A flow control cabinet for vapor deposition

CN121161270BActive Publication Date: 2026-04-21米拓半导体(上海)股份有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
米拓半导体(上海)股份有限公司
Filing Date
2025-08-21
Publication Date
2026-04-21

AI Technical Summary

Technical Problem

In existing vapor deposition technologies, gas flow control suffers from problems such as slow response speed, difficulty in multi-stage coordinated control, difficulty in adjusting small flow rates, and uneven gas distribution.

Method used

It adopts a dual-diameter pipe and rotating plug linkage design, combined with spring and connecting rod to dynamically adjust the opening of the solid semi-circular disk, so as to achieve multi-level precise flow control; through the cooperation of the rotating mechanism and the jetting mechanism, it realizes multi-angle dynamic gas injection and improves the uniformity of gas coverage.

Benefits of technology

It achieves rapid response and stable adjustment of gas flow rate, improves the uniformity and quality of vapor deposition, reduces energy consumption, and simplifies the operation process.

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Abstract

This invention discloses a flow control cabinet for vapor deposition, relating to the field of vapor deposition technology. It includes a control box with two sets of flow control mechanisms inside. Each flow control mechanism comprises two hollow semi-circular blocks fixed to both sides of a cavity. A solid semi-circular disk is slidably connected within each hollow semi-circular block, and multiple air holes are provided on the hollow semi-circular blocks. A gas-blocking disk slides within one side of the cavity. This invention employs a dual-diameter pipe and rotating plug linkage design. By switching the pipe diameter to change the gas thrust, combined with springs and connecting rods to dynamically adjust the opening of the solid semi-circular disk, multi-level precise flow control is achieved. This results in fast response and strong anti-interference capability. Simultaneously, the sliding fit structure between the hollow semi-circular blocks and the solid semi-circular disk, along with the automatic reset of the spring, ensures linear matching between the air hole opening and the gas thrust, improving the stability of micro-flow regulation.
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Citation Information

Patent Citations

  • Steam flow regulating device

    CN208999837U

  • Flow control apparatus for gas generator and flow control method using the same

    KR102459006B1