Multi-stage mixing gas mixing device

Abstract

The invention relates to a multi-stage mixing gas mixing device, which comprises a first-stage mixing cavity, a second-stage mixing cavity, a third-stage mixing cavity and a fourth-stage mixing cavity, the second-stage mixing cavity is provided with a gas mixing hole communicated with the first-stage mixing cavity, and the gas mixing hole is not opposite to any gas inlet hole; the third-stage mixing cavity is provided with a mixed gas guide port communicated with the second-stage mixing cavity, and the mixed gas guide port is obliquely arranged; the third-stage mixing cavity is also provided with a gas uniformizing hole, and gas mixed by the gas mixing device is led out through the gas uniformizing hole.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor manufacturing equipment, in particular to a multi-stage mixed gas mixing device. BACKGROUND

[0002] In the preparation process of ultraviolet LED chips, due to the influence of material quality, doping and other factors during epitaxy, as well as the difficulties existing in chip and packaging process, the high aluminum nitride technology lags behind the development of indium gallium nitride blue-green light technology. The most prominent is that the commercial blue-green light MOCVD (Metal-Organic Chemical Vapor Deposition) equipment cannot well inhibit the pre-reaction, which will lead to the decline of material quality and high consumption, so the special MOCVD equipment for manufacturing ultraviolet LED becomes an important link restricting the development of ultraviolet LED chip industry.

[0003] A difficult problem encountered in the manufacture of special MOCVD equipment for ultraviolet LED is how to better inhibit the influence of uneven mixing of reaction gas on the growth of AlN (aluminum nitride) film. After trimethylaluminum and ammonia gas enter the mixing chamber, due to the uneven pre-mixing of reaction gas, the reaction gas is not mixed uniformly after entering the reaction chamber, and the uneven concentration of reactants in the reaction container will directly lead to quality defects of AlN film growth. Therefore, how to better improve the uniformity of reactants in the reaction container is crucial for the design of MOCVD equipment to improve the uniformity of AlN film growth. SUMMARY

[0004] In view of the above analysis, the embodiments of the present application aim to provide a multi-stage mixed gas mixing device to at least solve one of the above problems.

[0005] The present application provides a multi-stage mixed gas mixing device, comprising:

[0006] A first mixing chamber is provided with a plurality of gas inlet holes, and each gas inlet hole is staggered with each other;

[0007] A second mixing chamber is provided with a gas mixing hole communicating with the first mixing chamber, and the gas mixing hole is not opposite to any gas inlet hole;

[0008] A third mixing chamber is provided with a gas mixing guide communicating with the second mixing chamber, and the gas mixing guide is inclined; the third mixing chamber is further provided with a gas uniformizing hole, and the gas mixed by the gas mixing device is guided out of the gas uniformizing hole.

[0009] Further, the gas mixing device comprises a plurality of first mixing chambers and second mixing chambers, and the number of first mixing chambers and second mixing chambers is the same;

[0010] The primary mixing cavity and the secondary mixing cavity are arranged one by one and sequentially arranged upstream of the tertiary mixing cavity.

[0011] Further, the primary mixing cavity and the secondary mixing cavity are uniformly distributed along the radial direction of the gas mixing device.

[0012] Further, the tertiary mixing cavity is provided with the same number of gas mixing guide ports as the secondary mixing cavities.

[0013] The distribution direction of the gas mixing guide port is consistent with the distribution direction of the secondary mixing cavity.

[0014] The opening direction of the gas mixing guide port is inclined downward, and the opening directions of the plurality of gas mixing guide ports are spirally distributed, so as to form a cyclone in the tertiary mixing cavity for the gas discharged from the secondary mixing cavity.

[0015] The secondary mixing cavity gradually decreases in size from top to bottom, and the secondary mixing cavity is arranged obliquely, and the oblique direction of the secondary mixing cavity is the same as the oblique direction of the gas mixing guide port.

[0016] Further, the gas mixing device comprises:

[0017] The mixing cavity body is provided with a three-step groove at the upper end face, and the bottom of the three-step groove is provided with the secondary mixing cavity and the gas mixing guide port.

[0018] The first cover plate is detachably arranged at the top of the three-step groove, and the first cover plate is provided with the gas inlet hole.

[0019] The second cover plate is detachably arranged at the bottom of the three-step groove, and the second cover plate is provided with the gas mixing hole.

[0020] The mixing cavity body is provided with the tertiary mixing cavity inside, and the lower end face of the mixing cavity body is provided with the uniform gas hole.

[0021] The first cover plate, the second cover plate, and the three-step groove side wall limit the primary mixing cavity.

[0022] Further, the three-step groove is a stepped groove with a groove opening decreasing from top to bottom.

[0023] The three-step groove comprises a first groove wall, a first bottom surface, a second groove wall, a second bottom surface, a third groove wall, and a third bottom surface connected in sequence from top to bottom.

[0024] Further, the first groove wall is vertically arranged outside the first bottom surface, and the first groove wall and the first bottom surface form the first step of the three-step groove; the shape and size of the first cover plate are matched with the first groove wall and the first bottom surface, and the top end face of the first cover plate is flush with the top end face of the mixing cavity body.

[0025] The first bottom surface horizontally surrounds the outside of the second groove wall, the second groove wall vertically surrounds the outside of the second bottom surface, and the second groove wall and the second bottom surface form the second step of the three-step groove;

[0026] The second bottom surface surrounds the outside of the third groove wall, the third groove wall vertically surrounds the outside of the third bottom surface, and the third groove wall and the third bottom surface form the third step of the three-step groove; the shape and size of the second cover plate are matched with the third groove wall and the third bottom surface, and the top end surface of the second cover plate is flush with the second bottom surface;

[0027] The first cover plate, the second cover plate, and the second groove wall limit the primary mixing cavity.

[0028] Further, a secondary mixing cavity downwardly and obliquely extends from the third bottom surface;

[0029] The secondary mixing cavity comprises two vertically arranged cavity walls and first and second obliquely arranged cavity walls, and the obliquity of the first obliquely arranged cavity wall is smaller than that of the second obliquely arranged cavity wall.

[0030] The bottom end of the second obliquely arranged cavity wall is provided with a guide platform protruding from the upper cavity wall of the tertiary mixing cavity, and the guide platform, the first obliquely arranged cavity wall, and the upper cavity wall of the tertiary mixing cavity limit the gas mixing guide opening.

[0031] Further, the gas inlet comprises a first gas inlet and a second gas inlet.

[0032] The first gas inlet is provided with a first gas inlet pipe, and the second gas inlet is provided with a second gas inlet pipe.

[0033] The lengths of the first gas inlet pipe and the second gas inlet pipe are different.

[0034] Further, the bottom of the mixing cavity body is provided with a detachable air uniformizing plate.

[0035] The air uniformizing plate is provided with a plurality of air uniformizing holes.

[0036] Compared with the prior art, the present application can at least achieve one of the beneficial effects: through the arrangement of the multi-step mixing cavity, the gas inlet hole, the gas mixing hole, and the gas mixing guide opening, the multi-step mixing of different gases is realized, and each mixing is orderly carried out in a respective independent and different space area. This unique structure can ingeniously cause a significant change in gas flow rate, thereby promoting sufficient contact and uniform distribution of gas molecules.

[0037] The technical solutions in the present application can be combined with each other to realize more preferred combination solutions. Other features and advantages of the present application will be described in the following description, and some advantages will become apparent from the description, or will be understood by those skilled in the art through implementation of the present application. The purposes and other advantages of the present application can be realized and obtained through the contents particularly pointed out in the description and the drawings. BRIEF DESCRIPTION OF DRAWINGS

[0038] The accompanying drawings are included to provide a further understanding of the present application, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the present application and, together with the description, serve to explain the principles of the present application.

[0039] Figure 1 Structure diagram of the gas mixing device with multi-stage mixing in the embodiment (one);

[0040] Figure 2 Structure diagram of the gas mixing device with multi-stage mixing in the embodiment (two);

[0041] Figure 3 Sectional view of the gas mixing device with multi-stage mixing in the embodiment;

[0042] Figure 4 Structure diagram of the gas mixing device with multi-stage mixing in the embodiment after removing the first cover plate;

[0043] Figure 5 Structure diagram of the gas mixing device with multi-stage mixing in the embodiment after removing the first cover plate and the second cover plate;

[0044] Figure 6 Enlarged view of the three-step groove of the gas mixing device with multi-stage mixing in the embodiment;

[0045] Figure 7 Sectional view of the gas mixing device with multi-stage mixing in the embodiment after removing the first cover plate and the second cover plate;

[0046] Figure 8 Enlarged view of the sectional view of the gas mixing device with multi-stage mixing in the embodiment after removing the first cover plate and the second cover plate (one);

[0047] Figure 9 Enlarged view of the sectional view of the gas mixing device with multi-stage mixing in the embodiment after removing the first cover plate and the second cover plate (two);

[0048] Figure 10 Structure diagram of the first cover plate in the embodiment (one);

[0049] Figure 11 Structure diagram of the first cover plate in the embodiment (two);

[0050] Figure 12 Structure diagram of the first cover plate (three) in the specific embodiment;

[0051] Figure 13 Structure diagram of the second cover plate (one) in the specific embodiment;

[0052] Figure 14 Structure diagram of the installation position of the first cover plate and the second cover plate in the specific embodiment;

[0053] Figure 15 Explosive diagram of the multi-stage mixed gas mixing device in the specific embodiment;

[0054] Figure 16 Local enlarged view of the upper cover in the specific embodiment (the dashed line with an arrow in the figure represents the air outlet direction of each gas mixing guide port).

[0055] Reference signs:

[0056] 1-mixing cavity body; 101-first stage mixing cavity; 102-second stage mixing cavity; 102a-upper cavity port; 102b-first inclined cavity wall; 102c-second inclined cavity wall; 102d-guide table; 103-third stage mixing cavity; 104-gas mixing guide port; 105-gas uniforming hole; 106-first recess bolt half hole; 107-second recess bolt half hole; 11-three-step recess; 111-first groove wall; 112-first bottom surface; 113-second groove wall; 114-second bottom surface; 115-third groove wall; 116-third bottom surface; 12-upper cover; 13-bottom cover; 131-mounting lug; 132-first threaded hole; 14-annular side wall; 141-second threaded hole; 2-first cover plate; 201-first air inlet hole; 202-second air inlet hole; 203-first cover plate bolt half hole; 21-first air inlet pipe; 22-second air inlet pipe; 3-second cover plate; 301-gas mixing hole; 302-second cover plate bolt half hole. Specific embodiment

[0057] The preferred embodiments of the present application will be described in detail below with reference to the drawings, wherein the drawings constitute a part of the present application and serve to explain the principles of the present application together with the embodiments of the present application, but are not intended to limit the scope of the present application.

[0058] In the description of the embodiments of the present application, it should be noted that unless otherwise explicitly specified and limited, the term "connected" should be understood in a broad sense, for example, it can be fixedly connected, or detachably connected, or integrally connected, which can be mechanically connected, or electrically connected, which can be directly connected, or indirectly connected through an intermediate medium. Those skilled in the art can understand the specific meaning of the above-mentioned term in the present application according to the specific circumstances.

[0059] The terms "top", "bottom", "above", "under" and "on" used throughout the description are relative to the relative position of the components of the device, for example the relative position of the top and bottom substrates inside the device. It is understood that the devices are multifunctional, regardless of their orientation in space.

[0060] The general working surface of the present application can be flat or curved, can be inclined or horizontal. For the convenience of explanation, the embodiments of the present application are placed on and used in the horizontal plane, and the "high and low" and "up and down" are defined accordingly.

[0061] One specific embodiment of the present application discloses a multi-stage mixed gas mixing device, which can be applied at least in the MOCVD equipment for manufacturing ultraviolet LED, for mixing reaction gas.

[0062] As shown in Figures 1-16 The multi-stage mixed gas mixing device (hereinafter referred to as gas mixing device) comprises:

[0063] The first mixing chamber 101 is provided with a plurality of gas inlet holes, and each gas inlet hole is staggered with each other;

[0064] The second mixing chamber 102 is provided with a gas mixing hole 301 which is in communication with the first mixing chamber, and the gas mixing hole is not opposite to any gas inlet hole;

[0065] The third mixing chamber 103 is provided with a gas mixing guide 104 which is in communication with the second mixing chamber, and the gas mixing guide is inclined; the third mixing chamber is also provided with a gas uniformizing hole 105, and the gas mixed by the gas mixing device is guided out of the gas uniformizing hole 105.

[0066] The staggered arrangement means that each gas inlet hole is not the same kind of gas inlet hole as its adjacent gas inlet hole, so as to improve the mixing of the multiple gases entering the first mixing chamber. The number of types of gas inlet holes depends on the number of gases to be mixed in the gas mixing device. For example, if there are two gases to be mixed in the gas mixing device, the gas inlet holes include a first gas inlet hole 201 and a second gas inlet hole 202, and the first gas inlet hole 201 and the second gas inlet hole 202 are staggered with each other. In this embodiment, the gas inlet holes are arranged in two parallel rows, one of which is arranged in the order of first gas inlet hole and second gas inlet hole, and the other of which is arranged in the order of second gas inlet hole and first gas inlet hole, and the column distance a and the row distance b of the two rows are equal. The column distance a and the row distance b can be equal or not equal, and in this embodiment, the column distance is greater than the row distance, i.e. a > b.

[0067] Each intake hole has multiple ones to guide the gas into the primary mixing chamber faster. In order to better distinguish different kinds of intake holes, the primary mixing chamber is provided with intake pipes in communication with the intake holes, and different kinds of intake holes are distinguished by intake pipes of different lengths, different colors, different thicknesses, etc. In this embodiment, the first intake hole and the second intake hole are distinguished by intake pipes of different lengths, specifically, the primary mixing chamber is provided with a first intake pipe 21 and a second intake pipe 22, the first intake pipe 21 is in communication with the first intake hole 201, and the second intake pipe 22 is in communication with the second intake hole 202, the length of the first intake pipe 21 is less than the length of the second intake pipe 22. The number of intake holes conveying the same kind of gas is equal to the number of intake pipes, that is, they are arranged one by one to improve the conveying speed of the gas.

[0068] The gas mixing hole 301 is not directly opposite to any intake hole, which can prevent the gas introduced into the primary mixing chamber from being directly discharged from the gas mixing hole. Preferably, the gas mixing hole is located directly below the staggered center of one or more intake holes, and the staggered center refers to the center point of the connecting line of the two closest intake holes of the same kind. When the intake holes are arranged in a certain rule (such as a matrix arrangement), the staggered centers of different kinds of intake holes are located at the same place. In this embodiment, the gas mixing hole 301 is located directly below the staggered center O of the first intake hole and the second intake hole.

[0069] The gas mixing guide port is inclined to avoid the gas entering the tertiary mixing chamber from being directly discharged from the uniform gas hole, thereby improving the mixing effect of the gas.

[0070] The gas mixing device of the present application realizes multi-step mixing of different gases through the arrangement of multi-stage mixing chambers, intake holes, gas mixing holes, and gas mixing guide ports, and ensures that each mixing is orderly carried out in a separate and different space area. This unique structure can cleverly cause a significant change in gas flow rate, thereby promoting sufficient contact and uniform distribution between gas molecules.

[0071] According to a preferred embodiment of the present application, the gas mixing device comprises a plurality of primary mixing chambers 101 and secondary mixing chambers 102, both of which are independent high-intensity turbulence generating devices. The gas successively undergoes multi-stage and multi-point shearing, stretching and folding processes, and the concentration pulsation is "refined" to the millimeter-submillimeter level. In comparison, a single large chamber can only achieve mixing by means of macroscopic backflow, and there is a large area of low shear region, making it difficult to achieve uniform mixing effect. Therefore, the mixing effect of the gas mixing device is better. The number of primary mixing chambers 101 and secondary mixing chambers 102 is the same. The primary mixing chambers 101 and secondary mixing chambers 102 are arranged one by one and arranged upstream of the tertiary mixing chamber 103, i.e. the primary mixing chamber is arranged upstream of the secondary mixing chamber, and the secondary mixing chamber is arranged upstream of the tertiary mixing chamber. The plurality of primary mixing chambers and secondary mixing chambers are connected to the tertiary mixing chamber in a parallel manner, i.e. the plurality of primary mixing chambers are independent of each other, and the plurality of secondary mixing chambers are also arranged independently of each other, and only the primary mixing chamber, the secondary mixing chamber and the tertiary mixing chamber are connected. In this embodiment, the primary mixing chamber 101 is located directly above the secondary mixing chamber 102, and the secondary mixing chamber 102 is located above the tertiary mixing chamber 103.

[0072] Preferably, the primary mixing chambers and secondary mixing chambers are uniformly distributed along the radial direction of the gas mixing device. That is, the longitudinal center line of the gas mixing device is A-A, the extension lines of the primary mixing chambers intersect at the same point of the center line A-A, the extension lines of the secondary mixing chambers intersect at the same point of the center line A-A, and the included angles of the extension lines of adjacent primary mixing chambers are the same, and the included angles of the extension lines of adjacent secondary mixing chambers are the same. That is, one end of the primary mixing chamber is close to the center line A-A, and the other end is radiated outward, and the extension line is perpendicular to the center line A-A, and the included angles of the extension lines of adjacent primary mixing chambers are the same; one end of the secondary mixing chamber is close to the center line A-A, and the other end is radiated outward, and the extension line is perpendicular to the center line A-A, and the included angles of the extension lines of adjacent secondary mixing chambers are the same. In this embodiment, the overall shape of the gas mixing device is cylindrical, and the plurality of primary mixing chambers and the plurality of secondary mixing chambers are uniformly distributed in the radial direction of the cylinder.

[0073] The tertiary mixing chamber 103 is provided with a plurality of gas mixing guide ports 104 corresponding to the number of secondary mixing chambers 102, and the distribution direction of the gas mixing guide ports 104 is consistent with the distribution direction of the secondary mixing chambers 102, i.e. the gas mixing guide ports 104 extend along the radial direction of the gas mixing device. The opening direction of the gas mixing guide ports 104 is inclined downward, and the opening directions of the plurality of gas mixing guide ports are spirally distributed, so as to form a cyclone in the tertiary mixing chamber for the gas discharged from the secondary mixing chamber 104b, thereby further improving the mixing effect of the gas in the tertiary mixing chamber.

[0074] To make the gas in the secondary mixing chamber 102 flow more smoothly from the gas mixing port 104, the secondary mixing chamber 102 gradually decreases in size from top to bottom, and is arranged obliquely, as shown in Figure 8 , that is, the cross section (the section perpendicular to the extension line of the secondary mixing chamber) of the secondary mixing chamber 102 is a trapezoidal shape, and the upper base is larger than the lower base, that is, the shape of the cross section of the secondary mixing chamber 102 is an inverted trapezoidal shape. Such an arrangement can also increase the wind speed of the gas entering the tertiary mixing chamber, so that the cyclone is generated faster, and the gas mixing effect is improved. It should be noted that the oblique direction of the secondary mixing chamber is the same as that of the gas mixing port, and the specific oblique degree of the two can be the same or different. Preferably, the oblique degree of the secondary mixing chamber (the angle between the center line of the upper base and the lower base and the vertical direction, that is, the ∠α of Figure 8 ) is greater than the oblique degree of the gas mixing port (the angle between the opening direction and the vertical direction, that is, the ∠β of Figure 8 ), so as to further promote the formation of the cyclone.

[0075] According to an embodiment of the present application, the gas mixing device comprises:

[0076] a mixing chamber body 1, the upper end face of which is provided with a three-step groove 11, and the bottom of the three-step groove 11 is provided with a secondary mixing chamber 102 and a gas mixing port 104;

[0077] a first cover plate 2, which is detachably arranged at the top of the three-step groove 11, and the first cover plate 2 is provided with the gas inlet hole;

[0078] a second cover plate 3, which is detachably arranged at the middle of the three-step groove 11, and the second cover plate 3 is provided with the gas mixing hole;

[0079] wherein, the mixing chamber body 1 is internally provided with the tertiary mixing chamber 103, and the lower end face of the mixing chamber body 1 is provided with the uniform gas hole 105;

[0080] the first cover plate 2, the second cover plate 3, and the three-step groove 11 side wall limit the primary mixing chamber 101.

[0081] The three-step groove 11 is a stepped groove with a groove opening that gradually decreases from top to bottom, and specifically, the three-step groove 11 comprises a first groove wall 111, a first bottom surface 112, a second groove wall 113, a second bottom surface 114, a third groove wall 115, and a third bottom surface 116 connected in sequence from top to bottom.

[0082] The first groove wall 111 is vertically arranged outside the first bottom surface 112, and the first groove wall 111 and the first bottom surface 112 form the first step of the three-step groove 11. The first cover plate 2 is adapted in size and shape to the first groove wall and the first bottom surface, and the top end surface of the first cover plate 2 is flush with the top end surface of the mixing cavity body. The first cover plate 2 is detachably installed in the first step of the three-step groove 11, and when the first cover plate 2 is installed in the first step, the side wall of the first cover plate 2 is tightly attached to the first groove wall 111, and the bottom of the first cover plate 2 is tightly attached to the first bottom surface 112. The first cover plate 2 can be detachably connected to the three-step groove by screwing, clamping or other detachable methods. In this embodiment, the first cover plate 2 is provided with a plurality of (such as four) first cover plate bolt half holes 203, and the first groove wall 111, the first bottom surface 112 and the first cover plate bolt half hole 203 are provided with a first groove bolt half hole 106 at a corresponding position. The bolt or screw is screwed into the bolt hole composed of the first groove bolt half hole 106 and the first cover plate bolt half hole 203 to realize the detachable installation of the first cover plate 2 to the top of the three-step groove. It should be noted that the first groove bolt half hole 106 extends from the first bottom surface 112 to the second groove wall to ensure the connection stability of the first cover plate 2.

[0083] The first bottom surface 112 is horizontally arranged outside the second groove wall 113, and the second groove wall 113 is vertically arranged outside the second bottom surface 114, and the second groove wall 113 and the second bottom surface 114 form the second step of the three-step groove.

[0084] The second bottom surface 114 is arranged outside the third groove wall 115, and the third groove wall 115 is vertically arranged outside the third bottom surface 116, and the third groove wall 115 and the third bottom surface 116 form the third step of the three-step groove. The second cover plate 3 is adapted in size and shape to the third groove wall and the third bottom surface, and the top end surface of the second cover plate 3 is flush with the second bottom surface 114. The first cover plate 3 is detachably installed in the third step of the three-step groove 11, and when the second cover plate 3 is installed in the third step, the side wall of the second cover plate 3 is tightly attached to the third groove wall 115, and the bottom of the second cover plate 3 is tightly attached to the third bottom surface 116. The second cover plate 3 can be detachably connected to the three-step groove by screwing, clamping or other detachable methods. In this embodiment, the second cover plate 3 is provided with a plurality of (such as four) second cover plate bolt half holes 302, and the second bottom surface 114, the third groove wall 115 and the third bottom surface 116 are provided with a second groove bolt half hole 107 at a corresponding position. The bolt or screw is screwed into the bolt hole composed of the second groove bolt half hole 107 and the second cover plate bolt half hole 302 to realize the detachable installation of the second cover plate 3 to the bottom of the three-step groove. It should be noted that the second groove bolt half hole 107 continues to extend downward from the third bottom surface 116 for a distance to ensure the connection stability of the second cover plate 3.

[0085] In order to facilitate the insertion of the bolt into the bolt hole composed of the bolt half-hole of the first groove and the bolt half-hole of the second groove, the bolt half-hole of the first groove 106 and the bolt half-hole of the second groove 107 are oppositely arranged, and the bolt half-hole of the second groove 107 extends upward from the second bottom surface to the first groove half-hole to facilitate the detachable assembly of the second cover plate 3.

[0086] The first cover plate 2, the second cover plate 3, and the second groove wall 113 limit the first-stage mixing chamber 101.

[0087] The bottom of the three-step groove 11 is provided with the second-stage mixing chamber 102 and the gas mixing guide 104. Specifically, the second-stage mixing chamber 102 extends downward from the third bottom surface 116, that is, the upper chamber opening 102a of the second-stage mixing chamber 102 is arranged on the third bottom surface 116, and the third bottom surface 116 is arranged outside the upper chamber opening 102a. The second-stage mixing chamber 102 extends downward to the upper wall of the third-stage mixing chamber 103, that is, the lower chamber opening (i.e., the gas mixing guide 104) of the second-stage mixing chamber 102 is arranged on the upper wall of the third-stage mixing chamber 103. In the embodiment, the second-stage mixing chamber 102 includes two vertically arranged cavity walls and oppositely arranged first and second inclined cavity walls 102b and 102c. The inclination of the first inclined cavity wall is smaller than that of the second inclined cavity wall to form a cavity with a large upper part and a small lower part. The bottom end of the second inclined cavity wall 102c is provided with a guide table 102d protruding from the upper wall of the third-stage mixing chamber. The guide table 102d and the first inclined cavity wall and the upper wall of the third-stage mixing chamber limit the gas mixing guide 104. The horizontal extension direction of the guide table 102d is consistent with the extension direction of the second-stage mixing chamber. The guide table 102d has a trapezoidal cross-sectional shape, as shown in the figure. The inclined surface of the guide table 102d facing the first inclined cavity wall constitutes the opening direction of the gas mixing guide 104, that is, the inclination of the inclined surface facing the first inclined cavity wall is greater than that of the second inclined cavity wall and that of the first inclined cavity wall. The gas mixing guide 104 formed by the guide table 102d can improve the stability of gas guiding and cyclone forming of the second-stage mixing chamber. Figure 9

[0088] The bottom of the mixing chamber body 1 is provided with a detachable gas uniformizing plate. The gas uniformizing plate is provided with a plurality of gas uniformizing holes 105.

[0089] In the embodiment, the mixing chamber body 1 has a cylindrical shape. Specifically, the mixing chamber body 1 includes an upper cover 12, a bottom cover 13, and an annular side wall 14. The first cover plate 2 and the second cover plate 3 are circular rectangular plates. The diameter of the circular end of the circular rectangular plate is the same as the width of the rectangular plate. The materials of the mixing chamber body 1, the first cover plate 2, and the second cover plate 3 are metal materials.

[0090] ​The upper cover 12 is radially uniformly provided with four three-step grooves 11, the bottom of the three-step groove 11 is detachably provided with a second cover plate 3, and the top of the three-step groove is detachably provided with a first cover plate. It should be noted that the upper cover has a certain thickness, so as to have sufficient thickness to set the three-step groove and the two-stage mixing cavity, and the bottom surface of the upper cover is the upper cavity wall of the three-stage cavity. Specifically, the first cover plate 2 and the second cover plate 3 are detachably connected with the three-step groove through four bolts respectively. The first cover plate 2 is provided with a first air inlet 201 and a second air inlet 202, the first air inlet 201 is provided with a first air inlet pipe 21, the second air inlet 202 is provided with a second air inlet pipe 202, and the lengths of the first air inlet pipe 21 and the second air inlet pipe 22 are different. Exemplarily, the length of the first air inlet pipe 21 is less than the length of the second air inlet pipe 22, and the length difference can be distinguished by the naked eye, so as to input different gases through the first air inlet pipe and the second air inlet pipe.

[0091] The bottom cover 13 is provided with a plurality of uniform gas holes 105, that is, the bottom cover 13 is the uniform gas plate described above, and preferably, the bottom cover 13 is detachably connected with the annular side wall 14. The bottom cover 13 and the annular side wall 14 can be connected by a detachable connection mode such as threaded connection, clamping, etc. Exemplarily, the bottom cover 13 is provided with a plurality of mounting lugs 131, the mounting lugs 131 are arranged outside the annular side wall 14, and the corresponding positions of the mounting lugs 131 and the annular side wall 14 are respectively provided with first threaded holes 132 and second threaded holes 141. By inserting a fixing member such as a bolt or a screw into the corresponding first threaded hole 132 and second threaded hole 141, the bottom cover can be detachably mounted on the annular side wall 14. In the embodiment, the number of mounting lugs is four, which are uniformly distributed on the bottom cover.

[0092] The gas mixing device of the embodiment is used to respectively pass two kinds of reaction gases through the first gas inlet pipe and the second gas inlet pipe, and the two kinds of reaction gases enter the first mixing cavity through the first gas inlet and the second gas inlet. Since the gas outlet holes (i.e. the gas mixing holes) of the first mixing cavity are staggered with the first gas inlet and the second gas inlet, the reaction gases will stay in the first mixing cavity, and the reaction gases are mixed for the first time. In the first mixing cavity, the first gas inlet, the second gas inlet and the gas mixing hole are staggered, so that a relatively isolated sub-circulation area is formed, the gas forms a backflow in the sub-circulation area in the first mixing cavity, the residence time of the gas in the first mixing cavity and the contact time between different gases are increased, and the mixing between the gases is increased. After the reaction gases are mixed for the first time, the reaction gases are discharged through the gas mixing hole and enter the second mixing cavity. In the second mixing cavity, the reaction gases are mixed for the second time, and the mixed gas flows out through the gas mixing guide port and enters the third mixing cavity. Since the second mixing cavity and the gas mixing guide port have a sloping guide structure, the structure can effectively guide the direction of the gas flow, and finally the reaction gas flow enters the third mixing cavity in a slanting downward ring shape, a cyclone is formed in the third mixing cavity, in this way, the gas can be avoided to be directly sprayed to the uniform gas distribution net, the situation that the reaction substances are not uniformly mixed in different areas in the third mixing cavity is reduced, and the gas transport efficiency is improved. After the gas is mixed in the third mixing cavity, the gas is finally sprayed out through the uniform gas holes.

[0093] The present application ensures that each mixing operation is orderly carried out in a respective independent and different space area through a multi-level and multi-step mixing process. This unique processing method ingeniously causes a significant change in the gas flow rate, thereby effectively promoting the sufficient contact and uniform distribution between gas molecules.

[0094] The above only describes the preferred embodiments of the present application, but the protection scope of the present application is not limited thereto, any changes or replacements within the technical range disclosed by the present application can be easily thought by those skilled in the art, and should be covered within the protection scope of the present application.

Claims

1. A multi-stage gas mixing device, characterized in that, include: The primary mixing chamber is equipped with multiple air inlets, each type of air inlet arranged in an alternating pattern. The secondary mixing chamber is provided with a mixing port that communicates with the primary mixing chamber, and the mixing port is not directly opposite any air inlet. The third-stage mixing chamber is provided with a gas mixing inlet that communicates with the second-stage mixing chamber, and the gas mixing inlet is inclined; the third-stage mixing chamber is also provided with a gas equalization hole, through which the gas mixed by the gas mixing device is discharged.

2. The gas mixing device according to claim 1, characterized in that, It includes multiple primary mixing chambers and secondary mixing chambers, and the number of primary mixing chambers and secondary mixing chambers is the same; The primary mixing chamber and the secondary mixing chamber are arranged in a one-to-one correspondence and are sequentially arranged upstream of the tertiary mixing chamber.

3. The gas mixing device according to claim 2, characterized in that, The primary mixing chamber and the secondary mixing chamber are uniformly distributed radially along the gas mixing device.

4. The gas mixing device according to claim 3, characterized in that, The third-stage mixing chamber has the same number of gas mixing inlets as the second-stage mixing chamber; The distribution direction of the gas mixing inlet is consistent with the distribution direction of the secondary mixing chamber; The opening direction of the gas mixing inlet is inclined downward, and the opening directions of multiple gas mixing inlets are spirally distributed so that the gas discharged from the secondary mixing chamber can form a cyclone in the tertiary mixing chamber. The secondary mixing chamber gradually decreases in size from top to bottom, and the secondary mixing chamber is inclined, with the inclination direction of the secondary mixing chamber being the same as that of the gas mixing inlet.

5. The gas mixing apparatus according to any one of claims 1 to 4, characterized in that, include: The mixing chamber body has a three-step groove on its upper surface, and the bottom of the three-step groove has the secondary mixing chamber and the gas mixing inlet; A first cover plate is detachably mounted on the top of the three-tiered groove; the first cover plate is provided with the air inlet. The second cover plate is detachably disposed at the bottom of the three-step groove, and the second cover plate is provided with the gas mixing hole; The mixing chamber body is provided with the three-stage mixing chamber inside, and the lower end face of the mixing chamber body is provided with the air equalization hole; The first cover plate, the second cover plate, and the three-step groove sidewall limit the primary mixing chamber.

6. The gas mixing device according to claim 5, characterized in that, The three-tiered groove is a stepped groove with the opening decreasing in size from top to bottom; The three-tiered groove includes a first groove wall, a first bottom surface, a second groove wall, a second bottom surface, a third groove wall, and a third bottom surface connected sequentially from top to bottom.

7. The gas mixing device according to claim 6, characterized in that, The first groove wall is vertically arranged around the outside of the first bottom surface, and the first groove wall and the first bottom surface form the first step of the three-stage groove; the shape and size of the first cover plate are adapted to the first groove wall and the first bottom surface, and the top end face of the first cover plate is flush with the top end face of the mixing chamber body; The first bottom surface is horizontally surrounded on the outside of the second groove wall, and the second groove wall is vertically surrounded on the outside of the second bottom surface. The second groove wall and the second bottom surface form the second step of the three-step groove. The second bottom surface surrounds the outside of the third groove wall, and the third groove wall is vertically surrounded on the outside of the third bottom surface. The third groove wall and the third bottom surface form the third step of the three-step groove. The shape and size of the second cover plate are adapted to the third groove wall and the third bottom surface, and the top end face of the second cover plate is flush with the second bottom surface. The first cover plate, the second cover plate, and the second groove wall limit the primary mixing chamber.

8. The gas mixing device according to claim 7, characterized in that, A secondary mixing chamber extending downwards is provided from the third bottom surface; The secondary mixing chamber includes two vertical cavity walls arranged opposite each other and a first inclined cavity wall and a second inclined cavity wall arranged opposite each other, wherein the inclination of the first inclined cavity wall is less than that of the second inclined cavity wall; The bottom end of the second inclined cavity wall is provided with a guide platform that protrudes from the upper cavity wall of the third-stage mixing cavity. The guide platform, together with the first inclined cavity wall and the upper cavity wall of the third-stage mixing cavity, limits the gas mixing port.

9. The gas mixing device according to claim 5, characterized in that, The air inlet includes a first air inlet and a second air inlet; The first air inlet is provided with a first air inlet pipe, and the second air inlet is provided with a second air inlet pipe; The first and second air intake pipes are of different lengths.

10. The gas mixing device according to claim 5, characterized in that, The bottom of the mixing chamber body is provided with a detachable air equalization plate; The gas distribution plate has multiple gas distribution holes.

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