Wide insertion angle process carrier

Abstract

The process carrier includes slots defined by teeth. The slots are each configured to receive a substrate, and each of the slots has a slot angle in a range of 47 DEG to 76 DEG. The teeth may extend to half or less than half the height of the process carrier. The teeth may be configured to at least separate a thickness of a disk or wafer received in the slot. The teeth may be configured to position a center of the substrate toward a tooth end of the process carrier relative to a height direction of the first sidewall and the second sidewall when the substrate is located in one of the plurality of slots.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to process carriers for one or more substrates, in particular, the carriers have a tooth profile that provides a wide insertion angle for the substrates.

[0002] CLAIM

[0003] The present disclosure claims priority to and the benefit of U.S. Provisional Patent No. 63 / 452,917, having an application date of March 17, 2023, which is incorporated herein by reference. BACKGROUND

[0004] Process carriers can be used to store and carry substrates, such as disks, during processing. The substrates can be susceptible to contamination, such as particles generated by the disks rubbing against portions of the process carrier. SUMMARY

[0005] The present disclosure relates to process carriers for one or more substrates, in particular, the carriers have a tooth profile that provides a wide insertion angle for the substrates.

[0006] By reducing the length of the teeth used to define the slots in the process carrier and increasing their insertion angle, the amount of contact between the contained substrates and the process carrier can be reduced. The teeth are sized and shaped such that the tilting of the disks is controlled within acceptable bounds. This can reduce the generation of particles from the process carrier and improve process yields. The increased insertion angle can further allow the process carrier to be used with a wider range of automation and reduce the precision required to automate handling the process carrier or inserting or removing substrates from the process carrier. The shape and position of the teeth can be further modified relative to the size of the substrates to be accommodated to reduce instances of disks getting stuck within their respective slots.

[0007] In an embodiment, a process carrier includes a first sidewall including a first plurality of teeth and a second sidewall including a second plurality of teeth. The second sidewall is opposite the first sidewall. Corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots. Each slot of the plurality of slots is configured to receive a substrate. A slot angle of each slot is in a range of 47° to 76°.

[0008] In an embodiment, the first plurality of teeth extends along a height direction of the first sidewall for half or less of the height direction of the first sidewall, and the second plurality of teeth extends along a height direction of the second sidewall for half or less of the height direction of the second sidewall.

[0009] In an embodiment, teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least the thickness of the substrate.

[0010] In an embodiment, the teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

[0011] In an embodiment, a slot angle of each slot is in a range of 50° to 54°.

[0012] In an embodiment, a process carrier includes a first sidewall including a first plurality of teeth and a second sidewall including a second plurality of teeth. The second sidewall is opposite the first sidewall. The first plurality of teeth extends along a height direction of the first sidewall by one-half or less of the height direction of the first sidewall, and the second plurality of teeth extends along a height direction of the second sidewall by one-half or less of the height direction of the second sidewall.

[0013] In an embodiment, corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots, each slot of the plurality of slots is configured to receive a substrate. A slot angle of each slot is in a range of 47° to 76°. In an embodiment, a slot angle of each slot is in a range of 50° to 54°.

[0014] In an embodiment, teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least the thickness of the substrate.

[0015] In an embodiment, the teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

[0016] In an embodiment, a method includes inserting a substrate into a slot configured to accommodate a substrate. The slot is defined in a process carrier. The process carrier includes a first sidewall including a first plurality of teeth and a second sidewall including a second plurality of teeth. The second sidewall is opposite the first sidewall. Corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots. Each slot of the plurality of slots is configured to receive a substrate. A slot angle of each slot is in a range of 47° to 76°.

[0017] In an embodiment, the substrate is inserted into the slot using an automated substrate handler.

[0018] In an embodiment, the method further includes removing the substrate from the slot using an automated substrate handler.

[0019] In an embodiment, the first plurality of teeth extends along a height direction of the first sidewall by one-half or less of the height direction of the first sidewall, and the second plurality of teeth extends along a height direction of the second sidewall by one-half or less of the height direction of the second sidewall.

[0020] In an embodiment, the teeth in the first plurality of teeth are at least spaced apart by the thickness of the substrate, and the teeth in the second plurality of teeth are at least spaced apart by the thickness of the substrate.

[0021] In an embodiment, each of the first plurality of teeth and the second plurality of teeth includes a first side, a second side, and a tip between the first side and the second side.

[0022] In one embodiment, when the substrate is located in one of the plurality of trenches, the center of the substrate is positioned relative to the height direction of the first sidewall and the second sidewall toward the toothed end of the process carrier. Attached Figure Description

[0023] Figure 1 A process carrier according to an embodiment is shown.

[0024] Figure 2 A cross-sectional view of the teeth of a process carrier according to an embodiment is shown.

[0025] Figure 3 A cross-sectional view of a process carrier and a wafer contained in the process carrier according to an embodiment is shown. Detailed Implementation

[0026] This disclosure relates to a process carrier for one or more disks, specifically, said carrier having a tooth profile that provides a wide insertion angle for the disks.

[0027] As used herein, a "tooth" is defined as a protrusion from the inner surface of a process carrier, configured to support and / or retain a substrate within the process carrier. Multiple teeth may be disposed on each of two opposing inner surfaces of the process carrier. Teeth may be spaced apart by gaps.

[0028] As used herein, a "groove" is defined as a feature of a process carrier configured to receive a substrate. The groove may be defined by the opposing sidewalls of each of a first pair of two adjacent teeth and a corresponding second pair of two adjacent teeth disposed on opposing inner surfaces of the process carrier.

[0029] As used herein, a “groove angle” is the angle formed between the opposing sidewalls of each pair of adjacent teeth that define a groove. One or both opposing sidewalls contain curves, such as concave or convex portions, and for the corresponding sidewall containing said curves, the groove angle may be defined relative to a plane extending from the base of the tooth to the tip of the tooth.

[0030] As used herein, the "insertion angle" of a groove is the maximum deviation relative to the groove axis under which the substrate can still be successfully inserted into the groove. When the opposing sidewalls defining the groove are mirror images of each other, the insertion angle can be half the groove angle.

[0031] Figure 1 A process carrier according to an embodiment is shown. Process carrier 100 includes a first end wall 102, a second end wall 104, a first side wall 106, and a second side wall 108. Each of the first side wall 106 and the second side wall 108 includes a plurality of teeth 110. The teeth 110 are distributed on the first side wall 106 and the second side wall 108 to define slots 112. Corresponding slots 112 on the first side wall 106 and the second side wall 108 are aligned such that corresponding slots 112 can each receive a substrate 114.

[0032] Process carrier 100 can be a process carrier configured to hold one or more substrates 114, for example, during storage, transport, and / or processing of the substrates 114. Process carrier 100 can be formed as a monolithic piece or assembled from multiple component pieces. Process carrier 100 can be made of any suitable material. For example, process carrier 100 can include a polyether ether ketone (PEEK) material. In embodiments, the surfaces of process carrier 100 that contact substrates 114 during use can be formed of a PEEK material. In embodiments, process carrier 100 is composed entirely of a PEEK material.

[0033] First end wall 102 and second end wall 104 define opposite ends of process carrier 100, respectively. First side wall 106 extends from first end wall 102 to second end wall 104. Second side wall 108 also extends from first end wall 102 to second end wall 104. First end wall 102, second end wall 104, first side wall 106, and second side wall 108 define a space capable of holding one or more substrates 114.

[0034] The plurality of teeth 110 extend inward from each of the first side wall 106 and the second side wall 108 into an interior space defined by the first end wall 102, the second end wall 104, the first side wall 106, and the second side wall 108. The teeth can extend along a height direction of the first side wall 106 and / or the second side wall 108. The teeth 110 distributed along the first side wall 106 and the second side wall 108, respectively, can extend a height that is one-half or less of a height of the process carrier 100 in a height direction of the process carrier 100. The teeth 110 can be disposed on a portion of the first side wall 106 or the second side wall 108 that is at or below one-half of a respective height of the first side wall 106 or the second side wall 108. In embodiments, each tooth 110 extends outward from a respective first side wall 106 or second side wall 108 on which the tooth 110 is disposed by 0.185 ± 0.015 inches to 0.225 ± 0.015 inches (0.470 ± 0.038 cm to 0.572 ± 0.038 cm). The portion of the first side wall 106 and the second side wall 108 from which the teeth 110 extend can be defined as a tooth end of the process carrier 100. Each tooth 110 can include a first wall, a tip, and a second wall, for example, first side wall 204, tip 206, and second side wall 208, as described below and as shown inFigure 2 The first and second sidewalls can be straight or can be curved, such as having a concavity or a convexity when extending from the respective sidewall 106 or 108 to the tip. The tip can be flat or rounded. In embodiments, the tip is flat with each of the transitions from the tip to the first and second walls being rounded. In embodiments, the teeth 110 are distributed along the first sidewall 204 and the second sidewall 206 such that the individual pitch of each tooth 110 is 0.250 ± 0.002 inches (0.635 ± 0.005 cm) and the total pitch of the region containing the teeth 100 is 6.000 ± 0.015 inches (15.240 ± 0.038 cm). The opposing first and second walls of two adjacent teeth 110 form an opening of one of the slots 112.

[0035] The slots 112 are defined between adjacent teeth 110 along one of the first sidewalls 106 or the second sidewalls 108. Each pair of corresponding slots 112 on each of the first sidewalls 106 and the second sidewalls 108 can provide a support structure for one substrate 114. The slots 112 can be defined such that the adjacent teeth 110 forming the slots 112 are spaced apart by an amount equal to or greater than a thickness of the substrate 114 that the slots 112 are configured to accommodate. A slot angle of each slot 112 is in a range of 47° to 76°. The slot angle can be defined with respect to a plane extending from a base of the tooth 110 to a tip of the tooth 110, where the sidewalls include curves, such as concave or convex portions. In embodiments, the slot angle is in a range of 50° to 54°. In embodiments, each slot 112 has an insertion angle of 23.5° to 38°. The insertion angle is a maximum angle between the substrate 114 and a height direction of the process carrier 100 at which the substrate 114 can be successfully inserted into the slot 112. In embodiments, the insertion angle can be in a range of 25° to 27°. For example, when the opposing sidewalls defining the slot 112 are mirror images of each other, the insertion angle can be equal to half of the slot angle. The insertion angle of the slot 112 can allow successful insertion even when there are misalignments of the substrate, errors in operation or positioning of automation handling such substrates, and the like. The insertion angle can allow the use of a process carrier 100 with lower automation precision to load and unload the substrate 114 from the process carrier 100. The slot angle and the insertion angle of the process carrier 100 can further reduce the risk of damaging the substrate 114 and / or generating particles from the process carrier 100 during loading and unloading. The slot angle and the insertion angle of the slots 112 of the process carrier 100 can support successful insertion and seating of the substrate 114 within the slots 112 without requiring a lead-in portion on the teeth 110. Since a lead-in can not be required, the teeth 110 can be shorter along the height direction of the process carrier 100, reducing a surface area of the teeth 110 that can contact the substrate 114, and thus reducing an area where friction between the teeth 110 and the substrate 114 can occur. In embodiments, the teeth 110 are distributed such that an individual pitch of each tooth 110 is 0.250 ± 0.002 inches (0.635 ± 0.005 cm), and a total pitch of a region containing the teeth 100 is 6.000 ± 0.015 inches (15.240 ± 0.038 cm).

[0036] The substrate 114 can be, for example, a disk for a hard disk drive, a wafer, or any other suitable substrate contained in the process carrier 100. The substrate 114 can have a circular shape. The process carrier 100 is configured to accommodate one or more substrates 114. The process carrier 100 is sized such that the one or more substrates 114 can be held in a slot 112 bounded by at least some of the teeth 110 disposed along the first sidewall 106 and the second sidewall 108. The number of opposing slots 112 disposed by respective teeth 110 disposed on the first sidewall 106 and the second sidewall 108 can correspond to the number of substrates 114 that can be contained within the process carrier 100.

[0037] Figure 2 A cross-sectional view of a tooth of a process carrier according to an embodiment is shown. The tooth 200 can be used as the teeth 110 disposed in the process carrier 100, as Figure 1 shown and as described above. Each tooth 200 includes a first side base 202, a first sidewall 204, a tip 206, a second sidewall 208, and a second side base 210. Adjacent teeth 200 are separated by a gap 212.

[0038] The first side base 202 is where the tooth emerges from the sidewall of the process carrier on the first side that includes the tooth 200. The first side base 202 can extend perpendicular to the surface of the sidewall of the process carrier. The first sidewall 204 extends between the first side base 202 and the tip 206. In an embodiment, the first sidewall 204 extends straight from the first side base 202 to the tip 206. In an embodiment, the first sidewall 204 can have a concavity or a convexity as it extends from the first side base 202 to the tip 206.

[0039] The tip 206 forms the most distal portion of the wall of the process carrier on which the tooth 200 is disposed. The tip 206 separates the first side and the second side of the tooth 200. The tip 206 can be flat or rounded. In embodiments, the tip 206 can have a height between 0.185 ± 0.015 inches to 0.225 ± 0.015 inches (0.470 ± 0.038 cm to 0.572 ± 0.038 cm) from the sidewall of the process carrier on which the tooth 200 is disposed. The width of the tip 206 can be any suitable width to provide the slot angle and the insertion angle desired by the slot defined by the adjacent tooth 200. In embodiments, the width of the tip can be selected based at least in part on manufacturability, such as limitations on molding. In embodiments, the tip 206 can have a width in a range of 0.015 inches to 0.054 inches (0.038 cm to 0.137 cm). In embodiments, the width of the tip 206 can be selected relative to the width of the tooth from the first side base 202 to the second side base 210 such that the first side wall 204 and the second side wall 208 provide a slot angle SA in a range of 47° to 76° and an insertion angle IA in a range of 23.5° to 38°. In cases where the first side wall 204 and / or the second side wall 208 of an adjacent tooth 200 define a slot that includes concavity or convexity, the insertion angle and / or the slot angle can be determined from a straight line from the first side base 202 to the tip 206. In embodiments, the slot defined by the first side wall 204 and the second side wall 208 of an adjacent tooth 200 can define a slot angle SA in a range of 50° to 54° and an insertion angle IA in a range of 25° to 27°.

[0040] The second side wall 208 extends between the tip 206 and the second side base 210. In embodiments, the second side wall 208 extends straight from the tip 206 to the second side base 210. In embodiments, the first side wall 204 can have concavity or convexity as it extends from the tip 206 to the second side base 210. The second side base 210 is where the tooth emerges from the sidewall of the process carrier including the second side of the tooth 200. The width of the tooth 200 can be defined by the distance from the first side base 202 to the second side base 210.

[0041] The gap 212 is the space formed on the sidewall of the process carrier between the respective bases 202, 210 of adjacent teeth 200, such first side wall 106 or second side wall 108 of the process carrier 100 as described above and as shown in FIG. 1. The gap 212 can be sized such that the distance between adjacent teeth 200 is equal to or greater than the thickness of a substrate that the teeth 200 are configured to receive, such as described above and as shown in FIG. 1. Figure 1 Figure 1 ​The gap 212 can be sized such that when the substrate is positioned in the slot bounded by two adjacent teeth 200, the center of the substrate is positioned relative to the height direction of the first and second sidewalls toward the tooth end of the process carrier. In embodiments, the width of the gap 212 can be 0.021 ± 0.003 inches (0.053 ± 0.0076 cm).

[0042] Figure 3 A cross-sectional view of a process carrier and a substrate contained in the process carrier according to embodiments is shown. The process carrier 300 includes a first sidewall 302 and a second sidewall 304. The process carrier 300 contains a substrate 306. The substrate 306 is shown as being positioned entirely within the process carrier 300, fully inserted into a slot bounded by teeth disposed in the process carrier 300, such as described above and in Figure 1 The teeth 110 that bound the slot 112 are shown in FIG. 1. The substrate 306 has a center point 308. When the substrate 302 is positioned entirely in the slot of the process carrier 300, the center point 308 is positioned relative to the height direction of the first and second sidewalls toward the tooth end of the process carrier. The center point 308 is positioned at or below a centerline C that extends across the process carrier 300 at half the height H of the process carrier 300. The positioning of the substrate 306 such that the center point 308 is below the centerline can, for example, reduce the risk of the substrate 306 getting stuck within the process carrier 300. The process carrier 300 provides increased clearance for the widest portion of the substrate 306, and the teeth of the process carrier also provide clearance for portions of the profile of the substrate 306 at the teeth. The increased clearance can reduce the likelihood of the substrate 306 being pinched by the process carrier 300 and thus getting stuck within the process carrier 300 during insertion or removal of the substrate 306.

[0043] ASPECT:

[0044] It is to be understood that any of aspects 1-5 can be combined with any of aspects 6-10 or 11-17. It is to be understood that any of aspects 6-10 can be combined with any of aspects 11-17.

[0045] Aspect 1. A process carrier, comprising:

[0046] a first sidewall including a first plurality of teeth; and

[0047] a second sidewall including a second plurality of teeth, the second sidewall opposite the first sidewall;

[0048] wherein corresponding teeth of the first plurality of teeth and the second plurality of teeth bound a plurality of slots, each slot of the plurality of slots configured to receive a substrate, a slot angle of each slot being in a range of 47° to 76°.

[0049] Aspect 2. The process carrier of aspect 1, wherein the first plurality of teeth extend along a height direction of the first sidewall by one-half or less of the height direction of the first sidewall, and the second plurality of teeth extend along a height direction of the second sidewall by one-half or less of the height direction of the second sidewall.

[0050] Aspect 3. The process carrier of any of aspects 1-2, wherein teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least a thickness of the substrate.

[0051] Aspect 4. The process carrier of any of aspects 1-3, wherein teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

[0052] Aspect 5. The process carrier of any of aspects 1-4, wherein a slot angle of each slot is in a range of 50° to 54°.

[0053] Aspect 6. A process carrier comprising:

[0054] a first sidewall including a first plurality of teeth; and

[0055] a second sidewall including a second plurality of teeth, the second sidewall opposite the first sidewall;

[0056] wherein the first plurality of teeth extend along a height direction of the first sidewall by one-half or less of the height direction of the first sidewall, and the second plurality of teeth extend along a height direction of the second sidewall by one-half or less of the height direction of the second sidewall.

[0057] Aspect 7. The process carrier of aspect 6, wherein corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots, each slot of the plurality of slots configured to receive a substrate, a slot angle of each slot being in a range of 47° to 76°.

[0058] Aspect 8. The process carrier of aspect 7, wherein a slot angle of each slot is in a range of 50° to 54°.

[0059] Aspect 9. The process carrier of any of aspects 6-8, wherein teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least a thickness of the substrate.

[0060] Aspect 10. The process carrier of any one of aspects 6-9, wherein the teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

[0061] Aspect 11. A method comprising inserting a substrate into a slot configured to accommodate the substrate, wherein the slot is defined in a process carrier, the process carrier comprising:

[0062] a first sidewall including a first plurality of teeth; and

[0063] a second sidewall including a second plurality of teeth, the second sidewall opposite the first sidewall;

[0064] wherein corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots, each slot of the plurality of slots configured to receive a substrate, a slot angle of each slot being in a range of 47° to 76°.

[0065] Aspect 12. The method of aspect 11, wherein the substrate is inserted into the slot using an automated substrate handler.

[0066] Aspect 13. The method of any one of aspects 11-12, further comprising removing a substrate from a slot using an automated substrate handler.

[0067] Aspect 14. The method of any one of aspects 11-13, wherein the first plurality of teeth extend along a height direction of the first sidewall for one-half or less of the height direction of the first sidewall, and the second plurality of teeth extend along a height direction of the second sidewall for one-half or less of the height direction of the second sidewall.

[0068] Aspect 15. The method of any one of aspects 11-14, wherein teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least a thickness of the substrate.

[0069] Aspect 16. The method of any one of aspects 11-15, wherein the teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

[0070] Aspect 17. The method of any one of aspects 11-16, wherein a center of a substrate is positioned toward a teeth end of the process carrier relative to height directions of the first sidewall and the second sidewall when the substrate is positioned in one of the plurality of slots.

[0071] The examples disclosed in this application are to be considered in all respects as illustrative and not restrictive. The scope of the application is indicated by the appended claims rather than by the foregoing description; all changes that come within the meaning and range of equivalents of the claims are intended to be embraced therein.

Claims

1. A process carrier comprising: a first sidewall including a first plurality of teeth; and a second sidewall including a second plurality of teeth, the second sidewall opposite the first sidewall; wherein corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots, each slot of the plurality of slots configured to receive a substrate, a slot angle of each of the slots being in a range of 47° to 76°.

2. The process carrier of claim 1, wherein the first plurality of teeth extend along a height direction of the first sidewall for one-half or less of the height direction of the first sidewall, and the second plurality of teeth extend along a height direction of the second sidewall for one-half or less of the height direction of the second sidewall.

3. The process carrier of claim 1, wherein teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least the thickness of the substrate.

4. The process carrier of claim 1, wherein teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

5. The process carrier of claim 1, wherein a slot angle of each of the slots is in a range of 50° to 54°.

6. A process carrier comprising: a first sidewall including a first plurality of teeth; and a second sidewall including a second plurality of teeth, the second sidewall opposite the first sidewall; wherein the first plurality of teeth extend along a height direction of the first sidewall for one-half or less of the height direction of the first sidewall, and the second plurality of teeth extend along a height direction of the second sidewall for one-half or less of the height direction of the second sidewall.

7. The process carrier of claim 6, wherein corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots, each slot of the plurality of slots configured to receive a substrate, a slot angle of each of the slots being in a range of 47° to 76°.

8. The process carrier of claim 7, wherein a slot angle of each of the slots is in a range of 50° to 54°.

9. The process carrier of claim 6, wherein teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least the thickness of the substrate.

10. The process carrier of claim 6, wherein teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

11. A method comprising inserting a substrate into a slot configured to accommodate the substrate, wherein the slot is defined in a process carrier, the process carrier comprising: a first sidewall including a first plurality of teeth; and a second sidewall including a second plurality of teeth, the second sidewall opposite the first sidewall; wherein corresponding teeth of the first plurality of teeth and the second plurality of teeth define a plurality of slots, each slot of the plurality of slots is configured to receive a substrate, a slot angle of each of the slots is in a range of 47° to 76°.

12. The method of claim 11, wherein the substrate is inserted into the slot using an automated substrate handler.

13. The method of claim 11, further comprising removing the substrate from the slot using an automated substrate handler.

14. The method of claim 11, wherein the first plurality of teeth extend along a height direction of the first sidewall for one-half or less of the height direction of the first sidewall, and the second plurality of teeth extend along a height direction of the second sidewall for one-half or less of the height direction of the second sidewall.

15. The method of claim 11, wherein teeth of the first plurality of teeth are spaced apart by at least a thickness of the substrate, and teeth of the second plurality of teeth are spaced apart by at least the thickness of the substrate.

16. The method of claim 11, wherein teeth of each of the first plurality of teeth and the second plurality of teeth each include a first side, a second side, and a tip between the first side and the second side.

17. The method of claim 11, wherein when the substrate is positioned in one of the plurality of slots, a center of the substrate is positioned toward a teeth end of the process carrier relative to height directions of the first sidewall and the second sidewall.

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