Z-axis driven self-focusing photoetching device

Abstract

The invention provides a Z-axis driving self-focusing photoetching device, which belongs to the technical field of photoetching or exposure processing, and comprises a Z-axis driving module, an exposure lens barrel and a height measurement laser, the exposure lens barrel is connected to the Z-axis driving module, and the height measurement laser is arranged at the upstream of the exposure lens barrel; and the Z-axis driving module adjusts the height of the exposure lens cone according to the height of the processing surface detected by the height measurement laser, so that automatic focusing of photoetching processing is realized. Exposure self-focusing is set to be exposure head Z-axis independent driving focusing, the effective service life of focusing and efficient focusing efficiency are guaranteed, a synergistic scheme is provided for photoetching or exposure, and popularization and application in the exposure processing fields of PCBs, IC carrier plates, carved large plates and the like are facilitated.

Description

Technical Field

[0001] This invention belongs to the field of photolithography or exposure processing, and specifically relates to a Z-axis driven self-focusing photolithography device. Background Technology

[0002] In lithography or exposure equipment, traditional setups involve multiple exposure heads that rely on objective lens groups for autofocus. This leads to a decrease in the lifespan or failure of optical components over time, and the response speed is not high, affecting the overall processing efficiency. This is especially true for laser direct-write imaging technology (LDI), where changing the focusing method is crucial for improving efficiency. Summary of the Invention

[0003] In order to overcome the shortcomings of the prior art, the present invention aims to provide a Z-axis driven self-focusing lithography device that can solve the above-mentioned problems.

[0004] A Z-axis driven self-focusing lithography apparatus includes a Z-axis drive module, an exposure lens barrel, and a height-measuring laser; the exposure lens barrel is connected to the Z-axis drive module, and the height-measuring laser is arranged upstream of the exposure lens barrel; the Z-axis drive module adjusts the height of the exposure lens barrel according to the height of the processing surface detected by the height-measuring laser, thereby realizing automatic focusing in lithography processing.

[0005] Furthermore, multiple exposure tubes are connected to corresponding Z-axis drive modules via independent drive mounts, enabling each Z-axis drive module to independently drive and control the height of each exposure tube, thus achieving independent autofocus for multiple exposure tubes.

[0006] Furthermore, the Z-axis drive module includes a drive plate, a Z-axis motor, a Z-axis adapter plate, and a load balancing damper; the Z-axis motor is located between the drive plate and the Z-axis adapter plate to drive the Z-axis adapter plate to rise and fall; the load balancing damper is located between the load mounting cavity vertically opened on the Z-axis adapter plate and the top of the drive plate; the drive frame is connected to the outer plate surface of the Z-axis adapter plate.

[0007] Furthermore, two guide sliding modules are vertically installed between the drive plate and the Z-axis transition plate, and a lifting detection grating unit is installed at the bottom of the Z-axis transition plate.

[0008] Furthermore, an exposure light source and an image acquisition device are set at the top of the exposure lens barrel. The exposure light source and the image acquisition device are coupled through a semi-transparent mirror to form an illumination processing optical path and an imaging acquisition optical path.

[0009] Furthermore, a water-cooling module is installed at the exposure light source, and an axial air-cooling module is installed at the mounting points of the Z-axis drive module and the exposure lens barrel.

[0010] Furthermore, a height-measuring laser is mounted on the crossbeam of the front gantry; a pre-alignment module is also mounted on the crossbeam of the front gantry for optical alignment of the workpiece to be processed on the moving platform below.

[0011] Furthermore, the exposure light source is set on the top surface of the rear gantry beam, and the drive plate of the Z-axis drive module is vertically connected to the front side of the rear gantry beam.

[0012] Compared with the prior art, the beneficial effects of the present invention are as follows: The present application sets the exposure self-focusing as an independent Z-axis drive for focusing, which ensures the effective lifespan of the focus and high focusing efficiency, providing an efficiency-enhancing solution for photolithography or exposure, and facilitating its application in the fields of exposure processing such as PCB, IC substrate, and large-format PCB. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of an example of the Z-axis driven self-focusing lithography apparatus of the present invention; Figure 2 This is a schematic diagram of the Z-axis drive module; Figure 3 This is a schematic diagram of the Z-axis motor; Figure 4 Three groups Figure 1 Example diagram; Figure 5 This is a schematic diagram of an example of a Z-axis driven self-focusing lithography apparatus.

[0014] In the picture: 10. Z-axis drive module; 11. Drive plate; 12. Z-axis motor; 121. Motor stator; 122. Motor mover; 13. Z-axis adapter plate; 14. Load balancing damper; 15. Guide sliding module; 16. Lifting detection grating unit; 17. Motor mounting top block; 20. Exposure tube; 30. Altimeter laser; 40. Exposure light source; 50. Image acquisition device; 60. Drive frame; 70. Water-cooled module; 80. Axial flow air-cooled module; 90. Mobile platform; 100. Pre-alignment module; 110. Front gantry; 120. Rear gantry; 130. Device base. Detailed Implementation

[0015] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0016] A Z-axis driven self-focusing lithography device, see [link / reference] Figures 1-5 It includes a Z-axis drive module 10, an exposure lens barrel 20, and a height measuring laser 30; the exposure lens barrel 20 is connected to the Z-axis drive module 10, and the height measuring laser 30 is arranged upstream of the exposure lens barrel 20; the Z-axis drive module 10 adjusts the height of the exposure lens barrel 20 according to the height of the processing surface detected by the height measuring laser 30, so as to realize automatic focusing in photolithography.

[0017] See Figure 3 Multiple exposure tubes 20 are connected to corresponding Z-axis drive modules 10 via independent drive brackets 60, enabling each Z-axis drive module 10 to independently drive and control the height of each exposure tube 20, thus achieving independent autofocus for multiple exposure tubes 20. The illustrated example uses three sets arranged side-by-side; however, more sets can be used, depending on the width of the workpiece or overall design requirements.

[0018] See Figure 2 The Z-axis drive module 10 includes a drive plate 11, a Z-axis motor 12, a Z-axis transfer plate 13, and a load balancing damper 14. The Z-axis motor 12 is disposed between the drive plate 11 and the Z-axis transfer plate 13 to drive the Z-axis transfer plate 13 to rise and fall. The load balancing damper 14 is disposed between the load mounting cavity vertically opened on the Z-axis transfer plate 13 and the top of the drive plate 11. The drive frame 60 is connected to the outer plate surface of the Z-axis transfer plate 13.

[0019] Two guide sliding modules 15 are also vertically arranged between the drive plate 11 and the Z-axis transfer movable plate 13 to provide lifting guidance and improve lifting stability.

[0020] A lifting detection grating unit 16 is set at the bottom of the Z-axis adapter plate 13.

[0021] In the specific example, the Z-axis motor 12 is a linear motor. Figure 3 The example uses a tubular or rod-shaped linear motor. It includes a motor stator rod 121 and a motor mover 122. The motor mover 122 has a rectangular interface for connecting to the back of the Z-axis adapter plate 13.

[0022] The load balancing damper 14 is either a spring or a cylinder; the illustrated example uses a balancing spring. The guide sliding module 15 uses a slide rail slider assembly, and the lifting detection grating unit 16 includes a grating ruler, a grating ruler mounting bracket, a reading head, and a reading head mounting plate.

[0023] A motor mounting block 17 is horizontally set on the top of the drive plate 11, and the top of the stator of the Z-axis motor 12 is connected to the bottom surface of the motor mounting block 17; the top of the load balancing damper 14 is connected to the bottom or outer end of the motor mounting block 17.

[0024] In the illustrated example, the bottom of the load mounting cavity of the Z-axis adapter plate 13 is provided with a load lower mounting shaft, the outer end of the motor mounting top block 17 is provided with a load upper mounting shaft, and the upper and lower ends of the load balancing damper 14 are installed to the corresponding load lower mounting shaft and load upper mounting shaft.

[0025] An exposure light source 40 and an image acquisition device 50 are arranged on the top of the exposure tube 20. The exposure light source 40 and the image acquisition device 50 are coupled through a semi-transparent mirror to form an illumination processing optical path and an imaging acquisition optical path.

[0026] In the illustrated example, the exposure light source 40 is a multi-band adjustable laser source in both ultraviolet and deep ultraviolet light. The image acquisition unit 50 uses a DMD sensor.

[0027] Cooling design: A water-cooled module 70 is installed at the exposure light source 40, and an axial air-cooled module 80 is installed at the mounting points of the Z-axis drive module 10 and the exposure lens barrel 20.

[0028] The height measuring laser 30 is mounted on the crossbeam of the front gantry 110; a pre-alignment module 100 is also mounted on the crossbeam of the front gantry 110 for optical alignment of the workpiece to be processed on the moving platform 90 below.

[0029] Exposure light source 40 is set on the top surface of the crossbeam of the rear gantry 120, and the drive plate 11 of the Z-axis drive module 10 is vertically connected to the front side of the crossbeam of the rear gantry 120.

[0030] The movable stage 90 is disposed on the upper surface of the device base 130.

[0031] In the illustrated example, the two columns of the front gantry 110 and the rear gantry 120 are both located on both sides of the device base 130, which is made of marble.

[0032] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A Z-axis drive auto-focusing photolithography device, characterized by: The Z-axis drive module (10), the exposure lens barrel (20) and the height measuring laser (30) are included. The exposure lens barrel (20) is connected to the Z-axis drive module (10), and the height measuring laser (30) is arranged upstream of the exposure lens barrel (20). The Z-axis drive module (10) adjusts the height of the exposure lens barrel (20) according to the height of the processing surface detected by the height measuring laser (30), so as to realize automatic focusing of the photoetching processing.

2. The Z-axis drive autofocus photolithography apparatus of claim 1, wherein: The plurality of exposure lens barrels (20) are connected to the corresponding Z-axis drive modules (10) through independent drive frames (60), so as to realize independent drive control of the height of each exposure lens barrel (20) by each Z-axis drive module (10) and independent self-focusing of the plurality of exposure lens barrels (20).

3. The Z-axis drive autofocus photolithography apparatus of claim 2, wherein: The Z-axis drive module (10) includes a drive vertical plate (11), a Z-axis motor (12), a Z-axis adapter movable plate (13) and a load balancing damper (14). The Z-axis motor (12) is arranged between the drive vertical plate (11) and the Z-axis adapter movable plate (13) to drive the Z-axis adapter movable plate (13) to rise and fall. The load balancing damper (14) is arranged in a vertically arranged load mounting cavity of the Z-axis adapter movable plate (13) and the top of the drive vertical plate (11). The drive frame (60) is connected to the outer plate surface of the Z-axis adapter movable plate (13).

4. The Z-axis drive autofocus photolithography apparatus of claim 3, wherein: Two guide sliding modules (15) are vertically arranged between the drive vertical plate (11) and the Z-axis adapter movable plate (13), and a lifting detection grating unit (16) is arranged at the bottom of the Z-axis adapter movable plate (13).

5. The Z-axis drive autofocus photolithography apparatus of claim 3, wherein: A motor mounting top block (17) is horizontally arranged at the top of the drive vertical plate (11). The top of the stator of the Z-axis motor (12) is connected to the bottom surface of the motor mounting top block (17). The top of the load balancing damper (14) is connected to the bottom or outer end of the motor mounting top block (17).

6. The Z-axis drive autofocus photolithography apparatus of claim 1, wherein: An exposure light source (40) and an image collector (50) are arranged at the top of the exposure lens barrel (20). The exposure light source (40) and the image collector (50) are coupled into an illumination processing light path and an imaging collection light path through a half-transmission half-reflection mirror.

7. The Z-axis drive autofocus photolithography apparatus of claim 1, wherein: A water cooling module (70) is arranged at the exposure light source (40), and an axial flow air cooling module (80) is arranged at the mounting position of the Z-axis drive module (10) and the exposure lens barrel (20).

8. The Z-axis drive autofocus photolithography apparatus of claim 1, wherein: The height measuring laser (30) is arranged on the cross beam of the front gantry (110). A pre-alignment module (100) is also arranged on the cross beam of the front gantry (110) to optically align the workpiece on the lower moving platform (90).

9. The Z-axis drive autofocus photolithography apparatus of claim 3, wherein: The exposure light source (40) is arranged on the top surface of the cross beam of the rear gantry (120), and the drive vertical plate (11) of the Z-axis drive module (10) is vertically connected to the front side surface of the cross beam of the rear gantry (120).

10. The Z-axis drive autofocus photolithography apparatus of claim 8, wherein: The moving platform (90) is arranged on the upper surface of the device base (130).

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