Gas supply system and method and reaction device
By using a gas supply system with branched and dual pipeline designs, combined with VCR pneumatic diaphragm valves and PLC control, the problems of leakage and cross-contamination in the gas supply system have been solved, achieving a high level of cleanliness and high repeatability in gas supply.
Patent Information
- Application Number
- CN202511463470.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-14
- Publication Date
- 2026-01-09
AI Technical Summary
Existing gas supply systems are prone to leakage and slow replacement during gas path and valve switching, affecting process purity and repeatability, especially with high risk of cross-contamination in active or highly reactive working fluids.
The system employs a branch pipeline and dual pipeline design, with gas washing via the first pipeline and gas supply via the second pipeline. It utilizes VCR pneumatic diaphragm valves and PLC control to achieve isolation between the gas washing and supply paths. Combined with a mass flow controller and PID control valve, it ensures the stability of the gas mixing ratio and output concentration.
It effectively removes residual gases, reduces the risk of cross-contamination, improves the cleanliness and repeatability of the gas supply system, ensures the stability of the mixing ratio and output concentration, and reduces leakage rate and pollution risk.
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Figure CN121296898A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of gas experimental technology, and in particular to a gas supply system, method and reaction apparatus. Background Technology
[0002] In material growth or chemical reaction experiments, the gas supply system of the reaction chamber needs to provide a constant and adjustable internal gas pressure, a stable mixture of process gases in a certain proportion, and to implement precise control and real-time monitoring of the flow rate and pressure of each gas path.
[0003] Existing technologies can achieve gas metering and pressure control to a certain extent, but in practical applications, when switching between multiple channels and valves, leakage or slow replacement of pipelines and valve chambers can leave residual gas from the previous process, affecting the purity and repeatability of subsequent processes; this is especially sensitive to active or highly reactive working fluids. Summary of the Invention
[0004] In view of the shortcomings of the prior art described above, the purpose of this invention is to provide a gas supply system, method and reaction device to improve the cleanliness of the gas path.
[0005] To achieve the above and other related objectives, the present invention provides a gas supply system, comprising:
[0006] The air intake pipe is provided in multiple ways, and each air intake pipe is connected to an air source.
[0007] First pipeline;
[0008] Second pipeline;
[0009] The gas scrubbing line is at least connected to the first line;
[0010] A gas supply line is at least connected to the second line, and a gas outlet line is connected to the gas supply line.
[0011] The first extraction unit is at least connected to the air scrubbing pipeline;
[0012] Branch pipes, one of each of the intake pipes is provided;
[0013] The two ends of each branch pipe are connected to the first pipe and the second pipe, respectively. The middle part of each branch pipe is connected to the corresponding air inlet pipe. A first valve is provided on the branch pipe between the air inlet pipe and the first pipe. A second valve is provided on the branch pipe between the air inlet pipe and the second pipe. A third valve is provided on the air washing pipe between the first air extraction unit and the first pipe. A fourth valve is provided on the air supply pipe between the air outlet pipe and the second pipe.
[0014] In a specific embodiment of the present invention, the two ends of the gas washing pipeline are respectively connected to the first pipeline and the second pipeline, the middle part of the gas washing pipeline is connected to the first extraction unit, the two ends of the gas supply pipeline are respectively connected to the first pipeline and the second pipeline, the middle part of the gas supply pipeline is connected to the gas outlet pipeline, a fifth valve is provided on the gas washing pipeline between the first extraction unit and the second pipeline, and a sixth valve is provided on the gas supply pipeline between the gas outlet pipeline and the first pipeline.
[0015] In one specific embodiment of the present invention, the first valve and the second valve are arranged symmetrically, the third valve and the fourth valve are arranged symmetrically, and the fifth valve and the sixth valve are arranged symmetrically.
[0016] In one specific embodiment of the present invention, a control tube is further included, which is sequentially connected to the gas supply line, the gas washing line and the first gas extraction unit.
[0017] In one specific embodiment of the present invention, a pressure controller is provided on the control tube, the outlet of the pressure controller is connected to the air washing pipe, and the inlet of the pressure controller is connected to the air supply pipe.
[0018] In one specific embodiment of the present invention, each of the air intake pipes is provided with a mass flow controller.
[0019] In one specific embodiment of the present invention, a mass flow meter is provided on the air outlet pipe.
[0020] The present invention also provides a gas supply method, applied to the aforementioned gas supply system, comprising the following steps:
[0021] The single-pipe gas washing step includes: opening the first valve and the third valve on one of the unwashed air inlet pipes, closing the other valves, and starting the first air extraction unit.
[0022] Repeat the single-pipe air washing step for each of the air intake pipes until all the air intake pipes have been washed.
[0023] Close all first valves and the third valve, open all second valves and open the fourth valve to supply mixed gas to the outlet pipe.
[0024] The present invention also provides a reaction apparatus, including the gas supply system, and further including a reaction chamber and a second gas extraction unit. The gas outlet pipe of the gas supply system is connected to the reaction chamber through a main pipeline. A seventh valve is provided on the main pipeline. The reaction chamber is connected to the second gas extraction unit through a gas extraction pipe.
[0025] In one specific embodiment of the present invention, the first air extraction unit and the second air extraction unit share the same air extraction pump.
[0026] In one specific embodiment of the present invention, a PID control valve is provided on the extraction pipe, and a vacuum gauge is provided in the reaction chamber.
[0027] The technical advantages of this invention are as follows: Residual gas is actively removed through the first pipeline and the extraction unit during the gas washing process; the gas supply pipeline and the gas outlet pipeline remain isolated during the gas washing stage, reducing the risk of cross-contamination between different gas sources. Gas supply is completed through a dedicated second pipeline, avoiding interference with the mixing chamber during the gas washing process, resulting in a more stable and consistent mixing ratio and output concentration. Attached Figure Description
[0028] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0029] Figure 1 This is a schematic diagram of the gas supply system according to one embodiment of the present invention;
[0030] Figure 2 This is a schematic diagram of the reaction device according to one embodiment of the present invention.
[0031] Explanation of reference numerals in the attached diagram: 1. Gas supply system; 2. Reaction chamber; 3. Second extraction unit; 4. Main pipeline; 5. Seventh valve; 6. PID control valve; 7. Vacuum gauge; 10. First pipeline; 20. Second pipeline; 30. Inlet pipe; 31. Mass flow controller; 40. Washing gas pipeline; 41. Third valve; 42. Fifth valve; 50. Gas supply pipeline; 51. Fourth valve; 52. Sixth valve; 60. First extraction unit; 70. Branch pipeline; 71. First valve; 72. Second valve; 80. Control pipe; 81. Pressure controller; 90. Outlet pipe; 91. Mass flow meter. Detailed Implementation
[0032] The following specific examples illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention. It should be noted that, unless otherwise specified, the following embodiments and features described therein can be combined with each other.
[0033] It should be noted that the illustrations provided in the following embodiments are only schematic representations of the basic concept of the present invention. Therefore, the illustrations only show the components related to the present invention and are not drawn according to the actual number, shape and size of the components in the actual implementation. In the actual implementation, the form, quantity and proportion of each component can be arbitrarily changed, and its component layout may also be more complex.
[0034] In material growth or chemical reaction experiments, process chambers often require maintaining stable gas pressure and supplying mixed gases in a certain ratio, while precisely controlling the flow rate and pressure of each gas path to meet process requirements. For this purpose, precision mass flow controllers, proportional valves, buffer chambers, and designed pipeline and reversing systems are typically used to achieve gas supply and switching, and target parameters are adjusted and maintained through online sensing and feedback control.
[0035] While the aforementioned methods can improve gas supply accuracy and control response to some extent, existing technologies still have several shortcomings: residual gas during gas path switching and reversal processes can easily cause cross-contamination and short-term ratio deviations, leading to reduced process repeatability; the mixing process is limited by pipeline layout, fluid dynamics, and local wall adsorption / desorption behavior, easily resulting in uneven mixing or lag, affecting the uniformity of the final reaction or deposition; pressure and flow control often exhibit overshoot, oscillation, or response lag during rapid process changes or system disturbances, making it difficult to recover to a stable state in a short time; limitations in sensor location, accuracy, and response speed, coupled with the difficulty of parameter tuning in the control loop, make it difficult for closed-loop control to maintain ideal control performance in complex multi-component systems; furthermore, pipeline and valve leaks, material compatibility issues, and long-term pollution accumulation and adsorption / desorption behavior can cause long-term drift and maintenance problems, and conventional precision controllers and pipeline designs cannot completely eliminate these effects in practical applications, thus restricting the stability and consistency of the gas supply system under high reliability, high purity, and high repeatability experimental conditions.
[0036] like Figure 1 As shown, the present invention proposes an air supply system 1, including an air inlet pipe 30, a first pipeline 10, a second pipeline 20, a gas washing pipeline 40, an air supply pipeline 50, a first air extraction unit 60, and a branch pipeline 70.
[0037] Multiple air inlet pipes 30 are provided (for example, three), and each air inlet pipe 30 is connected to a gas source. The gas source can be a gas cylinder, and a pressure reducing valve is installed at the gas cylinder outlet. When changing gas cylinders, the valve is disassembled to allow air to enter the air inlet pipe 30. For flammable and explosive gases, a gas purging operation is required before the experiment.
[0038] The gas washing line 40 is connected to at least the first line 10. The gas supply line 50 is connected to at least the second line 20, and the gas supply line 50 is connected to the gas outlet line 90.
[0039] One branch pipe 70 is provided for each intake pipe 30. The two ends of the branch pipe 70 are connected to the first pipe 10 and the second pipe 20 respectively, and the middle part of each branch pipe 70 is connected to the corresponding intake pipe 30.
[0040] A first valve 71 is installed on the branch pipe 70 between the intake pipe 30 and the first pipe 10; a second valve 72 is installed on the branch pipe 70 between the intake pipe 30 and the second pipe 20; a third valve 41 is installed on the air washing pipe 40 between the first air extraction unit 60 and the first pipe 10; and a fourth valve 51 is installed on the air supply pipe 50 between the outlet pipe 90 and the second pipe 20. Specifically, the first valve 71 and the second valve 72 can be VCR pneumatic diaphragm valves.
[0041] The gas washing path is as follows: Inlet pipe 30 → Branch (open the corresponding first valve 71, close the other second valves 72) → First pipeline 10 → Gas washing pipeline 40 (open the third valve 41) → First extraction unit 60. The extraction unit actively removes residual gas and air, completing single-pipe gas washing (repeated along each path).
[0042] Gas supply path: Inlet pipe 30 → Branch (second valve 72 opens) → Second pipe 20 → Gas supply pipe 50 (fourth valve 51 opens) → Outlet pipe 90. During the gas supply phase, the second pipe 20 is connected to the outlet pipe 90, and the first pipe 10 remains isolated from the extraction system.
[0043] In the above scheme, the second pipeline 20 and the outlet pipeline 90 are closed during the gas washing stage to ensure that the gas extraction does not affect the mixing chamber or the output gas that is being supplied, thus avoiding fluctuations in the mixing ratio. The first extraction unit 60 directly extracts the residual gas in the branch and the first pipeline 10, improving the washing efficiency and reducing the risk of cross-contamination, which is particularly suitable for flammable, explosive, or polluting sensitive gases. Gas supply is completed through the dedicated second pipeline 20, which is not disturbed by the gas washing process, resulting in a more stable mixing ratio and output concentration. Single-pipe gas washing can reduce unnecessary overall replacement gas volume, and the valve control logic reduces the risk of mixing contamination during bottle changing or maintenance. High-sealing elements such as VCR pneumatic diaphragm valves are used to improve system leakage control and long-term stability.
[0044] In one specific embodiment of the invention, all components are centrally mounted on a breadboard or a custom-designed orifice plate, facilitating modular arrangement and fixation. Piping routing and supports can be pre-designed to shorten pipe length, reduce dead volume, and lower mechanical stress. Each connection utilizes a VCR metal seal (metal gasket) to achieve a highly reliable sealing connection, suitable for high-purity, high-pressure, high-temperature, and low-leakage scenarios. Valves are pneumatically driven and controlled via digital / analog I / O or fieldbus communication with a PLC. The PLC handles valve position sequencing, extraction unit control, fault interlocking, and communication with the upper-level HMI / data recording system, enabling automated process flow and centralized diagnostics. The overall assembly method enhances system compactness, maintainability, and repeatability. The VCR metal seal significantly reduces leakage rate and contamination, minimizes dead zones and volatile releases, making it suitable for handling flammable, explosive, and high-cleanliness gases. Centralized PLC control enables deterministic timing, automated gas washing and supply switching, logic interlocking, and alarms, reducing human error and facilitating recording and traceability. Simultaneously, the modular panel facilitates on-site replacement, expansion, and mass production, improving reliability, safety, and operational stability.
[0045] In a specific embodiment of the present invention, the two ends of the gas washing pipeline 40 are respectively connected to the first pipeline 10 and the second pipeline 20, and the middle part of the gas washing pipeline 40 is connected to the first extraction unit 60. The two ends of the gas supply pipeline 50 are respectively connected to the first pipeline 10 and the second pipeline 20, and the middle part of the gas supply pipeline 50 is connected to the outlet pipeline 90. A fifth valve 42 is provided on the gas washing pipeline 40 between the first extraction unit 60 and the second pipeline 20, and a sixth valve 52 is provided on the gas supply pipeline 50 between the outlet pipeline 90 and the first pipeline 10. By combining and controlling the fifth valve 42, the sixth valve 52, and the first and second valves 72 at the branch points, the functions of the first pipeline 10 and the second pipeline 20 can be interchanged: in one configuration, the first pipeline 10 serves as the main channel for mixing / supplying gas, and the second pipeline 20 serves as the gas washing channel. In another configuration, the opposite is true. This structure allows the gas washing path to be achieved by any pipeline through the gas washing pipeline 40 to the first gas extraction unit 60, while the gas supply path can be achieved by another pipeline through the gas supply pipeline 50 to the gas outlet pipe 90. The valve position logic determines which pipeline is responsible for gas washing and which is responsible for gas supply, thereby realizing flexible switching and interchange of pipeline functions.
[0046] This interchangeable design offers high flexibility and redundancy, facilitating on-site switching between the gas washing and supply paths based on process requirements or maintenance status. This reduces the risk of downtime due to a single path failure and shortens maintenance downtime. During cylinder replacement, maintenance, or validation, one side of the pipeline can be used for continuous gas supply while the other side is used for gas washing and vacuuming, ensuring uninterrupted process operation. Interchangeability also facilitates uniform cleaning of both pipelines, reduces long-term accumulated contamination, and simplifies performance verification and calibration. Through the isolation control of the fifth valve 42 and the sixth valve 52, physical isolation between the gas supply and gas washing paths can be maintained during switching, further reducing the risk of cross-contamination and improving system safety and stability.
[0047] In a specific embodiment of the present invention, the first valve 71 and the second valve 72 are arranged symmetrically, the third valve 41 and the fourth valve 51 are arranged symmetrically, and the fifth valve 42 and the sixth valve 52 are arranged symmetrically. Symmetrical arrangement means that the first valve 71 and the second valve 72, the third valve 41 and the fourth valve 51, and the fifth valve 42 and the sixth valve 52 are installed on a breadboard / hole plate in a mirror or geometrically symmetrical manner, maintaining equivalence in pipeline length, number of bends, and installation position. This arrangement facilitates standardized pipeline layout, paired and repetitive placement of pneumatic actuators and sensors, and allows the PLC's I / O mapping and control program to be organized according to symmetrical logic. Installation, commissioning, and maintenance can be performed using the same steps, reducing the probability of human error in wiring and interface connection. The symmetrical design brings a balance between flow and resistance, which helps maintain consistent pressure, response time, and mixing characteristics during switching or interchange of the two sides, reducing mixing ratio deviations or dead volume differences caused by asymmetry. Modular interchangeability and redundant switching can be achieved during maintenance or failure, shortening downtime and improving system reliability. The symmetrical mechanical layout and standardized components also reduce manufacturing and maintenance costs, facilitate mass production and field replication, and improve system debugging efficiency and operational consistency.
[0048] In one specific embodiment of the present invention, a control pipe 80 is further included, which is sequentially connected to the gas supply line 50, the gas scrubbing line 40, and the first extraction unit 60. The control pipe 80 serves as an auxiliary channel sequentially connecting the gas supply line 50, the gas scrubbing line 40, and the first extraction unit 60, and is used to achieve controlled gas flow and pressure transmission during valve position switching and process cycles. Configuring the control pipe 80 enables a more controllable and smoother switching process, reducing the risk of backflow, jetting, or contamination caused by instantaneous pressure differences.
[0049] In one specific embodiment of the present invention, a pressure controller 81 is provided on the control pipe 80. The outlet end of the pressure controller 81 is connected to the washing gas pipe, and the inlet end of the pressure controller 81 is connected to the supply gas pipe 50. In this embodiment, one end (inlet end) of the pressure controller 81 installed on the control pipe 80 is connected to the supply gas pipe 50, and the other end (outlet end) is connected to the washing gas pipe 40. The pressure controller 81 can be implemented by an internal proportional valve or a pressure regulating component with position / pressure feedback. It maintains or regulates the steady-state pressure / flow rate at the outlet end by adjusting the valve opening degree, so that the supply gas side provides a controllable and settable pressure source to the washing gas side. The pressure controller 81 is usually linked with a pressure sensor and a PLC, automatically adjusting the valve position according to the programmed pressure / flow target, and cooperating with a check valve, bypass, or safety relief device when necessary to prevent reverse flow or overpressure.
[0050] In a specific embodiment of the present invention, each inlet pipe 30 is equipped with an independent mass flow controller 31 (MFC), with the measurement unit being sccm (Standard Cubic Centimeter per Minute). Each type of gas is equipped with a corresponding calibrated or gas conversion factor-equipped MFC. The MFC is installed on the inlet side, before the valve, or at a designated location, providing setpoints and real-time readback signals to the PLC. The PLC is responsible for issuing flow settings, recording, and interlocking. Because the MFC controls by mass flow, its output and sensitivity to temperature and pressure changes are low. It can be calibrated or corrected by gas factors to achieve accurate measurement and rapid response for different gases. It can also work in conjunction with the system's valve logic, extraction unit, and safety interlocks (such as valve closure due to over-limit and alarms). Individual MFCs achieve high-precision, repeatable gas measurement and rapid dynamic adjustment, ensuring the stability of the mixing ratio and the consistency of the output concentration from the source, facilitating formula switching and process traceability. Mass flow control reduces mixing ratio deviations caused by pressure fluctuations, shortens steady-state time, and improves output consistency. A standalone MFC can also serve as a safety current limiting and fault detection point, working in conjunction with a PLC to achieve overcurrent / undercurrent protection and alarms, facilitating the safe management of flammable and explosive gases. It also facilitates online diagnostics, calibration, and maintenance, improving system controllability and process reliability.
[0051] In one specific embodiment of the present invention, a mass flow meter 91 is installed on the outlet pipe 90. The mass flow meter 91 is installed on the outlet pipe 90 to measure the total flow rate of the mixed gas entering the reaction chamber 2 in real time. This mass flow meter 91 can output analog / digital signals to be connected to a PLC or HMI for online display, recording, and closed-loop control. It directly measures the total volume or mass flow rate (using thermal or Coriolis sensing), is independent of a single gas component, and facilitates comparison with the set values and readbacks of each inlet MFC to verify pipeline and metering consistency.
[0052] The present invention also provides a gas supply method, applied to the gas supply system 1, comprising the following steps:
[0053] S1. Open the first valve 71 between a certain inlet pipe 30 and the first pipeline 10, and simultaneously open the third valve 41 connected to the first pipeline 10. Close the remaining valves and activate the first extraction unit 60. The PLC controls the corresponding MFC to provide a set flow rate so that the pure gas in the cylinder enters the branch through the inlet pipe 30 and flows to the first pipeline 10. The first extraction unit 60 removes residual air and impurities from the connected pipeline, thereby completing the "washing" cycle of that line. The line-by-line washing in S1, through the combination of active extraction and controlled gas inflow, effectively removes air and residual contaminants introduced when changing gas cylinders or disconnecting the gas inlet, reducing cross-contamination and explosion risks, and saving replacement gas volume.
[0054] S2. Repeat S1 sequentially for each intake pipe 30 using the same logic until all intake pipes 30 have completed independent air washing. Each pipe can switch to the next pipe after a time specified by the PLC or after reaching the pressure / flow threshold to ensure that the required cleanliness is achieved. The sequential cycle of S2 ensures that all source pipes are cleaned using the same process, avoiding performance deviations caused by long-term accumulation on one side and facilitating recording and traceability.
[0055] S3. All first valves 71 and third valves 41 are closed to isolate the gas extraction circuit. All second valves 72 are opened and the fourth valve 51 is opened to connect the second pipeline 20 with the outlet pipe 90. Flow settings are issued to each MFC according to the formula ratio. The pressure controller 81 maintains the set pressure difference between the gas supply side and the gas washing side and works with the downstream gas extraction / pressure stabilizing pump to pre-charge and stabilize the pipeline. Once the mass flow meter 91 at the outlet and the pressure / flow feedback reach a steady state, the mixed gas is sent into the reaction chamber 2. The closed gas extraction circuit in S3 and the switch to gas supply in the second pipeline 20, combined with the precise MFC ratio and the pressure stabilizing pre-charge by the pressure controller 81 and the pump, can quickly establish a stable total flow rate and mixing ratio.
[0056] like Figure 2 As shown, the present invention also provides a reaction device, which consists of a gas supply system 1, a reaction chamber 2, and a second extraction unit 3. The outlet pipe 90 of the gas supply system 1 is connected to the reaction chamber 2 via a main pipeline 4. A seventh valve 5 (such as a proportional valve, needle valve, or regulating ball valve) is installed on the main pipeline 4 for isolation or coarse adjustment of the main passage. The reaction chamber 2 is connected to the second extraction unit 3 via an extraction pipe to achieve evacuation and pressure control of the chamber. The seventh valve 5 can be controlled by a PLC in conjunction with a pressure / flow sensor, thereby achieving graded isolation, pressure stabilization and pre-charging, flow limiting regulation, and fine flow direction control between the gas supply system 1, the main pipeline 4, and the chamber.
[0057] In one specific embodiment of the present invention, the first extraction unit 60 and the second extraction unit 3 share the same extraction pump. In this embodiment, the pipelines that were originally two independent extraction units share the same extraction pump, that is, the first extraction unit 60 (for extraction of the gas washing pipeline 40) and the second extraction unit 3 (for extraction of the reaction chamber 2 or the main pipeline 4) are connected to the same extraction pump through a multi-way reversing valve or valve group. Sharing the extraction pump can significantly reduce equipment investment, land occupation and spare parts types, simplify pump maintenance and energy consumption, and improve equipment utilization and economy. Centralized maintenance and unified monitoring also facilitate fault diagnosis and maintenance planning.
[0058] In one specific embodiment of the present invention, a PID control valve 6 with a motor is installed on the suction pipe, and a vacuum gauge 7 is arranged in the reaction chamber 2, forming a closed-loop pressure control circuit. The vacuum gauge 7 collects the pressure inside the chamber in real time and transmits the measured value to the PID control unit (which can be an independent controller or a control algorithm within a PLC). The controller compares the measured pressure with the set pressure, generates a control quantity through proportional-integral-derivative calculation, and issues it to the motor-driven regulating valve to change the valve opening, thereby adjusting the suction flow and affecting the pressure inside the chamber. The feedback control using the PID control valve 6 in conjunction with the vacuum gauge 7 can stabilize the chamber pressure near the set value, significantly reducing steady-state fluctuations, reducing overshoot and oscillation, and accelerating the stabilization time, thereby improving process consistency and repeatability.
[0059] In summary, this invention achieves several beneficial effects through independent gas washing along each path, dual-pipeline branching and isolation valve groups, controlled pressure pipelines (including control pipe 80 and pressure controller 81), individual MFC and outlet mass flow meter 91, symmetrical and modular mechanical layout (VCR metal seal, breadboard mounting), and control logic of PLC / PID closed-loop linkage and (optionally) shared suction pump: it can efficiently remove residual gas and air along each path with the lowest replacement gas volume during gas cylinder replacement or maintenance, significantly reducing cross-contamination and explosion risks and saving gas resources. Physical isolation and controlled pressure stabilization and buffering of the gas supply and washing paths make the mixing ratio, total flow rate, and output concentration more stable and repeatable during the gas supply stage. The symmetrical and modular design facilitates manufacturing, debugging, and maintenance, reduces dead volume and flow resistance differences, and facilitates field expansion and replacement. VCR metal seals and high-sealing valves improve sealing performance and long-term stability, reducing leakage and contamination. The PLC-sensor linkage and the closed-loop and alarm functions of the MFC and mass flow meter 91 enhance process controllability, online diagnostics and traceability capabilities, shorten steady-state time and improve yield consistency. Pressure control and PID valve control reduce transient shocks, extend pump and valve life, and provide rapid protection in case of failure. Interchangeable piping configurations and shared pump strategies improve redundancy and economy while ensuring safety and performance, significantly enhancing the overall system's safety, reliability, maintainability and process stability.
[0060] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in the present invention should still be covered by the claims of the present invention.
Claims
1. A gas supply system, characterized in that, include: The air intake pipe is provided in multiple ways, and each air intake pipe is connected to an air source. First pipeline; Second pipeline; The gas scrubbing line is at least connected to the first line; A gas supply line is at least connected to the second line, and a gas outlet line is connected to the gas supply line. The first extraction unit is at least connected to the air scrubbing pipeline; Branch pipes, one of each of the intake pipes is provided; The two ends of each branch pipe are connected to the first pipe and the second pipe, respectively. The middle part of each branch pipe is connected to the corresponding air inlet pipe. A first valve is provided on the branch pipe between the air inlet pipe and the first pipe. A second valve is provided on the branch pipe between the air inlet pipe and the second pipe. A third valve is provided on the air washing pipe between the first air extraction unit and the first pipe. A fourth valve is provided on the air supply pipe between the air outlet pipe and the second pipe.
2. The gas supply system according to claim 1, characterized in that, The two ends of the gas washing pipeline are connected to the first pipeline and the second pipeline, respectively. The middle part of the gas washing pipeline is connected to the first extraction unit. The two ends of the gas supply pipeline are connected to the first pipeline and the second pipeline, respectively. The middle part of the gas supply pipeline is connected to the gas outlet pipeline. A fifth valve is provided on the gas washing pipeline between the first extraction unit and the second pipeline. A sixth valve is provided on the gas supply pipeline between the gas outlet pipeline and the first pipeline.
3. The gas supply system according to claim 2, characterized in that, The first valve and the second valve are arranged symmetrically, the third valve and the fourth valve are arranged symmetrically, and the fifth valve and the sixth valve are arranged symmetrically.
4. The gas supply system according to claim 2, characterized in that, It also includes a control tube, which is sequentially connected to the gas supply line, the gas washing line and the first gas extraction unit.
5. The gas supply system according to claim 4, characterized in that, The control tube is equipped with a pressure controller, the outlet of which is connected to the air washing pipe, and the inlet of which is connected to the air supply pipe.
6. The gas supply system according to claim 1, characterized in that, Each of the aforementioned air intake pipes is equipped with a mass flow controller.
7. The gas supply system according to claim 1, characterized in that, A mass flow meter is installed on the outlet pipe.
8. A gas supply method, characterized in that, Applied to the gas supply system as described in any one of claims 1-7, the method includes the following steps: The single-pipe gas washing step includes: opening the first valve and the third valve on one of the unwashed air inlet pipes, closing the other valves, and starting the first air extraction unit. Repeat the single-pipe air washing step for each of the air intake pipes until all the air intake pipes have been washed. Close all first valves and the third valve, open all second valves and open the fourth valve to supply mixed gas to the outlet pipe.
9. A reaction apparatus, characterized in that, The gas supply system includes any one of claims 1-7, and further includes a reaction chamber and a second extraction unit. The gas outlet pipe of the gas supply system is connected to the reaction chamber through a main pipeline. A seventh valve is provided on the main pipeline. The reaction chamber is connected to the second extraction unit through an extraction pipe.
10. The reaction apparatus according to claim 9, characterized in that, The first air extraction unit and the second air extraction unit share the same air extraction pump.
11. The reaction apparatus according to claim 9, characterized in that, A PID control valve is installed on the extraction pipe, and a vacuum gauge is installed inside the reaction chamber.