Glass cover plate processing method

Abstract

The invention discloses a glass cover plate processing method, and belongs to the technical field of glass cover plates. The method comprises the following steps: S1, preparing a glass cover plate base material; s2, a hard film and a polishing auxiliary film are sequentially deposited on the surface of the base material, the hard film is composed of alternating high / low refractive index layers, and the thickness of the polishing auxiliary film ranges from 10 nm to 50 nm; s3, the polishing auxiliary film is polished through a polishing medium with the Mohs hardness being 2, and the polishing auxiliary film is removed to reduce the surface roughness of the hard film; s4, printing an ink layer on the surface opposite to the coated surface of the glass cover plate substrate; and S5, preparing the anti-fingerprint film on the surface of the polished hard film. According to the method, the scratch resistance and the surface quality of the glass cover plate are remarkably improved through an innovative multi-layer film structure design and a polishing process.

Description

Technical Field

[0001] This invention relates to the field of glass cover technology, and more particularly to a glass cover processing method. Background Technology

[0002] Glass covers are widely used in the display panels of electronic products such as smartphones, tablets, and wearable devices. Their surfaces not only need excellent optical properties but also superior wear resistance, scratch resistance, and aesthetics. As consumers' demands for the appearance and texture of electronic products continue to increase, surface treatment technology for glass covers has become a key research focus. Current technologies often improve the hardness and wear resistance of glass substrates by depositing hard films on the surface. However, the deposition process of hard films can easily produce surface roughness, affecting the appearance quality and user experience, and even under high hardness testing, minor scratches may still appear.

[0003] Therefore, there is an urgent need for a processing method that can significantly improve the scratch resistance of glass covers, effectively reduce surface roughness, and ensure the quality of subsequent processes. Summary of the Invention

[0004] The technical problem to be solved by the present invention is to provide a glass cover plate processing method in view of the above-mentioned defects of the prior art.

[0005] To achieve the above objectives, the present invention provides a glass cover plate processing method, the method comprising the following steps:

[0006] Step S1: Prepare a glass cover substrate with the desired appearance and size;

[0007] Step S2: A hard film and a polishing auxiliary film are sequentially deposited on the surface of the glass cover substrate; wherein the hard film is composed of multiple alternating high refractive index layers and low refractive index layers; the thickness of the polishing auxiliary film is set between 10 nm and 50 nm.

[0008] Step S3: Polish the polishing auxiliary film with a polishing medium having a Mohs hardness of 2 to remove the polishing auxiliary film and reduce the surface roughness of the hard film.

[0009] Step S4: Print an ink layer on the opposite side of the coated surface of the glass cover substrate;

[0010] Step S5: Prepare an anti-fingerprint film on the surface of the polished hard film.

[0011] In the glass cover plate processing method of the present invention, the glass cover plate substrate has a 2D or 2.5D structure, step S1 includes a chemical strengthening process, and after the chemical strengthening process and before the coating process, it further includes:

[0012] The glass cover substrate is subjected to double-sided unequal thickness polishing pretreatment to offset the deformation in the subsequent coating process. The amount of polishing on the surface to be coated is greater than the amount of polishing on the opposite surface.

[0013] In the glass cover plate processing method of the present invention, the glass cover plate substrate has a 3D structure, step S1 includes a chemical strengthening process, and a hot bending process is included before the chemical strengthening process.

[0014] In the hot bending process, the glass cover substrate is pretreated by designing the mold and hot bending parameters to offset the deformation in the subsequent coating process.

[0015] In the glass cover plate processing method of the present invention, the materials of the high refractive index layer and the low refractive index layer are SiOxNy.

[0016] In the glass cover processing method of the present invention, the material of the polishing auxiliary film is the same as the material of the outermost high refractive index layer or low refractive index layer of the corresponding hard film.

[0017] In the glass cover plate processing method of the present invention, step S3 includes:

[0018] The thickness of the polishing auxiliary film is used as the target removal amount. The polishing parameters are determined according to the correspondence between the removal amount and the polishing parameters. The polishing auxiliary film is removed using the polishing parameters to expose the hard film.

[0019] The method for generating the correspondence between the removal amount and the polishing parameters includes the following steps, wherein the material of the target film layer is the same as the material of the polishing auxiliary film:

[0020] Step a1: Obtain multiple sets of target film thickness and corresponding Lab values ​​of the target film thickness through simulation; the material of the target film is the same as that of the polishing auxiliary film;

[0021] Step a2: Fit the relationship curve between the target film thickness and the Lab value of reflection based on the simulation results;

[0022] Step a3: Prepare a target film layer on the surface of a glass substrate and test its initial reflectance Lab value. Obtain the initial thickness value of the target film layer based on the initial reflectance Lab value and the relationship curve.

[0023] Step a4: Perform trial polishing on the target film layer using a polishing medium with a Mohs hardness of 2, then test the reflection Lab value of the target film layer after polishing, obtain the thickness value of the target film layer after polishing based on the reflection Lab value of the target film layer after polishing and the relationship curve, and calculate the amount of material removed based on the thickness value of the target film layer after polishing and the initial thickness value of the target film layer.

[0024] Step a5: Repeat step a4. During the trial polishing process, adjust the polishing parameters, including polishing time, polishing machine speed, and polishing medium concentration, to obtain the corresponding relationship between different polishing amounts and polishing parameters.

[0025] The glass cover plate processing method provided by the present invention has the following beneficial effects:

[0026] 1. By constructing a hard film composed of alternating high / low refractive index layers, the film hardness is significantly improved, and no scratches are observed under a Mohs hardness of 7 and a 500g load, meeting the stringent requirements for wear resistance in high-end electronic products.

[0027] 2. By introducing a polishing auxiliary film with a specific thickness of 10–50 nm and polishing with a soft polishing medium with a Mohs hardness of 2, the polishing auxiliary film can be precisely removed and the surface smoothed without damaging the hard film, significantly improving the appearance quality.

[0028] 3. The high flatness of the polished hard film surface provides an ideal base for the firm adhesion of the anti-fingerprint film, improving product yield and reliability.

[0029] 4. The multi-layer structure design of the rigid film can adjust the optical refractive index, which helps to achieve specific visual effects and improve the user experience.

[0030] 5. The thickness of the polishing auxiliary film and the polishing parameters are precisely controllable, ensuring the consistency and stability of the processing, making it suitable for large-scale production. Attached Figure Description

[0031] The accompanying drawings, which are included to provide a further understanding of the invention and form part of this invention, illustrate exemplary embodiments of the invention and are used to explain the invention, but do not constitute an undue limitation of the invention. In the drawings:

[0032] Figure 1 This is a schematic diagram of the glass cover plate processing method steps provided in an embodiment of the present invention.

[0033] Figure 2 This is a schematic diagram illustrating the measurement of glass cover plate size changes provided in an embodiment of the present invention.

[0034] Figure 3 This is a line graph summarizing the transmission Lab values ​​of the finished products from multiple embodiments of the present invention.

[0035] Figure 4 This is a line graph summarizing the transmittance of the finished products from multiple embodiments of the present invention. Detailed Implementation

[0036] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0037] The embodiments of the present invention will now be described in further detail with reference to the accompanying drawings. It should be understood that the embodiments described herein are for illustrative and explanatory purposes only and are not intended to limit the scope of the invention.

[0038] The glass cover processing method of the present invention is used to enhance the scratch resistance of the glass cover while ensuring its optical performance, and is applicable to 2D glass cover, 2.5D glass cover, and 3D glass cover.

[0039] like Figure 1 As shown, this embodiment of the invention provides a method for processing a glass cover plate, the method comprising the following steps:

[0040] Step S1: Prepare a glass cover substrate with the desired appearance and size.

[0041] Glass cover plate processing involves a series of precision procedures, with a long process flow, high quality requirements, and strict yield control. Depending on the application (e.g., 2D flat covers or 3D curved covers), the procedures may vary slightly, but the core process can be summarized into five main stages: preliminary preparation and rough machining, forming and finishing, strengthening and surface treatment, cleaning and bonding, and quality inspection and packaging. The basic processing flow of glass covers is existing technology and will not be elaborated upon here.

[0042] like Figure 2As shown in the embodiment of the invention, multiple measuring lines (outer length 1, outer length 2, outer length 3, outer width 1, outer line width 2, outer width 3, outer width 4, outer width 5) are set along the length and width of the glass cover plate to measure its length and width. Multiple measuring points (H1-H10) are set at the edge of the glass cover plate to measure its height, where H1, H5, H6, and H10 are located near the four corners of the glass cover plate. In this embodiment, 300 3D glass cover plate products were randomly sampled, and the average dimensional values ​​and dimensional increase values ​​of each process were tested. The results are shown in Table 1. As can be seen from Table 1, each process in the glass cover plate manufacturing introduces some dimensional changes. Therefore, in this embodiment, strict flatness control is implemented in each process of glass cover plate manufacturing. Especially in the coating process, coating causes significant deformation of the glass cover plate, and the coated surface becomes convex. As shown in Table 1, the height changes at detection points H1, H5, H6, and H10 after coating are significantly greater than those at other detection points. In this embodiment of the invention, the glass is pretreated before coating to offset the deformation caused by the coating process, ensuring that the final product meets the expected flatness. Table 1 shows the results after pretreatment. Although the coating process causes significant deformation, the pretreatment provides compensation, offsetting the deformation during coating, resulting in minimal changes in the length and width of the final product.

[0043] Table 1 Summary of Dimensional Changes in Each Process of Glass Cover Plate Making

[0044]

[0045] In some embodiments of the present invention, the glass cover substrate has a 2D or 2.5D structure, and step S1 includes a chemical strengthening process. After the chemical strengthening process and before the coating process, the method further includes:

[0046] The glass cover substrate is subjected to double-sided unequal thickness polishing pretreatment to offset the deformation in the subsequent coating process. The amount of polishing on the surface to be coated is greater than the amount of polishing on the opposite surface.

[0047] For 2D or 2.5D glass cover substrates, the central portion is planar. If no pretreatment is performed before coating, the central planar portion will become arched after coating, the coated surface will become convex, and the opposite surface will become concave. Therefore, in this embodiment of the invention, after the chemical strengthening process and before the coating process, the glass cover substrate undergoes a double-sided unequal thickness polishing pretreatment, where the polishing amount on the surface to be coated is greater than the polishing amount on the opposite surface. The deformation caused by the coated surface is related to the film thickness and refractive index; the greater the film thickness and the greater the refractive index, the greater the final deformation. In actual implementation, the polishing amounts of the coated surface and its opposite surface need to be set according to the film thickness, structure, material, and the deformation after coating.

[0048] In other embodiments of the present invention, the glass cover substrate has a 3D structure, and step S1 includes a chemical strengthening process, which is preceded by a hot bending process.

[0049] In the hot bending process, the glass cover substrate is pretreated by designing the mold and hot bending parameters to offset the deformation in the subsequent coating process.

[0050] For 3D glass cover substrates, the central portion is typically a curved surface with a small curvature. If no pretreatment is performed before coating, the curvature of this central surface will increase after coating, which does not match the expected result. Therefore, in this embodiment of the invention, the 3D glass cover substrate undergoes pretreatment during the hot bending process to offset the deformation in the subsequent coating process. How to compensate for the deformation through mold design and hot bending parameter design depends on the thickness, structure, and material of the film layer, as well as the deformation itself.

[0051] Step S2: A hard film and a polishing auxiliary film are sequentially deposited on the surface of the glass cover substrate; wherein, the hard film is composed of multiple alternating high refractive index layers and low refractive index layers, and no scratches are found after a scratch test under the conditions of Mohs hardness of 7 and a load of 500 grams; the thickness of the polishing auxiliary film is set between 10 nm and 50 nm.

[0052] Because the rigid film is fabricated on the surface of the glass cover product, high transmittance is required. In this embodiment of the invention, the rigid film is formed by alternating stacks of high and low refractive index materials, utilizing light wave interference to cancel reflected light, thereby improving transmittance. This embodiment of the invention does not impose special restrictions on the materials of the high and low refractive index layers, as long as the optical properties and scratch resistance of the rigid film meet the expectations.

[0053] In some embodiments of the present invention, the high-refractive-index layer and the low-refractive-index layer are made of SiOxNy. The chemical composition of SiOxNy (silicon oxynitride) is between that of SiO2 and Si3N4, and the refractive index can be continuously controlled by adjusting the ratio of oxygen (O) and nitrogen (N). With high nitrogen content, SiOxNy is close to Si3N4, with a higher refractive index, which effectively reduces reflection. With high oxygen content, SiOxNy is close to SiO2, with a lower refractive index. Both Si3N4 and SiO2 have high hardness; the Vickers hardness of Si3N4 is typically 15-20 GPa, while that of SiO2 is approximately 10-12 GPa. Therefore, the hard film prepared by alternating stacks of high-refractive-index and low-refractive-index SiOxNy layers has extremely high hardness. In the embodiments of the present invention, a hard film is deposited on the surface of a glass cover substrate by magnetron sputtering, using a Si target, and the alternation of high-refractive-index and low-refractive-index deposition layers is achieved by precisely controlling the oxygen / nitrogen ratio.

[0054] In other embodiments of the present invention, the high refractive index material is AlN and the low refractive index material is SiO2.

[0055] In this embodiment of the invention, the material of the polishing auxiliary film is the same as the material of the outermost high refractive index layer or low refractive index layer of the corresponding hard film.

[0056] In this embodiment of the invention, the purpose of setting the polishing auxiliary film is to improve the surface roughness of the hard film. If the polishing auxiliary film is too thin, the polishing effect is poor; if it is too thick, the polishing precision is difficult to control, which will lead to a deterioration in the color and transmittance of the hard film. In this embodiment of the invention, preferably, the thickness of the polishing auxiliary film is 10nm to 50nm. Theoretically, the polishing auxiliary film can be made of any material. To simplify the process and to prevent incomplete polishing from affecting the optical performance of the hard film, in this embodiment of the invention, the material of the polishing auxiliary film is the same as the material of the outermost high-refractive-index layer or low-refractive-index layer of the hard film opposite to it. That is, if the side of the hard film closest to the polishing auxiliary film is a high-refractive-index layer, the polishing auxiliary film uses the same material as this high-refractive-index layer; if the side of the hard film closest to the polishing auxiliary film is a low-refractive-index layer, the polishing auxiliary film uses the same material as this low-refractive-index layer. This is equivalent to the thickness of the outermost high-refractive-index layer or low-refractive-index layer being the sum of the design value and the thickness of the polishing auxiliary film during the preparation of the hard film.

[0057] Step S3: Polish the polishing auxiliary film with a polishing medium having a Mohs hardness of 2 to remove the polishing auxiliary film and reduce the surface roughness of the hard film.

[0058] To minimize the surface roughness of the hard film, a polishing medium with a Mohs hardness of 2 is used in this embodiment of the invention. Furthermore, the thickness of the polishing auxiliary film in this embodiment is at the nm level, and conventional polishing methods cannot achieve precise control of the amount of material removed. Therefore, this embodiment of the invention employs a unique polishing method. Specifically, step S3 includes:

[0059] The thickness of the polishing auxiliary film is used as the target removal amount. The polishing parameters are determined according to the correspondence between the removal amount and the polishing parameters. The polishing auxiliary film is removed using the polishing parameters to expose the hard film.

[0060] The method for generating the correspondence between the removal amount and the polishing parameters includes the following steps:

[0061] Step a1: Obtain multiple sets of target film thickness and corresponding Lab values ​​of the target film thickness through simulation; the material of the target film is the same as that of the polishing auxiliary film;

[0062] Step a2: Fit the relationship curve between the target film thickness and the Lab value of reflection based on the simulation results;

[0063] Step a3: Prepare a target film layer on the surface of a glass substrate and test its initial reflectance Lab value. Obtain the initial thickness value of the target film layer based on the initial reflectance Lab value and the relationship curve.

[0064] Step a4: Perform trial polishing on the target film layer using a polishing medium with a Mohs hardness of 2, then test the reflection Lab value of the target film layer after polishing, obtain the thickness value of the target film layer after polishing based on the reflection Lab value of the target film layer after polishing and the relationship curve, and calculate the amount of material removed based on the thickness value of the target film layer after polishing and the initial thickness value of the target film layer.

[0065] Step a5: Repeat step a4. During the trial polishing process, adjust the polishing parameters, including polishing time, polishing machine speed, and polishing medium concentration, to obtain the corresponding relationship between different polishing amounts and polishing parameters.

[0066] After coating the glass surface, the reflectance Lab value (i.e., a quantitative index of reflected color) is directly related to the film thickness. This is because different film thicknesses lead to the suppression of reflected light of different wavelengths due to destructive interference, resulting in changes in the reflection spectrum and color. Therefore, in this embodiment of the invention, sufficient data on the correspondence between different film thicknesses and reflectance Lab values ​​are first obtained through simulation. Then, a relationship curve between the target film thickness and the reflectance Lab value is fitted. Next, the target film is prepared on the surface of the glass substrate, and multiple trial polishings are performed. After each trial polishing, the reflectance Lab value of the polished target film is measured, and the corresponding thickness is calculated based on the relationship curve. This allows for the calculation of the amount of material removed each time, obtaining the correspondence between different amounts of material removed and polishing parameters. Then, the thickness of the polishing auxiliary film is used as the target amount of material removed. Based on the correspondence, the target polishing parameters are found, and precise polishing can be achieved by using the target polishing parameters.

[0067] Preferably, in this embodiment of the invention, a polishing medium with a Mohs hardness of 2 is used for polishing to obtain ideal surface roughness and dynamic friction coefficient. If the Mohs hardness of the polishing medium is too high, even if the amount of material removed is well controlled, the surface roughness and dynamic friction coefficient will not meet expectations. In some embodiments of the invention, a powdered polishing medium with a Mohs hardness of 2 is used for polishing for 30 seconds, with a removal amount of 10 nm. The dynamic friction coefficients of each embodiment after polishing are shown in Table 2. As can be seen from Table 2, when the removal amount is 10 nm, the dynamic friction coefficients of each embodiment are less than 0.04, which meets the industry standards for glass covers. The optical performance parameters of each embodiment before and after polishing ("polishing" specifically refers to polishing the polishing auxiliary film) are shown in Table 3. As can be seen from Table 3, the difference in optical performance parameters of the glass cover before and after polishing is very small, and the effect of polishing on optical performance can be ignored.

[0068] Table 2 Summary of dynamic friction coefficients after polishing in each embodiment

[0069] Example coefficient of kinetic friction 1# 0.035 2# 0.027 3# 0.028 4# 0.031 5# 0.025 6# 0.034 7# 0.040 8# 0.025 9# 0.024 10# 0.020

[0070] Table 3 Comparison of optical performance before and after polishing in each embodiment

[0071]

[0072] Step S4: Print an ink layer on the opposite side of the coated surface of the glass cover substrate;

[0073] In this embodiment of the invention, for 2D and 2.5D glass covers, the ink layer is prepared by screen printing, and for 3D glass covers, the ink layer is prepared by pad printing.

[0074] Step S5: Prepare an anti-fingerprint film on the surface of the polished hard film.

[0075] In this embodiment of the invention, AF anti-fingerprint solution is sprayed onto the surface of the polished hard film and then dried to obtain an anti-fingerprint film.

[0076] In this embodiment of the invention, a hard film with high hardness and scratch resistance is first formed on the surface of the glass cover substrate, and a polishing auxiliary film is added on top of it. Next, the polishing auxiliary film is removed using a polishing material with extremely low hardness, effectively reducing the surface roughness of the hard film. Subsequently, an anti-fingerprint film is added to the finely processed surface of the hard film. Because the surface of the hard film is extremely smooth, it helps to reduce the dynamic coefficient of friction of the AF film surface, enhances the sliding feel, and thus significantly improves the scratch resistance of the finished glass cover.

[0077] In this embodiment of the invention, the transmission Lab value and transmittance of the prepared glass cover are shown in Tables 4 and 5. The summary line graphs of transmission Lab values ​​and transmittance of all embodiments are shown in Tables 4 and 5, respectively. Figure 3 and Figure 4 As shown, the Lab values ​​and reflectance are presented in Table 6. The L*, a*, and b* values ​​are the results measured under D65 standard light source conditions. The 15 examples were obtained by randomly selecting one glass cover from each of 15 batches of finished glass cover production, according to Tables 4-6. Figure 3 , Figure 4 The test data shows that the transmission Lab value, transmittance, reflection Lab value, and reflectance of each embodiment meet the optical performance requirements of the glass cover product. Furthermore, the results of all embodiments are highly consistent, proving that the solution of the present invention has little impact on the optical performance of the glass cover product, is highly stable, and is suitable for large-scale production.

[0078] Table 4. Transmission Lab values ​​and transmittance of the finished products from Examples 1-8

[0079] Example 1# 2# 3# 4# 5# 6# 7# 8# L* 96.64 97.2 97.28 97.34 97.34 97.3 97.16 97.29 a* -0.15 -0.17 -0.16 -0.13 -0.17 -0.16 -0.17 -0.18 b* 0.09 0.14 0.09 0.3 0.14 0.13 0.07 0.1 360nm 89.04 90.12 90.7 90.19 90.53 90.57 90.45 90.54 380nm 90.05 91.34 91.68 91.34 91.67 91.66 91.51 91.63 450nm 91.88 92.87 93.2 92.94 93.25 93.07 92.9 93.18 460nm 91.3 92.89 92.98 92.91 93.09 93.19 92.69 93.06 520nm 92.1 93.42 93.47 93.44 93.58 93.57 93.08 93.58 540nm 91.12 92.52 92.89 93.18 93.1 92.83 92.7 92.81 550nm 92.39 93.16 93.66 93.63 93.75 93.29 93.46 93.53 580nm 90.46 92.22 92.39 92.89 92.62 92.58 92.08 92.37 620nm 90.76 92.85 92.54 93.06 92.79 93.21 92.11 92.75 630nm 90 91.89 91.93 92.66 92.2 92.35 91.63 91.98 700nm 89.92 91.32 91.63 92.4 91.89 91.76 91.43 91.57 740nm 92.3 93.59 93.48 93.73 93.62 93.73 93.09 93.59

[0080] Table 5. Transmission Lab values ​​and transmittance of the finished products from Examples 9-15

[0081] Example 9# 10# 11# 12# 13# 14# 15# mean L* 97.33 97.37 97.24 96.7 97.08 97.45 97.23 97.20 a* -0.15 -0.16 -0.15 -0.15 -0.16 -0.16 -0.16 -0.16 b* 0.21 0.15 0.22 0.07 0.08 0.15 0.11 0.14 360nm 90.53 90.72 90.05 89.31 90.16 90.92 90.26 90.27 380nm 91.56 91.77 91.26 90.36 91.26 91.98 91.55 91.37 450nm 93.11 93.28 92.61 91.92 92.69 93.46 92.71 92.87 460nm 92.97 93.18 92.96 91.68 92.58 93.4 93.14 92.80 520nm 93.51 93.7 93.14 92.37 93.12 93.83 93.17 93.27 540nm 93.08 93.08 92.97 91.08 92.25 93.39 92.93 92.66 550nm 93.71 93.75 92.65 92.2 93.04 93.94 92.53 93.25 580nm 92.71 92.68 93.08 90.56 91.79 92.96 93.07 92.30 620nm 92.85 93 93.71 91.38 92.32 93.16 93.77 92.68 630nm 92.32 92.31 93.12 90.27 91.45 92.61 93.06 91.99 700nm 92.06 91.92 92.24 89.92 91.06 92.26 92.04 91.56 740nm 93.64 93.81 93.38 92.65 93.29 93.86 93.29 93.40

[0082] Table 6. Reflectance Lab values ​​and reflectance of the finished products from Examples 1-15

[0083]

[0084]

[0085] The glass cover prepared in this embodiment of the invention meets the optical performance standards, with a transmittance greater than 90.5%, no discoloration, and no scratches when subjected to a scratch test with a Mohs hardness of 7 and a weight of 500g. If the dynamic friction coefficient of the hard film is reduced to below 0.02 through polishing, the final product can withstand 9000 cycles of rubber and steel wool friction, significantly improving the scratch resistance of the glass cover.

[0086] The above are merely specific embodiments of the present invention and should not be construed as limiting the scope of the present invention. Equivalent variations made by those skilled in the art based on this invention, as well as changes well-known to those skilled in the art, should still fall within the scope of the present invention.

Claims

1. A method for processing a glass cover plate, characterized in that, The method includes the following steps: Step S1: Prepare a glass cover substrate with the desired appearance and size; Step S2: A hard film and a polishing auxiliary film are sequentially deposited on the surface of the glass cover substrate; wherein the hard film is composed of multiple alternating high refractive index layers and low refractive index layers; the thickness of the polishing auxiliary film is set between 10 nm and 50 nm. Step S3: Polish the polishing auxiliary film with a polishing medium having a Mohs hardness of 2 to remove the polishing auxiliary film and reduce the surface roughness of the hard film. Step S4: Print an ink layer on the opposite side of the coated surface of the glass cover substrate; Step S5: Prepare an anti-fingerprint film on the surface of the polished hard film.

2. The glass cover plate processing method according to claim 1, characterized in that, The glass cover substrate has a 2D or 2.5D structure. Step S1 includes a chemical strengthening process. After the chemical strengthening process and before the coating process, the following steps are also included: The glass cover substrate is subjected to double-sided unequal thickness polishing pretreatment to offset the deformation in the subsequent coating process. The amount of polishing on the surface to be coated is greater than the amount of polishing on the opposite surface.

3. The glass cover plate processing method according to claim 1, characterized in that, The glass cover substrate has a 3D structure. Step S1 includes a chemical strengthening process, and a hot bending process is included before the chemical strengthening process. In the hot bending process, the glass cover substrate is pretreated by designing the mold and hot bending parameters to offset the deformation in the subsequent coating process.

4. The glass cover plate processing method according to claim 1, characterized in that, The materials of the high refractive index layer and the low refractive index layer are SiOxNy.

5. The glass cover plate processing method according to claim 1, characterized in that, The polishing auxiliary film is made of the same material as the outermost high-refractive-index layer or low-refractive-index layer of its corresponding hard film.

6. The glass cover plate processing method according to claim 5, characterized in that, Step S3 includes: The thickness of the polishing auxiliary film is used as the target removal amount. The polishing parameters are determined according to the correspondence between the removal amount and the polishing parameters. The polishing auxiliary film is removed using the polishing parameters to expose the hard film. The method for generating the correspondence between the removal amount and the polishing parameters includes the following steps: Step a1: Obtain multiple sets of target film thickness and corresponding Lab values ​​of the target film thickness through simulation; the material of the target film is the same as that of the polishing auxiliary film; Step a2: Fit the relationship curve between the target film thickness and the Lab value of reflection based on the simulation results; Step a3: Prepare a target film layer on the surface of a glass substrate and test its initial reflectance Lab value. Obtain the initial thickness value of the target film layer based on the initial reflectance Lab value and the relationship curve. Step a4: Perform trial polishing on the target film layer using a polishing medium with a Mohs hardness of 2, then test the reflection Lab value of the target film layer after polishing, obtain the thickness value of the target film layer after polishing based on the reflection Lab value of the target film layer after polishing and the relationship curve, and calculate the amount of material removed based on the thickness value of the target film layer after polishing and the initial thickness value of the target film layer. Step a5: Repeat step a4. During the trial polishing process, adjust the polishing parameters, including polishing time, polishing machine speed, and polishing medium concentration, to obtain the corresponding relationship between different polishing amounts and polishing parameters.

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