Array substrate and display panel

Abstract

The invention provides an array substrate and a display panel, the array substrate comprises a first electrode layer, a passivation layer and a second electrode layer, the second electrode layer and a first sub-passivation layer of the passivation layer are sequentially stacked on the first electrode layer in an opening area, the second electrode layer is provided with a hollow part to expose the first sub-passivation layer, and the first sub-passivation layer is arranged on the first electrode layer. The refractive index of the first sub-passivation layer is smaller than that of the first electrode layer, so that the interface reflection loss of light at the interface of the first sub-passivation layer and the first electrode layer can be reduced, and the penetration rate of the array substrate can be improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to an array substrate and a display panel. BACKGROUND

[0002] With the development of display technology, liquid crystal display panels are widely used in many electronic products, such as mobile phones, tablet computers, etc. As users have higher and higher requirements for electronic products, electronic products are developing in the direction of high transmittance and high resolution.

[0003] A liquid crystal display panel generally includes an array substrate, an opposite substrate, and a liquid crystal layer sandwiched between the array substrate and the opposite substrate. The array substrate is divided into a display area and a non-display area in design, and the display area is further divided into an opening area and a device area. The transmittance of the array substrate is mainly affected by the refractive index of the several thin films in the opening area.

[0004] Therefore, it is necessary to provide an array substrate and a display panel to improve this defect. SUMMARY

[0005] Embodiments of the present application provide an array substrate and a display panel, which can improve the transmittance.

[0006] In order to achieve the above-mentioned purpose, according to a first aspect of the present application, an array substrate is provided, having a display area, the display area including an opening area, the array substrate comprising:

[0007] a first electrode layer;

[0008] a passivation layer, including a first sub-passivation layer disposed on one side of the first electrode layer;

[0009] a second electrode layer disposed on a side of the first sub-passivation layer away from the first electrode layer, the second electrode layer in the opening area having a hollow part, the hollow part exposing part of the first sub-passivation layer;

[0010] wherein the refractive index of the first sub-passivation layer is less than the refractive index of the first electrode layer.

[0011] Optionally, the difference between the refractive indices of the first sub-passivation layer and the second electrode layer is less than the difference between the refractive indices of the first electrode layer and the first sub-passivation layer.

[0012] Optionally, the difference between the refractive indices of the first sub-passivation layer and the second electrode layer is a first difference, and the difference between the refractive indices of the first electrode layer and the first sub-passivation layer is a second difference.

[0013] wherein the difference between the second difference and the first difference is greater than 0 and less than or equal to 0.05.

[0014] Optionally, the refractive index of the second electrode layer is less than the refractive index of the first sub-passivation layer.

[0015] Optionally, the absolute value of the difference between the refractive index of the first sub-passivation layer and the refractive index of the second electrode layer is greater than or equal to 0 and less than or equal to 0.09.

[0016] Optionally, the difference between the refractive index of the first electrode layer and the refractive index of the first sub-passivation layer is greater than or equal to 0.03 and less than or equal to 0.12.

[0017] Optionally, the material of the passivation layer comprises silicon nitride or silicon oxynitride.

[0018] Optionally, the refractive index of the portion of the passivation layer close to the second electrode layer is less than the refractive index of the portion of the passivation layer away from the second electrode layer.

[0019] Optionally, the passivation layer further comprises a second sub-passivation layer, the second sub-passivation layer is arranged between the first sub-passivation layer and the first electrode layer, and the refractive index of the first sub-passivation layer is less than the refractive index of the second sub-passivation layer.

[0020] Optionally, the material of the second sub-passivation layer is the same as the material of the first sub-passivation layer, and the difference between the refractive index of the second sub-passivation layer and the refractive index of the first sub-passivation layer is greater than or equal to 0.01 and less than or equal to 0.2.

[0021] According to a second aspect of the present application, a display panel is provided, comprising the array substrate as described above.

[0022] Optionally, the display panel further comprises an alignment layer, the alignment layer is arranged on the second electrode layer and the first sub-passivation layer.

[0023] Optionally, the refractive index of the alignment layer is less than or equal to the refractive index of the second electrode layer.

[0024] Optionally, the refractive index of the alignment layer is less than or equal to the refractive index of the first sub-passivation layer.

[0025] In the array substrate of the embodiments of the present application, by making the refractive index of the first sub-passivation layer less than the refractive index of the first electrode layer, the interface reflection loss of light at the interface between the first sub-passivation layer and the first electrode layer can be reduced, so that the transmittance of the array substrate can be improved.

[0026] Other features and advantages of the present application will be described in detail in the following detailed description. BRIEF DESCRIPTION OF DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings needed in the embodiment description. Obviously, the drawings in the following description only show some embodiments of the present application, and all other drawings obtained by those skilled in the art without creative effort based on these drawings also belong to the protection scope of the present application.

[0028] In order to more completely understand the present application and its beneficial effects, the following will be described in conjunction with the drawings, wherein the same reference numerals in the following description represent the same parts.

[0029] Figure 1 The top view of the array substrate provided for the embodiments of the present application;

[0030] Figure 2 The film layer structure schematic diagram of the display area of the array substrate provided for the embodiments of the present application;

[0031] Figure 3 The film layer structure schematic diagram of the display area of another array substrate provided for the embodiments of the present application;

[0032] Figure 4 The measured diagram of the transmittance of the array substrate provided for the comparative examples and the embodiments of the present application;

[0033] Figure 5 The schematic diagram of the display panel provided for the embodiments of the present application;

[0034] Figure 6 The schematic diagram of the display device provided for the embodiments of the present application. DETAILED DESCRIPTION

[0035] The text part of the five books: the font is No. 4, the line spacing is set to single spacing, and the font is Kai Ti (note that it is not Kai Ti GB). If the application file involves charts, formulas, etc., clear and complete display is preferred, which can be greater than single spacing.

[0036] The technical solutions in the embodiments of the present application will be described clearly and completely in conjunction with the drawings of the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative effort also belong to the protection scope of the present application.

[0037] The embodiment of the present application provides an array substrate, the array substrate has a display area, the display area includes an opening area, the array substrate includes a first electrode layer, a passivation layer and a second electrode layer, the passivation layer includes a first sub-passivation layer, the second electrode layer is sequentially stacked on the first electrode layer in the opening area with the first sub-passivation layer, and the second electrode layer has a hollow part to expose the first sub-passivation layer. The refractive index of the first sub-passivation layer is less than the refractive index of the first electrode layer.

[0038] In the embodiment of the present application, by making the refractive index of the first sub-passivation layer less than the refractive index of the first electrode layer, the interface reflection loss of light at the interface between the first sub-passivation layer and the first electrode layer can be reduced, so that the transmittance of the array substrate can be improved.

[0039] Referring to Figure 1 , Figure 1 The top view of the array substrate provided by the embodiment of the present application is shown, the array substrate 10 has a display area AA and a non-display area NA arranged at the periphery of the display area AA, the display area AA is an area that can display a picture image, and the non-display area NA is an area used for placing circuit structures and signal traces related to display functions.

[0040] Referring to Figure 2 , Figure 2 The film layer structure schematic diagram of the display area of the array substrate provided by the embodiment of the present application is shown, the display area AA includes an opening area AA1 and a device area AA2, the opening area AA1 is an area used for transmitting light, the device area AA2 is an area used for placing electrical devices related to display functions, and the area of the opening area AA1 is greater than the area of the device area AA2.

[0041] As Figure 2 shown, the array substrate 10 includes a first electrode layer 1, a passivation layer 13 and a second electrode layer 12, the second passivation layer 13 includes a first sub-passivation layer 131, the second electrode layer 12 is sequentially stacked on the first electrode layer 11 in the opening area AA1 with the first sub-passivation layer 131, the second electrode layer 12 has a hollow part 121, the hollow part 121 penetrates the second electrode layer 12 in the thickness direction of the array substrate, so as to expose the first sub-passivation layer 131.

[0042] In the part of the opening area AA1 corresponding to the hollow part 121, the first sub-passivation layer 131 serves as a light-emitting layer, and in the part of the opening area AA1 corresponding to the second electrode layer 12, the second electrode layer 12 serves as a light-emitting layer. Taking the first electrode layer 11 and the first sub-passivation layer 131 as an example, when light is directly incident on the first sub-passivation layer 131 from the first electrode layer 11, the light will have interface reflection loss at the interface between the first electrode layer 11 and the first sub-passivation layer 131, and the reflectivity R and the transmittance T of the light at the interface between the first electrode layer 11 and the first sub-passivation layer 131 satisfy the following formula:

[0043]

[0044] Where n1 is the refractive index of the first electrode layer 11 and n2 is the refractive index of the first sub-passivation layer 131. According to the above formula, the smaller the difference in refractive index between the first sub-passivation layer 131 and the first electrode layer 11, the smaller the reflectivity R of light at the interface between the first sub-passivation layer 131 and the first electrode layer 11, and the larger the transmittance T. In the portion corresponding to the cutout 121 of the opening region AA1, the first sub-passivation layer 131 serves as the light-emitting layer. In this embodiment, by making the refractive index of the first sub-passivation layer 131 smaller than the refractive index of the first electrode layer 11, a multilayer film structure with decreasing refractive index is formed in the portion corresponding to the cutout 121 of the opening region AA1. This can suppress multiple reflections, increase effective light emission, and thereby improve the transmittance of the portion corresponding to the cutout 121 of the array substrate.

[0045] In the portion of the opening region AA1 corresponding to the second electrode layer 12, the refractive index of the second electrode layer 12 is lower than the refractive index of the first sub-passivation layer 131. By making the refractive index of the second electrode layer 12 lower than that of the first sub-passivation layer 131, a multilayer film structure with decreasing refractive index can be formed in the portion of the opening region AA1 corresponding to the cutout portion 121. This can suppress multiple reflections, increase effective light emission, and thereby improve the transmittance of the portion of the array substrate corresponding to the second electrode layer 12. By increasing the transmittance of both the portion of the array substrate corresponding to the cutout portion 121 and the portion corresponding to the second electrode layer 12, the transmittance of the array substrate can be improved.

[0046] It should be noted that the transmittance of the array substrate is the average of the transmittance of the portion of the opening area AA1 corresponding to the cutout portion 121 and the transmittance of the portion of the opening area AA1 corresponding to the second electrode 12. In this embodiment, by simultaneously increasing the transmittance of the portion of the opening area AA1 corresponding to the cutout portion 121 and the transmittance of the portion of the opening area AA1 corresponding to the second electrode 12, the overall transmittance of the array substrate can be improved.

[0047] In this embodiment, by limiting the absolute value of the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 to between 0 and 0.09, the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 can be reduced. This reduces the reflectivity of light at the interface between the first sub-passivation layer 131 and the second electrode layer 12, thereby reducing the interface reflection loss of light at the interface between the first sub-passivation layer 131 and the second electrode layer 12. Therefore, the transmittance of the portion of the array substrate corresponding to the second electrode layer 12 can be further improved.

[0048] In the embodiments of this application, the first sub-passivation layer 131 and the second electrode layer 12 are an integral whole. When serving as the light-emitting layer of the array substrate, the overall refractive index is less than that of the first electrode layer 11, so as to form a multilayer film structure with decreasing refractive index in the opening region AA1. This can suppress multiple reflections, increase effective light emission, and thereby improve the transmittance of the array substrate.

[0049] In some embodiments, the absolute value of the difference between the refractive indices of the first sub-passivation layer 131 and the second electrode layer 12 can be 0, 0.01, 0.02, 0.03, 0.05, 0.06, 0.07, or 0.09, etc. The refractive index of the first sub-passivation layer 131 can be greater than or equal to the refractive index of the second electrode layer 12, or the refractive index of the first sub-passivation layer 131 can be less than or equal to the refractive index of the second electrode layer 12. It is only necessary to ensure that the absolute value of the difference between the refractive indices of the first sub-passivation layer 131 and the second electrode layer 12 is between 0 and 0.09.

[0050] It should be noted that if the absolute value of the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 is too large, it means that the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 is large. This will increase the interface reflection loss of light at the interface between the first sub-passivation layer 131 and the second electrode layer 12, resulting in a decrease in the transmittance of the array substrate. The embodiments of this application limit the absolute value of the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 to between 0 and 0.09, thereby reducing the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12, reducing the interface reflection loss of light at the interface between the first sub-passivation layer 131 and the second electrode layer 12, and thus improving the transmittance of the array substrate.

[0051] In some embodiments, the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 is smaller than the difference in refractive index between the first electrode layer 11 and the first sub-passivation layer 131. This reduces the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 near the light-emitting side, thereby reducing light reflection at the interface between the first sub-passivation layer 131 and the second electrode layer 12 and improving the transmittance of the array substrate.

[0052] In some embodiments, the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 is a first difference value, and the difference in refractive index between the first electrode layer 11 and the first sub-passivation layer 131 is a second difference value. The difference between the second difference and the first difference value is greater than 0 and less than or equal to 0.05. For example, the difference between the second difference and the first difference value can be 0.01, 0.02, 0.03, 0.04, or 0.05, etc. By limiting the difference between the second difference and the first difference value to between 0 and 0.05, when the first difference or the second difference value is close to the lower limit of the difference value, it is convenient to adjust the refractive index of the first electrode layer 11 and the second electrode layer 12.

[0053] In some embodiments, the average refractive index of the first sub-passivation layer 131 and the second electrode layer 12 is less than the refractive index of the first electrode layer 11. For example... Figure 2 As shown, in different regions, the first sub-passivation layer 131 and the second electrode layer 12 can respectively serve as the light-emitting layers of the array substrate. By making the average refractive index of the first sub-passivation layer 131 and the second electrode layer 12 less than the refractive index of the first electrode layer 11, a multilayer film structure with decreasing refractive index can be formed in the portion near the light-emitting side of the array substrate. This can suppress multiple reflections, increase effective light emission, and thereby improve the overall transmittance of the array substrate. In some embodiments, such as Figure 1 As shown, the array substrate 10 includes a substrate 15 and a light-shielding layer 16, a buffer layer 17, an active layer 18, a gate insulating layer 19, a gate layer 20, an interlayer dielectric layer 21, a source-drain layer 22, a planarization layer 23, a first electrode layer 11, a passivation layer 13, and a second electrode layer 12, which are sequentially stacked on the substrate 15.

[0054] In some embodiments, such as Figure 2 As shown, the buffer layer 17 can be a single-layer structure formed by any one of silicon nitride, silicon oxide, and silicon oxynitride, or a double-layer or multi-layer structure formed by at least two of silicon nitride, silicon oxide, and silicon oxynitride.

[0055] In some embodiments, such as Figure 2 As shown, both the gate insulating layer 19 and the interlayer dielectric layer 21 can be a single-layer structure formed by any one of silicon nitride, silicon oxide and silicon oxynitride, or a double-layer or multi-layer structure formed by at least two of silicon nitride, silicon oxide and silicon oxynitride.

[0056] In some embodiments, such as Figure 2 As shown, the first electrode layer 11 is a common electrode layer. The first electrode layer 11 can be a common electrode that is disposed on the entire surface, or the first electrode layer 11 can include multiple patterned common electrodes.

[0057] In some embodiments, such as Figure 2As shown, the second electrode layer 12 is a pixel electrode layer, which may include a plurality of patterned pixel electrodes 122 located in the opening region AA1. Each pixel electrode 122 has a plurality of cutouts 121 that penetrate the pixel electrode 122 in the thickness direction of the array substrate. The structure of the pixel electrode 122 and the cutouts 121 can be replaced with the structure of existing pixel electrodes and cutouts in an array substrate; no limitation is imposed here.

[0058] In some embodiments, such as Figure 2 As shown, the materials of the first electrode layer 11 and the second electrode layer 12 are both transparent conductive materials, which can be indium tin oxide.

[0059] In some embodiments, the difference in refractive index between the first electrode layer 11 and the first sub-passivation layer 131 is greater than or equal to 0.03 and less than or equal to 0.12. For example, the difference in refractive index between the first electrode layer 11 and the first sub-passivation layer 131 can be 0.03, 0.04, 0.06, 0.08, 0.1, or 1.2, etc.

[0060] It should be noted that if the difference in refractive index between the first electrode layer 11 and the first sub-passivation layer 131 is too large, the interface reflection loss of light at the interface between the first sub-passivation layer 131 and the first electrode layer 11 will be large, resulting in a decrease in the transmittance of the array substrate. The embodiments of this application limit the difference in refractive index between the first electrode layer 11 and the first sub-passivation layer 131 to between 0.03 and 0.12, thereby reducing the difference in refractive index between the first sub-passivation layer 131 and the first electrode layer 11, reducing the interface reflection loss of light at the interface between the first sub-passivation layer 131 and the first electrode layer 11, and thus improving the transmittance of the array substrate.

[0061] In some embodiments, the refractive index of the first sub-passivation layer 131 is greater than or equal to 1.7 and less than or equal to 1.82. For example, the refractive index of the first sub-passivation layer 131 may be 1.7, 1.72, 1.74, 1.76, 1.78, 1.8 or 1.82, etc.

[0062] In some embodiments, the material of the first sub-passivation layer 131 includes silicon nitride or silicon oxynitride. Silicon nitride and silicon oxynitride have higher refractive indices than silicon oxide. By selecting silicon nitride or silicon oxynitride as the material of the first sub-passivation layer 131, it can be ensured that the refractive index of the first sub-passivation layer 131 can reach 1.7 to 1.82.

[0063] In some embodiments, the refractive index of the first electrode layer 11 is greater than that of the second electrode layer 12. By making the refractive index of the first electrode layer 11 greater than that of the second electrode layer 12, the refractive indices of the first electrode layer 11, the first sub-passivation layer 131, and the second electrode layer 12 can gradually decrease, so as to form a multilayer film structure with decreasing refractive index in the opening region AA1. This can suppress multiple reflections, increase effective light emission, and thereby improve the transmittance of the array substrate.

[0064] In some embodiments, the refractive index of the first electrode layer 11 is greater than 1.77 and less than or equal to 1.82. For example, the refractive index of the first electrode layer 11 may be 1.78, 1.79, 1.8, 1.81, or 1.82, etc.

[0065] It should be noted that if the refractive index of the first electrode layer 11 is too high or too low, the difference in refractive index between the first electrode layer 11 and the first sub-passivation layer 131 will increase, resulting in greater interfacial reflection loss of light at the interface between the first sub-passivation layer 131 and the first electrode layer 11, thus reducing the transmittance of the array substrate. The embodiments of this application limit the refractive index of the first electrode layer 11 to between 1.77 and 1.82, thereby reducing the difference in refractive index between the first sub-passivation layer 131 and the first electrode layer 11, reducing interfacial reflection loss of light at the interface between the first sub-passivation layer 131 and the first electrode layer 11, and thus improving the transmittance of the array substrate.

[0066] In some embodiments, the refractive index of the second electrode layer 12 is greater than or equal to 1.77 and less than or equal to 1.79. For example, the refractive index of the second electrode layer 12 may be 1.77, 1.775, 1.78, 1.785, or 1.79, etc.

[0067] It should be noted that if the refractive index of the second electrode layer 12 is too high or too low, the difference in refractive index between the second electrode layer 12 and the first sub-passivation layer 131 will increase, resulting in greater interfacial reflection loss of light at the interface between the first sub-passivation layer 131 and the second electrode layer 12, thus reducing the transmittance of the array substrate. The embodiments of this application limit the refractive index of the second electrode layer 12 to between 1.77 and 1.79, thereby reducing the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12, reducing interfacial reflection loss of light at the interface between the first sub-passivation layer 131 and the second electrode layer 12, and thus improving the transmittance of the array substrate.

[0068] In some embodiments, the difference in refractive index between the first sub-passivation layer 131 and the second electrode layer 12 is less than the difference in refractive index between the first sub-passivation layer 131 and the first electrode layer 11. This allows the formation of a multilayer film structure with decreasing refractive index in the opening region AA1, thereby suppressing multiple reflections, increasing effective light emission, and thus improving the transmittance of the array substrate.

[0069] In some embodiments, the refractive index of the portion of the passivation layer 13 near the second electrode layer 12 is less than the refractive index of the portion of the passivation layer 13 away from the second electrode layer 12. By making the refractive index of the portion of the passivation layer 13 near the light-emitting side less than the refractive index of the underlying first electrode layer 11, the difference in refractive index between the passivation layer 13 and the second electrode layer 12, as well as the difference in refractive index between the passivation layer 13 and the first electrode layer 11, can be reduced. This facilitates the formation of a multilayer film structure with decreasing refractive index near the light-emitting side of the array substrate. This suppresses multiple reflections and reduces light reflection at the interface between the passivation layer and the first electrode layer 11 and the second electrode layer 12, thereby increasing effective light emission and improving the transmittance of the array substrate.

[0070] like Figure 3 As shown, Figure 3 A schematic diagram of the film layer structure of the display area of ​​another array substrate provided in an embodiment of this application, the structure of which is similar to... Figure 2 The array substrates shown have roughly the same structure, the difference being that the passivation layer 13 further includes a second sub-passivation layer 132, which is disposed between the first sub-passivation layer 131 and the first electrode layer 11.

[0071] like Figure 3 As shown, the passivation layer 13 is a double-layer structure formed by stacking a second sub-passivation layer 132 and a first sub-passivation layer 131. The second sub-passivation layer 132 is disposed between the first sub-passivation layer 131 and the first electrode layer 11. The refractive index of the first sub-passivation layer 131 is less than the refractive index of the second sub-passivation layer 132.

[0072] It should be noted that by making the refractive index of the first sub-passivation layer 131 less than that of the second sub-passivation layer 132, the refractive index can be made to decrease along the light emission direction. This can reduce the interface reflection loss between the first sub-passivation layer 131 and the second sub-passivation layer 132, thereby improving the transmittance of the array substrate.

[0073] In some embodiments, the difference in refractive index between the second sub-passivation layer 132 and the first sub-passivation layer 131 is greater than or equal to 0.01 and less than or equal to 0.2. For example, the difference in refractive index between the second sub-passivation layer 132 and the first sub-passivation layer 131 can be 0.01, 0.03, 0.06, 0.09, 0.12, 0.15, 0.18, or 0.2, etc.

[0074] It should be noted that if the difference in refractive index between the second sub-passivation layer 132 and the first sub-passivation layer 131 is too large, the interface reflection loss of light at the interface between the first sub-passivation layer 131 and the second sub-passivation layer 132 will be large, resulting in a decrease in the transmittance of the array substrate. The embodiments of this application limit the difference in refractive index between the second sub-passivation layer 132 and the first sub-passivation layer 131 to between 0.01 and 0.2, thereby reducing the difference in refractive index between the first sub-passivation layer 131 and the second sub-passivation layer 132, reducing the interface reflection loss of light at the interface between the first sub-passivation layer 131 and the second sub-passivation layer 132, and thus improving the transmittance of the array substrate.

[0075] In some embodiments, the absolute value of the difference in refractive index between the second sub-passivation layer 132 and the first electrode layer 11 is greater than or equal to 0 and less than or equal to 0.08. For example, the absolute value of the difference in refractive index between the second sub-passivation layer 132 and the first electrode layer 11 can be 0.01, 0.02, 0.03, 0.04, 0.05, 0.06, 0.07, or 0.08, etc.

[0076] It should be noted that if the difference in refractive index between the second sub-passivation layer 132 and the first electrode layer 11 is too large, the interface reflection loss of light at the interface between the second sub-passivation layer 132 and the first electrode layer 11 will be large, resulting in a decrease in the transmittance of the array substrate. The embodiments of this application limit the difference in refractive index between the second sub-passivation layer 132 and the first electrode layer 11 to between 0 and 0.08, thereby reducing the interface reflection loss of light at the interface between the second sub-passivation layer 132 and the first electrode layer 11, and thus improving the transmittance of the array substrate.

[0077] In some embodiments, the refractive index of the second sub-passivation layer 132 is less than that of the first electrode layer 11. It is only necessary to ensure that the difference between the refractive indices of the first electrode layer 11 and the second sub-passivation layer 132 is between 0 and 0.08 to reduce the interface reflection loss of light at the interface between the second sub-passivation layer 132 and the first electrode layer 11, thereby improving the transmittance of the array substrate.

[0078] In some embodiments, the second sub-passivation layer 132 is made of the same material as the first sub-passivation layer 131, and the refractive index of the second sub-passivation layer 132 is greater than or equal to 1.83 and less than or equal to 1.9. For example, the refractive index of the second sub-passivation layer 132 may be 1.83, 1.85, 1.87, 1.89, or 1.9, etc.

[0079] It should be noted that if the refractive index of the second sub-passivation layer 132 is too high or too low, it will increase the difference in refractive index between the second sub-passivation layer 132 and the first sub-passivation layer 131 and the first electrode layer 11. This results in greater interface reflection loss of light at the interface between the second sub-passivation layer 132 and the first sub-passivation layer 131 and the first electrode layer 11, leading to a decrease in the transmittance of the array substrate. The embodiments of this application limit the refractive index of the second sub-passivation layer 132 to between 1.83 and 1.9, thereby reducing the difference in refractive index between the second sub-passivation layer 132 and the first sub-passivation layer 131 and the first electrode layer 11. This reduces interface reflection loss of light at the interface between the second sub-passivation layer 132 and the first sub-passivation layer 131 and the first electrode layer 11, thereby improving the transmittance of the array substrate.

[0080] In some embodiments, the material of the second sub-passivation layer 132 includes silicon nitride. Silicon nitride has a higher refractive index than silicon oxide and silicon oxynitride. Choosing silicon nitride as the material of the second sub-passivation layer 132 not only ensures that the second sub-passivation layer 132 has good insulation properties, but also ensures that the refractive index of the second sub-passivation layer 132 can reach 1.83 to 1.9.

[0081] In some embodiments, the average refractive index of the first sub-passivation layer 131 and the second sub-passivation layer 132 is less than the refractive index of the first electrode layer 11, and the average refractive index of the first sub-passivation layer 131 and the second sub-passivation layer 132 is greater than the refractive index of the second electrode layer 12. This allows for the formation of multiple layers with decreasing refractive indexes in the portion near the light-emitting side of the array substrate. This suppresses multiple reflections, reduces light reflection at the interface between the second sub-passivation layer 132 and the first electrode layer 11, and reduces light reflection at the interface between the second electrode layer 12 and the first sub-passivation layer 131, thereby increasing effective light emission and improving the transmittance of the array substrate.

[0082] It should be noted that the average refractive index of the first sub-passivation layer 131 and the second sub-passivation layer 132 refers to the weighted average of the refractive indices of the first sub-passivation layer 131 and the second sub-passivation layer 132. For example, if the refractive index of the first sub-passivation layer 131 is n1 and its thickness is d1, and the refractive index of the second sub-passivation layer 132 is n2 and its thickness is d2, then the average refractive index n3 of the first sub-passivation layer 131 and the second sub-passivation layer 132 is n3 = (n1*d1 + n2*d2) / (d1 + d2). The average refractive index of the other two or more layers in the embodiments of this application is also the same, and will not be elaborated here.

[0083] The comparative examples and embodiments provided in this application are as follows:

[0084] Comparative Example 1

[0085] The array substrate includes a first electrode layer 11, a passivation layer 13, and a second electrode layer 12 sequentially stacked in the opening region AA1. The passivation layer 13 is a single-layer structure, and the material of the passivation layer 13 is silicon nitride. The refractive index of the passivation layer 13 is 1.85, the refractive index of the first electrode layer 11 is 1.78, and the refractive index of the second electrode layer 12 is 1.78.

[0086] Example 1

[0087] The array substrate includes a first electrode layer 11, a passivation layer 13, and a second electrode layer 12 sequentially stacked in the opening region AA1. The passivation layer 13 has a double-layer structure and includes a first sub-passivation layer 131 and a second sub-passivation layer 132. The first sub-passivation layer 131 and the second sub-passivation layer 132 are both made of silicon nitride. The refractive index of the first sub-passivation layer 131 is 1.73, the refractive index of the second sub-passivation layer 132 is 1.85, the refractive index of the first electrode layer 11 is 1.78, and the refractive index of the second electrode layer 12 is 1.78.

[0088] Example 2

[0089] The array substrate includes a first electrode layer 11, a passivation layer 13, and a second electrode layer 12 sequentially stacked in the opening region AA1. The passivation layer 13 is a single-layer structure and includes a first sub-passivation layer 131. The first sub-passivation layer 131 is made of silicon nitride and has a refractive index of 1.82. The refractive index of the first electrode layer 11 is 1.82, and the refractive index of the second electrode layer 12 is 1.78.

[0090] Example 3

[0091] The array substrate includes a first electrode layer 11, a passivation layer 13, and a second electrode layer 12 sequentially stacked in the opening region AA1. The passivation layer 13 is a single-layer structure and includes a first sub-passivation layer 131. The first sub-passivation layer 131 is made of silicon nitride and has a refractive index of 1.76. The first electrode layer 11 has a refractive index of 1.78, and the second electrode layer 12 has a refractive index of 1.79.

[0092] Example 4

[0093] The array substrate includes a first electrode layer 11, a passivation layer 13, and a second electrode layer 12 sequentially stacked in the opening region AA1. The passivation layer 13 is a single-layer structure and includes a first sub-passivation layer 131. The first sub-passivation layer 131 is made of silicon oxynitride and has a refractive index of 1.75. The refractive index of the first electrode layer 11 is 1.82, and the refractive index of the second electrode layer 12 is 1.79.

[0094] Combination Figure 4 As shown, Figure 4The figures provided are measured transmittance of the array substrates provided in the comparative examples and embodiments of this application. Because the passivation layer 13 of Comparative Example 1 exceeds the refractive index range of the first sub-passivation layer 131 defined in this application, the difference in refractive index between the passivation layer 13 and the first electrode layer 11 and the second electrode layer 12 also exceeds the range defined in this application, resulting in a transmittance of only 89.62% for Comparative Example 1. In Examples 1-4, the refractive indices of the first sub-passivation layer 131, the second sub-passivation layer 132, the first electrode layer 11, and the second electrode layer 12, as well as the difference in refractive index between adjacent layers, are all within the numerical range defined in this application, resulting in a significant improvement in transmittance of Examples 1-4 compared to Comparative Example 1. Therefore, by making the refractive index of the first sub-passivation layer smaller than that of the first electrode layer, and limiting the absolute value of the difference between the refractive indices of the first sub-passivation layer and the second electrode layer to between 0.03 and 0.09, the interface reflection loss of light at the interface between the first sub-passivation layer and the first electrode layer and the second electrode layer can be reduced, thereby improving the transmittance of the array substrate.

[0095] Based on the array substrate provided in the above embodiments of this application, embodiments of this application also provide a display panel. Please refer to [link to relevant documentation]. Figure 5 , Figure 5 This is a schematic diagram of a display panel provided in an embodiment of this application. The display panel is a liquid crystal display panel. The display panel 100 includes an array substrate 10, a counter substrate 30 disposed opposite to the array substrate 10, and a liquid crystal layer 40 located between the array substrate 10 and the counter substrate 30. The array substrate 10 can be any of the array substrates provided in the above embodiments to achieve the same or similar functions in this embodiment. In some embodiments, such as Figure 5 As shown, the display panel 100 also includes an alignment layer 14, which is disposed on the second electrode layer 12 and the first sub-passivation layer 131. The refractive index of the alignment layer 14 is less than or equal to the refractive index of the second electrode layer 12, or the refractive index of the alignment layer 14 is less than or equal to the refractive index of the first sub-passivation layer 131, so that the refractive index of the first sub-passivation layer 131 or the second electrode layer 12 to the alignment layer 14 changes in a decreasing manner. This can reduce the interface reflection loss of light at the interface between the first sub-passivation layer 131 or the second electrode layer 12 and the alignment layer 14, thereby improving the transmittance of the display panel.

[0096] In some embodiments, the refractive index of the alignment layer 14 is greater than or equal to 1.5 and less than or equal to 1.7. For example, the refractive index of the alignment layer 14 may be 1.5, 1.53, 1.56, 1.58, 1.6, 1.63, 1.66, 1.68 or 1.7, etc.

[0097] It should be noted that if the refractive index of the alignment layer 14 is too high or too low, the difference in refractive index between the alignment layer 14 and the second electrode layer 12 or the first sub-passivation layer 131 will be significant. This will result in a large light drop at the interface between the alignment layer 14 and the first sub-passivation layer 131 or the second electrode layer 12, leading to a decrease in the transmittance of the display panel. The embodiments of this application limit the refractive index of the alignment layer 14 to between 1.5 and 1.7, thereby reducing the difference in refractive index between the alignment layer 14 and the first sub-passivation layer 131 or the second electrode layer 12. This reduces interface reflection loss at the interface between the alignment layer 14 and the first sub-passivation layer 131 or the second electrode layer 12, thereby improving the transmittance of the display panel.

[0098] Based on the display panel provided in the above embodiments of this application, embodiments of this application also provide a display device. Please refer to [link to relevant documentation]. Figure 6 , Figure 6 This is a schematic diagram of a display device provided in an embodiment of this application. The display device 1000 includes a display panel 100 and a housing 200, with the display panel 100 disposed on the housing 200. The display panel 100 can be any of the display panels provided in the above embodiments. The display device provided in the embodiments of this application can achieve the same technical effects as the display panels provided in any of the above embodiments, and will not be described in detail here.

[0099] The beneficial effects of the embodiments of this application are as follows: This application provides an array substrate, a display panel, and a display device. The array substrate includes a first electrode layer, a passivation layer, and a second electrode layer. The second electrode layer and a first sub-passivation layer of the passivation layer are stacked sequentially on the first electrode layer in an opening area. The second electrode layer has a cutout portion to expose the first sub-passivation layer. By making the refractive index of the first sub-passivation layer less than the refractive index of the first electrode layer, and limiting the absolute value of the difference between the refractive indices of the first sub-passivation layer and the second electrode layer to between 0 and 0.09, the interface reflection loss of light at the interface between the first sub-passivation layer and the first electrode layer and the second electrode layer can be reduced, thereby improving the transmittance of the array substrate.

[0100] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more features. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0101] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0102] The embodiments, implementation methods, and related technical features of this application can be combined and substituted for each other without conflict.

[0103] The above are merely preferred embodiments of this application and are not intended to limit this application in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of this application without departing from the scope of the technical solution of this application shall still fall within the scope of the technical solution of this application.

Claims

1. An array substrate, characterized by, An array substrate having a display area including an opening area, the array substrate comprising: a first electrode layer; a passivation layer including a first sub-passivation layer disposed on a side of the first electrode layer; a second electrode layer disposed on a side of the first sub-passivation layer distal to the first electrode layer, the second electrode layer in the opening area having a hollow portion exposing a portion of the first sub-passivation layer; wherein a refractive index of the first sub-passivation layer is less than a refractive index of the first electrode layer.

2. The array substrate of claim 1, wherein, a difference between the refractive index of the first sub-passivation layer and the second electrode layer is less than a difference between the refractive index of the first electrode layer and the first sub-passivation layer.

3. The array substrate of claim 2, wherein, a difference between the refractive index of the first sub-passivation layer and the second electrode layer is a first difference, and a difference between the refractive index of the first electrode layer and the first sub-passivation layer is a second difference; wherein a difference between the second difference and the first difference is greater than 0 and less than or equal to 0.

05.

4. The array substrate of claim 1, wherein, a refractive index of the second electrode layer is less than a refractive index of the first sub-passivation layer.

5. The array substrate of claim 4, wherein, a difference between the refractive index of the first sub-passivation layer and the second electrode layer is greater than 0 and less than or equal to 0.

09.

6. The array substrate of claim 1, wherein, a difference between the refractive index of the first electrode layer and the first sub-passivation layer is greater than or equal to 0.03 and less than or equal to 0.

12.

7. The array substrate of claim 1, wherein, a material of the passivation layer includes silicon nitride or silicon oxynitride.

8. The array substrate of claim 1, wherein, a refractive index of a portion of the passivation layer proximate to the second electrode layer is less than a refractive index of a portion of the passivation layer distal to the second electrode layer.

9. The array substrate of claim 8, wherein, the passivation layer further includes a second sub-passivation layer disposed between the first sub-passivation layer and the first electrode layer, a refractive index of the first sub-passivation layer being less than a refractive index of the second sub-passivation layer.

10. The array substrate of claim 9, wherein, the second sub-passivation layer and the first sub-passivation layer are of the same material, and a difference between the refractive index of the second sub-passivation layer and the first sub-passivation layer is greater than or equal to 0.01 and less than or equal to 0.

2.

11. A display panel, characterized by, an array substrate as claimed in any one of claims 1 to 10.

12. The display panel of claim 11, wherein, the display panel further includes an alignment layer disposed on the second electrode layer and the first sub-passivation layer; wherein a refractive index of the alignment layer is less than or equal to a refractive index of the second electrode layer; or, a refractive index of the alignment layer is less than or equal to a refractive index of the first sub-passivation layer.

Images