SRAF adding method and device, storage medium and electronic equipment

Abstract

The invention discloses an SRAF adding method and device, a storage medium and electronic device.The SRAF adding method comprises the steps that a target layer layout, an original SRAF and a process design rule are obtained; extracting target features from the target layer layout, and extracting a minimum safety interval from the process design rules; expanding the target feature and the original SRAF according to the minimum safety distance to form a blocking region; calculating a difference set of the blocking region and the target layer layout boundary to obtain a plurality of blank regions; generating a plurality of candidate SRAFs based on the blank area, and determining a target SRAF from the plurality of candidate SRAFs according to a preset rule; and combining the target SRAF with the candidate SRAF to generate a final SRAF set. According to the embodiment of the invention, the blank area can be automatically identified, and the SRAF can be adaptively generated in the blank area.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, specifically to an SRAF addition method, apparatus, storage medium, and electronic device. Background Technology

[0002] Photolithography is a critical step in integrated circuit manufacturing, and its resolution and pattern accuracy directly affect device performance and yield. With the shrinking of process nodes, the use of Optical Proximity Correction (OPC) and Sub-Resolution Assist Features (SRAF) has become an important means of ensuring the printability of patterns. SRAF improves the edge placement error (EPE), critical dimension (CD) distribution, and contour consistency of the target pattern by adding tiny auxiliary structures near the target pattern that do not participate in the final pattern formation, thereby altering local optical interference conditions.

[0003] However, in scenarios involving through-hole layers and high-density or irregularly shaped layouts, existing SRAF placement methods, while adhering to minimum process spacing and conflict rejection rules, often leave several blank areas on the layout (i.e., theoretically, SRAFs can be placed but are not filled). These blank areas can lead to increased local edge placement error (EPE), CD offset, or the generation of new printing hotspots. Summary of the Invention

[0004] This application provides an SRAF addition method, apparatus, storage medium, and electronic device that can automatically identify blank areas and adaptively generate SRAFs within those areas.

[0005] In a first aspect, embodiments of this application provide an SRAF adding method, including: Obtain the target layer layout, original SRAF, and process design rules; Extract target features from the target layer layout and extract minimum safety spacing from the process design rules; The target feature and the original SRAF are expanded according to the minimum safety distance to form a blocking area; Calculate the difference between the blocked area and the boundary of the target layer layout to obtain several blank areas; Several candidate SRAFs are generated based on the blank area, and the target SRAF is determined from the several candidate SRAFs according to a preset rule; The target SRAF is merged with the candidate SRAF to generate the final SRAF set.

[0006] In the SRAF addition method provided in this application embodiment, the step of expanding the target feature and the original SRAF according to the minimum safety distance to form a blocking region includes: The buffer distance for expansion is determined based on the minimum safety clearance. Geometric buffering operations are performed on the target feature and the original SRAF according to the buffer distance to form the corresponding expanded polygon; The expanded polygon is preprocessed to generate a blocking region.

[0007] In the SRAF adding method provided in this application embodiment, the preprocessing of the expanded polygon to generate the blocking region includes: A set of blocking polygons is obtained by performing a union operation on several of the aforementioned expanded polygons. The set of blocking polygons is spliced ​​and deduplicated to generate the blocking region.

[0008] In the SRAF addition method provided in this application embodiment, the step of generating several candidate SRAFs based on the blank area includes: Geometric analysis is performed on several blank regions, and candidate SRAF generation strategies are determined based on the results of the geometric analysis. According to the candidate SRAF generation strategy, preliminary SRAFs are generated in the corresponding blank areas respectively; The initial SRAFs are filtered to generate a number of candidate SRAFs.

[0009] In the SRAF addition method provided in this application embodiment, the step of determining the candidate SRAF generation strategy based on geometric analysis results includes: When the area of ​​the blank region is larger than the first preset area and has a regular shape, the maximum inscribed rectangle method is used to generate a preliminary SRAF in the blank region. When the area of ​​the blank region is smaller than the second preset area or is irregular in shape, a rasterization method is used to generate a preliminary SRAF within the blank region. When the blank area is in the shape of a narrow channel, a preliminary SRAF is generated within the blank area using a skeleton extraction method.

[0010] In the SRAF addition method provided in this application embodiment, the step of filtering a plurality of initially selected SRAFs to generate a plurality of candidate SRAFs includes: Size screening is performed on several of the initial SRAFs to remove those with a width smaller than a preset minimum width or a length greater than a preset maximum length, thus obtaining several candidate SRAFs.

[0011] In the SRAF addition method provided in this application embodiment, the step of determining the target SRAF from a plurality of candidate SRAFs according to a preset rule includes: Priority evaluation is performed on several candidate SRAFs, and candidate SRAFs with priority higher than a preset threshold are selected as candidate sets based on the priority evaluation results. Perform optical simulation or contour simulation on the candidate set; The target SRAF is determined from the candidate set based on the simulation results.

[0012] Secondly, embodiments of this application provide an SRAF adding device, comprising: The acquisition unit is used to acquire the target layer layout, the original SRAF, and the process design rules. An extraction unit is used to extract target features from the target layer layout and extract the minimum safety distance from the process design rules. An expansion unit is used to expand the target feature and the original SRAF according to the minimum safety distance to form a blocking area; The calculation unit is used to calculate the difference between the boundary of the blocking region and the boundary of the target layer layout to obtain several blank regions; The determining unit is used to generate a number of candidate SRAFs based on the blank area, and to determine the target SRAF from the number of candidate SRAFs according to a preset rule; The merging unit is used to merge the target SRAF with the candidate SRAF to generate a final SRAF set.

[0013] Thirdly, this application provides a storage medium storing a plurality of instructions adapted for loading by a processor to execute the SRAF addition method described in any of the preceding claims.

[0014] Fourthly, this application provides an electronic device, including a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor executes the computer program to implement the SRAF addition method described in any of the preceding claims.

[0015] In summary, the SRAF addition method provided in this application includes obtaining a target layer layout, an original SRAF, and process design rules; extracting target features from the target layer layout and extracting a minimum safety distance from the process design rules; expanding the target features and the original SRAF according to the minimum safety distance to form a blocking region; calculating the difference between the blocking region and the boundary of the target layer layout to obtain several blank regions; generating several candidate SRAFs based on the blank regions, and determining a target SRAF from the candidate SRAFs according to preset rules; merging the target SRAF with the candidate SRAFs to generate a final SRAF set. This application embodiment can automatically identify blank regions and adaptively generate SRAFs within the blank regions, significantly improving local EPE / CD and contour consistency, reducing manual intervention, and lowering the risk of new hot spots and conflicts while considering process constraints and simulation efficiency, thereby improving lithography imaging quality and manufacturing yield. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram illustrating an application scenario of the SRAF addition method provided in this application embodiment.

[0018] Figure 2 This is a flowchart illustrating the SRAF addition method provided in the embodiments of this application.

[0019] Figure 3 This is a schematic diagram of the SRAF addition device provided in the embodiments of this application.

[0020] Figure 4 This is a schematic diagram of the structure of the electronic device provided in the embodiments of this application. Detailed Implementation

[0021] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numbers in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this application. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this application as detailed in the appended claims.

[0022] It should be noted that, in this document, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element. Furthermore, components, features, and elements with the same names in different embodiments of this application may have the same meaning or different meanings, the specific meaning of which must be determined by its interpretation in that specific embodiment or further in conjunction with the context of that specific embodiment.

[0023] It should be understood that the specific embodiments described herein are merely illustrative of this application and are not intended to limit this application.

[0024] In the following description, the use of suffixes such as "module," "part," or "unit" to denote elements is solely for the purpose of illustrative purposes and has no specific meaning in itself. Therefore, "module," "part," or "unit" may be used interchangeably.

[0025] In the description of this application, it should be noted that the terms "upper," "lower," "left," "right," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. In addition, terms such as "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0026] In scenarios involving through-hole layers and high-density or irregularly shaped layouts, existing SRAF placement methods, while adhering to minimum process spacing and conflict rejection rules, often leave several blank areas on the layout (i.e., theoretically, SRAFs can be placed but are not filled). These blank areas can lead to local EPE increase, CD shift, or the creation of new printing hotspots.

[0027] Based on this, embodiments of this application provide an SRAF adding method, apparatus, storage medium, and electronic device. Specifically, the SRAF adding apparatus can be integrated into an electronic device, which can be a server or a terminal, etc. The terminal can include mobile phones, wearable smart devices, tablet computers, laptops, and personal computers (PCs), etc. The server can be a single server or a server cluster composed of multiple servers, and can be a physical server or a virtual server.

[0028] For example, such as Figure 1 As shown, the electronic device can acquire the target layer layout, the original SRAF, and the process design rules; extract target features from the target layer layout and extract the minimum safety distance from the process design rules; expand the target features and the original SRAF according to the minimum safety distance to form a blocking region; calculate the difference between the blocking region and the boundary of the target layer layout to obtain several blank regions; generate several candidate SRAFs based on the blank regions, and determine the target SRAF from the candidate SRAFs according to preset rules; merge the target SRAF and the candidate SRAFs to generate the final SRAF set.

[0029] The technical solutions shown in this application will be described in detail below through specific embodiments. It should be noted that the order of description of the following embodiments is not intended to limit the priority of the embodiments.

[0030] Please see Figure 2 , Figure 2 This is a flowchart illustrating the SRAF adding method provided in this application embodiment. The specific flow of the SRAF adding method can be as follows: 101. Obtain the target layer layout, original SRAF, and process design rules.

[0031] In this context, the target layer layout refers to the geometric data set of the target layer (such as a via layer) in an integrated circuit design layout file (such as a GDSII or OASIS file) that needs to be photolithographically corrected and for which SRAFs need to be added or supplemented. This target layer layout can include the shape, position, and arrangement information of all design patterns on the target layer, as well as die boundary or tile division information. For example, in the application scenario of via layers, the target layer layout is the geometric boundaries and distribution of all vias in that layer.

[0032] The raw SRAF refers to the set of auxiliary features placed around the target layer during the regular SRAF generation process, based on the geometric rules and process constraints (such as minimum spacing, minimum width, etc.) of the target layer. The raw SRAF is usually stored as a separate layer in the layout file to improve the optical imaging effect of the target graphic.

[0033] Process design rules (MRCs) are a set of parameters defined by the semiconductor process flow to constrain layout design and assist in feature placement. These rules include, but are not limited to: minimum safety spacing, minimum linewidth, maximum linelength, aspect ratio limits, whether off-axis placement is allowed, rasterization resolution, candidate area thresholds, and lithography simulation criteria. As external input conditions, MRCs ensure that the generation and selection of SRAFs (Signal Surface Area Factors) comply with manufacturing process constraints, avoiding new conflicts or hotspots.

[0034] 102. Extract target features from the target layer layout and extract the minimum safety clearance from the process design rules.

[0035] Specifically, target features refer to the actual geometric shapes on the target layer that need to be imaged (e.g., the boundaries of vias), which can be obtained by analyzing the corresponding layer data in the target layer layout. Minimum safety clearance is specified in the process design rules and typically represents the minimum permissible interval between the SRAF and the target pattern or other structures.

[0036] 103. Expand the target features and the original SRAF according to the minimum safety distance to form a blocking area.

[0037] Specifically, a geometric buffering operation can be used to expand both the target feature and the original SRAF. The expansion buffer distance is the aforementioned minimum safety distance, resulting in corresponding expanded polygons. These expanded polygons are then merged to obtain a blocking region covering all prohibited placement areas. This blocking region is used to identify the areas where SRAFs cannot be placed, ensuring that subsequently generated candidate SRAFs meet process safety requirements.

[0038] In other words, step 104 can be specifically as follows: First, determine the buffer distance for expansion based on the minimum safety distance given in the process design rules; then, perform geometric buffering operations on the target feature and the original minimum safety distance (SRAF minimum safety distance) using the buffer distance to obtain multiple expansion polygons; finally, preprocess the expansion polygons to generate blocking areas for identifying prohibited placement of the minimum safety distance (SRAF minimum safety distance). Through this method, the safety boundaries of all target features and the original minimum safety distance (SRAF minimum safety distance) can be uniformly represented, avoiding boundary violations or conflicts during the subsequent generation of candidate minimum safety distances (SRAF minimum safety distances).

[0039] In another specific embodiment, the process of preprocessing the expanded polygons to generate the blocking region can be as follows: First, perform a union operation on multiple expanded polygons to obtain a set of blocking polygons; then, perform splicing and deduplication operations on the set of blocking polygons to eliminate overlapping, adjacent, or redundant boundaries, thereby forming a unique and continuous blocking region. The resulting blocking region covers all areas where the minimum safe distance (SRAF) cannot be placed, while avoiding misjudgments caused by repeated boundaries or geometric fragments, ensuring the integrity and accuracy of the blocking region.

[0040] 104. Calculate the difference between the blocked area and the boundary of the target layer to obtain several blank areas.

[0041] The target layer layout boundary refers to the smallest envelope polygon of all design graphics in the target layer, which can be obtained by parsing the corresponding layer data in the target layer layout file (such as a GDSII or OASIS file). The obtained boundary data should retain the original geometric constraint information of the layout to ensure the accuracy of subsequent difference operations.

[0042] Specifically, a difference operation can be performed between the blocked area and the target layer layout boundary to exclude unplaceable areas within the blocked area, retaining only the blank areas that can be used to generate SRAF. The difference operation can employ standard computational geometry algorithms, such as polygon Boolean operations, combined with spatial indexing optimization methods (such as R-tree or Quadtree) to ensure computational efficiency and accuracy.

[0043] 105. Generate several candidate SRAFs based on the blank area, and determine the target SRAF from the several candidate SRAFs according to the preset rules.

[0044] In some embodiments, geometric analysis can be performed on several blank areas first, and a candidate SRAF generation strategy can be determined based on the geometric analysis results. Preliminary SRAFs are then generated in the corresponding blank areas according to the candidate SRAF generation strategy. These preliminary SRAFs are then filtered to generate several candidate SRAFs. Finally, the target SRAF is determined from the candidate SRAFs according to preset rules.

[0045] For example, when the area of ​​the blank region is larger than a first preset area and has a regular shape (such as close to a rectangle or square), the maximum inscribed rectangle method can be used to generate a preliminary SRAF within the blank region. This embodiment can find the largest rectangular region within the blank region that meets the requirements of minimum linewidth and minimum safety spacing. Placing the SRAF inside the rectangle ensures that the SRAF covers the center of the region as evenly as possible, thus making full use of the blank region space. This embodiment can generate larger and more regular SRAFs in large, regular regions, improving the edge contrast of target features and the uniformity of optical imaging, while avoiding unstable imaging effects due to excessively small SRAF size or scattered distribution.

[0046] For example, when the area of ​​the blank region is smaller than a second preset area or has an irregular shape (such as curved, forked, or uneven), a rasterization method can be used to generate a preliminary SRAF within the blank region. Specifically, the blank region can be divided into several grid cells, with the size and spacing of each grid cell satisfying minimum linewidth and safety spacing constraints. Then, appropriate grid cells are selected as SRAF placement locations based on grid positions and process design rules. Through the rasterization method, even in complex or small areas, SRAFs can be placed in a regular manner, avoiding SRAF duplication or conflict caused by irregular areas, while ensuring a safe distance between the SRAF and the target feature.

[0047] For example, when the blank area is elongated and narrow (when the blank area has a narrow, elongated, or channel-like structure with limited width), a skeleton extraction method can be used to generate a preliminary SRAF within the blank area. Specifically, the blank area can first be skeletonized, and the center line of the area can be extracted to form a skeleton line. Then, SRAFs are evenly placed along the skeleton line, so that the SRAFs are laid out as close to the center line as possible, while maintaining a minimum safe distance from the edge of the channel. The skeleton extraction method can make full use of the limited space of the elongated area, avoid conflicts between the SRAF and target features or obstructing areas, and ensure that auxiliary features are effectively distributed within the channel, thereby improving imaging quality and manufacturability.

[0048] Specifically, the step "screening several preliminary SRAFs to generate several candidate SRAFs" can be performed on several preliminary SRAFs by size screening to remove preliminary SRAFs with a width smaller than the preset minimum width or a length greater than the preset maximum length, thereby obtaining several candidate SRAFs.

[0049] Size screening eliminates initially selected SRAFs that are too narrow or too long, ensuring that each candidate SRAF meets process design rules such as minimum linewidth, minimum spacing, and maximum length limits, thus preventing the generation of unmanufacturable or easily damaged SRAFs. Screened candidate SRAFs are distributed reasonably around the target feature, improving lithographic imaging results, such as increasing edge contrast and enhancing feature imaging uniformity, while avoiding the creation of new imaging hotspots. By eliminating non-compliant or poor-performing SRAFs in advance, the computational load in subsequent optical simulations, priority evaluations, and target SRAF determination processes is reduced, improving the overall efficiency and reliability of the SRAF addition process.

[0050] In some embodiments, the step "determine the target SRAF from several candidate SRAFs according to preset rules" may specifically be: performing priority evaluation on several candidate SRAFs, and selecting candidate SRAFs with a priority higher than a preset threshold as a candidate set based on the priority evaluation results; performing optical simulation or contour simulation on the candidate set; and determining the target SRAF from the candidate set based on the simulation results.

[0051] Priority evaluation is performed by scoring the SRAFs based on their optical improvement effect on the target feature, minimum distance from the target feature, and other design constraints. Based on the priority evaluation results, candidate SRAFs with a priority higher than a preset threshold are selected to form a candidate set. Subsequently, optical simulation or contour simulation is performed on the candidate set to further evaluate the contribution of each candidate SRAF to the imaging quality of the target feature. For example, the impact of SRAFs on edge contrast and imaging uniformity can be analyzed using optical transfer function (OTF), point spread function (PSF), or contour simulation. Finally, based on the simulation results, the target SRAF is determined from the candidate set. The determined target SRAF effectively improves the optical imaging effect of the target feature while satisfying process design rules and safety distance constraints. This step allows for the selection of the optimal SRAF set, providing a foundation for subsequent merging with the original SRAFs and the generation of the final layout.

[0052] 106. Merge the target SRAF with the candidate SRAFs to generate the final SRAF set.

[0053] Specifically, the original SRAFs and the target SRAFs can be initially merged to summarize the geometric data of all SRAFs, including their position, size, and shape information. Then, conflict detection is performed on the merged final SRAF set to check for overlaps, spacing less than the minimum safe distance, or conflicts with target features. Conflicting parts can be handled by deletion, repositioning, or size modification to ensure that each SRAF meets process constraints.

[0054] After merging, the SRAF set can be further optimized and organized to remove redundant boundaries or small fragments, forming a continuous and standardized set of geometric shapes. The final generated SRAF set includes both the original SRAFs and the supplementary target SRAFs, and all SRAFs satisfy process design rules such as minimum width, minimum spacing, and maximum length.

[0055] The embodiments of this application can achieve unified management of the original SRAF and the target SRAF, avoid duplication or conflict, improve the edge contrast and imaging uniformity of the target features, and at the same time ensure the manufacturability of the final SRAF set and its direct use in subsequent optical simulation and manufacturing verification.

[0056] In summary, the SRAF addition method provided in this application includes obtaining the target layer layout, the original SRAF, and process design rules; extracting target features from the target layer layout and extracting the minimum safety distance from the process design rules; expanding the target features and the original SRAF according to the minimum safety distance to form a blocking region; calculating the difference between the blocking region and the boundary of the target layer layout to obtain several blank regions; generating several candidate SRAFs based on the blank regions, and determining the target SRAF from the candidate SRAFs according to preset rules; merging the target SRAF and the candidate SRAFs to generate the final SRAF set. This application embodiment can automatically identify blank regions and adaptively generate SRAFs within the blank regions, achieving significant improvement in local EPE / CD and contour consistency, reducing manual intervention, and lowering the risk of new hot spots and conflicts while considering process constraints and simulation efficiency, thereby improving lithography imaging quality and manufacturing yield.

[0057] To facilitate better implementation of the SRAF adding method provided in this application, this application also provides an SRAF adding device. The meanings of the terms used are the same as in the SRAF adding method described above, and specific implementation details can be found in the descriptions within the method embodiments.

[0058] Please see Figure 3 , Figure 3 This is a schematic diagram of the SRAF adding device provided in an embodiment of this application. The SRAF adding device may include an acquisition unit 201, an extraction unit 202, an expansion unit 203, a calculation unit 204, a determination unit 205, and a merging unit 206. Acquisition unit 201 is used to acquire the target layer layout, the original SRAF, and the process design rules; Extraction unit 202 is used to extract target features from the target layer layout and extract minimum safety spacing from the process design rules; The expansion unit 203 is used to expand the target feature and the original SRAF according to the minimum safety distance to form a blocking area; The calculation unit 204 is used to calculate the difference between the boundary of the blocking region and the boundary of the target layer layout to obtain several blank regions; The determining unit 205 is used to generate a number of candidate SRAFs based on the blank area, and determine the target SRAF from the number of candidate SRAFs according to a preset rule; The merging unit 206 is used to merge the target SRAF with the candidate SRAF to generate a final SRAF set.

[0059] For specific implementation methods of each of the above units, please refer to the above-described embodiments of the SRAF addition method, which will not be repeated here.

[0060] In summary, the SRAF adding device provided in this application embodiment can acquire the target layer layout, the original SRAF, and the process design rules through the acquisition unit 201; the extraction unit 202 extracts the target features from the target layer layout and the minimum safety distance from the process design rules; the expansion unit 203 expands the target features and the original SRAF according to the minimum safety distance to form a blocking region; the calculation unit 204 calculates the difference between the boundary of the blocking region and the target layer layout to obtain several blank regions; the determination unit 205 generates several candidate SRAFs based on the blank regions and determines the target SRAF from the candidate SRAFs according to preset rules; and the merging unit 206 merges the target SRAF and the candidate SRAFs to generate the final SRAF set. This application embodiment can automatically identify blank regions and adaptively generate SRAFs within the blank regions, achieving significant improvement in local EPE / CD and contour consistency, reducing manual intervention, and lowering the risk of new hot spots and conflicts while taking into account process constraints and simulation efficiency, thereby improving lithography imaging quality and manufacturing yield.

[0061] This application also provides an electronic device that may integrate the SRAF adding device of this application embodiment, such as... Figure 4 As shown, it illustrates a structural schematic diagram of the electronic device involved in the embodiments of this application, specifically: The electronic device may include components such as a processor 301 with one or more processing cores and a memory 302 with one or more computer-readable storage media. Those skilled in the art will understand that... Figure 4 The electronic device structure shown does not constitute a limitation on the electronic device and may include more or fewer components than shown, or combine certain components, or have different component arrangements. Wherein: The processor 301 is the control center of the electronic device. It connects various parts of the electronic device via various interfaces and lines. By running or executing software programs stored in the memory 302 and / or this application, and by calling data stored in the memory 302, it performs various functions and processes data, thereby providing overall monitoring of the electronic device. Optionally, the processor 301 may include one or more processing cores; preferably, the processor 301 may integrate an application processor and a modem processor, wherein the application processor mainly handles the operation of the storage medium, user interface, and application programs, while the modem processor mainly handles wireless communication. It is understood that the modem processor may not be integrated into the processor 301.

[0062] The memory 302 can be used to store software programs and this application. The processor 301 executes various functional applications and data processing by running the software programs and this application stored in the memory 302. The memory 302 may mainly include a program storage area and a data storage area. The program storage area may store applications required for operating the storage medium and at least one function; the data storage area may store data created based on the use of the electronic device. In addition, the memory 302 may include high-speed random access memory and may also include non-volatile memory, such as at least one disk storage device, flash memory device, or other volatile solid-state storage device. Accordingly, the memory 302 may also include a memory controller to provide the processor 301 with access to the memory 302.

[0063] Although not shown, the electronic device may also include a display unit, an input unit, and a power supply, etc., which will not be described in detail here. Specifically, in this embodiment, the processor 301 in the electronic device loads the executable files corresponding to the processes of one or more application programs into the memory 302 according to the following instructions, and the processor 301 runs the application programs stored in the memory 302 to realize various functions, as follows: Obtain the target layer layout, original SRAF, and process design rules; Extract target features from the target layer layout and extract minimum safety clearance from the process design rules; The target features and the original SRAF are expanded according to the minimum safe distance to form a blocking area; Calculate the difference between the blocked area and the boundary of the target layer to obtain several blank areas; Several candidate SRAFs are generated based on the blank area, and the target SRAF is determined from the several candidate SRAFs according to the preset rules; The target SRAF is merged with the candidate SRAFs to generate the final SRAF set.

[0064] Those skilled in the art will understand that all or part of the steps in the various methods of the above embodiments can be performed by instructions, or by instructions controlling related hardware. These instructions can be stored in a computer-readable storage medium and loaded and executed by a processor.

[0065] Therefore, embodiments of this application provide a storage medium storing a plurality of instructions that can be loaded by a processor to execute steps in any of the methods provided in embodiments of this application. For example, the instructions can execute the following steps: Obtain the target layer layout, original SRAF, and process design rules; Extract target features from the target layer layout and extract minimum safety clearance from the process design rules; The target features and the original SRAF are expanded according to the minimum safe distance to form a blocking area; Calculate the difference between the blocked area and the boundary of the target layer to obtain several blank areas; Several candidate SRAFs are generated based on the blank area, and the target SRAF is determined from the several candidate SRAFs according to the preset rules; The target SRAF is merged with the candidate SRAFs to generate the final SRAF set.

[0066] For details on the implementation of each of the above operations, please refer to the previous examples, which will not be repeated here.

[0067] The storage medium may include: read-only memory (ROM), random access memory (RAM), disk or optical disk, etc.

[0068] Since the instructions stored in the storage medium can execute the steps of any method provided in the embodiments of this application, the beneficial effects that any method provided in the embodiments of this application can achieve can be realized. For details, please refer to the previous embodiments, which will not be repeated here.

[0069] The SRAF adding method, apparatus, storage medium, and electronic device provided in this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A method for adding SRAF, characterized in that, include: Obtain the target layer layout, original SRAF, and process design rules; Extract target features from the target layer layout and extract minimum safety spacing from the process design rules; The target feature and the original SRAF are expanded according to the minimum safety distance to form a blocking area; Calculate the difference between the blocked area and the boundary of the target layer layout to obtain several blank areas; Several candidate SRAFs are generated based on the blank area, and the target SRAF is determined from the several candidate SRAFs according to a preset rule; The target SRAF is merged with the candidate SRAF to generate the final SRAF set.

2. The SRAF addition method as described in claim 1, characterized in that, The step of expanding the target feature and the original SRAF according to the minimum safety distance to form a blocking region includes: The buffer distance for expansion is determined based on the minimum safety clearance. Geometric buffering operations are performed on the target feature and the original SRAF according to the buffer distance to form the corresponding expanded polygon; The expanded polygon is preprocessed to generate a blocking region.

3. The SRAF addition method as described in claim 2, characterized in that, The preprocessing of the expanded polygon to generate the blocking region includes: A set of blocking polygons is obtained by performing a union operation on several of the aforementioned expanded polygons. The set of blocking polygons is spliced ​​and deduplicated to generate the blocking region.

4. The SRAF addition method as described in claim 1, characterized in that, The generation of several candidate SRAFs based on the blank region includes: Geometric analysis is performed on several blank regions, and candidate SRAF generation strategies are determined based on the results of the geometric analysis. According to the candidate SRAF generation strategy, preliminary SRAFs are generated in the corresponding blank areas respectively; The initial SRAFs are filtered to generate a number of candidate SRAFs.

5. The SRAF addition method as described in claim 4, characterized in that, The step of determining the candidate SRAF generation strategy based on geometric analysis results includes: When the area of ​​the blank region is larger than the first preset area and has a regular shape, the maximum inscribed rectangle method is used to generate a preliminary SRAF in the blank region. When the area of ​​the blank region is smaller than the second preset area or is irregular in shape, a rasterization method is used to generate a preliminary SRAF within the blank region. When the blank area is in the shape of a narrow channel, a preliminary SRAF is generated within the blank area using a skeleton extraction method.

6. The SRAF addition method as described in claim 4, characterized in that, The step of filtering the preliminary SRAFs to generate a number of candidate SRAFs includes: Size screening is performed on several of the initial SRAFs to remove those with a width smaller than a preset minimum width or a length greater than a preset maximum length, thus obtaining several candidate SRAFs.

7. The SRAF addition method as described in claim 1, characterized in that, The step of determining the target SRAF from a plurality of candidate SRAFs according to a preset rule includes: Priority evaluation is performed on several candidate SRAFs, and candidate SRAFs with priority higher than a preset threshold are selected as candidate sets based on the priority evaluation results. Perform optical simulation or contour simulation on the candidate set; The target SRAF is determined from the candidate set based on the simulation results.

8. An SRAF adding device, characterized in that, include: The acquisition unit is used to acquire the target layer layout, the original SRAF, and the process design rules. An extraction unit is used to extract target features from the target layer layout and extract the minimum safety distance from the process design rules. An expansion unit is used to expand the target feature and the original SRAF according to the minimum safety distance to form a blocking area; The calculation unit is used to calculate the difference between the boundary of the blocking region and the boundary of the target layer layout to obtain several blank regions; The determining unit is used to generate a number of candidate SRAFs based on the blank area, and to determine the target SRAF from the number of candidate SRAFs according to a preset rule; The merging unit is used to merge the target SRAF with the candidate SRAF to generate a final SRAF set.

9. A storage medium, characterized in that, The storage medium stores multiple instructions adapted for loading by a processor to execute the SRAF addition method according to any one of claims 1-7.

10. An electronic device, characterized in that, It includes a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor executes the computer program to implement the SRAF addition method as described in any one of claims 1-7.

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