Hard-to-hard nanoimprint equipment with high-precision alignment capability

Abstract

The invention provides hard-to-hard nanoimprint equipment with high-precision alignment capability, which comprises an alignment vision system, a high-precision carrying table for mounting the alignment vision system and a levelness adjusting support column for the alignment vision system, and the alignment vision system comprises two groups of cameras arranged in a mirror image manner, a Z-axis sliding table, a Y-axis carrying table and an X-axis carrying table are sequentially arranged at the outer end of each group of cameras; a guide rail and a linear motor stator are arranged at the outer end of the X-axis carrying table; the levelness adjusting assembly comprises a force value sensor and a spectrum confocal range finder which are used for measuring and leveling, and the levelness adjusting assembly further comprises a high-flatness chuck suction cup, a template, a substrate, a template chuck suction cup and a template chuck loading module which are sequentially arranged from bottom to top. The problem that true conformal contact cannot be achieved due to the fact that the freedom degree of a movement mechanism is insufficient is solved.

Description

Technical Field

[0001] This invention relates to the field of nanoimprint technology, and more specifically, to a hard nanoimprint device with high-precision alignment capability. Background Technology

[0002] As semiconductor processes advance towards the micro-nano scale, traditional optical lithography technology is gradually facing physical limits. Due to the diffraction effect of light waves, its resolution is limited by the wavelength of the light source (such as deep ultraviolet light and extreme ultraviolet light), making it difficult to meet the process requirements below 5nm. At the same time, lithography machines rely on complex optical systems and lenses, resulting in high equipment costs (such as EUV lithography machines costing hundreds of millions of dollars) and extremely high energy consumption (a single unit consumes more than one megawatt). Subsequently, Professor Zhou Yu of Princeton University proposed nanoimprinting technology, the core principle of which is to achieve pattern transfer through mechanical imprinting rather than optical exposure. Hard-on-hard imprinting is one method of nanoimprinting, its core being the imprinting process where a hard template directly contacts a hard substrate, unlike traditional soft imprinting or photopolymerization processes. Hard-on-hard imprinting technology includes the following key advancements: ① Hard template development: Using rigid materials such as silicon and quartz to create templates, and achieving nanoscale structures through techniques such as electron beam etching; ② Imprinting adhesive optimization: Developing high-hardness, low-adhesion imprinting adhesives to ensure structural integrity during demolding after imprinting; ③ Uniform pressure application technology: Applying uniform pressure through precision mechanical devices to avoid template or substrate damage caused by localized stress; ④ High-precision alignment system: Achieving nanoscale alignment accuracy to meet the requirements of multi-layer pattern stacking; ⑤ Application-driven: 3D NAND and other memory devices require densely repeating structures, and hard-on-hard imprinting technology can efficiently replicate high-density patterns. Optical devices and biomedical applications such as holographic waveguides and microfluidic chips rely on high-precision nanostructures.

[0003] In the prior art, a laser-controlled nanoimprint alignment device and method are disclosed in application number CN2021114148057. The laser-controlled nanoimprint alignment device includes a housing, a first alignment component, a second alignment component, and a detection component disposed within the housing. The first alignment component includes a first alignment plate and a first adjustment structure. The first alignment plate can move in the x, y, and z directions under the action of the first adjustment structure. The second alignment component includes a second alignment plate and a second adjustment structure. The second alignment plate can move in the z direction under the action of the second adjustment structure. The detection component includes an emitter group, a detector group, and a detector array. When the first and second alignment plates are aligned in parallel, the ultraviolet laser beam emitted by the emitter group can sequentially pass through the first alignment plate, the detector, and the second alignment plate, and be received by the detector group. The laser-controlled nanoimprint alignment device of the present invention has high alignment accuracy and high applicability. Application No. CN202510539345.2 discloses an optical alignment system and method for chip mounting. The method includes: acquiring images of the target chip and the target substrate during the mounting process using an upper field-of-view camera positioned above a nozzle assembly and a lower field-of-view camera positioned above a substrate stage; extracting precise coordinates of the chip edge in the target chip image and precise coordinates of the reference mark in the target substrate image; solving for the mounting process compensation parameter matrix of the four-coordinate system of the upper and lower cameras, nozzle, and substrate during the mounting process based on the precise coordinates of the chip edge and the reference mark; calculating the XY-θ three-dimensional alignment compensation vector during the chip mounting process based on the mounting process compensation parameter matrix; and calculating the optimal mounting trajectory parameters and generating an execution instruction sequence based on the XY-θ three-dimensional alignment compensation vector. This method effectively solves the error accumulation problem caused by traditional individual calibration and significantly improves alignment accuracy. Hard-on-hard nanoimprinting requires dynamic leveling during the imprinting process, which is more difficult than photolithography alignment. This is because during the physical bonding process, the marking points on the template and the marking points on the substrate not only deflect in the XY-θ directions, but also shift in the UVW direction of flatness. Therefore, a 6-DOF mechanism is needed to continuously level the marking points during the alignment process. As can be seen from the above solutions, existing alignment mechanisms generally face the following problems: ① The motion axis used for alignment has insufficient degrees of freedom, and can only move in three directions: XYZ or XY-θ, which will lead to insufficient alignment accuracy and uneven distribution of imprinting force. ②Alignment is performed solely based on coordinate parameters without a real-time dynamic adjustment system, resulting in low alignment accuracy; ③ Poor adaptability, unable to meet the compatibility of various templates, substrates and alignment markers; therefore, we have made improvements and proposed a hard-press hard nanoimprinting device with high-precision alignment capability. Summary of the Invention

[0004] The purpose of this invention is to address the problem that the insufficient degrees of freedom of the motion mechanism in current nanoimprint designs prevent the achievement of true conformal contact.

[0005] To achieve the above-mentioned objectives, the present invention provides the following technical solution: A hard-press nanoimprinting device with high-precision alignment capability is proposed to improve the above-mentioned problems.

[0006] The application is as follows: A hard nanoimprinting device with high-precision alignment capability includes: The alignment vision system, the high-precision stage for mounting the alignment vision system, and the horizontal adjustment support column for the alignment vision system are included. The alignment vision system includes two sets of cameras arranged in mirror. Each set of cameras has a Z-axis slide, a Y-axis stage, and an X-axis stage at its outer end. The outer end of the X-axis stage is equipped with a guide rail and a linear motor stator. The leveling adjustment assembly includes a force sensor for measurement and leveling and a spectral confocal rangefinder. The leveling adjustment assembly also includes a high flatness chuck, a template, a substrate, a template chuck, and a template chuck loading module arranged sequentially from bottom to top. A high-precision six-axis motion platform is used in conjunction with a leveling adjustment component to apply pressure evenly and dynamically level the surface.

[0007] Preferably, the upper end of the leveling adjustment component is provided with an ultraviolet lamp and a lamp fixing plate for mounting the ultraviolet lamp. The two ends of the lamp fixing plate are provided with lamp cylinders and slide rails. The lamp cylinders and slide rails together control the forward and backward movement of the lamp fixing plate.

[0008] Preferably, the Z-axis slide, Y-axis stage, and X-axis stage are used to control the camera to move in three directions, and the Z-axis slide, Y-axis stage, and X-axis stage are respectively movably connected to linear motors.

[0009] Preferably, the template and the substrate are located between the template chuck and the high flatness chuck, respectively.

[0010] Compared with the prior art, the beneficial effects of the present invention are as follows: In the scheme of this application: This invention provides a complete six-degree-of-freedom (X, Y, Z, θx, θy, θz) motion capability with a six-axis platform. It can actively compensate for translational and tilting errors in all directions, ensuring that the template and substrate remain parallel before and during imprinting, laying the foundation for uniform pressure application and high-precision alignment. During the imprinting process, a force sensor monitors the pressure distribution in real time, and a spectral confocal sensor monitors the distance between the template and substrate at different positions. Simultaneously, a vision system continuously tracks the marking points. This data is fed back to the control system, which drives the six-axis platform to perform dynamic, real-time fine-tuning, forming a closed-loop feedback. This allows the equipment to continuously "find" the optimal alignment and contact state throughout the imprinting process, rather than completing it all at once. Furthermore, the six-degree-of-freedom adjustment capability and compensation algorithm enable the equipment to adapt to a wider range of template and substrate morphological differences, improving the equipment's process window and versatility. Attached Figure Description

[0011] Figure 1 A schematic diagram of the overall structure of a hard nanoimprinting device with high-precision alignment capability provided in this application; Figure 2Another perspective schematic diagram of the overall structure of a hard-press hard nanoimprint device with high-precision alignment capability provided in this application; Figure 3 An overall rear view of a hard nanoimprinting device with high-precision alignment capability provided for this application; Figure 4 An enlarged structural schematic diagram of the alignment vision system of a hard imprinting and hard nanoimprinting device with high-precision alignment capability provided in this application; Figure 5 A top view of the alignment vision system of a hard nanoimprint device with high-precision alignment capability provided in this application.

[0012] The image shows: 1. Alignment vision system; 11. Guide rail; 12. Linear motor stator; 13. X-axis stage; 14. Y-axis stage; 15. Camera; 16. Z-axis slide; 2. High-precision stage; 3. Support column; 4. Levelness adjustment component; 41. Template chuck loading module; 42. Template chuck suction cup; 43. Template and substrate; 44. High-flatness chuck suction cup; 45. Force sensor; 46. Spectral confocal rangefinder; 5. High-precision six-axis motion platform; 6. Lamp fixing plate; 7. Ultraviolet lamp; 8. Lamp cylinder; 9. Slide rail. Detailed Implementation

[0013] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0014] Therefore, the following detailed description of the embodiments of the present invention is not intended to limit the scope of the claimed invention, but merely to illustrate some embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention. It should be noted that, unless otherwise specified, the embodiments, features, and technical solutions in the embodiments of the present invention can be combined with each other.

[0015] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0016] like Figures 1-5 As shown, this embodiment proposes a hard nanoimprinting device with high-precision alignment capability, comprising: according to Figure 1 and Figure 4 , Figure 5As shown, the alignment vision system 1, the high-precision stage 2 for mounting the alignment vision system 1, and the horizontal adjustment support column 3 for the alignment vision system 1 are included. The alignment vision system 1 includes two sets of cameras 15 arranged in a mirror image. Each set of cameras 15 has a Z-axis slide 16, a Y-axis stage 14, and an X-axis stage 13 arranged sequentially at its outer end. The outer end of the X-axis stage is provided with a guide rail 11 and a linear motor stator 12. The Z-axis slide 16, Y-axis stage 14, and X-axis stage 13 are used to control the camera 15 to move in three directions. The Z-axis slide 16, Y-axis stage 14, and X-axis stage 13 are movably connected to the linear motor.

[0017] The high-precision stage 2 is used to fix and align the vision system 1, providing stable support and ensuring the rigidity and stability of the system during movement; the support column 3 has a height adjustment function, which is used to initially adjust the level of the vision system.

[0018] Guide rail 11 serves a guiding function. Figure 2 The stator 12 of the linear motor is used to drive the linear motor. Figure 2 The X-axis stage 13, Y-axis stage 14, and Z-axis slide 16 are controlled via the X, Y, and Z axes, respectively. Figure 2 The camera 15 moves in three directions to achieve three-dimensional precision movement. The camera 15 is a high-resolution CCD camera. The two sets of cameras 15 have a left-right symmetrical structure. High-precision linear motors and high-precision slides ensure high alignment accuracy.

[0019] Figures 2-3 The leveling adjustment component 4 shown includes a force sensor 45 for measurement and leveling and a spectral confocal rangefinder 46. The leveling adjustment component 4 also includes a high flatness chuck 44, a template and substrate 43, a template chuck 42 and a template chuck loading module 41 arranged from bottom to top. The template and substrate 43 are located between the template chuck 42 and the high flatness chuck 44, respectively. Force sensor 45 and spectral confocal rangefinder 46 are used to monitor pressure distribution and spacing changes in real time during the imprinting process; Furthermore, the template and the substrate are fixed by two chucks and suction cups, respectively, to ensure stable contact during the imprinting process.

[0020] A high-precision six-axis motion platform 5 is used in conjunction with the leveling adjustment component 4 to apply pressure evenly and dynamically level the surface.

[0021] The high-precision six-axis motion platform 5 has six degrees of freedom of motion: X, Y, Z, θ (rotation), U, and V (tilt). It is used to achieve dynamic leveling and uniform pressure during the imprinting process, avoiding uneven imprinting force distribution caused by flatness deviation.

[0022] The upper end of the leveling adjustment component 4 is provided with an ultraviolet lamp 7 and a lamp fixing plate 6 for mounting the ultraviolet lamp 7. The two ends of the lamp fixing plate 6 are provided with lamp cylinders 8 and slide rails 9. The lamp cylinders 8 and slide rails 9 together control the forward and backward movement of the lamp fixing plate 6. The ultraviolet lamp 7 achieves forward and backward movement through the cylinders and slide rails 9, which facilitates the exposure operation after the printing is completed, and avoids interference with the alignment process.

[0023] The workflow is as follows: (a) Install the template with the anti-adhesion layer onto the template chuck suction cup 42 and fix it. Place the substrate coated with imprinting adhesive onto the high flatness chuck suction cup 44. Start the equipment and the six-axis motion platform will initially rise to the preset height. (ii) Alignment stage: The six-axis platform descends, and the Z-axis slide 16 moves the camera 15 down to the optimal focusing distance. The camera 15 captures the alignment marks on the template and the substrate, identifies their coordinates through image processing algorithms, and records the position data of each axis (X, Y, Z, θ, U, V) at this time. If a positional deviation is found, the six-axis platform is used for real-time compensation and adjustment to ensure that the template and the substrate are completely aligned. (III) Imprinting and leveling stage: The six-axis platform slowly rises, so that the template and the substrate gradually come into contact. The force sensor 45 and the spectral confocal distance meter 46 monitor the pressure and spacing changes in real time and feed them back to the control system. The system dynamically adjusts each degree of freedom through the six-axis platform to ensure that the imprinting force is evenly distributed and avoid structural damage. After the imprinting is completed, the pressure is maintained for ultraviolet exposure to cure the imprinting adhesive. (iv) Demolding and resetting: After exposure, the six-axis platform descends, the vision system avoids it, and the UV lamp 7 advances for exposure (if necessary). After exposure, the template and substrate are separated, and the six-axis platform is reset to the initial position. If multiple imprints or multi-layer pattern superposition are required, the above alignment and imprinting process is repeated, and each time the alignment is compensated based on historical data.

[0024] In actual use, the control system and vision control system adopted are both well-known existing technologies. In specific use, technical personnel in related fields can adjust the specific system content according to needs and the openness of the system.

[0025] In practical use, during alignment, the six-axis motion mechanism is first lowered. A template with a pre-applied anti-adhesion layer is placed on the template chuck above and fixed. Then, the substrate coated with imprinting adhesive is placed on the six-axis motion platform directly below the template. After leveling the six-axis mechanism, it moves upward, and the Z-axis slide 16 lowers the camera 15 to its focal point, entering the optimal measurement distance for the alignment camera 15. Within this range, the measurement accuracy of the alignment camera 15 is greatly improved. Combined with the pre-adjusted optimal light source position, after finding the alignment mark points of the structure, the positions of the X-axis, Y-axis, Z-axis, θ-axis, and six-axis motion mechanism are saved and recorded. The six-axis motion mechanism is then moved upward, and the bonding process is dynamically leveled using a spectral confocal rangefinder 46 and a force feedback leveling module. During this process, the optical system continuously acquires the mark points on the template and substrate for dynamic alignment until the imprinting is completely finished. Then, the vision system performs avoidance maneuvers, completes exposure and other operations, and the entire imprinting process is completed, returning to the original six-axis platform.

[0026] When repeated imprinting or multi-layer graphic overlay is required, the six-axis motion mechanism is moved up to the position of the first alignment record and the camera 15 is lowered to the optimal focusing position. Then, the X and Y axes are moved to find the alignment mark points of the structure again. At this time, there will be a slight deviation from the position of the mark points found the first time. The difference between the X, Y and θ axes between the alignment points of the structure is calculated by the field of view of the camera 15 and the algorithm of the host computer, and fed back to the host computer. The host computer issues instructions to the six-axis motion mechanism to move to the compensated position and perform a series of operations such as imprinting, pressing, holding pressure, and exposure. Under the harsh physical contact conditions of hard-on-hard, nanoscale alignment accuracy is achieved and maintained. Its core lies in the deep integration of multi-degree-of-freedom mechanical platform, real-time feedback from multiple sensors and intelligent control algorithms, thereby breaking through the limitations of traditional design.

[0027] The above embodiments are only used to illustrate the present invention and are not intended to limit the technical solutions described herein. Although the present invention has been described in detail with reference to the above embodiments, the present invention is not limited to the specific embodiments described above. Therefore, any modifications or equivalent substitutions to the present invention, as well as all technical solutions and improvements that do not depart from the spirit and scope of the invention, are covered within the scope of the claims of the present invention.

Claims

1. A hard-press nanoimprinting device with high-precision alignment capability, characterized in that, include: The alignment vision system (1), the high-precision stage (2) for mounting the alignment vision system (1), and the level adjustment support column (3) for the alignment vision system (1) are provided. The alignment vision system (1) includes two sets of cameras (15) arranged in a mirror image. Each set of cameras (15) has a Z-axis slide (16), a Y-axis stage (14), and an X-axis stage (13) arranged sequentially at its outer end. The outer end of the X-axis stage is provided with a guide rail (11) and a linear motor stator (12). The leveling adjustment component (4) includes a force sensor (45) for measurement and leveling and a spectral confocal distance meter (46). The leveling adjustment component (4) also includes a high flatness chuck chuck (44), a template and substrate (43), a template chuck chuck (42) and a template chuck loading module (41) arranged from bottom to top. A high-precision six-axis motion platform (5) is used in conjunction with a leveling adjustment component (4) to apply pressure evenly and dynamically level the surface.

2. The hard imprinting and hard nanoimprinting equipment with high-precision alignment capability according to claim 1, characterized in that, The upper end of the leveling adjustment component (4) is provided with an ultraviolet lamp (7) and a lamp fixing plate (6) for mounting the ultraviolet lamp (7). The two ends of the lamp fixing plate (6) are provided with lamp cylinders (8) and slide rails (9). The lamp cylinders (8) and slide rails (9) together control the forward and backward movement of the lamp fixing plate (6).

3. The hard imprinting and hard nanoimprinting equipment with high-precision alignment capability according to claim 1, characterized in that, The Z-axis slide (16), Y-axis stage (14) and X-axis stage (13) are used to control the camera (15) to move in three directions. The Z-axis slide (16), Y-axis stage (14) and X-axis stage (13) are respectively connected to the linear motor.

4. The hard imprinting and hard nanoimprinting equipment with high-precision alignment capability according to claim 1, characterized in that, The template and the substrate (43) are located between the template chuck suction cup (42) and the high flatness chuck suction cup (44), respectively.

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