Circulating liquid supply pipeline system of solid-liquid mixed type polishing liquid and polishing liquid filtering equipment

Abstract

The invention relates to a circulating liquid supply pipeline system for solid-liquid mixed type polishing liquid and polishing liquid filtering equipment. The pipeline system comprises a main liquid supply pipe, a branch liquid supply pipe, a main liquid return pipe, a branch liquid return pipe, a liquid supply return pipe, a stirring tank and continuous operation type filtering equipment. The pipeline system solves the problems of liquid sedimentation and pipeline blockage through a liquid supply backflow structure and pipeline underneath layout, and backflow liquid pretreatment is achieved by arranging a stirring tank. In order to adapt to the continuous liquid return characteristic, centrifugal filtering equipment is adopted in a matched mode, and non-stop filtering and synchronous slag removal are achieved. And meanwhile, in order to avoid liquid supply interruption caused by backwashing operation, a buffer water tank and a liquid return pump are arranged beside the liquid using equipment to form an on-ground liquid supply system, so that the filtering stability and the liquid supply continuity are improved. The system is suitable for various solid-containing industrial liquid scenes, and has the advantages of compact structure, continuous operation, high efficiency and the like.

Description

Technical Field

[0001] This invention relates to the field of polishing slurry supply and recovery technology, specifically to a circulating supply pipeline system for a solid-liquid mixed polishing slurry and a polishing slurry filtration device. Background Technology

[0002] Polishing slurries are commonly used processing media in various precision machining industries, and are widely used in the surface treatment of materials such as metals, glass, ceramics, and semiconductors. These liquids are usually in a solid-liquid mixture state, containing a certain proportion of polishing particles, and are used to effectively grind the surface of the workpiece during the processing.

[0003] To improve the efficiency and management convenience of polishing slurry, modern factories typically employ centralized slurry supply systems. These systems connect multiple processing devices via a main supply pipe, enabling unified supply, filtration, and recycling, forming a closed-loop system for continuous use. However, during operation, it has been observed that solid deposits can form in the pipelines, clogging valves or branch pipes, especially noticeable when fluid flow is impeded in specific sections or when equipment is shut down for extended periods.

[0004] On the other hand, the filtration devices used in existing wastewater return systems are mostly intermittent filtration structures, which require pausing the filtration process and performing self-cleaning after a certain operating cycle. During this period, no new wastewater can be accepted. Therefore, existing systems generally include a transfer tank as a temporary storage container for wastewater before it enters the filtration equipment. Wastewater discharged from the processing equipment first flows into the transfer tank, and is then extracted and processed from it after the filtration equipment resumes operation, thus adapting to the intermittent filtration method.

[0005] However, this type of transfer structure not only increases the system size and complexity, but also makes it prone to sedimentation and deterioration during waste liquid retention, affecting subsequent treatment results. Therefore, there is an urgent need to propose a new system design scheme that simplifies the liquid path structure, avoids transfer links, and improves the overall efficiency and reliability of the polishing fluid management system while ensuring continuous liquid supply and continuous filtration capabilities. Summary of the Invention

[0006] To address the aforementioned deficiencies or defects in the prior art, the present invention first provides a circulating supply pipeline system for a solid-liquid hybrid polishing slurry, the pipeline system comprising:

[0007] The main liquid supply pipe is connected to the liquid supply equipment at its inlet, and multiple branch liquid supply pipes are connected to the main liquid supply pipe.

[0008] The branch supply pipe connects the main supply pipe and the liquid-using equipment from bottom to top, and is used to deliver polishing liquid from the supply equipment to each liquid-using equipment.

[0009] The main return pipe connects to multiple branch return pipes, and the outlet at the end of the main return pipe is connected to the filtration equipment.

[0010] The branch return pipe connects each liquid-using device to the main return pipe from top to bottom;

[0011] The liquid supply return pipe connects the end of the main liquid supply pipe to the beginning of the main liquid return pipe, and is used to return the polishing liquid that has not been consumed in the main liquid supply pipe back to the main liquid return pipe.

[0012] The backwash inlet is located at the inlet of the main liquid supply pipe and is used to introduce backwash liquid.

[0013] The backwash outlet is located at the end of the main return pipe and is used to discharge backwash liquid.

[0014] In some embodiments, the piping system further includes:

[0015] The first three-way valve is located at the end of the main return pipe. Its inlet is connected to the main return pipe, and its outlet is connected to the filter equipment and the backwash outlet, respectively. It is used to control the flow of liquid to the filter equipment or the backwash outlet.

[0016] In some embodiments, the main liquid supply pipe is positioned at a low position; the bottom of the branch liquid supply pipe is connected to the main liquid supply pipe, and the branch liquid supply pipe is configured to allow upward flow of liquid.

[0017] In some embodiments, each of the liquid-using devices is provided with a buffer water tank and a return pump. The inlet of the return pump is connected to the buffer water tank, and the outlet of the return pump is connected to the main return pipe and the liquid inlet of the liquid-using device respectively through a second three-way valve, for providing temporary liquid supply to the liquid-using device during backwashing.

[0018] In some embodiments, the branch return pipe has an inverted U-shaped structure, and the second three-way valve is located at the top of the branch return pipe; the branch return pipe in front of the second three-way valve is arranged from bottom to top, with the inlet end connected to the return pump; the rear section is arranged from top to bottom, with the outlet end connected to the main return pipe.

[0019] In some embodiments, a closed stirring tank is also included, which is located at the lowest point of the piping system; the stirring tank is connected to the end of the main return pipe for receiving return liquid; the stirring tank is connected to the inlet of the filtration device via a connecting pipe for conveying the liquid in the tank to the filtration device.

[0020] The mixing tank is equipped with a magnetic stirrer, with a magnetic stirring rod disposed inside the tank. An external variable magnetic field structure is provided outside the tank to drive the magnetic stirring rod to rotate.

[0021] or,

[0022] The mixing tank is equipped with an impeller inside and a drive motor outside; the drive motor drives the impeller to rotate through a drive shaft that extends into the mixing tank.

[0023] The present invention also provides a polishing fluid filtration device suitable for the pipeline system described above, the polishing fluid filtration device comprising:

[0024] Support structure;

[0025] The filter cartridge is rotatable around the support structure. The filter cartridge includes two closed end faces and a filter screen area arranged in the circumferential direction, and has a hollow cavity structure inside.

[0026] A drive assembly for driving the filter cartridge to rotate;

[0027] The spray pipe, connected to the outlet of the main return pipe, is installed in the support structure and is used to inject the solid-liquid mixture into the filter cartridge.

[0028] A backwash nozzle, located outside the filter cartridge, is used to spray cleaning fluid onto the filter screen area;

[0029] A slag receiving container is installed inside the filter cylinder, located below the spray path of the backwash nozzle, and is used to collect impurities that are detached during the cleaning process;

[0030] The slag discharge channel is connected to the slag receiving container and extends through the support structure to the outside of the filter cylinder for discharging the impurities;

[0031] A collection housing is provided outside the filter cylinder to collect the purified liquid ejected from the filter cylinder. The bottom of the collection housing is provided with a purified liquid outlet.

[0032] In some embodiments, the purified liquid outlet is connected to the purified liquid storage tank of the liquid supply device.

[0033] In some embodiments, the filter cartridge is arranged laterally, and its filter area includes a circumferential support frame, the filter screen covers the outside of the support frame and is detachably connected to it;

[0034] The spray pipe is arranged along the generatrix of the filter cylinder and has multiple outlets for uniformly spraying the solid-liquid mixture onto the inner wall surface of the filter cylinder.

[0035] In some embodiments, the slag discharge channel is connected to a vibrating screen assembly for solid-liquid separation of the discharged impurity mixture. The vibrating screen assembly includes a linear vibrating screen and a circular vibrating screen. The outlet of the linear vibrating screen is aligned with the inlet of the circular vibrating screen. The separated solids are directly removed or removed by replacing the screen bucket, and the liquid portion is introduced into a waste liquid tank.

[0036] The vibrating screen assembly is connected to the waste liquid tank, which is equipped with a stirring device and connected to the spray pipe through a return pipeline, for the purpose of re-introducing the liquid in the waste liquid tank into the filter cartridge for circulation treatment.

[0037] A circulating supply pipeline system for a solid-liquid hybrid polishing slurry, employing the above-described technical solution of the present invention, has the following advantages:

[0038] This effectively prevents the solid-liquid separation and deposition of polishing fluid in the pipeline system. By setting the main supply and return pipes at low positions, and connecting the branch supply and return pipes from bottom to top and from top to bottom, even in the event of temporary shutdown or localized insufficient flow, the settled solid particles can be carried away by the main flowing fluid and flow into the main pipeline, preventing them from accumulating at the bottom of the pipeline or valve joints. This significantly improves the system's anti-deposition capability and reduces downtime and maintenance costs caused by blockages.

[0039] Improve the flowability and anti-clogging properties of the main liquid supply pipe's end. By setting up a liquid supply return pipe to connect the end of the main liquid supply pipe to the beginning of the main liquid return pipe, a closed return flow path is constructed, ensuring that the liquid at the end of the main liquid supply pipe remains in a continuous flow state. This effectively avoids the formation of a stagnant liquid column at the end, prevents local solid-liquid separation and powder sedimentation, and thus extends the service life of the pipeline.

[0040] This system enables rapid cleaning and maintenance of the liquid supply pipeline. A backwash inlet is installed at the main liquid supply pipe inlet, and a backwash outlet is installed at the main return liquid pipe outlet, forming a cleaning loop covering the entire pipeline system. When high-pressure cleaning liquid is introduced, efficient cleaning can be completed using the existing pipeline routing, simplifying the cumbersome process of traditional pipe disassembly for cleaning and improving factory operation and maintenance efficiency.

[0041] The polishing fluid filtration equipment using the above-described technical solution of this invention has the following effects:

[0042] This design enables continuous filtration, preventing liquid supply interruptions. The filter cartridge is designed to rotate around the support structure and features an external backwash nozzle, allowing for simultaneous cleaning during filtration without requiring machine shutdown to disassemble the filter screen. This effectively overcomes the liquid supply interruption problem caused by frequent shutdowns for cleaning in traditional filtration equipment, making it suitable for continuous industrial production needs.

[0043] The solid-liquid separation structure is optimized to improve filtration quality. The filter cartridge adopts a cavity structure, combined with the circumferential area covered by the filter screen and the liquid spray pipe located inside it. This allows the polishing liquid to be evenly distributed to the inner wall of the filter screen after entering. Through rotational centrifugal action and sieving by the filter screen, efficient solid-liquid separation is achieved, ensuring the cleanliness of the output liquid.

[0044] This ensures the orderly collection and discharge of impurities during the cleaning process. The slag receiving container is located below the spray path of the backwash nozzle. After the impurities are stripped off, they are directly collected into the container and discharged to the outside of the equipment through the slag discharge channel, preventing impurities from mixing into the clean liquid path and ensuring filtration stability and impurity treatment efficiency.

[0045] It facilitates the collection and subsequent recycling of purified liquid. The filter cartridge is equipped with a collection shell and a purified liquid outlet at the bottom, which facilitates the centralized collection and export of purified liquid. Together with the purified liquid storage tank of the liquid supply equipment, it forms a recycling system, improving liquid utilization and reducing consumables and the risk of contamination.

[0046] Selective filtration. Based on the particle size of the impurities and the polishing powder, a filter screen with an appropriate mesh size is used to filter out impurities while retaining the effective components in the polishing solution. Attached Figure Description

[0047] Figure 1 This is a simplified diagram of the pipeline structure of the pipeline system of the present invention;

[0048] Figure 2 yes Figure 1 A simplified diagram of the piping on one side of the liquid handling equipment;

[0049] Figure 3 It is a 3D diagram of the integrated liquid supply and filtration equipment.

[0050] Figure 4 This is a 3D diagram of the internal structure of the filtration equipment;

[0051] Figure 5 This is a 3D view of the internal structure of the core part of the filtration equipment after it has been opened.

[0052] Figure 6 This is a 3D view of the filter drum section;

[0053] Figure 7 yes Figure 6 A sectional view;

[0054] Figure 8 This is a 3D view of the vibrating screen components;

[0055] Figure 9 It is a 3D diagram of the liquid supply equipment.

[0056] Explanation of reference numerals in the attached figures

[0057] 1-Main liquid supply pipe;

[0058] 2- Supply tubing;

[0059] 3-Main return pipe;

[0060] 4-Return pipe;

[0061] 5-Liquid supply return pipe;

[0062] 6- Backwash inlet;

[0063] 7- Backwash outlet;

[0064] 8-First three-way valve;

[0065] 9-Agitator;

[0066] 10-Connecting pipe;

[0067] 11-Buffer water tank;

[0068] 12-Return pump;

[0069] 13-Second three-way valve;

[0070] 14-Liquid supply equipment;

[0071] 15-Filtering equipment; 15a-Supporting structure; 15b-Filter cartridge; 15b1-Supporting frame; 15c-Drive assembly; 15d-Spray pipe; 15e-Backwash nozzle; 15f-Slag receiving container; 15g-Slag discharge channel; 15h-Collection shell;

[0072] 16 - Vibrating screen assembly, 16a - Linear vibrating screen, 16b - Circular vibrating screen;

[0073] 17-Waste liquid tank;

[0074] 18-Return piping. Detailed Implementation

[0075] The following provides a detailed description of specific embodiments of the present invention. It should be understood that the specific embodiments described herein are for illustrative and explanatory purposes only and are not intended to limit the scope of the invention.

[0076] In this invention, unless otherwise stated, directional terms such as "upper" and "lower" generally refer to the orientation in the assembled and used state. "Inner" and "outer" refer to the inner and outer sides relative to the outline of each component itself.

[0077] This invention proposes a circulating supply pipeline system suitable for solid-liquid mixed polishing slurries. In response to the problems of solid-liquid separation, particle deposition, and inability to continuously supply slurry during system backwashing in existing factory processing equipment, a liquid circuit structure with good anti-settling, stable circulating supply and backwashing compatibility is designed.

[0078] The piping system stably supplies liquid to the processing equipment through a main supply pipe 1 and multiple branch supply pipes 2 connected from bottom to top. The return liquid section flows from the branch return pipes 4 from top to bottom into the lower main return pipe 3, effectively utilizing gravity to assist drainage and guide sediment to the main channel. A supply return pipe 5 is installed at the end of the piping system. The supply return pipe 5 connects the main supply pipe 1 and the main return pipe 3, ensuring continuous liquid circulation at the end of the pipe, eliminating stagnant water sections, and inhibiting solid deposition in the polishing fluid.

[0079] To address potential blockages and deposits in the pipelines during long-term operation, the system is equipped with an online backflushing mechanism. Backflushing liquid is introduced at the inlet of the main supply pipe 1, flows through the main supply pipe 1, the supply return pipe 5, and the main return pipe 3 into the drainage path, enabling periodic cleaning of the entire pipeline system. To ensure uninterrupted liquid supply to the processing equipment during backflushing, a buffer tank 11 and a return pump 12 are added next to each liquid-using device, along with a bypass branch, allowing temporary extraction of buffer liquid and return to the processing equipment, achieving the effect of "uninterrupted liquid supply during backflushing."

[0080] In addition, the end of the main return pipe 3 is connected to a sealed stirring tank 9, which is equipped with a magnetic stirring rod and is driven to rotate by an external changing magnetic field. Together with the upward pipe between the stirring tank 9 and the filter equipment 15, it not only solves the problem of liquid accumulation and sedimentation in the pipe caused by the high inlet of the filter equipment 15, but also inhibits sedimentation and ensures that the liquid enters the filtration process uniformly and stably, ultimately realizing continuous, efficient and automated operation of the entire process of liquid supply-liquid return-filtration.

[0081] The following sections will detail each component of the pipeline system in modules.

[0082] Liquid supply pipeline (see attached) Figure 1 , 2 ):

[0083] In the piping system of this invention, the main liquid supply pipe 1 serves as the main passage of the system, is located at a low position, preferably slightly above the ground, and is laid out along the factory workshop. The inlet end of the main liquid supply pipe 1 is connected to the liquid supply device 14, which is used to receive and transport polishing liquid or purified polishing liquid. Multiple branch liquid supply pipes 2 are connected along the main liquid supply pipe 1, and each branch liquid supply pipe 2 is used to supply liquid to multiple liquid-using devices.

[0084] The branch supply pipe 2 is installed from bottom to top, with its bottom end connected to the main supply pipe 1 and its top end connected to the corresponding liquid-using equipment. The bottom-up upward structure is adopted to accommodate the actual equipment layout where the liquid supply system is located on the ground or at a low position and the liquid-using equipment is located at a high position (such as a workbench or machine tool). On the other hand, when the liquid-using equipment is not running for a long time, the solid particles in the static liquid column formed in the branch supply pipe 2 will naturally settle back to the bottom and flow into the main supply pipe 1 by gravity, avoiding accumulation and deposition at the bottom of the branch supply pipe 2 and at the valve.

[0085] This structure effectively solves the problem in existing technologies where sediment buildup at the bottom of the branch supply pipe 2, leading to blockage and malfunction of the flow control valve. Simultaneously, the high velocity of the main liquid in the main supply pipe 1 provides strong carrying and flushing capabilities, allowing sediment particles to be further carried out of the system or introduced into the return path for re-filtration.

[0086] In summary, the combined structure of the main liquid supply pipe 1 and the branch liquid supply pipe 2 has significant technical advantages in terms of spatial arrangement, fluid gravity utilization and sedimentation suppression, and is an important component module for realizing the overall anti-settlement capability of the system.

[0087] Return line (see attached) Figure 1 , 2 ):

[0088] In the circulating supply pipeline system of the solid-liquid mixed polishing slurry of the present invention, the return pipeline consists of a main return pipeline 3 and multiple branch return pipelines 4. The main return pipeline 3 is preferably located at a low position, laid along the factory floor, and finally connected to the filtration equipment 15. Each branch return pipeline 4 connects to the corresponding liquid-using equipment and the main return pipeline 3 from top to bottom, forming a return path from high to low, so that the waste liquid can be smoothly returned under the action of gravity, reducing the problem of liquid stagnation or poor return.

[0089] Each branch return pipe 4 preferably adopts an inverted U-shaped structure. The front section of the branch return pipe 4 extends from bottom to top, and its inlet end is connected to the return pump 12 located next to the corresponding processing equipment for pumping waste liquid from the buffer tank 11. The rear section of the branch return pipe 4 extends from top to bottom, and its outlet end is connected to the main return pipe 3. A second three-way valve 13 assembly is installed at the top of the branch return pipe 4 for controlling the switching of the waste liquid flow direction.

[0090] Specifically, during normal operation of the pipeline system, the second three-way valve 13 is in the first open state, and the return pump 12 draws the waste liquid from the buffer tank 11 into the branch return pipe 4 and then sends it to the filter equipment 15 for regeneration through the main return pipe 3. When the main supply pipe 1 is in the backwashing state, the second three-way valve 13 switches to the second open state, allowing the return pump 12 to draw the liquid from the buffer tank 11 and return it directly to the inlet of the application liquid equipment through the bypass branch of the branch return pipe 4, ensuring that the continuous liquid supply to the application liquid equipment is not interrupted during the backwashing process.

[0091] The advantages of this return pipeline structure are: the top-down liquid flow design enhances the drainage capacity of the return path; the inverted U-shaped structure, combined with the three-way valve at the top, facilitates flexible switching of the supply path; connecting the return pump 12 to the branch return pipe 4 creates positive pressure reflux, which helps improve the stability of high-viscosity polishing fluid delivery; during backwashing operations, the return pump 12 and the three-way structure enable local return supply, improving the system's continuous operation capability.

[0092] In summary, the structural design of the main return pipe 3 and the branch return pipe 4 not only adapts to the spatial layout and liquid return flow pattern, but also enhances the flexibility and continuity of the system under different operating modes through the combination of the return pump 12 and control valves. It is an indispensable component for achieving efficient and stable liquid supply.

[0093] Liquid supply return pipe 5 (see attached) Figure 1 ):

[0094] In the pipeline system of the present invention, in order to prevent sedimentation problems at the end of the main liquid supply pipe 1 due to reduced flow rate or liquid stagnation, the system is specially provided with a liquid supply return pipe 5. One end of the return pipe is connected to the end of the main liquid supply pipe 1, and the other end is connected to the beginning section of the main return pipe 3, forming an auxiliary return path for guiding the polishing liquid that has not been consumed by the liquid-using equipment back to the main return pipe 3 to participate in the subsequent recovery and filtration process.

[0095] The liquid supply return pipe 5 is preferably designed with a small diameter structure, and can be equipped with an internal regulating valve or flow limiting device to flexibly control the return flow according to the system operation requirements, so as to avoid pressure drop interference to the normal liquid supply of the main liquid supply pipe 1. The liquid supply return pipe 5 is preferably made of wear-resistant and anti-clogging industrial pipe fittings to withstand the long-term scouring of powder particles in high-concentration polishing fluid.

[0096] In operation, even when the end-user liquid equipment is not running, the liquid in the main supply pipe 1 can continue to flow through the supply return pipe 5, avoiding the formation of stagnant liquid columns and effectively reducing the risk of powder deposition at the end of the main supply pipe 1 and the end valve. At the same time, this return path also improves the overall flow closed-loop performance of the main supply pipe 1, enhancing the system's circulation stability and liquid renewal frequency.

[0097] The configuration of this structure, combined with the bottom placement of the main liquid supply pipe 1 and the upward placement of the branch liquid supply pipe 2, creates a synergistic effect, allowing the sediment after solid-liquid separation to be carried away by the system backflow and then processed by the filtration device, thus avoiding blockage and liquid concentration changes caused by local sedimentation.

[0098] Backwash (see attached) Figure 1 ):

[0099] To prevent sediment buildup and blockage in the pipeline system during long-term operation, this invention includes a backflushing module that can periodically clean key pipelines such as the main supply pipe 1, branch supply pipe 2, main return pipe 3, and branch return pipe 4 online, ensuring the smooth and efficient operation of the entire system.

[0100] Specifically, the system has a backwash inlet 6 at the inlet end of the main liquid supply pipe 1. This inlet is used to introduce high-pressure cleaning liquid during backwashing operations, preferably tap water or other suitable low-viscosity liquid, and its pressure can be provided by an external water supply system or a booster pump. The opening and closing status of this inlet can be controlled by a check valve or an electric valve to ensure that it is only opened during backwashing and to avoid backflow contamination during normal liquid supply.

[0101] At the end of the main return pipe 3, a backwash outlet 7 is provided. This outlet is usually located on the first three-way valve 8 at the end of the main return pipe 3. One outlet of the first three-way valve 8 is connected to the filter device 15, and the other outlet is the backwash outlet 7, which leads to the wastewater discharge pipe. The three-way valve can switch the flow direction according to system instructions or manual control. When in backwash mode, the cleaning fluid flows along the main supply pipe 1 → supply return pipe 5 → main return pipe 3, and finally exits the system through the backwash outlet 7, carrying away the deposited impurities and residual liquid in the pipe.

[0102] The entire backwashing process is independent of the start / stop status of each liquid-using device and can quickly complete the cleaning task during system shutdown. It is worth noting that, in order to prevent the cleaning fluid from entering the filter device 15 and disturbing its internal magnetic stirring device, the stirring tank 9 is located after the three-way valve in this system structure, and during the backwashing process, the three-way valve will switch the flow direction to the backwash outlet 7, thereby effectively protecting the structural integrity of the filter device 15 and the stirring tank 9.

[0103] The introduction of the backwash structure not only enhances the system's anti-deposition capability and extends the service life of key components, but also improves the overall system's maintainability and operational continuity, making it particularly suitable for circulating liquid supply environments with high concentrations and high viscosity liquids.

[0104] On-site liquid supply system (see attached) Figure 1 , 2 ):

[0105] Because the aforementioned backwashing structure requires switching the entire main supply pipe 1 and main return pipe 3 to a non-supply state during cleaning operations, it cannot continuously supply polishing fluid to the various fluid-using devices, easily causing adverse consequences such as short-term equipment outages and processing interruptions. Therefore, this invention further proposes an on-site fluid supply system structure that can temporarily replace the normal fluid supply path during backwashing operations, ensuring continuous operation of the fluid-using devices. This system includes a buffer tank 11, a return pump 12, and a second three-way valve 13.

[0106] A buffer tank 11 is located near each liquid-using device to collect the recycled polishing fluid generated during normal operation of the device, and has a certain liquid storage capacity. The buffer tank 11 can be made of metal or high-polymer corrosion-resistant materials, and is equipped with a liquid level monitoring device to control the upper limit and lower discharge limit.

[0107] The inlet of the return pump 12 is connected to the outlet of the buffer tank 11 and is used to extract the liquid in the buffer tank 11. The return pump 12 is preferably a particle-resistant centrifugal pump or a variable frequency drive pump to adapt to the characteristics of the return liquid containing solid particles.

[0108] The outlet of the return pump 12 is connected to a second three-way valve 13, which has two outlet channels: one leads to the branch return pipe 4 of the normal path (used to pump waste liquid back to the main return pipe 3 and deliver it to the filtration equipment 15 for processing), and the other channel is directly connected to the inlet of the corresponding liquid-using equipment, forming a bypass liquid supply path. When the main liquid supply pipe 1 cannot supply liquid, by switching the second three-way valve 13 to the bypass path, the return pump 12 can directly send the liquid in the buffer tank 11 into the processing equipment, achieving uninterrupted liquid supply in the local loop.

[0109] The second three-way valve 13 is preferably disposed on the inverted U-shaped structure at the top of the branch return pipe 4. This structure is beneficial for forming an effective flow driving force through the liquid level difference, and can reduce the accumulation of residual liquid in the second three-way valve 13, thereby reducing the risk of deposition.

[0110] With the above-mentioned structural coordination, when the main liquid supply system is shut down due to backwashing operations, the local liquid supply system can instantly switch the liquid supply path to ensure that the equipment using the liquid continues to receive polishing liquid, avoiding forced shutdown of the equipment due to liquid supply interruption, and greatly improving the flexibility and stability of system operation.

[0111] In addition, after the system resumes normal liquid supply, the second three-way valve 13 automatically switches to the original return liquid path, and the return liquid pump 12 continues to send the liquid in the buffer tank 11 to the main return liquid pipe 3 for centralized filtration, ensuring stable operation of the system in a closed loop and improving the efficiency of waste liquid reuse and environmental performance.

[0112] Mixing tank 9 (see attached) Figure 1 ):

[0113] In the piping system described in this invention, the main return pipe 3 collects waste liquid generated by various liquid-using devices and return liquid from the supply system at its end. Considering that the filter device 15 is usually installed on an equipment platform or in a high-level area, with its inlet above the ground, the liquid needs to be transported from bottom to top through the upward connecting pipe 10 to ensure smooth entry into the filter device 15. This upward transport path easily leads to solid deposition of the liquid at the bottom of the connecting pipe 10, especially when the solid content in the liquid is high or the flow rate is unstable, which can easily cause blockage and affect the stability and efficiency of the subsequent filtration process.

[0114] To solve the above problems, the present invention provides a sealed stirring tank 9 at the end of the main return pipe 3. The stirring tank 9 not only serves as a buffer container before entering the filtration system, but also has an effective solid-liquid mixing function, which significantly improves the deposition problem in the upstream pipe section.

[0115] The mixing tank 9 is preferably located at the lowest point of the entire liquid supply pipeline system, namely in the lower region between the main return pipe 3 and the filter device 15. The outlet of the main return pipe 3 is connected to the inlet of the mixing tank 9 to receive the returned liquid collected in the system. The outlet of the mixing tank 9 is connected to the inlet of the filter device 15 via an upward connecting pipe 10 to transport the uniformly mixed liquid to the filtration system.

[0116] Example 1: A magnetic stirrer is installed inside the mixing tank 9, with the magnetic stirring rod positioned at the bottom of the tank. An external variable magnetic field structure, such as a rotary magnetic actuator, is installed outside the tank to drive the stirring rod to rotate. This structure can create a stable liquid flow field, keeping the liquid inside the tank in a suspended state and preventing solid particles from settling at the bottom.

[0117] Example 2: The mixing tank 9 is equipped with an internal stirring impeller and an external drive motor. The drive motor drives the stirring impeller to rotate via a drive shaft that extends into the mixing tank 9.

[0118] The magnetic stirring rod is located at the bottom of the tank. An external variable magnetic field structure, such as a rotary magnetic actuator, is installed on the outside of the tank to drive the stirring rod's rotation. This structure creates a stable liquid flow field, keeping the liquid in suspension and preventing solid particles from settling at the bottom.

[0119] As the lowest liquid collection area in the system, the mixing tank 9 naturally carries the risk of sedimentation. By incorporating an active stirring mechanism, powder particles in the return liquid can be effectively prevented from settling at the bottom of the upward connecting pipe 10. Thorough stirring before the liquid rises into the filtration device maintains uniform liquid composition, improves filtration efficiency, and avoids frequent maintenance due to localized clogging of the filter media. The sealed structure prevents liquid exposure and contamination, making it suitable for the high-cleanliness liquid supply requirements of industrial workshop environments.

[0120] Through the above structural design, the mixing tank 9 not only realizes the functional transition of liquid flow (from horizontal return to vertical upward flow), but also plays a relay role in sedimentation isolation and homogenization mixing in terms of spatial structure, providing a good premise for continuous and stable filtration operation and further enhancing the reliability and maintainability of the entire system.

[0121] Filtration equipment 15 (see attached) Figures 3-8 ):

[0122] The piping system of this invention adopts a continuous return structure, realizing uninterrupted circulation of the polishing slurry in the supply and return pipelines. Due to the continuity of the return flow, the piping system can effectively prevent solid impurities in the polishing slurry from depositing and clogging in the pipeline, ensuring the stability and smoothness of the supply process.

[0123] Based on this pipeline system, the supporting filtration system must be capable of continuous online operation, achieving efficient separation and removal of solid impurities in the polishing fluid without interruption of filtration. Traditional intermittent filtration equipment 15 requires periodic shutdowns for cleaning, making it difficult to meet the requirements of a continuous liquid return supply system, which can easily lead to problems such as system interruption, reduced production efficiency, and frequent equipment maintenance.

[0124] Therefore, this invention provides a centrifugal filtration device 15 with continuous filtration and synchronous self-cleaning capabilities. This device achieves simultaneous filtration and cleaning processes through the coordinated operation of a rotating filter cartridge 15b and a backwashing cleaning structure. Under the centrifugal force of high-speed rotation, the filter cartridge 15b efficiently traps solid impurities, while the backwash nozzle 15e removes impurities from the filter screen in real time and discharges them promptly through the slag discharge channel 15g, ensuring that the filter screen always maintains good permeability and filtration efficiency.

[0125] The filtration device 15 is closely integrated with the pipeline system of the present invention to form a stable and efficient closed loop for solid-liquid mixture treatment, which significantly improves the system's operational stability and automation level, reduces maintenance frequency, and meets the high standard requirements of modern industrial polishing fluid circulation supply.

[0126] The filtration device 15 is responsible for filtering and separating impurities from the solid-liquid mixture. Its overall structure revolves around a rotatable filter cylinder 15b, which is stably supported and rotated by a support structure 15a mounted on a frame. The solid-liquid mixture flows into the filter cylinder 15b through the spray pipe 15d. Driven by the drive component 15c, the filter cylinder 15b rotates at high speed, generating centrifugal force that throws the liquid and fine particles out of the cylinder. The purified liquid is then collected by the external collection shell 15h. Larger solid impurities remain on the filter screen surface inside the filter cylinder 15b and are detached from the filter screen surface under the continuous spraying action of the backwash nozzle 15e, eventually falling into the internal slag receiving container 15f and being discharged through the slag discharge channel 15g.

[0127] The filter is compact in structure and highly efficient in operation, enabling simultaneous filtration and cleaning processes without the need for alternating shutdowns, thus effectively improving continuous operation capability and solid-liquid separation efficiency.

[0128] The filtration device 15 mainly includes the following functional modules: a support structure 15a, a filter cylinder 15b, a drive assembly 15c, a spray pipe 15d, a backwash nozzle 15e, a slag receiving container 15f, a slag discharge channel 15g, and a collection shell 15h. The support structure 15a is one of the key load-bearing components of the filter. Its main function is to provide stable support for the filter cylinder 15b, enabling the filter cylinder 15b to rotate around its axis, and simultaneously providing a path for the spray pipe 15d and the slag discharge channel 15g. It is mounted on the frame and fixedly connected to it.

[0129] This invention provides two embodiments of the support structure 15a.

[0130] Example 1: The support structure 15a includes a hollow, fixed long shaft mounted on the frame. The filter cylinder 15b is sleeved on the outside of the long shaft via bearings and can rotate freely relative to the long shaft. The spray pipe 15d passes through the axis of the long shaft, and the slag discharge channel 15g extends from the other end of the long shaft. The structure is compact and easy to integrate.

[0131] Example 2: The support structure 15a consists of two fixed mounting seats located at both ends of the filter cylinder 15b. The two ends of the filter cylinder 15b are rotatably connected to the two mounting seats via bearings. The spray pipe 15d and the slag discharge channel 15g are respectively inserted into the two mounting seats, forming a symmetrical support structure 15a, which facilitates maintenance and disassembly. Regardless of the method used, the support structure 15a remains stationary and does not rotate with the filter cylinder 15b, thus providing a stable platform for functions such as spraying and slag discharge.

[0132] Filter cartridge 15b: Filter cartridge 15b is the core component for solid-liquid separation in the filtration device 15 of this invention. The solid-liquid mixture is sprayed onto the inner wall of filter cartridge 15b by spray pipe 15d. Driven by drive component 15c, filter cartridge 15b rotates at high speed, and the mixture is thrown outward under centrifugal force. Liquid and small particles pass through the filter screen and are thrown out of the cartridge, then collected in collection shell 15h and guided to the clean liquid outlet, while larger impurities are blocked inside the filter screen. Compared with static filtration structure, this centrifugal lateral filtration method has stronger particle separation capability and filtration efficiency, and is less prone to flow rate reduction due to filter screen clogging.

[0133] The filter cylinder 15b is arranged horizontally and is cylindrical in shape. It is closed at both ends along its axial direction, with a filter screen area in the circumference. The interior is a cavity structure to accommodate the injected solid-liquid mixture and achieve separation during rotation.

[0134] The circumferential surface of the filter cartridge 15b includes a skeleton support structure 15a and a filter screen covering its outer surface. The support skeleton 15b1 can be composed of metal reinforcing ribs, a mesh skeleton, or a multi-ring structure to withstand the centrifugal load generated during rotation, ensuring that the filter screen does not deform or break under high-speed operation. The filter screen is made of wear-resistant and corrosion-resistant stainless steel woven mesh or sintered metal mesh, and its filtration accuracy can be set in the range of 10μm–20μm according to the application requirements, which can filter out large particles of impurities while retaining fine particles for reuse as effective abrasives.

[0135] To facilitate later cleaning, replacement, or adjustment of filtration accuracy according to usage scenarios, the filter screen is detachably installed on the outer surface of the support frame 15b1 via clamps, screws, or snap-fit ​​structures.

[0136] The filter cartridge 15b has shaft holes at both ends for rotatable connection with the support structure 15a. Specifically, in the embodiment employing a hollow long shaft structure, the shaft holes at both ends of the filter cartridge 15b are fitted onto the support shaft, and rolling bearings are installed between the shaft holes and the shaft to achieve low-resistance rotation of the filter cartridge 15b relative to the support shaft. In the embodiment employing a double-end mounting base structure, both ends of the filter cartridge 15b are connected to a fixed mounting base via bearings. The bearings can be nested within the bearing seat structure at the end of the filter cartridge 15b, supported by the mounting base, or they can be disposed within the mounting base, with the end of the filter cartridge 15b forming a shaft segment inserted therein.

[0137] To prevent liquid or fine particulate impurities from seeping into the bearing area during filtration and affecting lubrication and bearing life, the bearing area is equipped with multi-stage sealing components. Commonly used sealing structures include: skeleton oil seals, labyrinth seals, floating seals, etc., and can also be supplemented with oil retaining rings and cleaning rings to create a barrier between liquid, impurities, and lubricating grease.

[0138] Drive assembly 15c: Drive assembly 15c is the power source for the rotation of filter cartridge 15b. It can provide a stable and adjustable speed output to meet the separation needs of different solid-liquid mixtures.

[0139] In the appendix Figure 6 In the illustrated embodiment, the drive assembly 15c includes a speed-regulating motor mounted on a frame. This motor can automatically adjust its speed according to the operating status to meet the requirements for centrifugal force under different working conditions. The output shaft of the motor is connected to one end of the filter cartridge 15b via a belt drive or gear drive mechanism to achieve rotational drive of the filter cartridge 15b.

[0140] When using belt drive, the motor is equipped with a driving wheel and the filter cartridge 15b shaft end is equipped with a driven wheel. The two are connected by a tension belt, which is simple in structure, easy to maintain, and has a certain buffering and shock absorption capacity. When using gear drive, the filter cartridge 15b shaft end is directly connected through meshing gears, which has high transmission efficiency and is suitable for high-load continuous operation scenarios.

[0141] To enhance operational safety and adjustment accuracy, the drive assembly 15c can also be used with a frequency converter or servo drive system to achieve functions such as smooth start-up, adjustable speed, and overload protection. Overall, the drive assembly 15c ensures stable, controllable, and efficient rotation of the filter cartridge 15b, which is a key guarantee for achieving continuous centrifugal filtration.

[0142] Spray pipe 15d: The spray pipe 15d is a fixed component. Its structure runs through the support structure 15a and extends into the filter cylinder 15b. Its main function is to uniformly inject the solid-liquid mixed waste liquid collected from the outside into the filter cylinder 15b during the filtration process, thereby achieving efficient and continuous solid-liquid separation.

[0143] The spray pipe 15d is preferably positioned at the rotation axis of the filter cylinder 15b, that is, coaxially arranged with the axis of the filter cylinder 15b and extending axially. One end of the spray pipe 15d is connected to the liquid inlet channel, and the other end is fixed to the middle of the support structure 15a and extends into the cavity of the filter cylinder 15b. Since the spray pipe 15d itself does not rotate with the filter cylinder 15b, it can remain relatively stationary during the high-speed rotation of the filter cylinder 15b, thus continuously and stably supplying liquid to the interior of the filter cylinder 15b.

[0144] To improve the uniformity of liquid distribution and to facilitate centrifugal separation, the outlet of the spray pipe 15d is preferably located on the lower side wall of the spray pipe 15d. Multiple outlets are evenly spaced along the axis of the spray pipe 15d, with the spray direction being basically vertically downward. This allows the waste liquid to be evenly distributed onto the inner surface of the filter screen along the generatrix of the filter cartridge 15b. This design avoids spray dead zones and enhances the effect of the liquid spreading and forming a thin film during rotation. It also facilitates the rapid application of centrifugal force between the liquid and solid phases, thereby improving filtration efficiency.

[0145] Furthermore, the spray pipe 15d can be made of corrosion-resistant materials, and a detachable structure can be installed if necessary for easy maintenance, flushing, and cleaning, preventing impurities from clogging the nozzle. The overall design balances structural stability and fluid distribution performance, making it a key channel component ensuring the efficient and continuous operation of this device.

[0146] Backwash nozzle 15e: Backwash nozzle 15e and slag receiving container 15f (see attached) Figure 6 , 7 The backwash nozzle 15e and the slag receiving container 15f in this invention work together as a closed-loop cleaning-collection module, which aims to achieve online self-cleaning of the filter screen on the inner wall of the filter cylinder 15b, and to effectively remove and discharge large particulate impurities without interfering with normal filtration operation, thus overcoming the structural problem that filtration and cleaning cannot be carried out simultaneously in the prior art.

[0147] The backwash nozzle 15e is installed outside the filter cartridge 15b, preferably fixed to the upper part of the frame or support structure 15a, and is radially spaced from the filter cartridge 15b, and does not rotate with the filter cartridge 15b. Multiple nozzles are arranged at equal intervals along the axial direction of the filter cartridge 15b, and are arranged in a straight line or in an arc along its upper generatrix, ensuring that the spray area can cover the entire filter screen area, especially the full width of the circumferential filter screen surface.

[0148] The nozzle of the backwash nozzle 15e faces the circumferential surface of the filter cartridge 15b, and the spray direction is perpendicular or approximately perpendicular to the outer surface of the filter screen. The spray medium comes from a separately set backwash liquid supply assembly, which includes a clean liquid container and a high-pressure pump. This assembly draws and pressurizes the cleaning liquid from the clean liquid tank and delivers it to the nozzle end through pipelines. The cleaning liquid sprayed from the nozzle has a certain flow rate and pressure, which can effectively impact and peel off medium and large particulate impurities, such as chips, metal powder, glass particles, and polishing residue, that are attached to the inner wall of the filter screen.

[0149] Under the centrifugal force generated by the high-speed rotation of the filter cartridge 15b, these impurities tend to adhere to the inner side of the filter screen, easily clogging the mesh and reducing filtration efficiency without intervention. The backwash nozzle 15e actively "penetrates" the filter screen mesh through directional spraying, knocking particles off the inner wall into the cartridge cavity, thereby achieving the purpose of online cleaning.

[0150] Slag receiving container 15f: To simultaneously collect and discharge impurities, a slag receiving container 15f is installed inside the filter cylinder 15b. It is fixed in place and preferably positioned directly below the spray path of the nozzle, that is, coinciding with the path of the impurities that fall naturally after being sprayed away. The slag receiving container 15f is generally an arc-shaped trough structure, covering about 1 / 3 to 1 / 2 of the circumferential angle of the lower part of the inner wall of the filter screen, and the opening faces upward to receive impurities.

[0151] To guide the concentrated discharge of impurities, the bottom of the slag receiving container 15f is formed with a guide slope or a conical converging cavity. The lowest point of the container is provided with an opening that connects to the slag discharge channel 15g. The slag discharge channel 15g is further provided with a support structure 15a and extends to the outside of the filter cylinder 15b.

[0152] The working mode of the backwash nozzle 15e and the slag receiving container 15f is as follows: While the filter cylinder 15b is filtering, impurities continuously accumulate on the inner wall of the filter screen during the filtration process; the backwash nozzle 15e continuously sprays to wash away and remove the impurities; the impurities fall continuously under the combined action of gravity and the impact force of the jet from the backwash nozzle 15e; the impurities fall into the slag receiving container 15f and collect; the impurities are discharged from the filter through the slag discharge channel 15g and sent to the subsequent vibrating screen device for further processing.

[0153] In this way, uninterrupted filtration operation is achieved. Both the backwash nozzle 15e and the slag receiving container 15f are fixed structures, which do not interfere with the rotation of the filter cylinder 15b. This allows the three functions of filtration, cleaning, and slag discharge to be carried out simultaneously, significantly improving the system's working efficiency.

[0154] Fine particles retained, large particles removed: The cleaning process can precisely remove large particles of impurities from the filter screen without damaging the working particles smaller than 20μm that pass through the filter screen, ensuring the reuse quality of polishing fluid and other applications.

[0155] Extended maintenance cycle: Automated online cleaning reduces the frequency of manual maintenance, decreases downtime, and extends filter life. Clear impurity path, preventing backflow contamination: The cleaning impurities are physically separated from the liquid flow path, preventing impurities from wandering around in the filter cartridge 15b and causing secondary contamination.

[0156] The number and arrangement of backwash nozzles 15e can be adjusted according to the length, rotation speed and impurity concentration of filter cartridge 15b to improve the applicability.

[0157] Slag discharge channel 15g: Used to smoothly guide solid impurities collected in the slag receiving container 15f out of the filter cylinder 15b, thereby achieving centralized cleaning of impurities. One end of the channel is connected to the bottom of the slag receiving container 15f, and the other end passes through the support structure 15a and extends to the outside of the filter, forming an independent and closed discharge path. The channel is usually tubular in structure, and to prevent liquid leakage during slag discharge from contaminating bearings or other structural components, its shaft-passing part is equipped with a seal. The slag discharge channel 15g can discharge by natural gravity or can be connected to the vibrating screen assembly 16 for further solid-liquid separation.

[0158] Collection housing 15h: The collection housing 15h is installed outside the filter cartridge 15b. Its main function is to receive and collect the purified liquid splashed out of the filter cartridge 15b during the filtration process, preventing liquid splashing and contaminating the surrounding environment, while guiding the purified liquid to the purified liquid tank below. This housing typically adopts a closed structure to cover the outer periphery of the filter cartridge 15b, with a purified liquid outlet at the bottom. It can be directly connected to the inlet of the purified liquid tank according to the overall layout of the filtration device, realizing gravity-flow collection of the purified liquid. The shape of the housing can be customized according to the size of the filter cartridge 15b, with good sealing and adaptability, and is an important supporting structure for achieving a highly efficient and clean filtration environment.

[0159] Vibrating screen assembly 16 (see attached) Figure 8 ):

[0160] The vibrating screen assembly 16 is an important unit in the filtration system of the present invention for the subsequent treatment of impurity mixtures. Its main function is to perform solid-liquid separation on the impurity stream continuously discharged from the filter, further recover the residual liquid, improve resource utilization, and realize centralized management of solid impurities.

[0161] The vibrating screen assembly 16 comprises a two-stage structure: a linear vibrating screen 16a and a circular vibrating screen 16b. The impurity mixture first enters the linear vibrating screen 16a, where it undergoes preliminary separation on the screen. The liquid portion seeps out from below the screen and is collected in the waste liquid pool 17, while the larger solid impurities are conveyed to the circular vibrating screen 16b for further screening to remove any entrained liquid. After two stages of screening, the solid impurities have extremely low liquid content and can be collected centrally for periodic manual or automatic removal.

[0162] Meanwhile, the vibrating screen assembly 16 is connected to the waste liquid tank 17 and the return pipeline 18 to realize the recycling of liquid, forming a closed-loop treatment cycle. This structure ensures the timeliness of impurity treatment and the overall high efficiency and stability of the system during continuous operation of the filter.

[0163] The vibrating screen assembly 16 consists of a linear vibrating screen 16a and a circular vibrating screen 16b, both of which are mounted on the frame via spring supports, effectively isolating vibrations and reducing vibration transmission during equipment operation. Each vibrating screen is equipped with a dedicated vibrating motor, which generates periodic vibrations that cause the material to continuously jump and move on the screen, thereby achieving solid-liquid separation.

[0164] The linear vibrating screen 16a features a slightly inclined screen structure. Under the influence of vibration and gravity, liquid impurities seep out along the inclined surface to the collection tank below, and are then introduced into the waste liquid tank through pipes, effectively separating liquid and solid. Its design facilitates continuous and stable material flow and liquid discharge.

[0165] The circular vibrating screen 16b is equipped with a detachable screen for easy regular replacement and cleaning, improving maintenance efficiency. The screen further dehydrates impurities through rotational vibration, ensuring a low moisture content in the discharged solids, which aids in subsequent processing and transportation. The liquid discharged from the circular vibrating screen 16b is also directed to a waste liquid tank.

[0166] Waste liquid tank 17: This is a container in this filtration system used to collect and temporarily store the liquid portion containing residual impurities discharged from the vibrating screen assembly 16. Waste liquid tank 17 is equipped with a stirring device to prevent impurities from settling, maintain liquid homogeneity, and ensure stable liquid quality. Through stirring, the liquid in waste liquid tank 17 can be continuously kept in a flowing state, facilitating subsequent treatment and recycling.

[0167] Return pipe 18: Connects the waste liquid tank 17 to the inlet channel of the filter, realizing the circulation and return of liquid in the waste liquid tank 17. Through pumping or natural flow, the waste liquid is transported back to the filter cartridge 15b via the return pipe 18 for further filtration, forming a closed-loop circulation system. This design effectively reduces waste liquid discharge, improves resource utilization, and enhances the system's environmental performance and economic benefits.

[0168] The circulating supply pipeline system for the solid-liquid hybrid polishing slurry of the present invention (see attached diagram) Figure 9 This is an integrated treatment solution designed to achieve efficient filtration, concentration adjustment, and circulating supply of solid-liquid mixtures. It mainly includes a filtration unit 15 and a piping system. The piping system includes a purified liquid tank, supply piping components, a concentrated liquid tank, a clean water tank, and a control system.

[0169] The filtration system is the solid-liquid mixture filtration device proposed above in this invention, which can continuously and efficiently separate solid impurities from liquid in waste liquid, ensuring the continuity and stability of the filtration process.

[0170] Working process of the circulating supply pipeline system for solid-liquid mixed polishing slurry:

[0171] Liquid supply stage: The purified polishing liquid in the purified liquid tank is pressurized by the liquid supply pump and enters the main liquid supply pipe 1, flowing along the main liquid supply pipe 1 to each branch liquid supply pipe 2. Each branch liquid supply pipe 2 is arranged upwards and connected to the specific liquid-using equipment, thereby continuously and stably supplying the purified liquid to each processing station, enabling continuous operation of each station. The liquid supply system is equipped with a liquid supply return pipe 5 connected to the main liquid supply pipe 1 to regulate the liquid supply pressure and prevent abnormal pressure in the liquid supply system caused by the closure or blockage of some branch pipes.

[0172] Return stage: The polishing liquid containing impurities output from the liquid-using equipment is recovered to the main return pipe 3 via the branch return pipe 4. The main return pipe 3 is positioned at the bottom to facilitate the settling of solid impurities in the liquid to the bottom of the pipe by gravity, which is beneficial for centralized sedimentation and transportation. The end of the main return pipe 3 is connected to the mixing tank 9, which is located at the lowest point of the system and is equipped with a stirring mechanism to disperse any solid particles that may settle, keeping the mixture in a uniform state for subsequent high-efficiency filtration.

[0173] Filtration Stage: The mixture in the mixing tank 9 is conveyed to the continuous filtration device 15 through the outlet. This filtration device 15 employs a centrifugal structure, using a high-speed rotating filter cylinder 15b to separate the solid and liquid phases of the mixture. The liquid phase passes through the filter screen and is discharged, collected in the purified water tank, while solid impurities are blocked on the filter screen and simultaneously stripped off under the continuous spraying action of the backwash nozzle 15e, falling into the slag collection container 15f and being discharged through the slag discharge channel 15g. The entire process is completed without shutting down the machine, achieving simultaneous filtration and cleaning, and ensuring the continuity of filtration.

[0174] Continuous liquid supply during backflushing and return: To avoid interruption of liquid supply during backflushing operations, the system establishes an on-site liquid supply system via a buffer tank 11 and a return pump 12. During backflushing, the liquid supply source is switched via a second three-way valve 13, with the buffer tank 11 replenishing the liquid-using equipment to maintain continuous liquid supply at each station. After backflushing is completed, the system automatically switches back to the main liquid supply path, continuing to supply clean liquid through the supply equipment and pipelines, restoring normal circulation.

[0175] The preferred embodiments of the present invention have been described in detail above. However, the present invention is not limited to the specific details in the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0176] It should also be noted that the various specific technical features described in the above embodiments can be combined in any suitable manner without contradiction. To avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0177] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A circulating supply pipeline system for a solid-liquid mixed polishing slurry, characterized in that, include: The main liquid supply pipe (1) is connected to the liquid supply equipment (14) at the inlet, and multiple branch liquid supply pipes (2) are connected to the main liquid supply pipe (1); The branch liquid supply pipe (2) connects the main liquid supply pipe (1) and the liquid-using equipment from bottom to top, and is used to deliver polishing liquid from the liquid supply equipment (14) to each liquid-using equipment; The main return pipe (3) is connected to multiple branch return pipes (4), and the outlet of the main return pipe (3) is connected to the filter device (15). The branch return pipe (4) connects each liquid-using device to the main return pipe (3) from top to bottom; The liquid supply return pipe (5) connects the end of the main liquid supply pipe (1) to the beginning of the main liquid return pipe (3) and is used to draw the unconsumed polishing liquid in the main liquid supply pipe (1) back to the main liquid return pipe (3). The backwash inlet (6) is located at the inlet of the main liquid supply pipe (1) and is used to introduce backwash liquid; The backwash outlet (7) is located at the end of the main return pipe (3) and is used to discharge backwash liquid.

2. The piping system according to claim 1, characterized in that, The piping system also includes: The first three-way valve (8) is located at the end of the main return pipe (3). Its inlet is connected to the main return pipe (3), and its outlet is connected to the filter device (15) and the backwash outlet (7) respectively. It is used to control the flow of liquid to the filter device (15) or the backwash outlet (7).

3. The piping system according to claim 1, characterized in that, The main liquid supply pipe (1) is located at a low position; the bottom of the branch liquid supply pipe (2) is connected to the main liquid supply pipe (1), and the branch liquid supply pipe (2) is configured to allow the liquid to flow upward.

4. The piping system according to claim 1, characterized in that, Each of the aforementioned liquid-using devices is provided with a buffer water tank (11) and a return liquid pump (12). The inlet of the return liquid pump (12) is connected to the buffer water tank (11), and the outlet of the return liquid pump (12) is connected to the main return liquid pipe (3) and the liquid inlet of the liquid-using device respectively through a second three-way valve (13), which is used to provide temporary liquid supply to the liquid-using device during the backwashing process.

5. The piping system according to claim 4, characterized in that, The branch return pipe (4) has an inverted U-shaped structure, and the second three-way valve (13) is located at the top of the branch return pipe (4). The branch return pipe (4) in front of the second three-way valve (13) is set from bottom to top, and the inlet end is connected to the return pump (12). The rear section is set from top to bottom, and the outlet end is connected to the main return pipe (3).

6. The piping system according to claim 1, characterized in that, It also includes a closed mixing tank (9), which is located at the lowest point of the pipeline system; the mixing tank (9) is connected to the end of the main return pipe (3) to receive the return liquid; the mixing tank (9) is connected to the inlet of the filter device (15) through the connecting pipe (10) to transport the liquid in the tank to the filter device (15); The mixing tank (9) is equipped with a magnetic stirrer inside, and the magnetic stirring rod is set inside the tank. An external variable magnetic field structure is provided outside the tank to drive the magnetic stirring rod to rotate. or, The mixing tank (9) is equipped with an impeller inside and a drive motor outside; the drive motor drives the impeller to rotate through a drive shaft that extends into the mixing tank (9).

7. A polishing fluid filtration device suitable for the pipeline system described in any one of claims 1-6, characterized in that, include: Support structure (15a); The filter cartridge (15b) is rotatable around the support structure (15a). The filter cartridge (15b) includes two closed end faces and a filter screen area arranged in the circumferential direction, and has a hollow structure inside. A drive assembly (15c) is used to drive the filter cartridge (15b) to rotate; The spray pipe (15d) is connected to the outlet of the main return pipe (3) and passes through the support structure (15a) to inject the solid-liquid mixture into the filter cylinder (15b); A backwash nozzle (15e) is disposed outside the filter cartridge (15b) and is used to spray cleaning fluid onto the filter screen area; The slag receiving container (15f) is located inside the filter cylinder (15b) and below the spray path of the backwash nozzle (15e), and is used to collect impurities that are detached during the cleaning process; The slag discharge channel (15g) is connected to the slag receiving container (15f) and extends through the support structure (15a) to the outside of the filter cylinder (15b) for discharging the impurities; A collection housing (15h) is installed outside the filter cylinder (15b) to collect the purified liquid ejected from the filter cylinder (15b). The bottom of the collection housing (15h) is provided with a purified liquid outlet.

8. The filtration device according to claim 7, characterized in that, The purified liquid outlet is connected to the purified liquid storage tank of the liquid supply device (14).

9. The filtration device according to claim 7, characterized in that, The filter cartridge (15b) is arranged horizontally, and its filter area includes a circumferential support frame (15b1). The filter screen covers the outside of the support frame (15b1) and is detachably connected to it. The spray pipe (15d) is arranged along the generatrix of the filter cylinder (15b) and is provided with multiple liquid outlets for uniformly spraying the solid-liquid mixture onto the inner wall surface of the filter cylinder (15b).

10. The filtration device according to claim 7, characterized in that, The slag discharge channel (15g) is connected to a vibrating screen assembly (16) for solid-liquid separation of the discharged impurity mixture. The vibrating screen assembly (16) includes a linear vibrating screen (16a) and a circular vibrating screen (16b). The outlet of the linear vibrating screen (16a) is aligned with the inlet of the circular vibrating screen (16b). The separated solids are directly removed or removed by replacing the screen bucket, and the liquid is introduced into the waste liquid pool (17). The vibrating screen assembly (16) is connected to the waste liquid tank (17). The waste liquid tank (17) is equipped with a stirring device and is connected to the spray pipe (15d) through the return pipe (18) for recycling the liquid in the waste liquid tank (17) back into the filter cylinder (15b).

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