A perovskite scribing device multi-light-path distance adjustment scribe line control system and method

Abstract

The application provides a perovskite scribing device multi-light-path spacing adjustment line scribing control system and method. The application aims at the technical problems of insufficient uniformity of multi-light-path spacing, poor trajectory following synchronization and low line width and line depth stability in laser processing of perovskite solar cells. A control system is constructed by integrating a laser emission module, a visual positioning module, a light path spacing adjustment module, a trajectory cooperative control module and a laser focal point compensation module. The line spacing deviation and trajectory offset are corrected in real time, and the substrate surface flatness change is dynamically adapted, so that the processing defects caused by mechanical adjustment response lag, trajectory misplacement and fixed focal point in the traditional technology are effectively solved. The line spacing uniformity, trajectory synchronization accuracy and line width and line depth stability are obviously improved. The dynamic line spacing switching response time is less than or equal to 1 second, which can meet the large-size substrate mass production demand and provide technical support for efficient and large-scale production of perovskite batteries.

Description

Technical Field

[0001] This invention relates to a multi-optical path spacing adjustment scribing control system and method for a perovskite scribing device, belonging to the field of perovskite solar cell manufacturing technology, and is applicable to equipment control scenarios for high-precision, high-uniformity scribing processing on the substrate surface using multiple laser beams. Background Technology

[0002] In the laser scribing process of perovskite solar cells, multiple laser beams are often used for synchronous scribing to improve processing efficiency. However, existing technologies have the following problems: First, the uniformity of line spacing is insufficient. The spacing between adjacent lines of multiple laser beams is easily affected by factors such as mechanical installation errors and thermal deformation, resulting in line spacing deviations exceeding the allowable range of the process and affecting the accuracy of series and parallel connection of cells. Second, the trajectory following synchronization is poor. The laser scribing trajectory in the previous process may have slight deviations. If multiple lasers cannot synchronously follow this trajectory, scribing misalignment is likely to occur, reducing the consistency of the cell pattern. Third, the stability of line width and line depth is insufficient. Deviations in the flatness of the substrate processing surface or changes in the distance between the laser optical components and the processing surface can cause the laser focus position to shift, which in turn causes uneven line width and line depth fluctuations, affecting the electrical performance and reliability of the cell. Summary of the Invention

[0003] To address the shortcomings of the prior art, the present invention aims to provide a multi-optical path spacing adjustment scribing control system and method for a perovskite scribing apparatus.

[0004] According to an embodiment of the present invention, a first embodiment is provided as: a multi-optical path spacing adjustment scribing control system for a perovskite scribing apparatus, comprising:

[0005] The laser emission module outputs 1-48 laser beams to perform laser marking on the substrate surface;

[0006] The vision positioning module simultaneously acquires the processing baseline and the laser scribing trajectory of the previous process from multiple lasers in the laser scribing area, and outputs the trajectory position deviation data of the current laser scribing.

[0007] The optical path spacing adjustment module drives multiple lasers to adjust the line spacing between adjacent laser beams based on trajectory position deviation data, thereby controlling the line spacing uniformity within a threshold range.

[0008] The trajectory coordination control module divides the optical paths of multiple laser beams into coordination units, and controls the multiple laser beams in each coordination unit to synchronously follow the laser scribing trajectory of the previous process to perform laser scribing.

[0009] The laser focus compensation module collects the distance changes between the substrate's processing surface and the laser optical components, and dynamically adjusts the laser focus position based on the distance changes to control the uniformity of the laser scribing line width and the stability of the line depth.

[0010] Furthermore, the laser emitting module achieves multi-optical path expansion and dynamic output through modular construction: a basic optical path, including multiple independent laser emitting components, each of which can independently output multiple laser beams; a modular expansion structure, which superimposes at least one basic optical path through a standard interface to form an expansion optical path unit; a synchronization and coordination module, which uses control logic to ensure that the laser output timing of the basic optical path and the expansion optical path unit is consistent; and a dynamic gating unit, which selectively conducts some or all optical paths according to processing requirements to achieve dynamic output switching of the laser beam.

[0011] Furthermore, the steps for the visual positioning module to calculate trajectory position deviation data include: the visual positioning module includes a CCD high-speed camera and an image processor; the CCD high-speed camera is fixed in front of the laser scribing optical component, and the camera's internal and external parameters are calibrated using a calibration plate; before laser scribing, the image processor acquires a grayscale image of the substrate edge, extracts the edge contour, and fits it to obtain the processing baseline; during the laser scribing process, the image processor synchronously acquires the laser scribing trajectory image of the previous process and extracts trajectory feature points; the acquired trajectory feature points are matched with the processing baseline, and the trajectory position deviation data is calculated.

[0012] Furthermore, the steps for the visual positioning module to calculate trajectory position deviation data include: S21: Converting the graphic coordinate system (u,v) acquired by the visual positioning module into the mechanical coordinate system (x,y) using calibration parameters. The conversion formula is:

[0013] x=(u-u0)×k x +x0;

[0014] y=(v-v0)×k y +y0;

[0015] Where (u0, v0) are the pixel coordinates of the image center point, k x k y The values ​​are in pixel equivalents, and (x0, y0) are the mechanical coordinates of the calibration origin.

[0016] S22: Extract the trajectory feature coordinates (x1, y1) of the previous process laser scribing trajectory image and the target coordinates (x0, y0) of the current processing baseline, and calculate the trajectory position deviation data:

[0017] Δx = x1 - x0;

[0018] Δy = y1 - y0;

[0019] The trajectory position deviation data is output as an array (Δx, Δy) in μm, where the absolute values ​​of Δx and Δy are ≤50μm.

[0020] Furthermore, the adjustment steps for the line spacing between adjacent laser beams are as follows:

[0021] S31: An optical grating ruler is integrated on the sliding block of each laser beam to collect the X-axis coordinates (X1, X2, X3...X) of each laser beam in the mechanical coordinate system in real time. n ), where n is the total number of optical paths;

[0022] For the i-th and (i+1)-th laser paths, the adjacent line spacing D i for:

[0023] D i =∣X i+1 -X i |;

[0024] S32: Set the target line spacing D according to the battery processing requirements. t The D t Continuously adjustable within the range of 3-12mm, with a step size of 0.1mm, calculate the current line spacing D. i Spacing D from the target line t Deviation: ΔD i =D t -D i If |ΔD i If | > 0.5 μm, then trigger line spacing adjustment; if | ΔD i If |≤0.5μm, then maintain the current optical path position;

[0025] S33: Based on deviation ΔD i The displacement command Δx of the linear motor is generated through the first PID control algorithm. i Δx i =ΔD i ×s; where s is the transmission ratio coefficient; the linear motor driving the (i+1)th laser optical path moves Δx along the X-axis. i ;

[0026] S34: During the linear motor drive process, the position coordinates X of the i-th and (i+1)-th optical paths are acquired in real time using a grating ruler. i '、X i+1 ', recalculate the adjusted line spacing D i '=∣X i+1 '-X i '|, update bias is: ΔD i =D t -D i ';If |ΔD i '|>0.5μm, repeat steps S33-S34 until |ΔD i |≤0.5μm;

[0027] S35: Repeat steps S31-S34 for all adjacent optical paths (i=1 to n-1) to ensure that the line spacing of all adjacent laser beams is adjusted to D. t Within the range of ±0.5μm, and with an overall line spacing uniformity of ≤1μm.

[0028] Furthermore, the trajectory cooperative control module divides the optical paths of multiple laser beams into cooperative units using a cubic spline difference algorithm.

[0029] Furthermore, the step of the trajectory cooperative control module dividing the optical paths of multiple laser beams into cooperative units includes:

[0030] S41: The 1-48 laser beams are divided into 1-24 channels / units into cooperative units, and the optical paths in each cooperative unit are kept in a fixed relative position through a mechanical linkage structure;

[0031] S42: Based on the trajectory position deviation data (Δx, Δy) and the overall unit position deviation (ΔX, ΔY) fed back by the grating ruler, the weighted average algorithm is used to calculate the comprehensive error ΔW: ΔW = α × (Δx, Δy) + (1 - α) × (ΔX, ΔY); where α is the weighting coefficient, and the range of α is dynamically adjusted according to the visual positioning accuracy (0.6-0.8);

[0032] S43: Based on the comprehensive error ΔW, the overall motion trajectory of the cooperative unit is generated through the cubic spline difference algorithm to ensure that the displacement of each optical path in each cooperative unit is consistent;

[0033] S44: Drive all optical paths within each collaborative unit to move synchronously through a multi-axis motion controller, so that each collaborative unit can follow the marking of the previous process as a whole.

[0034] Furthermore, the steps for dynamically adjusting the laser focus position include:

[0035] S51: Fix the laser rangefinder to the side of the scribing prism, with the angle between it and the normal direction of the processed surface ≤5°, and calibrate the zero point of the rangefinder using a standard block;

[0036] S52: The distance Z(t) between the machining surface and the lower surface of the prism is acquired at a sampling frequency of 1kHz, and the data is filtered by a low-pass filter to remove high-frequency noise;

[0037] S53: Set the target focus position Z0, and calculate the real-time distance deviation ΔZ(t) = Z(t) - Z0;

[0038] S54: The focusing lens is driven to move along the optical axis by a servo motor or voice coil motor. The real-time distance deviation ΔZ is corrected by the second PID control algorithm, so that the focus tracking accuracy reaches ±5μm and the laser spot diameter fluctuation is <2%.

[0039] Furthermore, based on real-time distance deviation and laser focus position, the control steps for the uniformity of laser scribing line width are as follows:

[0040] S551: Adjust the focus position through the focus compensation module, simultaneously measure the line width at different focus positions, and record the correspondence between line width and focus position as the basis for compensation;

[0041] S552: The distance change between the processing surface and the optical components is obtained in real time through the focus compensation module. Combined with the adjustment result of the focusing lens in the focus compensation module, the actual position of the current laser focus on the processing surface is obtained.

[0042] S553: ​​Calculate the theoretical line width based on the current focus position, compare the theoretical line width with the target line width, and initiate compensation if the deviation exceeds the allowable range.

[0043] If the deviation is >2μm, the focus position is further corrected using the focus compensation module;

[0044] If the deviation is ≤2μm, adjust the laser power. If the focus shift causes the linewidth to increase, reduce the power to decrease the linewidth, and vice versa.

[0045] Steps for controlling the line depth stability of laser scribing:

[0046] S554: Fix the ideal focal position through the focal compensation module, adjust the laser power and scribing speed, measure the line depth under different power / speed combinations, and record the corresponding relationship between line depth and energy density as the basis for compensation;

[0047] S555: Real-time reading of current laser power and scribing speed via the focus compensation module to calculate actual energy density;

[0048] S556: The theoretical line depth is obtained based on the correspondence between line depth and energy density, combined with the current actual energy density;

[0049] Compare the theoretical depth with the target depth; if the deviation exceeds ±0.15μm, initiate compensation.

[0050] The energy density is too low. The laser power is provided by the power module or the scribing speed is reduced by the speed control module to improve the energy density.

[0051] If the energy density is too high, the laser power can be reduced by using a power module or the scribing speed can be increased by using a speed control module to reduce the energy density.

[0052] According to an embodiment of the present invention, utilizing the multi-optical path spacing adjustment scribing control system of the perovskite scribing device in the first embodiment of the present invention, a second embodiment is provided as follows:

[0053] A method for adjusting the spacing of multiple optical paths in a perovskite scribing apparatus to control scribing lines includes the following steps:

[0054] It outputs 1-48 laser beams to perform laser scribing on the substrate surface;

[0055] Simultaneously acquire the processing baseline and previous laser scribing trajectory of multiple lasers in the laser scribing area, and output the trajectory position deviation data of the current laser scribing.

[0056] Based on the trajectory position deviation data, multiple lasers are driven to adjust the line spacing between adjacent laser beams, and the line spacing uniformity is controlled within the threshold range.

[0057] The optical paths of multiple laser beams are divided into collaborative units, and the multiple laser beams in each collaborative unit are controlled to synchronously follow the laser scribing trajectory of the previous process to perform laser scribing.

[0058] The distance between the processed surface of the substrate and the laser optical components is collected, and the laser focus position is dynamically adjusted according to the distance change to control the uniformity of the laser scribing line width and the stability of the line depth.

[0059] Compared with the prior art, the unique advantages of the technical solution provided in this application are as follows:

[0060] The optical path spacing adjustment module drives multiple lasers to adjust the line spacing between adjacent laser beams based on the trajectory position deviation data output by the visual positioning module. This strictly controls the line spacing uniformity within the threshold range, effectively eliminating the influence of mechanical errors and environmental factors on spacing consistency and ensuring the series and parallel connection accuracy of the perovskite cell electrode pattern.

[0061] The trajectory coordination control module divides the optical paths of multiple laser beams into coordination units, and controls the multiple lasers in each coordination unit to synchronously follow the laser scribing trajectory of the previous process to scribing, which solves the problem of trajectory misalignment when multiple optical paths move independently and improves the overall consistency of scribing patterns on large-area substrates.

[0062] The laser focus compensation module collects the distance changes between the substrate processing surface and the laser optical components in real time and dynamically adjusts the laser focus position to effectively offset the influence of surface flatness deviation or distance fluctuation on the focus. This fundamentally controls the uniformity of laser scribing line width and the stability of laser depth, reducing the local performance differences of the battery caused by uneven line width and depth.

[0063] Through the synergistic effect of the above-mentioned technologies, the present invention significantly improves the processing accuracy of multi-path laser scribing, reduces the scribing defect rate, and thus improves the photoelectric conversion efficiency and long-term reliability of perovskite solar cells. At the same time, through the dynamic output and coordinated control of 1-48 lasers, it meets the high-efficiency processing requirements in large-scale mass production. Attached Figure Description

[0064] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0065] in:

[0066] Figure 1 This is a structural block diagram of a multi-optical path spacing adjustment scribing control system for a perovskite scribing apparatus in one embodiment.

[0067] Figure 2 This is a flowchart of a perovskite scribing device for adjusting the spacing of multiple optical paths and controlling scribing lines in one embodiment.

[0068] Figure 3 This is a structural block diagram of a computer device in one embodiment. Detailed Implementation

[0069] To enable those skilled in the art to better understand the technical solutions in this application, the technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0070] Example 1

[0071] This embodiment applies to the laser scribing process of large-area perovskite solar cells, specifically the patterning of the P1 / P2 / P3 layers of the perovskite thin film. The substrate to be processed is a 1.2m × 1.0m substrate, such as a flexible ITO substrate, glass FTO, or cadmium telluride glass substrate. It requires simultaneous scribing using 16 laser beams to form parallel trenches with a linewidth of 50μm and a depth of 2μm. The spacing between adjacent trenches must be controlled within 5mm ± 0.5μm, and the linewidth uniformity and depth fluctuation of the scribing on the entire substrate must be ≤2% to meet the electrical performance requirements of series-parallel cell connections.

[0072] In actual production, the following problems were found when using traditional multi-path laser marking equipment:

[0073] Insufficient uniformity of line spacing: Due to mechanical installation errors and thermal deformation after long-term processing, the maximum deviation of adjacent line spacing in the 16 laser beams reaches 3μm, exceeding the allowable process range of ±0.5μm, resulting in misalignment of battery electrodes in series and parallel, reducing photoelectric conversion efficiency; Poor trajectory tracking synchronization: There is a cumulative offset of ±10μm in the laser scribing trajectory of the previous process. The offset comes from substrate stretching or mechanical transmission errors. The multiple laser beams cannot detect this offset in real time, resulting in misalignment of the subsequent scribing trajectory with the previous process, forming a broken grid defect; Insufficient stability of line width and line depth: The flexible substrate has a surface flatness deviation of ±20μm. When the laser focus position is fixed, the line width fluctuates by 5μm, exceeding the allowable process parameter range of 2%, and the line depth fluctuates by ±0.3μm, exceeding the allowable range of ±0.15μm, affecting the conduction consistency of the battery.

[0074] The existing conventional solutions to address the above technical problems are as follows: Line spacing adjustment: a combination of mechanical hard limit and manual calibration is used. The distance between adjacent optical paths is measured with feeler gauges and manually adjusted with screws. A single calibration takes 2 hours and cannot cope with dynamic errors during processing. After one hour of operation following calibration, the line spacing deviation exceeds the threshold. Track following: it relies on the motion accuracy of mechanical guide rails and does not have real-time track detection and feedback, so it cannot compensate for cumulative errors caused by track offsets in previous processes or substrate deformation. Focus compensation: a fixed focus position is used, and the focus parameters are set in segments by pre-scanning the substrate surface height, but it cannot respond in real time to dynamic distance changes during processing, resulting in fluctuations in line width and line depth.

[0075] The specific solution of this invention is to provide a multi-optical path spacing adjustment scribing control system for a perovskite scribing apparatus, such as... Figure 1 As shown, the system includes: a laser emitting module 100, which outputs 1-48 laser beams to perform laser marking on the substrate surface; a vision positioning module 200, which synchronously acquires the processing baseline and the laser marking trajectory of the previous process from multiple laser beams in the laser marking area, and outputs the trajectory position deviation data of the current laser marking; an optical path spacing adjustment module 300, which drives multiple laser beams to adjust the line spacing between adjacent laser beams according to the trajectory position deviation data, and controls the line spacing uniformity within a threshold range; a trajectory coordination control module 400, which divides the optical paths of multiple laser beams into coordination units, and controls multiple laser beams in each coordination unit to synchronously follow the laser marking trajectory of the previous process for laser marking; and a laser focus compensation module 500, which acquires the distance change between the processing surface of the substrate and the laser optical components, and dynamically adjusts the laser focus position according to the distance change to control the line width uniformity and line depth stability of the laser marking.

[0076] Specifically, the laser emission module 100 provides stable and adjustable multi-channel laser output. It employs four basic optical path units, each containing four independent laser emission components, which are stacked through a standard interface to form 16 extended optical path units. A synchronization and coordination module ensures that the timing deviation of the 16 laser outputs is ≤1μs. The dynamic gating unit activates all 16 optical paths according to processing requirements, outputting a continuous laser with a wavelength of 532nm and a power of 10W.

[0077] Specifically, the visual positioning module 200: collects trajectory position deviation data in real time. Two CCD high-speed aerial cameras are fixed in front of the laser optics component, along with an image processor; the trajectory position deviation data is calculated and output according to an independently developed deviation technology process.

[0078] Specifically, the optical path spacing adjustment module 300: This module provides closed-loop control to ensure the uniformity of adjacent line spacing. Each laser beam's moving slider integrates a grating ruler, driven by a linear motor. Based on an independently developed adjustment process, it controls the overall line spacing uniformity. The main steps include: the grating ruler acquires the X-axis coordinates of the 16 optical paths in real time and calculates the adjacent line spacing; a target line spacing is set and the deviation is calculated; if the deviation exceeds the preset range, a displacement command is generated through a PID control algorithm; the linear motor is then driven to adjust according to the displacement command; this process of calculating adjacent line spacing is repeated until the deviation falls within the preset range, ensuring overall line spacing uniformity.

[0079] Specifically, the trajectory coordination control module 400 enables multi-channel laser synchronous tracking of the trajectory. The coordination unit is divided into two units of 8 channels each. Within each unit, a mechanical linkage structure maintains a fixed relative position. The trajectory tracking accuracy is controlled according to a synchronous control process: a comprehensive error is calculated based on visual positioning deviation and the overall unit position deviation fed back by the grating ruler. Then, a cubic spline interpolation algorithm is used to generate the overall motion trajectory of the coordination unit, driving the multi-axis motion controller to move the 8 laser channels within the unit synchronously, achieving fine control of the trajectory tracking accuracy.

[0080] Specifically, the laser focus compensation module 500 dynamically adjusts the focus position to stabilize line width and depth. A laser rangefinder is fixed to the side of the scribing prism, with a measurement range of 0~50mm, an accuracy of ±2μm, and an angle of 3° with the normal to the processed surface. It collects the distance between the processed surface and the lower surface of the prism, sets the target focus position, calculates the real-time deviation, and uses a PID control algorithm to drive a servo motor or voice coil motor to adjust the focusing lens, achieving fine control of focus following accuracy. Based on the correspondence between line width and focus position, fine control of the line width is achieved by adjusting the laser power or scribing speed.

[0081] Through closed-loop control of the optical path spacing adjustment module 300, the spacing deviation between adjacent lines of the 16 laser paths is reduced from the traditional 3μm to ≤0.5μm, and the uniformity is controlled within 1μm, meeting the accuracy requirements for perovskite solar cell series and parallel connection. The trajectory coordination control module 400 ensures that the trajectory following deviation of multiple laser paths within the coordination unit is ≤3μm, eliminating the scribing misalignment caused by trajectory offset in the previous process, and essentially eliminating grid breakage defects. The laser focus compensation module 500 effectively controls linewidth and line depth fluctuations, improving the consistency of the cell's electrical performance. The synchronous processing of 16 laser paths increases production efficiency by 4 times. The integrated system design reduces manual intervention, significantly improves equipment uptime, and correspondingly improves the mass production yield of perovskite solar cells. This invention solves key problems such as uneven line spacing, trajectory misalignment, and linewidth and line depth fluctuations in traditional multi-optical-path laser scribing through multi-module coordinated control, providing a reliable technical solution for high-precision and high-efficiency processing of perovskite solar cells.

[0082] Example 2

[0083] This embodiment details the implementation scheme of the multi-optical path spacing adjustment marking control system.

[0084] To address the patterning requirements of P1 / P2 / P3 layers on a 1.2m×1.0m flexible ITO substrate, this solution utilizes the coordinated operation of a laser emission module 100, a vision positioning module 200, an optical path spacing adjustment module 300, a trajectory collaborative control module 400, and a laser focus compensation module 500 to achieve simultaneous marking of 16 laser beams, meeting the high-precision requirements of 50μm±1μm linewidth, 2μm±0.15μm line depth, and 5mm±0.5μm spacing between adjacent lines.

[0085] (a) Laser emitting module 100

[0086] Laser emission module 100: 16-channel synchronous laser output, using 4 basic optical path units, each unit containing 4 independent laser emission components, wavelength 532nm, power 8-12W continuously adjustable, superimposed into 16-channel extended optical path units through a standard mechanical interface; integrated synchronization and coordination module, through FPGA logic controller to achieve a timing deviation of ≤0.5μs for the 16-channel laser output, ensuring the consistency of the marking phase; the dynamic gating unit is turned off to keep the 16-channel laser continuously conducting, and the beam diameter is focused to 50μm.

[0087] (ii) Visual positioning module 200

[0088] Two CCD high-speed aerial cameras, with a resolution of 2048×2048 and a frame rate of 1kHz, are fixed in front of the laser optical components, with a distance of 300mm from the processing surface; a matching image processor with a built-in distortion correction algorithm is also included.

[0089] S21: The graphic coordinate system (u,v) acquired by the visual positioning module 200 is converted into the mechanical coordinate system (x,y) through calibration parameters. The conversion formula is as follows:

[0090] x=(u-u0)×k x +x0;

[0091] y=(v-v0)×k y +y0;

[0092] Where (u0, v0) are the pixel coordinates of the image center point, k x k y The values ​​are in pixel equivalents, and (x0, y0) are the mechanical coordinates of the calibration origin.

[0093] S22: Extract the trajectory feature coordinates (x1, y1) of the previous process laser scribing trajectory image and the target coordinates (x0, y0) of the current processing baseline, and calculate the trajectory position deviation data:

[0094] Δx = x1 - x0;

[0095] Δy = y1 - y0;

[0096] The trajectory position deviation data is output as an array (Δx, Δy) in μm, where the absolute values ​​of Δx and Δy are ≤50μm.

[0097] (III) Optical path spacing adjustment module 300

[0098] Each laser beam slider integrates a grating ruler with a resolution of 0.1μm and a sampling frequency of 10kHz, and is driven by a high-precision linear motor.

[0099] S31: An optical grating ruler is integrated on the sliding block of each laser beam to collect the X-axis coordinates (X1, X2, X3...X) of each laser beam in the mechanical coordinate system in real time. n ), where n is the total number of optical paths;

[0100] For the i-th and (i+1)-th laser paths, the adjacent line spacing D i for:

[0101] D i =∣X i+1 -X i |;

[0102] S32: Set the target line spacing D according to the battery processing requirements. t The D t Continuously adjustable within the range of 3-12mm, with a step size of 0.1mm, calculate the current line spacing D. i Spacing D from the target line t Deviation:

[0103] ΔD i =D t -D i ;

[0104] If |ΔD i If | > 0.5μm, then the line spacing adjustment is triggered;

[0105] If |ΔD i If |≤0.5μm, then maintain the current optical path position;

[0106] S33: Based on deviation ΔD i The displacement command Δx of the linear motor is generated through the first PID control algorithm. i :

[0107] Δx i =ΔD i ×s;

[0108] Where s is the transmission ratio coefficient;

[0109] The linear motor driving the (i+1)th laser optical path moves Δx along the X-axis. i ;

[0110] S34: During the linear motor drive process, the position coordinates X of the i-th and (i+1)-th optical paths are acquired in real time using a grating ruler. i '、X i+1 ', recalculate the adjusted line spacing D i '=∣X i+1 '-X i '|, update bias is:

[0111] ΔD i =D t -D i ';

[0112] If |ΔD i '|>0.5μm, repeat steps S33-S34 until |ΔD i |≤0.5μm;

[0113] S35: Repeat steps S31-S34 for all adjacent optical paths (i=1 to n-1) to ensure that the line spacing of all adjacent laser beams is adjusted to D. t Within the range of ±0.5μm, and with an overall line spacing uniformity of ≤1μm.

[0114] PID closed-loop regulation is the core control algorithm of the optical path spacing adjustment module 300. Through the process of deviation detection, PID calculation, displacement drive, position feedback and deviation correction, the line spacing between adjacent laser beams is precisely controlled within the target value (5mm±0.5μm). Its essence is to eliminate the influence of interference factors such as mechanical error and thermal deformation on the spacing uniformity through real-time feedback and dynamic adjustment.

[0115] The PID algorithm handles deviations through the following three steps:

[0116] Proportional element (P): Directly outputs control quantity based on the magnitude of deviation, providing a rapid response to deviation;

[0117] Integral stage (I): Accumulates historical deviations to eliminate static errors;

[0118] Differential component (D): Predicts trends based on the rate of change of deviation and suppresses overshoot.

[0119] The PID parameters (proportional coefficient Kp, integral coefficient Ki, derivative coefficient Kd) need to be optimized through tuning to ensure that ΔD i When the value is ±5μm, the settling time is ≤0.5 seconds and there is no overshoot.

[0120] (iv) Trajectory Cooperative Control Module 400

[0121] S41: The 1-48 laser beams are divided into 1-24 channels / units into cooperative units, and the optical paths in each cooperative unit are kept in a fixed relative position through a mechanical linkage structure;

[0122] S42: Based on the trajectory position deviation data (Δx, Δy) and the overall unit position deviation (ΔX, ΔY) fed back by the grating ruler, the weighted average algorithm is used to calculate the comprehensive error ΔW:

[0123] ΔW=α×(Δx,Δy)+(1-α)×(ΔX,ΔY);

[0124] Wherein, α is the weighting coefficient, and the range of α is dynamically adjusted according to the visual positioning accuracy (0.6-0.8);

[0125] S43: Based on the comprehensive error ΔW, the overall motion trajectory of the cooperative unit is generated through the cubic spline difference algorithm to ensure that the displacement of each optical path in each cooperative unit is consistent;

[0126] S44: Drives all optical paths within each collaborative unit to move synchronously via EtherCAT bus and multi-axis motion controller, enabling each collaborative unit to follow the previous process marking line as a whole, with a trajectory following accuracy of ≤3μm.

[0127] (v) Laser focus compensation module 500

[0128] 5.1 Dynamic adjustment of focus position

[0129] Distance acquisition: Laser rangefinder, sampling frequency 2kHz, accuracy ±2μm, fixed on the side of the scribing prism, with an angle of 3° with the normal of the processed surface, acquires distance Z(t) in real time, and removes noise through a low-pass filter (cutoff frequency 500Hz);

[0130] Focus compensation: Set the target focus position Z0=20mm (laser focal length), calculate ΔZ(t)=Z(t)-Z0, and adjust the focusing lens by driving the servo motor or voice coil motor through the second PID algorithm. The focus following accuracy reaches ±3μm, ensuring that the spot diameter fluctuation is <1% and the corresponding line width fluctuation is <0.5μm.

[0131] 5.2 Fine control of line width and line depth

[0132] Linewidth adjustment: When the linewidth deviation after focus compensation is >1μm, fine-tune the laser power. For example, if the linewidth becomes wider due to the focus shifting upward, reduce the power by 0.3W to maintain linewidth stability.

[0133] Line depth adjustment: Controlled by energy density E=P / v (P is laser power, v is scribing speed). Set E=20J / mm², corresponding to a line depth of 2μm. Monitor the line depth deviation in real time. If it is >±0.15μm, adjust the speed or power to ensure that the line depth fluctuation is ≤±0.12μm.

[0134] Steps for controlling the uniformity of laser scribing line width:

[0135] S551: Adjust the focus position through the focus compensation module, simultaneously measure the line width at different focus positions, and record the correspondence between line width and focus position as the basis for compensation;

[0136] S552: The distance change between the processing surface and the optical components is obtained in real time through the focus compensation module. Combined with the adjustment result of the focusing lens in the focus compensation module, the actual position of the current laser focus on the processing surface is obtained.

[0137] S553: ​​Calculate the theoretical line width based on the current focus position, compare the theoretical line width with the target line width, and initiate compensation if the deviation exceeds the allowable range.

[0138] If the deviation is >2μm, the focus position is further corrected using the focus compensation module;

[0139] If the deviation is ≤2μm, adjust the laser power. If the focus shift causes the linewidth to increase, reduce the power to decrease the linewidth, and vice versa.

[0140] Steps for controlling the line depth stability of laser scribing:

[0141] S554: Fix the ideal focal position through the focal compensation module, adjust the laser power and scribing speed, measure the line depth under different power / speed combinations, and record the corresponding relationship between line depth and energy density as the basis for compensation;

[0142] S555: Real-time reading of current laser power and scribing speed via the focus compensation module to calculate actual energy density;

[0143] S556: The theoretical line depth is obtained based on the correspondence between line depth and energy density, combined with the current actual energy density;

[0144] Compare the theoretical depth with the target depth; if the deviation exceeds ±0.15μm, initiate compensation.

[0145] The energy density is too low. The laser power is provided by the power module or the scribing speed is reduced by the speed control module to improve the energy density.

[0146] If the energy density is too high, the laser power can be reduced by using a power module or the scribing speed can be increased by using a speed control module to reduce the energy density.

[0147] Technical results show that the spacing between adjacent lines of the 16 laser paths is controlled within 5mm ± 0.4μm, with an overall uniformity of 0.8μm, meeting the accuracy requirements for series and parallel connections. The synchronization error of the collaborative unit is ≤3μm, and there is no misalignment when the trajectory deviation of the previous process is ±10μm, essentially eliminating grid breakage defects. The linewidth fluctuation is ±0.8μm, and the line depth fluctuation is ±0.12μm, improving the photoelectric conversion efficiency of perovskite solar cells. The 16-path synchronous scribing achieves a processing time of ≤30 seconds per 1.2m × 1.0m substrate, meeting the requirements of mass production cycle time. This solution, through modular design and precise control, solves the problems of spacing uniformity, trajectory synchronization, and linewidth and line depth stability in multi-path scribing of flexible substrates, providing core technical support for the large-area mass production of perovskite solar cells.

[0148] Example 3

[0149] A method for adjusting the spacing of multiple optical paths in a perovskite scribing apparatus, such as... Figure 2 As shown, the steps include:

[0150] S1: Outputs 1-48 laser beams to perform laser marking on the substrate surface;

[0151] S2: Simultaneously acquire the processing baseline and previous laser scribing trajectory of multiple lasers in the laser scribing area, and output the trajectory position deviation data of the current laser scribing.

[0152] S3: Drive multiple lasers to adjust the line spacing between adjacent laser beams based on trajectory position deviation data, and control the line spacing uniformity within the threshold range;

[0153] S4: Divide the optical paths of multiple laser beams into collaborative units, and control the multiple laser beams in each collaborative unit to synchronously follow the laser scribing trajectory of the previous process to perform laser scribing.

[0154] S5: Collect the distance change between the processing surface of the substrate and the laser optical components, and dynamically adjust the laser focus position according to the distance change to control the uniformity of the laser scribing line width and the stability of the line depth.

[0155] Example 4

[0156] Figure 3 An internal structural diagram of a computer device in one embodiment is shown. This computer device can specifically be a terminal or a server. Figure 3 As shown, the computer device includes a processor, memory, and a network interface connected via a system bus. The memory includes a non-volatile storage medium and internal memory. The non-volatile storage medium stores an operating system and may also store a computer program that, when executed by the processor, enables the processor to implement a line-drawing control method. The memory may also store a computer program that, when executed by the processor, enables the processor to implement the line-drawing control method. Those skilled in the art will understand that... Figure 3 The structure shown is merely a block diagram of a portion of the structure related to the present application and does not constitute a limitation on the computer device to which the present application is applied. Specific computer devices may include more or fewer components than those shown in the figure, or combine certain components, or have different component arrangements.

[0157] In one embodiment, a computer device is provided, including a memory and a processor, the memory storing a computer program that, when executed by the processor, causes the processor to perform the following steps:

[0158] It outputs 1-48 laser beams to perform laser scribing on the substrate surface;

[0159] Simultaneously acquire the processing baseline and previous laser scribing trajectory of multiple lasers in the laser scribing area, and output the trajectory position deviation data of the current laser scribing.

[0160] Based on the trajectory position deviation data, multiple lasers are driven to adjust the line spacing between adjacent laser beams, and the line spacing uniformity is controlled within the threshold range.

[0161] The optical paths of multiple laser beams are divided into collaborative units, and the multiple laser beams in each collaborative unit are controlled to synchronously follow the laser scribing trajectory of the previous process to perform laser scribing.

[0162] The distance between the processed surface of the substrate and the laser optical components is collected, and the laser focus position is dynamically adjusted according to the distance change to control the uniformity of the laser scribing line width and the stability of the line depth.

[0163] In one embodiment, a computer-readable storage medium is provided storing a computer program that, when executed by a processor, causes the processor to perform the following steps:

[0164] It outputs 1-48 laser beams to perform laser scribing on the substrate surface;

[0165] Simultaneously acquire the processing baseline and previous laser scribing trajectory of multiple lasers in the laser scribing area, and output the trajectory position deviation data of the current laser scribing.

[0166] Based on the trajectory position deviation data, multiple lasers are driven to adjust the line spacing between adjacent laser beams, and the line spacing uniformity is controlled within the threshold range.

[0167] The optical paths of multiple laser beams are divided into collaborative units, and the multiple laser beams in each collaborative unit are controlled to synchronously follow the laser scribing trajectory of the previous process to perform laser scribing.

[0168] The distance between the processed surface of the substrate and the laser optical components is collected, and the laser focus position is dynamically adjusted according to the distance change to control the uniformity of the laser scribing line width and the stability of the line depth.

[0169] Those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by a computer program instructing related hardware. The program can be stored in a non-volatile computer-readable storage medium, and when executed, it can include the processes of the embodiments of the above methods. Any references to memory, storage, databases, or other media used in the embodiments provided in this application can include non-volatile and / or volatile memory. Non-volatile memory can include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), or flash memory. Volatile memory can include random access memory (RAM) or external cache memory. By way of illustration and not limitation, RAM is available in various forms, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), dual data rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), synchronous link DRAM (SLDRAM), Rambus direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM), etc.

[0170] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0171] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A multi-optical path spacing adjustment scribing control system for a perovskite scribing apparatus, characterized in that, include: The laser emission module outputs 1-48 laser beams to perform laser marking on the substrate surface; The vision positioning module simultaneously acquires the processing baseline and the laser scribing trajectory of the previous process from multiple lasers in the laser scribing area, and outputs the trajectory position deviation data of the current laser scribing. The optical path spacing adjustment module drives multiple lasers to adjust the line spacing between adjacent laser beams based on trajectory position deviation data, thereby controlling the line spacing uniformity within a threshold range. The trajectory coordination control module divides the optical paths of multiple laser beams into coordination units, and controls the multiple laser beams in each coordination unit to synchronously follow the laser scribing trajectory of the previous process to perform laser scribing. The laser focus compensation module collects the distance changes between the processing surface of the substrate and the laser optical components, and dynamically adjusts the laser focus position according to the distance changes to control the uniformity of the laser scribing line width and the stability of the line depth. The laser emitting module achieves multi-optical path expansion and dynamic output through modular construction: The basic optical path includes multiple independent laser emitting components, and each basic optical path can independently output multiple laser beams; Modular expansion structure, which superimposes at least one basic optical path through a standard interface to form an extended optical path unit; The synchronization and coordination module uses control logic to ensure that the laser output timing of the basic optical path and the extended optical path units is consistent. The dynamic gating unit selectively turns on part or all of the optical path according to processing requirements, thereby realizing dynamic output switching of the laser beam; The steps for the visual positioning module to calculate trajectory position deviation data include: The visual positioning module includes a CCD high-speed flying camera and an image processor. The CCD high-speed flying camera is fixed in front of the line drawing laser optical component, and the internal and external parameters of the camera are calibrated by a calibration plate. Before laser scribing, a grayscale image of the substrate edge is acquired by an image processor, and the edge contour is extracted and fitted to obtain the processing baseline. During the laser scribing process, an image processor is used to simultaneously acquire images of the laser scribing trajectory from the previous process and extract trajectory feature points. The collected trajectory feature points are matched with the processing baseline, and the trajectory position deviation data is calculated.

2. The multi-optical path spacing adjustment scribing control system for the perovskite scribing apparatus according to claim 1, characterized in that, The steps for the visual positioning module to calculate trajectory position deviation data include: S21: Convert the graphic coordinate system (u,v) acquired by the visual positioning module into the mechanical coordinate system (x,y) using calibration parameters. The conversion formula is as follows: x=(u-u0)×k x +x0; y=(v-v0)×k y +y0; Where (u0, v0) are the pixel coordinates of the image center point, k x k y The values ​​are in pixel equivalents, and (x0, y0) are the mechanical coordinates of the calibration origin. S22: Extract the trajectory feature coordinates (x1, y1) of the previous process laser scribing trajectory image and the target coordinates (x0, y0) of the current processing baseline, and calculate the trajectory position deviation data: Δx = x1 - x0; Δy = y1 - y0; The trajectory position deviation data is output as an array (Δx, Δy) in μm, where the absolute values ​​of Δx and Δy are ≤50μm.

3. The multi-optical path spacing adjustment scribing control system for the perovskite scribing apparatus according to claim 1, characterized in that, The steps for adjusting the line spacing between adjacent laser beams are as follows: S31: An optical grating ruler is integrated on the sliding block of each laser beam to collect the X-axis coordinates (X1, X2, X3...X) of each laser beam in the mechanical coordinate system in real time. n ), where n is the total number of optical paths; For the i-th and (i+1)-th laser paths, the adjacent line spacing D i for: D i =∣X i+1 -X i ∣; S32: Set the target line spacing D according to the battery processing requirements. t The D t Continuously adjustable within the range of 3-12mm, with a step size of 0.1mm, calculate the current line spacing D. i Spacing D from the target line t Deviation: ΔD i =D t -D i ; If |ΔD i If | > 0.5μm, then the line spacing adjustment is triggered; If |ΔD i If |≤0.5μm, then maintain the current optical path position; S33: Based on deviation ΔD i The displacement command Δx of the linear motor is generated through the first PID control algorithm. i : Δx i =ΔD i ×s; Where s is the transmission ratio coefficient; The linear motor driving the (i+1)th laser optical path moves Δx along the X-axis. i ; S34: During the linear motor drive process, the position coordinates X of the i-th and (i+1)-th optical paths are acquired in real time using a grating ruler. i '、X i+1 ', recalculate the adjusted line spacing D i '=∣X i+1 '-X i '|, update bias is: ΔD i '=D t -D i '; If |ΔD i '|>0.5μm, repeat steps S33-S34 until |ΔD i |≤0.5μm; S35: Repeat steps S31-S34 for all adjacent optical paths (i=1 to n-1) to ensure that the line spacing of all adjacent laser beams is adjusted to D. t Within the range of ±0.5μm, and with an overall line spacing uniformity of ≤1μm.

4. The multi-optical path spacing adjustment scribing control system for the perovskite scribing apparatus according to claim 1, characterized in that, The trajectory collaborative control module divides the optical paths of multiple laser beams into collaborative units using a cubic spline difference algorithm.

5. The multi-optical path spacing adjustment scribing control system for the perovskite scribing apparatus according to claim 4, characterized in that, The trajectory cooperative control module divides the optical paths of multiple laser beams into cooperative units, including the following steps: S41: The 1-48 laser beams are divided into 1-24 channels / units into cooperative units, and the optical paths in each cooperative unit are kept in a fixed relative position through a mechanical linkage structure; S42: Based on the trajectory position deviation data (Δx, Δy) and the overall unit position deviation (ΔX, ΔY) fed back by the grating ruler, the weighted average algorithm is used to calculate the comprehensive error ΔW: ΔW=α×(Δx,Δy)+(1-α)×(ΔX,ΔY); Wherein, α is the weighting coefficient, and the range of α is dynamically adjusted according to the visual positioning accuracy (0.6-0.8); S43: Based on the comprehensive error ΔW, the overall motion trajectory of the cooperative unit is generated through the cubic spline difference algorithm to ensure that the displacement of each optical path in each cooperative unit is consistent; S44: Drive all optical paths within each collaborative unit to move synchronously through a multi-axis motion controller, so that each collaborative unit can follow the marking of the previous process as a whole.

6. The multi-optical path spacing adjustment scribing control system for the perovskite scribing apparatus according to claim 1, characterized in that, The steps for dynamically adjusting the laser focus position include: S51: Fix the laser rangefinder to the side of the scribing prism, with the angle between it and the normal direction of the processed surface ≤5°, and calibrate the zero point of the rangefinder using a standard block; S52: The distance Z(t) between the machining surface and the lower surface of the prism is acquired at a sampling frequency of 1kHz, and the data is filtered by a low-pass filter to remove high-frequency noise; S53: Set the target focus position Z0, and calculate the real-time distance deviation ΔZ(t) = Z(t) - Z0; S54: The focusing lens is driven to move along the optical axis by a servo motor or voice coil motor. The real-time distance deviation ΔZ is corrected by the second PID control algorithm, so that the focus tracking accuracy reaches ±5μm and the laser spot diameter fluctuation is <2%.

7. The multi-optical path spacing adjustment scribing control system for the perovskite scribing apparatus according to claim 6, characterized in that, The steps for controlling the uniformity of laser scribing line width based on real-time distance deviation and laser focus position are as follows: S551: Adjust the focus position through the focus compensation module, simultaneously measure the line width at different focus positions, and record the correspondence between line width and focus position as the basis for compensation; S552: The distance change between the processing surface and the optical components is obtained in real time through the focus compensation module. Combined with the adjustment result of the focusing lens in the focus compensation module, the actual position of the current laser focus on the processing surface is obtained. S553: ​​Calculate the theoretical line width based on the current focus position, compare the theoretical line width with the target line width, and initiate compensation if the deviation exceeds the allowable range. If the deviation is >2μm, the focus position is further corrected using the focus compensation module; If the deviation is ≤2μm, adjust the laser power. If the focus shift causes the linewidth to increase, reduce the power to decrease the linewidth, and vice versa. Steps for controlling the line depth stability of laser scribing: S554: Fix the ideal focal position through the focal compensation module, adjust the laser power and scribing speed, measure the line depth under different power / speed combinations, and record the corresponding relationship between line depth and energy density as the basis for compensation; S555: Real-time reading of current laser power and scribing speed via the focus compensation module to calculate actual energy density; S556: The theoretical line depth is obtained based on the correspondence between line depth and energy density, combined with the current actual energy density; Compare the theoretical depth with the target depth; if the deviation exceeds ±0.15μm, initiate compensation. The energy density is too low. The laser power is provided by the power module or the scribing speed is reduced by the speed control module to improve the energy density. If the energy density is too high, the laser power can be reduced by using a power module or the scribing speed can be increased by using a speed control module to reduce the energy density.

8. A method for adjusting the spacing of multiple optical paths in a perovskite scribing apparatus to control scribing lines, characterized in that, A scribing control device for adjusting the spacing of multiple optical paths in a perovskite scribing apparatus according to any one of claims 1 to 7, the method comprising the steps of: It outputs 1-48 laser beams to perform laser scribing on the substrate surface; Simultaneously acquire the processing baseline and previous laser scribing trajectory of multiple lasers in the laser scribing area, and output the trajectory position deviation data of the current laser scribing. Based on the trajectory position deviation data, multiple lasers are driven to adjust the line spacing between adjacent laser beams, and the line spacing uniformity is controlled within the threshold range. The optical paths of multiple laser beams are divided into collaborative units, and the multiple laser beams in each collaborative unit are controlled to synchronously follow the laser scribing trajectory of the previous process to perform laser scribing. The distance between the processed surface of the substrate and the laser optical components is collected, and the laser focus position is dynamically adjusted according to the distance change to control the uniformity of the laser scribing line width and the stability of the line depth.

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