also be configured similarly to the pre-wetting diluent flow path system 5 described above, and includes functions for detecting diluent temperature anomalies and handling anomaly detection as described in the first to third methods.

[0137] Furthermore, the flow path system for the resist connected to the nozzle 34 can be configured similarly to that for the diluent, allowing for the detection and handling of abnormal temperature readings in the resist. Additionally, this technology can be applied to processing solutions other than resists and diluents that affect the substrate processing due to temperature variations. Specifically, examples of such processing solutions include solutions for forming various films such as antireflective films, and developing solutions for developing resist films. As mentioned above, this technology is not limited to pre-wetting processing solutions, nor is it limited to diluents.

[0138] Other examples of flow path system configurations

[0139] Figure 22 This is a structural diagram of flow path system 5A, a first variation of flow path system 5. In this flow path system 5A, a portion of the return flow path 52 is configured as a flow path 72 formed by a flow path forming component 71, such as quartz. Regarding the flow path forming component 71, it is configured such that light can pass between the flow path 72 formed inside and the outside. Figure 22 In the example shown, a light sensor is positioned between thermocouple T3 and valve V3 in the return flow path 52. Additionally, a light sensor is provided, including a light-emitting section 73 that illuminates light into the flow path 72 and a light-receiving section 74. The light-receiving section 74 receives scattered light generated when light from the light-emitting section 73 illuminates foreign matter in the diluent flowing in the flow path 72. The light-receiving section 74 sends a detection signal corresponding to this light-receiving state to the control unit 100, which can then obtain information about the quantity and size of foreign matter in the flow path 72 of the flow path forming member 71 based on this detection signal.

[0140] like Figure 6 , Figure 7As described above, an anti-retention operation is performed to allow the diluent to flow between pumps 61. During this flow, foreign objects are detected using the aforementioned photosensitive sensor, and the control unit 100 determines whether the number of foreign objects of a predetermined size is above a reference value. Then, when it is determined that the number of foreign objects is, for example, above the reference value, [the system]... Figures 10-11 Similarly, as described above, the diluent for the detection position of thermocouple T3 is discharged from the annular path 54, so that the pump unit 6 and each valve are activated so that the diluent for the detection position of the optical sensor (i.e., flow path 72) is discharged from the annular path 54 via the drainage path 55.

[0141] Regarding the aforementioned optical sensor, it is not limited to a structure where scattered light is incident on the light-receiving section 74. It can also be a structure where transmitted light, irradiated from the light-projecting section 73 and passing through the flow path 72, is incident on the light-receiving section 74. The control unit 100 detects the quantity and size of foreign objects based on a detection signal output according to the light reception status of the transmitted light. Furthermore, the flow path forming member 71 is not limited to being located in the return flow path 52; it can also be located in the main flow path 53.

[0142] in addition, Figure 23 This is a structural diagram of flow path system 5B, a second variation of flow path system 5. In this flow path system 5B, the upstream and downstream ends of flow path 75 are connected between valve V3 and thermocouple T1, and between thermocouple T3 and valve V3, respectively, in the return flow path 52. However, thermocouple T2 is not provided in flow path system 5B. Valve V10 is inserted into the aforementioned flow path 75. A cooling section 76, for example, composed of a heat exchanger, is provided near flow path 75, and the diluent flowing in flow path 75 is cooled by heat exchange with the cooling section 76.

[0143] In progress Figure 6 , Figure 7 During the anti-retention operation described above, if no temperature abnormality is detected by thermocouple T1, valve V3 is opened as previously stated to allow the diluent to flow in the annular path 54. On the other hand, as... Figure 23 As shown, valve V10 is closed, and the diluent no longer flows in flow path 75. If an abnormal temperature is detected by thermocouple T1, valve V3 is closed, and valve V10 is opened as shown. Figure 24 As shown, the diluent A1, whose detection temperature has become abnormal, flows and is cooled in flow path 75. When the diluent A1 reaches the detection position of thermocouple T3, and the detection temperature at thermocouple T3 is abnormal, it... Figure 10 , Figure 11Similarly, the diluent A1 described in the first embodiment is discharged from the drain path 55. That is, the discharge from the drain path 55 is performed based on the detection temperature of the thermocouple T3 at time t2 after the time t1 when the thermocouple T1 detects an anomaly. The time from time t1 to time t2 is the time it takes for the volume of diluent to flow from the detection position of the thermocouple T1 through the flow path 75 to the flow path of the thermocouple T3 using the pump unit 6. Alternatively, as described as the second embodiment, the diluent A1 can also be stored in the pump 61 instead of being discharged from the drain path 55 in this way.

[0144] As described above, regarding flow path 75, a bypass path is formed in the annular path 54 to bypass the portion connected to one end of flow path 75 and the portion connected to the other end. Valves V3 and V10 constitute switching parts that switch the supply of diluent from the annular path 54 to this bypass path and the cessation of supply. When a structure is adopted such that the flow path to which the diluent flows is switched based on the detection results of thermocouples, thereby cooling the diluent, the frequency of diluent discharge can be reduced, or the time for storing the diluent in the pump 61 and cooling it can be shortened. As a result, the operating cost of the device can be suppressed, and the reduction in the throughput of the device can be prevented, which is therefore preferable.

[0145] Furthermore, flow path 75 is not limited to being connected to return flow path 52, but can also be connected to main flow path 53. Additionally, in Figure 23 , Figure 24 In the example, a cooling section 76 is provided to accommodate the possibility that the diluent may be heated in the annular path 54. However, if the diluent may be cooled in the annular path 54, a heating section may be provided instead of a cooling section 76 to heat the diluent flowing in the flow path 75. This heating section may be composed of, for example, a heat exchanger or a heater.

[0146] [Supplementary information regarding pumps, etc.]

[0147] As a liquid delivery unit, namely pump unit 6, an example is shown where two pumps 61 are provided in the circular path 54. However, it is also possible to provide only one pump 61 as a liquid delivery unit. Furthermore, it is explained that when two pumps 61 are provided as pump unit 6, and the diluent flows from one pump 61 to the other, various corresponding processing measures are performed (discharge of diluent, storage in pump 61) based on temperature detection and the detection results. It is not limited to performing temperature detection and corresponding processing during such flow; other methods may also be implemented as follows... Figure 25 The diluent is circulated from one pump 61 to another pump 61 (i.e., to the same pump 61) as shown, during which temperature detection and the aforementioned corresponding treatments are performed.

[0148] Furthermore, in the examples described above, thermocouples were used as temperature sensors, but any method that can detect the temperature of the processing liquid in the flow path is acceptable, and the use of thermocouples is not limited to this. Additionally, the second and third embodiments show the method of storing the diluent in the storage section 62 of the pump 61, but a container different from the pump 61, capable of storing the processing liquid, can also be provided in the annular path 54 as a storage section, storing the processing liquid with abnormal temperatures. However, to suppress the increase in the manufacturing cost of the device, it is advantageous to adopt a structure where the liquid is stored in the pump 61. Moreover, the substrate to be processed can be replaced by an FPD (flat panel display) substrate, a substrate for manufacturing exposure masks, or a test substrate for setting the conditions for processing the wafer W, etc. As described above, the substrate to be processed is not limited to the wafer W.

[0149] It should be considered that the embodiments disclosed herein are illustrative rather than restrictive in all respects. The above-described embodiments may also be omitted, substituted, modified, and combined in various ways without departing from the scope and spirit of the invention.

Claims

1. A liquid treatment device, characterized in that, include: A nozzle that ejects a processing solution supplied from a processing solution supply source toward the substrate; A first flow path connects the treatment fluid supply source to the nozzle; The second flow path has one end connected to the first connecting part in the first flow path and the other end connected to the second connecting part downstream of the first connecting part, forming a loop path together with the main flow path between the first connecting part and the second connecting part in the first flow path; A liquid delivery unit, located in the main flow path, delivers the stored treatment liquid downstream. A switching unit that switches whether the treatment liquid discharged from the liquid delivery unit goes to the nozzle or to the second flow path; A temperature sensor, disposed in the annular path, is used to detect the temperature of the treatment liquid; and The control unit outputs a control signal based on the detection result of the temperature sensor to control the movement of the treatment liquid in the annular path.

2. The liquid treatment apparatus according to claim 1, characterized in that, include: A support portion that supports the nozzle and forms part of the first flow path; and A first valve is disposed on the support portion in such a way that it is located downstream of the second connection portion in the first flow path, thus constituting the switching portion.

3. The liquid treatment apparatus according to claim 2, characterized in that: The second connecting part is disposed on the support part.

4. The liquid treatment apparatus according to claim 1, characterized in that: The temperature sensor is disposed between the liquid delivery section and the second connecting section in the main flow path.

5. The liquid treatment apparatus according to claim 1, characterized in that: A drainage path is provided, which is connected to the loop path and is used to discharge the treated liquid from the loop path. The switching unit switches whether to discharge the treated liquid into the drainage path. The control unit outputs a control signal based on the temperature sensor's detection value to discharge the treatment liquid into the drainage path.

6. The liquid treatment apparatus according to claim 5, characterized in that: The temperature sensor includes: First temperature sensor; and The second temperature sensor is located closer than the first temperature sensor to the third connection point connected to the drain path in the direction of movement of the processed liquid in the annular path. The liquid treatment device discharges the treated liquid from the annular path to the drainage path based on the detection value of the second temperature sensor.

7. The liquid treatment apparatus according to claim 6, characterized in that: When the detection value of the first temperature sensor deviates from the allowable range, the processed liquid is discharged into the drainage path based on the detection value of the second temperature sensor. The detection value of the second temperature sensor is obtained after the first temperature sensor has detected a predetermined amount of the treatment liquid flowing in the annular path.

8. The liquid treatment apparatus according to claim 7, characterized in that: A storage section for storing the treatment liquid is provided in the annular path. The control unit outputs the control signal based on the detection value of the second temperature sensor to discharge the processed liquid into the drainage path, or to move the processed liquid that has obtained the detection value of the second temperature sensor in the circular path, the movement being used to store the processed liquid in the storage unit.

9. The liquid treatment apparatus according to claim 8, characterized in that: If the value detected by the second temperature sensor falls within a first abnormal range that deviates from the permissible range, the processing liquid is stored in the storage compartment. In the case where the fluid is included in a second abnormal range that deviates more from the permissible range than the first abnormal range, the control unit outputs the control signal to discharge the fluid into the drainage path.

10. The liquid treatment apparatus according to claim 1, characterized in that: A storage section for storing the treatment liquid is provided in the annular path. The control unit outputs the control signal based on the detection value of the temperature sensor to move the processing liquid that has obtained the detection value in the annular path, and the movement is used to store the processing liquid in the storage unit.

11. The liquid treatment apparatus according to claim 10, characterized in that: The storage section is located in the liquid delivery section.

12. The liquid treatment apparatus according to claim 11, characterized in that: The liquid delivery unit includes a first pump and a second pump arranged in parallel with respect to the first connecting part and the second connecting part. The movement of the treatment fluid is a movement from one of the first pump and the second pump to the other.

13. The liquid treatment apparatus according to claim 5, characterized in that: An optical sensor is provided to optically detect foreign objects in the loop path. The control unit outputs the control signal based on the detection result of the optical sensor to discharge the treated liquid into the drainage path.

14. The liquid treatment apparatus according to claim 1, characterized in that: A bypass path is provided, with one end of the bypass path connected to the annular path, enabling temperature regulation of the flowing treatment liquid. The switching unit is capable of switching the supply of the processing fluid from the annular path to the bypass path and stopping the supply. The control unit outputs the control signal based on the detection result of the temperature sensor to supply power to the bypass path.

15. The liquid treatment apparatus according to claim 1, characterized in that: The processing liquid is a diluent supplied to the substrate to improve the wettability of the coating liquid before the coating liquid for forming the coating film is supplied to the substrate.

16. A liquid treatment method, characterized in that, include: The step of ejecting the processing liquid supplied from the processing liquid supply source from the nozzle onto the substrate; The step of storing the treatment liquid in the liquid delivery section, wherein the liquid delivery section is disposed in the main flow path of the annular path, the annular path is formed by the second flow path and the main flow path, one end of the second flow path is connected to the first connection part in the first flow path that connects the treatment liquid supply source and the nozzle, and the other end is connected to the second connection part downstream of the first connection part, and the main flow path is located between the first connection part and the second connection part in the first flow path; The step of conveying the processing liquid stored in the liquid delivery section to the downstream side of the main flow path; The step of switching the flow path by using a switching unit to switch whether the processing liquid delivered from the liquid delivery unit goes to the nozzle or to the second flow path; The step of detecting the temperature of the treatment liquid using a temperature sensor disposed in the annular path; and The step of controlling the movement of the treatment fluid in the annular path based on the detection result of the temperature sensor.

17. A storage medium, characterized in that: The storage medium contains a computer program for a liquid handling device. When the computer program is executed by the control unit, it implements the liquid treatment method of claim 16.

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